CN111256618A - Double-differential structured light illumination microscopic measurement method for rapidly measuring three-dimensional morphology of surface of micro-nano structure - Google Patents
Double-differential structured light illumination microscopic measurement method for rapidly measuring three-dimensional morphology of surface of micro-nano structure Download PDFInfo
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Abstract
The invention discloses a double differential type structure illumination obvious micrometering method for quickly measuring the three-dimensional shape of the surface of a micro-nano structure. The coded light field is projected to the surface of a measured object through the DMD, a double-differential measurement method is constructed by adopting three CCD detection paths, and light intensity information of the three detection paths is synchronously acquired. And solving the modulation degree distribution of the coded light field collected by the three CCD systems by adopting a phase shift algorithm, performing double differential operation on the three different solved modulation degree distributions to construct double differential modulation degree distribution, completing the calibration of a linear region between the modulation degree distribution and the height information, and recovering the surface morphology by calculating the relationship between the modulation degree and the height information. The double differential modulation degree response curve provided by the invention has a longer linear area than that of the traditional method, namely the method of the invention has a wider measurement range.
Description
Technical Field
The invention belongs to the field of micro-nano measurement, and particularly relates to a double differential type structure illumination obvious micro-measurement method for rapidly measuring the three-dimensional morphology of the surface of a micro-nano structure.
Background
The micro-nano detection technology is a hot research direction in the current micro-nano field and is a basic guarantee for further development of the micro-nano field. Due to the unique performance of the micro-nano device in the micro-scale, the micro-nano device has wide application in a plurality of high and new technical fields such as aerospace, biomedicine, semiconductor manufacturing and the like. A series of processes such as design, production, manufacturing, testing and the like of the micro-nano device can not leave the micro-nano detection technology, and the three-dimensional micro-nano structure rapid measurement technology is a key development trend in the field of micro-nano detection and plays an important role in actual production and life.
The current measuring method for the three-dimensional micro-nano structure mainly comprises a white light interference measuring technology and a digital holographic measuring technology. The white light interference measurement technology is characterized in that interference fringes are generated between a measuring beam irradiating on a surface to be measured and a reference beam irradiating on a reference plane by utilizing an interference principle, an optical path difference is recorded in the form of the interference fringes, the interference fringes contain the shape information of the surface to be measured, and through phase unwrapping, the height information can be extracted from an interference fringe image, so that the three-dimensional shape recovery of the surface to be measured is completed. At present, the white light interference method has high measurement accuracy, but when the method is used for measuring a surface with large roughness and a surface with large curvature, dense interference fringes can be generated, and the phase unwrapping process is not facilitated, so that the use of the method is limited under certain conditions. The digital holographic measurement technology is characterized in that light waves reflected back by the surface of an object and irradiated by the light are stored as a hologram in the form of interference fringes by utilizing the interference principle and the diffraction theory of light, the hologram contains wave front information of the object to be measured, the phase and amplitude information of the object to be measured can be recovered by carrying out numerical reconstruction on the recorded hologram, and the three-dimensional shape reconstruction of the object to be measured is completed. Currently, digital holography has been widely applied in the fields of label-free biological cell detection, material surface measurement, and microstructure surface detection. However, for a surface with large roughness, the method is limited in use because it is difficult to generate continuous interference fringes, so that phase and amplitude information cannot be acquired when three-dimensional reconstruction is performed.
The structured light-based microscopic measurement method has attracted wide attention due to its characteristics of high precision, full field of view, non-contact, etc. In 1997, Neil solved the axial response curve in the structured light microscopy system by using a phase shift method, and the maximum value of the modulation degree appears when the measured surface is just on the focal plane of the objective lens, so that the height of the measured surface can be obtained according to the position where the maximum value of the modulation degree appears and the scanning step distance, thereby realizing the measurement of the surface topography. In 1999, Tsai introduced a double-scanning method in structured light microscopy, and utilized the linear region of the modulation response curve to realize rapid topography measurement. In 2019, Xie combines differential measurement and a structured light microscopic measurement technology, and widens the measurement range of the system to a certain extent. So far, the rapid measurement method based on the structured light microscope adopts a linear region between a calibration modulation response curve and the height for three-dimensional reconstruction, however, the modulation response curve is approximately in a Gaussian distribution, the range of the linear region is small, and the use range of the method is greatly limited.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention provides a double differential type structure illumination obvious micro-measurement method for rapidly measuring the three-dimensional topography of the surface of a micro-nano structure, which is characterized in that two CCD detection branches with small distances are added on the basis of the original single CCD conjugate imaging, double differential operation is carried out on modulation response curves acquired by three CCDs, a three-CCD double differential system is constructed, the range of a linear region is obviously increased for the modulation response curve analysis of the generated double differential system, the measurement range in the rapid measurement system is greatly improved, and the system is particularly suitable for measuring objects with large height difference.
In order to achieve the aim, the invention provides a double differential type structure illumination obvious micro-measurement method for rapidly measuring the three-dimensional morphology of the surface of a micro-nano structure, which comprises the following steps:
the method comprises the following steps: vertically scanning a standard plane object at a micro step pitch by controlling piezoelectric ceramics through an upper computer program, projecting sinusoidal grating stripes of N-step phase shift by using a DMD (digital micromirror device) every time of scanning, collecting a stripe pattern modulated by a measured surface by using a three-CCD (charge coupled device) double differential system, and storing the stripe pattern in a computer;
step two: each time of scanning, resolving a modulation value of each pixel point for the fringe patterns collected by the three CCDs by respectively applying an N-step phase shift algorithm, and obtaining M-frame modulation values of each pixel point after scanning for M times;
step three: performing double differential operation on the modulation degree distribution of the fringe patterns acquired by the three CCDs to construct a double differential modulation degree curve of each pixel point;
step four: according to a correlation theory, extracting a linear region of a double differential modulation degree curve, and calibrating a relation between the modulation degree and the height in the linear region;
step five: in the experiment, a series of phase shift images of an object at a certain position in a linear calibration range are collected, a phase shift method is used for solving the modulation degree, and the three-dimensional reconstruction of the measured surface can be completed according to the relation between the modulation degree and the height in the calibrated linear region.
Furthermore, the two CCDs of the two added CCD detection branches should be respectively placed on two sides of the imaging focal plane and have the same distance with the imaging focal plane, and when the distances between the two CCD detection branches and the imaging focal plane are the same, the system has a wider measurement range under the condition that other system conditions are not changed.
Furthermore, the standard plane object is controlled by the piezoelectric ceramics to perform M times of micro stepping along the optical axis, a three-CCD double differential system is acquired to acquire a modulated stripe image, the modulation degree distribution of the image is calculated by N-step phase shift algorithm after each scanning, and double differential operation processing is performed on the modulation degree distribution of the image acquired by the three CCDs, so that the corresponding relation between the double differential modulation degree and the surface height can be obtained.
Further, under the condition of setting the same system parameters, compared with the traditional method based on the structured light microscopic measurement principle, the double-differential structured light microscopic measurement method has a longer linear area, namely, a wider measurement range.
The principle of the invention is as follows: the invention generates a coded light field with a specific rule by regulating and controlling a spatial light field through a DMD and projects the coded light field onto the surface of a measured object, a double-differential measurement method is constructed by adopting three CCDs, two CCD detection branches with small differences are added on the basis of single-path CCD conjugate imaging, light intensity information of three detection paths is synchronously acquired, modulation degree distribution of the coded light field acquired by a three-CCD system is solved by adopting a phase shift algorithm, double-differential operation is carried out on the solved three different modulation degree distributions to construct double-differential modulation degree distribution, linear calibration between the modulation degree distribution and height information is completed by utilizing a related theory, and thus the surface morphology is restored by calculating the relation between the modulation degree and the height information.
Compared with the prior art, the invention has the advantages that: two additional CCD detection branches are introduced to form a three-CCD double-differential measurement system, a double-differential modulation degree response curve is constructed, and under the same system condition, a linear region calibrated by the method is longer than that of the traditional method, namely the method has a wider measurement range.
Drawings
FIG. 1 is a flow chart of a double differential type structured light illumination microscopic measurement method for rapidly measuring the three-dimensional topography of the surface of a micro-nano structure.
FIG. 2 is an optical path diagram of a double differential type structure illumination obvious micrometering method for rapidly measuring the three-dimensional topography of the surface of a micro-nano structure according to the present invention; the device comprises a light source 201, a collimating mirror 202, a DMD digital micromirror array 203, a first Tube lens 204, a first beam splitter 205, a microscope objective 206, a sample 207, PZT piezoelectric ceramic 208, a second Tube lens 209, a second beam splitter 210, a first CCD211, a third beam splitter 212, a second CCD213 and a third CCD 214.
Fig. 3 is a graph showing axial modulation response curves of the first CCD211, the second CCD213, and the third CCD214, respectively, which are obtained by simulation of the present invention.
FIG. 4 is a comparison graph of linear regions of a single CCD structure light microscopic measurement system, a double CCD single differential structure light microscopic measurement system and a three CCD double differential structure light microscopic measurement system obtained by simulation of the present invention.
