Self-purification silicon wafer conveying device
Technical Field
The invention relates to the technical field of silicon wafer conveying, in particular to a self-purifying silicon wafer conveying device.
Background
The battery cells made of silicon wafers are generally classified into single crystal silicon, polycrystalline silicon, and amorphous silicon. Monocrystalline silicon solar cells are the fastest currently developed type of solar cells, the construction and production process of which are established, and the products are widely used in space and ground. The solar cell uses high-purity monocrystalline silicon rods as raw materials. In order to reduce the production cost, solar cells and the like applied to the ground adopt solar-grade monocrystalline silicon rods, and the material performance index is relaxed. Some single crystal silicon rods special for solar cells can be prepared by redrawing the semiconductor device processing head and tail materials and waste single crystal silicon materials.
After the silicon wafer is cut, the silicon wafer can be conveyed into the reaction chamber to carry out treatment reaction after a series of conveying, but the surface of the silicon wafer is often stained with dirt and the like during transportation, so that the silicon wafer is damaged, and the performance of the silicon wafer is reduced.
The above-described problems are a need in the art for a solution.
Disclosure of Invention
The invention aims to solve the technical problem of providing a self-purifying silicon wafer conveying device, so that external dust can be isolated in the process of conveying silicon wafers, and the silicon wafers are prevented from being damaged.
In order to solve the technical problems, the scheme provided by the invention is as follows: the utility model provides a self-purification silicon chip conveyer, includes the conveyor that the symmetry set up, conveyor one side is provided with dustproof frame, dustproof frame inside is located two the centre of conveyor one side is provided with the manipulator, the manipulator one side is provided with the absorption and sweeps the runway, the absorption sweeps the runway both sides and is provided with dustproof runway, be provided with the microscope carrier on the dustproof runway, dustproof frame inside is located dustproof runway top is provided with grabbing device, dustproof frame inside is located grabbing device one side is provided with the truss, be provided with the clamping jaw on the truss.
As a further improvement of the invention, an alignment device is arranged below the grabbing device on the adsorption purging runway, the alignment device comprises a support, a silicon wafer groove is arranged at the top of the support, a cylinder is arranged between the supports, and a silicon wafer groove is arranged at the output end of the cylinder.
As a further improvement of the invention, the bottom of the dustproof frame is provided with a material receiving drawer.
As a further improvement of the invention, the conveying device comprises a frame, a mounting plate is arranged in the middle of the frame, conveying runways are symmetrically arranged on the mounting plate and the bottom inside the frame, limiting plates are arranged on two sides of the conveying runways, guide blocks are arranged at two ends of the conveying runways, a regular runway is arranged at one end of the conveying runway on the mounting plate, a blocking plate and a regular cylinder are arranged at the tail of the regular runway, a receiving runway is arranged at one end of the conveying runway at the bottom inside the frame, and air curtains are arranged on the side surfaces of the frame and above the conveying runway.
As a further improvement of the invention, the adsorption purging runway comprises a rail, a movable placing device is arranged on the rail, air blowing pipes are symmetrically arranged on the placing device, adsorption devices are symmetrically arranged on two sides of the rail, and purging devices are arranged on two sides of the rail and positioned at one end of the adsorption devices.
As a further improvement of the invention, the dustproof runway comprises a mounting frame, two ends of the mounting frame are respectively provided with a rotatable driven wheel and a rotatable driving wheel, the driven wheel and the driving wheel are sleeved with a conveyor belt, a protection plate for covering the bottom of the conveyor belt is arranged in the mounting frame, moving tracks are arranged on two sides of the conveyor belt in the mounting frame, sliding blocks are arranged on the moving tracks and are connected with the conveyor belt, and an isolation cover is arranged at the top of the mounting frame.
As a further improvement of the invention, the grabbing device comprises a mounting seat, wherein first clamping devices are symmetrically arranged on two sides of the mounting seat, a first air blowing pipe and a second air blowing pipe are arranged on the first clamping devices, second clamping devices are symmetrically arranged in the middle of the mounting seat, and a third air blowing pipe is arranged on the second clamping devices.
As a further improvement of the invention, the carrier is provided with a purge tube.
As a further improvement of the invention, a purge pipe is arranged at the drag chain on the grabbing device.
The invention has the beneficial effects that:
the invention has reasonable and simple structure and convenient operation, the basket for storing the silicon chips is placed in the conveying device and conveyed to the manipulator, the silicon chips on the basket are clamped to the adsorption sweeping runway by the manipulator, the silicon chips are conveyed to the position right below the grabbing device, the silicon chips are grabbed to the dustproof runway on one side by the grabbing device, finally the quartz boat on the dustproof runway is grabbed to the reaction device by the clamping jaw to react, the reacted silicon chips are clamped to the dustproof runway on the other side by the clamping jaw, the silicon chips are clamped to the adsorption sweeping runway by the grabbing device, the adsorption sweeping runway conveys the silicon chips to the manipulator, the manipulator grabs the silicon chips to the conveying device, finally the whole process of conveying the silicon chips is completed in the dustproof frame, thereby isolating dust and avoiding pollution to the silicon chips.
Drawings
FIG. 1 is a schematic diagram of the structure of the present invention;
FIG. 2 is a schematic view of the structure of the dust-proof housing of the present invention;
FIG. 3 is an enlarged schematic view at I in FIG. 2;
FIG. 4 is an enlarged schematic view at II in FIG. 2;
FIG. 5 is a schematic view of the structure of the conveying device of the present invention;
FIG. 6 is an enlarged schematic view of portion A of FIG. 5;
FIG. 7 is a schematic view of a conveyor apparatus of the present invention from another perspective;
FIG. 8 is an enlarged schematic view of portion B of FIG. 7;
FIG. 9 is a schematic diagram of the adsorption purge runway of the present invention;
FIG. 10 is a schematic view of the dust runway of the present invention;
FIG. 11 is a schematic view of the structure of the gripping device of the present invention;
FIG. 12 is a schematic view of the structure of the gripping device of the present invention;
fig. 13 is a schematic view of the structure of the alignment device of the present invention.
Reference numerals: 1. a conveying device; 101. a frame; 102. a mounting plate; 103. conveying runways; 1031. a limiting plate; 1032. a guide block; 104. a wind curtain; 105. a runway is regulated; 106. a blocking plate; 107. a regular cylinder; 108. receiving a runway; 2. a manipulator; 3. adsorbing and purging the runway; 301. a track; 302. a placement device; 303. an adsorption device; 304. a purge device; 305. an air blowing pipe; 4. a dust-proof runway; 401. a mounting frame; 402. a protection plate; 403. driven wheel; 404. a driving wheel; 405. a conveyor belt; 406. a moving track; 407. a slide block; 408. an isolation cover; 5. a dust-proof rack; 6. a gripping device; 601. a mounting base; 602. a first gripping device; 603. a second gripping device; 604. a first air blowing pipe; 605. a second air blowing pipe; 606. a third air blowing pipe; 7. truss; 8. a clamping jaw; 9. a carrier; 10. an alignment device; 1001. a bracket; 1002. a silicon wafer groove; 1003. a cylinder; 11. a material receiving drawer; 12. purge tube.
Detailed Description
The present invention will be further described with reference to the accompanying drawings and specific examples, which are not intended to be limiting, so that those skilled in the art will better understand the invention and practice it.
Referring to fig. 1, an embodiment of the present invention includes symmetrically arranged conveying devices 1, a dustproof frame 5 is disposed on one side of the conveying devices 1, a manipulator 2 is disposed in the dustproof frame 5 and located in the middle of one side of the two conveying devices 1, an adsorption purging runway 3 is disposed on one side of the manipulator 2, dustproof runways 4 are disposed on two sides of the adsorption purging runway 3, a carrying platform 9 is disposed on the dustproof runways 4, a grabbing device 6 is disposed in the dustproof frame 5 and located above the dustproof runways 4, a truss 7 is disposed in the dustproof frame 5 and located on one side of the grabbing device 6, and clamping jaws 8 are disposed on the truss 7; the method comprises the steps of respectively placing quartz boats on a carrying platform 9 and an adsorption purging runway 3, placing a basket of flowers for storing silicon wafers in a conveying device 1, conveying the basket of flowers to a manipulator 2, clamping the silicon wafers to the inside of the quartz boats on the adsorption purging runway 3 through the manipulator 2, conveying the quartz boats to the lower part of a grabbing device 6 through the adsorption purging runway 3, clamping the silicon wafers on the quartz boats to the inside of the quartz boats on the carrying platform 9 through the grabbing device 6, conveying the quartz boats to the lower part of clamping jaws 8 through one of dustproof runways 4, and grabbing and moving the quartz boats for storing the silicon wafers to the inside of a reaction device through the clamping jaws 8 on a truss 7 for reaction; after the silicon chip reaction is completed, the quartz boat is grabbed onto the other dustproof runway 4 through the clamping jaw 8, the quartz boat is conveyed to the lower part of the grabbing device 6 through the dustproof runway 4, the silicon chip inside the quartz boat is grabbed onto the adsorption sweeping runway 3 through the grabbing device 6 and is conveyed to the manipulator 2, the silicon chip is clamped into the conveying device 1 through the manipulator 2 and is conveyed and collected after the reaction, and the whole process of conveying the silicon chip is completed inside the dustproof frame 5, so that dust can be isolated, and pollution to the silicon chip is avoided.
In this embodiment, the alignment device 10 is arranged below the grabbing device 6 on the adsorption and purging runway 3, the alignment device 10 comprises a bracket 1001, a silicon wafer groove 1002 is arranged at the top of the bracket 1001, an air cylinder 1003 is arranged between the brackets 1001, a silicon wafer groove 1002 is arranged at the output end of the air cylinder 1003, when the silicon wafer on the adsorption and purging runway 3 is conveyed to the grabbing device 6, the silicon wafer can be orderly arranged through the silicon wafer groove 1002 on the air cylinder 1003 and the silicon wafer groove 1002 arranged at the top of the bracket 1001, and the grabbing effect of the grabbing device 6 on the silicon wafer is improved.
In this embodiment, the bottom of the dustproof frame 5 is provided with a material receiving drawer 11, which can collect dust and scattered silicon chips on the adsorption and purging runway 3 and the dustproof runway 4.
In this embodiment, the conveying device 1 includes a frame 101, a mounting plate 102 is disposed in the middle of the frame 101, conveying runways 103 are symmetrically disposed on the mounting plate 102 and at the bottom inside the frame 101, limiting plates 1031 are disposed on two sides of the conveying runways 103, guide blocks 1032 are disposed on two ends of the conveying runways 103, a regular runway 105 is disposed at one end of the conveying runway 103 on the mounting plate 102, a blocking plate 106 and a regular cylinder 107 are disposed at the tail of the regular runway 105, a receiving runway 108 is disposed at one end of the conveying runway 103 at the bottom inside the frame 101, and air curtains 104 are disposed above the conveying runway 103 on the side surfaces of the frame 101; the air curtain 104 continuously works, dust outside the air curtain is isolated from entering the frame 101, a basket for storing silicon wafers is placed on the conveying runway 103 on the mounting plate 102 and is conveyed to the regular runway 105, the basket is regular through the blocking plate 106 and the regular air cylinder 107, finally the silicon wafers are grabbed through the manipulator 2, and meanwhile the reacted silicon wafers are conveyed to the conveying runway 103 through the receiving runway 108 to be collected.
In this embodiment, the adsorption and purging runway 3 includes a track 301, a movable placement device 302 is disposed on the track 301, air blowing pipes 305 are symmetrically disposed on the placement device 302, adsorption devices 303 are symmetrically disposed on two sides of the track 301, and purging devices 304 are disposed on two sides of the track 301 at one end of the adsorption devices 303; the quartz boat is placed in the placement device 302 for transportation, the air blowing pipe 305 sweeps the quartz boat, dust is prevented from being polluted by silicon wafers, the quartz boat sweeps and adsorbs the silicon wafers scattered inside the quartz boat through the sweeping device 304 and the adsorption device 303 during movement, and the silicon wafers are kept clean.
In this embodiment, dustproof runway 4, including mounting bracket 401, mounting bracket 401 both ends are provided with rotatable follow driving wheel 403 and action wheel 404 respectively, follow driving wheel 403 and action wheel 404 on the cover be equipped with conveyer belt 405, the inside guard plate 402 that is provided with of mounting bracket 401 covers conveyer belt 405 bottom, the inside conveyer belt 405 both sides that lie in of mounting bracket 401 are provided with the removal track 406, be provided with slider 407 on the removal track 406, slider 407 is connected with conveyer belt 405, mounting bracket 401 top is provided with cage 408, protect conveyer belt 407, follow driving wheel 403 and action wheel 404 through cage 408 and guard plate 402, prevent that scattered objects such as dust from causing damage to it.
In this embodiment, the grabbing device 6 includes a mounting base 601, a first clamping device 602 is symmetrically arranged on two sides of the mounting base 601, a first air blowing pipe 604 and a second air blowing pipe 605 are arranged on the first clamping device 602, a second clamping device 603 is symmetrically arranged in the middle of the mounting base 601, a third air blowing pipe 606 is arranged on the second clamping device 603, and when the first clamping device 602 and the second clamping device 603 clamp the silicon wafer, the silicon wafer is subjected to air blowing dust removal treatment through the first air blowing pipe 604, the second air blowing pipe 605 and the third air blowing pipe 606, so that the silicon wafer is kept clean.
In the embodiment, the carrier 9 is provided with a purging pipe 12 for purging the carrier 9 along the moving path, so that the transportation environment is kept clean.
In the embodiment, the purging pipe 12 is arranged at the position of the drag chain on the grabbing device 6, dust can be accumulated when the drag chain moves back and forth, the purging pipe 12 is used for purging and dedusting the drag chain, the cleanliness of the drag chain can be maintained, and the silicon wafer transportation environment is improved.
The above-described embodiments are merely preferred embodiments for fully explaining the present invention, and the scope of the present invention is not limited thereto. Equivalent substitutions and modifications will occur to those skilled in the art based on the present invention, and are intended to be within the scope of the present invention. The protection scope of the invention is subject to the claims.