CN113560964A - Polishing method and device - Google Patents
Polishing method and device Download PDFInfo
- Publication number
- CN113560964A CN113560964A CN202111122993.6A CN202111122993A CN113560964A CN 113560964 A CN113560964 A CN 113560964A CN 202111122993 A CN202111122993 A CN 202111122993A CN 113560964 A CN113560964 A CN 113560964A
- Authority
- CN
- China
- Prior art keywords
- polishing
- brush
- cleaning
- polishing brush
- polished
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/002—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using electric current
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/033—Other grinding machines or devices for grinding a surface for cleaning purposes, e.g. for descaling or for grinding off flaws in the surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/005—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents using brushes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/006—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the speed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
- B24B53/007—Cleaning of grinding wheels
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Cleaning In General (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention provides a polishing method and a polishing apparatus. The first aspect of the present invention provides a polishing method comprising the steps of: polishing a piece to be polished for the first time by using a polishing brush, and cleaning the polishing brush for the first time after polishing for 5-30min, wherein waste water and impurities generated by the first cleaning do not contact the piece to be polished; repeating the polishing-cleaning steps at least twice to finish the polishing process of the piece to be polished. The invention adopts a mode of combining multiple polishing and multiple cleaning, and blocks impurities generated in the cleaning process, thereby avoiding the influence of the impurities generated in the polishing on the piece to be polished, further reducing the polishing frequency of the piece to be polished and prolonging the effective working time of the piece to be polished.
Description
Technical Field
The invention relates to a polishing method and a polishing device, and relates to the technical field of polishing.
Background
In the production process of the copper foil, a cathode roller is required to polish the surface of the copper foil, the side, attached to the surface of the cathode roller, of the copper foil is called a smooth surface, a plating surface is called a rough surface, the smooth surface of the copper foil is closely related to the surface state of the cathode roller, and the flatness and the roughness of the roller surface of the cathode roller directly determine the quality of the smooth surface of the copper foil. The defects of scratch, titanium roller mark and the like on the surface of a cathode roller are easily caused by the imperfection of the polishing operation procedure and the process parameters in the conventional polishing process, so that the apparent quality and the application of the smooth surface of the copper foil are influenced.
In order to solve the problems, currently, a polishing brush is used for polishing and regrinding the surface of the cathode roller, so as to remove an oxide layer on the surface of the cathode roller and prolong the service life of the cathode roller.
Disclosure of Invention
The invention provides a polishing method, which adopts a mode of combining multiple polishing and multiple cleaning and blocks impurities generated in the cleaning process, thereby avoiding the influence of the impurities generated in the polishing on a piece to be polished, further reducing the polishing frequency of the piece to be polished and prolonging the effective working time of the piece to be polished.
The invention also provides a polishing device for implementing the polishing method.
In a first aspect, the present invention provides a polishing method comprising the steps of:
polishing a to-be-polished piece for the first time by using a polishing brush, stopping polishing for the first time after polishing for 5-30min, and cleaning the polishing brush for the first time, wherein waste water and impurities generated by cleaning for the first time do not contact with the to-be-polished piece;
repeating the polishing-cleaning steps at least twice to complete the polishing process of the piece to be polished;
wherein the first cleaning comprises the steps of: and rinsing the surface of the polishing brush for 1-5min by using deionized water, drying the polishing brush, and repeating the rinsing-drying steps at least twice to finish the first cleaning of the polishing brush.
The polishing method further comprises the following steps before the first polishing: and inspecting the polishing brush to ensure that the surface of the polishing brush is clean and tidy and the direction of bristles is consistent.
In the above polishing method, the first polishing specifically includes the following steps: wetting the polishing brush, moving the polishing brush to be in contact with the surface of a piece to be polished, setting polishing parameters, and polishing the piece to be polished for the first time, wherein the polishing parameters comprise polishing current, vibration frequency and polishing brush rotating speed.
In the above polishing method, the member to be polished is a cathode roll, and the polishing-cleaning step is repeated 3 times.
In the polishing method, the polishing current is set to be 6-10A, the vibration frequency is set to be 200-300rpm, and the rotation speed is set to be 180-300 rpm; in the second polishing, the polishing current is set to be 5-9A, the vibration frequency is set to be 200-300rpm, and the rotation speed is set to be 180-300 rpm; in the third polishing, the polishing current is set to be 4-8A, the vibration frequency is set to be 200-300rpm, and the rotation speed is set to be 180-300 rpm.
