CN114411220A - Process method for precisely controlling thickness of oxalic acid anodized film layer by constant pressure of gradient boosting - Google Patents
Process method for precisely controlling thickness of oxalic acid anodized film layer by constant pressure of gradient boosting Download PDFInfo
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Abstract
The invention belongs to the field of material surface treatment, and particularly relates to a process method for accurately controlling the thickness of an oxalic acid anodized film layer by using a constant pressure of gradient boosting. The test process of the oxalic acid anodizing process is divided into a plurality of test stages, each test stage is firstly subjected to slow pressure rise and then is kept for a certain time under constant pressure, the voltage parameters in the test process are controlled through the mode, the problems that the thickness range of the oxalic acid anodized film layer of the aluminum alloy is too wide and the accuracy is not high are solved, the thickness range of the oxalic acid anodized film layer is accurate to +/-5 um from +/-10 um, the grinding allowance is reduced, and the hardness meets the requirement that the hardness is more than or equal to 350 HV; the process method is suitable for parts with different shapes, different surface areas and different quantities, does not need to adjust the voltage value, has simple operation process and can realize batch production.
Description
Technical Field
The invention belongs to the field of material surface treatment, and particularly relates to a process method for accurately controlling the thickness of an oxalic acid anodized film layer by using a constant pressure of gradient boosting.
Background
At present, the formula adopted by oxalic acid anodization is triacid (sulfuric acid + oxalic acid + tartaric acid), and the adopted power supply mode is constant direct current control. When the oxalic acid anodizing treatment is carried out on parts with different shapes, surface areas or numbers, different currents need to be set according to the number, the shapes and the surface areas of the parts, and the operation is complicated. In addition, because the part is integrally anodized by oxalic acid, in order to ensure the size and the surface luminosity requirements of the part, the part needs to be grinded or grinded after being anodized by oxalic acid, but the thickness range of the film layer prepared by the method is large, the difference between the thickest part and the thinnest part can be +/-10 microns, the thickness uniformity is poor, and the subsequent grinding or grinding processing difficulty is large.
Disclosure of Invention
The invention aims to provide a process method for accurately controlling the thickness of an oxalic acid anodized film layer by a gradient boosting constant pressure, which solves the problems that the anodized film layer prepared by the existing constant direct current control method has a large thickness range (+/-10 microns), poor uniformity, and complicated operation when oxalic acid anodization is carried out on parts with different shapes, numbers and surface areas. The method can accurately control the thickness of the anodized film layer of the part within a tolerance range of +/-5 microns, meets the requirement of more than or equal to 350HV for hardness, and is suitable for parts with different shapes, numbers and surface areas.
The technical scheme of the invention is as follows:
a process method for accurately controlling the thickness of an oxalic acid anodized film layer by constant pressure with gradient boosting is characterized by comprising the following steps:
step 1, performing an oxalic acid anodizing test on a test piece by using a constant direct current control method;
step 1.1, selecting a test piece, and calculating the current required by oxalic acid anodizing by using a constant direct current control method according to the shape and the surface area of the test piece and the thickness h of a target film layer;
step 1.2, performing an oxalic acid anodizing test on the test piece by using a constant direct current control method under the current calculated in the step 1.1 until the test is finished, and recording a final voltage value v and test time t;
step 2, determining technological parameters;
step 2.1, dividing the whole test into n test stages, wherein each test stage comprises a boosting process and a constant-pressure maintaining process; wherein n is a natural number greater than or equal to 2;
step 2.2, taking the final voltage value v recorded in the step 1 as a constant voltage value of the nth test stage, and taking the test duration t recorded in the step 1 as the total duration of the n test stages;
step 2.3, determining the value of n, the constant pressure values of the first n-1 test stages, the duration of the boosting process of each test stage and the duration of the constant pressure maintaining process of each test stage through tests;
and 3, performing oxalic acid anodizing treatment on the target parts with different shapes, surface areas or quantities according to the process parameters determined in the step 2, and forming a film layer with the thickness of h +/-5 micrometers and the hardness of more than or equal to 350HV on the surface of the target part.
Further, the constant voltage values at the 1 st to nth test stages are in an arithmetic progression from small to large.
Further, the duration of the boosting process is equal in each test phase.
Further, step 2.3 specifically includes:
let n equal 2; the constant pressure value of the 1 st test stage is v/2, and the constant pressure value of the 2 nd test stage is v; the duration of the boosting process of the 1 st test stage and the 2 nd test stage is t2s(ii) a The duration of the constant pressure maintaining process of the 1 st test stage and the 2 nd test stage is t1h、t2h(ii) a Wherein 2t2s+t21h+t22hT; on the premise of satisfying the relation, t is adjusted2s、t21h、t22hObtaining a plurality of groups of technological parameters; root of herbaceous plantAccording to the process parameters, film layers with different uniformity and hardness are formed on the surface of the test piece;
let n be equal to 3, 4, … …, i respectively, i being a natural number greater than or equal to 5; the constant pressure value of the 1 st test stage is v/n, the constant pressure value of the 2 nd test stage is 2v/n, … …, and the constant pressure value of the nth test stage is v; the 1 st test stage, the 2 nd test stage … …, and the nth test stage have the boosting process time length tis(ii) a The duration of the constant pressure maintaining process of the 1 st test stage, the 2 nd test stage, … …, and the nth test stage is ti1h、ti2h、……、tinh(ii) a Wherein ntis+ti1h+ti2h……tinhT; on the premise of satisfying the relation, t is adjustedis、ti1h、ti2h……tinhObtaining a plurality of groups of technological parameters; according to the process parameters, film layers with different uniformity and hardness are formed on the surface of the test piece;
and comparing the uniformity and the hardness of the film under different process parameters, and selecting the process parameter with the best uniformity and the hardness meeting the requirement as the final process parameter.
Further, h in step 1.1 is 65 microns;
the final voltage value V recorded in the step 1.2 is 60V, and the test time t is 105 min;
in step 2.3, the value of n is 6; the constant pressure values at the 1 st to 6 th test stages were: 10V, 20V, 30V, 40V, 50V, 60V; the duration of the pressure boosting process of the 1 st to the 6 th test stages is 5 min; the duration of the constant pressure maintaining process in the 1 st to 6 th test stages is respectively as follows: 10min, 20min, 15 min.
The invention has the beneficial effects that:
1. the invention divides the test process of the oxalic acid anodizing process into a plurality of test stages, each test stage is firstly boosted slowly and then kept for a certain time under constant pressure, the voltage parameter in the test process is controlled by the mode, the problems of too wide thickness range and low accuracy of the oxalic acid anodized film layer of the aluminum alloy are solved, the thickness range of the oxalic acid anodized film layer is accurate to +/-5 um from the original +/-10 um, the grinding allowance is reduced, and the hardness meets the requirement of being more than or equal to 350 HV;
2. the process method is suitable for parts with different shapes, different surface areas and different quantities, does not need to adjust the voltage value, has simple operation process and can realize batch production.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, specific embodiments thereof will be described in detail below, and it is apparent that the described embodiments are a part, but not all, of the embodiments of the present invention. All other embodiments, which can be obtained by a person skilled in the art without making creative efforts based on the embodiments of the present invention, shall fall within the protection scope of the present invention.
In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention, but the present invention may be practiced in other ways than those specifically described and will be readily apparent to those of ordinary skill in the art without departing from the spirit of the present invention, and therefore the present invention is not limited to the specific embodiments disclosed below.
Furthermore, reference herein to "one embodiment" or "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one implementation of the invention. The appearances of the phrase "in one embodiment" in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments.
