CN110709980A - 具有提高的生产量和加工灵活性的cmp机器 - Google Patents
具有提高的生产量和加工灵活性的cmp机器 Download PDFInfo
- Publication number
- CN110709980A CN110709980A CN201880031946.0A CN201880031946A CN110709980A CN 110709980 A CN110709980 A CN 110709980A CN 201880031946 A CN201880031946 A CN 201880031946A CN 110709980 A CN110709980 A CN 110709980A
- Authority
- CN
- China
- Prior art keywords
- carrier head
- substrate
- rotation
- platen
- support
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 86
- 230000008569 process Effects 0.000 title claims abstract description 70
- 239000000758 substrate Substances 0.000 claims abstract description 54
- 239000000126 substance Substances 0.000 claims abstract description 11
- 239000012528 membrane Substances 0.000 claims description 37
- 238000012545 processing Methods 0.000 claims description 31
- 238000005498 polishing Methods 0.000 claims description 27
- 230000001360 synchronised effect Effects 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 81
- 238000005516 engineering process Methods 0.000 description 18
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- 238000006073 displacement reaction Methods 0.000 description 5
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 230000001143 conditioned effect Effects 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229920002943 EPDM rubber Polymers 0.000 description 2
- 230000000712 assembly Effects 0.000 description 2
- 238000000429 assembly Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
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- 229920001971 elastomer Polymers 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
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- 235000012239 silicon dioxide Nutrition 0.000 description 2
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- 229920003051 synthetic elastomer Polymers 0.000 description 2
- 239000005061 synthetic rubber Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
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- 210000002310 elbow joint Anatomy 0.000 description 1
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- 239000011521 glass Substances 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
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- 238000012423 maintenance Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
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- 239000012858 resilient material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- 229920002725 thermoplastic elastomer Polymers 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
- B24B37/32—Retaining rings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/0023—Other grinding machines or devices grinding machines with a plurality of working posts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/033—Other grinding machines or devices for grinding a surface for cleaning purposes, e.g. for descaling or for grinding off flaws in the surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
- B24B37/105—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement
- B24B37/107—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping the workpieces or work carriers being actively moved by a drive, e.g. in a combined rotary and translatory movement in a rotary movement only, about an axis being stationary during lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/12—Lapping plates for working plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B51/00—Arrangements for automatic control of a series of individual steps in grinding a workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762602538P | 2017-04-26 | 2017-04-26 | |
US62/602,538 | 2017-04-26 | ||
PCT/US2018/026590 WO2018200165A1 (en) | 2017-04-26 | 2018-04-06 | Cmp machine with improved throughput and process flexibility |
Publications (1)
Publication Number | Publication Date |
---|---|
CN110709980A true CN110709980A (zh) | 2020-01-17 |
Family
ID=63915835
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201880031946.0A Pending CN110709980A (zh) | 2017-04-26 | 2018-04-06 | 具有提高的生产量和加工灵活性的cmp机器 |
Country Status (6)
Country | Link |
---|---|
US (2) | US20180311784A1 (ja) |
EP (1) | EP3616237A4 (ja) |
JP (3) | JP7094983B2 (ja) |
KR (2) | KR20240110657A (ja) |
CN (1) | CN110709980A (ja) |
WO (1) | WO2018200165A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022526214A (ja) | 2019-02-14 | 2022-05-24 | アクス テクノロジー エルエルシー | 基板キャリアヘッドおよび処理システム |
