CN112222782A - Titanium and titanium alloy seal head processing technology - Google Patents

Titanium and titanium alloy seal head processing technology Download PDF

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Publication number
CN112222782A
CN112222782A CN202011083917.4A CN202011083917A CN112222782A CN 112222782 A CN112222782 A CN 112222782A CN 202011083917 A CN202011083917 A CN 202011083917A CN 112222782 A CN112222782 A CN 112222782A
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China
Prior art keywords
titanium
polishing
wafer
processing technology
end socket
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Pending
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CN202011083917.4A
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Chinese (zh)
Inventor
谢金山
帅昱良
谭雅丹
孙彦磊
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YONGSHENG MACHINERY INDUSTRIAL (KUNSHAN) CO LTD
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YONGSHENG MACHINERY INDUSTRIAL (KUNSHAN) CO LTD
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Priority to CN202011083917.4A priority Critical patent/CN112222782A/en
Publication of CN112222782A publication Critical patent/CN112222782A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23PMETAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
    • B23P15/00Making specific metal objects by operations not covered by a single other subclass or a group in this subclass

Abstract

The invention discloses a titanium and titanium alloy seal head processing technology, which comprises the following steps of material inspection; forming a wafer; polishing the wafer: polishing the wafer outside the range of Di/2 from the center of the wafer; stamping forming: preheating a B-type die to 80-100 ℃, coating high-temperature anti-oxidation coating on the two surfaces of the wafer, heating and discharging, and performing multiple stamping treatments at 580-620 ℃ after coating the lubricant on the wafer for more than 60 min; spinning; and (3) heat treatment: heating the product after spinning, keeping the temperature at 500-540 ℃ for more than 50min at the heating rate of less than or equal to 200 ℃/h, and slowly cooling to room temperature; chamfering the groove; surface treatment: polishing the end socket, removing iron ions, pickling and washing, and pasting a film on two sides. The invention changes the current situation that the titanium material is difficult to process or the problems of cracking and scratching generated in the processing process, can avoid a plurality of factors such as recovery, deformation and the like after forming, and can achieve quantitative production through the process means and solution.

Description

Titanium and titanium alloy seal head processing technology
Technical Field
The invention relates to the technical field of titanium and titanium alloy processing, in particular to a processing technology of a titanium and titanium alloy seal head.
Background
The titanium material is a novel crystalline structure material, has excellent comprehensive mechanical properties, high strength and fracture toughness resistance, good fatigue resistance and crack expansion resistance, good low-temperature toughness, can continuously operate and be stable in a high-temperature environment, is widely applied to aviation, aerospace, chemical industry and the like at present, is widely applied to pressure vessels and related equipment recently, is very difficult to cold-work forming treatment particularly in a normal-temperature environment, and is difficult to form and process at normal temperature due to high recovery after forming.
Disclosure of Invention
The invention aims to provide a titanium and titanium alloy end socket processing technology, which changes the current situation that a titanium material is difficult to process or the problems of cracking and scratching generated in the processing process, can avoid various factors such as recovery, deformation and the like after forming, and can achieve quantitative production through the technological means and solution.
In order to achieve the purpose, the invention adopts the technical scheme that: a titanium and titanium alloy seal head processing technology comprises the following steps,
s1) material inspection: inspecting the surface quality, chemical components and mechanical properties of the material;
s2) disc molding: marking and transplanting, cutting and blanking by adopting plasma cutting, polishing a cutting surface of a blank smoothly, welding a jointed board and polishing a welding seam;
s3) wafer polishing: polishing the wafer outside the range of Di/2 from the center of the wafer;
s4) press forming: preheating a B-type die to 80-100 ℃, coating high-temperature anti-oxidation coating on the two surfaces of the wafer, heating and discharging, and performing multiple stamping treatments at 580-620 ℃ after coating the lubricant on the wafer for more than 60 min;
s5) spinning: heating the part to be spun to 150-;
s6) heat treatment: heating the product after spinning, keeping the temperature at 500-540 ℃ for more than 50min at the heating rate of less than or equal to 200 ℃/h, and slowly cooling to room temperature;
s7) chamfering the groove: cutting by adopting a water jet cutter, cutting by laser, machining a bevel chamfer and grinding after chamfering;
s8) surface treatment: polishing the end socket, removing iron ions, pickling and washing, and pasting a film on two sides.
As a further optimization, a metallic pencil, or a water-insoluble, metal-free, chlorine-free, sulfur-free ink was used as the marker in S2.
As a further optimization, the polishing process in S3 was double-side radioactive polishing using an 80 mesh abrasive cloth.
As a further optimization, when the temperature of the wafer in S4 is lower than 300 ℃, the wafer needs to be heated back to 580-620 ℃.
As a further optimization, the lubricant in S4 is molybdenum dioxide, or a mixture of graphite, mica powder and water.
As a further optimization, microcracks occurring in the stamping process of S4 need to be immediately removed by grinding.
As a further optimization, a tooling plate rounding groove is used for chamfering in S5.
As a further optimization, the product is not exposed to direct flame contact during heating in S6.
As a further optimization, the heating in S6 uses coal gas mixed with oxygen for heating.
As a further optimization, the polishing treatment in S8 is performed by using a 60-80 mesh abrasive cloth; before the double-sided film pasting, the contaminated parts are wiped by alcohol.
Compared with the prior art, the invention has the following beneficial effects: the method changes the current situation that the titanium material is difficult to process or the problems of cracking and scratching generated in the processing process, can avoid a plurality of factors such as recovery, deformation and the like after forming, and can achieve quantitative production through the process means and solution.
Drawings
FIG. 1 is a graph showing the relationship between pressing temperature and time in the press-forming step of the present invention.
FIG. 2 is a graph showing the relationship between the pressing temperature and the pressing time in the pressing heat treatment step of the present invention.
FIG. 3 is a schematic view of the working state of the spinning step of the present invention.
Detailed Description
The following are specific embodiments of the present invention and are further described with reference to the drawings, but the present invention is not limited to these embodiments.
A titanium and titanium alloy seal head processing technology comprises the following steps,
s1) material inspection: the surface quality, chemical components and mechanical properties of the material are detected, and the method specifically comprises the following steps: the material has good surface quality and no defects of cracks, peeling, scratches, layering, pockmarks and the like; the chemical composition, the mechanical property and the process performance of the plate are rechecked according to the standard and the supply and demand protocol; determining the feeding thickness of the seal head according to the manufacturing process, and ensuring that the minimum thickness of the formed seal head is not less than the minimum thickness actually required; the material should meet the relevant standard specifications and also should meet the requirements of the technical protocols of the pattern and order.
S2) disc molding: marking off and marking for transplantation, adopting plasma cutting blanking, polishing the cutting surface of the blank smoothly, welding the jointed boards, and polishing the welding seam specifically as follows: the mark adopts a metal pencil or water-insoluble, metal-free pigment-free, chlorine-free and sulfur-free ink; the diameter of the blanking blank is cut by plasma according to the blanking diameter size of the stainless steel seal head; protecting the surface of the titanium material during cutting to prevent cutting splash from adhering to the surface of the material, removing a pollution layer by adopting a mechanical method after cutting, and performing double-sided radioactive polishing by using 80-mesh abrasive cloth; the blank is cut without a gap, and the cut section is polished and smoothly transited after plasma blanking and cutting, so that the serious defects that the gap forming tooth edge is left to cause cracking and the like during pressing and forming are avoided; and (3) splicing the plates and then forming the seal head, and polishing the weld joint residual height on the inner surface and the outer surface until the base metal is flush after the weld joint is checked to be qualified.
S3) wafer polishing: because the notch sensitivity of the titanium alloy is higher, the surface scratch perpendicular to the stretching direction and the grinding wheel piece grinding mark can generate cracks during plastic forming, and finally the cracks are caused, so that the polishing treatment is carried out outside the range of Di/2 from the center of the wafer, specifically: a 60-80 mesh radioactive polishing treatment is used.
S4) press forming: preheating a B-type die to 80-100 ℃, coating high-temperature anti-oxidation coating on the two surfaces of the wafer, heating and discharging, performing multiple stamping treatment at 580-620 ℃ after coating the lubricant on the wafer, wherein the stamping time is more than 60min, and the method specifically comprises the following steps: sundries such as iron scales, iron filings and the like which can cause pollution to the titanium material after scratching or embedding the titanium material on the base material and the forming equipment are processed, and the titanium material is not polluted by iron ions when the content of the sundries is 100 percent; the elasticity modulus of titanium is low, the resilience of cold deformation is large, and the titanium and titanium alloy are not beneficial to forming, so that multiple times of melting back, heating and stamping are required in the processing process to improve the processing plasticity; as shown in figure 1, the temperature of the material is discharged from a furnace for hot stamping at 580-620 ℃, the temperature of the material in stamping is not lower than 300 ℃, otherwise, the material is returned to the furnace in time and heated for stamping again, the two sides of the wafer are coated with high-temperature anti-oxidation coating, and the pressure is controlled to be adjusted during stamping; the stamping adopts multi-pass stamping, a proper amount of lubricant (commonly used: molybdenum dioxide, or graphite, mica powder and water) is coated before stamping, the blank holder force is controlled to be adjusted during stamping, micro cracks appear on the surface of the material in the stamping process, the material needs to be immediately polished and removed, and the material is stamped after being heated to about 620 ℃.
S5) spinning: heating the part needing spinning to 150-: inspecting the groove before spinning, wherein the end socket has no gap and burrs; selecting a proper spinning die, and grinding and polishing the die; when the titanium and titanium alloy end socket is spun, the spinning part of the end socket is heated to 150-.
As shown in FIG. 3, in the spinning process, the titanium semi-finished end enclosure without straight edge process is placed on the rotary table of the spinning machine, after the center is corrected, the end enclosure is rotated to turn on the gas heating gun to heat the part to be formed, the spinning is started when the part to be formed is heated to about 200 ℃, the part is rotated and heated, at the moment, the distance between the heating gun and the heated workpiece is controlled to ensure that the temperature is between 160 ℃ and 200 ℃, the workpiece is taken down until the spinning is finished and the size of the workpiece is stable.
S6) heat treatment: as shown in fig. 2, the product after spinning is heated, the heating rate is less than or equal to 200 ℃/h, the temperature is maintained at 500-540 ℃ for more than 50min, and the product is slowly cooled to the room temperature, specifically: the pure titanium end socket is subjected to stress relief heating to about 520 ℃, the heating time is not too fast, the pure titanium end socket is heated by a gradient which is less than about 200 ℃ per hour, the pure titanium end socket is heated to about 520 ℃ and is subjected to heat preservation in a furnace for 50 minutes, then the pure titanium end socket is slowly cooled in the furnace, and overheating is strictly forbidden; the heating furnace is preferably heated by mixing coal gas and oxygen, and is not suitable for heating solid or liquid fuel such as coal, pulverized coal or heavy oil, coal tar and the like to avoid polluting materials.
S7) chamfering the groove: adopt water sword cutting, laser cutting, machining groove chamfer, grind behind the chamfer, specifically do: and (3) cutting by adopting a water jet cutter, cutting by adopting laser, and machining a bevel chamfer. The cutting splash is prevented from being adhered to the surface of the material, and a pollution layer is removed by adopting methods such as machining, grinding and the like after cutting; a tool plate is used for rounding the groove to ensure the flatness of the groove surface; and grinding the bevel angle according to the requirements of the drawing.
S8) surface treatment: polishing, removing iron ions, pickling and washing the end socket, and pasting a film on the two sides, specifically: polishing the surface of the end socket by 60-80 meshes; carrying out iron ion pollution inspection on the surface of the end socket until no iron exists; pickling the inner surface and the outer surface, and then washing the inner surface and the outer surface with clean water; after polishing, the titanium end socket is subjected to double-sided film pasting, so that iron ion pollution is prevented, and severe damage (such as local pollution, cleaning by alcohol) caused by the shortened service life of a product during iron ion pollution is avoided.
The specific embodiments described herein are merely illustrative of the spirit of the invention. Various modifications or additions may be made to the described embodiments or alternatives may be employed by those skilled in the art without departing from the spirit or ambit of the invention as defined in the appended claims.

Claims (10)

1. A titanium and titanium alloy seal head processing technology is characterized by comprising the following steps,
s1) material inspection: inspecting the surface quality, chemical components and mechanical properties of the material;
s2) disc molding: marking and transplanting, cutting and blanking by adopting plasma cutting, polishing a cutting surface of a blank smoothly, welding a jointed board and polishing a welding seam;
s3) wafer polishing: polishing the wafer outside the range of Di/2 from the center of the wafer;
s4) press forming: preheating a B-type die to 80-100 ℃, coating high-temperature anti-oxidation coating on the two surfaces of the wafer, heating and discharging, and performing multiple stamping treatments at 580-620 ℃ after coating the lubricant on the wafer for more than 60 min;
s5) spinning: heating the part to be spun to 150-;
s6) heat treatment: heating the product after spinning, keeping the temperature at 500-540 ℃ for more than 50min at the heating rate of less than or equal to 200 ℃/h, and slowly cooling to room temperature;
s7) chamfering the groove: cutting by adopting a water jet cutter, cutting by laser, machining a bevel chamfer and grinding after chamfering;
s8) surface treatment: polishing the end socket, removing iron ions, pickling and washing, and pasting a film on two sides.
2. A process of claim 1, wherein the label in S2 is a metal pencil or a water-insoluble, metal-free, chlorine-free, sulfur-free ink.
3. A titanium and titanium alloy end socket processing technology as claimed in claim 1, wherein in the polishing treatment in S3, 80-mesh abrasive cloth is used for double-sided radioactive polishing.
4. A process for preparing the sealing head of Ti or Ti alloy as claimed in claim 1, wherein the temperature of the round piece in S4 is lower than 300 deg.C and then it is heated to 580-620 deg.C.
5. A titanium and titanium alloy end socket processing technology as claimed in claim 1, wherein the lubricant in S4 is molybdenum dioxide or a mixture of graphite, mica powder and water.
6. A titanium and titanium alloy end socket processing technology as claimed in claim 1, wherein micro-cracks in the S4 stamping process need to be immediately ground and removed.
7. The titanium and titanium alloy end socket processing technology according to claim 1, wherein a tooling plate is used for rounding the bevel during chamfering in S5.
8. A titanium and titanium alloy end socket processing technology as claimed in claim 1, wherein the product is not directly contacted by flame when heated in S6.
9. The titanium and titanium alloy end socket processing technology of claim 1, wherein in the step S6, heating is performed by mixing coal gas and oxygen.
10. A titanium and titanium alloy end socket processing technology as claimed in claim 1, wherein polishing treatment in S8 uses 60-80 mesh abrasive cloth for polishing; before the double-sided film pasting, the contaminated parts are wiped by alcohol.
CN202011083917.4A 2020-10-12 2020-10-12 Titanium and titanium alloy seal head processing technology Pending CN112222782A (en)

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CN202011083917.4A CN112222782A (en) 2020-10-12 2020-10-12 Titanium and titanium alloy seal head processing technology

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Application Number Priority Date Filing Date Title
CN202011083917.4A CN112222782A (en) 2020-10-12 2020-10-12 Titanium and titanium alloy seal head processing technology

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113798790A (en) * 2021-09-13 2021-12-17 常州旷达威德机械有限公司 Manufacturing method of large-size thin-wall end socket
CN114045481A (en) * 2021-11-24 2022-02-15 永胜机械工业(昆山)有限公司 Method for removing iron ions on titanium surface before heat treatment of titanium composite steel plate equipment

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CN102989922A (en) * 2012-12-01 2013-03-27 西安优耐特容器制造有限公司 Punch forming method of thin-wall end socket
CN103071736A (en) * 2012-12-28 2013-05-01 西安优耐特容器制造有限公司 Composite molding process of large-size titanium-made end socket
CN103381441A (en) * 2013-07-03 2013-11-06 中国船舶重工集团公司第七二五研究所 Hot stamping formation processing method for thin-walled titanium alloy sealing head
CN103831584A (en) * 2013-07-05 2014-06-04 宜兴市九洲封头锻造有限公司 Method for machining elliptical end socket
CN104786006A (en) * 2014-01-21 2015-07-22 无锡市前洲西塘锻压有限公司 Manufacturing method for titanium plate plugs

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030228745A1 (en) * 2002-06-10 2003-12-11 Water Lur Method and system for making cobalt silicide
CN1471145A (en) * 2002-06-10 2004-01-28 联华电子股份有限公司 Method and apparatus for forming cobalt silicide and semiconductor element having same
CN1955536A (en) * 2005-07-04 2007-05-02 哈尔滨工业大学 Manufacturing method of composite pressure container of large size, superthin metal lining
CN101157175A (en) * 2007-11-20 2008-04-09 中国航天科技集团公司第五研究院第五一○研究所 A processing method of titanium alloy closing end
CN101745784A (en) * 2009-12-21 2010-06-23 中国船舶重工集团公司第七二五研究所 Simple forming process of seal head for titanium alloy cylinder
CN102989922A (en) * 2012-12-01 2013-03-27 西安优耐特容器制造有限公司 Punch forming method of thin-wall end socket
CN103071736A (en) * 2012-12-28 2013-05-01 西安优耐特容器制造有限公司 Composite molding process of large-size titanium-made end socket
CN103381441A (en) * 2013-07-03 2013-11-06 中国船舶重工集团公司第七二五研究所 Hot stamping formation processing method for thin-walled titanium alloy sealing head
CN103831584A (en) * 2013-07-05 2014-06-04 宜兴市九洲封头锻造有限公司 Method for machining elliptical end socket
CN104786006A (en) * 2014-01-21 2015-07-22 无锡市前洲西塘锻压有限公司 Manufacturing method for titanium plate plugs

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113798790A (en) * 2021-09-13 2021-12-17 常州旷达威德机械有限公司 Manufacturing method of large-size thin-wall end socket
CN114045481A (en) * 2021-11-24 2022-02-15 永胜机械工业(昆山)有限公司 Method for removing iron ions on titanium surface before heat treatment of titanium composite steel plate equipment
CN114045481B (en) * 2021-11-24 2023-07-25 永胜机械工业(昆山)有限公司 Method for removing iron ions on surface of titanium before heat treatment of titanium composite steel plate equipment

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