CN112099546B - Humidity control system for micro-nano manufacturing detection of micro-liquid-moving pipe - Google Patents
Humidity control system for micro-nano manufacturing detection of micro-liquid-moving pipe Download PDFInfo
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- CN112099546B CN112099546B CN202010889793.2A CN202010889793A CN112099546B CN 112099546 B CN112099546 B CN 112099546B CN 202010889793 A CN202010889793 A CN 202010889793A CN 112099546 B CN112099546 B CN 112099546B
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- 238000005192 partition Methods 0.000 claims abstract description 15
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- 238000005406 washing Methods 0.000 claims description 30
- 239000000523 sample Substances 0.000 claims description 16
- 238000001035 drying Methods 0.000 claims description 15
- 238000003756 stirring Methods 0.000 claims description 9
- 238000006073 displacement reaction Methods 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 9
- 229910052802 copper Inorganic materials 0.000 abstract description 8
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- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 3
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- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D22/00—Control of humidity
- G05D22/02—Control of humidity characterised by the use of electric means
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B11/00—Automatic controllers
- G05B11/01—Automatic controllers electric
- G05B11/36—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential
- G05B11/42—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential for obtaining a characteristic which is both proportional and time-dependent, e.g. P. I., P. I. D.
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
- G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
- G05B13/0265—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric the criterion being a learning criterion
- G05B13/0275—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric the criterion being a learning criterion using fuzzy logic only
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- Software Systems (AREA)
- Mathematical Physics (AREA)
- Fuzzy Systems (AREA)
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Abstract
The invention discloses a humidity control system for micro-nano manufacturing detection of a micro-pipette, which adopts a double-structure design of a buffer chamber and a working chamber, pre-mixes dry and wet gases by using the buffer chamber, fixes a metal plate for deposition in the middle of the working chamber, and divides the working chamber into an upper working box air chamber and a lower working box air chamber by using a partition plate, so as to ensure the uniformity of the humidity of the upper working chamber and reduce the disturbance influence of air flow on a deposition point; micro-environment humidity control in micro-nano manufacturing is achieved through a double-buffer box structure, meanwhile, disturbance of air flow to micro liquid drops is minimum, metal cation concentration is balanced, deposition rate is stable, the deposited copper column is attractive in shape and structure, and edge structure deposition is regular.
Description
Technical Field
The invention belongs to the field of electrochemical imaging devices, and particularly relates to a humidity control system for micro-nano manufacturing detection of a micro-pipette.
Background
In recent years, in the field of micro-nano manufacturing and detection, the scanning probe-based semilunar droplet restriction electrochemical deposition method has the advantages of wide material application field, less deposition condition restriction, controllable tissue-morphology-performance coordination, free forming structure and the like, and is widely concerned by researchers at home and abroad; however, during the manufacturing process, ambient humidity has a significant impact on both the rate and stability of deposition. Since the meniscus of the probe tip has a large area to volume ratio, surface evaporation when exposed to air causes the concentration of ions at the surface of the drop to be greater than the central concentration, resulting in a local solution concentration gradient and a change in potential. Meanwhile, evaporation drives the interior of the solution to form convection, which greatly influences the concentration distribution of metal cations in the liquid drop, further influences the shape and density of a deposition structure, and forms irregular edge structure deposition. In the experiments with the half-moon limited electrodeposition, at higher humidity, the copper deposition rate decreased significantly due to the reduced amount of copper ions that were replenished to the electrolyte-deposition interface as a result of evaporation. At higher humidity, the pipette often clogs during electrodeposition. In terms of MCED micro-environmental humidity control, Hu teaches placing all equipment in a glove box by designing a large glove box. This method has fatal disadvantages that, firstly, since the glove box is large in volume, the system has a large delay, and it is difficult to control the humidity at a given value in a short time; secondly, the humidity uniformity of a micro-nano manufacturing local area and other areas is difficult to ensure in a large-volume glove box; and finally, all the micro-nano actuating mechanisms and the electrical control system are placed in the glove box, so that the service life of the equipment can be greatly shortened. At the same time, manual adjustment of the probe position and replacement of the sample also become quite difficult. Based on the method, the glove box is reduced, only a micro-nano manufacturing area is closed to form a closed area, the local humidity in the area is controlled by controlling the air flow speed through the micro-control needle valve, and meanwhile small air flow is guaranteed not to disturb small liquid drops at the tips of the micro-nano probes. In the process of printing the micro-nano metal structure by using a local pulse electrodeposition-based method, the humidity of Soheil Daryadel is controlled to be about 60%, and the space is sealed by a flexible plastic bag to ensure the humidity of a local area.
Because the physical configuration of SECCM is similar to MCED, the environmental humidity also has an important role in the scanning electrochemical cell microscope micro-nano imaging and electrochemical activity analysis process, and the influence of the environmental humidity on the liquid drop of the probe tip is very obvious. During the process of carrying out morphology scanning and electrochemical experiments on SECCM, it is found that the air humidity is too low, micro-droplets at the probe tip are easy to crystallize, and the normal operation of the experiments is influenced; in the process of carrying out an electrochemical analysis experiment by using SECCM (sealed electrochemical mechanical scientific research), by designing a microenvironment area, arranging a city protection river around a substrate, and introducing saturated aqueous solution to evaporate the saturated aqueous solution naturally, the humidity requirement of the microenvironment area is ensured, but although the method ensures that the disturbance of airflow on small droplets at the probe tip is minimum, the control effect is very little, and the influence of the airflow on the tip cannot be effectively inhibited.
Disclosure of Invention
The invention aims to provide a humidity control system for micro-nano manufacturing and detection of a micro-liquid moving pipe, so as to overcome the defects of the prior art, and the humidity control system can effectively reduce the disturbance influence of airflow on a deposition point.
In order to achieve the purpose, the invention adopts the following technical scheme:
a humidity control system for micro-nano manufacturing detection of a micro-pipette comprises a buffer chamber and a working chamber, wherein an air inlet of the buffer chamber is connected with a dry air source and a wet air source; a metal plate for deposition is fixed in the middle of the working chamber, a partition plate is arranged at the lower end of the metal plate in the working chamber, and a plurality of vent holes are formed in the partition plate; the gas outlet of the buffer chamber is communicated into the working chamber through a pipeline, a mixed gas pump is arranged on the pipeline between the buffer chamber and the working chamber, and the gas inlet of the pipeline in the working chamber is positioned at the lower end of the partition plate; the upper end cover of the working chamber is provided with a micro-displacement actuator, a capillary probe is arranged in the micro-displacement actuator and is connected with a direct current power supply, and the metal plate is connected with the direct current power supply through a micro-current meter.
Furthermore, a first air inlet of the buffer chamber is connected to the gas washing bottle through a pipeline, a wet air pump is arranged on an air inlet pipeline of the gas washing bottle, the air inlet pipeline of the gas washing bottle is immersed in liquid in the gas washing bottle, an air outlet pipeline of the gas washing bottle is communicated into the buffer chamber, and one end of the air outlet pipeline of the gas washing bottle is located in the gas washing bottle and is located at the upper end of the liquid level in the gas washing bottle.
Furthermore, a wet air flow meter is arranged on an air outlet pipeline of the gas washing bottle.
Furthermore, a second air inlet of the buffer chamber is communicated to an air outlet pipeline of the drying pipe through a pipeline, and a dry air pump is arranged on the air outlet pipeline of the drying pipe.
Furthermore, a dry air flow meter is also arranged on the air outlet pipeline of the drying pipe.
Further, a stirring fan is arranged in the buffer chamber.
Furthermore, the second air inlet of the buffer chamber and the first air inlet of the buffer chamber are positioned on the same side, and the air outlet of the buffer chamber is positioned on the side wall opposite to the first air inlet.
Furthermore, a plurality of first wireless temperature and humidity sensors used for acquiring temperature and humidity information of each position in the buffer chamber are arranged in the buffer chamber.
Furthermore, a plurality of second wireless temperature and humidity sensors used for acquiring temperature and humidity information of all positions in the working chamber are arranged at the top in the working chamber.
Furthermore, the lower extreme of studio is equipped with the air inlet of two opposition settings, and the gas outlet of buffer chamber and two air inlets of studio are respectively through the pipe connection, are provided with first mist flow meter on one of them pipeline, are provided with the second mist flow meter on another pipeline.
Compared with the prior art, the invention has the following beneficial technical effects:
the invention relates to a humidity control system for micro-nano manufacturing and detection of a micro-pipette, which adopts a double-structure design of a buffer chamber and a working chamber, the dry air source and the wet air source are connected through the air inlet of the buffer chamber, the dry and wet air is premixed by the buffer chamber, a metal plate for deposition is fixed in the middle of the working chamber, the working chamber is divided into an upper working box air chamber and a lower working box air chamber by a partition plate, the uniformity of the humidity of the upper working chamber is ensured, the disturbance influence of air flow on deposition points is reduced, an air outlet of a buffer chamber is communicated into the working chamber through a pipeline, a mixed gas pump is arranged on the pipeline between the buffer chamber and the working chamber, an air inlet of the pipeline in the working chamber is positioned at the lower end of the partition plate, a plurality of vent holes are formed in the partition plate, the gas is prevented from rising to disturb the upper cavity type by the aid of the vent holes, and a continuous and stable temperature and humidity environment can be provided; micro-environment humidity control in micro-nano manufacturing is achieved through a double-buffer box structure, meanwhile, disturbance of air flow to micro liquid drops is minimum, metal cation concentration is balanced, deposition rate is stable, the deposited copper column is attractive in shape and structure, and edge structure deposition is regular.
Furthermore, a wet air flow meter is arranged on the air outlet pipeline of the gas washing bottle, and a dry air flow meter is also arranged on the air outlet pipeline of the drying pipe, so that the flow of the mixed gas entering the buffer chamber can be accurately controlled.
Furthermore, through the two air inlets which are oppositely arranged, the air entering the working chamber can be neutralized, single-side turbulent disturbance is prevented, and the air flow can enter the upper end of the working chamber more smoothly.
Further, set up humid air source and dry air source inlet in same one side, can mix earlier when admitting air, and the back is more even through stirring fan stirring mixture.
Drawings
Fig. 1 is a schematic structural diagram in an embodiment of the present invention.
Fig. 2 is a schematic diagram of a connection structure of a controller according to an embodiment of the present invention.
In the figure: 1-damp air flow meter, 2-damp air pump, 3-gas washing bottle, 4-buffer chamber, 5-first wireless temperature and humidity sensor, 6-stirring fan, 7-drying tube, 8-dry air pump, 9-dry air flow meter, 10-mixed gas pump, 11-work box upper air chamber, 12-metal column, 13-metal plate, 14-capillary probe, 15-micrometric displacement executor, 16-second wireless temperature and humidity sensor, 17-direct current power supply, 18-micro current meter, 19-baffle, 20-first mixed gas flow meter, 21-work box lower air chamber, 22-second mixed gas flow meter.
Detailed Description
The invention is described in further detail below with reference to the accompanying drawings:
as shown in fig. 1, a humidity control system for micro-nano manufacturing and detection of a micro-pipette comprises a buffer chamber 4 and a working chamber 23, wherein the buffer chamber 4 is connected with a dry air source and a wet air source and is used for uniformly mixing the dry air source and the wet air source in the buffer chamber 4; a metal plate 13 for deposition is fixed in the middle of the working chamber 23, a partition plate 19 is arranged at the lower end of the metal plate 13 in the working chamber 23, and a plurality of vent holes are formed in the partition plate 19; the buffer chamber 4 is communicated to the working chamber 23 through a pipeline, a mixed gas pump 10 is arranged on the pipeline between the buffer chamber 4 and the working chamber 23 and used for controlling the flow of the mixed gas entering the working chamber, and a pipeline air inlet communicated with the working chamber 23 is positioned at the lower end of the partition plate 19; the upper end cover of the working chamber 23 is provided with a micro-displacement actuator 15, a capillary probe 14 is arranged in the micro-displacement actuator 15, the capillary probe 14 is connected with a direct current power supply 17, and the metal plate 13 is connected with the direct current power supply 17 through a micro-current meter 18. The working air chamber adopts a structure of the upper air chamber and the lower air chamber, the humidity uniformity of the working upper chamber is ensured, and the disturbance influence of air flow on a deposition point is reduced. The partition plate 19 is adopted to divide the interior of the working chamber 23 into the upper working box air chamber 11 and the lower working box air chamber 21, so that the humidity uniformity of the upper working chamber is ensured, and the disturbance influence of air flow on a deposition point is reduced.
Specifically, the first air inlet of the buffer chamber 4 is connected to the gas washing bottle 3 through a pipeline, the wet air pump 2 is arranged on an air inlet pipeline of the gas washing bottle 3, the air inlet pipeline of the gas washing bottle 3 is immersed in liquid in the gas washing bottle 3, an air outlet pipeline of the gas washing bottle 3 is communicated to the buffer chamber 4, one end of the air outlet pipeline of the gas washing bottle 3 is located at the upper end of the liquid level in the gas washing bottle 3, and air flow forms wet air through the gas washing bottle to enter the buffer chamber. And a wet air flow meter 1 is arranged on an air outlet pipeline of the gas washing bottle 3.
The second air inlet of the buffer chamber 4 is communicated to the air outlet pipeline of the drying pipe 7 through a pipeline, the air outlet pipeline of the drying pipe 7 is provided with a dry air pump 8, and the dry air pump 8 provides power to suck air in the atmosphere into the drying pipe 7 for drying and then the air is introduced into the buffer chamber. And a dry air flow meter 9 is also arranged on the air outlet pipeline of the drying pipe 7.
Be equipped with stirring fan 6 in the surge chamber 4 for the gas stirring who sneakes into is even, and the air in the environment produces corresponding humid air and dry air through getting into gas washer and drying tube respectively, mixes through the mode of convection current in surge chamber 4, and gas mixing speed is fast, and the state is stable.
The lower end of the working chamber 23 is provided with two air inlets which are oppositely arranged, the air outlet of the buffer chamber 4 is respectively connected with the two air inlets of the working chamber 23 through pipelines, one of the pipelines is provided with a first mixed gas flowmeter 20, the other pipeline is provided with a second mixed gas flowmeter 22, and the air entering the working chamber 23 can be neutralized through the two air inlets which are oppositely arranged, so that single-side turbulent disturbance is prevented, and the air flow can more smoothly enter the upper end of the working chamber 23.
The second air inlet of surge chamber 4 and the first air inlet of surge chamber 4 lie in same one side, and the gas outlet of surge chamber 4 lies in the opposite lateral wall of first air inlet, prevents that wet air source or dry air source from not intensive mixing and discharging from the gas outlet and get into studio 23 in, sets up wet air source and dry air source entry in same one side, can mix earlier when admitting air, and the back is more even through stirring fan 6 stirring mixture.
A plurality of first wireless temperature and humidity sensors 5 are arranged in the buffer chamber 4 and are used for acquiring temperature and humidity information of each position in the buffer chamber 4. The top in the studio 23 is provided with a plurality of second wireless temperature and humidity sensors 16 for acquiring temperature and humidity information of each position in the studio 23. The temperature and humidity data in the buffer chamber and the working chamber are transmitted to the detection and control device in a wireless mode, the rotating speeds of the wet air pump and the dry air pump are adjusted according to the collected data, the wet air and the dry air are introduced according to a certain flow, the fan blades are used for mixing the air, and the air in the buffer chamber and the working chamber is guaranteed to reach a preset value.
The invention can be used for micro-nano manufacturing of Meniscus Confined Electrochemical Deposition (MCED) based on a micro-pipette and shape detection of a Scanning Electrochemical Cell microscope (SECCM) and environmental humidity control in the Electrochemical activity analysis process.
According to the humidity control system for micro-nano manufacturing detection of the micro-pipette, micro-environment humidity control in micro-nano manufacturing is achieved through a double-buffer box structure, meanwhile, disturbance of airflow to micro liquid drops is minimized, metal cation concentration is balanced, deposition rate is stable, the deposited copper cylinder is attractive in shape and structure, and edge structure deposition is regular. According to the invention, the humidity of a deposition area is kept constant in the micro-nano manufacturing process, wet air and dry air are introduced into the buffer chamber 4 for mixing through the wet air pump 2 and the dry air pump 8 in the figure 1, and the fan 6 is added into the buffer chamber 4, so that the air flow in the buffer chamber 4 is accelerated, the mixing rate is accelerated, and the gas is more uniform. The wet air flow meter 1 and the dry air flow meter 9 can adjust the flow rates of the dry air and the wet air so that the humidity of the gas in the buffer chamber 4 is balanced. The lower air chamber 21 of the work box is filled with mixed gas through the mixed gas pump 10, and the first mixed gas flowmeter 20 and the second mixed gas flowmeter 22 are responsible for adjusting the mixed gas velocity at two sides of the lower air chamber of the work box, so that the humidity of the mixed gas passing through the partition plate 19 and near the copper plate 13 of the work area is kept constant.
In the invention, dry air is obtained by sucking air from the outside by a dry air pump 9 and passing through a drying pipe 7; the wet air is obtained by sucking air from the outside through a wet air pump 2 and passing through a gas washing bottle 3.
The metal plate 13 of the invention adopts a copper plate, the metal column 12 arranged on the metal plate 13 is a copper column, a micro-displacement actuator 15 is utilized to move a capillary probe 14, a direct current power supply 17 provides electroplating energy, and the capillary probe 14 is filled with a copper sulfate aqueous solution for providing copper ions; copper ions on the cathode copper plate (metal plate 13) are subjected to electron reduction deposition to form the copper pillar 12.
When the electronic reduction deposition is carried out in the working chamber 23, the temperature and humidity parameters in the buffer chamber 4 and the working chamber 23 are respectively obtained in real time through the first wireless temperature and humidity sensor 5 and the second wireless temperature and humidity sensor 16, the obtained temperature and humidity parameters are transmitted to the controller, the controller calculates the temperature and humidity error e and the error change rate ec in the buffer chamber 4 and the working chamber 23 according to the temperature and humidity parameters in the buffer chamber 4 and the working chamber 23, the temperature and humidity error e and the error change rate ec are used as input, three output parameters of Kp, Ki and Kd are obtained through three processes of fuzzification, fuzzy reasoning and defuzzification, PID calculation is carried out according to the three obtained parameters, the flow rate of the flow pump is controlled through speed regulation, and the flow rate of the wet air is controlled, and finally the control effect is achieved. The control system is based on a fuzzy PID control algorithm, the key point of a humidity controller is to control the humidity of a mixing chamber to be a preset value, the control accuracy is ensured by controlling a flow rate pump 2 and a flow rate pump 7, the humidity control of the mixing chamber has nonlinearity, the system adopts a fuzzy PID control system, the system hardware composition is shown in figure 2 and mainly comprises a microcontroller, STM32F103 is used as a main controller, an SHT30 temperature and humidity sensor module is used for testing the environment temperature and humidity, and a self-made ZIGBEE-based wireless sensor node is used for collecting the environment temperature and humidity. The motor driving module is used for completing flow control, the fan control module is used for realizing forced convection mixing of wet air in the mixing chamber, and the human-computer interaction interface is used for parameter setting. The working air chamber adopts a structure of an upper air chamber and a lower air chamber, the uniformity of the humidity of the working upper chamber is ensured, the disturbance influence of air flow on a deposition point is reduced, and meanwhile, a fuzzy PID control algorithm is designed to control the humidity of the mixing chamber to be constant by combining the good characteristic of the fuzzy PID control algorithm on a nonlinear system.
Claims (5)
1. A humidity control system for micro-nano manufacturing and detection of a micro-pipette is characterized by comprising a buffer chamber (4) and a working chamber (23), wherein an air inlet of the buffer chamber (4) is connected with a dry air source and a wet air source; a metal plate (13) for deposition is fixed in the middle of the working chamber (23), a partition plate (19) is arranged at the lower end of the metal plate (13) in the working chamber (23), and a plurality of vent holes are formed in the partition plate (19); the gas outlet of the buffer chamber (4) is communicated into the working chamber (23) through a pipeline, a mixed gas pump (10) is arranged on the pipeline between the buffer chamber (4) and the working chamber (23), and the gas inlet of the pipeline in the working chamber (23) is positioned at the lower end of the partition plate (19); a micro-displacement actuator (15) is arranged on an upper end cover of the working chamber (23), a capillary probe (14) is arranged in the micro-displacement actuator (15), the capillary probe (14) is connected with a direct current power supply (17), the metal plate (13) is connected with the direct current power supply (17) through a micro-current meter (18), two oppositely arranged air inlets are arranged at the lower end of the working chamber (23), an air outlet of the buffer chamber (4) is connected with the two air inlets of the working chamber (23) through pipelines respectively, one pipeline is provided with a first mixed gas flowmeter (20), the other pipeline is provided with a second mixed gas flowmeter (22), the first air inlet of the buffer chamber (4) is connected to the gas washing bottle (3) through a pipeline, a wet air pump (2) is arranged on an air inlet pipeline of the gas washing bottle (3), the air inlet pipeline of the gas washing bottle (3) is immersed in liquid in the gas washing bottle (3), an air outlet pipeline of the gas washing bottle (3) is communicated to the inside of the buffer chamber (4), and one end of the air outlet pipeline of the gas washing bottle (3) is positioned in the gas washing bottle (3) and is positioned at the upper end of the liquid level in the gas washing bottle (3); a wet air flow meter (1) is arranged on an air outlet pipeline of the gas washing bottle (3); a second air inlet of the buffer chamber (4) is communicated to an air outlet pipeline of the drying pipe (7) through a pipeline, and a dry air pump (8) is arranged on the air outlet pipeline of the drying pipe (7); a dry air flow meter (9) is also arranged on the air outlet pipeline of the drying pipe (7).
2. The humidity control system for micro-nano manufacturing detection of the micro-pipette tube according to claim 1, characterized in that a stirring fan (6) is arranged in the buffer chamber (4).
3. The humidity control system for micro-nano manufacturing detection of the micro-pipette tube according to claim 1, wherein the second air inlet of the buffer chamber (4) and the first air inlet of the buffer chamber (4) are located on the same side, and the air outlet of the buffer chamber (4) is located on the opposite side wall of the first air inlet.
4. The humidity control system for micro-nano manufacturing and detection of the micro-pipette tube according to claim 1, characterized in that a plurality of first wireless temperature and humidity sensors (5) for acquiring temperature and humidity information of each position in the buffer chamber (4) are arranged in the buffer chamber (4).
5. The humidity control system for micro-nano manufacturing and detection of the micro-pipette tube according to claim 1, wherein a plurality of second wireless temperature and humidity sensors (16) for acquiring temperature and humidity information of each position in the working chamber (23) are arranged at the top in the working chamber (23).
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2102535U (en) * | 1991-08-03 | 1992-04-22 | 湖北省环境保护研究所 | Temperature controller |
| CN103558142A (en) * | 2013-10-22 | 2014-02-05 | 沈阳建筑大学 | Atmospheric corrosion simulator capable of adjusting temperature, humidity, ultraviolet light and pollution gas |
| CN204150446U (en) * | 2014-08-22 | 2015-02-11 | 富瑞世嘉（天津）电子有限公司 | A kind of electronic devices and components proof cabinet |
| CN104460733A (en) * | 2014-10-28 | 2015-03-25 | 重庆交通大学 | Flowing gas humidity control device |
| CN207085940U (en) * | 2017-08-22 | 2018-03-13 | 苏州市乐测检测技术服务有限公司 | A kind of high/low temperature alternate humid heat test case |
| CN109900764A (en) * | 2019-03-29 | 2019-06-18 | 西安交通大学 | A kind of micro environment control platform and its scan method for SECCM |
| CN111026177A (en) * | 2019-12-18 | 2020-04-17 | 北京航空航天大学 | System and method for controlling humidity in alkali metal air chamber |
| CN111399568A (en) * | 2020-02-29 | 2020-07-10 | 天津大学 | Multi-closed-loop temperature and humidity control system for mechanical testing of micro-cavity environment |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101884969B (en) * | 2010-06-25 | 2012-07-04 | 北京航空航天大学 | Device for preparing thin film by liquid level drawdown method |
| CN209493053U (en) * | 2018-11-05 | 2019-10-15 | 深圳华大法医科技有限公司 | A kind of automatic single channel liquid shifting equipment |
| CN209941089U (en) * | 2019-04-15 | 2020-01-14 | 郑州市新昇汽车配件有限公司 | Baffle aeration stirring type passivation device |
| CN210376248U (en) * | 2019-05-20 | 2020-04-21 | 西安交通大学 | Experimental system for preparing methanol from carbon dioxide through photocatalysis |
-
2020
- 2020-08-28 CN CN202010889793.2A patent/CN112099546B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2102535U (en) * | 1991-08-03 | 1992-04-22 | 湖北省环境保护研究所 | Temperature controller |
| CN103558142A (en) * | 2013-10-22 | 2014-02-05 | 沈阳建筑大学 | Atmospheric corrosion simulator capable of adjusting temperature, humidity, ultraviolet light and pollution gas |
| CN204150446U (en) * | 2014-08-22 | 2015-02-11 | 富瑞世嘉（天津）电子有限公司 | A kind of electronic devices and components proof cabinet |
| CN104460733A (en) * | 2014-10-28 | 2015-03-25 | 重庆交通大学 | Flowing gas humidity control device |
| CN207085940U (en) * | 2017-08-22 | 2018-03-13 | 苏州市乐测检测技术服务有限公司 | A kind of high/low temperature alternate humid heat test case |
| CN109900764A (en) * | 2019-03-29 | 2019-06-18 | 西安交通大学 | A kind of micro environment control platform and its scan method for SECCM |
| CN111026177A (en) * | 2019-12-18 | 2020-04-17 | 北京航空航天大学 | System and method for controlling humidity in alkali metal air chamber |
| CN111399568A (en) * | 2020-02-29 | 2020-07-10 | 天津大学 | Multi-closed-loop temperature and humidity control system for mechanical testing of micro-cavity environment |
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