As in the polishing method described above, the first cleaning specifically includes the steps of: keeping the polishing brush rotating, washing the surface of the polishing brush for 1-5min by using deionized water, then increasing the rotating speed of the polishing brush to be more than 500rpm, drying the water on the surface of the polishing brush, and repeating the washing-drying steps at least twice to finish the first cleaning of the polishing brush.
The polishing method further comprises the following steps after the polishing process is finished: and drying the polishing brush, and periodically checking and finishing the polishing brush.
The invention provides a device for implementing any one of the polishing methods, which comprises a main body, a polishing brush, a cleaning unit and a baffle unit, wherein the polishing brush is arranged on the main body in a sliding manner, and the cleaning unit is positioned on one side of the polishing brush and is used for cleaning the polishing brush;
the blocking unit is arranged on the other side, far away from the cleaning unit, of the polishing brush and comprises a storage part and a blocking part, the storage part is arranged on the main body, the blocking part can be stored in the storage part, and the blocking part covers at least part of the surface of the polishing brush when being unfolded and is used for blocking waste water and impurities generated in the first cleaning process from contacting with the polishing piece to be polished.
According to the device, the device further comprises a sliding unit, the sliding unit is arranged on the main body in a sliding mode, is fixedly connected with the polishing brush and is used for moving the polishing brush.
According to the device, the device further comprises a drainage unit, wherein the drainage unit is positioned below the cleaning unit and used for collecting waste water and impurities generated when the polishing brush is cleaned by the cleaning unit.
The implementation of the invention has at least the following advantages:
1. the invention adopts a mode of combining multiple polishing and multiple cleaning, and blocks impurities generated in the cleaning process, thereby avoiding the influence of the impurities generated by polishing on a piece to be polished, reducing the polishing frequency of the piece to be polished and prolonging the effective working time of the piece to be polished; in addition, the polishing brush is cleaned in a mode of combining multiple rinsing and multiple drying, and the cleaning efficiency is improved.
2. According to the polishing device provided by the invention, the blocking unit is arranged on one side of the polishing brush, so that the damage of waste water or impurities generated in the cleaning process of the polishing brush to the surface of a piece to be polished can be effectively reduced, the polishing frequency of the piece to be polished is reduced, and the effective working time of the piece to be polished is prolonged.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a schematic flow chart of a polishing method according to an embodiment of the present invention;
FIG. 2 is a schematic flow chart of a cleaning method according to an embodiment of the present invention;
FIG. 3 is a schematic flow chart of a polishing method according to another embodiment of the present invention;
fig. 4 is a schematic structural diagram of a polishing apparatus according to an embodiment of the present invention.
Description of reference numerals:
1: a main body;
2: polishing brushes;
3: a cleaning unit;
3-1: a shower pipe;
3-2: cleaning the outer cover;
4: a blocking unit;
4-1: a storage section;
4-2: a barrier portion;
5: a sliding unit;
6: a drainage unit;
7: the member to be polished accommodates the unit.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In a first aspect, the present invention provides a polishing method comprising the steps of:
polishing a to-be-polished piece for the first time by using a polishing brush, stopping polishing for the first time after polishing for 5-30min, and cleaning the polishing brush for the first time, wherein waste water and impurities generated by cleaning for the first time do not contact with the to-be-polished piece;
repeating the polishing-cleaning steps at least twice to complete the polishing process of the piece to be polished;
wherein the first cleaning comprises the steps of: and rinsing the surface of the polishing brush for 1-5min by using deionized water, drying the polishing brush, and repeating the rinsing-drying steps at least twice to finish the first cleaning of the polishing brush.
The inventor researches and discovers that impurities generated when a polishing piece to be polished is polished by a polishing brush are important factors influencing the polishing effect of the piece to be polished, on the basis of the impurities, the invention provides a polishing method, the polishing treatment is carried out on the piece to be polished by adopting a mode of multiple polishing and multiple cleaning, and FIG. 1 is a flow schematic diagram of the polishing method provided by one embodiment of the invention, as shown in FIG. 1, firstly, the piece to be polished is polished for the first time by using the polishing brush, after 5-30min of polishing, the first polishing is stopped and the polishing brush is cleaned for the first time, attention needs to be paid in the first cleaning process, and wastewater and impurities generated by the first cleaning do not contact with the piece to be polished; then, the polishing-cleaning steps are repeated at least twice by taking the first polishing and the first cleaning as a whole, the polishing process of the piece to be polished is completed, and when the polishing of the piece to be polished is completed and waste water generated in the cleaning process of the polishing brush is clean and transparent and has no impurities, the polishing process can be finished; the polishing brushes used in the polishing process are the same, namely, the polishing process is divided into a plurality of stages, and the polishing brushes are cleaned after each stage of polishing so as to remove impurities generated in the polishing process and avoid the influence of the impurities on the surface of a workpiece to be polished; in order to further ensure the cleaning efficiency of the polishing brush, the polishing brush is cleaned by a method of washing and drying for multiple times, specifically, fig. 2 is a schematic flow chart of the cleaning method provided by an embodiment of the present invention, and as shown in fig. 2, in the cleaning process, firstly, deionized water is used for washing the surface of the polishing brush for 1-5min to wash away impurities on the surface of the polishing brush, then, the polishing brush is dried to remove water on the surface of the polishing brush, and the washing-drying steps are repeated at least twice until water yielding from the cleaning of the polishing brush is clear, so that the first cleaning of the polishing brush can be completed. The invention adopts a mode of combining multiple polishing and multiple cleaning, and blocks impurities generated in the cleaning process, thereby avoiding the influence of the impurities generated by polishing on a piece to be polished, reducing the polishing frequency of the piece to be polished and prolonging the effective working time of the piece to be polished; in addition, the polishing brush is cleaned in a mode of combining multiple rinsing and multiple drying, and the cleaning efficiency is improved.
In one embodiment, before the first polishing, the method further comprises: and inspecting the polishing brush to ensure that the surface of the polishing brush is clean and tidy and the direction of the bristles is consistent.
Fig. 3 is a schematic flow chart of a polishing method according to another embodiment of the present invention, as shown in fig. 3, before a workpiece to be polished is polished for the first time, a polishing brush is first checked to ensure that the surface of the polishing brush is clean and tidy and the brush bristles are in the same direction, then the workpiece to be polished is polished for the first time by using the polishing brush, after polishing for 5-30min, the first polishing is stopped and the polishing brush is cleaned for the first time, and the polishing process is completed by repeating the above steps.
The polishing can be carried out according to the usual techniques in the art, for example, the first polishing comprises in particular the following steps: wetting the polishing brush, moving the polishing brush to be in contact with the surface of a piece to be polished, setting polishing parameters, and polishing the piece to be polished for the first time, wherein the polishing parameters comprise polishing current, vibration frequency and polishing brush rotating speed.
For the cathode roller used in the polishing process of the copper foil, in order to further prolong the service time of the cathode roller, each polishing parameter can be set, for example, when the polishing-cleaning step is repeated for 3 times, namely, 3 times of polishing and 3 times of cleaning are included, in the first polishing, the polishing current is set to be 6-10A, the vibration frequency is set to be 200-300rpm, and the rotation speed is set to be 180-300 rpm; in the second polishing, the polishing current is set to be 5-9A, the vibration frequency is set to be 200-300rpm, and the rotation speed is set to be 180-300 rpm; in the third polishing, the polishing current is set to be 4-8A, the vibration frequency is set to be 200-300rpm, and the rotation speed is set to be 180-300 rpm.
The cleaning process mainly utilizes deionized water to rinse the polishing brush, and the first cleaning specifically comprises the following steps: keeping the polishing brush rotating, washing the surface of the polishing brush for 1-5min by using deionized water, then increasing the rotating speed of the polishing brush to be more than 500rpm, drying the water on the surface of the polishing brush, and repeating the washing-drying steps at least twice to finish the first cleaning of the polishing brush.
In addition, the polishing process is completed with the following steps: the brush is dried and periodically inspected and conditioned.
In one embodiment, this embodiment is described in detail with respect to polishing a cathode roll as an example: step 1, checking the polishing brush to ensure that the surface of the polishing brush is clean and the direction of bristles is consistent; step 2, keeping the cathode roller to rotate clockwise, and keeping the rotating speed at 1.5-2 m/min; step 3, first polishing: after deionized water is introduced to moisten the polishing brush, moving the polishing brush to be in contact with the surface of the cathode roller, keeping the polishing brush to rotate clockwise, setting the polishing current to be 6-10A, the vibration frequency to be 200-300rpm, the rotation speed to be 180-300rpm and the polishing time to be 5-30min, and finishing the first polishing; step 4, stopping polishing for the first time, flushing the surface of the polishing brush with deionized water for 1-5min, increasing the rotating speed of the polishing brush to be more than 500rpm, removing water on the surface of the polishing brush, continuing flushing the polishing brush with deionized water, and repeating the step 3-5 times until water thrown off from the surface of the polishing brush is clear; step 5, polishing for the second time: the operation is the same as the first polishing, except that the polishing parameters are different, specifically, the polishing current is set to be 5-9A, the vibration frequency is 200-300rpm, the rotation speed is 180-300rpm, and the polishing time is 5-30 min; step 6, cleaning for the second time: the step is the same as the step 4; step 7, polishing for the third time, wherein the operation is the same as the first polishing, except that the polishing parameters are different, specifically, the polishing current is set to be 4-8A, the vibration frequency is 200-300rpm, the rotation speed is 180-300rpm, and the polishing time is 5-30 min; step 8, cleaning for the third time: and step 4, after cleaning, slowly rotating the polishing brush for 6-10 hours, waiting for complete drying, periodically checking the surface of the polishing brush, and finishing the polishing brush as required.
The following effects are explained with reference to specific examples:
example one
The polishing method provided by the embodiment specifically comprises the following steps:
step 1, polishing preparation: and (4) inspecting the surface of the polishing brush to ensure that the surface of the brush roller is clean and uniform in height and direction of bristles.
Step 2, keeping the cathode roller to rotate clockwise, and keeping the rotating speed at 1.8 m/min;
step 3, first polishing: after deionized water is introduced to moisten the polishing brush, moving the polishing brush to contact with the surface of the cathode roller, keeping clockwise rotation, setting the polishing current to be 8.6A, the vibration frequency to be 200rpm, the rotation speed to be 210rpm, and the polishing time to be 10min, and finishing the first polishing;
step 4, stopping the first polishing, flushing the surface of the polishing brush with deionized water for 2min, increasing the rotating speed of the polishing brush by 500rpm, drying the water on the surface of the polishing brush by spinning, continuing flushing the polishing brush with deionized water, and repeating the step 3 times until the water thrown off from the surface of the polishing brush is clear;
step 6, cleaning for the second time: the same step 4 is carried out;
step 8, cleaning for the third time: in the same way as the step 4, the method comprises the following steps,
and 9, continuously and slowly rotating the polishing brush for 6-10 hours, stopping after the polishing brush is completely dried, periodically checking the surface of the polishing brush, and finishing the polishing brush as required.
The number of scratches of the cathode roller after three polishing and three cleaning processes is obviously reduced, and the cathode roller can continuously work for about 7 days.
Comparative example 1
The polishing method provided by the comparative example specifically includes the steps of:
step 1, polishing preparation: and (4) inspecting the surface of the polishing brush to ensure that the surface of the brush roller is clean and uniform in height and direction of bristles.
Step 2, keeping the cathode roller to rotate clockwise, and keeping the rotating speed at 1.8 m/min;
step 3, first polishing: after deionized water is introduced to wet the polishing brush, keeping the polishing brush rotating clockwise, setting the polishing current to be 8.6A, the vibration frequency to be 200rpm, the rotating speed to be 210rpm and the polishing time to be 10min, and finishing the first polishing;
step 4, polishing for the second time: setting the polishing current to be 8.2A, the vibration frequency to be 215rpm, the rotating speed to be 230rpm and the polishing time to be 20min, and finishing the second polishing;
and 6, cleaning the polishing brush, washing the surface of the polishing brush for 1-5min by using deionized water, and naturally drying.
The cathode roller surface polished according to the process has more scratches, and the roller surface has the defects of serious scratches and the like after about 4 days of working, and needs to be polished again.
According to the polishing method provided by the embodiment 1 and the comparative example 1, the impurity generated in the cleaning process is blocked by adopting a mode of combining multiple polishing and multiple cleaning, so that the influence of the impurity generated in the polishing on the workpiece to be polished is avoided, the polishing frequency of the workpiece to be polished is further reduced, and the effective working time of the workpiece to be polished is prolonged. In addition, it should be noted that the present invention is illustrated by taking polishing of the cathode roller as an example, but the present invention is not limited to be applied to polishing of the cathode roller, and is also applicable to similar processes in other industries.
A second aspect of the present invention provides an apparatus for performing the above polishing method, and fig. 4 is a schematic structural view of a polishing apparatus according to an embodiment of the present invention, as shown in fig. 4, the polishing apparatus includes a main body 1, a polishing brush 2, a cleaning unit 3, and a barrier unit 4, wherein:
the material of the main body 1 may include, but is not limited to, stainless steel, aluminum alloy, etc., and those skilled in the art may select the material of the main body 1 according to the requirement and process the material according to the size and dimension of the polishing brush 2 and other unit components, which is not limited in the present invention.
The polishing brush 2 is slidably disposed on the main body 1, i.e., can slide relative to the main body 1 according to different working states of the polishing brush 2, for example, when the polishing brush 2 is in a polishing state, the polishing brush 2 is in contact with a surface of an object to be polished and performs polishing, and when the polishing brush 2 is in a cleaning state, the polishing brush 2 is located below the cleaning unit 3.
The cleaning unit 3 is located on one side of the polishing brush 2, and is used for cleaning the polishing brush 2.
The blocking unit 4 is arranged on the other side, far away from the cleaning unit 3, of the polishing brush 2 and comprises a storage part 4-1 and a blocking part 4-2, the storage part 4-1 is arranged on the main body 1, the blocking part 4-2 can be stored in the storage part 4-1, and the blocking part 4-2 wraps at least part of the surface of the polishing brush 2 when being unfolded and is used for blocking waste water or impurities generated in the cleaning process of the polishing brush 2 and preventing the waste water or the impurities generated in the cleaning process of the polishing brush 2 from splashing to the surface of a workpiece to be polished.
According to the polishing device provided by the invention, the blocking unit is arranged on one side of the polishing brush, so that the damage of waste water or impurities generated in the cleaning process of the polishing brush to the surface of a piece to be polished can be effectively reduced, the polishing frequency of the piece to be polished is reduced, and the effective working time of the piece to be polished is prolonged.
In a possible embodiment, the cleaning unit 3 includes a shower pipe 3-1, a cleaning cover 3-2, and a vertical water guard (not shown), the shower pipe 3-1 and the cleaning cover 3-2 are fixed to the main body 1, and the shower pipe 3-1 is located obliquely above the polishing brush 2 for spraying a cleaning liquid, such as deionized water; the cleaning outer cover 3-2 is arranged at the periphery of the polishing brush 2 and is used for preventing waste water and impurities generated in the cleaning process from splashing; a vertical water baffle is arranged in the cleaning outer cover 3-2 close to the polishing brush 2 and is positioned right above the polishing brush 2 and used for draining the cleaning liquid sprayed from the spray pipe 3-1 to the cleaning outer cover 3-2; in the cleaning process, deionized water is obliquely and upwards sprayed onto the cleaning outer cover 3-2 from the spray pipe 3-1 and is guided to the surface of the polishing brush 2 through the vertical water baffle 3, so that the deionized water can be uniformly sprayed onto the surface of the polishing brush 2.
In a possible embodiment, the device further comprises a sliding unit 5, wherein the sliding unit 5 is used for realizing the sliding connection of the polishing brush 2 and the main body 1, namely, the sliding unit 5 is arranged on the main body 1 in a sliding way and is connected with the polishing brush 2; specifically, the sliding unit 5 includes two sliding rails, sliding brackets are fixed to the two sliding rails, and the polishing brush 3 is mounted on the two sliding brackets through bearings, so as to slide the polishing brush 2.
In a possible embodiment, the storage part 4-1 is a roller blind winding drum, the blocking part 4-2 is a blocking screen, and the sliding unit 5 is provided with a buckle, when the polishing brush 2 is in a polishing working state, the blocking screen is wound and stored in the roller blind winding drum, when the polishing brush 2 is in a cleaning state, the blocking screen is unfolded, and the lower end of the blocking screen is connected with the buckle, so that a blocking effect is achieved.
In a possible embodiment, the apparatus further comprises a drainage unit 6, wherein the drainage unit 6 is positioned below the cleaning unit 3 and is used for collecting waste water and impurities generated when the cleaning unit 3 cleans the polishing brush 2; specifically, the drain unit 6 includes a waste water receiving portion for collecting waste water and impurities generated during the cleaning process of the polishing brush 2 and discharging them through a drain opening, and a drain opening provided on the waste water receiving portion.
In a possible embodiment, the device further comprises a to-be-polished piece accommodating unit 7, and the to-be-polished piece accommodating unit 7 is positioned on one side of the baffle unit 4 away from the polishing brush 2 and used for placing the to-be-polished piece.
In a possible embodiment, the apparatus further comprises a control unit (not shown in the figures) connected to the polishing brush and the cleaning unit for controlling the polishing brush and the cleaning unit.
The working mode of the device provided by the invention is as follows: when the workpiece to be polished needs to be polished, the blocking part is retracted, and the control unit controls the polishing brush to slide to be in contact with the surface of the workpiece to be polished and starts polishing; when the polishing brush needs to be cleaned, the control unit controls the polishing brush to slide to the lower side of the cleaning unit, the partition part is unfolded, and the cleaning unit is opened to clean the polishing brush.
In summary, according to the polishing device provided by the invention, the blocking unit is arranged on one side of the polishing brush, so that the damage of impurities generated in the cleaning process of the polishing brush to the surface of the workpiece to be polished can be effectively reduced, the polishing frequency of the workpiece to be polished is reduced, and the effective working time of the workpiece to be polished is prolonged.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the invention has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.
Claims (10)
1. A method of polishing, comprising the steps of:
polishing a to-be-polished piece for the first time by using a polishing brush, stopping polishing for the first time after polishing for 5-30min, and cleaning the polishing brush for the first time, wherein waste water and impurities generated by cleaning for the first time do not contact with the to-be-polished piece;
repeating the polishing-cleaning steps at least twice to complete the polishing process of the piece to be polished;
wherein the first cleaning comprises the steps of: and rinsing the surface of the polishing brush for 1-5min by using deionized water, drying the polishing brush, and repeating the rinsing-drying steps at least twice to finish the first cleaning of the polishing brush.
2. The polishing method as set forth in claim 1, further comprising, before the first polishing: and inspecting the polishing brush to ensure that the surface of the polishing brush is clean and tidy and the direction of bristles is consistent.
3. The polishing method according to claim 1 or 2, characterized in that the first polishing specifically comprises the steps of: wetting the polishing brush, moving the polishing brush to be in contact with the surface of a piece to be polished, setting polishing parameters, and polishing the piece to be polished for the first time, wherein the polishing parameters comprise polishing current, vibration frequency and polishing brush rotating speed.
4. The polishing method according to claim 3, wherein the member to be polished is a cathode roll, and the polishing-cleaning step is repeated 3 times.
5. The polishing method as claimed in claim 4, wherein in the first polishing, the polishing current is set to 6-10A, the vibration frequency is set to 200-300rpm, and the rotation speed is set to 180-300 rpm; in the second polishing, the polishing current is set to be 5-9A, the vibration frequency is set to be 200-300rpm, and the rotation speed is set to be 180-300 rpm; in the third polishing, the polishing current is set to be 4-8A, the vibration frequency is set to be 200-300rpm, and the rotation speed is set to be 180-300 rpm.
6. The polishing method according to claim 1 or 2, characterized in that the first cleaning specifically comprises the steps of: keeping the polishing brush rotating, washing the surface of the polishing brush for 1-5min by using deionized water, then increasing the rotating speed of the polishing brush to be more than 500rpm, drying the water on the surface of the polishing brush, and repeating the washing-drying steps at least twice to finish the first cleaning of the polishing brush.
7. The polishing method as set forth in claim 1, further comprising, after completion of the polishing process: and drying the polishing brush, and periodically checking and finishing the polishing brush.
8. An apparatus for performing the polishing method according to any one of claims 1 to 7, wherein the apparatus comprises a main body, a polishing brush slidably disposed on the main body, a cleaning unit disposed at one side of the polishing brush for cleaning the polishing brush, and a barrier unit;
the blocking unit is arranged on the other side, far away from the cleaning unit, of the polishing brush and comprises a storage part and a blocking part, the storage part is arranged on the main body, the blocking part can be stored in the storage part, and the blocking part covers at least part of the surface of the polishing brush when being unfolded and is used for blocking waste water and impurities generated in the first cleaning process from contacting with the polishing piece to be polished.
