CN114436440A - Processing system of low salt waste water in organosilicon production - Google Patents

Processing system of low salt waste water in organosilicon production Download PDF

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Publication number
CN114436440A
CN114436440A CN202210072035.0A CN202210072035A CN114436440A CN 114436440 A CN114436440 A CN 114436440A CN 202210072035 A CN202210072035 A CN 202210072035A CN 114436440 A CN114436440 A CN 114436440A
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low
water
salt wastewater
water tank
tank
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周文博
渠国忠
王旭普
贾佳乐
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Inner Mongolia Xingxing Chemical Co ltd
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Inner Mongolia Xingxing Chemical Co ltd
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    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00Multistage treatment of water, waste water or sewage
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/001Processes for the treatment of water whereby the filtration technique is of importance
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/02Treatment of water, waste water, or sewage by heating
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/24Treatment of water, waste water, or sewage by flotation
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/28Treatment of water, waste water, or sewage by sorption
    • C02F1/283Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/42Treatment of water, waste water, or sewage by ion-exchange
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/44Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/441Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/44Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/442Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by nanofiltration
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/52Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
    • C02F1/5236Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities using inorganic agents
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/66Treatment of water, waste water, or sewage by neutralisation; pH adjustment
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/72Treatment of water, waste water, or sewage by oxidation
    • C02F1/722Oxidation by peroxides
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/72Treatment of water, waste water, or sewage by oxidation
    • C02F1/725Treatment of water, waste water, or sewage by oxidation by catalytic oxidation
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F2001/007Processes including a sedimentation step
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/42Treatment of water, waste water, or sewage by ion-exchange
    • C02F2001/425Treatment of water, waste water, or sewage by ion-exchange using cation exchangers
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/36Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture of organic compounds
    • C02F2103/38Polymers
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00Use of specific compounds during water treatment
    • C02F2305/02Specific form of oxidant
    • C02F2305/026Fenton's reagent

Abstract

The application provides a processing system of low salt waste water in organosilicon production, include, it has oil interceptor, air supporting machine, distribution tank, micro-nano air supporting machine, first water tank, alkali-heat polymerization reaction unit, second water tank, fenton oxidation pond, neutralization sedimentation tank, many medium filter, ion exchange equipment, low salt clear water case, low pressure reverse osmosis unit and water purification case to establish ties in proper order along the waste water treatment direction. The system of this application, with the low salt waste water that produces in the organosilicon production process, progressively gets rid of the pollutant through above-mentioned device and purify, obtains the water purification that the physicochemical index accords with the retrieval and utilization standard to the water purification that will obtain recycles once more. The system of this application is to low salt waste water behind purification treatment, and direct retrieval and utilization realizes the zero release of waste water, has practiced thrift the water resource simultaneously, reduces the manufacturing cost of mill, has improved the income of enterprise to a certain extent.

Description

Processing system of low salt waste water in organosilicon production
Technical Field
The application relates to a wastewater treatment technology, in particular to a treatment system for low-salt wastewater in organic silicon production.
Background
In the production process of organic silicon, a large amount of alkali is used as a catalyst in the hydrolysis and polymerization processes, the alkali is generally strong bases such as potassium hydroxide, sodium hydroxide and the like, acid is used for adjusting pH in the treatment process after the reaction is finished, industrial hydrochloric acid is generally used for adjustment, a large amount of salt-containing wastewater is generated by acid-base neutralization in the pH adjustment process, the salt-containing wastewater is generally divided into high-salt wastewater and low-salt wastewater, wherein the high-salt wastewater is high in concentration such as sodium chloride and potassium chloride, but the generation amount is small; the low-salt wastewater has low salt content, but the low-salt wastewater has large generation amount, and simultaneously the low-salt wastewater is generated from an organic silicon production section, so that the low-salt wastewater contains partial silicon-containing organic matters, which leads the Chemical Oxygen Demand (COD) value of the low-salt wastewater to be as high as 6000, and how to treat the low-salt wastewater in the organic silicon production becomes one of important problems in the aspect of factory pollution discharge treatment.
The low-salt wastewater in the production process of the organic silicon contains salt such as sodium chloride and potassium chloride, siliceous organic matters, colloid, insoluble particles and other impurities. The existing method for treating low-salt wastewater is to simply purify the low-salt wastewater in the production process of organic silicon, discharge the low-salt wastewater to the environment after reaching the emission standard, and although the treated low-salt wastewater reaches the national standard, a large amount of the low-salt wastewater is discharged, so that not only is the water resource wasted, but also the environment is polluted.
Disclosure of Invention
The application provides a processing system of low salt waste water in organosilicon production for solve above-mentioned organosilicon production process low salt waste water direct discharge after handling and fail to recycle and lead to the problem of water waste machine environmental pollution.
The application provides a processing system of low salt waste water in organosilicon production, include, it has oil interceptor, air supporting machine, distribution tank, micro-nano air supporting machine, first water tank, alkali-heat polymerization reaction unit, second water tank, fenton oxidation pond, neutralization sedimentation tank, many medium filter, ion exchange equipment, low salt clear water case, low pressure reverse osmosis unit and water purification case to establish ties in proper order along the waste water treatment direction.
The alkali thermal polymerization reaction device is used for carrying out alkali thermal polymerization reaction on the low-salt wastewater from the first water tank under the conditions that the temperature is 50-60 ℃ and the pH value is alkaline, and conveying the low-salt wastewater after the alkali thermal polymerization reaction to the second water tank;
the Fenton oxidation pond is used for stirring and reacting a Fenton reagent and low-salt wastewater from the second water tank for 3-5 hours under the acidic condition of the pH value, wherein the Fenton reagent comprises hydrogen peroxide and ferrous sulfate, and the molar ratio of the hydrogen peroxide to the ferrous sulfate is 1: 1-4: 1.
Optionally, a manganese sand filter is further arranged between the multi-media filter and the ion exchange equipment.
Optionally, an activated carbon filter is further arranged between the manganese sand filter and the ion exchange equipment.
Optionally, a medium-pressure nanofiltration device is connected between the low-pressure reverse osmosis device and the clean water tank.
Optionally, a high-pressure reverse osmosis device is connected between the medium-pressure nanofiltration device and the purified water tank.
Optionally, a first heat exchanger is connected between the first water tank and the alkaline thermal polymerization reaction device.
Optionally, a cloth bag filter and a second heat exchanger are sequentially connected in series between the second water tank and the fenton oxidation pond, the cloth bag filter is connected with the second water tank, and the second heat exchanger is connected with the fenton oxidation pond.
Alternatively, the treatment in the alkaline thermal polymerization apparatus is operated as follows:
heating the low-salt wastewater entering the alkali thermal polymerization reaction device to 50-60 ℃;
adding strong base into the alkaline thermal polymerization reaction device to adjust the pH value of the low-salt wastewater to 10-12, and stirring for reaction for 1-3 hours; wherein the strong base is one or more of sodium hydroxide, potassium hydroxide or calcium hydroxide.
The treatment mode in the Fenton oxidation pond is operated according to the following method:
adjusting the pH value of the wastewater entering the Fenton oxidation pond to 3-4;
putting hydrogen peroxide/ferrous sulfate into a Fenton oxidation tank according to the ratio of 1: 1-4: 1, and stirring for reaction for 3-5 hours; the adding amount of the hydrogen peroxide is calculated as COD: h2O2=1∶2~1∶3。
Optionally, the heating medium flowing in the first heat exchanger and the second heat exchanger is steam condensate with the temperature of 80-90 ℃.
Optionally, indexes of purified water in the water purifying tank are that COD is less than or equal to 30, pH is 7-9, chloride ion concentration is less than or equal to 50mg/L, and conductivity is less than or equal to 50 mu S/cm.
The system of the application separates oily pollutants such as organic silicon and the like in the low-salt wastewater through the oil separation tank; the air flotation machine further removes oily pollutants such as organic silicon and the like; storing water and buffering in a distribution tank, and preliminarily removing suspended matters in the low-salt wastewater by using a micro-nano air floatation machine; the first water tank stores water and buffers; the device comprises a thermal alkali polymerization reaction device, a heat treatment device and a heat treatment device, wherein the thermal alkali polymerization reaction device is used for generating and removing the organic silicon in the low-salt wastewater through precipitation; the second water tank stores water and buffers; a Fenton oxidation pond for deeply oxidizing organic matters and oxidizable pollutants in the low-salt wastewater through a Fenton oxidation reaction and converting the organic matters and the oxidizable pollutants into low-molecular inorganic matters to be removed; the pH value of the wastewater subjected to Fenton oxidation is adjusted to be neutral by the neutralization sedimentation tank, and pollutants in the wastewater are precipitated and removed; the multi-medium filter intercepts suspended matters, colloids and the like remaining after wastewater treatment, and reduces the turbidity of the wastewater; removing calcium and magnesium ions in the wastewater by using ion exchange equipment; storing water and buffering in a low-salt clear water tank; the low-pressure reverse osmosis device further removes salt in the wastewater, so that the stored water is clean; the water storage of the water purifying tank can convey the treated clean water to other working sections for recycling.
The system of this application, with the low salt waste water that produces in the organosilicon production process, progressively gets rid of the pollutant through above-mentioned device and purify, obtains the water purification that the physicochemical index accords with the retrieval and utilization standard to the water purification that will obtain recycles once more. The system of this application is to low salt waste water through purification treatment back, and direct retrieval and utilization realizes the zero release of waste water, has practiced thrift the water resource simultaneously, reduces the manufacturing cost of mill, has improved the income of enterprise to a certain extent.
Drawings
In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a schematic view of a system for treating low-salt wastewater in organosilicon production according to an embodiment of the present application;
FIG. 2 is a schematic view of a system for treating low-salt wastewater in organosilicon production according to another embodiment of the present application;
FIG. 3 is a schematic view of a system for treating low-salt wastewater in organosilicon production according to another embodiment of the present application;
FIG. 4 is a schematic view of a system for treating low-salt wastewater in organosilicon production according to another embodiment of the present application;
FIG. 5 is a schematic view of a system for treating low-salt wastewater in organosilicon production according to an embodiment of the present application;
FIG. 6 is a schematic view of a system for treating low-salt wastewater in organosilicon production according to an embodiment of the present application;
FIG. 7 is a schematic view of a system for treating low-salt wastewater in organosilicon production according to an embodiment of the present application.
Description of reference numerals:
1. an oil separation tank;
2. an air flotation machine;
3. a water distribution tank;
4. a micro-nano air floatation machine;
5. a first water tank;
6. an alkaline thermal polymerization reaction device;
7. a second water tank;
8. a Fenton oxidation pond;
9. a neutralization sedimentation tank;
10. a multi-media filter;
11. an ion exchange device;
12. a low-salt clear water tank;
13. a low pressure reverse osmosis unit;
14. a water purifying tank;
15. a manganese sand filter;
16. an activated carbon filter;
17. a medium pressure nanofiltration device;
18. a high pressure reverse osmosis unit;
19. a first heat exchanger;
20. a cloth bag filter;
21. a second heat exchanger;
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application are clearly and completely described below, and it is obvious that the described embodiments are a part of the embodiments of the present application, but not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
As shown in fig. 1, the application provides a treatment system for low-salt wastewater in organosilicon production, which comprises an oil separation tank 1, an air flotation machine 2, a distribution tank 3, a micro-nano air flotation machine 4, a first water tank 5, an alkaline thermal polymerization reaction device 6, a second water tank 7, a fenton oxidation tank 8, a neutralization sedimentation tank 9, a multi-media filter 10, an ion exchange device 11, a low-salt clean water tank 12, a low-pressure reverse osmosis device 13 and a clean water tank 14 which are sequentially connected in series along a wastewater treatment direction;
the alkali thermal polymerization reaction device 6 is used for carrying out alkali thermal polymerization reaction on the low-salt wastewater from the first water tank 5 under the conditions that the temperature is 50-60 ℃ and the pH value is alkaline, and conveying the low-salt wastewater after the alkali thermal polymerization reaction to the second water tank 7;
the Fenton oxidation pond 8 is used for stirring and reacting a Fenton reagent and low-salt wastewater from the second water tank 7 for 3-5 hours under the acidic condition of the pH value, wherein the Fenton reagent comprises hydrogen peroxide and ferrous sulfate, and the molar ratio of the hydrogen peroxide to the ferrous sulfate is 1: 1-4: 1.
The system of this application sets up oil interceptor 1, can detach the siliceous organic matter in the low salt waste water. The essence of the oil separation tank 1 is an oil-water separator, silicon-containing organic matters contained in the low-salt wastewater are not soluble in water, have lower density than water and float on the liquid level, the low-salt wastewater containing organic silicon is transferred into the oil separation tank 1 and stands for 15-25 minutes, the silicon-containing organic matters are separated from water, the upper layer is the silicon-containing organic matters, an oil layer and a water layer in which the silicon-containing organic matters are located are separated through the oil separation tank 1, the water layer enters the next device for treatment, and the oil layer is transferred into an oil collection tank for centralized treatment, so that pollution is reduced.
And an air floatation machine 2 is arranged, and the air floatation machine is utilized to further separate and remove organic silicon impurities in the low-salt wastewater. The air floatation is that a great deal of fine bubbles are introduced into water or somehow generated to form a three-phase mixture of water, air and removed substances, so that the bubbles are attached to suspended particles to form a bonding body, and the bonding body floats upwards to sleep due to low density of the bonding body, thereby realizing separation of water and suspended substances, and further purifying the waste water while recovering useful substances in the waste water. Air flotation can be used in applications unsuitable for sedimentation to separate difficult-to-sediment suspensions, such as grease, fiber, algae, etc., with densities close to water. The air flotation machine 2 is arranged, organic silicon which cannot be completely removed in a previous section of procedure in the low-salt wastewater can be removed, the content of organic matters in water and the treatment pressure of a next section of procedure are reduced, and the organic silicon separated out in the air flotation machine 2 can be transferred to an oil collecting tank for centralized treatment, so that pollution is reduced.
The distribution tank 3 is arranged in the application, the distribution tank 3 has the function of an intermediate water storage device, low-salt wastewater treated by the air floatation machine 2 can be collected and delivered to the next procedure for treatment, and low-salt wastewater without organic silicon from other sections can be discharged into the distribution tank 3 for centralized treatment.
The distribution tank 3 has the functions of buffering and concentrating wastewater, and can reduce the treatment pressure of subsequent working sections.
Set up micro-nano air supporting machine 4 in this application, can detach the partial suspended solid in the low salt waste water. Bubbles in the water, which are generally referred to as micro bubbles, are present in the water and have a size of ten to several tens of micrometers; bubbles with the size of hundreds of nanometers or less are called nano bubbles, and the state of the mixture of the bubbles existing between the nano bubbles and the nano bubbles is called micro-nano bubbles, so that after the general bubbles are generated in water, the general bubbles quickly rise to the water surface and are broken and disappear, namely the existence time is short. And the micron bubbles can be broken and disappear in water for tens of seconds or even minutes, the micro-nano air flotation machine 4 can generate the micro-nano bubbles, and the micro-nano bubbles have small diameters, so that the generated micro-nano bubbles have large specific surface area and short breaking time, and can adsorb suspended matters in water and be combined with the suspended matters to bring the suspended matters to the liquid surface, thereby removing the suspended matters in the wastewater. The micro-nano air floatation machine 4 is used for treating suspended matters in the wastewater, and the suspended matters are removed by utilizing bubbles in the process, so that the collected suspended matters after treatment cannot be adhered to the micro-nano air floatation machine 4, the blockage problem of the micro-nano air floatation machine 4 is avoided, the treated suspended matters can float on the liquid level, and therefore the suspended matters are extremely easy to remove, and the treatment cost is also saved.
The first water tank 5 has the functions of water storage and buffering, and can centralize the wastewater treated by the pre-treatment process for treatment, so that the treatment pressure of equipment can be reduced.
The alkali thermal polymerization reaction device 6 heats the low-salt wastewater to a reaction temperature (55-60 ℃) in the alkali thermal polymerization reaction device 6, the heating process can be completed in the alkali thermal polymerization reaction device 6, and a heating device such as a heat exchanger can be arranged before the alkali thermal polymerization reaction device 6 to realize heating. And adding strong base such as sodium hydroxide, potassium hydroxide, calcium hydroxide and the like into the mixture, and controlling the pH of the reaction system to be 10-12, so that the reaction can be promoted. During the reaction, the organosiloxane reacts with the base to form a precipitate, which is removed.
The second water tank 7 has the functions of water storage and buffering, and can centralize the wastewater treated by the pre-treatment process for treatment, so that the treatment pressure of the equipment can be reduced.
A Fenton oxidation tank 8, wherein the Fenton oxidation method is to use Fe under the condition that the pH value is 2-52+As catalyst, with H2O2A method for treating wastewater by chemical oxidation. Mixing Fe2+/H2O2The system of compositions is called Fenton's reagent. The reaction mechanism is Fe2+And Fe3+And H2O2The reaction generates hydroxyl free radical with strong oxidizing property, and generates organic free radical with refractory organic matter in aqueous solution to destroy the structure, finally realizes oxidative decomposition, and the generated reaction is as follows:
Fe2++H2O2→Fe3++OH-+OH·。
the Fenton oxidation method is mainly suitable for treating waste water containing refractory organic matters, such as waste water in paper-making industry, waste water in dyeing and finishing industry, waste water in coal chemical industry, waste water in petrochemical industry, waste water in fine chemical industry, waste water in fermentation industry, garbage percolate and the like, and waste water in centralized waste water treatment plants in industrial parks.
Fenton oxidation is one of advanced oxidation technologies, residual organic matters and oxidizable matters in low-salt wastewater can be deeply oxidized into simple substances such as small-molecular inorganic substances including carbon dioxide, and the COD value of the wastewater can be reduced from 2000-3000 mg/L to below 500mg/L by combining with other treatment processes. The Fenton oxidation pond 8 is arranged, so that the low-salt wastewater can be subjected to advanced treatment by using a Fenton oxidation method, oxidizable substances such as organic matters in the wastewater are removed, the cleanliness of the wastewater is further improved, and the pressure is reduced for subsequent treatment procedures.
And a neutralization sedimentation tank 9 is arranged, acid is added into the low-salt wastewater from the Fenton oxidation tank 8 in the neutralization sedimentation tank 9 to adjust the pH value to 6-8, and at the moment, after the pH value of a product subjected to Fenton oxidation in the low-salt wastewater is increased, the solubility of partial impurities is reduced, so that the low-salt wastewater is precipitated. And standing the neutralized wastewater for 20-30 minutes to enable the neutralized wastewater to be completely precipitated. The setting of the neutralization sedimentation tank 9 can reduce the treatment pressure of the subsequent working section.
The multi-medium filter 10 is filled with quartz sand filler, anthracite filler, magnetite filler, porous ceramic filler, garnet filler and the like, can retain solid particles, colloids and the like which are suspended in liquid and cannot be completely precipitated in the neutralization sedimentation tank 9, and can reduce the turbidity of the effluent to below 3 ℃ after being filtered and retained by the multi-medium filter 10. The provision of the multimedia filter 10 reduces the process pressure in the subsequent process and protects the subsequent equipment.
The ion exchange equipment 11 in the application is filled with cation exchange resin, and is mainly used for removing cations such as calcium and magnesium in low-salt wastewater, further reducing the concentration of salt in the low-salt wastewater, relieving the treatment pressure of a subsequent process device, and regenerating the cation exchange resin after the cation exchange resin is invalid, so that the cost for treating the wastewater can be reduced.
The low-salt clear water tank 12 has the functions of storing light salt water and performing centralized treatment.
The low-pressure reverse osmosis device 13, reverse osmosis is also called reverse osmosis, and is a membrane separation operation for separating a solvent from a solution using a pressure difference as a driving force. The feed solution on one side of the membrane is pressurized and when the pressure exceeds its osmotic pressure, the solvent will reverse osmosis against the direction of natural osmosis. Thereby obtaining a permeated solvent, i.e., permeate, at the low pressure side of the membrane; the high pressure side yields a concentrated solution, i.e., a concentrate. In the application, the low-pressure reverse osmosis is used, namely the working pressure is 0.7-2.0 MP, because the concentration of inorganic salt in low-salt water entering the low-pressure reverse osmosis device 13 is low through the treatment of the preorder working section, pure treated water can be completely produced by using the low-pressure reverse osmosis device 13, the operating pressure in the low-pressure reverse osmosis device 13 is low, severe working conditions are not needed, the investment of relevant equipment such as pressurizing equipment is greatly reduced, and the treatment cost is reduced.
And in the water purifying tank 14, the low-salt wastewater is purified into purified water through the previous treatment process and stored in the water purifying tank 14, and the purified water can be supplied to other workshop sections of a factory for recycling, so that zero emission of the wastewater is realized, water resources are saved, and the production cost of the factory is reduced.
The system of the application separates oily pollutants such as organic silicon and the like in the low-salt wastewater through the oil separation tank 1; the air flotation machine 2 further removes oily pollutants such as organic silicon and the like; the water distribution tank 3 stores water and buffers, and the micro-nano air floatation machine 4 preliminarily removes suspended matters in the low-salt wastewater; the first water tank 5 stores water and buffers; an alkaline thermal polymerization reaction device 6 for removing the organic silicon in the low-salt wastewater by generating precipitate through alkaline thermal polymerization reaction; the second water tank 7 stores water and buffers; a Fenton oxidation pond 8 for deeply oxidizing organic matters and oxidizable pollutants in the low-salt wastewater through a Fenton oxidation reaction and converting the organic matters and the oxidizable pollutants into low-molecular inorganic matters to be removed; the neutralization sedimentation tank 9 adjusts the pH value of the wastewater subjected to Fenton oxidation to be neutral, and simultaneously, sediments and removes pollutants in the wastewater; the multi-medium filter 10 intercepts suspended matters, colloids and the like remaining after wastewater treatment, and reduces the turbidity of the wastewater; the ion exchange device 11 removes calcium and magnesium ions in the wastewater; the low-salt clear water tank 12 stores and buffers water; the low-pressure reverse osmosis device 13 further removes salt in the wastewater, so that the stored water is clean; the water storage of the clean water tank 14 can convey the treated clean water to other working sections for recycling.
In the application, in the alkaline thermal polymerization reaction device 6, strong base and organosilicon react under the condition of 50-60 ℃, the organosilicon in the low-salt wastewater is rapidly precipitated and removed, most organic matters in the low-salt wastewater can be removed by the step, the COD (chemical oxygen demand) value of the low-salt wastewater is reduced, the pressure of Fenton oxidation in subsequent steps is reduced, the Fenton reagent is saved, the treatment cost is reduced, and meanwhile, the siloxane is precipitated, so that the siloxane is easy to remove, the difficulty in removing the siloxane is reduced, and the operation is simple and easy to implement.
Fenton oxidation pond 8 in this application, wherein Fenton's reagent produces the hydroxyl free radical, passes through oxidation with the high material of COD value in the waste water and removes to reduce the COD value of waste water, reduce the pressure of follow-up processing operation.
