CN116621425B - A method for hot replacement of platinum channel of TFT liquid crystal glass - Google Patents
A method for hot replacement of platinum channel of TFT liquid crystal glassInfo
- Publication number
- CN116621425B CN116621425B CN202310477807.3A CN202310477807A CN116621425B CN 116621425 B CN116621425 B CN 116621425B CN 202310477807 A CN202310477807 A CN 202310477807A CN 116621425 B CN116621425 B CN 116621425B
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- platinum channel
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B7/00—Distributors for the molten glass; Means for taking-off charges of molten glass; Producing the gob, e.g. controlling the gob shape, weight or delivery tact
- C03B7/02—Forehearths, i.e. feeder channels
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
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- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacture And Refinement Of Metals (AREA)
Abstract
The invention provides a hot state replacement method for a TFT liquid crystal glass platinum channel, which comprises the steps of firstly emptying glass liquid in a kiln and the platinum channel, keeping the kiln, the normal position platinum channel and a forming furnace to run at high temperature, then cooling and replacing the platinum channel at a fault position, and after the platinum channel at the fault position is reinstalled, heating the platinum channel to reach a target temperature and then recovering normal production. The local replacement of the platinum channel at the fault part avoids the cold repair replacement of the whole hot end equipment, reduces the fault recovery time, greatly reduces the fault recovery cost, reduces the material purchasing cost of new equipment, and ensures that the production operation of a company is powerfully ensured.
Description
Technical Field
The invention belongs to the technical field of TFT liquid crystal glass manufacturing, and particularly relates to a platinum channel hot state replacement method.
Background
In the liquid crystal glass production manufacturing process, a platinum channel heats, clarifies, homogenizes and cools the high-temperature glass liquid premelted in the kiln 1, adjusts the temperature to meet the requirement of a forming process, and flows into a glass collecting tank of a forming furnace 8 for overflow forming after the temperature is increased, namely the platinum channel is a glass liquid refining furnace, and carries out deep processing and optimized adjustment on the glass liquid. The platinum passageway divide into heating up section 2, clarification section 3, cooling section 4, stirring section 5, cooling section 6 and feed section 7 according to the technology demand, and the structure of platinum passageway divide into two parts, and heating up section 3 and clarification section 3 are an integer promptly, and cooling section 4, stirring section 5, cooling section 6 and feed section 7 are an integer, adopt two platinum flange to link together between the two parts. Because of the requirements of the clarification process, the temperature of the channel heating and clarification area is higher than 1640 ℃, and the service life of the platinum channel in the heating and clarification area is the broken plate of the whole platinum channel due to the high temperature and glass liquid flowing erosion, and the service life of the platinum channel affects the service life of the kiln and the forming furnace.
At present, the service life of the platinum channel accounts for 80% of the total production line scrapping amount due to the temperature rise and clarification area faults, the TFT liquid crystal glass hot end equipment input cost is high, the production line scrapping brings serious influence to production operation due to the faults of the platinum channel, cold repair is performed after the whole hot end equipment is cooled to normal temperature, and all hot end equipment is scrapped, and new kiln, platinum channel, forming furnace and other equipment are reinstalled.
Disclosure of Invention
The invention aims to provide a hot replacement method for a TFT liquid crystal glass platinum channel, which aims to solve the problem of integral replacement of a hot end wire body caused by a platinum channel fault in the prior art. According to the invention, a method for cooling and replacing the platinum channel at the fault part is adopted, glass liquid in the kiln and the platinum channel at the normal part and the forming furnace are kept to run at high temperature, and after the platinum channel at the fault part is reinstalled, the temperature is raised to the target temperature, and then normal production is resumed.
In order to achieve the above purpose, the invention adopts the following technical scheme:
a hot state replacement method for a TFT liquid crystal glass platinum channel comprises the following steps:
Step1, stopping feeding the kiln, and emptying glass liquid in the kiln and a platinum channel;
Step 2, controlling the temperatures of the kiln, the platinum channel at the normal position and the forming furnace to a preset temperature respectively, and continuously preserving heat at the preset temperature;
step 3, dismantling a platinum channel of the fault part, and installing a new platinum channel at the fault part;
Step 4, after the new platinum channel is subjected to one-time heating treatment, the new platinum channel is abutted against the kiln and the platinum channel at the normal position;
step 5, performing secondary heating treatment on the new platinum channel;
And 6, feeding the kiln and establishing a liquid level, and after the kiln, the platinum channel and the forming furnace are restored to a normal production state according to the liquid level height, completing the hot replacement of the platinum channel of the TFT liquid crystal glass.
Further, in the step 2, the preset temperature of the kiln is 1500-1550 ℃.
Further, in step2, the preset temperature of the platinum channel of the normal part is 1100 ℃ to 1200 ℃.
Further, in the step 2, the preset temperature of the forming furnace is 1050-1150 ℃.
Further, in the step 2, the time of continuous heat preservation is continued until the thermal state replacement of the TFT liquid crystal glass platinum channel is completed.
Further, in the step 4, the primary temperature rising treatment specifically comprises the step of rising the temperature of the new platinum channel to 1260-1300 ℃.
Further, in the step 5, the secondary temperature rising treatment specifically comprises the step of rising the temperature of the new platinum channel to 1550 ℃ by taking the temperature of 1260-1300 ℃ as a starting point.
Further, in step 6, the liquid level satisfies a normal production state.
Further, in step 4, the temperature rise rate of the one-time temperature rise treatment is 8 ℃.
Further, in step 5, the temperature rise rate of the secondary temperature rise treatment is 8 ℃.
Compared with the prior art, the invention has the following beneficial effects:
the hot state replacement method for the TFT liquid crystal glass platinum channel provided by the invention only partially replaces the fault part of the platinum channel, greatly reduces the recovery cost of faults, maintains high temperature of a kiln, a normal part platinum channel and a forming furnace, reduces the cost of purchasing new equipment materials, greatly reduces the fault processing time, the fault recovery time is about 50 days, and the recovery time of the hot end wire cold repair method in the prior art is about 90 days.
Further, the heat preservation temperature of the kiln is selected to be 1500-1550 ℃, and at the temperature, the refractory material of the kiln is in the most stable state, so that shrinkage cracking of the refractory material after temperature reduction can be avoided, heating quantity can be reduced, and cost is effectively controlled.
Further, the heat preservation temperature of the platinum channel at the normal part is 1100-1200 ℃, and the platinum channel and the refractory material are in the most stable state at the temperature, so that the low-temperature shrinkage tearing of the platinum channel and shrinkage cracking of the refractory material after temperature reduction can be avoided.
Further, the heat preservation temperature of the forming furnace is 1050-1150 ℃, and the refractory material of the forming furnace is in a stable state at the temperature.
Further, the invention carries out primary heating treatment and secondary heating treatment on the new platinum channel, after the primary heating treatment, the expansion of the platinum is finished, the heating of the later recovery process has no influence on the expansion of the platinum, and after the secondary heating treatment, no glass liquid exists in the platinum channel, the glass liquid cannot support the platinum, the strength of the platinum can be reduced due to overhigh temperature, and hidden danger is brought to equipment, so the secondary heating treatment can ensure the fluidity of the glass liquid and the safety of the equipment.
Drawings
FIG. 1 is a schematic view of a kiln, platinum tunnel, forming furnace;
the device comprises a kiln, a platinum channel heating section, a platinum channel clarifying section, a platinum channel cooling section, a platinum channel stirring section, a platinum channel cooling section, a platinum channel feeding section and a forming furnace.
FIG. 2 is a graph of the coefficients of thermal expansion of the fused re-sintered mullite brick, ptRh10, ptRh20, and HDZS-65.
Detailed Description
In order that those skilled in the art may better understand the present invention, a further detailed description of the present invention will be provided with reference to the accompanying drawings, which are intended to illustrate, but not limit, the present invention.