9. The apparatus of claim 8, further comprising a slide unit slidably disposed on the body and fixedly coupled to the polishing brush for moving the polishing brush.
10. The apparatus of claim 8, further comprising a drain unit located below the cleaning unit for collecting waste water and impurities generated when the cleaning unit cleans the polishing brush.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111122993.6A CN113560964A (en) | 2021-09-24 | 2021-09-24 | Polishing method and device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202111122993.6A CN113560964A (en) | 2021-09-24 | 2021-09-24 | Polishing method and device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN113560964A true CN113560964A (en) | 2021-10-29 |
Family
ID=78174300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202111122993.6A Pending CN113560964A (en) | 2021-09-24 | 2021-09-24 | Polishing method and device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113560964A (en) |
Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03131472A (en) * | 1989-10-17 | 1991-06-05 | Mitsubishi Materials Corp | Cutting or grinding processing method |
| CN1550289A (en) * | 2003-05-20 | 2004-12-01 | 豪尼机械制造股份公司 | Method for cleaning a grinding body coated with cubi boron nitride and apparatus for performing said method |
| CN204192437U (en) * | 2014-10-10 | 2015-03-11 | 葳玛机械（新西兰）有限公司 | A kind of cleaning polishing equipment |
| CN105177695A (en) * | 2015-08-10 | 2015-12-23 | 灵宝华鑫铜箔有限责任公司 | Cathode roller PVA polishing technology |
| DE102014111158A1 (en) * | 2014-08-06 | 2016-02-11 | Klingelnberg Ag | Device with fluid nozzle arrangement for delivering a fluid to a grinding tool and use of a fluid nozzle arrangement in a grinding machine |
| CN207256006U (en) * | 2017-08-21 | 2018-04-20 | 上海哈特工业设备有限公司 | A kind of fiber wheel |
| CN108032205A (en) * | 2017-11-27 | 2018-05-15 | 徐鹏威 | A kind of burnishing device with cleaning assembly |
| CN108127540A (en) * | 2017-12-12 | 2018-06-08 | 山东金宝电子股份有限公司 | A kind of polishing process of electrolytic copper foil production cathode roll |
| CN208163300U (en) * | 2018-04-19 | 2018-11-30 | 滁州克莱帝玻璃科技有限公司 | A kind of process equipment of refrigerator plate glass |
| CN110340762A (en) * | 2019-07-16 | 2019-10-18 | 淮南巧天机械设备技术有限公司 | A kind of polishing machine |
| CN110565158A (en) * | 2019-10-08 | 2019-12-13 | 陕西汉和新材料科技有限公司 | novel cathode titanium roller online polishing method and online polishing device |
| CN210435914U (en) * | 2019-08-09 | 2020-05-01 | 晋江市德诺机械设备有限公司 | Multi-station three-axis linkage numerical control polishing equipment |
| CN111451920A (en) * | 2020-05-25 | 2020-07-28 | 宁波大榭开发区佳洁锌铸件有限公司 | Full-automatic polishing machine |
| CN211681520U (en) * | 2020-02-27 | 2020-10-16 | 徐州永泽新材料科技有限公司 | Monocrystalline silicon piece polishing machine with cleaning structure |
| CN112388499A (en) * | 2019-07-05 | 2021-02-23 | 云和县凯毅德电子设备厂 | Polishing machine for bearing machining |
| CN213352017U (en) * | 2020-09-14 | 2021-06-04 | 灵宝宝鑫电子科技有限公司 | Online burnishing device of crude foil cathode roll |
-
2021
- 2021-09-24 CN CN202111122993.6A patent/CN113560964A/en active Pending
Patent Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03131472A (en) * | 1989-10-17 | 1991-06-05 | Mitsubishi Materials Corp | Cutting or grinding processing method |
| CN1550289A (en) * | 2003-05-20 | 2004-12-01 | 豪尼机械制造股份公司 | Method for cleaning a grinding body coated with cubi boron nitride and apparatus for performing said method |
| DE102014111158A1 (en) * | 2014-08-06 | 2016-02-11 | Klingelnberg Ag | Device with fluid nozzle arrangement for delivering a fluid to a grinding tool and use of a fluid nozzle arrangement in a grinding machine |
