CN1108626A - 铸铁搪瓷一次性烧成瓷釉 - Google Patents
铸铁搪瓷一次性烧成瓷釉 Download PDFInfo
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- CN1108626A CN1108626A CN 94116238 CN94116238A CN1108626A CN 1108626 A CN1108626 A CN 1108626A CN 94116238 CN94116238 CN 94116238 CN 94116238 A CN94116238 A CN 94116238A CN 1108626 A CN1108626 A CN 1108626A
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- 210000003298 dental enamel Anatomy 0.000 title claims abstract description 44
- 229910001018 Cast iron Inorganic materials 0.000 title claims abstract description 15
- 238000010304 firing Methods 0.000 claims abstract description 13
- 239000000203 mixture Substances 0.000 claims abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims description 5
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 claims description 4
- 239000011734 sodium Substances 0.000 claims description 4
- 229910052810 boron oxide Inorganic materials 0.000 claims description 3
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 3
- 239000004408 titanium dioxide Substances 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 claims description 2
- 229910001947 lithium oxide Inorganic materials 0.000 claims description 2
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 claims description 2
- 229910001950 potassium oxide Inorganic materials 0.000 claims description 2
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims description 2
- 229910001948 sodium oxide Inorganic materials 0.000 claims description 2
- 229910010413 TiO 2 Inorganic materials 0.000 claims 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 1
- 239000000919 ceramic Substances 0.000 abstract description 5
- 230000000694 effects Effects 0.000 abstract description 4
- 239000002994 raw material Substances 0.000 abstract description 4
- 238000009472 formulation Methods 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 229910007266 Si2O Inorganic materials 0.000 abstract 1
- 229910003082 TiO2-SiO2 Inorganic materials 0.000 abstract 1
- 239000012752 auxiliary agent Substances 0.000 abstract 1
- 229910052681 coesite Inorganic materials 0.000 abstract 1
- 229910052906 cristobalite Inorganic materials 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 229910052682 stishovite Inorganic materials 0.000 abstract 1
- 229910052905 tridymite Inorganic materials 0.000 abstract 1
- 238000000034 method Methods 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000010953 base metal Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- -1 guarantees physics Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000003317 industrial substance Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2207/00—Compositions specially applicable for the manufacture of vitreous enamels
- C03C2207/06—Compositions specially applicable for the manufacture of vitreous enamels for cast iron
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
本发明公开了一种铸铁搪瓷一次性烧成的瓷釉，它利用R2O-B2O3-TiO2-SiO2配方系统代替传统的R2O-B2O3-Sb2O3-SiO2配方系统，利用Ti2O乳浊性能好的特点，并降低Si2O含量，提高B2O3的含量，利用R2O的混合碱效应并辅以Al2O3，P2O5作助剂提高系统的密着力，从而使本发明具备一次性瓷釉的特点，大大降低了原料，能源的消耗，简化了生产工艺。
Description
本发明涉及到一次性烧成的铸铁搪瓷瓷釉。
我们知道，硅酸盐铸铁搪瓷瓷釉大都采用的是R2O-B2O3-Sb2O3-SiO2系统，这里的R2O指的是碱金属氧化物。即易熔的锑面釉。该类面釉一般需要多次干撒在红热的底釉坯上，通过相应次数在820℃～880℃之间烧成。为了达到预期效果，铸铁搪瓷传统的工艺一般需要两种相互匹配的瓷釉-底釉和面釉，至少通过两次烧成来保证制品的良好密着和良好外观，以及其它方面的化学性能。一般来说，两次烧成的工艺繁复，工人劳动强度大，能源消耗大，同时，两次烧成的铸铁成分有变化，杂质氧化后易产生多种缺陷。
本发明的目的在于提供一种铸铁搪瓷一次性烧成的瓷釉以简化两次烧成工艺，降低能耗，节约原料。
本发明的目的是通过如下配方的组合物系统来实现的。该系统主要包括碱金属氧化物R2O，氧化硼B2O3，二氧化钛TiO2和氧化硅SiO2。该系统组合的原理是：SiO2成分充当基体形成剂，保证瓷釉要求的物理、化学性能，B2O3大大降低瓷釉熔体的表面张力，加强瓷釉同铸铁的密着性能，R2O则可破坏SiO2的四面体网络，使整个系统有个合适的低共熔点，同时调整瓷釉的酸碱度，为瓷釉的光泽度提供保证。这样通过合适的配比使瓷釉具有较低的表面张力和较低的烧成温度，在具有良好密着性能的基础上，再配以TiO2，作为乳浊剂，它能保证使用时比Sb2O3作为乳浊剂具有更好的遮盖能力，故而该瓷釉具备了一次性瓷釉的特征，从而省去了传统工艺中为产生密着层而进行的搪烧底釉这一系列工艺，变二次烧成为一次烧成。
各组分在R2O-B2O3-TiO2-SiO2组成的系统的重量比：
SiO2：41.46～48.78% B2O3：17.07～21.95%
TiO2：10.61～13.54% R2O：20.12～26.46%
以上配比中：SiO2量比传统配方略低，因为SiO2量越高，其表面张力越高，密着性越差，同时烧成温度也高。但过低会使整个瓷釉丧失机械强度和化学稳定性，因此确定其重量比在41.46～48.78%之间。
B2O3能显著降低表面张力，改善密着，提高光泽，同时在此系统中其量在一定范围内又能做瓷釉基体剂，因此在该系统中用量较大，占重17.07～21.95%之间。
作为强乳浊剂的TiO2，它的引入主要是加强瓷釉对铸铁遮盖力，但它对密着不利，因此在一次釉中，TiO2在乳浊达标情况下，用量越低越好，因此其范围定在10.61～13.54%之间，比传统面釉乳浊剂含量低得多。
R2O一般是一价碱金属氧化物的总称，本系统中主要采用氧化锂Li2、氧化钠Na2O，氧化钾K2O的混合物，它们之间的摩尔比是：Na2O∶K2O∶Li2O＝4∶2∶1。这主要是利用“混合碱效应”来显著降低烧成温度并改善系统的化学稳定性，使其具有更好的光泽度。
另外，本组分系统还可外加入占系统总重量2.1～5.5%的氧化铝Al2O3，它可控制高温下瓷釉粘度，使烧成工艺易于控制。
此外，本组分系统还可外加入占系统总重量4.27～6.70的五氧化二磷P2O5，它一方面可以降低瓷釉表面张力，另一方面稳定TiO2析晶，使TiO2乳浊效果更佳。
该瓷釉的制作及使用过程如下：
将合格的各种所需的化工原料和矿物原料按配方称量，充分混合后，送入温度为1250℃～1400℃的窑炉进行熔制，待炉内高温熔体抽丝无结后，即可出炉淬碎成瓷釉熔块，熔块干燥后，将其与粘土、水相应色素等混合研磨至适当的细度和容重的釉浆，然后通过喷涂或人工涂施等方式将釉浆均匀地施涂在业已表面处理过的铸铁铁坯上，干燥后即进入温度为660℃～750℃的窑炉中烧成4-7分钟，出炉冷却后即得一次性烧成的铸铁搪瓷制品。
同现有技术比较，本发明为一次性烧成的瓷釉，因而比传统的搪烧工艺省略一半过程，一方面减轻了劳动强度，节约原料，另一方面也减少了制品在生产过程中各类运输带来的机械性损伤。本发明使得烧成温度降低了一百摄氏度，降低了能耗，另外也大大克服了传统的二次烧成中所产生的气体类缺陷。由此瓷釉及配套工艺生产出的产品成本得以降低。
下面通过实施例对发明作进一步描述。
首先选用如下四组配方，各个配方的组分均为重量百分比：
A B C D
SiO241.05 48.70 43.92 46.08
B2O320.95 19.87 18.64 21.05
R2O 24.03 19.82 26.46 20.11
TiO213.52 11.62 10.98 12.76
外引入
Al2O32.83 2.20 5.49 3.21
P2O54.50 6.57 5.98 4.96
其中R2O选用Na2，K2O，Li2O，组成混合碱，三种物质摩尔比在A、B、C、D中均基本按4∶2∶1进行搭配。
将以上的配方按如下工艺生产并使用于铸铁上
原料称量-混合-均匀度测试-熔制-淬碎-干燥成熔块-研磨-施涂在表面处理过的铸铁坯上-烘干-烧成-冷却-附加工序完成-制品。
将以上制品利用如下的试验方法检验
①密着性能：将100g钢球置于制品上方1.5m自由落下，视其掉瓷处情况，一般地丝状、网状为合格;
②光泽度：利用陶瓷光泽计测量，测量值不低于95;
③白度：利用陶瓷白度计测量，测量值不低于72;
Claims (4)
1、铸铁搪瓷一次烧成瓷釉，该瓷釉的配方主要包括：碱金属氧化物R2O，氧化硼B2O3，二氧化钛TiO2，氧化硅SiO2，其特征在于：
各组分在R2O-B2O3-TiO2-SiO2组成的系统中的重量百分比是：
氧化硅SiO2：41.46-48.78%
氧化硼B2O3：17.07-21.95%
二氧化钛TiO2：10.61-13.54%
碱金属氧化物R2O：20.12-26.46%。
2、根据权利要求1所述的瓷釉，其特征还在于：
碱金属氧化物R2O，主要采用，氧化钠Na2O，氧化钾K2O，氧化锂Li2O的混合物，它们之间的摩尔比是4∶2∶1。
3、根据权利要求1所述的瓷釉，其特征还在于：还可外加入占R2O-B2O3-TiO2-SiO2总重量2.1-5.5%的氧化铝;
4、根据权利要求1所述的瓷釉，其特征还在于：还可外加入占R2O-B2O3-TiO2-SiO2总重量4.27-6.70%的五氧化二磷。
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| Application Number | Priority Date | Filing Date | Title |
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| CN 94116238 CN1108626A (zh) | 1994-09-24 | 1994-09-24 | 铸铁搪瓷一次性烧成瓷釉 |
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| Application Number | Priority Date | Filing Date | Title |
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| CN 94116238 CN1108626A (zh) | 1994-09-24 | 1994-09-24 | 铸铁搪瓷一次性烧成瓷釉 |
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| Publication Number | Publication Date |
|---|---|
| CN1108626A true CN1108626A (zh) | 1995-09-20 |
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| CN 94116238 Pending CN1108626A (zh) | 1994-09-24 | 1994-09-24 | 铸铁搪瓷一次性烧成瓷釉 |
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1314610C (zh) * | 2003-01-22 | 2007-05-09 | 王强 | 超强度搪瓷黑板、白板的制造方法及其搪瓷釉料 |
| CN101139167B (zh) * | 2007-08-06 | 2010-09-15 | 江阴硅普搪瓷有限公司 | 低温密着强度高烧成幅度宽的搪玻璃底釉 |
| CN102898119A (zh) * | 2012-10-10 | 2013-01-30 | 福建省德化县永德信陶瓷有限责任公司 | 低温一次烧成环保陶瓷 |
| CN105924009A (zh) * | 2016-04-25 | 2016-09-07 | 福建省德化汇远陶瓷有限公司 | 一次烧成的低温釉及具有该釉料瓷器的制作工艺 |
| CN111606566A (zh) * | 2019-02-22 | 2020-09-01 | Lg电子株式会社 | 搪瓷组合物、制备搪瓷组合物的方法和烹饪用具 |
| US11261124B2 (en) | 2018-10-31 | 2022-03-01 | Lg Electronics Inc. | Enamel composition and method of preparing the same |
| US11274060B2 (en) | 2019-02-22 | 2022-03-15 | Lg Electronics Inc. | Enamel composition, method for preparing enamel composition, and cooking appliance |
| US11292743B2 (en) | 2018-11-09 | 2022-04-05 | Lg Electronics Inc. | Enamel composition, method of preparing same, and cooking appliance |
| US11401201B2 (en) | 2019-02-22 | 2022-08-02 | Lg Electronics Inc. | Enamel composition, method for preparing enamel composition, and cooking appliance |
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| US11773007B2 (en) | 2019-02-22 | 2023-10-03 | Lg Electronics Inc. | Enamel composition, method for preparing enamel composition, and cooking appliance |
| US11780766B2 (en) | 2019-02-22 | 2023-10-10 | Lg Electronics Inc. | Enamel composition, method for preparing enamel composition, and cooking appliance |
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-
1994
- 1994-09-24 CN CN 94116238 patent/CN1108626A/zh active Pending
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1314610C (zh) * | 2003-01-22 | 2007-05-09 | 王强 | 超强度搪瓷黑板、白板的制造方法及其搪瓷釉料 |
| CN101139167B (zh) * | 2007-08-06 | 2010-09-15 | 江阴硅普搪瓷有限公司 | 低温密着强度高烧成幅度宽的搪玻璃底釉 |
| CN102898119A (zh) * | 2012-10-10 | 2013-01-30 | 福建省德化县永德信陶瓷有限责任公司 | 低温一次烧成环保陶瓷 |
| CN102898119B (zh) * | 2012-10-10 | 2015-04-15 | 福建省德化县永德信陶瓷有限责任公司 | 低温一次烧成环保陶瓷 |
| CN105924009A (zh) * | 2016-04-25 | 2016-09-07 | 福建省德化汇远陶瓷有限公司 | 一次烧成的低温釉及具有该釉料瓷器的制作工艺 |
| US11261124B2 (en) | 2018-10-31 | 2022-03-01 | Lg Electronics Inc. | Enamel composition and method of preparing the same |
| US11292743B2 (en) | 2018-11-09 | 2022-04-05 | Lg Electronics Inc. | Enamel composition, method of preparing same, and cooking appliance |
| US11274060B2 (en) | 2019-02-22 | 2022-03-15 | Lg Electronics Inc. | Enamel composition, method for preparing enamel composition, and cooking appliance |
| CN111606566A (zh) * | 2019-02-22 | 2020-09-01 | Lg电子株式会社 | 搪瓷组合物、制备搪瓷组合物的方法和烹饪用具 |
| CN111606566B (zh) * | 2019-02-22 | 2022-07-26 | Lg电子株式会社 | 搪瓷组合物、制备搪瓷组合物的方法和烹饪用具 |
| US11396472B2 (en) | 2019-02-22 | 2022-07-26 | Lg Electronics Inc. | Enamel composition, method for preparing enamel composition, and cooking appliance |
| US11401201B2 (en) | 2019-02-22 | 2022-08-02 | Lg Electronics Inc. | Enamel composition, method for preparing enamel composition, and cooking appliance |
| US11479500B2 (en) | 2019-02-22 | 2022-10-25 | Lg Electronics Inc. | Enamel composition, method for preparing enamel composition, and cooking appliance |
| US11773007B2 (en) | 2019-02-22 | 2023-10-03 | Lg Electronics Inc. | Enamel composition, method for preparing enamel composition, and cooking appliance |
| US11780766B2 (en) | 2019-02-22 | 2023-10-10 | Lg Electronics Inc. | Enamel composition, method for preparing enamel composition, and cooking appliance |
| US12006257B2 (en) | 2019-02-22 | 2024-06-11 | Lg Electronics Inc. | Enamel composition, method for preparing enamel composition, and cooking appliance |
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