CN110639332B - High-purity nitrogen or argon purification equipment - Google Patents
High-purity nitrogen or argon purification equipment Download PDFInfo
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- CN110639332B CN110639332B CN201910966817.7A CN201910966817A CN110639332B CN 110639332 B CN110639332 B CN 110639332B CN 201910966817 A CN201910966817 A CN 201910966817A CN 110639332 B CN110639332 B CN 110639332B
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
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- C01B21/00—Nitrogen; Compounds thereof
- C01B21/04—Purification or separation of nitrogen
- C01B21/0405—Purification or separation processes
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- C01B21/045—Physical processing only by adsorption in solids
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
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- C01B23/00—Noble gases; Compounds thereof
- C01B23/001—Purification or separation processes of noble gases
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Abstract
The invention relates to high-purity nitrogen or argon purification equipment which comprises a first purification tank and a second purification tank which are connected through a pipeline, wherein the first purification tank is connected with a gas inlet and a plurality of stop valves through the pipeline, a first adsorption layer is arranged in the first purification tank, the second purification tank is connected with a gas outlet through the pipeline, and a second adsorption layer is arranged in the second purification tank. The invention enlarges the contact surface area of the gas and the adsorption layer, the gas path is not obstructed, the structure is simple, and the operation is easy to realize; when the gas passes through the adsorption layer, the gas is mixed and dispersed for many times to achieve a good homogenization effect, so that the purity of the gas reaches 99.9999 percent, the purification of the high-purity gas is realized, and the method is suitable for the purification of nitrogen or argon with harsh requirements.
Description
Technical Field
The invention belongs to the technical field of gas purification equipment, and particularly relates to high-purity nitrogen or argon purification equipment for enabling the gas purity to reach 99.9999%.
Background
High purity Gases (Purified Gases), a term of industry, generally refers to Gases of a certain degree of purity that can be achieved using modern purification techniques. Purity levels vary for different classes of gases, for example for nitrogen, hydrogen, argon, helium, which generally means that a high purity gas with a purity equal to or higher than 99.999%; for oxygen, the purity of the oxygen is 99.99 percent, namely high purity oxygen; for hydrocarbons, a purity of 99.99% is considered a high purity gas; the application field of high-purity gas is very wide, and in the semiconductor industry, high-purity nitrogen, hydrogen, argon and helium can be used as carrier gas and protective gas; the high-purity gas can be used as bottom gas for preparing mixed gas.
The existing gas purification technology principle mainly comprises catalytic oxidation, physical adsorption and chemical adsorption. The catalytic oxidation needs to heat the gas to a certain temperature, and the catalyst can catalyze and oxidize the impurity gas; the physical adsorption mostly adopts molecular sieve adsorption, can effectively remove impurities of CO2 and H2O, has reversible purification process at high temperature, and can regenerate the molecular sieve; and the chemical adsorption is to remove impurities by the chemical reaction between the gas in the impurities and the filler in the purification tower.
In nitrogen and argon separated by most air separation devices, heavy hydrocarbon components which are difficult to detect are contained, and special analysis instruments such as oil refineries and the like need high-purity gas as carrier gas, if ordinary high-purity nitrogen is adopted as carrier gas, the spectrogram performance is poor, and unknown peaks appear at corresponding positions. But the spectrogram of the trap is stable without unknown peaks after the trap is additionally arranged. The high-purity nitrogen is detected by an aluminum trioxide chromatographic column (FID) detector, and hydrocarbon substances below C5 are not found, which indicates that the common high-purity gas contains hydrocarbon substances above C5, and the high-purity gas for special purposes needs to be purified to an ultra-high purity level.
Nowadays, the purity of gases in the fields of semiconductors, electronics, aviation and the like has high requirements, and large batches of ultra-high purity electronic grade gases are needed. The purity of gas produced by air separation or chemical reaction is difficult to meet the production requirement, and most of gas used in the fields of semiconductors and electronics is purified bottled gas. Most purifier can only purify single gas at present, hardly satisfies the purification of multiple gas, to many first gas producer, purchases the purification gas of many equipment, and purchase cost is higher to a certain extent, and area is great, wants to realize that the production line formula purifies difficultly. This results in a lower purification efficiency, and gas purification is only suitable for small-batch purification of special gases, which is particularly difficult for mass production of ultra-high purity gases.
The air separation of the high-purity gas product in the market at present can only reach 99.999 percent, and 99.9999 percent of the gas product is required to be used in many fine-end facilities.
Disclosure of Invention
The invention aims to provide a high-purity nitrogen or argon purifying device which can ensure that the gas purity reaches 99.9999% in order to overcome the defect that the air separation of the existing high-purity gas product can only reach 99.999%.
In order to achieve the purpose, the invention adopts the following technical scheme:
the utility model provides a high-purity nitrogen gas or argon gas purification equipment, includes first purification jar and the second purification jar through the tube coupling, first purification jar passes through tube coupling air inlet and a plurality of stop valves, and first purification jar is inside to be equipped with first adsorbed layer, second purification jar passes through the tube coupling gas outlet, and inside is equipped with the second adsorbed layer. High-purity nitrogen or argon is input through the air inlet and is adsorbed by the first purifying tank and the second purifying tank to remove impurities, so that a gas product with the purity of 99.9999% is obtained.
Preferably, the first adsorption layer inner container is a rhombohedron, and the inside of the first adsorption layer inner container is filled with a 5A molecular sieve. The inner container of the first adsorption layer is arranged into a rhombohedron, so that gas can be contacted with the molecular sieve inside for multiple times after entering the adsorption layer, and the high-purity gas is dispersed and converged for multiple times, thereby achieving the purpose of removing impurities.
Preferably, the second adsorption layer inner container is a rhombohedron with a rounded vertex angle, and the carbon molecular sieve is filled inside the second adsorption layer inner container. The second adsorption layer inner container is arranged to be a rhombohedron with a rounded vertex angle, because high-purity gas passes through the second adsorption layer in the second purification tank, the gas is continuously dispersed and polymerized, no dead volume exists when the gas passes through, the gas is more smooth to pass through, and the gas changes direction for many times and is mixed and dispersed for many times, so that the gas has a good homogenization effect, and the aim of removing impurities is enhanced.
Preferably, the tank bodies of the first purification tank and the second purification tank are externally covered with heating blankets, and thermocouples are arranged inside the tank bodies.
Preferably, a back pressure valve is provided at the outlet.
Preferably, the pipeline is also provided with a plurality of pressure gauges.
Preferably, the first purification tank and the second purification tank both comprise a tank body, the inner wall of the tank body is provided with an elastic connection part corresponding to one adsorption layer, the top end of the elastic connection part is connected with the adsorption layer, the outer side of the tank body is provided with a waveform transmission point corresponding to the elastic connection part, the back surface of the waveform transmission point and the bottom end of the elastic connection part are located at the same position, all the waveform transmission points are fixed on the surface of the tank body in a vertically arranged manner, any adjacent adsorption layers are connected through a metal transmission line, and the connection positions of all the adsorption layers and the metal transmission line are the same;
the waveform integrity detection device comprises a waveform generator, a waveform detector, a waveform comparator and a plurality of installation hoops, wherein the waveform generator and the waveform detector are fixed in the installation hoops, the installation hoops are arranged at the position of a waveform transmission point of the tank body in an embracing mode during detection, the waveform generator and the waveform detector are attached to the position of the waveform transmission point, the waveform generator outputs waveforms to a first input end of the waveform comparator, the waveforms output by the waveform generator are transmitted to the waveform receiver through a corresponding waveform transmission point of the adsorption layer, a corresponding elastic connection part of the adsorption layer, a corresponding adsorption layer, a metal transmission line, an adjacent adsorption layer, an elastic connection part of the adjacent adsorption layer and a waveform transmission point of the adjacent adsorption layer in sequence, the waveform receiver performs noise reduction and amplification and then transmits the waveforms to a second input end of the waveform comparator, and the noise reduction regulation and amplification regulation circuit configured on the waveform receiver is calibrated manually.
The application only needs to hold the hoop on the tank body when detecting the integrity, wherein the waveform transmission point corresponding to the waveform generator, the waveform receiver also corresponds to the waveform transmission point, the driving output part of the waveform generator is a polarization motor, the polarization motor is fixed at the waveform transmission point to receive the driving wave, the driving wave is synchronously output to the waveform receiver, if a plurality of waveform receivers are provided, the first input end of each waveform receiver receives the same driving waveform, then the output part in the waveform generator, namely the polarization motor acts, namely the driving waveform is transmitted to the waveform receiver through the waveform transmission point of the corresponding adsorption layer, the elastic connection part of the corresponding adsorption layer, the metal transmission line, the adjacent adsorption layer, the elastic connection part of the adjacent adsorption layer and the waveform transmission point of the adjacent adsorption layer in sequence, and the waveforms can be greatly changed through the components, amplitude, phase place all change, but its frequency still can keep invariable, consequently can carry out the integrality detection to the adsorbed layer through two kinds of modes, first kind, because all adsorbed layers no longer carry out subsequent change after the installation, consequently, as long as when making an uproar, enlargie and the skew data adjustment of waveform receiver accomplish with the initial calibration after, later every time contrast, the data that can obtain all should be the same or roughly the same, in case the incomplete condition of adsorbed layer appears, great deviation will appear in the wave form contrast then to judge that present adsorbed layer has the problem. And in the integrity test, the waveform generator can be arranged at the corresponding waveform transmission point of the first adsorption layer to perform primary measurement, and then the waveform generator is repeatedly arranged at the corresponding waveform transmission point of the second adsorption layer to perform secondary measurement until all the transmission points are measured, and then the detection process is completed.
Secondly, not performing calibration operation, directly acquiring all waveforms, performing Fourier transform or wavelet Fourier transform on the waveforms to acquire frequency data of the currently acquired waveforms, simultaneously performing Fourier transform or wavelet Fourier transform on the drive waves, and comparing the difference between the acquired waveform frequency and the waveform frequency of the drive waves.
If the method in the second is adopted, higher processing and calculation capacity is needed, namely, the waveform comparator needs support of an embedded system, and the cost is higher, therefore, the method is a first detection method which is commonly used in the application, the method can be used after primary calibration is completed by adjusting an adjustable capacitive element and an adjustable resistive element in the waveform comparator during detection, the applicability is strong, the speed is high, but the method only can be used as a simple test depending on calibration work of an engineer, and the stability and the accuracy of the test are inferior to those of the second detection method.
Preferably, the outer edge of the elastic connection part of the inner wall of the tank body is wrapped with a circle of vibration damping ring, the vibration damping ring is fixedly connected with the inner wall of the tank body, the position, corresponding to the vibration damping ring, of the inner wall of the tank body is wrapped with a metal isolation shell, and a gap is reserved between the metal isolation shell and the vibration damping ring. The purpose of this design is to isolate the gas and the damping rings.
Preferably, the elastic connection part is a horizontal protrusion, the horizontal protrusion is transversely provided with an arc-shaped groove, a reed is filled in the groove body of the arc-shaped groove, the corresponding adsorption layer is inserted into the arc-shaped groove and is fixedly connected with the reed, the center of the bottom of the arc-shaped groove is positioned on the back of the waveform transmission point, and the connection position of the adsorption layer and the metal transmission line is the center of the adsorption layer from the center of a circle to the elastic connection part. The structure is a common structure and can also be realized by directly filling reeds at the original splicing and fixing positions of the adsorption layer.
The invention has the beneficial effects that: the invention enlarges the contact surface area of the gas and the adsorption layer, the gas path is not obstructed, the structure is simple, and the operation is easy to realize; when the gas passes through the adsorption layer, the gas is mixed and dispersed for many times to achieve a good homogenization effect, so that the purity of the gas reaches 99.9999 percent, the purification of the high-purity gas is realized, and the method is suitable for the purification of nitrogen or argon with harsh requirements.
Drawings
FIG. 1 is a schematic diagram of an embodiment of the present invention.
Fig. 2 is a cross-sectional view of a first adsorbent layer of the present invention.
FIG. 3 is a cross-sectional view of a second adsorbent layer of the present invention.
In the figure, 1, a first purification tank; 2. a second purification tank; 3. an air inlet; 4. a first adsorbent layer; 5. an air outlet; 6. a second adsorption layer; 7. a heating blanket; 8. a thermocouple; 9. a stop valve; 10. a back pressure valve; 11. and a pressure gauge.
Detailed Description
The invention will be further explained with reference to the following embodiments and the accompanying drawings:
example 1:
referring to fig. 1, 2 and 3, the high-purity nitrogen or argon purifying equipment is mounted on a platform and comprises a first purifying tank 1 and a second purifying tank 2 which are connected through a pipeline, wherein the first purifying tank 1 is connected with an air inlet 3 and five stop valves 9 through pipelines, a first adsorption layer 4 is arranged inside the first purifying tank 2, the second purifying tank 2 is connected with an air outlet 5 through a pipeline, and a second adsorption layer 6 is arranged inside the second purifying tank 2; the heating blankets 7 are wrapped outside the first purifying tank 1 and the second purifying tank 2, and thermocouples 8 are arranged inside the first purifying tank and the second purifying tank; the outlet is provided with a backpressure valve 10, and the pipeline is also provided with 2 pressure gauges 11. The operating parameters of the heating blanket and thermocouple may be operated according to existing processes.
The inner container of the first adsorption layer 4 is rhombohedron, and the inside of the inner container is filled with 5A molecular sieve, and the 5A molecular sieve can be purchased from the market. The gas can contact with the molecular sieve inside for many times after entering the adsorption layer, so that the high-purity gas is dispersed and converged for many times, and the aim of removing impurities is fulfilled.
The inner container of the second adsorption layer 5 is a rhombohedron with an inverted vertex angle, and the inner container is filled with a carbon molecular sieve. The carbon molecular sieve is commercially available. When the high-purity gas passes through the second adsorption layer in the second purification tank, the high-purity gas is continuously dispersed and polymerized, the gas does not have dead volume when passing through, the gas passes more smoothly, and the gas has good homogenization effect on the gas due to the fact that the gas changes direction for many times and is mixed and dispersed for many times, so that the purpose of removing impurities is enhanced.
For example, the results before and after purification using 99.99% nitrogen are shown in table 1 below:
TABLE 1 purification results
For example, 99.99% argon purification, the results before and after purification are shown in Table 2 below:
TABLE 2 purification results
The invention enlarges the contact surface area of the gas and the adsorption layer, the gas path is not obstructed, the structure is simple, and the operation is easy to realize; when the gas passes through the adsorption layer, the gas is mixed and dispersed for many times to achieve a good homogenization effect, so that the purity of the gas reaches 99.9999 percent, the purification of the high-purity gas is realized, and the method is suitable for the purification of nitrogen or argon with harsh requirements.
Example 2:
the principle and the implementation method of the embodiment are basically the same as those of embodiment 1, and the difference is that the first purification tank and the second purification tank both comprise a tank body, an elastic connection part is arranged on the inner wall of the tank body corresponding to one adsorption layer, the top end of the elastic connection part is connected with the adsorption layer, a waveform transmission point is arranged on the outer side of the tank body corresponding to the elastic connection part, the back surface of the waveform transmission point and the bottom end of the elastic connection part are located at the same position, all the waveform transmission points are fixed on the surface of the tank body in a vertically arranged manner, any adjacent adsorption layers are connected through a metal transmission line, and the connection positions of all the adsorption layers and the metal transmission line are the same;
the waveform integrity detection device comprises a waveform generator, a waveform detector, a waveform comparator and a plurality of installation hoops, wherein the waveform generator and the waveform detector are fixed in the installation hoops, the installation hoops are arranged at the position of a waveform transmission point of the tank body in an embracing mode during detection, the waveform generator and the waveform detector are attached to the position of the waveform transmission point, the waveform generator outputs waveforms to a first input end of the waveform comparator, the waveforms output by the waveform generator are transmitted to the waveform receiver through a corresponding waveform transmission point of the adsorption layer, a corresponding elastic connection part of the adsorption layer, a corresponding adsorption layer, a metal transmission line, an adjacent adsorption layer, an elastic connection part of the adjacent adsorption layer and a waveform transmission point of the adjacent adsorption layer in sequence, the waveform receiver performs noise reduction and amplification and then transmits the waveforms to a second input end of the waveform comparator, and the noise reduction regulation and amplification regulation circuit configured on the waveform receiver is calibrated manually.
The application only needs to hold the hoop on the tank body when detecting the integrity, wherein the waveform transmission point corresponding to the waveform generator, the waveform receiver also corresponds to the waveform transmission point, the driving output part of the waveform generator is a polarization motor, the polarization motor is fixed at the waveform transmission point to receive the driving wave, the driving wave is synchronously output to the waveform receiver, if a plurality of waveform receivers are provided, the first input end of each waveform receiver receives the same driving waveform, then the output part in the waveform generator, namely the polarization motor acts, namely the driving waveform is transmitted to the waveform receiver through the waveform transmission point of the corresponding adsorption layer, the elastic connection part of the corresponding adsorption layer, the metal transmission line, the adjacent adsorption layer, the elastic connection part of the adjacent adsorption layer and the waveform transmission point of the adjacent adsorption layer in sequence, and the waveforms can be greatly changed through the components, amplitude, phase place all change, but its frequency still can keep invariable, consequently can carry out the integrality detection to the adsorbed layer through two kinds of modes, first kind, because all adsorbed layers no longer carry out subsequent change after the installation, consequently, as long as when making an uproar, enlargie and the skew data adjustment of waveform receiver accomplish with the initial calibration after, later every time contrast, the data that can obtain all should be the same or roughly the same, in case the incomplete condition of adsorbed layer appears, great deviation will appear in the wave form contrast then to judge that present adsorbed layer has the problem. And in the integrity test, the waveform generator can be arranged at the corresponding waveform transmission point of the first adsorption layer to perform primary measurement, and then the waveform generator is repeatedly arranged at the corresponding waveform transmission point of the second adsorption layer to perform secondary measurement until all the transmission points are measured, and then the detection process is completed.
Secondly, not performing calibration operation, directly acquiring all waveforms, performing Fourier transform or wavelet Fourier transform on the waveforms to acquire frequency data of the currently acquired waveforms, simultaneously performing Fourier transform or wavelet Fourier transform on the drive waves, and comparing the difference between the acquired waveform frequency and the waveform frequency of the drive waves.
If the method in the second needs higher processing calculation capability, namely the waveform comparator needs support of an embedded system, the cost is higher, therefore, the method in the application is a first detection method which is commonly used, and after initial calibration is completed through adjustment of an adjustable capacitive element and an adjustable resistive element in the waveform comparator during detection, the method can be used.
The outer fringe package of jar internal wall in elastic connection department is equipped with the round damping circle, the damping circle is connected with the inner wall fixed connection of the jar body, jar internal wall corresponds damping circle position package and is equipped with the metal isolation shell, there is the space between metal isolation shell and the damping circle. The purpose of this design is to isolate the gas and the damping rings.
The elastic connection part is a horizontal protrusion, an arc-shaped groove is transversely formed in the horizontal protrusion, a reed is filled in a groove body of the arc-shaped groove, a corresponding adsorption layer is inserted into the arc-shaped groove and fixedly connected with the reed, the center of the bottom of the arc-shaped groove is located on the back of the waveform transmission point, and the position where the adsorption layer is connected with the metal transmission line is the center of the adsorption layer from the center of a circle to the elastic connection part. The structure is a common structure and can also be realized by directly filling reeds at the original splicing and fixing positions of the adsorption layer.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the invention, and any modifications, equivalents and improvements made within the spirit and principle of the present invention are intended to be included within the scope of the present invention.
Claims (8)
1. The high-purity nitrogen or argon purification equipment is characterized by comprising a first purification tank and a second purification tank which are connected through a pipeline, wherein the first purification tank is connected with a gas inlet and a plurality of stop valves through the pipeline, a first adsorption layer is arranged in the first purification tank, the second purification tank is connected with a gas outlet through the pipeline, and a second adsorption layer is arranged in the second purification tank;
the first purification tank and the second purification tank comprise tank bodies, the inner wall of each tank body is provided with an elastic connection part corresponding to one adsorption layer, the top end of each elastic connection part is connected with the adsorption layer, the outer side of each tank body is provided with a waveform transmission point corresponding to the elastic connection part, the back surface of each waveform transmission point and the bottom end of each elastic connection part are located at the same position, all the waveform transmission points are fixed on the surface of each tank body in a vertically arranged mode, any adjacent adsorption layers are connected through a metal transmission line, and the connection positions of all the adsorption layers and the metal transmission line are the same;
the waveform integrity detection device comprises a waveform generator, a waveform detector, a waveform comparator and a plurality of installation hoops, wherein the waveform generator and the waveform detector are fixed in the installation hoops, the installation hoops are arranged at the position of a waveform transmission point of the tank body in an embracing mode during detection, the waveform generator and the waveform detector are attached to the position of the waveform transmission point, the waveform generator outputs waveforms to a first input end of the waveform comparator, the waveforms output by the waveform generator are transmitted to the waveform receiver through a corresponding waveform transmission point of the adsorption layer, a corresponding elastic connection part of the adsorption layer, a corresponding adsorption layer, a metal transmission line, an adjacent adsorption layer, an elastic connection part of the adjacent adsorption layer and a waveform transmission point of the adjacent adsorption layer in sequence, the waveform receiver performs noise reduction and amplification and then transmits the waveforms to a second input end of the waveform comparator, the noise reduction regulation and amplification regulation circuit configured for the waveform receiver is calibrated manually;
the integrity waveform integrity detection device collects all waveforms, performs Fourier transform or wavelet Fourier transform on the waveforms to acquire frequency data of the currently collected waveforms, performs Fourier transform or wavelet Fourier transform on the drive waves, and compares the difference between the collected waveform frequency and the waveform frequency of the drive waves.
