CN114102426B - 基板处理装置、基板处理方法以及存储有程序的存储介质 - Google Patents
基板处理装置、基板处理方法以及存储有程序的存储介质Info
- Publication number
- CN114102426B CN114102426B CN202110717360.3A CN202110717360A CN114102426B CN 114102426 B CN114102426 B CN 114102426B CN 202110717360 A CN202110717360 A CN 202110717360A CN 114102426 B CN114102426 B CN 114102426B
- Authority
- CN
- China
- Prior art keywords
- substrate
- polishing
- polishing head
- detector
- slip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
- B24B37/0053—Control means for lapping machines or devices detecting loss or breakage of a workpiece during lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/042—Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/005—Control means for lapping machines or devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
- B24B37/32—Retaining rings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/006—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the speed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/08—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving liquid or pneumatic means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/10—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/12—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
- H10P52/40—Chemomechanical polishing [CMP]
- H10P52/402—Chemomechanical polishing [CMP] of semiconductor materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0428—Apparatus for mechanical treatment or grinding or cutting
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
- H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
- H10P74/238—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes comprising acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection or in-situ thickness measurement
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020111535A JP7443169B2 (ja) | 2020-06-29 | 2020-06-29 | 基板処理装置、基板処理方法、および基板処理方法を基板処理装置のコンピュータに実行させるためのプログラムを格納した記憶媒体 |
| JP2020-111535 | 2020-06-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN114102426A CN114102426A (zh) | 2022-03-01 |
| CN114102426B true CN114102426B (zh) | 2026-03-06 |
Family
ID=76641617
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110717360.3A Active CN114102426B (zh) | 2020-06-29 | 2021-06-28 | 基板处理装置、基板处理方法以及存储有程序的存储介质 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US11911868B2 (https=) |
| EP (1) | EP3932615B1 (https=) |
| JP (1) | JP7443169B2 (https=) |
| KR (1) | KR102884989B1 (https=) |
| CN (1) | CN114102426B (https=) |
| TW (1) | TWI897976B (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2025136592A (ja) * | 2024-03-07 | 2025-09-19 | 株式会社荏原製作所 | 基板研磨装置、基板処理装置、基板研磨方法、およびプログラム |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106891241A (zh) * | 2015-12-18 | 2017-06-27 | 株式会社荏原制作所 | 研磨装置、该研磨装置的控制方法以及控制程序 |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10214806A (ja) * | 1997-01-31 | 1998-08-11 | Hitachi Chem Co Ltd | 半導体基板の研磨方法 |
| JP3705670B2 (ja) | 1997-02-19 | 2005-10-12 | 株式会社荏原製作所 | ポリッシング装置及び方法 |
| JP2977543B2 (ja) * | 1997-09-02 | 1999-11-15 | 松下電子工業株式会社 | 化学的機械研磨装置及び化学的機械研磨方法 |
| JP3572917B2 (ja) * | 1997-12-09 | 2004-10-06 | 信越半導体株式会社 | 半導体ウエーハの両面研磨方法及びその装置 |
| JP2001000964A (ja) * | 1999-06-22 | 2001-01-09 | Japan Atom Energy Res Inst | 超音波により水相から有機溶媒を除去する方法 |