The system of this application, with the low salt waste water that produces in the organosilicon production process, progressively gets rid of the pollutant through above-mentioned device and purify, obtains the water purification that the physicochemical index accords with the retrieval and utilization standard to the water purification that will obtain recycles once more. The system of this application is to low salt waste water through purification treatment back, and direct retrieval and utilization realizes the zero release of waste water, has practiced thrift the water resource simultaneously, reduces the manufacturing cost of mill, has improved the income of enterprise to a certain extent.
Optionally, as shown in fig. 2, a manganese sand filter 15 is further provided between the multimedia filter 10 and the ion exchange device 11.
In this application, manganese sand filter 15 is filled with the manganese sand filter material in, can remove the iron ion in the waste water to can also hold back one process untreated clean suspended solid, colloid etc. set up manganese sand filter 15 and can further handle low salt waste water, remove the iron ion of introducing in fenton oxidation pond 8 in the waste water, reduce pressure for the subsequent processing process, and can prolong the life of subsequent processing device.
Optionally, as shown in fig. 3, an activated carbon filter 16 is further provided between the manganese sand filter 15 and the ion exchange device 11.
In this application, set up activated carbon filter 16, further handle low salt waste water, reduce the impurity in the waste water. Activated carbon particles, which are rod-shaped or spherical and have a size of about 0.5 cm, are filled in the activated carbon filter 16, the activated carbon is a specially treated carbon, organic raw materials (shells, coal, wood, etc.) are heated under the condition of air isolation to reduce non-carbon components (this process is called carbonization), and then the organic raw materials react with gas to erode the surface, so that a structure with developed micropores is generated, namely an activation process. Since the activation process is a microscopic process, i.e., the surface erosion of a large amount of molecular carbides is a point-like erosion, the surface of the activated carbon is caused to have countless fine pores. The diameter of the micropores on the surface of the activated carbon is mostly between 2 and 50nm, even a small amount of activated carbon has huge surface area, and the surface area of each gram of activated carbon is 500 to 1500m2The huge surface area of the activated carbon is the basis of strong adsorption capacity, so the activated carbon can be used for treating oily wastewater, dye wastewater, mercury-containing wastewater, chromium-containing wastewater, adsorbing impurities in gas and the like. By activity ofThe carbon treatment of the low-salt wastewater can effectively remove fine suspended matters in the wastewater, and the activated carbon has rich sources, low price and easy acquisition, can be regenerated and recycled, and can reduce the cost in the treatment process.
Optionally, as shown in fig. 4, a medium pressure nanofiltration device 17 is further connected between the low pressure reverse osmosis device 13 and the clean water tank 14.
Set up middling pressure nanofiltration device 17 in this application, the device passes through the nanofiltration membrane, can further detach the salinity such as calcium chloride, magnesium chloride and sodium chloride in the low salt waste water, further reduces the concentration of chlorion, organic matter etc. in the waste water for it is purer to go out the water.
The principle of nanofiltration is that salt and small molecular substances pass through a nanofiltration membrane under the driving of pressure difference, so that the separation technology for intercepting the large molecular substances is mainly applied to the concentration and purification of the large molecular substances. The nanofiltration system mainly adopts a cross-flow filtration mode. The cross flow mode avoids the blocking phenomenon in the filtering process, the feed liquid flows through the surface of the membrane, liquid and small molecular substances penetrate through the nanofiltration membrane under the action of pressure, and insoluble substances and large molecular substances are effectively intercepted. In the case of filtration by means of a cake layer during cross-flow, the separation occurs at the membrane surface rather than in the cake layer, and thus the filtrate quality is uniform and stable throughout the process. The quality of the filtrate depends on the quality of the membrane itself, which puts the production process under full effective control. Most nanofiltration membranes are self-negatively charged and they hinder multivalent ion permeation through electrostatic interactions, which is an important reason that nanofiltration membranes have higher desalination performance at lower pressures. The filtration precision of nanofiltration is between reverse osmosis and ultrafiltration, the molecular weight of the nanofiltration can be about 200-400 for intercepting organic matters, the capacity of intercepting soluble salts is 20-98%, the removal rate of monovalent anion salt solution is lower than that of high-valence anion salt solution, such as 20-80% for sodium chloride and calcium chloride, and 90-98% for magnesium sulfate and sodium sulfate.
Set up middling pressure nanofiltration device 17 in this application, further reduce the concentration of chlorion, organic matter etc. in the waste water for it is purer to go out water, and the salinity of removing can be retrieved, is used for other production workshop sections of mill after the purification once more, perhaps partial shipment packing is sold, so both can reduce the cost in the low salt solution processing procedure, can create revenue again, improves the benefit of enterprise.
Optionally, as shown in fig. 5, a high pressure reverse osmosis device 18 is connected between the medium pressure nanofiltration device 17 and the clean water tank 14.
Set up high pressure reverse osmosis unit 18 in this application, high pressure reverse osmosis is that operating pressure is 2.8 ~ 4.2 MPa's reverse osmosis unit, and high pressure reverse osmosis is compared and can be filtered more for tiny material in low pressure reverse osmosis to high pressure reverse osmosis unit 18's entrapment ability is stronger, through high pressure reverse osmosis treatment, can further improve the cleanliness factor of water, and the salt fraction of being held back by high pressure reverse osmosis unit 18 simultaneously can be collected, through reuse or sale after the purification.
Alternatively, as shown in fig. 6, a first heat exchanger 19 is connected between the first water tank 5 and the alkaline thermal polymerization reactor 6.
The system of this application sets up first heat exchanger 19, is in order to guarantee that the temperature of the low salt waste water that gets into in the alkali thermal polymerization reaction unit 6 reaches reaction temperature (50 ~ 60 ℃), and the heating medium that flows among the first heat exchanger 19 generally is the high-temperature circulating water that comes from other workshop sections, can make full use of the waste heat in the mill like this, reduces the waste of energy, reduces treatment cost. During practical use, the low-salt wastewater in the first heat exchanger 19 passes through the tube side of the first heat exchanger 19, and the heating medium passes through the shell side, so that the impurities in the low-salt wastewater can be prevented from being deposited in the first heat exchanger 19 to cause damage to the first heat exchanger 19, and meanwhile, the daily maintenance and cleaning of the first heat exchanger 19 are facilitated.
Alternatively, as shown in fig. 7, a cloth bag filter 20 and a second heat exchanger 21 are sequentially connected in series between the second water tank 7 and the fenton oxidation pond 8, the cloth bag filter 20 is connected to the second water tank 7, and the second heat exchanger is connected to the fenton oxidation pond 8.
The system of this application sets up cloth bag filter 20, can filter the insoluble impurity in the waste water, reduces the influence of these impurities to fenton oxidation process.
The second heat exchanger 21 is used for keeping the temperature of the low-salt wastewater entering the Fenton oxidation pond 8 at 50-60 ℃, and the higher temperature is beneficial to the oxidation reaction.
Alternatively, the treatment in the alkaline thermal polymerization apparatus 6 is performed as follows:
heating the low-salt wastewater entering the alkali thermal polymerization reaction device 6 to 50-60 ℃;
adding strong base into the alkaline thermal polymerization reaction device 6 to adjust the pH value of the low-salt wastewater to 10-12, and stirring for reaction for 1-3 hours; wherein the strong base is one or more of sodium hydroxide, potassium hydroxide or calcium hydroxide;
the treatment in the fenton oxidation pond 8 is carried out as follows:
adjusting the pH value of the wastewater entering the Fenton oxidation pond 8 to 3-4;
adding hydrogen peroxide/ferrous sulfate into a Fenton oxidation tank 8 according to the ratio of 1: 1-4: 1, and stirring for reaction for 3-5 hours; the adding amount of the hydrogen peroxide is calculated as COD: H2O2 is 1: 2-1: 3.
In this application, low salt waste water heats to 50 ~ 60 ℃ in getting into alkali thermal polymerization reaction unit 6, and this heating process can be gone on in alkali thermal polymerization reaction unit 6, also can set up the heat exchanger before in alkali thermal polymerization reaction unit 6 and realize. And (3) adjusting the pH of the heated low-salt wastewater to 10-12 by using strong base such as sodium hydroxide, potassium hydroxide or calcium hydroxide, and stirring for 1-3 hours to enable organic silicon in the low-salt wastewater to react with the base to generate precipitate.
In the operation of the Fenton oxidation, the pH value of the system needs to be adjusted to be acidic, which is 3-4 in the application, because the Fenton oxidation reaction is performed under the acidic condition, the reaction is favorably performed smoothly, and the acid used in the pH adjustment process is concentrated hydrochloric acid. In the reaction, after mixing hydrogen peroxide and ferrous sulfate, the following reaction occurs in the system:
Fe2++H2O2→Fe3++OH-+OH·。
therefore, the hydrogen peroxide/ferrous sulfate is used according to the proportion of 1: 1-4: 1, more hydroxyl free radicals can be generated, and the reaction is more thorough.
Optionally, the flowing heating medium in the first heat exchanger 19 and the second heat exchanger 21 is steam condensate with the temperature of 80-90 ℃.
In this application, regard as the heating medium in the heat exchanger with the steam condensate, the waste heat of other workshop sections in the ability make full use of mill reduces energy loss and waste, has also practiced thrift the treatment cost simultaneously.
Optionally, indexes of the purified water in the purified water tank 14 are that COD is less than or equal to 30, pH is 7-9, chloride ion concentration is less than or equal to 50mg/L, and conductivity is less than or equal to 50 muS/cm.
In the application, indexes of the purified water in the purified water tank 14 are that COD is less than or equal to 30, pH is 7-9, the concentration of chloride ions is less than or equal to 50mg/L, and the conductivity is less than or equal to 50 mu S/cm, and the indexes completely meet the water reuse standard, so that the purified water in the purified water tank 14 can be supplied to other sections for use again, the production cost of a factory is reduced, and water resources are saved.
Finally, it should be noted that the above embodiments are only used for illustrating the technical solutions of the present application, and not for limiting the same; although the present application has been described in detail with reference to the foregoing embodiments, it will be understood by those skilled in the art; the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present application.

Claims (10)

1. A treatment system for low-salt wastewater in organic silicon production is characterized in that an oil separation tank (1), an air floatation machine (2), a water distribution tank (3), a micro-nano air floatation machine (4), a first water tank (5), an alkaline thermal polymerization reaction device (6), a second water tank (7), a Fenton oxidation tank (8), a neutralization sedimentation tank (9), a multi-medium filter (10), ion exchange equipment (11), a low-salt clean water tank (12), a low-pressure reverse osmosis device (13) and a clean water tank (14) are sequentially connected in series along the wastewater treatment direction;
the hot alkali polymerization reaction device (6) is used for carrying out hot alkali polymerization reaction on the low-salt wastewater from the first water tank (5) under the conditions that the temperature is 50-60 ℃ and the pH value is alkaline, and conveying the low-salt wastewater after the hot alkali polymerization reaction to the second water tank (7);
the Fenton oxidation pond (8) is used for stirring and reacting a Fenton reagent and low-salt wastewater from the second water tank (7) for 3-5 hours under the acidic condition of the pH value, wherein the Fenton reagent comprises hydrogen peroxide and ferrous sulfate, and the molar ratio of the hydrogen peroxide to the ferrous sulfate is 1: 1-4: 1.
2. The system for treating low-salt wastewater according to claim 1, wherein a manganese sand filter (15) is further disposed between the multimedia filter (10) and the ion exchange device (11).
3. The system for treating low-salt wastewater according to claim 2, wherein an activated carbon filter (16) is further disposed between the manganese sand filter (15) and the ion exchange equipment (11).
4. The system for treating low-salt wastewater according to claim 1, wherein a medium-pressure nanofiltration device (17) is further connected between the low-pressure reverse osmosis device (13) and the clean water tank (14).
5. The system for treating low-salt wastewater according to claim 4, wherein a high-pressure reverse osmosis device (18) is further connected between the medium-pressure nanofiltration device (17) and the clean water tank (14).
6. The system for treating low-salt wastewater according to claim 1, wherein a first heat exchanger (19) is connected between the first water tank (5) and the alkaline thermal polymerization reaction device (6).
7. The system for treating low-salt wastewater according to claim 6, wherein a cloth bag filter (20) and a second heat exchanger (21) are sequentially connected in series between the second water tank (7) and the Fenton oxidation pond (8), the cloth bag filter (20) is connected with the second water tank (7), and the second heat exchanger is connected with the Fenton oxidation pond (8).
8. The system for treating low-salt wastewater according to claim 1,
the treatment mode in the alkali thermal polymerization reaction device (6) is operated as follows:
heating the low-salt wastewater entering the alkali thermal polymerization reaction device (6) to 50-60 ℃;
adding strong base into the alkaline thermal polymerization reaction device (6) to adjust the pH value of the low-salt wastewater to 10-12, and stirring for reaction for 1-3 hours; wherein the strong base is one or more of sodium hydroxide, potassium hydroxide or calcium hydroxide;
the treatment mode in the Fenton oxidation pond (8) is operated according to the following method:
adjusting the pH value of the wastewater entering the Fenton oxidation pond (8) to 3-4;
putting hydrogen peroxide/ferrous sulfate into a Fenton oxidation tank (8) according to the proportion of 1: 1-4: 1, and stirring for reaction for 3-5 hours; the adding amount of the hydrogen peroxide is calculated as COD: h2O2=1∶2~1∶3。
9. The system for treating low-salt wastewater according to claim 7, wherein the heating medium flowing in the first heat exchanger (19) and the second heat exchanger (21) is steam condensate with the temperature of 80-90 ℃.
10. The system for treating low-salt wastewater according to any one of claims 1-9, wherein the index of the purified water in the purified water tank (14) is COD < 30, pH 7-9, chloride ion concentration < 50mg/L, and conductivity < 50 μ S/cm.
CN202210072035.0A 2022-01-21 2022-01-21 Processing system of low salt waste water in organosilicon production Pending CN114436440A (en)

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