CN114770306A - Semi-automatic polishing device and method - Google Patents
Semi-automatic polishing device and method Download PDFInfo
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- CN114770306A CN114770306A CN202210606593.0A CN202210606593A CN114770306A CN 114770306 A CN114770306 A CN 114770306A CN 202210606593 A CN202210606593 A CN 202210606593A CN 114770306 A CN114770306 A CN 114770306A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B19/00—Single-purpose machines or devices for particular grinding operations not covered by any other main group
- B24B19/22—Single-purpose machines or devices for particular grinding operations not covered by any other main group characterised by a special design with respect to properties of the material of non-metallic articles to be ground
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/04—Headstocks; Working-spindles; Features relating thereto
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/10—Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces
- B24B47/12—Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces by mechanical gearing or electric power
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/22—Equipment for exact control of the position of the grinding tool or work at the start of the grinding operation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/02—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant
- B24B55/03—Equipment for cooling the grinding surfaces, e.g. devices for feeding coolant designed as a complete equipment for feeding or clarifying coolant
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Abstract
本发明公开了一种半自动打磨装置及方法,其中半自动打磨装置包括半自动打磨装置本体、打磨机构和驱动机构,打磨机构置于半自动打磨装置本体内,且打磨机构能够对待打磨料块进行打磨,驱动机构与打磨机构相连,且驱动机构能够驱动打磨机构旋转,使得打磨机构与待打磨料块摩擦,以实现对待打磨料块的打磨。当对待打磨料块进行打磨时,需开启驱动机构,驱动机构旋转,带动打磨机构旋转,在打磨机构旋转的过程中和待打磨料块不断的进行摩擦,以实现对待打磨料块的打磨,从而使得待打磨料块成为预设形状结构。和现有技术相比,上述半自动打磨装置不仅可以提高打磨效率,而且能够提升料块表面粗糙度的均匀性,从而进一步提高了打磨质量。
The invention discloses a semi-automatic grinding device and method, wherein the semi-automatic grinding device comprises a semi-automatic grinding device body, a grinding mechanism and a driving mechanism, the grinding mechanism is placed in the semi-automatic grinding device body, and the grinding mechanism can grind the material to be ground and drive The mechanism is connected with the grinding mechanism, and the driving mechanism can drive the grinding mechanism to rotate, so that the grinding mechanism rubs against the material block to be ground, so as to realize the grinding of the material block to be ground. When grinding the material block to be ground, the drive mechanism needs to be turned on, the driving mechanism rotates, and the grinding mechanism is driven to rotate. During the rotation of the grinding mechanism, the friction with the material block to be ground is continuously carried out to realize the grinding of the material block to be ground, thereby Make the material block to be polished into a preset shape structure. Compared with the prior art, the above-mentioned semi-automatic grinding device can not only improve the grinding efficiency, but also improve the uniformity of the surface roughness of the material block, thereby further improving the grinding quality.
Description
技术领域technical field
本发明涉及半导体打磨技术领域,特别涉及一种半自动打磨装置及方法。The invention relates to the technical field of semiconductor polishing, in particular to a semi-automatic polishing device and method.
背景技术Background technique
当前,半导体锥形料块的打磨通常是采用60目-400目的砂纸进行手工打磨,通过工作人员手工将锥形料块表面的附着物打磨掉,并将锥形料块上下端面拐角处的菱角打磨圆滑,但是这种手工打磨的方法效率极低,而且打磨后的料块表面粗糙度也不均匀,可能对半导体单晶材料生长过程的熔料造成影响,进而影响成晶率。At present, the grinding of semiconductor cone blocks is usually done by hand with 60-400-mesh sandpaper. The attachments on the surface of the cone blocks are manually polished by the staff, and the water chestnuts at the corners of the upper and lower end faces of the cone blocks are removed by hand. The grinding is smooth, but the efficiency of this manual grinding method is extremely low, and the surface roughness of the polished block is not uniform, which may affect the molten material in the growth process of the semiconductor single crystal material, thereby affecting the crystallization rate.
因此,如何提供一种半自动打磨装置,不仅能够提高打磨效率,还能够提高打磨质量是本领域技术人员亟需解决的技术问题。Therefore, how to provide a semi-automatic grinding device that can not only improve the grinding efficiency, but also improve the grinding quality is a technical problem that those skilled in the art need to solve urgently.
发明内容SUMMARY OF THE INVENTION
有鉴于此,本发明的目的在于提供一种半自动打磨装置,不仅能够提高打磨效率,还能够提高打磨质量。In view of this, the purpose of the present invention is to provide a semi-automatic grinding device, which can not only improve the grinding efficiency, but also improve the grinding quality.
本发明的另一目的还在于提供一种半自动打磨方法。Another object of the present invention is to provide a semi-automatic grinding method.
为实现上述目的,本发明提供如下技术方案:To achieve the above object, the present invention provides the following technical solutions:
一种半自动打磨装置,包括半自动打磨装置本体、打磨机构和驱动机构,所述打磨机构置于所述半自动打磨装置本体内,且所述打磨机构能够对待打磨料块进行打磨,所述驱动机构与所述打磨机构相连,且所述驱动机构能够驱动所述打磨机构旋转,使得所述打磨机构与所述待打磨料块摩擦,以实现对待打磨料块的打磨。A semi-automatic grinding device, comprising a semi-automatic grinding device body, a grinding mechanism and a driving mechanism, wherein the grinding mechanism is placed in the semi-automatic grinding device body, and the grinding mechanism can grind a to-be-grinding material block, and the driving mechanism and the The grinding mechanism is connected, and the driving mechanism can drive the grinding mechanism to rotate, so that the grinding mechanism rubs against the material block to be ground, so as to realize the grinding of the material block to be ground.
优选的,所述打磨机构包括砂轮,和与所述砂轮相连的转杆,所述待打磨料块置于所述砂轮的内腔,且与所述砂轮的内壁相接触。Preferably, the grinding mechanism includes a grinding wheel and a rotating rod connected to the grinding wheel, and the material block to be ground is placed in the inner cavity of the grinding wheel and is in contact with the inner wall of the grinding wheel.
优选的,所述砂轮的内腔为锥形状腔体,所述待打磨料块为与所述砂轮的内腔仿形的锥形状结构。Preferably, the inner cavity of the grinding wheel is a cone-shaped cavity, and the material block to be ground is a cone-shaped structure that mirrors the inner cavity of the grinding wheel.
优选的,所述驱动机构包括驱动电机、第一皮带轮、第二皮带轮和皮带,所述第一皮带轮与所述驱动电机的电机轴相连,所述第二皮带轮与所述转杆相连,所述第一皮带轮和所述第二皮带轮通过所述皮带相连。Preferably, the drive mechanism includes a drive motor, a first pulley, a second pulley and a belt, the first pulley is connected to a motor shaft of the drive motor, the second pulley is connected to the rotating rod, the The first pulley and the second pulley are connected by the belt.
优选的,所述第一皮带轮和所述砂轮之间还设置有第一轴承和第二轴承,所述第一轴承和所述第二轴承均设置于所述转杆上。Preferably, a first bearing and a second bearing are further arranged between the first pulley and the grinding wheel, and both the first bearing and the second bearing are arranged on the rotating rod.
优选的,还包括设置于所述半自动打磨装置本体上的盖体,所述半自动打磨装置本体上设置有盖体导轨,所述盖体与所述盖体导轨相配合。Preferably, it also includes a cover body disposed on the semi-automatic polishing device body, a cover body guide rail is provided on the semi-automatic polishing device body, and the cover body is matched with the cover body guide rail.
优选的,还包括螺杆,和与所述螺杆相连的固定块,所述固定块置于所述砂轮和所述盖体之间,所述螺杆能够带动所述固定块沿竖直方向运动。Preferably, it also includes a screw rod and a fixing block connected with the screw rod, the fixing block is placed between the grinding wheel and the cover body, and the screw rod can drive the fixing block to move in the vertical direction.
优选的,所述半自动打磨装置本体的内腔还设置有第一隔板和第二隔板,所述第一隔板和所述第二隔板将所述半自动打磨装置本体分隔为第一腔室、第二腔室和第三腔室;Preferably, the inner cavity of the semi-automatic polishing device body is further provided with a first partition plate and a second partition plate, and the first partition plate and the second partition plate divide the semi-automatic polishing device body into a first cavity chamber, a second chamber and a third chamber;
所述驱动电机和所述第一皮带轮均设置于所述第一腔室内,所述第二皮带轮、所述第一轴承和所述第二轴承均设置于所述第二腔室内,所述砂轮设置于所述第三腔室内;The drive motor and the first pulley are all disposed in the first chamber, the second pulley, the first bearing and the second bearing are all disposed in the second chamber, and the grinding wheel arranged in the third chamber;
所述第一隔板上设置有用于所述皮带穿过的第一通孔,所述第二隔板上设置有用于所述转杆穿过的第二通孔。The first partition is provided with a first through hole for the belt to pass through, and the second partition is provided with a second through hole for the rotation rod to pass through.
优选的,所述半自动打磨装置本体上还开设有用于冷却液进入的进液口,和用于所述冷却液排出的排液口,所述进液口和所述排液口均设置于所述第二腔室的侧壁上。Preferably, the body of the semi-automatic polishing device is also provided with a liquid inlet for the entry of cooling liquid and a liquid discharge port for the discharge of the cooling liquid, and the liquid inlet and the liquid discharge port are both arranged in the on the side wall of the second chamber.
一种半自动打磨方法,应用于如上述任意一项所述的半自动打磨装置,包括以下步骤:A semi-automatic grinding method, applied to the semi-automatic grinding device as described in any of the above, comprises the following steps:
S 100:将待打磨料块安装于半自动打磨装置的砂轮内,使得所述待打磨料块和所述砂轮的内腔的内壁相贴合;S100: Install the material block to be ground in the grinding wheel of the semi-automatic grinding device, so that the material block to be ground and the inner wall of the inner cavity of the grinding wheel are abutted;
S200:开启驱动机构,控制所述驱动机构的转速为100r/min~200r/min,控制所述驱动机构的转动时间为10min-40min,同时开启冷却水源,使得所述冷却水通入半自动打磨装置本体的第二腔室内对所述砂轮进行冷却;S200: Turn on the drive mechanism, control the rotational speed of the drive mechanism to be 100r/min-200r/min, control the rotation time of the drive mechanism to be 10min-40min, and open the cooling water source at the same time, so that the cooling water flows into the semi-automatic grinding device cooling the grinding wheel in the second chamber of the body;
S300:当所述待打磨料块打磨完成后,关闭所述驱动机构和所述冷却水源,当所述砂轮停止旋转后,取下所述待打磨料块。S300: After the grinding of the material block to be ground is completed, the driving mechanism and the cooling water source are turned off, and when the grinding wheel stops rotating, the material block to be ground is removed.
由以上技术方案可以看出,当对待打磨料块进行打磨时,需开启驱动机构,驱动机构旋转,带动打磨机构旋转,在打磨机构旋转的过程中和待打磨料块不断的进行摩擦,以实现对待打磨料块的打磨,从而使得待打磨料块成为预设形状结构。和现有技术相比,通过半自动打磨装置对待打磨料块进行打磨,不仅可以提高打磨效率,而且能够提升料块表面粗糙度的均匀性,从而进一步提高了打磨质量。It can be seen from the above technical solutions that when grinding the material block to be ground, the drive mechanism needs to be turned on, the driving mechanism rotates, and the grinding mechanism is driven to rotate. Grinding the to-be-ground material block, so that the to-be-ground material block becomes a preset shape structure. Compared with the prior art, grinding the material block to be ground by the semi-automatic grinding device can not only improve the grinding efficiency, but also improve the uniformity of the surface roughness of the material block, thereby further improving the grinding quality.
附图说明Description of drawings
为了更清楚地说明本发明实施例或现有技术中的技术方案,下面对实施例或现有技术描述中所需要使用的附图作简单地介绍,显而易见的,下面描述中的附图仅仅是本发明的实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据提供的附图获得其他的附图。In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the accompanying drawings that need to be used in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only It is an embodiment of the present invention. For those of ordinary skill in the art, other drawings can also be obtained according to the provided drawings without creative work.
图1为本发明实施例所公开的半自动打磨装置的结构示意图;1 is a schematic structural diagram of a semi-automatic grinding device disclosed in an embodiment of the present invention;
图2为本发明实施例所公开的半自动打磨方法的流程示意图。FIG. 2 is a schematic flowchart of a semi-automatic grinding method disclosed in an embodiment of the present invention.
其中,各部件名称如下:Among them, the names of the parts are as follows:
100为半自动打磨装置本体,101为第一隔板,1011为第一通孔,1012为第二通孔,102为第二隔板,103为第一腔室,104为第二腔室,1041为排液口,105为第三腔室,200为打磨机构,201为砂轮,202为转杆,300为盖体,400为驱动机构,401为驱动电机,402为第一皮带轮,403为第二皮带轮,404为皮带,500为第一轴承,600为第二轴承,700为螺杆,701为把手,800为固定块,900为待打磨料块。100 is the semi-automatic grinding device body, 101 is the first partition, 1011 is the first through hole, 1012 is the second through hole, 102 is the second partition, 103 is the first chamber, 104 is the second chamber, 1041 is the drain port, 105 is the third chamber, 200 is the grinding mechanism, 201 is the grinding wheel, 202 is the rotating rod, 300 is the cover, 400 is the driving mechanism, 401 is the driving motor, 402 is the first pulley, and 403 is the first pulley. Two pulleys, 404 is a belt, 500 is a first bearing, 600 is a second bearing, 700 is a screw, 701 is a handle, 800 is a fixed block, and 900 is a material block to be polished.
具体实施方式Detailed ways
有鉴于此,本发明的核心在于提供一种半自动打磨装置,不仅能够提高打磨效率,还能够提高打磨质量。In view of this, the core of the present invention is to provide a semi-automatic grinding device, which can not only improve the grinding efficiency, but also improve the grinding quality.
本发明的另一核心还在于提供一种半自动打磨方法。Another core of the present invention is to provide a semi-automatic grinding method.
为了使本技术领域的人员更好地理解本发明方案,下面接合附图和具体实施方式对本发明作进一步的详细说明。In order to make those skilled in the art better understand the solution of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.
请参考图1,本发明实施例所公开的半自动打磨装置,包括半自动打磨装置本体100、打磨机构200和驱动机构400,其中,打磨机构200置于半自动打磨装置本体100内,且打磨机构200能够对待打磨料块900进行打磨,驱动机构400与打磨机构200相连,且驱动机构400能够驱动打磨机构200旋转,使得打磨机构200与待打磨料块900摩擦,以实现对待打磨料块900的打磨。Referring to FIG. 1 , the semi-automatic grinding device disclosed in the embodiment of the present invention includes a semi-automatic
当对待打磨料块900进行打磨时,需开启驱动机构400,驱动机构400旋转,带动打磨机构200旋转,在打磨机构200旋转的过程中和待打磨料块900不断的进行摩擦,以实现对待打磨料块900的打磨,从而使得待打磨料块900成为预设形状结构。和现有技术相比,通过半自动打磨装置对待打磨料块900进行打磨,不仅可以提高打磨效率,而且能够提升料块表面粗糙度的均匀性,从而进一步提高了打磨质量。When grinding the
本发明实施例对打磨机构200的具体结构不进行限定,只要满足本发明使用要求的结构均在本发明的保护范围之内。The embodiment of the present invention does not limit the specific structure of the
作为优选实施例,本发明实施例所公开的半自动打磨装置中,打磨机构200包括用于放置待打磨料块900的砂轮201,和与砂轮201相连的转杆202,其中,待打磨料块900置于砂轮201的内腔,且与砂轮201的内壁相接触。在砂轮201转动的过程中可对待打磨料块900进行打磨。As a preferred embodiment, in the semi-automatic grinding device disclosed in the embodiment of the present invention, the
本发明实施例对砂轮的内腔的具体结构形状不进行限定,砂轮的内腔可以为矩形状结构,可以为锥形状结构,当然也可以为其它结构,只要满足本发明使用要求的结构均在本发明的保护范围之内。The embodiment of the present invention does not limit the specific structure and shape of the inner cavity of the grinding wheel. The inner cavity of the grinding wheel can be a rectangular structure, a cone-shaped structure, and of course other structures, as long as the structures that meet the use requirements of the present invention are all in within the protection scope of the present invention.