CN114206551A (zh) * | 2019-08-02 | 2022-03-18 | 崇硕科技公司 | 用于工件抛光期间晶片滑移检测的原位调整的方法和设备 |
KR20210095047A (ko) * | 2020-01-22 | 2021-07-30 | 주식회사 씨티에스 | 웨이퍼 건조 모듈 및 이를 포함하는 씨엠피 장치 |
US11705354B2 (en) | 2020-07-10 | 2023-07-18 | Applied Materials, Inc. | Substrate handling systems |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020132566A1 (en) * | 2001-03-15 | 2002-09-19 | Jeong In Kwon | System and method for chemical mechanical polishing using multiple small polishing pads |
US20070141954A1 (en) * | 2005-12-16 | 2007-06-21 | Applied Materials, Inc. | Paired pivot arm |
US20080038993A1 (en) * | 2006-08-08 | 2008-02-14 | Jeong In-Kwon | Apparatus and method for polishing semiconductor wafers |
CN102124545A (zh) * | 2008-08-14 | 2011-07-13 | 应用材料公司 | 具有可移动的浆液分配器的化学机械抛光机及方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5562524A (en) * | 1994-05-04 | 1996-10-08 | Gill, Jr.; Gerald L. | Polishing apparatus |
US6354926B1 (en) * | 1997-03-12 | 2002-03-12 | Lam Research Corporation | Parallel alignment method and apparatus for chemical mechanical polishing |
JP2000061821A (ja) | 1998-08-19 | 2000-02-29 | Speedfam-Ipec Co Ltd | ポリッシング装置における外気連通機構 |
JP3797822B2 (ja) * | 1999-06-30 | 2006-07-19 | 株式会社荏原製作所 | ポリッシング装置 |
US6189680B1 (en) * | 1999-07-27 | 2001-02-20 | Fujikoshi Kikai Kogyo Kabushiki Kaisha | Rotary conveyor |
JP4485643B2 (ja) | 1999-08-30 | 2010-06-23 | 三菱マテリアル株式会社 | 研磨装置及び被研磨材の研磨方法 |
US6602121B1 (en) * | 1999-10-28 | 2003-08-05 | Strasbaugh | Pad support apparatus for chemical mechanical planarization |
JP4257017B2 (ja) | 2000-05-02 | 2009-04-22 | 不二越機械工業株式会社 | ウェーハの研磨装置 |
JP2001326201A (ja) | 2000-05-16 | 2001-11-22 | Ebara Corp | ポリッシング装置 |
US6923711B2 (en) * | 2000-10-17 | 2005-08-02 | Speedfam-Ipec Corporation | Multizone carrier with process monitoring system for chemical-mechanical planarization tool |
US6439981B1 (en) * | 2000-12-28 | 2002-08-27 | Lsi Logic Corporation | Arrangement and method for polishing a surface of a semiconductor wafer |
KR100488376B1 (ko) * | 2001-04-27 | 2005-05-11 | 가부시키가이샤 고베 세이코쇼 | 기판 처리 방법 및 기판 처리 설비 |
US6817923B2 (en) * | 2001-05-24 | 2004-11-16 | Applied Materials, Inc. | Chemical mechanical processing system with mobile load cup |
US6575818B2 (en) * | 2001-06-27 | 2003-06-10 | Oriol Inc. | Apparatus and method for polishing multiple semiconductor wafers in parallel |
KR20050004156A (ko) * | 2002-05-17 | 2005-01-12 | 가부시키가이샤 에바라 세이사꾸쇼 | 기판처리장치 및 기판처리방법 |
JP2005131772A (ja) | 2003-10-31 | 2005-05-26 | Ebara Corp | ポリッシング装置 |
JP5112061B2 (ja) * | 2004-07-02 | 2013-01-09 | ストラスボー | ウエハ処理方法およびシステム |
-
2018
- 2018-04-06 EP EP18791930.3A patent/EP3616237A4/en active Pending
- 2018-04-06 CN CN201880031946.0A patent/CN110709980A/zh active Pending
- 2018-04-06 KR KR1020247021569A patent/KR20240110657A/ko active Search and Examination
- 2018-04-06 WO PCT/US2018/026590 patent/WO2018200165A1/en unknown
- 2018-04-06 JP JP2019558761A patent/JP7094983B2/ja active Active
- 2018-04-06 US US15/947,510 patent/US20180311784A1/en not_active Abandoned
- 2018-04-06 KR KR1020197033907A patent/KR102680584B1/ko active IP Right Grant
-
2021
- 2021-12-06 US US17/457,871 patent/US20220088744A1/en active Pending
-
2022
- 2022-06-21 JP JP2022099826A patent/JP7408726B2/ja active Active
-
2023
- 2023-12-20 JP JP2023215247A patent/JP2024026436A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020132566A1 (en) * | 2001-03-15 | 2002-09-19 | Jeong In Kwon | System and method for chemical mechanical polishing using multiple small polishing pads |
US20070141954A1 (en) * | 2005-12-16 | 2007-06-21 | Applied Materials, Inc. | Paired pivot arm |
US20080038993A1 (en) * | 2006-08-08 | 2008-02-14 | Jeong In-Kwon | Apparatus and method for polishing semiconductor wafers |
CN102124545A (zh) * | 2008-08-14 | 2011-07-13 | 应用材料公司 | 具有可移动的浆液分配器的化学机械抛光机及方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2020518475A (ja) | 2020-06-25 |
JP2024026436A (ja) | 2024-02-28 |
WO2018200165A1 (en) | 2018-11-01 |
JP7408726B2 (ja) | 2024-01-05 |
EP3616237A1 (en) | 2020-03-04 |
US20180311784A1 (en) | 2018-11-01 |
KR20200002928A (ko) | 2020-01-08 |
JP7094983B2 (ja) | 2022-07-04 |
JP2022141653A (ja) | 2022-09-29 |
US20220088744A1 (en) | 2022-03-24 |
EP3616237A4 (en) | 2020-12-16 |
KR102680584B1 (ko) | 2024-07-03 |
KR20240110657A (ko) | 2024-07-15 |
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