CN111681978B - 一种晶圆清洗装置 - Google Patents
一种晶圆清洗装置 Download PDFInfo
- Publication number
- CN111681978B CN111681978B CN202010804243.6A CN202010804243A CN111681978B CN 111681978 B CN111681978 B CN 111681978B CN 202010804243 A CN202010804243 A CN 202010804243A CN 111681978 B CN111681978 B CN 111681978B
- Authority
- CN
- China
- Prior art keywords
- cleaning
- wafer
- mounting plate
- fixedly installed
- driving device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H10P72/0412—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/10—Cleaning by methods involving the use of tools characterised by the type of cleaning tool
- B08B1/14—Wipes; Absorbent members, e.g. swabs or sponges
- B08B1/143—Wipes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B1/00—Cleaning by methods involving the use of tools
- B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
-
- H10P72/0414—
-
- H10P72/78—
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010804243.6A CN111681978B (zh) | 2020-08-12 | 2020-08-12 | 一种晶圆清洗装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010804243.6A CN111681978B (zh) | 2020-08-12 | 2020-08-12 | 一种晶圆清洗装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111681978A CN111681978A (zh) | 2020-09-18 |
| CN111681978B true CN111681978B (zh) | 2020-12-01 |
Family
ID=72458278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010804243.6A Active CN111681978B (zh) | 2020-08-12 | 2020-08-12 | 一种晶圆清洗装置 |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111681978B (zh) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112547603B (zh) * | 2020-11-13 | 2024-08-13 | 沈阳晶润半导体材料有限公司 | 一种半导体晶圆表面清洗装置 |
| CN112485641B (zh) * | 2020-11-18 | 2021-08-20 | 江门诺华精密电子有限公司 | 一种线路板的自动检测装置及其检测方法 |
| CN112420565A (zh) * | 2020-12-08 | 2021-02-26 | 广东先导先进材料股份有限公司 | 晶圆清洗装置及方法 |
| CN112366133B (zh) * | 2021-01-13 | 2021-03-30 | 中电鹏程智能装备有限公司 | 针对半导体产品的擦拭清洗装置及其清洗方法 |
| CN116646273A (zh) * | 2022-02-15 | 2023-08-25 | 盛美半导体设备(上海)股份有限公司 | 基板清洗设备及其翻转装置 |
| CN115582333B (zh) * | 2022-10-24 | 2023-09-01 | 苏州智程半导体科技股份有限公司 | 半导体晶圆翻转式清洗装置 |
| CN118610127B (zh) * | 2024-06-18 | 2025-05-02 | 芯朋半导体科技(如东)有限公司 | 一种具有输送挡水构件的芯片框架清洗系统 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0697137A (ja) * | 1992-09-14 | 1994-04-08 | Dainippon Screen Mfg Co Ltd | 基板洗浄装置 |
| JP4824883B2 (ja) * | 2001-09-25 | 2011-11-30 | 株式会社岡本工作機械製作所 | 基板の研磨装置および基板の研磨・洗浄・乾燥方法 |
| JP2004111815A (ja) * | 2002-09-20 | 2004-04-08 | Nec Yamagata Ltd | 保護テープの剥離方法及びその装置 |
| JP6304349B1 (ja) * | 2016-11-15 | 2018-04-04 | 株式会社Sumco | ウェーハのエッジ研磨装置及び方法 |
| CN109346424A (zh) * | 2018-10-29 | 2019-02-15 | 浙江金瑞泓科技股份有限公司 | 一种硅片刷片机 |
| CN210223964U (zh) * | 2019-08-14 | 2020-03-31 | 常州科沛达清洗技术股份有限公司 | 晶圆片刷洗甩干机构 |
-
2020
- 2020-08-12 CN CN202010804243.6A patent/CN111681978B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN111681978A (zh) | 2020-09-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN111681978B (zh) | 一种晶圆清洗装置 | |
| CN111739828B (zh) | 一种晶圆自动刷片机 | |
| CN115458449B (zh) | 一种机械摆臂与槽体紧凑配合的晶圆槽式清洗机 | |
| CN105689315A (zh) | 一种机械零部件清洗装置 | |
| CN111889437A (zh) | 一种晶圆清洗机 | |
| CN114256062A (zh) | 一种镀膜前al制品去胶清洗的方法 | |
| CN211965144U (zh) | 全自动单片清洗机 | |
| CN117102129A (zh) | 一种用于晶圆的清洗装置 | |
| CN106944394A (zh) | 一种硅片翻转冲洗装置 | |
| CN222077346U (zh) | 一种清洗装置及硅片生产设备 | |
| CN113770072A (zh) | 一种液晶面板显示器自动清洗烘干设备 | |
| CN108160602A (zh) | 全自动smt吸嘴清洗机 | |
| CN218215233U (zh) | 一种用于晶圆清洗的容纳盒 | |
| CN221532530U (zh) | 一种自动移蛋设备 | |
| CN115301610B (zh) | 一种芯片全方位清洗拣选机及清洗方法 | |
| CN218794547U (zh) | 一种快速高效的洁净过滤袋装置 | |
| CN110676197A (zh) | 一种精密半导体清洗装置 | |
| CN206676807U (zh) | 一种硅片翻转冲洗装置 | |
| CN115472544A (zh) | 一种清洗半导体硅片的装置 | |
| CN111383965A (zh) | 一种旋转式冲洗烘干装置 | |
| CN216174632U (zh) | 一种具有水循环机构的半导体硅片清洗装置 | |
| CN221734357U (zh) | 一种玻璃高效清洗机 | |
| CN116371806A (zh) | 一种晶片清洗机 | |
| CN221934825U (zh) | 一种硅片加工用清洗装置 | |
| CN220821498U (zh) | 一种用于超小尺寸单片晶圆的清洗取干装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 261000 west area of the third photoelectric Park, north of Yuqing street, west of Yinfeng Road, high tech Zone, Weifang City, Shandong Province Patentee after: Yuanxu Semiconductor Technology Co.,Ltd. Address before: 261000 west area of the third photoelectric Park, north of Yuqing street, west of Yinfeng Road, high tech Zone, Weifang City, Shandong Province Patentee before: SHANDONG NOVOSHINE OPTOELECTRONICS Co.,Ltd. |
|
| CP01 | Change in the name or title of a patent holder | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: Wafer cleaning device Effective date of registration: 20220411 Granted publication date: 20201201 Pledgee: Weifang Jinma road sub branch of Bank of Weifang Co.,Ltd. Pledgor: Yuanxu Semiconductor Technology Co.,Ltd. Registration number: Y2022980004083 |
|
| PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
| PC01 | Cancellation of the registration of the contract for pledge of patent right |
Granted publication date: 20201201 Pledgee: Weifang Jinma road sub branch of Bank of Weifang Co.,Ltd. Pledgor: Yuanxu Semiconductor Technology Co.,Ltd. Registration number: Y2022980004083 |
|
| TR01 | Transfer of patent right | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20240617 Address after: Floors 1-3, Sapphire Factory, No. 233-4 Sufu Road, Suxi Town, Yiwu City, Jinhua City, Zhejiang Province, 322000 Patentee after: BOE Huacan Jingtu Technology (Zhejiang) Co.,Ltd. Country or region after: China Address before: 261000 west area of the third photoelectric Park, north of Yuqing street, west of Yinfeng Road, high tech Zone, Weifang City, Shandong Province Patentee before: Yuanxu Semiconductor Technology Co.,Ltd. Country or region before: China |