The invention mainly adopts a multi-stage constant-pressure control oxalic acid anodizing process for the aluminum alloy material, the thickness of an anodized film layer of a part is accurately controlled within a tolerance range of +/-5 microns, and the hardness meets the requirement of being more than or equal to 350 HV. The method comprises the steps of firstly, processing related parameters in an anodizing film test process according to a constant direct current control method, setting corresponding process parameters, dividing the whole test into a plurality of test stages, wherein each stage comprises a boosting stage and a constant voltage stage, and the voltage acceleration of each test stage is slowed down by adjusting the number of the test stages and the duration of each stage, so that the growth uniformity and compactness of a film layer are ensured, and meanwhile, the film layer thickness can be more accurately controlled. The rapid increase in voltage may cause severe electrical breakdown to occur, resulting in rapid corrosion of the aluminum metal. And finally, performing oxalic acid anodizing treatment on parts with different shapes, different quantities or different surface areas according to finally determined process parameters. Corresponding process parameters do not need to be adjusted again in the process, the operation process is simple, and batch production can be realized.
The method specifically comprises the following steps:
step 1, firstly, performing an oxalic acid anodizing test on a test piece by utilizing a current common constant direct current control method;
selecting a test piece, and calculating the current required for oxalic acid anodizing by using a constant direct current control method according to the shape and the surface area of the test piece and the thickness h of a target film layer; performing an oxalic acid anodizing test on the test piece by using a constant direct current control method under the calculated current until the test is finished, and recording a final voltage value v and test time t;
step 2, determining technological parameters of the process;
in the process, the whole test process is divided into n test stages, and each test stage comprises a boosting process and a constant-pressure maintaining process; n is a natural number greater than or equal to 2, and can be determined according to specific experiments, and the value of n can be different according to different target film thicknesses; and (3) taking the final voltage value v recorded in the step (1) as a constant voltage value of the nth test stage, namely the last test stage, and taking the test time length t recorded in the step (1) as the total time length of the n test stages, namely the time length of the whole test process is also t.
Secondly, determining the value of n, the constant pressure values of the first n-1 test stages, the duration of the boosting process of each test stage and the duration of the constant pressure maintaining process of each test stage through specific tests;
if n can be made equal to 2 first; the constant pressure value of the 1 st test stage is v/2, and the constant pressure value of the 2 nd test stage is v; 1 st test stage, 2 nd test stageThe duration of the step-up process of the section is t2s(ii) a The duration of the constant pressure maintaining process of the 1 st test stage and the 2 nd test stage is t21h、t22h(ii) a Wherein 2t2s+t21h+t22hT; on the premise of satisfying the relation, t is adjusted2s、t21h、t22hObtaining a plurality of groups of technological parameters; according to the process parameters, film layers with different uniformity and hardness are formed on the surface of the test piece;
then n is equal to 3; the constant pressure value of the 1 st test stage is v/3, the constant pressure value of the 2 nd test stage is 2v/3, and the constant pressure value of the 3 rd test stage is v; the duration of the boosting process of the 1 st test stage, the 2 nd test stage and the 3 rd test stage is t3s(ii) a The duration of the constant pressure maintaining process of the 1 st test stage, the 2 nd test stage and the 3 rd test stage is t31h、t32h、t33h(ii) a Wherein 3t3s+t31h+t32h+t33hT; on the premise of satisfying the relation, t is adjusted3s、t31h、t32h、t33hObtaining a plurality of groups of technological parameters; according to the process parameters, film layers with different uniformity and hardness are formed on the surface of the test piece;
then n is equal to 4; the constant pressure value of the 1 st test stage is v/4, the constant pressure value of the 2 nd test stage is v/2, the constant pressure value of the 3 rd test stage is 3v/4, and the constant pressure value of the 4 th test stage is v; the duration of the boosting process of the 1 st test stage, the 2 nd test stage, the 3 rd test stage and the 4 th test stage is t4s(ii) a The duration of the constant pressure maintaining process of the 1 st test stage, the 2 nd test stage, the 3 rd test stage and the 4 th test stage is t41h、t42h、t43h、t44h(ii) a Wherein 4t4s+t41h+t42h+t43h+t44hT; on the premise of satisfying the relation, t is adjusted4s、t41h、t42h、t43h、t44hObtaining a plurality of groups of technological parameters; according to the above process parameters, in-process testForming film layers with different uniformity and hardness on the surfaces of the sheets;
by the way of analogy, the method can be used,
respectively enabling n to be equal to 5, 6, … …, i, wherein i is a natural number which is more than or equal to 7; adjusting tis、t i1h、 ti2h、ti3h、ti4h、ti5h、ti6h……，tinhObtaining a plurality of groups of technological parameters; according to the process parameters, film layers with different uniformity and hardness are formed on the surface of the test piece;
and comparing the uniformity and the hardness of the film under different process parameters, and selecting the process parameter with the best uniformity and the hardness meeting the requirement as the final process parameter.
Of course, n can be made equal to 2, 4, 6 … … in sequence.
And 3, performing oxalic acid anodizing treatment on the target parts with different shapes, different quantities or different surface areas according to the final process parameters determined in the step 2, and forming a film layer with the thickness of h +/-5 micrometers and the hardness of more than or equal to 350HV on the surface of the target part.
Example 1
In this embodiment, a film layer with a thickness of 65 μm (film thickness) is deposited on the surface of the test piece, and the temperature is maintained at 12.5 ℃ in the whole test process, which includes the following steps:
firstly, according to the size of the test piece, the current required by oxalic acid anodizing treatment by a constant direct current control method is calculated.
For example: the area of a single test piece is 2.1dm2The number of test pieces: 4 pieces, current density: 1.5-1.8A/dm2Current density (current density × area of test piece): 3.15-3.78A, total current (single current x number of test strips): 12.6-15.12A.
Secondly, a constant direct current control method is utilized to carry out an oxalic acid anodizing test on the test piece, the voltage increases in a larger slope when the current increases from 0A to a set current stage, and the voltage uniformly and stably increases along with the increase of time when the constant current stage of stabilizing the current is reached. And recording the final voltage value and the test time length until the test is finished. The final voltage value of this example is 60V, and the test duration is 105 min.
Secondly, dividing the whole test of the invention into n test stages, wherein each test stage comprises a boosting process and a constant-pressure maintaining process; wherein n is a natural number greater than or equal to 2; taking the test duration 105min recorded in the constant direct current control method as the total duration of the n test stages; taking the recorded final voltage value of 60V as the constant voltage value of the nth test stage;
secondly, determining the value of n, the constant voltage values of the first n-1 test stages, the duration of the boosting process of each test stage and the duration of the constant voltage maintaining process of each test stage through tests;
in this embodiment, n is 2, 4, 6;
when n is 2, the constant voltage value of the 1 st test stage is 30V, and the constant voltage value of the 2 nd test stage is 60; the duration of the boosting process of the 1 st test stage and the 2 nd test stage is 17.5 min; the duration of the constant pressure maintaining process of the 1 st test stage and the 2 nd test stage is 35min and 35min respectively; and anodizing the test piece according to the process parameters, namely, in the first test stage, the voltage is increased from 0V to 30V within 17.5min, then the constant voltage is maintained for 35min, and then, in the second test stage, the voltage is increased from 30V to 60V within 17.5min, then the constant voltage is maintained for 35min, so that an anodized film layer is formed on the surface of the test piece.
The duration of the boosting process of the 1 st test stage and the 2 nd test stage can be adjusted to be 15 min; the duration of the constant pressure maintaining process of the 1 st test stage and the 2 nd test stage is respectively 30min and 45 min; and anodizing the test piece according to the process parameters, namely, in the first test stage, the voltage is increased from 0V to 30V within 15min, then the constant voltage is kept for 30min, then, the second test stage is carried out, the voltage is increased from 30V to 60V within 15min, then, the constant voltage is kept for 45min, and an anodized film layer is formed on the surface of the test piece.
When n is 4, the constant voltage value of the 1 st test stage is 15V, the constant voltage value of the 2 nd test stage is 30V, the constant voltage value of the 3 rd test stage is 45V, and the constant voltage value of the 4 th test stage is 60V; the duration of the pressure boosting process of the 1 st test stage, the 2 nd test stage, the 3 rd test stage and the 4 th test stage is 8.75 min; the duration of the constant pressure maintaining process of the 1 st test stage, the 2 nd test stage, the 3 rd test stage and the 4 th test stage is 17.5 min; and anodizing the test piece according to the process parameters to form an anodized film layer on the surface of the test piece.
