CN110606491A - 一种高纯二碘硅烷的制备方法 - Google Patents
一种高纯二碘硅烷的制备方法 Download PDFInfo
- Publication number
- CN110606491A CN110606491A CN201910537707.9A CN201910537707A CN110606491A CN 110606491 A CN110606491 A CN 110606491A CN 201910537707 A CN201910537707 A CN 201910537707A CN 110606491 A CN110606491 A CN 110606491A
- Authority
- CN
- China
- Prior art keywords
- diiodosilane
- phenylsilane
- temperature
- mixture
- solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- AIHCVGFMFDEUMO-UHFFFAOYSA-N diiodosilane Chemical compound I[SiH2]I AIHCVGFMFDEUMO-UHFFFAOYSA-N 0.000 title claims abstract description 86
- 238000002360 preparation method Methods 0.000 title claims abstract description 24
- PARWUHTVGZSQPD-UHFFFAOYSA-N phenylsilane Chemical compound [SiH3]C1=CC=CC=C1 PARWUHTVGZSQPD-UHFFFAOYSA-N 0.000 claims abstract description 64
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims abstract description 34
- 229910052740 iodine Inorganic materials 0.000 claims abstract description 34
- 239000011630 iodine Substances 0.000 claims abstract description 34
- 239000000126 substance Substances 0.000 claims abstract description 34
- 238000006243 chemical reaction Methods 0.000 claims abstract description 32
- 239000000203 mixture Substances 0.000 claims abstract description 30
- XNAFLNBULDHNJS-UHFFFAOYSA-N dichloro(phenyl)silicon Chemical compound Cl[Si](Cl)C1=CC=CC=C1 XNAFLNBULDHNJS-UHFFFAOYSA-N 0.000 claims abstract description 27
- 239000002904 solvent Substances 0.000 claims abstract description 20
- 238000003756 stirring Methods 0.000 claims abstract description 20
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 18
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 18
- 239000001301 oxygen Substances 0.000 claims abstract description 18
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 18
- 239000011261 inert gas Substances 0.000 claims abstract description 16
- 239000012280 lithium aluminium hydride Substances 0.000 claims abstract description 16
- -1 lithium aluminum hydride Chemical compound 0.000 claims abstract description 16
- 150000002170 ethers Chemical class 0.000 claims abstract description 14
- 239000003054 catalyst Substances 0.000 claims abstract description 10
- 238000010438 heat treatment Methods 0.000 claims abstract description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 49
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 28
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 24
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 19
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 16
- 239000012535 impurity Substances 0.000 claims description 12
- 229910052757 nitrogen Inorganic materials 0.000 claims description 12
- 239000006227 byproduct Substances 0.000 claims description 10
- LJSQFQKUNVCTIA-UHFFFAOYSA-N diethyl sulfide Chemical compound CCSCC LJSQFQKUNVCTIA-UHFFFAOYSA-N 0.000 claims description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 claims description 8
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 7
- 238000010926 purge Methods 0.000 claims description 7
- 238000000746 purification Methods 0.000 claims description 7
- 238000001704 evaporation Methods 0.000 claims description 6
- 150000002148 esters Chemical class 0.000 claims description 5
- 239000001307 helium Substances 0.000 claims description 5
- 229910052734 helium Inorganic materials 0.000 claims description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 5
- 150000002576 ketones Chemical class 0.000 claims description 5
- 229910052754 neon Inorganic materials 0.000 claims description 5
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 claims description 5
- 229910052724 xenon Inorganic materials 0.000 claims description 5
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 5
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 239000012298 atmosphere Substances 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 239000000843 powder Substances 0.000 claims description 2
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims 1
- 238000003801 milling Methods 0.000 claims 1
- 150000002484 inorganic compounds Chemical class 0.000 abstract description 2
- 229910010272 inorganic material Inorganic materials 0.000 abstract description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 239000000047 product Substances 0.000 description 7
- 238000000227 grinding Methods 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 238000011031 large-scale manufacturing process Methods 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- 231100000252 nontoxic Toxicity 0.000 description 5
- 230000003000 nontoxic effect Effects 0.000 description 5
- 239000005054 phenyltrichlorosilane Substances 0.000 description 5
- 239000000376 reactant Substances 0.000 description 5
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 5
- 231100000481 chemical toxicant Toxicity 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910001961 silver nitrate Inorganic materials 0.000 description 4
- 239000012086 standard solution Substances 0.000 description 4
- 239000003440 toxic substance Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- RNRZLEZABHZRSX-UHFFFAOYSA-N diiodosilicon Chemical compound I[Si]I RNRZLEZABHZRSX-UHFFFAOYSA-N 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000002194 synthesizing effect Effects 0.000 description 2
- 101710134784 Agnoprotein Proteins 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910010084 LiAlH4 Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910003828 SiH3 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 208000012839 conversion disease Diseases 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 239000002085 irritant Substances 0.000 description 1
- 231100000021 irritant Toxicity 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000012686 silicon precursor Substances 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/10778—Purification
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
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CN201910537707.9A CN110606491B (zh) | 2019-06-20 | 2019-06-20 | 一种高纯二碘硅烷的制备方法 |
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CN110606491A true CN110606491A (zh) | 2019-12-24 |
CN110606491B CN110606491B (zh) | 2022-07-29 |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3640205A1 (en) * | 2018-10-18 | 2020-04-22 | Yamanaka Hutech Corporation | Diiodosilane producing method |
CN113548669A (zh) * | 2021-09-01 | 2021-10-26 | 福建福豆新材料有限公司 | 一种高纯电子级二碘硅烷的制备装置及其制备方法 |
CN114656497A (zh) * | 2021-12-30 | 2022-06-24 | 盘锦研峰科技有限公司 | 一种苯硅烷的制备方法 |
CN116081626A (zh) * | 2023-03-30 | 2023-05-09 | 研峰科技(北京)有限公司 | 一种二碘硅烷的制备方法 |
CN116375038A (zh) * | 2023-02-23 | 2023-07-04 | 安徽博泰电子材料有限公司 | 一种二碘硅烷的制备方法 |
CN116789140A (zh) * | 2023-06-29 | 2023-09-22 | 铜陵安德科铭电子材料科技有限公司 | 一种二碘硅烷及其制备方法 |
KR102621030B1 (ko) * | 2023-07-27 | 2024-01-04 | 주식회사 아이켐스 | 디요오도실란의 제조방법 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07252271A (ja) * | 1994-03-14 | 1995-10-03 | Shin Etsu Chem Co Ltd | ヨードシランの製造方法 |
JP2000044575A (ja) * | 1998-07-31 | 2000-02-15 | Mitsui Chemicals Inc | 有機シラン類の製造方法 |
CN105801611A (zh) * | 2014-12-31 | 2016-07-27 | 上海楚青新材料科技有限公司 | 制备苯基硅烷和二苯基硅烷的方法 |
US20160264426A1 (en) * | 2016-05-19 | 2016-09-15 | Air Liquide Advanced Materials, Inc. | Synthesis methods for halosilanes |
US20180099872A1 (en) * | 2016-05-19 | 2018-04-12 | Air Liquide Advanced Materials Llc | PREPARATION OF Si-H CONTAINING IODOSILANES VIA HALIDE EXCHANGE REACTION |
-
2019
- 2019-06-20 CN CN201910537707.9A patent/CN110606491B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07252271A (ja) * | 1994-03-14 | 1995-10-03 | Shin Etsu Chem Co Ltd | ヨードシランの製造方法 |
JP2000044575A (ja) * | 1998-07-31 | 2000-02-15 | Mitsui Chemicals Inc | 有機シラン類の製造方法 |
CN105801611A (zh) * | 2014-12-31 | 2016-07-27 | 上海楚青新材料科技有限公司 | 制备苯基硅烷和二苯基硅烷的方法 |
US20160264426A1 (en) * | 2016-05-19 | 2016-09-15 | Air Liquide Advanced Materials, Inc. | Synthesis methods for halosilanes |
US20180099872A1 (en) * | 2016-05-19 | 2018-04-12 | Air Liquide Advanced Materials Llc | PREPARATION OF Si-H CONTAINING IODOSILANES VIA HALIDE EXCHANGE REACTION |
Non-Patent Citations (2)
Title |
---|
EHUD KEINAN等: "Diiodosilane. 1. A novel reagent for deoxygenation of alcohols and ethers", 《THE JOURNAL OF ORGANIC CHEMISTRY 》 * |
W. H. NEBERGALL: "Some Reactions of Phenylsilane", 《JOURNAL OF THE AMERICAN CHEMICAL SOCIETY》 * |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102414089B1 (ko) | 2018-10-18 | 2022-06-28 | 야마나카 휴텍 가부시키가이샤 | 디요오도실란의 제조 방법 |
KR20200043896A (ko) * | 2018-10-18 | 2020-04-28 | 야마나카 휴텍 가부시키가이샤 | 디요오도실란의 제조 방법 |
US11072534B2 (en) | 2018-10-18 | 2021-07-27 | Yamanaka Hutech Corporation | Diiodosilane producing method |
EP3640205A1 (en) * | 2018-10-18 | 2020-04-22 | Yamanaka Hutech Corporation | Diiodosilane producing method |
CN113548669B (zh) * | 2021-09-01 | 2022-11-11 | 福建福豆新材料有限公司 | 一种高纯电子级二碘硅烷的制备装置及其制备方法 |
CN113548669A (zh) * | 2021-09-01 | 2021-10-26 | 福建福豆新材料有限公司 | 一种高纯电子级二碘硅烷的制备装置及其制备方法 |
CN114656497A (zh) * | 2021-12-30 | 2022-06-24 | 盘锦研峰科技有限公司 | 一种苯硅烷的制备方法 |
CN114656497B (zh) * | 2021-12-30 | 2024-03-19 | 盘锦研峰科技有限公司 | 一种苯硅烷的制备方法 |
CN116375038A (zh) * | 2023-02-23 | 2023-07-04 | 安徽博泰电子材料有限公司 | 一种二碘硅烷的制备方法 |
CN116081626A (zh) * | 2023-03-30 | 2023-05-09 | 研峰科技(北京)有限公司 | 一种二碘硅烷的制备方法 |
CN116789140A (zh) * | 2023-06-29 | 2023-09-22 | 铜陵安德科铭电子材料科技有限公司 | 一种二碘硅烷及其制备方法 |
CN116789140B (zh) * | 2023-06-29 | 2023-12-22 | 铜陵安德科铭电子材料科技有限公司 | 一种二碘硅烷及其制备方法 |
KR102621030B1 (ko) * | 2023-07-27 | 2024-01-04 | 주식회사 아이켐스 | 디요오도실란의 제조방법 |
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Address after: 300450 south of GANGDA road and west of Zhonghe Haifeng project, Nangang Industrial Zone, economic and Technological Development Zone, Binhai New Area, Tianjin Patentee after: Tianjin Green Ling Gas Co.,Ltd. Country or region after: China Address before: 300450 south of GANGDA road and west of Zhonghe Haifeng project, Nangang Industrial Zone, economic and Technological Development Zone, Binhai New Area, Tianjin Patentee before: Tianjin Lvling Gas Co.,Ltd. Country or region before: China |