Detailed Description
To better illustrate the specific processes of the present invention, further details are provided below in conjunction with the accompanying drawings.
As shown in fig. 1-2, a double differential type structure illumination obvious micro-measurement method for rapidly measuring the three-dimensional topography of the surface of a micro-nano structure comprises the following specific steps:
the method comprises the following steps: the piezoelectric ceramics are controlled by an upper computer program to vertically scan a standard plane object at a micro step pitch, a DMD is used for projecting sinusoidal grating stripes of N-step phase shift each time of scanning, a three-CCD double differential system is used for collecting a stripe pattern modulated by the measured surface, and the stripe pattern is stored in a computer.
Step two: and each scanning time, resolving the modulation value of each pixel point by respectively applying an N-step phase shift algorithm to the fringe patterns collected by the first CCD211, the second CCD213 and the third CCD214, and obtaining M frames of modulation values of each pixel point after scanning for M times.
Step three: and performing double differential operation on the modulation degree distribution of the fringe patterns collected by the first CCD211, the second CCD213 and the third CCD214 to construct a double differential modulation degree curve of each pixel point.
Step four: according to the correlation theory, a linear region of the double differential modulation degree curve is extracted, and the relation between the modulation degree and the height in the linear region is calibrated.
Step five: in the experiment, a series of phase shift images of an object at a certain position in a linear calibration range are collected, a phase shift method is used for solving the modulation degree, and the three-dimensional reconstruction of the measured surface can be completed according to the relation between the modulation degree and the height in the calibrated linear region.
The light intensity collected by the CCD can be expressed as:
I(x,y)＝I0B(x,y)[1+C(x,y)cos(2πfx+φ0)](1)
wherein, I0For background intensity, B (x, y) is the reflectivity of the surface (0 ≦ B ≦ 1), C (x, y) describes the modulation of the projected sinusoidal fringes, f is the spatial frequency of the fringe pattern, φ0Is a projected fringeThe initial phase of (a).
Further, in order to obtain the modulation degree distribution of each scanning position, an N-step phase shift algorithm is adopted to solve the modulation degree value of each pixel point.
The phase-shifted fringe pattern can be expressed as:
wherein, Ii(x, y) is the light intensity distribution at the i-th phase shift, N is the total number of phase shift steps, and i is 1,2,3 … N.
Wherein the modulation degree distribution can be defined as:
the formula (2) can be substituted for the formula (3):
according to the imaging theory, in the structured light microscopy measurement system, for a fixed pixel, the response curve of the modulation degree and the defocus distance is approximate to a gaussian curve, which can be expressed as:
wherein z isaIs the axial position of the focal plane, z is the axial distance from the focal plane, m is a constant, and
the FWHM is the full width at half maximum, which can be expressed as:
where v is the normalized frequency of the projected fringe, v ═ λ/(2NA × T), T is the period of the projected fringe, NA is the numerical aperture of the objective lens, λ is the central wavelength of the light source, and n is the refractive index.
The modulation degree distribution of the three CCDs can be expressed as:
wherein M is1(x,y,z)、M2(x, y, z) and M3(x, y, z) are modulation degree distributions of the first CCD211, the second CCD213, and the third CCD214, respectively, and d is a distance from each of the first CCD211 and the third CCD214 to the imaging plane.
The modulation degree curve of the double differential type can be expressed as:
the relationship between the double differential modulation degree value and the height can be established by intercepting and calibrating a linear region in the double differential modulation degree curve.
Fig. 3 is a simulation diagram of the modulation degree axial response curves of the first CCD211, the second CCD213, and the third CCD214, the modulation degree response curves of the three CCDs having similar shapes with only a displacement in the lateral direction by a distance related to the distance between the first CCD211 and the third CCD214, respectively, and the imaging plane.
FIG. 4 is a simulation comparison diagram of linear regions of a single CCD structure light microscopic measurement system, a double CCD single differential structure light microscopic measurement system and a three CCD double differential structure light microscopic measurement system. Fig. 4 clearly shows that the three-CCD double differential system proposed by the present invention has a wider measurement range than the conventional single-CCD method and the double-CCD single differential method.
In the present invention, the main devices include: the digital micromirror array 203 of DMD, three black and white CCD cameras, microscope objective 206, LED illumination light source 201, two Tube lenses, three spectroscopes. The LED illumination source is used to provide a light source for the measurement system, the first CCD211 is located in front of the focal plane of the second Tube lens 209, the second CCD213 is located at the focal plane of the second Tube lens 209, and the third CCD214 is located behind the focal plane of the second Tube lens 209 for image acquisition. The DMD digital micromirror array 203 is located at the focal plane position of the first Tube lens 204 and is used for generating a grating image, the first Tube lens 204 and the second Tube lens 209 are used for focusing and imaging, the microscope objective 206 is used for imaging the surface 207 of the object to be detected, the first beam splitter 205, the second beam splitter 210 and the third beam splitter 212 are used for splitting light beams, the PZT piezoelectric ceramics 208 is used for driving the object to perform axial scanning, and the sample 207 to be detected is located at the focal plane position of the microscope objective 206.
Claims (4)
1. A double differential type structure illumination obvious micro-measurement method for rapidly measuring the three-dimensional morphology of the surface of a micro-nano structure is characterized by comprising the following steps: the method comprises the following steps:
the method comprises the following steps: the piezoelectric ceramics are controlled by an upper computer program to vertically scan a standard plane object at a micro step pitch, in each scanning process, a sinusoidal grating stripe with N-step phase shift is projected by using a DMD, a stripe pattern modulated by the measured surface is acquired by using a three-CCD double differential measurement system, and the stripe pattern is stored in a computer;
step two: each time of scanning, resolving a modulation value of each pixel point for the fringe patterns collected by the three CCDs by respectively applying an N-step phase shift algorithm, and obtaining M-frame modulation values of each pixel point after scanning for M times;
step three: performing double differential operation on the modulation degree distribution of the fringe patterns acquired by the three CCDs to construct a double differential modulation degree curve of each pixel point;
step four: according to a correlation theory, extracting a linear region of a double differential modulation degree curve, and calibrating a relation between the modulation degree and the surface height in the linear region;
step five: in the experiment, a series of phase shift images of a measured object at a certain position in a linear calibration range are collected, a phase shift method is used for solving out the modulation degree, and the three-dimensional reconstruction of the measured surface can be completed according to the relationship between the modulation degree and the surface height in the calibrated linear region.
2. The double differential type structure illumination obvious micrometering method for the rapid measurement of the three-dimensional topography of the surface of the micro-nano structure according to claim 1, which is characterized in that: the two CCDs of the added two CCD detection branches are respectively placed on two sides of the imaging focal plane and have the same distance with the imaging focal plane, and when the distances between the two CCD detection branches and the imaging focal plane are the same, the system has a wider measurement range under the condition that other system conditions are not changed.
3. The double differential type structure illumination obvious micrometering method for the rapid measurement of the three-dimensional topography of the surface of the micro-nano structure according to claim 1, which is characterized in that: the standard plane object is controlled by the piezoelectric ceramics to perform M times of micro stepping along the optical axis, a three-CCD double differential system is acquired to acquire a modulated stripe image, the modulation degree distribution of the image is calculated by N-step phase shift algorithm in each scanning, and double differential operation processing is performed on the modulation degree distribution of the image acquired by the three CCDs, so that the corresponding relation between the double differential modulation degree and the surface height can be obtained.
4. The double differential type structure illumination obvious micrometering method for the rapid measurement of the three-dimensional topography of the surface of the micro-nano structure according to claim 1, which is characterized in that: under the condition of setting the same system parameters, compared with the traditional method based on the structured light microscopic measurement principle, the double-differential structured light microscopic measurement method has a longer linear area, namely a wider measurement range.
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| CN111896557A (en) * | 2020-09-07 | 2020-11-06 | 中国工程物理研究院机械制造工艺研究所 | Three-dimensional measuring device and method for dark field microscopic defects of structured light modulation |
| CN114812437A (en) * | 2022-03-25 | 2022-07-29 | 珠海城市职业技术学院 | Optical three-dimensional measurement method and system based on pixel coding |
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| CN111829457B (en) * | 2020-07-09 | 2022-06-10 | 中国科学院光电技术研究所 | Method for detecting three-dimensional morphology of ultrathin film device based on structured light illumination microscope system |
| CN111896557A (en) * | 2020-09-07 | 2020-11-06 | 中国工程物理研究院机械制造工艺研究所 | Three-dimensional measuring device and method for dark field microscopic defects of structured light modulation |
| CN114812437A (en) * | 2022-03-25 | 2022-07-29 | 珠海城市职业技术学院 | Optical three-dimensional measurement method and system based on pixel coding |
| CN114812437B (en) * | 2022-03-25 | 2023-07-04 | 珠海城市职业技术学院 | Optical three-dimensional measurement method and system based on pixel coding |
| CN116753862A (en) * | 2023-05-24 | 2023-09-15 | 成都飞机工业（集团）有限责任公司 | Measurement system and differential scheduling detection method |
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