Adjusting the duration of the boosting process of the 1 st test stage, the 2 nd test stage, the 3 rd test stage and the 4 th test stage to be 5 min; the duration of the constant pressure maintaining process of the 1 st test stage, the 2 nd test stage, the 3 rd test stage and the 4 th test stage is 20min, 20min and 25min respectively; and anodizing the test piece according to the process parameters to form an anodized film layer on the surface of the test piece.
When n is 6, the constant voltage value of the 1 st test stage is 10, the constant voltage value of the 2 nd test stage is 20, the constant voltage value of the 3 rd test stage is 30, the constant voltage value of the 4 th test stage is 40, the constant voltage value of the 5 th test stage is 50, and the constant voltage value of the 6 th test stage is 60; the duration of the boosting process of the 1 st test stage, the 2 nd test stage, the 3 rd test stage, the 4 th test stage, the 5 th test stage and the 6 th test stage is 5 min; the duration of the constant pressure maintaining process of the 1 st test stage, the 2 nd test stage, the 3 rd test stage, the 4 th test stage, the 5 th test stage and the 6 th test stage is respectively 10min, 20min and 15 min; and anodizing the test piece according to the process parameters to form an anodized film layer on the surface of the test piece.
Through inspection, when n is 6, the anodized film layer on the surface of the test piece is the most uniform under the corresponding process parameters, and the hardness also meets the requirement of more than or equal to 350 HV. Therefore, in this embodiment, when n is 6, the corresponding process parameter is selected as the final process parameter.
The specific process parameters determined in this example are as follows:
the first test stage: gradually increasing voltage from 0V to 10V for 5min, and maintaining for 10 min.
And (3) a second test stage: gradually increasing voltage from 10V to 20V for 5min, and maintaining for 10 min.
And a third test stage: gradually increasing voltage from 20V to 30V for 5min, and maintaining for 10 min.
And a fourth test stage: gradually increasing voltage from 30V to 40V for 5min, and maintaining for 10 min.
And a fifth test stage: gradually increasing voltage from 40V to 50V for 5min, and maintaining for 20 min.
A sixth test phase: gradually increasing voltage from 50 to 60V for 5min, and maintaining for 15 min.
The test results of oxalic acid anodization of the test piece according to the above process parameters are as follows: the color of the test piece is uniform and no ablation occurs, 5 points are selected on the test piece each time the thickness is measured, and care is taken not to select the points close to the edge. The results are shown in Table 1, with the average thickness ranging from 63.5 to 67.8um, using the standard thickness of 5 points as the thickness of the individual test pieces.
Table 1, test piece film thickness after oxalic acid anodization in constant pressure mode:
| name (R) | Average thickness |
| Test piece 1 | 63.5um |
| Test piece 2 | 65.3um |
| Test piece 3 | 65.8um |
| Test piece 4 | 67.8um |
And finally, according to the determined process parameters, performing oxalic acid anodizing treatment on the target parts with different shapes, different quantities or different surface areas to form a film layer with the thickness of h +/-5 microns and the hardness of more than or equal to 350HV on the surface of the target part.
Example 2
In this embodiment, 6 samples of the content metering valve were anodized with oxalic acid according to the final process parameters determined in example 1, and the 6 samples were observed for their appearance, uniform in color, and free from ablation. Every time the thickness is measured 5 points are chosen on the sample, taking care not to choose the points close to the edges. The average thickness of the film layer of 5 points is taken as the thickness of the film layer of a single sample piece, the result is shown in table 2, the average thickness range is 60.0-63.8um, and a processed part is sent to a detection center to detect the thickness and the hardness of the film layer, and the detection shows that the thickness of the film layer of the sample piece is 60um, the hardness is 354HV0.1, the film layer meets the requirements of 60-70 microns, and the hardness is more than or equal to 350 HV.
Table 2, constant pressure mode oxalic acid anodized sample film thickness:
example 3
In order to verify that the process parameters can be suitable for machining parts with different quantities, the embodiment selects the internal measurement valve sample pieces, the quantity of the internal measurement valve sample pieces is increased to 10 pieces, oxalic acid anodizing treatment machining is carried out according to the process parameters determined in the embodiment 1, and the machined 10 pieces of parts are observed to have uniform appearance and uniform color and have no ablation phenomenon. Every time the thickness of the film layer was measured, 5 points were chosen on the part, taking care not to choose the points close to the edges. The average thickness of 5 points is taken as the thickness of a film layer of a single part, the result is shown in Table 3, the average thickness of the film layer ranges from 62.2 um to 65.4um, and a processed part is sent to an inspection and detection center to be subjected to film layer thickness and hardness detection, wherein the thickness is 65um, the hardness is 361HV0.1, the requirements of 60-70 micrometers and the hardness is more than or equal to 350HV are met.
Table 3, constant pressure mode oxalic acid anodized sample film thickness:
| name (R) | Average thickness |
| Sample 1 | 63.5um |
| Sample 2 | 62.2um |
| Sample 3 | 62.7um |
| Sample 4 | 64.5um |
| Sample 5 | 65.0um |
| Sample 6 | 64.8um |
| Sample 7 | 65.4um |
| Sample 8 | 62.9um |
| Sample 9 | 63.7um |
| Sample 10 | 64.8um |
Example 4
In order to verify that the process parameters can be suitable for machining parts with different shapes and areas, the number of the bushings is 3, the process parameters are obtained according to the embodiment 1, and the 3 bushings are subjected to oxalic acid anodizing treatment. And the appearance of the machined part is observed, and 3 parts of the bushings are uniform in color and have no ablation phenomenon. Every time the thickness of the film layer was measured, 5 points were chosen on the part, taking care not to choose the points close to the edges. The average thickness of 5 points is taken as the thickness of a film layer of a single part, the result is shown in Table 4, the average thickness of the film layer ranges from 61.5 um to 63.0um, and a processed part is sent to an inspection and detection center to be subjected to thickness and hardness detection, wherein the thickness is 63um, the hardness is 365HV0.1, the requirements of 60-70 micrometers and the hardness is more than or equal to 350HV are met.
Table 4, constant pressure mode oxalic acid anodized sample film thickness:
| name (R) | Average thickness |
| Sample 1 | 62.9um |
| Sample 2 | 61.5um |
| Sample 3 | 63.0um |
Through the embodiments, it can be seen that after the process method determined by the invention is used for oxalic acid anodization, the film thickness of the test piece is relatively uniform and is basically controlled within the range of 65 +/-5 micrometers, and oxalic acid anodization tests of three groups of parts prove that the process method determined by the invention is beneficial to uniform and fine formation of a hard anodized film, and the film thickness and hardness of the parts can be controlled by oxalic acid anodization tests of parts with different numbers, areas and shapes, and the initial target that the thickness is 65 +/-5 micrometers and the hardness is more than or equal to 350HV is met.
The binding assay case requires attention:
1. the bath solution must be analyzed once a week (whether the electrolytic bath leaks or not is firstly checked by eyes during analysis and sampling), the stability of the solution is ensured, and analysis, adjustment and record are made and the solution is properly stored.
2. The apparatus and KMF-300A/100V oxalic acid anodizing power supply were maintained once a day.
3. The whole operation process has to have two operators and the operators are responsible for monitoring on the spot.
4. In the case of stopping the gas (compressed air) or power failure, the operator immediately takes out the part from the anodizing bath within three minutes, and immediately performs the flow cleaning process.
5. According to the automatic specification of the oxalic acid anodization power supply, the power supply control precision is as follows: 5%, allowing a current error of 10A due to the power supply device itself.
6. The oxalic acid anodizing bath is covered when the parts are not processed, so that cross contamination between bath solutions is prevented.
7. In the process of cleaning the test piece with water, the cleaning quality of the water is required to be controlled, and the conductivity of the water is required to be less than 50 mu s/cm.