2. The apparatus of claim 1, wherein the first adsorption layer inner container is a rhombohedron, and the inside of the first adsorption layer inner container is filled with a 5A molecular sieve.
3. The apparatus of claim 1, wherein the second adsorption layer liner is a rhombohedral body with rounded corners, and carbon molecular sieves are filled in the second adsorption layer liner.
4. The apparatus of claim 1, wherein the first and second purification tanks have heating blankets covering the tanks and thermocouples inside the tanks.
5. The apparatus for purifying high purity nitrogen or argon as claimed in claim 1, wherein a back pressure valve is provided at the outlet.
6. The apparatus of claim 1, wherein the piping has pressure gauges.
7. The high-purity nitrogen or argon purification equipment as claimed in claim 1, wherein a ring of vibration reduction ring is wrapped on the outer edge of the elastic connection part of the inner wall of the tank body, the vibration reduction ring is fixedly connected with the inner wall of the tank body, a metal isolation shell is wrapped on the inner wall of the tank body at the position corresponding to the vibration reduction ring, and a gap is formed between the metal isolation shell and the vibration reduction ring.
8. The high-purity nitrogen or argon purification equipment as claimed in claim 1 or 7, wherein the elastic connection part is a horizontal protrusion, an arc-shaped groove is transversely formed in the horizontal protrusion, a reed is filled in a groove body of the arc-shaped groove, a corresponding adsorption layer is inserted in the arc-shaped groove and fixedly connected with the reed, the center of the bottom of the arc-shaped groove is located on the back of the waveform transmission point, and the position where the adsorption layer is connected with the metal transmission line is from the center of the adsorption layer to the center of the elastic connection part.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101181982A (en) * | 2007-12-05 | 2008-05-21 | 四川普瑞净化设备有限公司 | Device and method for preparing high-purity argon gas |
| CN203360002U (en) * | 2013-07-11 | 2013-12-25 | 哈尔滨黎明气体有限公司 | Novel nitrogen purification device |
| CN205527751U (en) * | 2015-12-21 | 2016-08-31 | 赵志峰 | High -purity nitrogen gas purification device |
| CN106383030A (en) * | 2016-08-24 | 2017-02-08 | 上海泛智能源装备有限公司 | Fault detection method and related device |
| CN110042736A (en) * | 2018-01-16 | 2019-07-23 | 光宝电子(广州)有限公司 | Road surface reparation method, apparatus and system |
-
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- 2019-10-12 CN CN201910966817.7A patent/CN110639332B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101181982A (en) * | 2007-12-05 | 2008-05-21 | 四川普瑞净化设备有限公司 | Device and method for preparing high-purity argon gas |
| CN203360002U (en) * | 2013-07-11 | 2013-12-25 | 哈尔滨黎明气体有限公司 | Novel nitrogen purification device |
| CN205527751U (en) * | 2015-12-21 | 2016-08-31 | 赵志峰 | High -purity nitrogen gas purification device |
| CN106383030A (en) * | 2016-08-24 | 2017-02-08 | 上海泛智能源装备有限公司 | Fault detection method and related device |
| CN110042736A (en) * | 2018-01-16 | 2019-07-23 | 光宝电子(广州)有限公司 | Road surface reparation method, apparatus and system |
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