| CN204192437U (en) * | 2014-10-10 | 2015-03-11 | 葳玛机械（新西兰）有限公司 | A kind of cleaning polishing equipment |
| CN105177695A (en) * | 2015-08-10 | 2015-12-23 | 灵宝华鑫铜箔有限责任公司 | Cathode roller PVA polishing technology |
| CN207256006U (en) * | 2017-08-21 | 2018-04-20 | 上海哈特工业设备有限公司 | A kind of fiber wheel |
| CN108032205A (en) * | 2017-11-27 | 2018-05-15 | 徐鹏威 | A kind of burnishing device with cleaning assembly |
| CN108127540A (en) * | 2017-12-12 | 2018-06-08 | 山东金宝电子股份有限公司 | A kind of polishing process of electrolytic copper foil production cathode roll |
| CN208163300U (en) * | 2018-04-19 | 2018-11-30 | 滁州克莱帝玻璃科技有限公司 | A kind of process equipment of refrigerator plate glass |
| CN112388499A (en) * | 2019-07-05 | 2021-02-23 | 云和县凯毅德电子设备厂 | Polishing machine for bearing machining |
| CN110340762A (en) * | 2019-07-16 | 2019-10-18 | 淮南巧天机械设备技术有限公司 | A kind of polishing machine |
| CN210435914U (en) * | 2019-08-09 | 2020-05-01 | 晋江市德诺机械设备有限公司 | Multi-station three-axis linkage numerical control polishing equipment |
| CN110565158A (en) * | 2019-10-08 | 2019-12-13 | 陕西汉和新材料科技有限公司 | novel cathode titanium roller online polishing method and online polishing device |
| CN211681520U (en) * | 2020-02-27 | 2020-10-16 | 徐州永泽新材料科技有限公司 | Monocrystalline silicon piece polishing machine with cleaning structure |
| CN111451920A (en) * | 2020-05-25 | 2020-07-28 | 宁波大榭开发区佳洁锌铸件有限公司 | Full-automatic polishing machine |
| CN213352017U (en) * | 2020-09-14 | 2021-06-04 | 灵宝宝鑫电子科技有限公司 | Online burnishing device of crude foil cathode roll |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102554748B (en) | Polishing method | |
| US11945008B2 (en) | Roller cleaning method and roller cleaning machine | |
| CN213915150U (en) | Cleaning device for precision mechanical parts | |
| CN107081285A (en) | A kind of steel wire rope purging system | |
| CN104438377A (en) | Automatic control system and method for strip steel surface rust removal | |
| CN113560964A (en) | Polishing method and device | |
| KR20090073582A (en) | Controlling method of washing machine | |
| KR20090101676A (en) | System and method for polishing a metal tape surface | |
| KR100925620B1 (en) | Brush Scrubbing Apparatus for Continuous Galvanizing Line | |
| JP3708740B2 (en) | Polishing apparatus and polishing method | |
| CN109778211A (en) | Workpiece degreasing process and degreasing plant before a kind of electrophoresis | |
| CN110355155A (en) | A kind of convenience removes the automobile pipeline cleaning device of grease stain | |
| CN214418463U (en) | Trimming burr-free strip steel surface treatment device | |
| CN113969485B (en) | Method for cleaning filth of drum type washing equipment | |
| JP2002273358A (en) | Method for cleaning optical element | |
| CN219094750U (en) | Polishing device | |
| KR19980073947A (en) | Wafer cleaning method | |
| JP3218796B2 (en) | Metal strip drainer | |
| CN111037439B (en) | Device for removing oxidation and cleaning surface of prestressed steel strand and working method thereof | |
| CN214441262U (en) | Automatic cleaning equipment is used in smart production of alloy | |
| JP2713064B2 (en) | Descaling device for hot rolled steel strip | |
| CN220592787U (en) | Polishing anti-splashing device | |
| CN217941043U (en) | Wafer polishing solution residue cleaning device | |
| CN212395998U (en) | Mud discharging and cleaning assembly of filter press | |
| CN217963857U (en) | Flaked silicon wafer cleaning device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20211029 |