Claims (5)
1. A process method for accurately controlling the thickness of an oxalic acid anodized film layer by using a gradient boosting constant pressure is characterized by comprising the following steps of:
step 1, performing an oxalic acid anodizing test on a test piece by using a constant direct current control method;
step 1.1, selecting test pieces, and calculating the current required by oxalic acid anodizing by using a constant direct current control method according to the shape, the number, the surface area and the target film layer thickness h of the test pieces;
step 1.2, performing an oxalic acid anodizing test on the test piece by using a constant direct current control method under the current calculated in the step 1.1 until the test is finished, and recording a final voltage value v and test time t;
step 2, determining technological parameters;
step 2.1, dividing the whole test into n test stages, wherein each test stage comprises a boosting process and a constant-pressure maintaining process; wherein n is a natural number greater than or equal to 2;
step 2.2, taking the final voltage value v recorded in the step 1 as a constant voltage value in the constant voltage maintaining process in the nth test stage, and taking the test time length t recorded in the step 1 as the total time length of the n test stages;
step 2.3, determining the value of n, the constant pressure value of the constant pressure maintaining process in the first n-1 test stages, the duration of the boosting process of each test stage and the duration of the constant pressure maintaining process of each test stage through tests to obtain final process parameters;
and 3, performing oxalic acid anodizing treatment on the target parts with different shapes, surface areas or quantities according to the final process parameters determined in the step 2, and forming a film layer with the thickness of h +/-5 micrometers and the hardness of more than or equal to 350HV on the surface of the target part.
2. The process method for accurately controlling the thickness of the oxalic acid anodized film layer by the constant voltage of the gradient boosting according to claim 1, is characterized in that: the constant voltage values of the 1 st to the nth test stages are in an arithmetic progression from small to large.
3. The process method for accurately controlling the thickness of the oxalic acid anodized film layer by the constant voltage of the gradient boosting according to claim 2, is characterized in that: the duration of the boosting process is equal for each test phase.
4. The process method for accurately controlling the thickness of the oxalic acid anodized film layer by the constant voltage of the gradient voltage boosting according to the claim 3, wherein the step 2.3 is specifically as follows:
let n equal 2; the constant pressure value of the 1 st test stage is v/2, and the constant pressure value of the 2 nd test stage is v; the duration of the boosting process of the 1 st test stage and the 2 nd test stage is t2s(ii) a The duration of the constant pressure maintaining process of the 1 st test stage and the 2 nd test stage is t1h、t2h(ii) a Wherein 2t2s+t21h+t22hT; on the premise of satisfying the relation, t is adjusted2s、t21h、t22hObtaining a plurality of groups of technological parameters; according to the process parameters, film layers with different uniformity and hardness are formed on the surface of the test piece;
let n be equal to 3, 4, … …, i respectively, i being a natural number greater than or equal to 5; the constant pressure value of the 1 st test stage is v/n, the constant pressure value of the 2 nd test stage is 2v/n, … …, and the constant pressure value of the nth test stage is v; the 1 st test stage, the 2 nd test stage … …, and the nth test stage have the boosting process time length tis(ii) a The duration of the constant pressure maintaining process of the 1 st test stage, the 2 nd test stage, … …, and the nth test stage is ti1h、ti2h、……、tinh(ii) a Wherein ntis+ti1h+ti2h……tinhT; on the premise of satisfying the relation, t is adjustedis、ti1h、ti2h……tinhObtaining a plurality of groups of technological parameters; according to the process parameters, film layers with different uniformity and hardness are formed on the surface of the test piece;
and comparing the uniformity and the hardness of the film under different process parameters, and selecting the process parameter with the best uniformity and the hardness meeting the requirement as the final process parameter.
5. The process method for accurately controlling the thickness of the oxalic acid anodized film layer with the constant voltage of the gradient voltage boost according to the claim 4, wherein in the step 1.1, h is 65 microns;
the final voltage value V recorded in the step 1.2 is 60V, and the test time t is 105 min;
in step 2.3, the value of n is 6; the constant pressure values at the 1 st to 6 th test stages were: 10V, 20V, 30V, 40V, 50V, 60V; the duration of the pressure boosting process of the 1 st to the 6 th test stages is 5 min; the duration of the constant pressure maintaining process in the 1 st to 6 th test stages is respectively as follows: 10min, 20min, 15 min.
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