| JP2001096455A (ja) | 1999-09-28 | 2001-04-10 | Ebara Corp | 研磨装置 |
| JP3922887B2 (ja) | 2001-03-16 | 2007-05-30 | 株式会社荏原製作所 | ドレッサ及びポリッシング装置 |
| US6796879B2 (en) * | 2002-01-12 | 2004-09-28 | Taiwan Semiconductor Manufacturing Co., Ltd. | Dual wafer-loss sensor and water-resistant sensor holder |
| JP4102081B2 (ja) * | 2002-02-28 | 2008-06-18 | 株式会社荏原製作所 | 研磨装置及び研磨面の異物検出方法 |
| JP2004106123A (ja) * | 2002-09-19 | 2004-04-08 | Toshiba Corp | 研磨方法、cmp装置及び膜厚測定装置 |
| US6946397B2 (en) * | 2003-11-17 | 2005-09-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Chemical mechanical polishing process with reduced defects in a copper process |
| JP2005251924A (ja) * | 2004-03-03 | 2005-09-15 | Nikon Corp | ウエハの保持部材からの飛び出し検出方法、ウエハ部分割れ検出方法、及びcmp装置におけるウエハの飛び出し検出方法、cmp装置におけるウエハの部分割れ検出方法、及びウエハの保持部材からの一部飛び出し検出方法 |
| JP2007134478A (ja) * | 2005-11-10 | 2007-05-31 | Tokyo Seimitsu Co Ltd | ウェーハ研磨装置及び方法 |
| JP4814677B2 (ja) * | 2006-03-31 | 2011-11-16 | 株式会社荏原製作所 | 基板保持装置および研磨装置 |
| JP5004494B2 (ja) * | 2006-04-14 | 2012-08-22 | 富士フイルム株式会社 | 化学的機械的研磨方法 |
| TWI572441B (zh) * | 2008-08-05 | 2017-03-01 | 荏原製作所股份有限公司 | 硏磨方法及裝置 |
| EP2457689B1 (en) * | 2009-07-22 | 2013-06-26 | JTEKT Corporation | Method and device for preventing slip of work piece |
| US8034723B2 (en) * | 2009-12-25 | 2011-10-11 | Tokyo Electron Limited | Film deposition apparatus and film deposition method |
| US9240042B2 (en) | 2013-10-24 | 2016-01-19 | Globalfoundries Inc. | Wafer slip detection during CMP processing |
| US9184084B2 (en) * | 2014-01-28 | 2015-11-10 | Lam Research Corporation | Wafer handling traction control system |
| JP6266493B2 (ja) * | 2014-03-20 | 2018-01-24 | 株式会社荏原製作所 | 研磨装置及び研磨方法 |
| JP6357260B2 (ja) * | 2016-09-30 | 2018-07-11 | 株式会社荏原製作所 | 研磨装置、及び研磨方法 |
| JP6882017B2 (ja) * | 2017-03-06 | 2021-06-02 | 株式会社荏原製作所 | 研磨方法、研磨装置、および基板処理システム |
| JP6913318B2 (ja) * | 2017-06-16 | 2021-08-04 | 山九株式会社 | 重量物横移動用のリフト |
| JP6887371B2 (ja) * | 2017-12-20 | 2021-06-16 | 株式会社荏原製作所 | 基板処理装置、基板処理装置の制御方法、プログラムを格納した記憶媒体 |
| JP6487613B1 (ja) | 2019-01-11 | 2019-03-20 | キコヘッド株式会社 | Il−33発現抑制剤の製造方法 |
| JP7374710B2 (ja) | 2019-10-25 | 2023-11-07 | 株式会社荏原製作所 | 研磨方法および研磨装置 |
-
2020
- 2020-06-29 JP JP2020111535A patent/JP7443169B2/ja active Active
-
2021
- 2021-06-08 TW TW110120759A patent/TWI897976B/zh active
- 2021-06-23 KR KR1020210081369A patent/KR102884989B1/ko active Active
- 2021-06-23 US US17/355,525 patent/US11911868B2/en active Active
- 2021-06-25 EP EP21181846.3A patent/EP3932615B1/en active Active
- 2021-06-28 CN CN202110717360.3A patent/CN114102426B/zh active Active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106891241A (zh) * | 2015-12-18 | 2017-06-27 | 株式会社荏原制作所 | 研磨装置、该研磨装置的控制方法以及控制程序 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP3932615A1 (en) | 2022-01-05 |
| JP7443169B2 (ja) | 2024-03-05 |
| EP3932615B1 (en) | 2023-08-16 |
| US20210402548A1 (en) | 2021-12-30 |
| TWI897976B (zh) | 2025-09-21 |
| US11911868B2 (en) | 2024-02-27 |
| KR102884989B1 (ko) | 2025-11-12 |
| JP2022010795A (ja) | 2022-01-17 |
| CN114102426A (zh) | 2022-03-01 |
| KR20220001477A (ko) | 2022-01-05 |
| TW202218805A (zh) | 2022-05-16 |
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Legal Events
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|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |