CN110964221A - 一种段节厚度编码的条形码纳米棒及其制备方法 - Google Patents

一种段节厚度编码的条形码纳米棒及其制备方法 Download PDF

Info

Publication number
CN110964221A
CN110964221A CN201911069145.6A CN201911069145A CN110964221A CN 110964221 A CN110964221 A CN 110964221A CN 201911069145 A CN201911069145 A CN 201911069145A CN 110964221 A CN110964221 A CN 110964221A
Authority
CN
China
Prior art keywords
poly
nanorod
thickness
section
segment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201911069145.6A
Other languages
English (en)
Other versions
CN110964221B (zh
Inventor
陈洪旭
李海东
程凤梅
陈超
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiaxing University
Original Assignee
Jiaxing University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jiaxing University filed Critical Jiaxing University
Priority to CN201911069145.6A priority Critical patent/CN110964221B/zh
Publication of CN110964221A publication Critical patent/CN110964221A/zh
Application granted granted Critical
Publication of CN110964221B publication Critical patent/CN110964221B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/06—Coating with compositions not containing macromolecular substances
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K19/00—Record carriers for use with machines and with at least a part designed to carry digital markings
    • G06K19/06—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
    • G06K19/06009—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code with optically detectable marking
    • G06K19/06037—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code with optically detectable marking multi-dimensional coding
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K19/00—Record carriers for use with machines and with at least a part designed to carry digital markings
    • G06K19/06—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
    • G06K19/06009—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code with optically detectable marking
    • G06K19/06046—Constructional details
    • G06K19/06084—Constructional details the marking being based on nanoparticles or microbeads
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K19/00—Record carriers for use with machines and with at least a part designed to carry digital markings
    • G06K19/06—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
    • G06K19/06009—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code with optically detectable marking
    • G06K19/06046—Constructional details
    • G06K19/06093—Constructional details the marking being constructed out of a plurality of similar markings, e.g. a plurality of barcodes randomly oriented on an object
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2301/00—Characterised by the use of cellulose, modified cellulose or cellulose derivatives
    • C08J2301/08—Cellulose derivatives
    • C08J2301/26—Cellulose ethers
    • C08J2301/28—Alkyl ethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2305/00—Characterised by the use of polysaccharides or of their derivatives not provided for in groups C08J2301/00 or C08J2303/00
    • C08J2305/04—Alginic acid; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2305/00—Characterised by the use of polysaccharides or of their derivatives not provided for in groups C08J2301/00 or C08J2303/00
    • C08J2305/08—Chitin; Chondroitin sulfate; Hyaluronic acid; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2325/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
    • C08J2325/02—Homopolymers or copolymers of hydrocarbons
    • C08J2325/04—Homopolymers or copolymers of styrene
    • C08J2325/06—Polystyrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
    • C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
    • C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C08J2327/16—Homopolymers or copolymers of vinylidene fluoride
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2327/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
    • C08J2327/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
    • C08J2327/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C08J2327/18—Homopolymers or copolymers of tetrafluoroethylene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2329/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Derivatives of such polymer
    • C08J2329/02—Homopolymers or copolymers of unsaturated alcohols
    • C08J2329/04—Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/02—Homopolymers or copolymers of acids; Metal or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2333/10—Homopolymers or copolymers of methacrylic acid esters
    • C08J2333/12—Homopolymers or copolymers of methyl methacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2333/14—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2339/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen; Derivatives of such polymers
    • C08J2339/04—Homopolymers or copolymers of monomers containing heterocyclic rings having nitrogen as ring member
    • C08J2339/08—Homopolymers or copolymers of vinyl-pyridine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2365/00—Characterised by the use of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2369/00—Characterised by the use of polycarbonates; Derivatives of polycarbonates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2377/00—Characterised by the use of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Derivatives of such polymers
    • C08J2377/04—Polyamides derived from alpha-amino carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/02—Polyamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2389/00—Characterised by the use of proteins; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2401/00—Characterised by the use of cellulose, modified cellulose or cellulose derivatives
    • C08J2401/08—Cellulose derivatives
    • C08J2401/26—Cellulose ethers
    • C08J2401/28—Alkyl ethers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2405/00—Characterised by the use of polysaccharides or of their derivatives not provided for in groups C08J2401/00 or C08J2403/00
    • C08J2405/04—Alginic acid; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2405/00—Characterised by the use of polysaccharides or of their derivatives not provided for in groups C08J2401/00 or C08J2403/00
    • C08J2405/08—Chitin; Chondroitin sulfate; Hyaluronic acid; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2425/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
    • C08J2425/02—Homopolymers or copolymers of hydrocarbons
    • C08J2425/04—Homopolymers or copolymers of styrene
    • C08J2425/06—Polystyrene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2427/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
    • C08J2427/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
    • C08J2427/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C08J2427/16—Homopolymers or copolymers of vinylidene fluoride
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2427/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers
    • C08J2427/02—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment
    • C08J2427/12—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C08J2427/18—Homopolymers or copolymers of tetrafluoroethylene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2429/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Derivatives of such polymer
    • C08J2429/02—Homopolymers or copolymers of unsaturated alcohols
    • C08J2429/04—Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/02—Homopolymers or copolymers of acids; Metal or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C08J2433/10—Homopolymers or copolymers of methacrylic acid esters
    • C08J2433/12—Homopolymers or copolymers of methyl methacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2433/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
    • C08J2433/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
    • C08J2433/14—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2439/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen; Derivatives of such polymers
    • C08J2439/04—Homopolymers or copolymers of monomers containing heterocyclic rings having nitrogen as ring member
    • C08J2439/08—Homopolymers or copolymers of vinyl-pyridine
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2465/00—Characterised by the use of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain; Derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2469/00—Characterised by the use of polycarbonates; Derivatives of polycarbonates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2477/00—Characterised by the use of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Derivatives of such polymers
    • C08J2477/04—Polyamides derived from alpha-amino carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2479/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2461/00 - C08J2477/00
    • C08J2479/02—Polyamines
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2489/00—Characterised by the use of proteins; Derivatives thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Laminated Bodies (AREA)

