CN114265230A - Display panel, manufacturing method thereof and display device - Google Patents

Display panel, manufacturing method thereof and display device Download PDF

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Publication number
CN114265230A
CN114265230A CN202111634389.1A CN202111634389A CN114265230A CN 114265230 A CN114265230 A CN 114265230A CN 202111634389 A CN202111634389 A CN 202111634389A CN 114265230 A CN114265230 A CN 114265230A
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China
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layer
light
substrate
transparent
display panel
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CN202111634389.1A
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李辉
郑浩旋
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HKC Co Ltd
Mianyang HKC Optoelectronics Technology Co Ltd
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HKC Co Ltd
Mianyang HKC Optoelectronics Technology Co Ltd
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Priority to CN202111634389.1A priority Critical patent/CN114265230A/en
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Abstract

The application discloses display panel and manufacturing method and display device thereof, display panel and blue light source backlight unit range upon range of setting relatively, display panel includes first base plate and second base plate, first base plate with the second base plate sets up relatively, first base plate includes red filter layer, green filter layer, stratum lucidum and the cover that the array was arranged red filter layer green filter layer with the stratum lucidum's flat layer, the flat layer include with the diaphane portion that the stratum lucidum corresponds the setting, at least one of them is provided with coarse texture in diaphane portion and the stratum lucidum, coarse texture will blue light source backlight unit direct extremely send after scattering takes place for the light scattering of stratum lucidum. This application is through above-mentioned scheme with the inclined problem of the role that looks sideways who improves display panel.

Description

Display panel, manufacturing method thereof and display device
Technical Field
The present disclosure relates to the field of display technologies, and in particular, to a display panel, a manufacturing method thereof, and a display device.
Background
A TFT-lcd (thin Film Transistor Liquid Crystal display) gradually becomes the leading technology in the field of flat panel display due to the advantages of low power consumption, high image quality, low price, and the like. The liquid crystal display surface consists of a display panel and a backlight module, wherein the display panel consists of an array substrate provided with a thin film transistor, a color film substrate and a middle liquid crystal; however, the conventional color filter has poor light utilization rate and low transmittance, and the conventional color resistance material has a wide half-peak width and limited color concentration, is difficult to realize a wide color gamut, and cannot meet the quality requirement of a user on display. The quantum dots can emit high-purity monochromatic light, so that the transmittance and color gamut of the display can be improved, and the quantum dots are widely applied to the display. Compared with the traditional TFT-LCD, the quantum dot display applies quantum dots to pixels in a color substrate, the red and green sub-pixel areas are mixed with the quantum dots, the blue pixel area is replaced by a transparent layer, and the corresponding backlight source uses a blue backlight source.
However, it is found that in the above technology, the light emitted from the blue backlight directly transmits through the transparent layer, and the linearity thereof is strong, so that the side-viewing role is serious, and therefore, it is necessary to provide an improved technology to solve the problem.
Disclosure of Invention
The application aims to provide a display panel, a manufacturing method thereof and a display device, so as to solve the problem of side view character deviation of the display panel.
The application discloses display panel for with blue light source backlight unit range upon range of setting relatively, display panel includes first base plate and second base plate, first base plate with the second base plate sets up relatively, first base plate includes red filter layer, green filter layer, stratum lucidum and the cover that the array was arranged red filter layer green filter layer with the stratum lucidum's flat layer, the flat layer include with the stratum lucidum corresponds the printing opacity portion that sets up, at least one of them is provided with coarse texture with the stratum lucidum, coarse texture makes blue light source backlight unit penetrate directly to the scattering takes place for the light of stratum lucidum.
Optionally, the red filter layer is internally filled with red quantum dots, the green filter layer is internally filled with green quantum dots, the transparent layer includes a transparent photoresist, and the rough structure is disposed on one side of the transparent photoresist close to the second substrate.
Optionally, the transparent layer includes a transparent photoresist, and the roughness structure is disposed on a side of the light-transmitting portion close to the second substrate.
Optionally, the transparent layer includes a transparent photoresist, and the rough structures are respectively disposed on a side of the transparent photoresist close to the second substrate and a side of the light-transmitting portion close to the second substrate.
Optionally, the roughness structure comprises a plurality of protrusions or pits, and the radial width of each protrusion or pit is between 50nm and 500 nm.
Optionally, the rough structure is formed by a mask technology.
The application also discloses a manufacturing method of the display panel, which comprises the following steps:
forming a red filter layer, a green filter layer and a transparent layer which are arranged in an array manner on a substrate;
forming a flat layer on the red filter layer, the green filter layer and the transparent layer to form a first substrate;
forming a second substrate, and forming a display panel by aligning the first substrate and the second substrate;
the step of forming the red filter layer, the green filter layer and the transparent layer which are arranged in an array on the substrate further comprises the step of forming a rough structure on the transparent layer through a photomask; or
The step of forming a flat layer on the red filter layer, the green filter layer and the transparent layer to form the first substrate further comprises the step of forming a rough structure on a light-transmitting part of the flat layer, which is arranged corresponding to the transparent layer, through a photomask;
the photomask comprises a light-transmitting area and a non-light-transmitting area, the light-transmitting area comprises a plurality of full light-transmitting areas and a plurality of semi-light-transmitting areas, the full light-transmitting areas and the semi-light-transmitting areas are arranged in a staggered mode, the non-light-transmitting areas correspond to red filter layers and green filter layers, the light-transmitting areas correspond to transparent layers, and the rough structure is formed through exposure and development of the photomask.
Optionally, the transmittance in full light-transmitting region is 100%, the transmittance in half light-transmitting region is between 10% to 70%, the full light-transmitting region with the area in half light-transmitting region is between 15um to 5um respectively.
Optionally, the transmittance of each semi-transparent region is the same.
The application also discloses a display device, including blue light source backlight unit and as above-mentioned display panel, display panel sets up blue light source backlight unit's play plain noodles, blue light source backlight unit does display panel provides blue backlight.
The light emitted by the blue light source backlight module irradiates the first substrate after passing through the second substrate, wherein the blue backlight can excite the red filter layer and the green filter layer to emit corresponding red light and green light, the blue backlight can scatter after passing through the red filter layer and the green filter layer, the blue backlight penetrates through the transparent layer to emit blue light, and the general collimation of the blue light is higher. This application sets up coarse structure through the region at the stratum lucidum, on the rete of stratum lucidum, makes light take place the scattering through this coarse structure, and this coarse structure makes the blue light take place the scattering promptly, increases the transmittance of viewing angle direction blue light. Blue color cast that blue light is not enough to lead to under having improved display panel large visual angle condition has improved simultaneously because the higher blue light of collimation nature is watched in the front also can cause visual fatigue more easily, causes the injury to the eyesight, weakens the light of penetrating the people's eye directly promptly, plays the effect of protection people's eye.
Drawings
The accompanying drawings, which are included to provide a further understanding of the embodiments of the application, are incorporated in and constitute a part of this specification, illustrate embodiments of the application and together with the description serve to explain the principles of the application. It is obvious that the drawings in the following description are only some embodiments of the application, and that for a person skilled in the art, other drawings can be derived from them without inventive effort. In the drawings:
fig. 1 is a schematic view of a display panel according to a first embodiment of the present application;
FIG. 2 is a schematic diagram of a display panel according to a second embodiment of the present application;
FIG. 3 is a schematic view of a display panel according to a third embodiment of the present application;
FIG. 4 is a schematic diagram illustrating a manufacturing method of a display panel according to a fourth embodiment of the present application;
FIG. 5 is a schematic view of a mask according to a fourth embodiment of the present application;
FIG. 6 is a first enlarged schematic view of sub-pixel area A of FIG. 5;
FIG. 7 is a diagram illustrating a transparent photoresist according to a fourth embodiment of the present application;
FIG. 8 is a second enlarged schematic view of sub-pixel area A of FIG. 5;
fig. 9 is a schematic view of a display device according to a fifth embodiment of the present application.
Wherein, 1, a display device; 10. a display panel; 20. a blue light source backlight module; 100. a first substrate; 110. a red filter layer; 120. a green filter layer; 130. a transparent layer; 131. transparent photoresist; 132. a planarization layer; 133. a light-transmitting portion; 140. a coarse structure; 141. a protrusion; 150. a black light-shielding layer; 180. a liquid crystal layer; 190. a second substrate; 300. a photomask; 310. a light-transmitting region; 311. a full light-transmitting area; 312. a semi-opaque region; 320. a non-light-transmitting region.
Detailed Description
It is to be understood that the terminology, the specific structural and functional details disclosed herein are for the purpose of describing particular embodiments only, and are representative, but that the present application may be embodied in many alternate forms and should not be construed as limited to only the embodiments set forth herein. In the description of the present application, the terms "first", "second" are used for descriptive purposes only and are not to be construed as indicating relative importance or as implicitly indicating the number of technical features indicated. Thus, unless otherwise specified, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature; "plurality" means two or more. In addition, terms of orientation or positional relationship indicated by "upper", "lower", and the like, are described based on the orientation or relative positional relationship shown in the drawings, and are only for convenience of simplifying the description of the present application, and do not indicate that the referred device or element must have a specific orientation, be configured and operated in a specific orientation, and thus, should not be construed as limiting the present application. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
The present application is described in detail below with reference to the figures and alternative embodiments.
The first embodiment is as follows:
fig. 1 shows a schematic diagram of a display panel according to a first embodiment of the present application, where the display panel 10 is used to be stacked opposite to a blue light source backlight module 20, and a backlight source in the present embodiment is a blue backlight provided by the blue light source backlight module 20, and the blue backlight passes through the display panel 10 to enable the display panel 10 to display color image information.
The display panel 10 provided in this embodiment includes a first substrate 100 and a second substrate 190, the first substrate 100 and the second substrate 190 are disposed opposite to each other, the first substrate 100 includes a red filter layer 110, a green filter layer 120, and a transparent layer 130 arranged in an array, a rough structure 140 is disposed on the transparent layer 130, and the rough structure 140 scatters light directly incident on the transparent layer 130 from the blue light source backlight module 20.
The light emitted from the blue light source backlight module 20 of the present application passes through the second substrate 190 and then irradiates the first substrate 100, wherein the blue backlight can excite the red filter layer 110 and the green filter layer 120 to emit corresponding red light and green light, the blue backlight can scatter when passing through the red filter layer 110 and the green filter layer 120, the blue backlight passes through the transparent layer 130 to emit blue light, and the blue light has generally high collimation. In the present application, the rough structure 140 is disposed on the film layer of the transparent layer 130 in the region of the transparent layer 130, and the light is scattered through the rough structure 140, that is, the blue light is scattered through the rough structure 140, so that the transmittance of the blue light in the side view angle direction is increased. The blue color shift caused by insufficient blue light under the condition of large viewing angle of the display panel 10 is improved. Meanwhile, the problem that the vision fatigue is easily caused by the fact that the blue light with high collimation is watched from the front side is solved, the vision is damaged, namely the light which directly irradiates the human eyes is weakened, and the effect of protecting the human eyes is achieved.
In the display panel 10 of the first embodiment, taking the liquid crystal display panel 10 as an example, the first substrate 100 is a color film substrate, the second substrate 190 is an array substrate, and the display panel further includes a liquid crystal layer 180, the liquid crystal layer 180 is disposed between the array substrate and the color film substrate, and the display panel 10 can change a deflection angle of the liquid crystal by changing voltages at two sides of the liquid crystal layer 180, so as to control the display panel 10 to display different images. The blue light source backlight module 20 of the embodiment of the present invention is generally disposed on a side of the second substrate 190 away from the first substrate 100, light emitted from the blue light source backlight module 20 sequentially passes through the second substrate 190, the liquid crystal layer 180 and the first substrate 100, and the rough structure 140 is a roughened uneven structure such as a plurality of protrusions 141 or pits, i.e., a structure capable of scattering collimated light, the protrusions 141 and pits are generally nano-sized or micro-sized, the rough structure 140 mentioned in the present application is disposed on a film structure of the first substrate 100, and specific film layers are set forth in the following embodiments.
In this embodiment, the red filter layer 110 is filled with red quantum dots, the green filter layer 120 is filled with green quantum dots, the transparent layer 130 includes a transparent photoresist 131, and the roughness structure 140 is disposed on one side of the transparent photoresist 131 close to the second substrate 190. The red filter layer 110 is a red sub-pixel, the green filter layer 120 is a green sub-pixel, and the transparent layer 130 is a blue sub-pixel, which form a pixel unit. The red quantum dots and the green quantum dots are quantum dot materials respectively, for example, the red quantum dots can emit red light under the excitation of blue light, and the red light is emitted in a scattering manner, so that the color cast does not exist in the areas of the red sub-pixels and the green sub-pixels. The quantum dot material in the red sub-pixel and the quantum dot material in the green sub-pixel can be selected from II-VI or III-V group quantum dot materials, such as one or more of CdS, CdSe, CdTe, ZnS and the like. The transparent photoresist 131 is formed using an organic resin material.
Specifically, the first substrate 100 further includes a black light-shielding layer 150, the black light-shielding layer 150 is generally a black matrix, etc., the black light-shielding layer 150 is disposed on the same layer as the red sub-pixel, the green sub-pixel and the transparent photoresist 131, the black light-shielding layer 150, the red sub-pixel and the green sub-pixel are sequentially prepared in the process, and the transparent photoresist 131 having the rough structure 140 is formed, the rough structure 140 of the transparent photoresist 131 is formed by directly performing a roughening process by using a mask technology in the process of forming the transparent photoresist 131, so as to form the rough structure 140, and the mask technology is further described in the following embodiments. The first substrate 100 further includes a flat layer 132, the flat layer covers the black light-shielding layer 150, the red sub-pixels, the green sub-pixels, and the transparent photoresist 131, the flat layer 132 is finally formed, and the flat layer structure can insulate the quantum dot materials in the red sub-pixels and the green sub-pixels from water and oxygen. It should be noted that, in this embodiment, the flat layer 132 is not necessary, and other films capable of insulating water and oxygen may be used, the flat layer mainly plays a role of insulating water and oxygen, and other films capable of insulating water and oxygen should also fall within the protection scope of the present application.
Specifically, the roughness 140 includes a plurality of protrusions 141 or pits, and each of the protrusions 141 or pits has a radial width of 50nm to 500 nm. In addition, the rough structure 140 in this embodiment is disposed on the transparent photoresist 131, and the transparent photoresist 131 is further disposed with a flat layer, so that the rough structure 140 is a rough interface between the transparent photoresist 131 and the flat layer, within this range, the light emitted from the blue light source backlight module 20 will be scattered at the rough structure 140, thereby improving the side view angle of the blue pixel and reducing the light directly irradiating human eyes, and achieving the effect of protecting human eyes.
Example two:
as shown in fig. 2, which is a schematic view of a display panel according to a second embodiment of the present application, the display panel 10 includes a first substrate 100 and a second substrate 190, the first substrate 100 includes a red filter layer 110, a green filter layer 120, a transparent layer 130 arranged in an array, and a planarization layer 132 covering the red filter layer 110, the green filter layer 120 and the transparent layer 130, the planarization layer 132 includes a light-transmitting portion 133 disposed corresponding to the transparent layer 130, the red filter layer 110 includes red sub-pixels, which are filled with red quantum dots, the green filter layer 120 includes a green sub-pixel, which is filled with green quantum dots, the transparent layer 130 includes a transparent photoresist 131, the roughness 140 is disposed on a side of the light-transmitting portion 133 adjacent to the second substrate 190, the rough structure 140 scatters the light directly emitted from the blue light source backlight module 20 to the transparent layer 130, and then emits the scattered light.
The roughness 140 in this embodiment is disposed on the light-transmitting portion 133 of the flat layer 132, and the light-transmitting portion 133 is disposed corresponding to the transparent layer 130, so as to achieve the effect of scattering light of the transparent layer 130. The difference is that the thickness of the planarization layer 132 is thicker, and the roughness 140 formed on the planarization layer 132 is more selective than the roughness 140 formed on the transparent photoresist 131. Furthermore, the flat layer 132 may have a larger area for disposing the roughness structure 140 than on the transparent photoresist 131, as will be described below.
Specifically, the first substrate 100 further includes a black light-shielding layer 150, the black light-shielding layer 150 is generally, for example, a black matrix, the black light-shielding layer 150 is disposed on the same layer as the red sub-pixel, the green sub-pixel, and the transparent photoresist 131, the black light-shielding layer 150, the red sub-pixel, the green sub-pixel, and the transparent photoresist 131 are sequentially prepared in the process, the flat layer 132 covers the black light-shielding layer 150, the red sub-pixel, the green sub-pixel, and the transparent photoresist 131, the flat layer 132 is finally formed, and the flat layer 132 can insulate the quantum dot material in the red sub-pixel and the green sub-pixel from water and oxygen. In this embodiment, the flat layer 132 may be disposed to cover the black light-shielding layer 150, the red sub-pixel, the green sub-pixel and the transparent photoresist 131, and the rough structure 140 may be correspondingly disposed in a region where the flat layer 132 covers the black light-shielding layer 150 and the transparent photoresist 131, light emitted from the blue light source backlight module 20 toward the first substrate 100 is generally highly collimated, and light corresponding to the black light-shielding layer 150 is absorbed by the black light-shielding layer 150, so as to cause a decrease in brightness of the display panel 10. Further, the roughness 140 may be disposed at a position where the flat layer 132 covers the black mask layer 150, the red sub-pixel, the green sub-pixel and the transparent photoresist 131.
After the process is completed, the planarization layer 132 is roughened by a mask technique, which is described in the following embodiments, to form the roughness structure 140. Of course, the physical manner may be, for example, rubbing treatment, so that the roughness 140 is formed at the corresponding position of the flat layer 132. The embodiment further has a modified embodiment, that is, the transparent layer 130 is not provided with the transparent photoresist 131 in the region corresponding to the transparent layer 130, and the transparent layer 130 is filled with the flat layer 132 protruding downward, that is, the transparent layer 130 is filled with the flat layer 132 at the position of the transparent photoresist 131, specifically, the roughness structure 140 includes a plurality of protrusions 141 or pits, and the radial width of each protrusion 141 or pit is between 50nm and 500 nm. In this range, the light emitted from the blue light source backlight module 20 will be scattered at the rough structure 140, so as to improve the side view angle of the blue pixel and reduce the light directly irradiating human eyes, thereby achieving the effect of protecting human eyes.
Example three:
fig. 3 is a schematic diagram of a display panel according to a third embodiment of the present disclosure, where the display panel 10 includes a first substrate 100 and a second substrate 190, the first substrate 100 includes a red filter layer 110, a green filter layer 120, a transparent layer 130, and a flat layer 132 covering the red filter layer 110, the green filter layer 120, and the transparent layer 130, the flat layer 132 includes a light-transmitting portion 133 corresponding to the transparent layer 130, the red filter layer 110 includes a red sub-pixel, the red sub-pixel is filled with a red quantum dot, the green filter layer 120 includes a green sub-pixel, the green sub-pixel is filled with a green quantum dot, and the rough structures 140 are respectively disposed on a side of the transparent photoresist 131 close to the second substrate 190 and a side of the light-transmitting portion 133 close to the second substrate 190. That is, the third embodiment of the present application combines the designs of the first and second embodiments, that is, the rough structure 140 is disposed on the transparent photoresist 131 and the rough structure 140 is disposed on the light-transmitting portion 133 of the planarization layer 132, so that the amount of direct blue light is reduced to the greatest extent by double-layer diffusion, thereby achieving a better eye-protecting effect.
It should be noted that, although the roughness 140 of the three embodiments is only designed on the transparent photoresist 131 or the flat layer 132, the embodiments are also applicable to other layers on the first substrate 100 or the second substrate 190, and the embodiments only take the transparent photoresist 131 and the flat layer 132 as examples, and the roughness 140 mentioned in the embodiments is disposed on other layers, which also belong to the protection scope of the present application.
