CN115287605B - Crucible structure and evaporation source device - Google Patents

Crucible structure and evaporation source device Download PDF

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Publication number
CN115287605B
CN115287605B CN202211119076.7A CN202211119076A CN115287605B CN 115287605 B CN115287605 B CN 115287605B CN 202211119076 A CN202211119076 A CN 202211119076A CN 115287605 B CN115287605 B CN 115287605B
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Prior art keywords
baffle
bottom wall
crucible
hole
holes
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CN115287605A (en
Inventor
杨炳伟
曾琪皓
刘浩
关新兴
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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BOE Technology Group Co Ltd
Chengdu BOE Optoelectronics Technology Co Ltd
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Priority to CN202211119076.7A priority Critical patent/CN115287605B/en
Publication of CN115287605A publication Critical patent/CN115287605A/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/243Crucibles for source material
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The present disclosure provides a crucible structure and an evaporation source device. The crucible structure comprises: the crucible body comprises a bottom wall and side surrounding walls, and the side surrounding walls are connected to the bottom wall; the baffle plate assembly is arranged in the crucible body and connected with the side wall, and the baffle plate assembly and the bottom wall are oppositely arranged so as to divide the space in the crucible body into a plurality of accommodating spaces; the baffle assembly comprises a first baffle and a second baffle which can slide relatively in the thickness direction of the baffle assembly; the first partition plate is provided with a plurality of first through holes which are distributed at intervals, the second partition plate is provided with a plurality of second through holes which are distributed at intervals, and the second through holes are in one-to-one correspondence with the first through holes; when the first partition board moves to a first position relative to the second partition board, the first through hole is communicated with the second through hole; when the first partition plate moves to the second position relative to the second partition plate, the first through holes are staggered from the second through holes. The present disclosure can improve the evaporation effect.

Description

Crucible structure and evaporation source device
Technical Field
The disclosure relates to the field of vapor deposition technology, and in particular relates to a crucible structure and a vapor deposition source device.
Background
With the development of display technology, the use of organic light emitting diode display devices with faster response speed and higher contrast is becoming wider, and the fabrication process thereof is attracting more attention. Among them, vapor deposition is a relatively mature process for manufacturing an organic light emitting diode display device, and has been used for mass production. However, the existing vapor deposition effect is poor.
Disclosure of Invention
The purpose of the present disclosure is to provide a crucible structure and a vapor deposition source device, which can improve vapor deposition effect.
According to one aspect of the present disclosure, there is provided a crucible structure comprising:
the crucible body comprises a bottom wall and side walls, wherein the side walls are connected to the bottom wall;
the baffle plate component is arranged in the crucible body and connected with the side surrounding wall, and the baffle plate component and the bottom wall are oppositely arranged so as to divide the space in the crucible body into a plurality of accommodating spaces; the baffle assembly comprises a first baffle and a second baffle which can slide relatively in the thickness direction of the baffle assembly; the first partition plate is provided with a plurality of first through holes which are distributed at intervals, the second partition plate is provided with a plurality of second through holes which are distributed at intervals, and the second through holes are in one-to-one correspondence with the first through holes; when the first partition board moves to a first position relative to the second partition board, the first through hole is communicated with the second through hole; when the first partition plate moves to a second position relative to the second partition plate, the first through holes are staggered from the second through holes.
Further, the first baffle is located the second baffle is kept away from the side of diapire, the second baffle includes:
the support sheet is arranged opposite to the first partition board;
the plurality of hollow columns are arranged at intervals on one side of the supporting sheet facing the first partition plate, the supporting sheet is provided with an opening communicated with the inner cavity of the hollow column, and the opening and the inner cavity of the hollow column form the second through hole;
the heat insulation layer is arranged on one side of the supporting sheet facing the first partition plate and surrounds the hollow columns.
Further, the height of the hollow column ranges from 1cm to 1.5cm; and/or
The thickness of the first partition board is 2mm-3mm.
Further, a heating structure is arranged in the first partition plate.
Further, the number of the baffle assemblies is plural, and the plurality of baffle assemblies are distributed at intervals along the direction perpendicular to the bottom wall.
Further, for any two of the first partitions, the cross-sectional area of the first through hole in the first partition near the bottom wall is larger than the cross-sectional area of the first through hole in the first partition far from the bottom wall.
Further, the aperture of the first through hole is 5mm-50mm.
Further, the first partition plate is arranged on one side, far away from the bottom wall, of the second partition plate, and the cross-sectional area of the first through hole is gradually reduced along the direction close to the bottom wall.
Further, the crucible structure further comprises:
the push rod comprises a first end and a second end which are opposite, the first end is fixed on the side edge of the first partition board, and the second end penetrates out of the side surrounding wall;
and the driving mechanism is connected with the second end so as to drive the first partition plate to slide.
According to one aspect of the present disclosure, there is provided an evaporation source apparatus including the crucible structure.
The crucible structure and the evaporation source device of this disclosure, in the use, to the internal evaporation material that fills of crucible, because the baffle subassembly will the internal space of crucible is divided into a plurality of accommodation spaces to make the internal evaporation material of crucible separate into a plurality of parts, when heating the evaporation, at first make foretell first through-hole and second through-hole stagger, and carry out the evaporation by heating to a part of evaporation material, when this part evaporation material evaporation is accomplished or is close to the evaporation completion, make first through-hole and second through-hole intercommunication, and carry out the evaporation to the next part of evaporation material, so set up, compare in adopting all evaporation materials of cavity evaporation, the chamber evaporation of evaporation material can be realized to this disclosure, improve the homogeneity that evaporation material is heated, promote the utilization ratio of the material that is located the mid portion, improve the evaporation effect.
Drawings
Fig. 1 is a schematic view of a crucible structure of an embodiment of the present disclosure.
Fig. 2 is a schematic cross-sectional view of a crucible structure of an embodiment of the present disclosure.
FIG. 3 is a schematic view of a baffle assembly of an embodiment of the present disclosure.
Fig. 4 is a schematic view of a first separator of an embodiment of the present disclosure.
Fig. 5 is a schematic view of a second separator according to an embodiment of the present disclosure.
Fig. 6 is a schematic diagram of an embodiment of the present disclosure after the first and second through holes are in communication.
Fig. 7 is a schematic view of the first and second vias in an embodiment of the present disclosure after being staggered.
Fig. 8-10 are schematic plan views of a first separator in an embodiment of the present disclosure.
Fig. 11 is a schematic view of a first via and a second via according to an embodiment of the present disclosure.
Reference numerals illustrate: 1. a crucible body; 101. a bottom wall; 102. a side wall; 103. a top wall; 2. a first separator; 201. a first through hole; 3. a second separator; 301. a support sheet; 302. a thermal insulation layer; 303. a hollow column; 304. a second through hole; 4. a nozzle; 5. a push rod; 6. a driving mechanism; 7. an accommodating space; 8. a baffle; 100. a baffle assembly.
Detailed Description
Reference will now be made in detail to exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, the same numbers in different drawings refer to the same or similar elements, unless otherwise indicated. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present disclosure. Rather, they are merely examples of apparatus consistent with some aspects of the disclosure as detailed in the accompanying claims.
The terminology used in the present disclosure is for the purpose of describing particular embodiments only and is not intended to be limiting of the present disclosure. Unless defined otherwise, technical or scientific terms used in this disclosure should be given the ordinary meaning as understood by one of ordinary skill in the art to which this disclosure belongs. The terms "first," "second," and the like in the description and in the claims, are not used for any order, quantity, or importance, but are used for distinguishing between different elements. Likewise, the terms "a" or "an" and the like do not denote a limitation of quantity, but rather denote the presence of at least one. "plurality" or "plurality" means two or more. Unless otherwise indicated, the terms "front," "rear," "lower," and/or "upper" and the like are merely for convenience of description and are not limited to one location or one spatial orientation. The word "comprising" or "comprises", and the like, means that elements or items appearing before "comprising" or "comprising" are encompassed by the element or item recited after "comprising" or "comprising" and equivalents thereof, and that other elements or items are not excluded. The terms "connected" or "connected," and the like, are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. As used in this disclosure and the appended claims, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It should also be understood that the term "and/or" as used herein refers to and encompasses any or all possible combinations of one or more of the associated listed items.
In the related art, when the crucible is adopted for heating evaporation, the evaporation material at the inner and outer parts of the crucible chamber is closer to the heating device, the evaporation material at the middle part of the crucible chamber is farther away from the heating device, so that the evaporation material at the middle part of the crucible chamber cannot be sufficiently heated, and further the evaporation material at the middle part cannot be gasified, thereby causing waste and reducing the utilization rate of the evaporation material.
Embodiments of the present disclosure provide a crucible structure. As shown in fig. 1 and 2, the crucible structure may include a crucible body 1 and a baffle assembly 100, wherein:
the body 1 comprises a bottom wall 101 and side walls 102, said side walls 102 being connected to said bottom wall 101. The baffle plate assembly 100 is provided in the crucible body 1 and is connected to the side wall 102. The baffle plate assembly 100 is disposed opposite to the bottom wall 101 to divide the space inside the body 1 into a plurality of receiving spaces 7. As shown in fig. 6 and 7, in the thickness direction of the separator assembly 100, the separator assembly 100 includes a first separator 2 and a second separator 3 that are relatively slidable. The first partition board 2 is provided with a plurality of first through holes 201 which are distributed at intervals, the second partition board 3 is provided with a plurality of second through holes 304 which are distributed at intervals, and the second through holes 304 are in one-to-one correspondence with the first through holes 201. As shown in fig. 6, when the first separator 2 moves to the first position with respect to the second separator 3, the first through hole 201 communicates with the second through hole 304; as shown in fig. 7, when the first separator 2 moves to the second position with respect to the second separator 3, the first through hole 201 is offset from the second through hole 304.
In the crucible structure of the embodiment of the disclosure, during the use process, the vapor deposition material is filled into the crucible body 1, and the space in the crucible body 1 is divided into the plurality of accommodating spaces 7 by the baffle plate assembly 100, so that the vapor deposition material in the crucible body 1 is divided into a plurality of parts, during the heating vapor deposition, the first through hole 201 and the second through hole 304 are staggered, one part of the vapor deposition material is heated and deposited, when the vapor deposition of the vapor deposition material in the part is completed or is close to the completion of the vapor deposition, the first through hole 201 and the second through hole 304 are communicated, and the next part of the vapor deposition material is evaporated, and compared with the vapor deposition material evaporated by adopting one chamber, the vapor deposition material vapor deposition device can realize the vapor deposition of the vapor deposition material in different chambers, improve the heated uniformity of the vapor deposition material, improve the utilization rate of the material positioned in the middle part and improve the vapor deposition effect; meanwhile, the material island effect caused by uneven heating can be balanced.
The following describes in detail the parts of the crucible structure according to the embodiments of the present disclosure:
as shown in fig. 2, the body 1 includes a bottom wall 101 and side walls 102. The side wall 102 is a cylindrical side wall, both ends of the side wall 102 are open ends, and one open end can be connected with the bottom wall 101 to form a receiving chamber of the crucible body 1 for receiving the evaporation material. The side enclosure 102 may be made of a high temperature resistant material to extend the operational life of the side enclosure 102 in a high temperature vapor deposition environment. The high temperature resistant material may be graphite or boron nitride, but is not limited thereto, and may be other materials such as platinum. The cross section of the side wall 102 may be rectangular, but of course, the cross section may also be circular, trapezoidal, etc., which are not shown here.
The bottom wall 101 may also be made of a high temperature resistant material. The bottom wall 101 may be the same material as the side wall 102 or may be different. For example, the bottom wall 101 is made of boron nitride. The shape of the bottom wall 101 may conform to the shape of the cross-section of the side wall 102 and may be of a size equal to or greater than the size of the cross-section of the side wall 102 such that the orthographic projection of the cross-section of the side wall 102 onto the bottom wall 101 does not protrude beyond the edges of the bottom wall 101.
The receiving chamber defined by the bottom wall 101 and the side wall 102 is adapted to receive a liquid. Wherein, the inner wall of holding chamber can be equipped with the non-stick coating, makes things convenient for operating personnel to clean the inner wall of holding chamber after the coating by vaporization is accomplished, avoids different coating by vaporization materials to pollute each other, influences the quality of coating by vaporization. The non-stick coating may be a polytetrafluoroethylene coating, but is not limited thereto, and may also be a ceramic coating, etc.
The open end of the side wall 102 can be sealingly connected to the bottom wall 101 to avoid liquid leakage from the receiving chamber. For example, a high temperature resistant sealant is applied between the open end of the side wall 102 and the connection surface of the bottom wall 101. Of course, the open end of the side wall 102 and the bottom wall 101 may be sealed by welding or other means. In other embodiments of the present disclosure, the side wall 102 may be integrally formed with the bottom wall 101, and the manner of integrally forming the side wall is not particularly limited. Further, as shown in fig. 1 and 2, the body 1 may further include a top wall 103 and a spout 4 provided to the top wall 103. The top wall 103 is connected to the other open end of the side wall 102. The nozzle 4 is communicated with the space in the crucible body 1, and the vaporized vapor deposition material can enter the external environment through the nozzle 4.
As shown in fig. 1 and 2, the baffle plate assembly 100 is provided in the crucible body 1 and is connected to the side wall 102. The baffle plate assembly 100 is disposed opposite to the bottom wall 101 to divide the space in the crucible body 1 into a plurality of accommodating spaces 7, i.e., the accommodating chamber is divided into a plurality of accommodating spaces 7 by the baffle plate assembly 100, so that the vapor deposition material in the crucible body 1 is divided into a plurality of layers, and the vapor deposition materials in different layers are separated by the baffle plate assembly 100. For two adjacent layers of vapor deposition materials, the present disclosure refers to the vapor deposition material near the nozzle 4 as an upper layer vapor deposition material, and the vapor deposition material near the bottom wall 101 as a lower layer vapor deposition material. The number of the partition plate assemblies 100 is plural, and the plurality of partition plate assemblies 100 are spaced apart in a direction perpendicular to the bottom wall 101.
In the thickness direction of the separator assembly 100, the separator assembly 100 includes a first separator 2 and a second separator 3. The first separator 2 is disposed opposite to the bottom wall 101 of the body 1. The first separator 2 can be hermetically connected to the side wall 102 of the body 1. The thickness of the first separator 2 may be 2mm to 3mm. As shown in fig. 3 and 4, the first separator 2 may be provided with a plurality of first through holes 201 spaced apart from each other. The shape of the first through hole 201 may be rectangular, but of course, may be triangular (see fig. 8 and 9), but is not limited thereto, and may be circular, square (see fig. 10), or the like. As shown in fig. 11, the cross-sectional area of any of the first through holes 201 may be gradually smaller in the direction approaching the bottom wall 101, so that the remaining upper layer vapor deposition material may flow to the lower layer when the first through holes 201 and the second through holes 304 communicate. Wherein the cross-sectional area of the first through-hole 201 refers to the area of the cross-section of the first through-hole 201 in the direction parallel to the bottom wall 101. The aperture of the first through hole 201 can be 5mm-50mm, so that the high vapor pressure is not generated inside while the difficult hole plugging is ensured, and the large fluctuation of the vapor deposition rate is avoided. Taking the above-mentioned number of the separator assemblies 100 as a plurality as an example, for any two first separators 2, the cross-sectional area of the first through holes 201 in the first separator 2 near the bottom wall 101 is larger than the cross-sectional area of the first through holes 201 in the first separator 2 far from the bottom wall 101, so that the vapor pressure of the vapor deposition material can be balanced. In addition, a heating structure may be further disposed in the first partition board 2. The heating structure may be an electric heating wire or the like.
As shown in fig. 2, 3 and 5, the second separator 3 is disposed opposite to the bottom wall 101 of the body 1. The second separator 3 can be hermetically connected to the side wall 102 of the body 1. The second separator 3 can be disposed on one side of the first separator 2 facing the bottom wall 101 of the crucible body 1, i.e., the first separator 2 is disposed between the second separator 3 and the nozzle 4, so that the first separator 2 having a heating structure can heat the bottom of the upper layer of evaporation material during the evaporation process, so that the heating is more uniform. The second separator 3 may be provided with a plurality of second through holes 304 spaced apart from each other. The plurality of second through holes 304 are in one-to-one correspondence with the plurality of first through holes 201. The shape of the first through hole 201 may be rectangular, of course, triangular, but not limited thereto, and may be circular, square, or the like. The shape of the second through hole 304 may be the same as the shape of the first through hole 201, but may be different. The second through-hole 304 may have a uniform cross-sectional area, but the present disclosure is not limited thereto. The aperture of the second through hole 304 may be the same as the aperture of the first through hole 201, and of course, the aperture of the second through hole 304 may be larger or smaller than the aperture of the first through hole 201. Taking the above-mentioned number of baffle assemblies 100 as a plurality as an example, for any two second baffles 3, the cross-sectional area of the second through hole 304 in the second baffle 3 near the bottom wall 101 is larger than the cross-sectional area of the second through hole 304 in the second baffle 3 far from the bottom wall 101.
Further, as shown in fig. 3 and 5, the second separator 3 may include a support sheet 301, a hollow column 303, and a heat insulating layer 302. The support piece 301 is disposed opposite to the first separator 2. The thickness of the support sheet 301 may be 2mm, 3mm, 4mm, etc., but the present disclosure is not limited thereto. The hollow column 303 may be a cylindrical structure, i.e., the hollow column 303 has an inner cavity with both ends open. The number of the hollow columns 303 is plural, and the plural hollow columns 303 are disposed at intervals on the side of the support sheet 301 facing the first separator 2. The height of the hollow column 303 may range from 1cm to 1.5cm, such as 1cm, 1.3cm, 1.5cm, etc. The support sheet 301 may be provided with an opening communicating with the inner cavity of the hollow column 303, the opening and the inner cavity of the hollow column 303 constituting the second through hole 304. The inner diameter of the opening may be the same as the inner diameter of the hollow column 303. The heat insulating layer 302 may be disposed on a side of the support plate 301 facing the first separator 2 and surrounds the plurality of hollow columns 303, so that the influence of the heating structure in the first separator 2 on the temperature of the underlying vapor deposition material may be reduced. In addition, the surface of the insulating layer 302 remote from the support sheet 301 may be flush with the end surface of the hollow post 303 remote from the support sheet 301. Furthermore, as shown in fig. 1, a baffle 8 may be provided in the crucible body 1 of the present disclosure. The baffle plate 8 may be disposed perpendicularly to the bottom wall 101 of the body 1. The number of baffles 8 may be plural and may be spaced apart in a direction parallel to the bottom wall 101.
As shown in fig. 6 and 7, the first separator 2 and the second separator 3 can slide relatively. For example, the first partition 2 is slidably disposed on the second partition 3, and the first partition 2 is slidable to a first position and a second position. The slidable first baffle 2 does not protrude from the side wall 102 of the body 1. Further, as shown in fig. 2, the crucible structure may further include a push rod 5 and a driving mechanism 6. The push rod 5 may comprise opposite first and second ends, the first end of the push rod 5 being fixed to the side edge of the first separator 2, and the second end of the push rod 5 being passed out of the side wall 102 of the body 1. Taking the number of the partition plate assemblies 100 as a plurality of example, the number of the push rods 5 may be a plurality of, and the plurality of push rods 5 are connected to the plurality of first partition plates 2 in a one-to-one correspondence. The driving mechanism 6 is connected to the second end of the push rod 5 to drive the first partition board 2 to slide back and forth between the first position and the second position. The first through hole 201 communicates with the second through hole 304 when the first separator 2 moves to a first position with respect to the second separator 3; the first through hole 201 is offset from the second through hole 304 when the first separator 2 moves to the second position relative to the second separator 3.
Working principle:
taking the crucible structure including four baffle assemblies 100 as an example, the receiving cavity in the crucible body 1 is divided into five receiving spaces 7 by the four baffle assemblies 100. In the direction from the spout 4 to the bottom wall 101 of the body 1, the present disclosure designates five holding spaces 7 as a first holding space, a second holding space, a third holding space, a fourth holding space, and a fifth holding space. When the vapor deposition material in the nth accommodating space is subjected to temperature rising vapor deposition, the first through hole 201 and the second through hole 304 of the baffle plate assembly 100 between the nth accommodating space and the (n+1) th accommodating space are staggered; when the vapor deposition material in the (n+1) th accommodation space is subjected to the temperature-increasing vapor deposition, the first through hole 201 and the second through hole 304 of the partition board assembly 100 between the n-th accommodation space and the (n+1) th accommodation space are communicated, and n is 1, 2, 3, or 4. Before the vapor deposition, a vapor deposition material is contained in each of the containing spaces 7. The evaporation process comprises a first stage, a second stage, a third stage, a fourth stage and a fifth stage, and the states of the stages are shown in the table below. The "temperature-increasing vapor deposition" means that the vapor deposition material in the accommodating space 7 is subjected to temperature-increasing vapor deposition. The "high temperature 0rate" indicates that the vapor deposition material in the accommodating space 7 is in a critical state of vapor deposition, and the vapor deposition material is heated in this state, so that the vapor deposition material can be vaporized. "not heated" means that the vapor deposition material is not heated. The periphery of each accommodating space 7 is provided with a corresponding heating system. When the vapor deposition material in each accommodating space 7 is heated, the corresponding heating system and the heating structure arranged in the first partition plate 2 can be simultaneously started.
The embodiment of the disclosure also provides an evaporation source device. The vapor deposition source device may include the vapor deposition crucible according to any one of the embodiments described above. Since the vapor deposition crucible in the vapor deposition source device according to the embodiment of the present disclosure is the same as the vapor deposition crucible in the embodiment of the vapor deposition crucible described above, it has the same advantageous effects and will not be described in detail here.
The foregoing disclosure is not intended to be limited to the preferred embodiments of the present disclosure, but rather is to be construed as limited to the embodiments disclosed, and modifications and equivalent arrangements may be made in accordance with the principles of the present disclosure without departing from the scope of the disclosure.