Abstract

本发明涉及一种段节厚度编码的条形码纳米棒及其制备方法，制备方法为：在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°；制得的一种段节厚度编码的条形码纳米棒为包含两个以上段节且至少一个段节的厚度不均匀的多段节纳米棒，不均匀即沿与多段节纳米棒长度方向垂直的方向递变。本发明的一种段节厚度编码的条形码纳米棒的制备方法简单易行，成本低廉，且可以批量制备；本发明的一种段节厚度编码的条形码纳米棒，至少一个段节的厚度不均匀，通过将形貌因素引入到纳米棒阵列中大大增加了其编码容量。

Description

一种段节厚度编码的条形码纳米棒及其制备方法
技术领域
本发明属于纳米编码材料技术领域，涉及一种段节厚度编码的条形码纳米棒及其制备方法。
背景技术
纳米编码材料由于自身大量的图案区分信息，从产品追踪到生物检测等方面都有重要的应用，也因此引起了人们的广泛关注。同超市里肉眼可见的黑白相间的产品标识码不同，纳米编码材料肉眼不可见，使得它可以用作贵重商品或重要材料的编码。纳米编码材料的广泛应用需要高的编码容量、低耗、高粒子产量和合适精确的检测体系，面对这些要求，很多的设计编码材料技术快速发展起来。其中，纳米棒由于其低花费、高产量、高长径比、易于制备和可以进行多种表面修饰等优点已经获得了广泛的关注，同球形条形码相比，条形码纳米棒因为自身长度的优势有利于增加编码容量和易于进行表面修饰，成为非常重要的一种结构。但是目前条形码纳米棒的构建主要是依赖氧化铝模板法，该方法仅可以沉积特定的金属，大大限制了其编码容量。
因此，研究一种增加条形码纳米棒的编码容量的方法具有十分重要的意义。
发明内容
本发明的目的为进一步提高条形码纳米棒的编码容量，提供一种段节厚度编码的条形码纳米棒及其制备方法。本发明首先制备递变厚度的多层膜，然后结合等离子体刻蚀技术制备纳米棒段节厚度递变的条形码纳米棒阵列，方法简单、成本低廉且可批量制备，大大增加了编码容量。
为达到上述目的，本发明采用的技术方案如下：
一种段节厚度编码的条形码纳米棒，为包含两个以上段节且至少一个段节的厚度不均匀的多段节纳米棒，不均匀即沿与多段节纳米棒长度方向垂直的方向递变(不均匀也可以是沿与多段节纳米棒长度方向垂直的方向先递增后递减，或先递减后递增等等，不均匀所参考的方向不必须为“与多段节纳米棒长度方向垂直的方向”，也可以为与多段节纳米棒长度方向呈锐角或钝角夹角的方向)。厚度不均匀，其形貌就不一样，形貌可以作为编码信息，假设形貌有m种，对于n段节的纳米棒而言，其编码容量为m的n次方。形貌越多，编码信息m就越多，编码容量就越大。
作为优选的技术方案：
如上所述的一种段节厚度编码的条形码纳米棒，厚度递变的段节的厚度递变方向相同或不同，厚度的递变方向不同，最后形貌中段节厚度的递变方向也会不同，厚度的递变方向不同可以是指厚度的递变方向相反，也可以是指厚度的递变方向成锐角、直角、钝角夹角。
如上所述的一种段节厚度编码的条形码纳米棒，各段节的材质选自于聚甲基丙烯酸羟乙酯、聚乙烯醇、聚对苯二甲酸乙二醇酯、聚二甲基硅氧烷、聚对二甲苯、光刻胶、光敏树脂、聚四氟乙烯、聚偏氟乙烯、聚乙烯、聚苯乙烯、聚碳酸酯、聚甲基丙烯酸甲酯、聚乙烯基亚胺、壳聚糖、海藻酸、透明质酸、明胶、胶原、聚L-赖氨酸、聚L-谷胺酸、羟丙基甲基纤维素、羟乙基纤维素、羧甲基纤维素、羧乙烯聚合物、聚丙烯酸、聚甲基丙烯酸、聚甲基丙烯酸乙二醇酯、聚乙二醇、聚丙三醇、聚(N-异丙基丙烯酰胺)、聚(N-正丙基丙烯酰胺)、聚(N-环丙基丙烯酰胺)、聚(N-异丙基甲基丙烯酰胺)、聚(N-乙基丙烯酰胺)、聚(N-(L)-(1-羟甲基)丙基甲基丙烯酰胺)、聚(4-乙烯吡啶)、聚[N-(2-甲基丙烯酰氧乙基)吡咯烷酮]、聚[N-(3-丙烯酰氧丙基)吡咯烷酮]、聚[N-(3-甲基丙烯酰氧丙基)吡咯烷酮]、聚[N-(2-丙烯酰氧丙基)吡咯烷酮]和聚[N-(1-甲基-2-丙烯酰氧乙基)吡咯烷酮]，其中，非相邻段节的材质可以相同或不同。
本发明还提供制备如上任一项所述的一种段节厚度编码的条形码纳米棒的方法，在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°，聚合物是溶液，具有流动性，当基底倾斜角度不为0°时在重力作用下会使其向下坡方向留，因此导致膜层厚度成梯度递变。
作为优选的技术方案：
如上所述的方法，构建采用胶体晶体刻蚀法，胶体晶体刻蚀法由于简单、低成本、通用性强等特点被广泛用于微纳图案的大面积制备。
如上所述的方法，构建过程为：首先采用旋涂法或滴涂法将不同的聚合物溶液在同一基底表面依次沉积成膜，控制上层采用的聚合物溶液中的溶剂不能溶解下层采用的聚合物溶液中的聚合物(目的是为了形成层层分明的结构，避免各层混为一体)，然后在多层聚合物膜表面组装聚苯乙烯微球或二氧化硅微球，最后利用苯乙烯微球或刻蚀后的二氧化硅微球为掩板刻蚀下面的多层聚合物膜制得多段节纳米棒阵列后释放，制得多段节纳米棒，其中，所述刻蚀是指将紧密堆积的二氧化硅微球刻蚀成非紧密堆积的阵列，当采用二氧化硅微球时，最终产品多段节纳米棒为圆柱形；当采用聚苯乙烯微球，最终产品多段节纳米棒为锥形棒。
上述的聚合物中，聚合物是薄膜态的，还可以将该聚合物薄膜作为基底，当其为基底时，基底可以被刻蚀成为多段节纳米棒的一个段节。
如上所述的方法，刻蚀采用等离子体刻蚀技术。
如上所述的方法，聚苯乙烯微球或二氧化硅微球的平均直径为300nm～3μm。
本发明通过在同一基底上制备出多种不同尺寸和递变厚度的纳米棒，且同一纳米棒上每个段节可以是固定的厚度也可以是递变的厚度，这种制备方法简单、低花费、可以批量制备，且通过将形貌因素引入到纳米棒阵列中大大增加了编码容量。
有益效果：
(1)本发明的一种段节厚度编码的条形码纳米棒的制备方法，简单易行，成本低廉，且可以批量制备；
(2)本发明的一种段节厚度编码的条形码纳米棒的制备方法，通过将形貌因素引入到纳米棒阵列中大大增加了其编码容量；
(3)本发明的一种段节厚度编码的条形码纳米棒的制备方法，可以通过调节旋涂或滴涂层数对聚合物纳米棒的段节数进行调节，从而增加编码容量；
(4)本发明的一种段节厚度编码的条形码纳米棒，至少一个段节的厚度不均匀，编码信息多，编码容量大。
附图说明
图1为本发明的多段节纳米棒的构建示意图；
其中，1-二氧化硅微球，2-聚合物a，3-聚合物b，4-基底。
具体实施方式
下面结合具体实施方式，进一步阐述本发明。应理解，这些实施例仅用于说明本发明而不用于限制本发明的范围。此外应理解，在阅读了本发明讲授的内容之后，本领域技术人员可以对本发明作各种改动或修改，这些等价形式同样落于本申请所附权利要求书所限定的范围。
实施例1
段节厚度编码的条形码纳米棒的制备方法，在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°；
多段节纳米棒采用胶体晶体刻蚀法构建，构建示意图如图1所示，具体过程为：首先采用旋涂法将聚合物b 3溶液和聚合物a 2溶液在同一基底4(基底为硅基底)表面依次交替沉积成膜，然后在六层聚合物膜表面组装二氧化硅微球1，接着将紧密堆积的二氧化硅微球采用等离子体刻蚀技术刻蚀成非紧密堆积的阵列，最后利用刻蚀后的二氧化硅微球(平均直径为400nm)为掩板刻蚀下面的六层聚合物膜制得多段节纳米棒阵列后释放，制得多段节纳米棒(一层聚合物膜即为一段节)，即为段节厚度编码的条形码纳米棒，其中，自下而上，六层聚合物膜中各层对应的聚合物、聚合物对应的溶剂、各层对应的基底相对于水平面的倾斜角度、各层的厚度递增的方向、各层的平均厚度的对比关系见下表。
Figure BDA0002260386490000041
实施例2
段节厚度编码的条形码纳米棒的制备方法，在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°；
多段节纳米棒采用胶体晶体刻蚀法构建，构建过程为：首先采用旋涂法将不同的聚合物溶液在同一基底(基底为硅基底)表面依次沉积成膜，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，然后在三层聚合物膜表面组装二氧化硅微球(平均直径为500nm)，接着将紧密堆积的二氧化硅微球采用等离子体刻蚀技术刻蚀成非紧密堆积的阵列，最后利用刻蚀后的二氧化硅微球为掩板，刻蚀下面的三层聚合物膜制得多段节纳米棒阵列后释放，制得多段节纳米棒(一层聚合物膜即为一段节)，即为段节厚度编码的条形码纳米棒，其中，自下而上，三层聚合物膜中各层对应的聚合物、聚合物对应的溶剂、各层对应的基底相对于水平面的倾斜角度、各层的厚度递增的方向、各层的平均厚度的对比关系见下表。
聚合物 溶剂 角度 方向 平均厚度
第一层(即最下层) 聚乙烯醇 水 0° —— 300nm
第二层 聚对二甲苯 氯仿 30° 水平向右 200nm
第三层 光刻胶 AZ4620中的溶剂 0° 水平向左 400nm
实施例3
段节厚度编码的条形码纳米棒的制备方法，在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°；
多段节纳米棒采用胶体晶体刻蚀法构建，构建过程为：首先采用旋涂法将不同的聚合物溶液在同一基底(基底为二氧化硅基底)表面依次沉积成膜，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，然后在三层聚合物膜表面组装二氧化硅微球，接着将紧密堆积的二氧化硅微球采用等离子体刻蚀技术刻蚀成非紧密堆积的阵列，最后利用刻蚀后的二氧化硅微球为掩板刻蚀下面的三层聚合物膜制得多段节纳米棒阵列后释放，制得多段节纳米棒(一层聚合物膜即为一段节)，即为段节厚度编码的条形码纳米棒，其中，自下而上，三层聚合物膜中各层对应的聚合物、聚合物对应的溶剂、各层对应的基底相对于水平面的倾斜角度、各层的厚度递增的方向、各层的平均厚度的对比关系见下表。
聚合物 溶剂 角度 方向 平均厚度
第一层(即最下层) 光刻胶 AZ5214中的溶剂 30° 水平向右 600nm
第二层 聚乙烯醇 水 10° 水平向右 100nm
第三层 光刻胶 AZ5214中的溶剂 0° 水平向左 300nm
实施例4
段节厚度编码的条形码纳米棒的制备方法，在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°；
多段节纳米棒采用胶体晶体刻蚀法构建，构建过程为：首先采用滴涂法将不同的聚合物溶液在同一基底(基底为聚四氟乙烯薄膜)表面依次沉积成膜，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，然后在四层聚合物膜表面组装二氧化硅微球(平均直径为1.5μm)，接着将紧密堆积的二氧化硅微球采用等离子体刻蚀技术刻蚀成非紧密堆积的阵列，最后利用刻蚀后的二氧化硅微球为掩板刻蚀下面的四层聚合物膜制得多段节纳米棒阵列后释放，制得多段节纳米棒(一层聚合物膜即为一段节)，即为段节厚度编码的条形码纳米棒，其中，自下而上，四层聚合物膜中各层对应的聚合物、聚合物对应的溶剂、各层对应的基底相对于水平面的倾斜角度、各层的厚度递增的方向、各层的平均厚度的对比关系见下表。
聚合物 溶剂 角度 方向 平均厚度
第一层(即基底) 聚四氟乙烯 —— 0° —— 300nm
第二层 聚偏氟乙烯 丙酮 30° 水平向右 400nm
第三层 壳聚糖 水 10° 水平向右 200nm
第四层 聚甲基丙烯酸羟乙酯 乙醇 0° 水平向左 150nm
实施例5
段节厚度编码的条形码纳米棒的制备方法，在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°；
多段节纳米棒采用胶体晶体刻蚀法构建，构建过程为：首先采用滴涂法将不同的聚合物溶液在同一基底(基底为聚对苯二甲酸乙二醇酯薄膜)表面依次沉积成膜，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，然后在六层聚合物膜表面组装二氧化硅微球(平均直径为400nm)，接着将紧密堆积的二氧化硅微球采用等离子体刻蚀技术刻蚀成非紧密堆积的阵列，最后利用刻蚀后的二氧化硅微球为掩板刻蚀下面的六层聚合物膜制得多段节纳米棒阵列后释放，制得多段节纳米棒(一层聚合物膜即为一段节)，即为段节厚度编码的条形码纳米棒，其中，自下而上，六层聚合物膜中各层对应的聚合物、聚合物对应的溶剂、各层对应的基底相对于水平面的倾斜角度、各层的厚度递增的方向、各层的平均厚度的对比关系见下表。
Figure BDA0002260386490000061
实施例6
段节厚度编码的条形码纳米棒的制备方法，在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°；
多段节纳米棒采用胶体晶体刻蚀法构建，构建过程为：首先采用旋涂法将不同的聚合物溶液在同一基底(基底为硅基底)表面依次沉积成膜，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，然后在十一层聚合物膜表面组装二氧化硅微球(平均直径为1μm)，接着将紧密堆积的二氧化硅微球采用等离子体刻蚀技术刻蚀成非紧密堆积的阵列，最后利用刻蚀后的二氧化硅微球为掩板刻蚀下面的十一层聚合物膜制得多段节纳米棒阵列后释放，制得多段节纳米棒(一层聚合物膜即为一段节)，即为段节厚度编码的条形码纳米棒，其中，自下而上，十一层聚合物膜中各层对应的聚合物、聚合物对应的溶剂、各层对应的基底相对于水平面的倾斜角度、各层的厚度递增的方向、各层的平均厚度的对比关系见下表。
Figure BDA0002260386490000062
Figure BDA0002260386490000071
实施例7
段节厚度编码的条形码纳米棒的制备方法，在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°；
多段节纳米棒采用胶体晶体刻蚀法构建，构建过程为：首先采用旋涂法将不同的聚合物溶液在同一基底(基底为硅基底)表面依次沉积成膜)表面依次沉积成膜，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，然后在六层聚合物膜表面组装二氧化硅微球(平均直径为550nm)，接着将紧密堆积的二氧化硅微球采用等离子体刻蚀技术刻蚀成非紧密堆积的阵列，最后利用刻蚀后的二氧化硅微球为掩板刻蚀下面的六层聚合物膜制得多段节纳米棒阵列后释放，制得多段节纳米棒(一层聚合物膜即为一段节)，即为段节厚度编码的条形码纳米棒，其中，自下而上，六层聚合物膜中各层对应的聚合物、聚合物对应的溶剂、各层对应的基底相对于水平面的倾斜角度、各层的厚度递增的方向、各层的平均厚度的对比关系见下表。
Figure BDA0002260386490000072
Figure BDA0002260386490000081
实施例8
段节厚度编码的条形码纳米棒的制备方法，在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°；
多段节纳米棒采用胶体晶体刻蚀法构建，构建过程为：首先采用滴涂法将不同的聚合物溶液在同一基底(基底为石英基底)表面依次沉积成膜，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，然后在六层聚合物膜表面组装二氧化硅微球(平均直径为2.5μm)，接着将紧密堆积的二氧化硅微球采用等离子体刻蚀技术刻蚀成非紧密堆积的阵列，最后利用刻蚀后的二氧化硅微球为掩板刻蚀下面的六层聚合物膜制得多段节纳米棒阵列后释放，制得多段节纳米棒(一层聚合物膜即为一段节)，即为段节厚度编码的条形码纳米棒，其中，自下而上，六层聚合物膜中各层对应的聚合物、聚合物对应的溶剂、各层对应的基底相对于水平面的倾斜角度、各层的厚度递增的方向、各层的平均厚度的对比关系见下表。
Figure BDA0002260386490000082
实施例9
段节厚度编码的条形码纳米棒的制备方法，在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°；
多段节纳米棒采用胶体晶体刻蚀法构建，构建过程为：首先采用滴涂法将不同的聚合物溶液在同一基底(基底为硅基底)表面依次沉积成膜，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，然后在十层聚合物膜表面组装二氧化硅微球(平均直径为1μm)，接着将紧密堆积的二氧化硅微球采用等离子体刻蚀技术刻蚀成非紧密堆积的阵列，最后利用刻蚀后的二氧化硅微球为掩板刻蚀下面的十层聚合物膜制得多段节纳米棒阵列后释放，制得多段节纳米棒(一层聚合物膜即为一段节)，即为段节厚度编码的条形码纳米棒，其中，自下而上，十层聚合物膜中各层对应的聚合物、聚合物对应的溶剂、各层对应的基底相对于水平面的倾斜角度、各层的厚度递增的方向、各层的平均厚度的对比关系见下表。
Figure BDA0002260386490000091
实施例10
段节厚度编码的条形码纳米棒的制备方法，基本同实施例3，不同之处在于沉积该不同的聚合物膜，控制基底相对于水平面倾斜一定的角度时，聚乙烯醇的厚度递增方向与光刻胶的段节递增方向之间的夹角不为0，该夹角为60°。
实施例11
段节厚度编码的条形码纳米棒的制备方法，在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°；
多段节纳米棒采用胶体晶体刻蚀法构建，构建过程为：首先采用滴涂法将不同的聚合物溶液在同一基底(基底为硅基底)表面依次沉积成膜，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，然后在五层聚合物膜表面组装聚苯乙烯微球(平均直径为2μm)，最后利用聚苯乙烯微球为掩板刻蚀下面的五层聚合物膜制得多段节纳米棒阵列后释放，制得多段节纳米棒(一层聚合物膜即为一段节)，即为段节厚度编码的条形码纳米棒，其中，自下而上，五层聚合物膜中各层对应的聚合物、聚合物对应的溶剂、各层对应的基底相对于水平面的倾斜角度、各层的厚度递增的方向、各层的平均厚度的对比关系见下表。
Figure BDA0002260386490000101
实施例12
段节厚度编码的条形码纳米棒的制备方法，在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°；
多段节纳米棒采用胶体晶体刻蚀法构建，构建过程为：首先采用旋涂法将不同的聚合物溶液在同一基底(基底为硅基底)表面依次沉积成膜，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，然后在九层聚合物膜表面组装聚苯乙烯微球(平均直径为3μm)，接着将紧密堆积的聚苯乙烯微球采用等离子体刻蚀技术刻蚀成非紧密堆积的阵列，最后利用聚苯乙烯微球为掩板刻蚀下面的九层聚合物膜制得多段节纳米棒阵列后释放，制得多段节纳米棒(一层聚合物膜即为一段节)，即为段节厚度编码的条形码纳米棒，其中，自下而上，九层聚合物膜中各层对应的聚合物、聚合物对应的溶剂、各层对应的基底相对于水平面的倾斜角度、各层的厚度递增的方向、各层的平均厚度的对比关系见下表。
Figure BDA0002260386490000102
Figure BDA0002260386490000111
实施例13
段节厚度编码的条形码纳米棒的制备方法，基本同实施例1，不同之处在于将聚苯乙烯溶液(溶剂为甲苯)替换为光敏树脂(溶剂为丙酮)。
实施例14
段节厚度编码的条形码纳米棒的制备方法，基本同实施例9，不同之处在于将聚(N-乙基丙烯酰胺)溶液(溶剂为乙醇)替换为聚(N-(L)-(1-羟甲基)丙基甲基丙烯酰胺)(溶剂为乙醇)。
实施例15
段节厚度编码的条形码纳米棒的制备方法，基本同实施例9，不同之处在于将聚[N-(2-丙烯酰氧丙基)吡咯烷酮]溶液(溶剂为N，N-二甲基甲酰胺)替换为聚[N-(1-甲基-2-丙烯酰氧乙基)吡咯烷酮](溶剂为N，N-二甲基甲酰胺)。
实施例16
段节厚度编码的条形码纳米棒的制备方法，基本同实施例9，不同之处在于将聚[N-(2-丙烯酰氧丙基)吡咯烷酮]溶液(溶剂为N，N-二甲基甲酰胺)替换为聚[N-(2-甲基丙烯酰氧乙基)吡咯烷酮](溶剂为N，N-二甲基甲酰胺)。
实施例17
段节厚度编码的条形码纳米棒的制备方法，基本同实施例2，不同之处在于将聚乙烯醇(溶剂为水)替换为聚乙二醇(溶剂为乙醇)。
实施例18
段节厚度编码的条形码纳米棒的制备方法，基本同实施例1，不同之处在于将聚苯乙烯溶液(溶剂为甲苯)替换为聚乙烯(溶剂为甲苯)。
实施例19
段节厚度编码的条形码纳米棒的制备方法，基本同实施例11，不同之处在于将羧甲基纤维素溶液(溶剂为水)替换为羟乙基纤维素(溶剂为水)。

Claims (8)

1.一种段节厚度编码的条形码纳米棒，其特征是：为包含两个以上段节且至少一个段节的厚度不均匀的多段节纳米棒，不均匀即沿与多段节纳米棒长度方向垂直的方向递变。
2.根据权利要求1所述的一种段节厚度编码的条形码纳米棒，其特征在于，厚度递变的段节的厚度递变方向相同或不同。
3.根据权利要求1所述的一种段节厚度编码的条形码纳米棒，其特征在于，各段节的材质选自于聚甲基丙烯酸羟乙酯、聚乙烯醇、聚对苯二甲酸乙二醇酯、聚二甲基硅氧烷、聚对二甲苯、光刻胶、光敏树脂、聚偏氟乙烯、聚乙烯、聚苯乙烯、聚碳酸酯、聚四氟乙烯、聚甲基丙烯酸甲酯、聚乙烯基亚胺、壳聚糖、海藻酸、透明质酸、明胶、胶原、聚L-赖氨酸、聚L-谷胺酸、羟丙基甲基纤维素、羟乙基纤维素、羧甲基纤维素、羧乙烯聚合物、聚丙烯酸、聚甲基丙烯酸、聚甲基丙烯酸乙二醇酯、聚乙二醇、聚丙三醇、聚(N-异丙基丙烯酰胺)、聚(N-正丙基丙烯酰胺)、聚(N-环丙基丙烯酰胺)、聚(N-异丙基甲基丙烯酰胺)、聚(N-乙基丙烯酰胺)、聚(N-(L)-(1-羟甲基)丙基甲基丙烯酰胺)、聚(4-乙烯吡啶)、聚[N-(2-甲基丙烯酰氧乙基)吡咯烷酮]、聚[N-(3-丙烯酰氧丙基)吡咯烷酮]、聚[N-(3-甲基丙烯酰氧丙基)吡咯烷酮]、聚[N-(2-丙烯酰氧丙基)吡咯烷酮]和聚[N-(1-甲基-2-丙烯酰氧乙基)吡咯烷酮]。
4.制备如权利要求1～3任一项所述的一种段节厚度编码的条形码纳米棒的方法，其特征是：在构建多段节纳米棒的过程中，每沉积一层聚合物膜时，控制基底相对于水平面倾斜一定的角度，基底倾斜的角度不全为0°。
5.根据权利要求4所述的方法，其特征在于，构建采用胶体晶体刻蚀法。
6.根据权利要求5所述的方法，其特征在于，构建过程为：首先采用旋涂法或滴涂法将不同的聚合物溶液在同一基底表面依次沉积成膜，控制上层采用的聚合物溶液中的溶剂不能溶解下层采用的聚合物溶液中的聚合物，然后在多层聚合物膜表面组装聚苯乙烯微球或二氧化硅微球，最后利用苯乙烯微球或刻蚀后的二氧化硅微球为掩板刻蚀下面的多层聚合物膜制得多段节纳米棒阵列后释放，制得多段节纳米棒，其中，所述刻蚀是指将紧密堆积的二氧化硅微球刻蚀成非紧密堆积的阵列。
7.根据权利要求6所述的方法，其特征在于，刻蚀采用等离子体刻蚀技术。
8.根据权利要求7所述的方法，其特征在于，聚苯乙烯微球或二氧化硅微球的平均直径为300nm～3μm。
CN201911069145.6A 2019-11-05 2019-11-05 一种段节厚度编码的条形码纳米棒及其制备方法 Active CN110964221B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201911069145.6A CN110964221B (zh) 2019-11-05 2019-11-05 一种段节厚度编码的条形码纳米棒及其制备方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201911069145.6A CN110964221B (zh) 2019-11-05 2019-11-05 一种段节厚度编码的条形码纳米棒及其制备方法

Publications (2)

Publication Number Publication Date
CN110964221A true CN110964221A (zh) 2020-04-07
CN110964221B CN110964221B (zh) 2021-07-30

Family

ID=70030123

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201911069145.6A Active CN110964221B (zh) 2019-11-05 2019-11-05 一种段节厚度编码的条形码纳米棒及其制备方法

Country Status (1)

Country Link
CN (1) CN110964221B (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111777716A (zh) * 2020-06-01 2020-10-16 东南大学 一种聚苯乙烯纳米棒的制备方法
CN114005912A (zh) * 2021-10-29 2022-02-01 嘉兴学院 一种椭圆纳米棒、发光二极管的制备方法及显示装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102633230A (zh) * 2012-04-26 2012-08-15 厦门大学 一种基于纳米球刻蚀技术制备硅纳米柱阵列的方法
US20170228629A1 (en) * 2014-06-10 2017-08-10 Sicpa Holding Sa Substrate with a fragmented marking thereon
CN109311208A (zh) * 2016-07-21 2019-02-05 沙特基础工业全球技术有限公司 多层身份制品和制造其的方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102633230A (zh) * 2012-04-26 2012-08-15 厦门大学 一种基于纳米球刻蚀技术制备硅纳米柱阵列的方法
US20170228629A1 (en) * 2014-06-10 2017-08-10 Sicpa Holding Sa Substrate with a fragmented marking thereon
CN109311208A (zh) * 2016-07-21 2019-02-05 沙特基础工业全球技术有限公司 多层身份制品和制造其的方法

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
HONGXU CHEN ET AL.: "Ag nanoparticle/polymer composite barcode nanorods", 《NANO RESEARCH》 *
XIAO LI ET AL.: "Controlled Fabrication of Fluorescent Barcode Nanorods", 《ACSNANO》 *
陈洪旭: "聚合物多层微纳结构的构筑及其功能化", 《中国博士学位论文全文数据库 工程科技Ⅰ辑（电子期刊）》 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111777716A (zh) * 2020-06-01 2020-10-16 东南大学 一种聚苯乙烯纳米棒的制备方法
CN111777716B (zh) * 2020-06-01 2022-07-26 东南大学 一种聚苯乙烯纳米棒的制备方法
CN114005912A (zh) * 2021-10-29 2022-02-01 嘉兴学院 一种椭圆纳米棒、发光二极管的制备方法及显示装置
CN114005912B (zh) * 2021-10-29 2023-08-11 嘉兴学院 一种椭圆纳米棒、发光二极管的制备方法及显示装置

Also Published As

Publication number Publication date
CN110964221B (zh) 2021-07-30

Similar Documents

Publication Publication Date Title
Yabu Fabrication of honeycomb films by the breath figure technique and their applications
CN110964221B (zh) 一种段节厚度编码的条形码纳米棒及其制备方法
Zhang et al. Patterning colloidal crystals and nanostructure arrays by soft lithography
KR100898255B1 (ko) 하드 코트 필름 및 광학기능성 필름
Liu et al. Investigation of polystyrene-based microspheres from different copolymers and their structural color coatings on wood surface
KR100800971B1 (ko) 향상된 치수안정성의 광학용 용융압출 플라스틱 시트 및이를 포함하고 있는 액정 디바이스 윈도우
CN101784918B (zh) 表面粗糙度均匀性良好的光扩散膜及其制造方法
TW201434633A (zh) 積層體及使用該積層體之透明導電性膜
CN113088182B (zh) 抗指纹高硬度可弯折低收缩uv硬化液的配方、制备方法
KR102102612B1 (ko) 경화 온도에 따라 표면 구조 조절이 가능한 다공성 필름의 제조방법
CN103163571A (zh) 光学膜及其制造方法
CN110878147B (zh) 一种多段节条形码纳米棒及其制备方法
CN104194014B (zh) 具有电场响应亲疏水变化的聚苯胺针垫阵列薄膜及其制备方法
CN110246607B (zh) 一种高透光率高结合强度的柔性透明导电薄膜及其制备方法和应用
Okubo et al. Kinetic aspects in the drying dissipative crack patterns of colloidal crystals
Li et al. Two-dimensional colloidal crystal of soft microgel spheres: Development, preparation and applications
CN101880431A (zh) 纳米分子印迹聚合物薄膜的原位制备方法和应用
Yanagishita et al. Effect of Fine Structures Formed by Nanoimprinting Using Anodic Porous Alumina Mold on Surface Hydrophobicity
Huang et al. Pitch control of hexagonal non-close-packed nanosphere arrays using isotropic deformation of an elastomer
CN101870772B (zh) 一种具有周期性纳米结构的高分子膜的制备方法及所用模板
Okubo et al. Drying dissipative patterns of colloidal crystals of silica spheres in organic solvents
De France Chiral nematic cellulose nanocrystal composites: An organized review
CN111483971B (zh) 一种二轴对称多孔腔状阵列结构及其制备方法
TW201934626A (zh) 三維有序多孔微結構的製造方法以及由此方法所製成的整體柱
CN103163686A (zh) 双光轴相位差膜及其制造方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant