CN116490476A - 玻璃基板 - Google Patents

玻璃基板 Download PDF

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Publication number
CN116490476A
CN116490476A CN202180071873.XA CN202180071873A CN116490476A CN 116490476 A CN116490476 A CN 116490476A CN 202180071873 A CN202180071873 A CN 202180071873A CN 116490476 A CN116490476 A CN 116490476A
Authority
CN
China
Prior art keywords
glass substrate
less
glass
etching
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202180071873.XA
Other languages
English (en)
Chinese (zh)
Inventor
牧田雅贵
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Electric Glass Co Ltd
Original Assignee
Nippon Electric Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Glass Co Ltd filed Critical Nippon Electric Glass Co Ltd
Publication of CN116490476A publication Critical patent/CN116490476A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/11—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen
    • C03C3/112—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine
    • C03C3/115—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine containing boron
    • C03C3/118—Glass compositions containing silica with 40% to 90% silica, by weight containing halogen or nitrogen containing fluorine containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • G—PHYSICS
    • G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/01—Manufacture or treatment
    • H10W70/05—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers
    • H10W70/095—Manufacture or treatment of insulating or insulated package substrates, or of interposers, or of redistribution layers of vias therein
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/62—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their interconnections
    • H10W70/63—Vias, e.g. via plugs
    • H10W70/635—Through-vias
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00—Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60—Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67—Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/69—Insulating materials thereof
    • H10W70/692—Ceramics or glasses

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Glass Compositions (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
CN202180071873.XA 2020-11-16 2021-11-09 玻璃基板 Pending CN116490476A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-190229 2020-11-16
JP2020190229 2020-11-16
PCT/JP2021/041107 WO2022102598A1 (ja) 2020-11-16 2021-11-09 ガラス基板

Publications (1)

Publication Number Publication Date
CN116490476A true CN116490476A (zh) 2023-07-25

Family

ID=81601315

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202180071873.XA Pending CN116490476A (zh) 2020-11-16 2021-11-09 玻璃基板

Country Status (5)

Country Link
US (1) US20230399253A1 (https=)
JP (2) JP7787500B2 (https=)
KR (1) KR20230098828A (https=)
CN (1) CN116490476A (https=)
WO (1) WO2022102598A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN120548300A (zh) * 2022-12-26 2025-08-26 日本电气硝子株式会社 玻璃基板

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007302550A (ja) * 2006-04-11 2007-11-22 Nippon Electric Glass Co Ltd ディスプレイ用ガラス基板
CN105793207A (zh) * 2013-12-04 2016-07-20 旭硝子株式会社 玻璃基板的精研磨方法、以及利用该方法进行了精研磨的无碱玻璃基板
CN107108334A (zh) * 2014-10-31 2017-08-29 康宁股份有限公司 对玻璃进行尺寸稳定的快速蚀刻
CN107207325A (zh) * 2015-02-10 2017-09-26 日本板硝子株式会社 激光加工用玻璃以及使用其的带孔玻璃的制造方法
CN107922254A (zh) * 2015-08-31 2018-04-17 日本板硝子株式会社 带微细结构的玻璃的制造方法
TW201911267A (zh) * 2017-07-31 2019-03-16 日商大日本印刷股份有限公司 顯示面板及顯示裝置
CN109562979A (zh) * 2016-08-05 2019-04-02 Ａｇｃ株式会社 玻璃基板、半导体装置以及显示装置
CN111356664A (zh) * 2017-10-27 2020-06-30 康宁公司 使用保护性材料的贯穿玻璃通孔的制造

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6333282U (https=) 1986-08-20 1988-03-03
JP2000044278A (ja) * 1998-05-20 2000-02-15 Nippon Electric Glass Co Ltd ディスプレイ用ガラス基板
JP2002308643A (ja) * 2001-02-01 2002-10-23 Nippon Electric Glass Co Ltd 無アルカリガラス及びディスプレイ用ガラス基板
CN1764610A (zh) * 2003-03-31 2006-04-26 旭硝子株式会社 无碱玻璃
US8947627B2 (en) * 2011-10-14 2015-02-03 Apple Inc. Electronic devices having displays with openings
JP6333282B2 (ja) * 2012-11-29 2018-05-30 コーニング インコーポレイテッド レーザー損傷及びエッチングによってガラス物品を製造する方法
JP6575223B2 (ja) * 2014-08-27 2019-09-18 Ａｇｃ株式会社 無アルカリガラス
JP6643263B2 (ja) * 2015-02-13 2020-02-12 日本板硝子株式会社 レーザ加工用ガラス及びそれを用いた孔付きガラスの製造方法
JP7292006B2 (ja) * 2015-03-24 2023-06-16 コーニング インコーポレイテッド ディスプレイガラス組成物のレーザ切断及び加工
TWI853308B (zh) * 2016-02-22 2024-08-21 美商康寧公司 無鹼硼鋁矽酸鹽玻璃
US11078112B2 (en) * 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
JP2018205525A (ja) 2017-06-05 2018-12-27 ソニー株式会社 表示装置および電子機器
JP2019066613A (ja) 2017-09-29 2019-04-25 大日本印刷株式会社 表示パネルおよびタイリング表示装置
JP7064706B2 (ja) * 2017-08-28 2022-05-11 日本電気硝子株式会社 レーザーアシストエッチング用ガラス基板、及びそれを用いた有孔ガラス基板の製造方法
US20190119150A1 (en) * 2017-10-20 2019-04-25 Corning Incorporated Methods for laser processing transparent workpieces using pulsed laser beam focal lines and chemical etching solutions
US11554984B2 (en) * 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
WO2020149040A1 (ja) * 2019-01-17 2020-07-23 日本板硝子株式会社 微細構造付ガラス基板及び微細構造付ガラス基板の製造方法
WO2020184175A1 (ja) 2019-03-08 2020-09-17 日本電気硝子株式会社 ガラス板
US11952310B2 (en) * 2019-05-10 2024-04-09 Corning Incorporated Silicate glass compositions useful for the efficient production of through glass vias
US20200354262A1 (en) * 2019-05-10 2020-11-12 Corning Incorporated High silicate glass articles possessing through glass vias and methods of making and using thereof
WO2022026348A1 (en) * 2020-07-30 2022-02-03 Corning Incorporated High boron oxide low alumina and alkali-free glasses for through glass via applications

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007302550A (ja) * 2006-04-11 2007-11-22 Nippon Electric Glass Co Ltd ディスプレイ用ガラス基板
CN105793207A (zh) * 2013-12-04 2016-07-20 旭硝子株式会社 玻璃基板的精研磨方法、以及利用该方法进行了精研磨的无碱玻璃基板
CN107108334A (zh) * 2014-10-31 2017-08-29 康宁股份有限公司 对玻璃进行尺寸稳定的快速蚀刻
CN107207325A (zh) * 2015-02-10 2017-09-26 日本板硝子株式会社 激光加工用玻璃以及使用其的带孔玻璃的制造方法
CN107922254A (zh) * 2015-08-31 2018-04-17 日本板硝子株式会社 带微细结构的玻璃的制造方法
CN109562979A (zh) * 2016-08-05 2019-04-02 Ａｇｃ株式会社 玻璃基板、半导体装置以及显示装置
TW201911267A (zh) * 2017-07-31 2019-03-16 日商大日本印刷股份有限公司 顯示面板及顯示裝置
CN111356664A (zh) * 2017-10-27 2020-06-30 康宁公司 使用保护性材料的贯穿玻璃通孔的制造

Also Published As

Publication number Publication date
JP2026026351A (ja) 2026-02-16
JP7787500B2 (ja) 2025-12-17
WO2022102598A1 (ja) 2022-05-19
US20230399253A1 (en) 2023-12-14
JPWO2022102598A1 (https=) 2022-05-19
TW202229192A (zh) 2022-08-01
KR20230098828A (ko) 2023-07-04

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