CN111748795A - Special gas coupling conveying device for reaction chamber of flat plate type PECVD (plasma enhanced chemical vapor deposition) equipment - Google Patents
Special gas coupling conveying device for reaction chamber of flat plate type PECVD (plasma enhanced chemical vapor deposition) equipment Download PDFInfo
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- CN111748795A CN111748795A CN201910250504.1A CN201910250504A CN111748795A CN 111748795 A CN111748795 A CN 111748795A CN 201910250504 A CN201910250504 A CN 201910250504A CN 111748795 A CN111748795 A CN 111748795A
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- Prior art keywords
- seat
- transition
- reaction chamber
- gas supply
- conveying device
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 32
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 title claims abstract description 22
- 230000008878 coupling Effects 0.000 title claims abstract description 14
- 238000010168 coupling process Methods 0.000 title claims abstract description 14
- 238000005859 coupling reaction Methods 0.000 title claims abstract description 14
- 230000007704 transition Effects 0.000 claims abstract description 50
- 238000007789 sealing Methods 0.000 claims abstract description 40
- 239000007789 gas Substances 0.000 description 39
- 210000001503 joint Anatomy 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 6
- 230000006872 improvement Effects 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16J—PISTONS; CYLINDERS; SEALINGS
- F16J15/00—Sealings
- F16J15/02—Sealings between relatively-stationary surfaces
- F16J15/06—Sealings between relatively-stationary surfaces with solid packing compressed between sealing surfaces
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
The invention discloses a special gas coupling conveying device for a reaction chamber of flat-plate PECVD (plasma enhanced chemical vapor deposition) equipment, which comprises an upper gas supply seat positioned on an upper cover of the reaction chamber, a lower gas supply seat positioned in the reaction chamber and a transition seat positioned between the upper gas supply seat and the lower gas supply seat, wherein a plurality of upper gas supply joints are arranged on the upper gas supply seat, a plurality of transition channels are arranged on the transition seat, a plurality of lower gas supply joints are arranged on the lower gas supply seat, the lower ends of the upper gas supply joints and the upper ends of the transition channels are arranged in a one-to-one correspondence manner, the upper ends of the lower gas supply joints correspondingly extend into the lower ends of the transition channels one by one, first sealing rings are respectively arranged at the peripheries of the transition channels at the upper end of the transition seat, and second sealing rings including all the first sealing rings are arranged at the edge. The invention can safely introduce gas from the fixed lower reaction chamber into the gas nozzle of the movable upper cover of the hinge type flip structure, and has the advantages of simple structure, good reliability, difficult occurrence of gas leakage and the like.
Description
Technical Field
The invention relates to a flat plate type PECVD device, in particular to a special gas coupling conveying device for a reaction chamber of the flat plate type PECVD device.
Background
Pecvd (plasma Enhanced Chemical Vapor deposition) refers to a plasma Enhanced Chemical Vapor deposition method in which a special gas containing atoms of a film component (e.g., silane and ammonia gas) is ionized by microwave or radio frequency to locally form plasma, and the plasma is chemically active so that a Chemical reaction can be performed at a relatively low temperature to deposit a desired film on a substrate. The inner wall of the cavity is also adhered with the film material in the film growth process and needs to be cleaned regularly, so that the equipment adopts a mode of opening the upper cover hinge, and the upper cover is opened during maintenance. The mutually reactive process gases are introduced from the chamber into the gas injection ports of the movable upper cover. The flat plate type PECVD equipment has obvious advantages, such as low basic temperature, high deposition rate, good film forming quality, less pinholes and difficult cracking.
The existing special gas conveying modes mainly comprise two modes, one mode is that corrugated pipes are directly connected, fatigue fracture can occur along with frequent opening of an upper cover, the corrugated pipes are possibly extruded when the upper cover of a reaction chamber is closed, and gas leakage can be caused after the corrugated pipes are crushed along with increase of cover closing times, so that a film growth process cannot be carried out; the other method is to adopt single-path gas butt joint, although the problem of bellows damage is avoided by the mode, gas leakage is caused because sealing failure is easy to occur due to relative movement, and the leaked gas enters a reaction chamber to cause poor process repeatability and poor product quality.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide the plate type PECVD equipment reaction chamber extra-gas coupling conveying device with simple structure and good reliability.
In order to solve the technical problems, the invention adopts the following technical scheme:
a special gas coupling conveying device of a reaction chamber of a flat plate type PECVD (plasma enhanced chemical vapor deposition) device comprises an upper gas supply seat positioned on an upper cover of the reaction chamber, a lower gas supply seat positioned in the reaction chamber, and a transition seat positioned between the upper gas supply seat and the lower gas supply seat, wherein a plurality of upper gas supply joints are arranged on the upper gas supply seat, a plurality of transition channels are arranged on the transition seat, a plurality of lower gas supply joints are arranged on the lower gas supply seat, the lower ends of the upper gas supply joints are arranged in one-to-one correspondence with the upper ends of the transition channels, the upper ends of the lower gas supply joints correspondingly extend into the lower ends of the transition channels in one-to-one correspondence, first sealing rings are respectively arranged at the peripheries of the transition channels at the upper end of the transition seat, and second sealing rings including all the first sealing rings are arranged at the edge of.
As a further improvement of the above technical solution: and a vacuumizing channel is arranged in the transition seat, the air inlet of the vacuumizing channel is positioned between the first sealing ring and the second sealing ring, and the air outlet is connected with a vacuumizing pump.
As a further improvement of the above technical solution: and the upper end of the lower air supply joint is provided with at least one third sealing ring.
As a further improvement of the above technical solution: the periphery of the lower air supply connector is sleeved with an elastic piece, the upper end of the elastic piece is abutted to the transition seat, and the lower end of the elastic piece is abutted to the lower air supply seat.
Compared with the prior art, the invention has the advantages that: the invention discloses a special gas coupling conveying device of a reaction chamber of flat plate type PECVD equipment, wherein the upper cover of the reaction chamber is separated from the fed gas of a lower chamber, an upper gas supply joint is concentrated on an upper gas supply seat, a transition channel is concentrated on the transition seat, the transition seat can provide space for arranging a first sealing ring, a second sealing ring and a vacuumizing channel, the sealing between each upper gas supply joint and the transition channel can depend on the corresponding first sealing ring and also can depend on the second sealing ring on the outer side for total sealing, even if the single first sealing ring has failure leakage, the leaked gas can be sealed by the second sealing ring and cannot leak into the chamber, the process quality of the reaction chamber cannot be influenced, and meanwhile, the gas is safely introduced into a gas jet port of a movable upper cover of a hinge type flip structure from the fixed lower reaction chamber.
Drawings
FIG. 1 is a schematic structural diagram of a reaction chamber special gas coupling conveying device of a flat-plate PECVD apparatus of the invention.
The reference numerals in the figures denote: 1. an upper air supply seat; 11. an upper air supply joint; 2. a lower air supply seat; 21. a lower air supply joint; 22. a third seal ring; 23. an elastic member; 3. a transition seat; 31. a transition passage; 32. a second seal ring; 33. a first seal ring; 34. and (4) vacuumizing the channel.
Detailed Description
The invention is described in further detail below with reference to the figures and specific examples of the specification.
FIG. 1 shows an embodiment of the special gas coupling transportation device for the reaction chamber of a flat-plate PECVD apparatus of the present invention, which comprises an upper gas-sending seat 1 located on the upper cover of the reaction chamber, a lower gas-sending seat 2 located in the reaction chamber, and the transition seat 3 is positioned between the upper air supply seat 1 and the lower air supply seat 2, a plurality of upper air supply joints 11 are arranged on the upper air supply seat 1, a plurality of transition channels 31 are arranged on the transition seat 3, a plurality of lower air supply joints 21 are arranged on the lower air supply seat 2, the lower ends of the upper air supply joints 11 are arranged in one-to-one correspondence with the upper ends of the transition channels 31, the upper ends of the lower air supply joints 21 extend into the lower ends of the transition channels 31 in one-to-one correspondence, first sealing rings 33 are respectively arranged at the peripheries of the transition channels 31 at the upper end of the transition seat 3, and second sealing rings 32 including all the first sealing rings 33 are arranged at the upper end edge of the transition seat 3.
According to the special gas coupling conveying device for the reaction chamber of the flat-plate PECVD equipment, the upper cover of the reaction chamber is separated from the fed gas of a lower chamber, the upper gas feeding joint 11 is concentrated on the upper gas feeding seat 1, the transition channel 31 is concentrated on the transition seat 3, the transition seat 3 can provide space for arranging a first sealing ring 33, a second sealing ring 32 and a vacuumizing channel 34, the sealing between each upper gas feeding joint 11 and the transition channel 31 can depend on the corresponding first sealing ring 33 and can also depend on the second sealing ring 32 on the outer side for general sealing, and even if the single first sealing ring 33 fails and leaks, the leaked gas can be sealed by the second sealing ring 32 and cannot leak into the chamber, and the process quality of the reaction chamber cannot be influenced.
Further, in the present embodiment, a vacuum pumping channel 34 is disposed in the transition seat 3, an air inlet of the vacuum pumping channel 34 is located between the first sealing ring 33 and the second sealing ring 32, and an air outlet is connected to a vacuum pumping pump (not shown in the figure). When the first sealing ring 33 fails and leaks, the leaking gas is blocked by the second sealing ring 32 on the one hand and can be timely evacuated by means of the evacuation pump and the evacuation channel 34 on the other hand.
Further, at least one third packing 22 is provided at the upper end of the lower air supply joint 21. In this embodiment, there are two third seal rings 22. The provision of more than one third sealing ring 22 is advantageous in ensuring the tightness between transition seat 3 and lower air feed joint 21.
Further, in the present embodiment, an elastic member 23 is fitted around the outer periphery of the lower air supply joint 21, the upper end of the elastic member 23 abuts against the transition seat 3, and the lower end of the elastic member 23 abuts against the lower air supply seat 2. When the upper cover is opened and closed, the transition seat 3 can move up and down under the action of the elastic piece 23, so that flexible contact between the transition seat 3 and the upper air supply seat 1 is realized, and meanwhile, when the upper cover of the reaction chamber is closed, the transition seat 3 and the upper air supply seat 1 are tightly attached to each other.
Although the present invention has been described with reference to the preferred embodiments, it is not intended to be limited thereto. Those skilled in the art can make numerous possible variations and modifications to the present invention, or modify equivalent embodiments to equivalent variations, without departing from the scope of the invention, using the teachings disclosed above. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical spirit of the present invention should fall within the protection scope of the technical scheme of the present invention, unless the technical spirit of the present invention departs from the content of the technical scheme of the present invention.
Claims (4)
1. A plate type PECVD equipment reaction chamber special gas coupling conveying device is characterized in that: comprises an upper gas supply seat (1) positioned on an upper cover of a reaction chamber, a lower gas supply seat (2) positioned in the reaction chamber, and a transition seat (3) positioned between the upper gas supply seat (1) and the lower gas supply seat (2), a plurality of upper air feeding joints (11) are arranged on the upper air feeding seat (1), a plurality of transition channels (31) are arranged on the transition seat (3), a plurality of lower air feeding joints (21) are arranged on the lower air feeding seat (2), the lower ends of the upper air feeding joints (11) are arranged in one-to-one correspondence with the upper ends of the transition channels (31), the upper ends of the lower air feeding joints (21) correspondingly extend into the lower ends of the transition channels (31), the upper end of the transition seat (3) is respectively provided with a first sealing ring (33) at the periphery of each transition channel (31), and the edge of the upper end of the transition seat (3) is provided with a second sealing ring (32) comprising all the first sealing rings (33).
2. The special gas coupling conveying device for the reaction chamber of the flat-plate type PECVD equipment according to claim 1, characterized in that: a vacuumizing channel (34) is arranged in the transition seat (3), the air inlet of the vacuumizing channel (34) is located between the first sealing ring (33) and the second sealing ring (32), and the air outlet is connected with a vacuumizing pump.
3. The special gas coupling conveying device for the reaction chamber of the flat-plate type PECVD equipment according to the claim 1 or 2, characterized in that: and the upper end of the lower air feeding joint (21) is provided with at least one third sealing ring (22).
4. The special gas coupling conveying device for the reaction chamber of the flat-plate type PECVD equipment according to the claim 1 or 2, characterized in that: the periphery of the lower air supply connector (21) is sleeved with an elastic piece (23), the upper end of the elastic piece (23) is abutted to the transition seat (3), and the lower end of the elastic piece (23) is abutted to the lower air supply seat (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910250504.1A CN111748795A (en) | 2019-03-29 | 2019-03-29 | Special gas coupling conveying device for reaction chamber of flat plate type PECVD (plasma enhanced chemical vapor deposition) equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910250504.1A CN111748795A (en) | 2019-03-29 | 2019-03-29 | Special gas coupling conveying device for reaction chamber of flat plate type PECVD (plasma enhanced chemical vapor deposition) equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111748795A true CN111748795A (en) | 2020-10-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910250504.1A Pending CN111748795A (en) | 2019-03-29 | 2019-03-29 | Special gas coupling conveying device for reaction chamber of flat plate type PECVD (plasma enhanced chemical vapor deposition) equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111748795A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108060410A (en) * | 2017-12-15 | 2018-05-22 | 浙江晶盛机电股份有限公司 | Structure is protected for the admission line of flat-plate type PECVD |
| CN210012899U (en) * | 2019-03-29 | 2020-02-04 | 中国电子科技集团公司第四十八研究所 | Special gas coupling conveying device for reaction chamber of flat plate type PECVD (plasma enhanced chemical vapor deposition) equipment |
-
2019
- 2019-03-29 CN CN201910250504.1A patent/CN111748795A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108060410A (en) * | 2017-12-15 | 2018-05-22 | 浙江晶盛机电股份有限公司 | Structure is protected for the admission line of flat-plate type PECVD |
| CN210012899U (en) * | 2019-03-29 | 2020-02-04 | 中国电子科技集团公司第四十八研究所 | Special gas coupling conveying device for reaction chamber of flat plate type PECVD (plasma enhanced chemical vapor deposition) equipment |
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