Example four:
fig. 4 is a schematic diagram illustrating a manufacturing method of a display panel according to a fourth embodiment of the present application, the manufacturing method of the display panel including the steps of:
s10: forming a red filter layer, a green filter layer and a transparent layer which are arranged in an array manner on a substrate;
s20: forming a flat layer on the red filter layer, the green filter layer and the transparent layer to form a first substrate;
s30: forming a second substrate, and forming a display panel by aligning the first substrate and the second substrate;
in S20, the step of forming the red filter layer, the green filter layer, and the transparent layer arranged in an array on the substrate further includes:
s21: a step of forming a roughness structure on the transparent layer through a photomask;
or
In the step of S30, the step of forming a planarization layer on the red filter layer, the green filter layer and the transparent layer to form the first substrate further includes:
s31: a step of forming a rough structure on a light-transmitting portion of the flat layer provided corresponding to the transparent layer through a mask;
one or both of S21 and S31 in the above steps may be selected for use, corresponding to the display panels formed in the first, second and third embodiments, respectively. The rough structure in the method for manufacturing a display panel in this embodiment only involves forming through a mask, but it is within the scope of the present application that the rough structure in the first to third embodiments is formed through a physical means such as friction.
Fig. 5 is a schematic diagram of a photomask according to a fourth embodiment of the present invention, fig. 6 is a first enlarged schematic diagram corresponding to a sub-pixel area a in fig. 5, in which the photomask 300 of the present embodiment mainly functions to form the above-mentioned roughness structure 140 on a film, the photomask 300 is used to dispose the roughness structure 140 on a transparent photoresist 131, the photomask 300 includes a light-transmitting region 310 and a non-light-transmitting region 320, the light-transmitting region 310 includes a plurality of full light-transmitting regions 311 and a plurality of semi-light-transmitting regions 312, the plurality of full light-transmitting regions 311 and the plurality of semi-light-transmitting regions 312 are alternately disposed, the non-light-transmitting region 320 is disposed corresponding to the red filter layer 110 and the green filter layer 120, the light-transmitting region 310 is disposed corresponding to the transparent layer 130, and the roughness structure 140 is formed by exposing and developing the photomask 300.
The transparent layer 130 is mainly provided with a transparent area 310 in the area corresponding to the mask 300, and the areas corresponding to the red filter layer 110 and the green filter layer 120 are provided with non-transparent areas, so that the roughening treatment of the transparent layer 130 will not affect the red filter layer 110 and the green filter layer 120. Taking the negative photoresist as an example, during exposure, the transparent layer regions have different transmittances, so that the crosslinking degrees are different, and the surface development resistance is different, so that a concave-convex interface can be formed; the corresponding transparent region 310 includes a plurality of full transparent regions 311 and semi-transparent regions 312, which are alternately disposed, such that when the transparent photoresist 131 is exposed to light by the mask 300, a plurality of protrusions 141 or recesses are formed on the corresponding transparent photoresist 131, thereby forming the roughness structure 140.
It should be noted that the mask 300 of the present embodiment is disposed corresponding to the negative transparent photoresist 131, if the mask is the transparent photoresist 131 made of the positive photoresist material, the mask 300 may be correspondingly disposed with a light-transmitting region 310 and a non-light-transmitting region 320, the light-transmitting region 310 is disposed corresponding to the red filter layer 110 and the green filter layer 120, the non-light-transmitting region 320 is disposed corresponding to the transparent photoresist 131, the non-light-transmitting region 320 is disposed with a plurality of semi-light-transmitting regions 312, the non-light-transmitting regions 320 are divided into a plurality of sub-non-light-transmitting regions 320 by the plurality of semi-light-transmitting regions 312, and the plurality of semi-light-transmitting regions 312 and the plurality of sub-non-light-transmitting regions 320 are disposed in a staggered manner. The design is the reverse of the negative photoresist mask 300, and the design is also within the scope of the present application.
Specifically, the transmittance of the fully light-transmitting region 311 is 100%, and the transmittance of the semi-light-transmitting region 312 is between 10% and 70%, specifically, the transmittance of the semi-light-transmitting region 312 may be 70%, or may be 60%, 50%, 40%, 30%, 20%, 10%, or the like. The different transmittance may cause the light intensity received by the transparent photoresist 131 to be different, so that the photosensitive removal degree is different, and the height or depth of the formed protrusion 141 or pit is different. The areas of the full-light-transmitting region 311 and the half-light-transmitting region 312 are respectively between 15um × 15um and 5um × 5um, and the specific area can be set to 15um × 15um, or 10um × 10um or 5um × 5 um. Generally, the shape of the full light-transmitting region 311 and the semi-light-transmitting region 312 is a block distribution, so that the structural distribution of the protrusions 141 or the pits in the roughness structure 140 is more uniform. Wherein, the transmittance of each semi-transparent region 312 is the same.
As shown in fig. 7, a schematic diagram of a transparent photoresist is shown, where a rough structure 140 is disposed on the transparent photoresist 131, the rough structure 140 includes a plurality of protrusions 141, the protrusions 141 are uniformly arranged on the surface of the transparent photoresist 131, the areas of the full light-transmitting region 311 and the half light-transmitting region 312 are respectively 15um by 15um to 5um by 5um, and the radial width of each protrusion 141 can be formed between 50nm and 500 nm. The height of the protrusions 141 is mainly determined by the transmittance of the semi-transparent region 312, and the lower the transmittance, the less light passes through the mask 300, and the less the transparent photoresist 131 is etched, so that the more the transparent photoresist 131 remains there.
As shown in fig. 8, which is a second enlarged schematic view of the sub-pixel region a in fig. 5 of the present application, the transmittance of each semi-transparent region 312 is different, and can be specifically selected from 10% to 70%. The height or depth of each of the corresponding protrusions 141 or depressions is formed differently. It should be noted that, this embodiment is only exemplified by the transparent photoresist 131, and for the flat layer, if the flat layer also has the negative photoresist characteristic, the above transparent photoresist forming method can be directly adopted, and the transmittance of the photo mask corresponding to the red filter layer and the green filter layer regions of the flat layer can be set to 100%; the transparent layer area has different transmittances corresponding to the photomask, and a concave-convex interface is generated after exposure and development. In addition, if the flat layer is not a photosensitive material; an etching process is also needed, that is, an etching technology is used to cover the anti-etching photoresist on the flat layers corresponding to the red filter layer and the green filter layer, the photoresist is covered on the flat layer corresponding to the transparent layer area in a partitioning manner, and then, the etching process is used to generate a recess on the position of the transparent layer area not covered by the photoresist. By disposing a layer of photoresist on the flat layer 132, exposing and developing the photoresist through the mask 300, correspondingly forming a plurality of protrusions 141 to cover the light-transmitting portions 133 of the flat layer 132, exposing and developing the corresponding light-transmitting portions 133 corresponding to the positions of the full light-transmitting regions 311, etching the positions to form a plurality of pits by etching, and finally stripping the photoresist, thereby forming the rough structure 140 on the flat layer 132.
Example five:
fig. 9 shows a schematic diagram of a display device according to a fifth embodiment of the present application, where the display device 1 includes a blue light source backlight module 20 and the display panel 10 according to any one of the embodiments, and the blue light source backlight module 20 provides a blue backlight source for the display panel 10. The technical solution of the present application can be widely applied to various display panels, such as TN (Twisted Nematic) display panel, IPS (In-Plane Switching) display panel, VA (Vertical Alignment) display panel, MVA (Multi-Domain Vertical Alignment) display panel, and of course, other types of display panels, such as OLED (Organic Light-Emitting Diode) display panel, and the above solution can be applied thereto. The display device includes, but is not limited to, an electronic device for outputting image information, such as a television, a mobile phone, a tablet computer, and a notebook computer.
It should be noted that the inventive concept of the present application can form many embodiments, but the present application has a limited space and cannot be listed one by one, so that, on the premise of no conflict, any combination between the above-described embodiments or technical features can form a new embodiment, and after the embodiments or technical features are combined, the original technical effect will be enhanced.
The foregoing is a more detailed description of the present application in connection with specific alternative embodiments, and the specific implementations of the present application are not to be considered limited to these descriptions. For those skilled in the art to which the present application pertains, several simple deductions or substitutions may be made without departing from the concept of the present application, and all should be considered as belonging to the protection scope of the present application.

Claims (10)

1. A display panel is used for being oppositely stacked with a blue light source backlight module, the display panel comprises a first substrate and a second substrate, the first substrate and the second substrate are oppositely arranged,
the first substrate comprises red filter layers, green filter layers, a transparent layer and a flat layer, the red filter layers, the green filter layers and the transparent layer are arranged in an array mode, the flat layer covers the red filter layers, the green filter layers and the transparent layer, the flat layer comprises light transmission parts which are arranged corresponding to the transparent layer, at least one of the light transmission parts and the transparent layer is provided with a rough structure, and the rough structure enables light rays which are directly emitted to the transparent layer by the blue light source backlight module to be scattered.
2. The display panel of claim 1, wherein the red filter layer is filled with red quantum dots, the green filter layer is filled with green quantum dots, and the transparent layer comprises a transparent photoresist, wherein the roughness structure is disposed on a side of the transparent photoresist close to the second substrate.
3. The display panel according to claim 1, wherein the transparent layer comprises a transparent photoresist, and the roughness is provided on a side of the light-transmitting portion adjacent to the second substrate.
4. The display panel according to claim 1, wherein the transparent layer comprises a transparent photoresist, and the roughness structures are respectively disposed on a side of the transparent photoresist adjacent to the second substrate and a side of the light-transmitting portion adjacent to the second substrate.
5. The display panel according to any of claims 1 to 4, wherein the roughness structure comprises a plurality of protrusions or pits, and wherein each of the protrusions or pits has a radial width of between 50nm and 500 nm.
6. The display panel according to claim 5, wherein the roughness structure is formed using a mask technique.
7. A manufacturing method of a display panel is characterized by comprising the following steps:
forming a red filter layer, a green filter layer and a transparent layer which are arranged in an array manner on a substrate;
forming a flat layer on the red filter layer, the green filter layer and the transparent layer to form a first substrate;
forming a second substrate, and forming a display panel by aligning the first substrate and the second substrate;
the step of forming the red filter layer, the green filter layer and the transparent layer which are arranged in an array on the substrate further comprises the step of forming a rough structure on the transparent layer through a photomask; or
The step of forming a flat layer on the red filter layer, the green filter layer and the transparent layer to form the first substrate further comprises the step of forming a rough structure on a light-transmitting part of the flat layer, which is arranged corresponding to the transparent layer, through a photomask;
the photomask comprises a light-transmitting area and a non-light-transmitting area, the light-transmitting area comprises a plurality of full light-transmitting areas and a plurality of semi-light-transmitting areas, the full light-transmitting areas and the semi-light-transmitting areas are arranged in a staggered mode, the non-light-transmitting areas correspond to red filter layers and green filter layers, the light-transmitting areas correspond to transparent layers, and the rough structure is formed through exposure and development of the photomask.
8. The method of claim 7, wherein the transmittance of the fully transmissive region is 100%, the transmittance of the semi-transmissive region is 10% to 70%, and the areas of the fully transmissive region and the semi-transmissive region are 15um to 5um, respectively.
9. The method of claim 7, wherein the transmittance of each of the semi-opaque regions is the same.
10. A display device, comprising a blue light source backlight module and the display panel as claimed in any one of claims 1 to 6, wherein the display panel is disposed on a light-emitting surface of the blue light source backlight module, and the blue light source backlight module provides blue backlight for the display panel.
CN202111634389.1A 2021-12-29 2021-12-29 Display panel, manufacturing method thereof and display device Pending CN114265230A (en)

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CN108919560A (en) * 2018-06-25 2018-11-30 福州大学 A kind of quantum stippling film backing structure
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CN106773306A (en) * 2017-01-03 2017-05-31 青岛海信电器股份有限公司 A kind of display panel and liquid crystal display device for being packaged with quantum dot layer
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