It should be noted that the terms "comprises" and "comprising," along with any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed or inherent to such process, method, article, or apparatus, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.
A hot replacement repair method for a platinum channel of TFT liquid crystal glass comprises a replacement process of the platinum channel at a fault part and process control requirements of a kiln, the platinum channel and a forming furnace in the replacement process, wherein the kiln, the platinum channel and the forming furnace are shown in figure 1.
The existing kiln refractory material is made of an electrofusion re-sintering mullite brick material, platinum channels are made of platinum-rhodium alloy made of PtRh10 and PtRh20 materials respectively, and a forming furnace is made of HDZS-65 refractory materials.
A hot state replacement and repair method for a TFT liquid crystal glass platinum channel specifically comprises the following steps:
stopping feeding the kiln, and emptying glass liquid in a platinum channel of the kiln;
Step two, gradually reducing the temperature of the kiln from the normal production process temperature to 1500-1550 ℃ in the process of emptying the kiln glass liquid, keeping the temperature for a long time until the platinum channel is recovered to the normal production process after the thermal state replacement is completed, selecting 1500-1550 ℃ for long time, mainly considering that the kiln refractory material is in the most stable state at the temperature, avoiding shrinkage cracking of the refractory material after temperature reduction, reducing the heating amount and effectively controlling the cost;
Step three, dismantling and reinstalling the platinum channel, related refractory materials and auxiliary facilities at the fault part of the platinum channel;
the temperature of the normal part of the platinum channel is reduced to 1100-1200 ℃ from the normal production temperature until the normal production process is recovered after the thermal state of the platinum channel is replaced, the temperature is selected to be kept for a long time from 1100-1200 ℃, and the platinum channel and the refractory material are mainly considered to be in the most stable state at the temperature, so that the shrinkage and tearing of the platinum channel at low temperature and the shrinkage and cracking of the refractory material after the temperature reduction are avoided;
Step five, the normal production temperature of the forming furnace is reduced to 1050-1150 ℃ and maintained during the replacement of the platinum channel, the temperature requirement mainly considers the equipment energy consumption and the glass collecting tank of the forming furnace, and the refractory material is in a stable state at the temperature until the platinum channel is recovered to the normal production process after the thermal state replacement is completed;
Step six, after the replacement of the platinum channel at the fault part is completed, heating up according to the heating rate of 8 ℃ per Hr, butting the newly replaced platinum channel with the platinum channel in a kiln and heat-preserving state after the temperature reaches 1260 ℃ to 1300 ℃, wherein the temperature condition butting mainly considers that the expansion of the platinum at the temperature of 1260 ℃ to 1300 ℃ is finished, the heating up of the post recovery process has no influence on the expansion of the platinum, after the butting is completed, the newly replaced platinum channel is continuously heated up according to the heating rate until the temperature reaches 1550 ℃, and the temperature mainly considers the liquidity of glass liquid and the safety of equipment, because the glass liquid does not exist in the platinum channel at the moment, the supporting effect of the glass liquid on the platinum is avoided, the strength of the platinum can be reduced due to the overhigh temperature, and hidden danger is brought to the safety of the equipment;
Step seven, the kiln is provided with a feeder to start feeding to establish a liquid level, the kiln, the platinum channel and the forming furnace recover to the normal production process according to the liquid level, the process recovery target is the liquid level and the kiln, the platinum channel and the forming furnace recover to the same place at the same time, the thermal state replacement of the platinum channel is completed, and the normal production state is entered.
The method is used for locally replacing the fault part of the platinum channel, the production recovery time of the production line is shortened to 50 days, the investment of fault recovery funds is reduced by more than 60%, and the workload and the intensity of staff are greatly reduced. Because reasonable heat preservation temperature is formulated for the normal part platinum channel and the forming furnace, the normal part equipment state is guaranteed to be good, after failure recovery, the whole platinum channel system can be operated well, the product quality is stable and controlled, the service life of the platinum channel meets the design requirement, and the production operation cost management and control of a company and the stable supply of customer products are guaranteed strongly.
The following detailed description is of embodiments, and is intended to provide further details of the application. Unless defined otherwise, all technical terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments in accordance with the application.
Example 1
Stopping feeding the kiln, and emptying glass liquid in a platinum channel of the kiln;
Step two, gradually reducing the temperature of the kiln from the normal production process temperature to 1500 ℃ in the process of emptying the kiln glass liquid and after emptying, keeping the kiln temperature for a long time until the platinum channel is recovered to the normal production process after the hot replacement is completed, selecting 1500 ℃ for a long time, mainly considering that the kiln refractory material is in the most stable state at the temperature, avoiding shrinkage cracking of the refractory material after cooling, reducing the heating amount and effectively controlling the cost;
Step three, dismantling and reinstalling the platinum channel, related refractory materials and auxiliary facilities at the fault part of the platinum channel;
The temperature of the normal part of the platinum channel is reduced to 1200 ℃ from the normal production temperature until the normal production process is restored after the thermal state replacement of the platinum channel is completed, the 1200 ℃ is selected to be maintained for a long time, and the platinum channel and the refractory material are mainly considered to be in the most stable state at the temperature, so that the low-temperature shrinkage tearing of the platinum channel and the shrinkage cracking of the refractory material after the temperature reduction are avoided;
step five, reducing and maintaining the normal production temperature of the forming furnace to 1150 ℃ during the replacement of the platinum channel, wherein the temperature requirement mainly considers the equipment energy consumption and a glass collecting tank of the forming furnace, and the refractory material is in a stable state at the temperature until the platinum channel is recovered to the normal production process after the thermal state replacement is completed;
Step six, heating up the platinum channel at the fault part according to the heating rate of 8 ℃ per Hr after the replacement of the platinum channel is completed, butting the newly replaced platinum channel with the platinum channel in a kiln and heat-preserving state after the temperature reaches 1260 ℃, wherein the butting under the temperature condition mainly considers that the expansion of the platinum at the 1260 ℃ is finished, the heating up of the post recovery process has no influence on the expansion of the platinum, the newly replaced platinum channel is continuously heated up according to the heating rate after the butting is completed until the temperature reaches 1550 ℃, the temperature mainly considers that the fluidity of glass liquid and the safety of equipment are ensured, and the glass liquid does not exist in the platinum channel at the moment, the supporting effect of the glass liquid on the platinum is avoided, the strength of the platinum can be reduced due to the overhigh temperature, and hidden danger is brought to the safety of the equipment;
Step seven, the kiln is provided with a feeder to start feeding to establish a liquid level, the kiln, the platinum channel and the forming furnace recover to the normal production process according to the liquid level, the process recovery target is the liquid level and the kiln, the platinum channel and the forming furnace recover to the same place at the same time, the thermal state replacement of the platinum channel is completed, and the normal production state is entered.
Example 2
Stopping feeding the kiln, and emptying glass liquid in a platinum channel of the kiln;
Step two, gradually reducing the temperature of the kiln from the normal production process temperature to 1525 ℃ in the process of emptying the kiln glass liquid, keeping the temperature for a long time until the platinum channel is recovered to the normal production process after the thermal state replacement is completed, selecting 1525 ℃ for a long time, mainly considering that the kiln refractory material is in the most stable state at the temperature, avoiding shrinkage cracking of the refractory material after temperature reduction, reducing the heating amount and effectively controlling the cost;
Step three, dismantling and reinstalling the platinum channel, related refractory materials and auxiliary facilities at the fault part of the platinum channel;
The temperature of the normal part of the platinum channel is reduced to 1100 ℃ from the normal production temperature until the normal production process is restored after the thermal state replacement of the platinum channel is completed, the 1100 ℃ is selected to be maintained for a long time, and the platinum channel and the refractory material are mainly considered to be in the most stable state at the temperature, so that the low-temperature shrinkage tearing of the platinum channel and the shrinkage cracking of the refractory material after the temperature reduction are avoided;
Step five, the temperature of the forming furnace is reduced to 1050 ℃ from the normal production temperature and maintained during the replacement of the platinum channel, the temperature requirement mainly considers the equipment energy consumption and a glass collecting tank of the forming furnace, and the refractory material is in a stable state at the temperature until the platinum channel is recovered to the normal production process after the thermal state replacement is completed;
Step six, after the replacement of the platinum channel at the fault part is completed, heating up according to the heating rate of 8 ℃ per Hr, after the temperature reaches 1300 ℃, butting the newly replaced platinum channel with the platinum channel in a kiln and heat-preserving state, wherein the butting under the temperature condition mainly considers that the expansion of the platinum is finished at 1300 ℃, the heating up of the post recovery process has no influence on the expansion of the platinum, after the butting is completed, the newly replaced platinum channel is continuously heated up according to the heating rate until the temperature reaches 1550 ℃, the temperature mainly considers ensuring the fluidity of glass liquid and the safety of equipment, and because the glass liquid does not exist in the platinum channel at the moment, the supporting effect of the glass liquid on the platinum is avoided, the strength of the platinum can be reduced due to the overhigh temperature, and hidden danger is brought to the safety of the equipment;
Step seven, the kiln is provided with a feeder to start feeding to establish a liquid level, the kiln, the platinum channel and the forming furnace recover to the normal production process according to the liquid level, the process recovery target is the liquid level and the kiln, the platinum channel and the forming furnace recover to the same place at the same time, the thermal state replacement of the platinum channel is completed, and the normal production state is entered.
Example 3
Stopping feeding the kiln, and emptying glass liquid in a platinum channel of the kiln;
step two, gradually reducing the temperature of the kiln from the normal production process temperature to 1550 ℃ in the process of emptying the kiln glass liquid and after emptying, keeping the kiln temperature for a long time until the platinum channel is recovered to the normal production process after the hot replacement is completed, selecting 1550 ℃ for a long time, mainly considering that the kiln refractory material is in the most stable state at the temperature, avoiding shrinkage cracking of the refractory material after cooling, reducing the heating amount and effectively controlling the cost;
Step three, dismantling and reinstalling the platinum channel, related refractory materials and auxiliary facilities at the fault part of the platinum channel;
the temperature of the normal part of the platinum channel is reduced to 1150 ℃ from the normal production temperature until the normal production process is restored after the thermal state replacement of the platinum channel is completed, the 1150 ℃ is selected to be maintained for a long time, and the platinum channel and the refractory material are mainly considered to be in the most stable state at the temperature, so that the low-temperature shrinkage tearing of the platinum channel and the shrinkage cracking of the refractory material after the temperature reduction are avoided;
Step five, reducing the normal production temperature of the forming furnace to 1100 ℃ and keeping the temperature during the replacement of the platinum channel, wherein the temperature requirement mainly considers the equipment energy consumption and a glass collecting tank of the forming furnace, and the refractory material is in a stable state at the temperature until the platinum channel is recovered to the normal production process after the thermal state replacement is completed;
Step six, heating up the platinum channel at the fault part according to the heating rate of 8 ℃ per Hr after the replacement of the platinum channel is completed, butting the newly replaced platinum channel with the platinum channel in a kiln and heat-preserving state after the temperature reaches 1280 ℃, wherein the butting under the temperature condition mainly considers that the expansion of the platinum at 1280 ℃ is finished, the heating up of the post recovery process has no influence on the expansion of the platinum, and continuously heating up the newly replaced platinum channel until the temperature reaches 1550 ℃ after the butting is completed according to the heating rate, wherein the temperature mainly considers ensuring the fluidity of glass liquid and the safety of equipment, and because the glass liquid does not exist in the platinum channel at the moment, the supporting effect of the glass liquid on the platinum is avoided, the strength of the platinum can be reduced due to the overhigh temperature, and hidden danger is brought to the safety of the equipment;
Step seven, the kiln is provided with a feeder to start feeding to establish a liquid level, the kiln, the platinum channel and the forming furnace recover to the normal production process according to the liquid level, the process recovery target is the liquid level and the kiln, the platinum channel and the forming furnace recover to the same place at the same time, the thermal state replacement of the platinum channel is completed, and the normal production state is entered.
It will be appreciated by those skilled in the art that the invention can be practiced in other embodiments that depart from the spirit or essential characteristics thereof. Accordingly, the above disclosed embodiments are illustrative in all respects only and not restrictive, and all changes coming within the meaning and equivalency range of the invention are intended to be embraced therein.
Claims (8)
1. The hot state replacement method of the TFT liquid crystal glass platinum channel is characterized by comprising the following steps of:
Step1, stopping feeding the kiln, and emptying glass liquid in the kiln and a platinum channel;
Step 2, controlling the temperatures of the kiln, the platinum channel at the normal position and the forming furnace to a preset temperature respectively, and continuously preserving heat at the preset temperature;
step 3, dismantling a platinum channel of the fault part, and installing a new platinum channel at the fault part;
Step 4, after the new platinum channel is subjected to one-time heating treatment, the new platinum channel is abutted against the kiln and the platinum channel at the normal position;
step 5, performing secondary heating treatment on the new platinum channel;
Step 6, feeding the kiln and establishing a liquid level, and after the kiln, the platinum channel and the forming furnace are restored to a normal production state according to the liquid level height, completing the hot replacement of the platinum channel of the TFT liquid crystal glass;
in the step 4, the primary temperature rising treatment specifically comprises the following steps of rising the temperature of a new platinum channel to 1260-1300 ℃;
in step 5, the secondary temperature raising process specifically includes the following steps:
the new platinum channel is heated to 1550 ℃ with the temperature of 1260 ℃ to 1300 ℃ as the starting point.
2. The method for hot replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, wherein in step 2, the preset temperature of the kiln is 1500 ℃ to 1550 ℃.
3. The method for hot replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, wherein in step 2, the preset temperature of the platinum channel of the normal portion is 1100 ℃ to 1200 ℃.
4. The method for hot replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, wherein in step 2, the preset temperature of the forming furnace is 1050 ℃ to 1150 ℃.
5. The method for hot replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, wherein in step 2, the duration of the heat preservation is continued until the hot replacement of the platinum channel of the TFT liquid crystal glass is completed.
6. The method for hot replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, wherein in step 6, the liquid level satisfies a normal production state.
7. The method for hot-state replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, wherein in step 4, the temperature rising rate of the primary temperature rising process is 8 ℃.
8. The method for hot-state replacement of a platinum channel of a TFT liquid crystal glass according to claim 1, wherein in step 5, the temperature rising rate of the secondary temperature rising process is 8 ℃.
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| CN114853317A (en) * | 2022-04-20 | 2022-08-05 | 湖南旗滨医药材料科技有限公司 | Platinum channel non-heating area thermal state maintenance method |
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| CN104357067B (en) * | 2014-10-14 | 2016-09-07 | 辽宁中弘信冶金技术有限公司 | Maintenance of coke oven method |
| KR102107900B1 (en) * | 2017-06-30 | 2020-05-08 | 아반스트레이트 가부시키가이샤 | Method for manufacturing glass substrate and glass substrate manufacturing apparatus |
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| CN115784572B (en) * | 2022-12-20 | 2024-04-30 | 河北光兴半导体技术有限公司 | Platinum channel and butt joint method thereof |
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|---|---|---|---|---|
| CN102206032A (en) * | 2010-03-30 | 2011-10-05 | 湖北新华光信息材料有限公司 | Detachable optical glass successive melting furnace |
| CN216337242U (en) * | 2021-09-28 | 2022-04-19 | 彩虹显示器件股份有限公司 | Steel structure supporting device for glass substrate production channel |
| CN114853317A (en) * | 2022-04-20 | 2022-08-05 | 湖南旗滨医药材料科技有限公司 | Platinum channel non-heating area thermal state maintenance method |
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