其中,砂轮的内腔的不同形状结构需对与其形状适配的待打磨料块900进行打磨。Wherein, the different shapes and structures of the inner cavity of the grinding wheel need to be ground for the
作为优选,本发明实施例所公开的砂轮201的内腔为锥形状腔体,待打磨料块900为与砂轮201的内腔仿形的锥形状结构。Preferably, the inner cavity of the
本发明实施例对驱动机构400的具体结构不进行限定,只要满足本发明使用要求的结构均在本发明的保护范围之内。The embodiment of the present invention does not limit the specific structure of the
作为优选实施例,本发明实施例所公开的驱动机构400包括驱动电机401、第一皮带轮402、第二皮带轮403和皮带404,第一皮带轮402与驱动电机401的电机轴相连,第二皮带轮403与转杆202相连,第一皮带轮402和第二皮带轮403通过皮带404相连。As a preferred embodiment, the
启动驱动电机401,驱动电机401的电机轴转动,带动第一皮带轮402转动,第一皮带轮402通过皮带404带动第二皮带轮403转动,第二皮带轮403带动转杆202转动,转杆202带动砂轮201转动,在砂轮201转动的过程中,与待打磨料块900摩擦,从而实现对待打磨料块900的打磨。Start the
为了保证转杆202能够顺利的转动,本发明实施例所公开的半自动打磨装置,在第一皮带轮402和砂轮201之间还设置有第一轴承500和第二轴承600,其中,第一轴承500和第二轴承600均设置于转杆202上。In order to ensure that the rotating
作为优选实施例,本发明实施例所公开的半自动打磨装置还包括设置于半自动打磨装置本体100上的盖体300,半自动打磨装置本体100上设置有盖体导轨,盖体300与盖体导轨相配合。如此设置,盖体300可以通过盖体导轨与半自动打磨装置本体100实现密封配合。As a preferred embodiment, the semi-automatic grinding device disclosed in the embodiment of the present invention further includes a
为了能够对待打磨料块900的位置进行限制,本发明实施例所公开的半自动打磨装置还包括螺杆700,和与螺杆700相连的固定块800,其中,固定块800置于砂轮201和盖体300之间,螺杆700能够带动固定块900沿竖直方向运动。In order to limit the position of the
需要说明的是,在盖体300上开设有螺纹孔,螺杆700与螺纹孔相配合,当顺时针转动螺杆700,螺杆700带动固定块800逐渐朝向靠近待打磨料块900的方向移动,直至与待打磨料块800接触,在螺杆700和固定块800的作用下,待打磨料块900可以与砂轮201的内腔的内壁实现贴合,如此设置,砂轮201在转动过程中能够对待打磨料块900实现打磨;当逆时针转动螺杆700,螺杆700带动固定块800朝向远离待打磨料块800的方向移动,以实现固定块800与待打磨料块900的分离。It should be noted that the
需要说明的是,待打磨料块900与砂轮201的贴合程度不能过紧,也不能过松,保证砂轮201与待打磨料块900接触,且砂轮201能够进行转动以实现对待打磨料块900的打磨即可。It should be noted that the degree of fit between the
其中,本发明实施例对固定块800的具体结构不进行限定,固定块800可以为金属,可以为塑料,也可以为橡胶,只要满足本发明使用要求的结构均在发明的保护范围之内。The specific structure of the fixing
作为优选实施例,本发明实施例所公开的固定块800优选为橡胶块,由于橡胶块的弹性作用,可以避免对待打磨料块900造成损坏。As a preferred embodiment, the fixing
作为本发明的优选实施例,本发明实施例所公开的半自动打磨装置,半自动打磨装置本体100的内腔还设置有第一隔板101和第二隔板102,其中,第一隔板101和第二隔板102将半自动打磨装置本体100分隔为第一腔室103、第二腔室104和第三腔室105。As a preferred embodiment of the present invention, in the semi-automatic grinding device disclosed in the embodiment of the present invention, the inner cavity of the semi-automatic
其中,驱动电机401和第一皮带轮402均设置于第一腔室103内,第二皮带轮403、第一轴承500和第二轴承600均设置于第二腔室104内,砂轮201设置于第三腔室105内;第一隔板101上设置有用于皮带404穿过的第一通孔1011,第二隔板102上设置有用于转杆202穿过的第二通孔1012。The driving
在砂轮201进行打磨的过程中温度会升高,为了保证砂轮201能够正常运转,本发明实施例所公开的半自动打磨装置本体100上还开设有用于冷却液进入的进液口,和用于冷却液排出的排液口1041,其中,进液口和排液口1041均设置于第二腔室104的侧壁上,通过冷却液对砂轮201的冷却,可以保证砂轮201的正常运转,进而提升砂轮201的使用寿命。During the grinding process of the
当然,由于进液口和排液口1041只设置于第二腔室104的侧壁上,因此,冷却液只在第二腔室104内流动,不会对驱动机构400、第一轴承500和第二轴承600等造成影响。Of course, since the liquid inlet and the
请参考图2,本发明实施例还公开了一种半自动打磨方法,应用于如上述任意一实施例所公开的半自动打磨装置,包括以下步骤:Please refer to FIG. 2 , an embodiment of the present invention also discloses a semi-automatic grinding method, which is applied to the semi-automatic grinding device disclosed in any of the above-mentioned embodiments, and includes the following steps:
S 100:将待打磨料块900安装于半自动打磨装置的砂轮201内,使得待打磨料块900和砂轮201的内腔的内壁相贴合;S100: Install the
S200:开启驱动机构400,控制驱动机构400的转速为100r/min~200r/min,控制驱动机构400的转动时间为10min-40min,同时开启冷却水源,使得冷却水通入半自动打磨装置本体100的第二腔室104内以对砂轮201进行冷却。S200: Turn on the
S300:当待打磨料块900打磨完成后,关闭驱动机构400和冷却水源,当砂轮201停止旋转后,取下待打磨料块900,完成打磨。S300: After the grinding of the