Claims (10)

1. A crucible structure, comprising:
the crucible body comprises a bottom wall and side walls, wherein the side walls are connected to the bottom wall;
the baffle plate component is arranged in the crucible body and connected with the side surrounding wall, and the baffle plate component and the bottom wall are oppositely arranged so as to divide the space in the crucible body into a plurality of accommodating spaces; the baffle assembly comprises a first baffle and a second baffle which can slide relatively in the thickness direction of the baffle assembly; the first partition plate is provided with a plurality of first through holes which are distributed at intervals, the second partition plate is provided with a plurality of second through holes which are distributed at intervals, and the second through holes are in one-to-one correspondence with the first through holes; when the first partition board moves to a first position relative to the second partition board, the first through hole is communicated with the second through hole; when the first partition plate moves to a second position relative to the second partition plate, the first through holes are staggered from the second through holes.
2. The crucible structure of claim 1, wherein the first baffle is disposed on a side of the second baffle remote from the bottom wall, the second baffle comprising:
the support sheet is arranged opposite to the first partition board;
the plurality of hollow columns are arranged at intervals on one side of the supporting sheet facing the first partition plate, the supporting sheet is provided with an opening communicated with the inner cavity of the hollow column, and the opening and the inner cavity of the hollow column form the second through hole;
the heat insulation layer is arranged on one side of the supporting sheet facing the first partition plate and surrounds the hollow columns.
3. The crucible structure of claim 2, wherein the hollow column has a height in the range of 1cm to 1.5cm; and/or
The thickness of the first partition board is 2mm-3mm.
4. The crucible structure of claim 1 or 2, wherein a heating structure is provided in the first partition.
5. The crucible structure of claim 1, wherein the number of baffle assemblies is plural, and wherein the plurality of baffle assemblies are spaced apart along a direction perpendicular to the bottom wall.
6. The crucible structure of claim 5, wherein for any two of said first baffles, the cross-sectional area of the first through hole in said first baffle proximate to said bottom wall is greater than the cross-sectional area of the first through hole in said first baffle distal from said bottom wall.
7. The crucible structure of claim 1 or 6, wherein the first through hole has a pore size of 5mm to 50mm.
8. The crucible structure according to claim 1, wherein the first partition plate is provided on a side of the second partition plate remote from the bottom wall, and the cross-sectional area of the first through hole is gradually reduced in a direction approaching the bottom wall.
9. The crucible structure of claim 1, wherein the crucible structure further comprises:
the push rod comprises a first end and a second end which are opposite, the first end is fixed on the side edge of the first partition board, and the second end penetrates out of the side surrounding wall;
and the driving mechanism is connected with the second end so as to drive the first partition plate to slide.
10. An evaporation source device comprising the crucible structure according to any one of claims 1 to 9.
CN202211119076.7A 2022-09-13 2022-09-13 Crucible structure and evaporation source device Active CN115287605B (en)

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101041891A (en) * 2006-03-22 2007-09-26 佳能株式会社 Vapor deposition source and vapor deposition apparatus
JP2011122199A (en) * 2009-12-10 2011-06-23 Seiko Epson Corp Apparatus for vapor deposition
JP2015010257A (en) * 2013-06-28 2015-01-19 株式会社日立ハイテクファインシステムズ Evaporation source for vacuum deposition apparatus, and vacuum vapor deposition apparatus and vacuum deposition method using the evaporation source
CN107002232A (en) * 2014-11-26 2017-08-01 应用材料公司 Crucible component for evaporating purpose
CN206680569U (en) * 2017-05-04 2017-11-28 长春理工大学光电信息学院 A kind of Full-color OLED micro-display device evaporation coating device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101041891A (en) * 2006-03-22 2007-09-26 佳能株式会社 Vapor deposition source and vapor deposition apparatus
JP2011122199A (en) * 2009-12-10 2011-06-23 Seiko Epson Corp Apparatus for vapor deposition
JP2015010257A (en) * 2013-06-28 2015-01-19 株式会社日立ハイテクファインシステムズ Evaporation source for vacuum deposition apparatus, and vacuum vapor deposition apparatus and vacuum deposition method using the evaporation source
CN107002232A (en) * 2014-11-26 2017-08-01 应用材料公司 Crucible component for evaporating purpose
CN206680569U (en) * 2017-05-04 2017-11-28 长春理工大学光电信息学院 A kind of Full-color OLED micro-display device evaporation coating device

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