CN112831756A - Automatic vacuum evaporation method - Google Patents
Automatic vacuum evaporation method Download PDFInfo
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- CN112831756A CN112831756A CN202011623227.3A CN202011623227A CN112831756A CN 112831756 A CN112831756 A CN 112831756A CN 202011623227 A CN202011623227 A CN 202011623227A CN 112831756 A CN112831756 A CN 112831756A
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- evaporation
- vacuum
- vacuum evaporation
- coating material
- pump
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The application provides an automatic vacuum evaporation method, adopts vacuum evaporation machine full automatization to carry out vacuum evaporation, includes the step: s1, vacuumizing the chamber of the vacuum evaporator by using a rough pump; s2, turning off the rough pump, and continuing to vacuumize by adopting the fine pump; s3, preheating by a heating lamp in the cavity of the vacuum evaporator while vacuumizing S2, and removing moisture on the surface of the workpiece product; s4, preheating the evaporation coating material in the crucible at the same time of starting heating by the heating lamp in the step S3, and melting the granular evaporation coating material into a whole; s5, starting an ion source device, and bombarding the surface of the workpiece product in a physical mode; s6, changing the evaporation coating material from solid state to liquid state to gas state by electron beam or thermal resistance evaporation principle, making the evaporation coating material gas molecule reach the surface of the workpiece, and forming coating on the surface of the workpiece after solidification.
Description
Technical Field
The invention relates to the technical field of evaporation machines, in particular to an automatic vacuum evaporation method.
Background
The vacuum evaporation plating machine is characterized in that under the vacuum condition, a coating material (or called a coating material) is evaporated and gasified by means of current heating, electron beam bombardment heating, ion-assisted bombardment substrate precleaning, ion-assisted coating and the like, and then the gasified particles fly to the surface of a substrate to be condensed, and finally a film is formed. The vacuum evaporation has the advantages of simple film forming method, high film purity and compactness, unique film structure and performance and the like, thereby being widely applied.
Most of the existing vacuum evaporation methods are semi-automatic, the production efficiency is low, and the adhesion of a coating film on the surface of a workpiece product is poor.
In view of the above, the present invention provides an automatic vacuum evaporation method, which is fully automatic, has high production efficiency, and has good adhesion of the coating film on the surface of the workpiece product.
Disclosure of Invention
The invention aims to provide an automatic vacuum evaporation method which is full-automatic, high in production efficiency and good in coating film adhesion of the surface of a workpiece product.
An automatic vacuum evaporation method adopts a vacuum evaporation machine to carry out vacuum evaporation in a full-automatic manner, and comprises the following steps:
s1, vacuumizing the cavity of the vacuum evaporation machine by using a rough pump, so that the pressure in the cavity of the vacuum evaporation machine is 10-40 pa;
s2, closing the rough pump, and continuously vacuumizing the chamber of the vacuum evaporation machine by adopting the fine pump to ensure that the pressure in the chamber of the vacuum evaporation machine is 1 multiplied by 10-1Pa～1×10-5Pa；
S3, preheating by a heating lamp in a cavity of the vacuum evaporation machine while vacuumizing S2, heating by the heating lamp in a vacuum environment, removing moisture on the surface of a workpiece product, and increasing the dryness of the surface of a coated product so as to increase the adhesion;
s4, preheating the evaporation coating material in the crucible when the heating lamp starts to heat in the step S3 or after the step S3, so that the granular evaporation coating material is melted into a whole, and the subsequent coating evaporation is facilitated;
s5, starting an ion source device, and bombarding the surface of a workpiece product in a physical mode through argon ions generated after argon molecules are ionized by the ion source device, so that the effects of cleaning and increasing the surface roughness are achieved, and the adhesion of subsequent coating is increased;
s6, the evaporation coating material melted into a whole body in the crucible is heated by electron beam bombardment or by current heating to change the evaporation coating material from a solid state to a liquid state to a gaseous state by utilizing the principle of electron beam or thermal resistance evaporation, so that gas molecules of the evaporation coating material reach the surface of the workpiece, and a coating is formed on the surface of the workpiece after solidification.
In some embodiments, in step S1, the roughing pump includes: oil pump, or dry pump.
Further, the pressure in the chamber of the vacuum evaporator reaches 10pa-40pa, and the sensor starts to transmit a signal to the fine pump.
In some embodiments, in step S2, the fine pump includes: one of a cryopump, a molecular pump, or a diffusion pump.
Further, after the rough pump is closed, the high valve PV11 of the fine pump is opened, and the fine pump starts to work.
In some embodiments, before step S3 and after step S2, the method further comprises the steps of: continuously vacuumizing the chamber of the vacuum evaporation machine to ensure that the pressure in the chamber is 9.9 multiplied by 10-3Pa～1.0×10-7Pa, to a higher degree of vacuum.
In some embodiments, the ion source device is turned on at the same time of coating in step S6, and turning on the ion source device at the same time of coating can play a role in assisting coating, so as to increase the compactness of coating.
Further, the ion source device is started while the film is coated in the step S6, and argon ions and the evaporated atoms of the film coating material are subjected to secondary collision, so that the energy of the atoms of the film coating material is increased, the free stroke distance of the atoms is changed, the molecular motion track of the evaporated film coating material is changed, the arrangement sequence of the atoms is increased, the compactness of the film is greatly improved, and the electrical property of the film coated product is improved.
In some embodiments, in step S6, the crucible is cooled (due to the large amount of heat generated) after each evaporation of one of the evaporated coating materials is completed.
Further, after all the evaporation coating materials are evaporated, breaking air in a chamber of the vacuum evaporation machine, wherein the breaking air is to fill dry and clean nitrogen into the chamber of the vacuum evaporation machine, so that the pressure in the chamber of the vacuum evaporation machine is reduced to atmospheric pressure from high vacuum, and then the coated workpiece product is taken out.
Detailed Description
The following examples are described to aid in the understanding of the present application and are not, and should not be construed to, limit the scope of the present application in any way.
Example 1
An automatic vacuum evaporation method adopts a vacuum evaporation machine to carry out vacuum evaporation in a full-automatic manner, and comprises the following steps:
s1, vacuumizing the cavity of the vacuum evaporation machine by using a rough pump, so that the pressure in the cavity of the vacuum evaporation machine is 10-40 pa;
s2, closing the rough pump, and continuously vacuumizing the chamber of the vacuum evaporation machine by adopting the fine pump to ensure that the pressure in the chamber of the vacuum evaporation machine is 1 multiplied by 10-1Pa～1×10-5Pa；
S3, preheating by a heating lamp in a cavity of the vacuum evaporation machine while vacuumizing S2, heating by the heating lamp in a vacuum environment, removing moisture on the surface of a workpiece product, and increasing the dryness of the surface of a coated product so as to increase the adhesion;
s4, preheating the evaporation coating material in the crucible when the heating lamp starts to heat in the step S3, so that the granular evaporation coating material is melted into a whole, and the subsequent coating evaporation is facilitated;
s5, starting an ion source device, and bombarding the surface of a workpiece product in a physical mode through argon ions generated after argon molecules are ionized by the ion source device, so that the effects of cleaning and increasing the surface roughness are achieved, and the adhesion of subsequent coating is increased;
s6, the evaporation coating material melted into a whole body in the crucible is heated by electron beam bombardment or by current heating to change the evaporation coating material from a solid state to a liquid state to a gaseous state by utilizing the principle of electron beam or thermal resistance evaporation, so that gas molecules of the evaporation coating material reach the surface of the workpiece, and a coating is formed on the surface of the workpiece after solidification.
In step S1, the roughing pump includes: oil pump, or dry pump. The pressure in the chamber of the vacuum evaporator reaches 10pa-40pa,the sensor initiates transmission of a signal to the fine pump. In step S2, the fine pump includes: one of a cryopump, a molecular pump, or a diffusion pump. After the rough pump is closed, the high valve PV11 of the fine pump is opened and the fine pump starts to work. Before step S3 and after step S2, the method further includes the steps of: continuously vacuumizing the chamber of the vacuum evaporation machine to ensure that the pressure in the chamber is 9.9 multiplied by 10-3Pa～1.0×10-7Pa, to a higher degree of vacuum. And (5) in the step S6, the ion source device is started while coating, and the ion source device can play a role in assisting coating while coating, so that the coating compactness is improved. And (3) starting the ion source device while coating in the step (S6), and increasing the energy of the atoms of the coating material and changing the free stroke distance of the atoms by the secondary collision of the argon ions and the atoms of the coating material to be evaporated, so that the molecular motion track of the coating material to be evaporated is changed, the arrangement sequence of the atoms is increased, the compactness of the film is greatly improved, and the electrical property of the coated product is improved. In step S6, after each evaporation of one of the evaporated coating materials, the crucible is cooled (due to the generation of a large amount of heat). After all the evaporation coating materials are evaporated, breaking gas in a chamber of the vacuum evaporation machine, wherein the gas breaking is to fill dry and clean nitrogen into the chamber of the vacuum evaporation machine, so that the pressure in the chamber of the vacuum evaporation machine is reduced to atmospheric pressure from high vacuum, and then the coated workpiece product is taken out.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the present invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (9)
1. An automatic vacuum evaporation method is characterized in that a vacuum evaporation machine is adopted to carry out vacuum evaporation in a full-automatic mode, and the method comprises the following steps:
s1, vacuumizing the cavity of the vacuum evaporation machine by using a rough pump, so that the pressure in the cavity of the vacuum evaporation machine is 10-40 pa;
s2, closing the rough pump, and continuously vacuumizing the chamber of the vacuum evaporation machine by adopting the fine pump to ensure that the pressure in the chamber of the vacuum evaporation machine is 1 multiplied by 10-1Pa～1×10-5Pa；
S3, preheating by a heating lamp in a cavity of the vacuum evaporation machine while vacuumizing S2, heating by the heating lamp in a vacuum environment, removing moisture on the surface of a workpiece product, and increasing the dryness of the surface of a coated product so as to increase the adhesion;
s4, preheating the evaporation coating material in the crucible at the same time of starting heating by the heating lamp in the step S3 or after the step S3, so that the granular evaporation coating material is melted into a whole and is convenient for subsequent coating evaporation;
s5, starting an ion source device, and bombarding the surface of a workpiece product in a physical mode through argon ions generated after argon molecules are ionized by the ion source device, so that the effects of cleaning and increasing the surface roughness are achieved, and the adhesion of subsequent coating is increased;
s6, the evaporation coating material melted into a whole body in the crucible is heated by electron beam bombardment or by current heating to change the evaporation coating material from a solid state to a liquid state to a gaseous state by utilizing the principle of electron beam or thermal resistance evaporation, so that gas molecules of the evaporation coating material reach the surface of the workpiece, and a coating is formed on the surface of the workpiece after solidification.
2. The automated vacuum evaporation method of claim 1, wherein in step S1, the roughing pump comprises: oil pump, or dry pump.
3. The automated vacuum evaporation method of claim 2, wherein the pressure in the chamber of the vacuum evaporator reaches 10pa to 40pa, and the sensor starts to transmit a signal to the vacuum pump.
4. The automated vacuum evaporation method of claim 1, wherein in step S2, the fine pump comprises: one of a cryopump, a molecular pump, or a diffusion pump.
5. The automated vacuum evaporation method of claim 1, further comprising, before step S3 and after step S2: continuously vacuumizing the chamber of the vacuum evaporation machine to ensure that the pressure in the chamber is 9.9 multiplied by 10-3Pa～1.0×10-7Pa, to a higher degree of vacuum.
6. The automated vacuum evaporation method of claim 1, wherein the ion source device is turned on at the same time of the step S6, and the turning on of the ion source device at the same time of the step S6 can assist the deposition and increase the compactness of the deposition.
7. The automated vacuum evaporation method of claim 6, wherein the argon ions collide with the evaporated atoms of the coating material for a second time, thereby increasing the energy of the atoms of the coating material and changing the distance of the free path of the atoms, so that the molecular motion trajectory of the evaporated coating material is changed, thereby increasing the sequence of the atoms, greatly improving the compactness of the coating film, and improving the electrical properties of the coated product.
8. The automated vacuum evaporation method of claim 1, wherein in step S6, the crucible is cooled after each evaporation of one of the evaporated coating materials.
9. The automated vacuum deposition method of claim 8, wherein after all the evaporation coating materials are deposited, the chamber of the vacuum deposition machine is de-aerated, wherein the de-aerated is to fill dry and clean nitrogen gas into the chamber of the vacuum deposition machine, so that the pressure in the chamber of the vacuum deposition machine is reduced from high vacuum to atmospheric pressure, and then the coated workpiece product is taken out.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011623227.3A CN112831756A (en) | 2020-12-31 | 2020-12-31 | Automatic vacuum evaporation method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011623227.3A CN112831756A (en) | 2020-12-31 | 2020-12-31 | Automatic vacuum evaporation method |
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| CN112831756A true CN112831756A (en) | 2021-05-25 |
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| CN202011623227.3A Pending CN112831756A (en) | 2020-12-31 | 2020-12-31 | Automatic vacuum evaporation method |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115094388A (en) * | 2022-07-08 | 2022-09-23 | 广东信大科技有限公司 | Heating pipe coating method and rose gold pipe and gold pipe prepared by same |
| CN115094372A (en) * | 2022-07-08 | 2022-09-23 | 深圳市创基真空科技有限公司 | Method and device for coating film on surface of plastic substrate |
| WO2023060941A1 (en) * | 2021-10-14 | 2023-04-20 | 中国华能集团清洁能源技术研究院有限公司 | Method for preparing electrode film layer on surface of solar cell substrate |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2023060941A1 (en) * | 2021-10-14 | 2023-04-20 | 中国华能集团清洁能源技术研究院有限公司 | Method for preparing electrode film layer on surface of solar cell substrate |
| CN115094388A (en) * | 2022-07-08 | 2022-09-23 | 广东信大科技有限公司 | Heating pipe coating method and rose gold pipe and gold pipe prepared by same |
| CN115094372A (en) * | 2022-07-08 | 2022-09-23 | 深圳市创基真空科技有限公司 | Method and device for coating film on surface of plastic substrate |
| CN115094388B (en) * | 2022-07-08 | 2024-02-09 | 广东信大科技有限公司 | Heating pipe coating method and rose gold pipe prepared by heating pipe coating method |
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