当对待打磨料块900进行打磨时,首先将待打磨料块900安装于半自动打磨装置的砂轮201内,使得待打磨料块900和砂轮201的内腔的内壁相贴合;然后开启驱动机构400,控制驱动机构400的转速为100r/min~200r/min,控制驱动机构400的转动时间为10min-40min,同时开启冷却水源,使得冷却水通入半自动打磨装置本体100的第二腔室以对砂轮201进行冷却;当待打磨料块900打磨完成后,关闭驱动机构400和冷却水源,当砂轮201停止旋转后,取下待打磨料块900。和现有技术相比,通过上述半自动打磨方法对待打磨料块900进行打磨,不仅可以提高打磨效率,而且能够提升料块表面粗糙度的均匀性,从而进一步提高了打磨质量。When grinding the
其中,待打磨料块可以为砷化镓、磷化铟等半导体晶体,本发明实施例对其具体材料不进行限定。The material block to be polished may be a semiconductor crystal such as gallium arsenide and indium phosphide, and the specific material thereof is not limited in the embodiment of the present invention.
需要说明的是,当待打磨料块900为锥形状料块时,待打磨料块900的上端面和下端面直径的公差优选设置为φ±1mm。It should be noted that, when the
下面是手动打磨和采用半自动打磨装置对三种规格的砷化镓锥形状料块进行打磨的数据对比分析图表:The following is a data comparison and analysis chart of manual grinding and semi-automatic grinding device grinding of three specifications of GaAs cone-shaped blocks:
实施例一Example 1
实施例二Embodiment 2
实施例三Embodiment 3
经具体实施例采集数据对比,本发明实施例所公开的半导体锥形料块半自动打磨方法比手工使用砂纸打磨方法的打磨效率至少提升7倍,而且锥形状料块打磨后表面粗糙度均匀性远远优于手工打磨。After comparing the data collected by the specific embodiment, the semi-automatic grinding method of the semiconductor tapered block disclosed in the embodiment of the present invention is at least 7 times more efficient than the manual grinding method using sandpaper, and the surface roughness uniformity of the tapered block after grinding is far better. Much better than hand sanding.
在本申请的描述中,需要说明的是,术语“中心”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本申请和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本申请的限制。此外,术语“第一”、“第二”、“第三”仅用于描述目的,而不能理解为指示或暗示相对重要性。In the description of this application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the accompanying drawings, which is only for the convenience of describing the present application and simplifying the description, rather than indicating or implying that the indicated device or element must have a specific orientation or a specific orientation. construction and operation, and therefore should not be construed as limitations on this application. Furthermore, the terms "first", "second", and "third" are used for descriptive purposes only and should not be construed to indicate or imply relative importance.
除非另有明确的规定和限定,术语“安装”、“相连”、“连接”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接,或一体地连接;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通。对于本领域的普通技术人员而言,可以具体情况理解上述术语在本申请中的具体含义。Unless otherwise expressly specified and limited, the terms "installed", "connected" and "connected" should be understood in a broad sense, for example, it may be a fixed connection, a detachable connection, or an integral connection; it may be a mechanical connection, It can also be an electrical connection; it can be a direct connection, an indirect connection through an intermediate medium, or an internal connection between two components. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood in specific situations.
对所公开的实施例的上述说明,使本领域专业技术人员能够实现或使用本发明。对这些实施例的多种修改对本领域的专业技术人员来说将是显而易见的,本文中所定义的一般原理可以在不脱离本发明的精神或范围的情况下,在其它实施例中实现。因此,本发明将不会被限制于本文所示的这些实施例,而是要符合与本文所公开的原理和新颖特点相一致的最宽的范围。The above description of the disclosed embodiments enables any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (10)
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