CN114102426B - 基板处理装置、基板处理方法以及存储有程序的存储介质 - Google Patents

基板处理装置、基板处理方法以及存储有程序的存储介质

Info

Publication number
CN114102426B
CN114102426B CN202110717360.3A CN202110717360A CN114102426B CN 114102426 B CN114102426 B CN 114102426B CN 202110717360 A CN202110717360 A CN 202110717360A CN 114102426 B CN114102426 B CN 114102426B
Authority
CN
China
Prior art keywords
substrate
polishing
polishing head
detector
slip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202110717360.3A
Other languages
English (en)
Chinese (zh)
Other versions
CN114102426A (zh
Inventor
三谷隆
真继阿沙葵
斋藤步
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of CN114102426A publication Critical patent/CN114102426A/zh
Application granted granted Critical
Publication of CN114102426B publication Critical patent/CN114102426B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/005Control means for lapping machines or devices
    • B24B37/0053Control means for lapping machines or devices detecting loss or breakage of a workpiece during lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/005Control means for lapping machines or devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/10Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/27Work carriers
    • B24B37/30Work carriers for single side lapping of plane surfaces
    • B24B37/32Retaining rings
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/006Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the speed
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/08Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving liquid or pneumatic means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/10Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/16Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40Chemomechanical polishing [CMP]
    • H10P52/402Chemomechanical polishing [CMP] of semiconductor materials
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0428Apparatus for mechanical treatment or grinding or cutting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/23Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
    • H10P74/238Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes comprising acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection or in-situ thickness measurement

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
CN202110717360.3A 2020-06-29 2021-06-28 基板处理装置、基板处理方法以及存储有程序的存储介质 Active CN114102426B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020111535A JP7443169B2 (ja) 2020-06-29 2020-06-29 基板処理装置、基板処理方法、および基板処理方法を基板処理装置のコンピュータに実行させるためのプログラムを格納した記憶媒体
JP2020-111535 2020-06-29

Publications (2)

Publication Number Publication Date
CN114102426A CN114102426A (zh) 2022-03-01
CN114102426B true CN114102426B (zh) 2026-03-06

Family

ID=76641617

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110717360.3A Active CN114102426B (zh) 2020-06-29 2021-06-28 基板处理装置、基板处理方法以及存储有程序的存储介质

Country Status (6)

Country Link
US (1) US11911868B2 (https=)
EP (1) EP3932615B1 (https=)
JP (1) JP7443169B2 (https=)
KR (1) KR102884989B1 (https=)
CN (1) CN114102426B (https=)
TW (1) TWI897976B (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2025136592A (ja) * 2024-03-07 2025-09-19 株式会社荏原製作所 基板研磨装置、基板処理装置、基板研磨方法、およびプログラム

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106891241A (zh) * 2015-12-18 2017-06-27 株式会社荏原制作所 研磨装置、该研磨装置的控制方法以及控制程序

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10214806A (ja) * 1997-01-31 1998-08-11 Hitachi Chem Co Ltd 半導体基板の研磨方法
JP3705670B2 (ja) 1997-02-19 2005-10-12 株式会社荏原製作所 ポリッシング装置及び方法
JP2977543B2 (ja) * 1997-09-02 1999-11-15 松下電子工業株式会社 化学的機械研磨装置及び化学的機械研磨方法
JP3572917B2 (ja) * 1997-12-09 2004-10-06 信越半導体株式会社 半導体ウエーハの両面研磨方法及びその装置
JP2001000964A (ja) * 1999-06-22 2001-01-09 Japan Atom Energy Res Inst 超音波により水相から有機溶媒を除去する方法
JP2001096455A (ja) 1999-09-28 2001-04-10 Ebara Corp 研磨装置
JP3922887B2 (ja) 2001-03-16 2007-05-30 株式会社荏原製作所 ドレッサ及びポリッシング装置
US6796879B2 (en) * 2002-01-12 2004-09-28 Taiwan Semiconductor Manufacturing Co., Ltd. Dual wafer-loss sensor and water-resistant sensor holder
JP4102081B2 (ja) * 2002-02-28 2008-06-18 株式会社荏原製作所 研磨装置及び研磨面の異物検出方法
JP2004106123A (ja) * 2002-09-19 2004-04-08 Toshiba Corp 研磨方法、cmp装置及び膜厚測定装置
US6946397B2 (en) * 2003-11-17 2005-09-20 Taiwan Semiconductor Manufacturing Company, Ltd. Chemical mechanical polishing process with reduced defects in a copper process
JP2005251924A (ja) * 2004-03-03 2005-09-15 Nikon Corp ウエハの保持部材からの飛び出し検出方法、ウエハ部分割れ検出方法、及びcmp装置におけるウエハの飛び出し検出方法、cmp装置におけるウエハの部分割れ検出方法、及びウエハの保持部材からの一部飛び出し検出方法
JP2007134478A (ja) * 2005-11-10 2007-05-31 Tokyo Seimitsu Co Ltd ウェーハ研磨装置及び方法
JP4814677B2 (ja) * 2006-03-31 2011-11-16 株式会社荏原製作所 基板保持装置および研磨装置
JP5004494B2 (ja) * 2006-04-14 2012-08-22 富士フイルム株式会社 化学的機械的研磨方法
TWI572441B (zh) * 2008-08-05 2017-03-01 荏原製作所股份有限公司 硏磨方法及裝置
EP2457689B1 (en) * 2009-07-22 2013-06-26 JTEKT Corporation Method and device for preventing slip of work piece
US8034723B2 (en) * 2009-12-25 2011-10-11 Tokyo Electron Limited Film deposition apparatus and film deposition method
US9240042B2 (en) 2013-10-24 2016-01-19 Globalfoundries Inc. Wafer slip detection during CMP processing
US9184084B2 (en) * 2014-01-28 2015-11-10 Lam Research Corporation Wafer handling traction control system
JP6266493B2 (ja) * 2014-03-20 2018-01-24 株式会社荏原製作所 研磨装置及び研磨方法
JP6357260B2 (ja) * 2016-09-30 2018-07-11 株式会社荏原製作所 研磨装置、及び研磨方法
JP6882017B2 (ja) * 2017-03-06 2021-06-02 株式会社荏原製作所 研磨方法、研磨装置、および基板処理システム
JP6913318B2 (ja) * 2017-06-16 2021-08-04 山九株式会社 重量物横移動用のリフト
JP6887371B2 (ja) * 2017-12-20 2021-06-16 株式会社荏原製作所 基板処理装置、基板処理装置の制御方法、プログラムを格納した記憶媒体
JP6487613B1 (ja) 2019-01-11 2019-03-20 キコヘッド株式会社 Il−33発現抑制剤の製造方法
JP7374710B2 (ja) 2019-10-25 2023-11-07 株式会社荏原製作所 研磨方法および研磨装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106891241A (zh) * 2015-12-18 2017-06-27 株式会社荏原制作所 研磨装置、该研磨装置的控制方法以及控制程序

Also Published As

Publication number Publication date
EP3932615A1 (en) 2022-01-05
JP7443169B2 (ja) 2024-03-05
EP3932615B1 (en) 2023-08-16
US20210402548A1 (en) 2021-12-30
TWI897976B (zh) 2025-09-21
US11911868B2 (en) 2024-02-27
KR102884989B1 (ko) 2025-11-12
JP2022010795A (ja) 2022-01-17
CN114102426A (zh) 2022-03-01
KR20220001477A (ko) 2022-01-05
TW202218805A (zh) 2022-05-16

Similar Documents

Publication Publication Date Title
CN108025419B (zh) 研磨方法及研磨装置
JP6827663B2 (ja) 基板の研磨装置
CN100466191C (zh) 抛光设备
CN102513920B (zh) 抛光设备
KR102741013B1 (ko) 기판을 보유 지지하기 위한 톱 링 및 기판 처리 장치
KR101664532B1 (ko) 기판의 연마 이상 검출 방법 및 연마 장치
US20140134924A1 (en) Substrate holding apparatus and polishing apparatus
KR20190054972A (ko) 기판 보지 장치 및 기판 보지 장치를 구비하는 기판 처리 장치
KR20180097136A (ko) 기판의 연마 장치 및 연마 방법
CN107199503A (zh) 研磨装置和研磨方法
CN114102426B (zh) 基板处理装置、基板处理方法以及存储有程序的存储介质
TW201901790A (zh) 校正方法及記錄有校正程序之非暫態電腦可讀取記錄媒介
TWI821480B (zh) 基板處理裝置及基板處理裝置中應部分研磨區域之限定方法
US20260001189A1 (en) Substrate polishing apparatus, substrate polishing method, polishing apparatus, and polishing method
US20200269383A1 (en) Substrate polishing device and substrate polishing method
KR20220048482A (ko) 화학적 기계적 연마 보정 툴
CN113021173B (zh) 研磨单元、基板处理装置及研磨方法
CN118809424A (zh) 膜厚测定装置、膜厚测定方法及基板研磨装置
US20250312882A1 (en) Substrate polishing method, program, and substrate polishing apparatus
JP7779778B2 (ja) 基板研磨装置および基板研磨方法
WO2025187806A1 (ja) 基板研磨装置、基板処理装置、基板研磨方法、およびプログラム
CN119526260A (zh) 信息处理装置、基板处理装置及信息处理方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant