CN112435948A - Self-purification silicon wafer transportation device - Google Patents

Self-purification silicon wafer transportation device Download PDF

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Publication number
CN112435948A
CN112435948A CN202011406218.9A CN202011406218A CN112435948A CN 112435948 A CN112435948 A CN 112435948A CN 202011406218 A CN202011406218 A CN 202011406218A CN 112435948 A CN112435948 A CN 112435948A
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runway
silicon wafer
frame
conveying
dust
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CN112435948B (en
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王小彬
董晓清
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Wuxi Jiangsong Science And Technology Co ltd
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Wuxi Jiangsong Science And Technology Co ltd
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    • H10P72/3221
    • H10P72/0406

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Abstract

本发明涉及硅片输送技术领域,具体涉及一种自净化硅片运输装置。本发明包括对称设置的输送装置,所述输送装置一侧设置有防尘机架,所述防尘机架内部位于两个所述输送装置一侧的中间设置有机械手,所述机械手所述机械手一侧设置有吸附吹扫跑道,所述吸附吹扫跑道两侧设置有防尘跑道,所述防尘跑道上设置有载台,所述防尘机架内部位于所述防尘跑道上方设置有抓取装置,所述防尘机架内部位于所述抓取装置一侧设置有桁架,所述桁架上设置有夹爪。本发明结构合理、简单,操作便捷,从而能够在硅片输送的途中,隔绝外界的灰尘,避免对硅片造成损坏。

Figure 202011406218

The invention relates to the technical field of silicon wafer transportation, in particular to a self-purification silicon wafer transportation device. The invention includes a symmetrically arranged conveying device, a dust-proof frame is arranged on one side of the conveying device, and a manipulator is arranged inside the dust-proof frame in the middle of one side of the two conveying devices, and the manipulator is the manipulator. An adsorption and purging runway is arranged on one side, and a dust-proof runway is arranged on both sides of the adsorption and purging runway. A grasping device, a truss is arranged inside the dustproof frame on one side of the grasping device, and a clamping jaw is arranged on the truss. The present invention has reasonable and simple structure and convenient operation, so that the silicon wafer can be isolated from external dust during the transportation of the silicon wafer to avoid damage to the silicon wafer.

Figure 202011406218

Description

Self-purification silicon wafer transportation device
Technical Field
The invention relates to the technical field of silicon wafer conveying, in particular to a self-purification silicon wafer conveying device.
Background
The cell made of silicon wafer is generally classified into single crystal silicon, polycrystalline silicon, and amorphous silicon. The single crystalline silicon solar cell is the fastest developed solar cell at present, the construction and production process of the single crystalline silicon solar cell are established, and the single crystalline silicon solar cell is widely used in space and ground. The solar cell takes a high-purity silicon single crystal rod as a raw material. In order to reduce the production cost, solar-grade single crystal silicon rods are adopted for solar cells and the like applied to the ground, and the material performance index is widened. And some silicon single crystal rods special for the solar cell can also be prepared by redrawing head and tail materials processed by semiconductor devices and waste secondary single crystal silicon materials.
After the silicon wafer is cut, the silicon wafer can be conveyed into a reaction chamber for processing reaction only through a series of conveying, but the surface of the silicon wafer is often stained with dust and other stains in the conveying process, so that the silicon wafer can be damaged, and the performance of the silicon wafer is reduced.
The above problems are problems that the art needs to solve.
Disclosure of Invention
The invention aims to provide a self-purification silicon wafer conveying device, so that external dust can be isolated in the silicon wafer conveying process, and the silicon wafer is prevented from being damaged.
In order to solve the technical problem, the invention provides the following scheme: the utility model provides a self-purification silicon chip conveyer, conveyor including the symmetry setting, conveyor one side is provided with dustproof frame, the dustproof frame is inside to be located two the centre of conveyor one side is provided with the manipulator, the manipulator one side is provided with adsorbs the runway that sweeps, it is provided with dustproof runway to adsorb the runway both sides that sweep, be provided with the microscope carrier on the dustproof runway, the dustproof frame is inside to be located dustproof runway top is provided with grabbing device, the dustproof frame is inside to be located grabbing device one side is provided with the truss, be provided with the clamping jaw on the truss.
As a further improvement of the invention, an alignment device is arranged on the adsorption and purging runway and below the grabbing device, the alignment device comprises a support, a silicon wafer groove is arranged at the top of the support, an air cylinder is arranged between the supports, and a silicon wafer groove is arranged at the output end of the air cylinder.
As a further improvement of the invention, a material receiving drawer is arranged at the bottom of the dustproof rack.
As a further improvement of the invention, the conveying device comprises a frame, a mounting plate is arranged in the middle of the frame, conveying runways are symmetrically arranged on the mounting plate and at the bottom inside the frame, limiting plates are arranged on two sides of each conveying runway, guide blocks are arranged at two ends of each conveying runway, a regulating runway is arranged at one end of each conveying runway on the mounting plate, a blocking plate and a regulating cylinder are arranged at the tail of each regulating runway, a receiving runway is arranged at one end of each conveying runway at the bottom inside the frame, and air curtains are arranged on the side surfaces of the frame above the conveying runways.
As a further improvement of the invention, the adsorption purging runway comprises a rail, wherein a movable placing device is arranged on the rail, air blowing pipes are symmetrically arranged on the placing device, adsorption devices are symmetrically arranged on two sides of the rail, and purging devices are arranged on two sides of the rail at one end of the adsorption devices.
As a further improvement of the invention, the dustproof runway comprises an installation frame, wherein a rotatable driven wheel and a rotatable driving wheel are respectively arranged at two ends of the installation frame, a conveying belt is sleeved on the driven wheel and the driving wheel, a protection plate for covering the bottom of the conveying belt is arranged inside the installation frame, moving tracks are arranged inside the installation frame and positioned at two sides of the conveying belt, sliding blocks are arranged on the moving tracks, the sliding blocks are connected with the conveying belt, and an isolation cover is arranged at the top of the installation frame.
As a further improvement of the invention, the gripping device comprises an installation seat, wherein first clamping devices are symmetrically arranged on two sides of the installation seat, a first air blowing pipe and a second air blowing pipe are arranged on the first clamping devices, a second clamping device is symmetrically arranged in the middle of the installation seat, and a third air blowing pipe is arranged on the second clamping device.
As a further improvement of the invention, the carrier is provided with a purging pipe.
As a further improvement of the invention, a purging pipe is arranged at the position of the drag chain on the grabbing device.
The invention has the beneficial effects that:
the silicon wafer adsorption and blowing device is reasonable and simple in structure and convenient and fast to operate, a flower basket for storing silicon wafers is placed in the conveying device and conveyed to the manipulator, the silicon wafers on the flower basket are clamped to the adsorption and blowing runway through the manipulator, the silicon wafers are conveyed to the position under the grabbing device, the silicon wafers are grabbed to the dustproof runway on one side through the grabbing device, finally, quartz boats on the dustproof runway are grabbed to the reaction device through the clamping jaws to react, the reacted silicon wafers are clamped to the dustproof runway on the other side through the clamping jaws, the silicon wafers are clamped to the adsorption and blowing runway through the grabbing device, the silicon wafers are conveyed to the manipulator through the adsorption and blowing runway, the manipulator grabs the silicon wafers to the conveying device and finally collects the processed silicon wafers, and the whole process of conveying the silicon wafers is finished in the dustproof rack, so that dust can be isolated, and pollution to the silicon wafers.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a schematic view of the present invention with the dust guard removed;
FIG. 3 is an enlarged schematic view at I of FIG. 2;
FIG. 4 is an enlarged schematic view at II of FIG. 2;
FIG. 5 is a schematic view of the structure of the conveying apparatus of the present invention;
FIG. 6 is an enlarged view of portion A of FIG. 5;
FIG. 7 is a schematic view of another aspect of the delivery device of the present invention;
FIG. 8 is an enlarged schematic view of portion B of FIG. 7;
FIG. 9 is a schematic diagram of the configuration of the adsorption purge runway of the present invention;
fig. 10 is a schematic structural view of the dustproof runway according to the invention;
FIG. 11 is a schematic view of the construction of the grasping device of the present invention;
FIG. 12 is a schematic view of the construction of the grasping device of the present invention;
fig. 13 is a schematic view of the structure of the aligning apparatus of the present invention.
Reference numerals: 1. a conveying device; 101. a frame; 102. mounting a plate; 103. a conveying runway; 1031. a limiting plate; 1032. a guide block; 104. an air curtain; 105. regulating a runway; 106. a blocking plate; 107. arranging a cylinder; 108. receiving a runway; 2. a manipulator; 3. adsorbing and purging a runway; 301. a track; 302. a placement device; 303. an adsorption device; 304. a purging device; 305. an air blowing pipe; 4. a dustproof runway; 401. a mounting frame; 402. a protection plate; 403. a driven wheel; 404. a driving wheel; 405. a conveyor belt; 406. a moving track; 407. a slider; 408. an isolation cover; 5. a dust-proof frame; 6. a gripping device; 601. a mounting seat; 602. a first gripping device; 603. a second gripping device; 604. a first air blowing pipe; 605. a second gas blow pipe; 606. a third gas blow pipe; 7. a truss; 8. a clamping jaw; 9. a stage; 10. an alignment device; 1001. a support; 1002. a silicon wafer groove; 1003. a cylinder; 11. a material receiving drawer; 12. and (4) purging the tube.
Detailed Description
The present invention is further described below in conjunction with the following figures and specific examples so that those skilled in the art may better understand the present invention and practice it, but the examples are not intended to limit the present invention.
Referring to fig. 1, an embodiment of the invention includes symmetrically arranged conveying devices 1, a dustproof rack 5 is arranged on one side of each conveying device 1, a manipulator 2 is arranged in the dustproof rack 5 and positioned in the middle of one side of each conveying device 1, an adsorption purging runway 3 is arranged on one side of each manipulator 2, dustproof runways 4 are arranged on two sides of each adsorption purging runway 3, a carrier platform 9 is arranged on each dustproof runway 4, a grabbing device 6 is arranged above each dustproof runway 4 in each dustproof rack 5, a truss 7 is arranged on one side of each grabbing device 6 in each dustproof rack 5, and a clamping jaw 8 is arranged on each truss 7; the quartz boat is respectively placed on a carrying platform 9 and an adsorption purging runway 3, a flower basket for storing the silicon wafers is placed inside a conveying device 1 and conveyed to a manipulator 2, the silicon wafers are clamped inside the quartz boat on the adsorption purging runway 3 through the manipulator 2, the quartz boat is conveyed to the lower side of a grabbing device 6 through the adsorption purging runway 3, the silicon wafers on the quartz boat are clamped inside the quartz boat on the carrying platform 9 by the grabbing device 6, the quartz boat is conveyed to the lower side of a clamping jaw 8 through one of dust-proof runways 4, and the quartz boat for storing the silicon wafers is grabbed and moved to the inside of a reaction device through the clamping jaw 8 on a truss 7 for reaction; after the silicon chip reaction is accomplished, snatch the quartz boat to another dustproof runway 4 through clamping jaw 8, carry the quartz boat to grabbing device 6 below through dustproof runway 4, snatch the inside silicon chip of quartz boat to adsorbing and sweeping runway 3 through grabbing device 6 on, and transport to manipulator 2 department, press from both sides the silicon chip through manipulator 2 and get and carry and collect the silicon chip after the reaction to conveyor 1 in, the whole journey of carrying the silicon chip is all accomplished at dustproof frame 5 insidely, thereby can completely cut off the dust, avoid the pollution to the silicon chip.
In this embodiment, it is provided with aligning device 10 to adsorb to be located grabbing device 6 below on sweeping runway 3, aligning device 10 includes support 1001, the support 1001 top is provided with silicon chip groove 1002, be provided with cylinder 1003 between the support 1001, the cylinder 1003 output is provided with silicon chip groove 1002, when adsorbing the silicon chip that sweeps on runway 3 and carry to grabbing device 6 department, can be provided with silicon chip groove 1002 through silicon chip groove 1002 on the cylinder 1003 and support 1001 top and rule the silicon chip, improve the effect that grabbing device 6 snatched the silicon chip.
In this embodiment, the bottom of the dustproof rack 5 is provided with a material receiving drawer 11, which can collect and process dust and fragmentary silicon wafers on the adsorption and purging runway 3 and the dustproof runway 4.
In this embodiment, the conveying device 1 includes a frame 101, a mounting plate 102 is disposed in the middle of the frame 101, conveying runways 103 are symmetrically disposed on the mounting plate 102 and at the bottom inside the frame 101, limit plates 1031 are disposed on two sides of the conveying runways 103, guide blocks 1032 are disposed at two ends of the conveying runways 103, a regulating runway 105 is disposed at one end of the conveying runways 103 on the mounting plate 102, a blocking plate 106 and a regulating cylinder 107 are disposed at the tail of the regulating runway 105, a receiving runway 108 is disposed at one end of the conveying runways 103 at the bottom inside the frame 101, and air curtains 104 are disposed on the side surfaces of the frame 101 above; the air curtain 104 continuously works, isolated outside dust enters the rack 101, the flower basket storing the silicon wafers is placed on the conveying runway 103 on the mounting plate 102 and conveyed to the regulating runway 105, the flower basket is regulated through the blocking plate 106 and the regulating cylinder 107, finally the silicon wafers are grabbed through the manipulator 2, and meanwhile, the silicon wafers after the reaction are conveyed to the conveying runway 103 through the receiving runway 108 to be collected.
In this embodiment, the adsorption purging runway 3 includes a track 301, a movable placing device 302 is disposed on the track 301, air blowing pipes 305 are symmetrically disposed on the placing device 302, adsorption devices 303 are symmetrically disposed on two sides of the track 301, and purging devices 304 are disposed on two sides of the track 301 at one end of the adsorption devices 303; the quartz boat is placed and is transported in placer 302, and gas blow pipe 305 sweeps the quartz boat, avoids the silicon chip to be infected with the dust, and the quartz boat removes and sweeps and adsorbs the inside fragmentary silicon chip of quartz boat through sweeping device 304 and adsorption equipment 303 on the way for the silicon chip keeps clean and tidy.
In this embodiment, dustproof runway 4, including mounting bracket 401, mounting bracket 401 both ends are provided with rotatable follow driving wheel 403 and action wheel 404 respectively, the cover is equipped with conveyer belt 405 from driving wheel 403 and action wheel 404, the inside guard plate 402 that covers conveyer belt 405 bottom that is provided with of mounting bracket 401, the inside conveyer belt 405 both sides that are located of mounting bracket 401 are provided with removal track 406, be provided with slider 407 on the removal track 406, slider 407 is connected with conveyer belt 405, mounting bracket 401 top is provided with cage 408, conveyer belt 407 is protected through cage 408 and guard plate 402, follow driving wheel 403 and action wheel 404 protect, prevent that the fragmentary objects such as dust from causing the harm to it.
In this embodiment, the gripping device 6 includes a mounting base 601, first clamping devices 602 are symmetrically arranged on two sides of the mounting base 601, a first blowing pipe 604 and a second blowing pipe 605 are arranged on the first clamping device 602, a second clamping device 603 is symmetrically arranged in the middle of the mounting base 601, a third blowing pipe 606 is arranged on the second clamping device 603, and when the first clamping device 602 and the second clamping device 603 clamp the silicon wafer, the silicon wafer is subjected to blowing and dedusting treatment through the first blowing pipe 604, the second blowing pipe 605 and the third blowing pipe 606, so that the cleanliness of the silicon wafer is maintained.
In this embodiment, the purge pipe 12 is provided on the stage 9 to purge the stage 9 along the way, thereby keeping the transportation environment clean.
In this embodiment, the drag chain department on grabbing device 6 is provided with and sweeps pipe 12, and drag chain round trip movement can accumulate the dust, sweeps the dust removal to it through sweeping pipe 12, can keep the clean and tidy of drag chain, improves the environment of silicon chip transportation.
The above-mentioned embodiments are merely preferred embodiments for fully illustrating the present invention, and the scope of the present invention is not limited thereto. The equivalent substitution or change made by the technical personnel in the technical field on the basis of the invention is all within the protection scope of the invention. The protection scope of the invention is subject to the claims.

Claims (9)

1.一种自净化硅片运输装置,其特征在于,包括对称设置的输送装置(1),所述输送装置(1)一侧设置有防尘机架(5),所述防尘机架(5)内部位于两个所述输送装置(1)一侧的中间设置有机械手(2),所述机械手(2)所述机械手(2)一侧设置有吸附吹扫跑道(3),所述吸附吹扫跑道(3)两侧设置有防尘跑道(4),所述防尘跑道(4)上设置有载台(9),所述防尘机架(5)内部位于所述防尘跑道(4)上方设置有抓取装置(6),所述防尘机架(5)内部位于所述抓取装置(6)一侧设置有桁架(7),所述桁架(7)上设置有夹爪(8)。1. A self-purifying silicon wafer transportation device, characterized in that it comprises a symmetrically arranged conveying device (1), one side of the conveying device (1) is provided with a dust-proof frame (5), the dust-proof frame (5) A manipulator (2) is provided inside the middle of one side of the two conveying devices (1), and an adsorption and purging runway (3) is provided on one side of the manipulator (2). A dust-proof runway (4) is provided on both sides of the adsorption-purging runway (3), a carrier (9) is provided on the dust-proof runway (4), and the dust-proof frame (5) is located inside the dust-proof runway (5). A grabbing device (6) is arranged above the dust runway (4), and a truss (7) is arranged inside the dustproof frame (5) on one side of the grabbing device (6). A clamping jaw (8) is provided. 2.如权利要求1所述的一种自净化硅片运输装置,其特征在于,所述吸附吹扫跑道(3)上位于所述抓取装置(6)下方设置有对齐装置(10),所述对齐装置(10)包括支架(1001),所述支架(1001)顶部设置有硅片槽(1002),所述支架(1001)之间设置有气缸(1003),所述气缸(1003)输出端设置有硅片槽(1002)。2. A self-cleaning silicon wafer transportation device according to claim 1, characterized in that, an alignment device (10) is provided on the adsorption-purging runway (3) below the grabbing device (6), The aligning device (10) comprises a bracket (1001), a silicon wafer groove (1002) is provided at the top of the bracket (1001), and an air cylinder (1003) is arranged between the brackets (1001), and the air cylinder (1003) The output end is provided with a silicon wafer slot (1002). 3.如权利要求1所述的一种自净化硅片运输装置,其特征在于,所述防尘机架(5)底部设置有收料抽屉(11)。3 . The self-purifying silicon wafer transport device according to claim 1 , wherein a receiving drawer ( 11 ) is provided at the bottom of the dust-proof rack ( 5 ). 4 . 4.如权利要求1所述的一种自净化硅片运输装置,其特征在于,所述输送装置(1)包括机架(101),所述机架(101)中间设置有安装板(102),所述安装板(102)上和所述机架(101)内部底部均对称设置有输送跑道(103),所述输送跑道(103)两侧设置有限位板(1031),所述输送跑道(103)两端均设置有导向块(1032),位于所述安装板(102)上的输送跑道(103)一端设置有规整跑道(105),所述规整跑道(105)尾部设置有阻挡板(106)和规整气缸(107),位于所述机架(101)内部底部的输送跑道(103)一端设置有接收跑道(108),所述机架(101)侧面位于所述输送跑道(103)上方均设置有风帘(104)。4. The self-purifying silicon wafer transportation device according to claim 1, wherein the conveying device (1) comprises a frame (101), and a mounting plate (102) is arranged in the middle of the frame (101). ), a conveying runway (103) is symmetrically arranged on the mounting plate (102) and the inner bottom of the frame (101), and limit plates (1031) are arranged on both sides of the conveying runway (103). Both ends of the runway (103) are provided with guide blocks (1032), one end of the conveying runway (103) located on the mounting plate (102) is provided with a regular runway (105), and a rear end of the regular runway (105) is provided with a barrier A plate (106) and a regular cylinder (107), a receiving runway (108) is provided at one end of the conveying runway (103) at the inner bottom of the frame (101), and the side of the frame (101) is located on the conveying runway (108). 103) Wind curtains (104) are arranged above all. 5.如权利要求1所述的一种自净化硅片运输装置,其特征在于,所述吸附吹扫跑道(3)包括轨道(301),所述轨道(301)上设置有能够移动的放置装置(302),所述放置装置(302)上对称设置有吹气管(305),所述轨道(301)两侧设置有对称设置有吸附装置(303),所述轨道(301)两侧位于所述吸附装置(303)一端设置有吹扫装置(304)。5. A self-cleaning silicon wafer transportation device according to claim 1, characterized in that, the adsorption and purging runway (3) comprises a rail (301), and a movable placement is provided on the rail (301). A device (302), wherein a blowing pipe (305) is symmetrically arranged on the placing device (302), an adsorption device (303) is arranged symmetrically on both sides of the track (301), and the two sides of the track (301) are located at One end of the adsorption device (303) is provided with a purging device (304). 6.如权利要求1所述的一种自净化硅片运输装置,其特征在于,所述防尘跑道(4),包括安装架(401),所述安装架(401)两端分别设置有可转动的从动轮(403)和主动轮(404),所述从动轮(403)和主动轮(404)上套设有传送带(405),所述安装架(401)内部设置有覆盖所述传送带(405)底部的防护板(402),所述安装架(401)内部位于所述传送带(405)两侧设置有移动轨道(406),所述移动轨道(406)上设置有滑块(407),所述滑块(407)与所述传送带(405)连接,所述安装架(401)顶部设置有隔离罩(408)。6. A self-purifying silicon wafer transportation device according to claim 1, wherein the dust-proof runway (4) comprises a mounting frame (401), and two ends of the mounting frame (401) are respectively provided with A rotatable driven wheel (403) and a driving wheel (404), a conveyor belt (405) is sleeved on the driven wheel (403) and the driving wheel (404), and the mounting frame (401) is internally provided with a cover to cover the A protective plate (402) at the bottom of the conveyor belt (405), a moving rail (406) is provided inside the mounting frame (401) on both sides of the conveyor belt (405), and a slider (406) is provided on the moving rail (406). 407), the slider (407) is connected with the conveyor belt (405), and an isolation cover (408) is provided on the top of the mounting frame (401). 7.如权利要求1所述的一种自净化硅片运输装置,其特征在于,所述抓取装置(6)包括安装座(601),所述安装座(601)两侧对称设置有第一夹取装置(602),所述第一夹取装置(602)上设置有第一吹气管(604)和第二吹气管(605),所述安装座(601)中间对称设置有第二夹取装置(603),所述第二夹取装置(603)上设置有第三吹气管(606)。7 . The self-purifying silicon wafer transport device according to claim 1 , wherein the grabbing device ( 6 ) comprises a mounting seat ( 601 ), and the mounting seat ( 601 ) is symmetrically provided with a second A clamping device (602), a first air blowing pipe (604) and a second air blowing pipe (605) are arranged on the first clamping device (602), and a second air blowing pipe (605) is symmetrically arranged in the middle of the mounting seat (601). A clamping device (603), wherein a third air blowing pipe (606) is arranged on the second clamping device (603). 8.如权利要求1所述的一种自净化硅片运输装置,其特征在于,所述载台(9)上设置有吹扫管(12)。8 . The self-purifying silicon wafer transportation device according to claim 1 , wherein a purge pipe ( 12 ) is arranged on the carrier ( 9 ). 9 . 9.如权利要求1所述的一种自净化硅片运输装置,其特征在于,所述抓取装置(6)上的拖链处设置有吹扫管(12)。9 . The self-purifying silicon wafer transport device according to claim 1 , wherein a purging pipe ( 12 ) is provided at the drag chain on the grabbing device ( 6 ). 10 .
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Cited By (3)

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Publication number Priority date Publication date Assignee Title
CN114927447A (en) * 2022-04-18 2022-08-19 通威太阳能(安徽)有限公司 Silicon chip transfer mechanism and photovoltaic cell production system
CN115108317A (en) * 2021-03-22 2022-09-27 江苏润阳光伏科技有限公司 Automatic change transport mechanism's davit transport roller shaft conveyer
CN118658822A (en) * 2024-08-21 2024-09-17 宁波润华全芯微电子设备有限公司 Large size wafer handling device

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