Disclosure of Invention
The application aims to provide a method and a device for controlling the wavelength of dense wavelength division multiplexing of a laser stably, and solve the technical problem that the wavelength of a DWDM optical module laser cannot be controlled quickly, stably and reliably in the prior art.
In order to achieve the above object, the present application provides a method for stable wavelength control of laser dense wavelength division multiplexing, comprising:
setting a set voltage value of a refrigerator controller through a laser controller, and monitoring an output voltage value of the refrigerator controller under the set voltage value in real time by the laser controller to obtain a corresponding relation between the set voltage value and the output voltage value;
detecting the set corresponding temperature of the laser under the set voltage value, and obtaining the corresponding relation between the set voltage value and the set corresponding temperature; detecting the monitored temperature reported by the refrigerator controller under a set voltage value within a working temperature range to obtain a corresponding relation between the set voltage value and the monitored temperature;
obtaining a monitoring temperature threshold range according to a working set voltage value corresponding to the laser within a working temperature range and a corresponding relation between the set voltage value and the monitoring temperature; obtaining a target set temperature value of the refrigerator controller according to the monitoring temperature threshold range and a preset target temperature setting strategy; obtaining a hysteresis temperature range calibrated by an upper limit hysteresis temperature and a lower limit hysteresis temperature based on the target set temperature value;
setting the target set temperature value as a target monitoring temperature reported by the refrigerator controller, obtaining a target set voltage value according to the target monitoring temperature, obtaining a target output voltage value according to the target set voltage value, and outputting the target output voltage value to the refrigerator;
and detecting the working real-time temperature of the laser in real time, and starting the laser when the real-time temperature is within the hysteresis temperature range.
Optionally, wherein the method further comprises:
obtaining a limiting temperature range calibrated by the upper limit temperature of the laser and the lower limit temperature of the laser based on the target set temperature value and a laser temperature limiting strategy;
and detecting the working real-time temperature of the laser in real time, and turning off the laser when the real-time temperature exceeds the limited temperature range.
Optionally, detecting a set corresponding temperature of the laser at the set voltage value, and obtaining a corresponding relationship between the set voltage value and the set corresponding temperature is as follows:
detecting the set corresponding temperature of the laser under the set voltage value;
according to Temp ═ a1*VSET 3+b1*VSET 2+c1*VSET+d1Obtaining the corresponding relation between the set voltage value and the set corresponding temperature, wherein Temp is the set corresponding temperature, VSETTo set the voltage value, a1、b1、c1And d1Are coefficients.
Optionally, within the working temperature range, the monitoring temperature reported by the refrigerator controller is detected under the set voltage value, and the corresponding relationship between the set voltage value and the monitoring temperature is obtained as follows:
detecting the monitoring temperature reported by the refrigerator controller under the set voltage value within the working temperature range;
according to VSET=a2*Tm 2+b2*Tm+c2Obtaining the corresponding relation between the set voltage value and the monitored temperature, wherein VSETTo set the voltage value, TmTo monitor the temperature, a2、b2And c2Are coefficients.
Optionally, a target set temperature value of the refrigerator controller is obtained according to the monitoring temperature threshold range and a preset target temperature setting strategy; based on the target set temperature value, obtaining a hysteresis temperature range calibrated by an upper limit hysteresis temperature and a lower limit hysteresis temperature, wherein the hysteresis temperature range is as follows:
obtaining a target set temperature value of the refrigerator controller according to the average temperature value of the temperature values at the two ends of the monitoring temperature threshold range;
obtaining an upper limit hysteresis temperature by adding a hysteresis temperature compensation value based on the target set temperature value; subtracting the hysteresis temperature compensation value to obtain a lower limit hysteresis temperature based on the target set temperature value;
and taking the temperature range between the upper limit hysteresis temperature and the lower limit hysteresis temperature as the hysteresis temperature range.
In another aspect, the present invention further provides a device for wavelength control stabilization of dense wavelength division multiplexing of a laser, including: a relation processor for setting voltage value and output voltage value, a relation processor for setting voltage value and laser temperature, a hysteresis temperature range analysis processor, a refrigerator control processor and a laser control processor;
the laser controller monitors the output voltage value of the refrigerator controller under the set voltage value in real time to obtain the corresponding relation between the set voltage value and the output voltage value;
the processor for the relationship between the set voltage value and the laser temperature is connected with the refrigerator control processor, detects the set corresponding temperature of the laser under the set voltage value, and obtains the corresponding relationship between the set voltage value and the set corresponding temperature; detecting the monitored temperature reported by the refrigerator controller under a set voltage value within a working temperature range to obtain a corresponding relation between the set voltage value and the monitored temperature;
the hysteresis temperature range analysis processor is connected with the set voltage value and laser temperature relation processor and the laser control processor, and obtains a monitoring temperature threshold range according to a corresponding working set voltage value of the laser in a working temperature range and a corresponding relation between the set voltage value and the monitoring temperature; obtaining a target set temperature value of the refrigerator controller according to the monitoring temperature threshold range and a preset target temperature setting strategy; obtaining a hysteresis temperature range calibrated by an upper limit hysteresis temperature and a lower limit hysteresis temperature based on the target set temperature value;
the refrigerator control processor is connected with the set voltage value and output voltage value relation processor, the set voltage value and laser temperature relation processor and the refrigerator controller, sets the target set temperature value as a target monitoring temperature reported by the refrigerator controller, obtains a target set voltage value according to the target monitoring temperature, obtains a target output voltage value according to the target set voltage value, and outputs the target output voltage value to the refrigerator;
the laser control processor is connected with the hysteresis temperature range analysis processor, the refrigerator controller and the laser, detects the working real-time temperature of the laser in real time, and starts the laser when the real-time temperature is in the hysteresis temperature range.
Optionally, wherein the apparatus further comprises: a laser shutdown processor connected with the hysteresis temperature range analysis processor and the laser,
obtaining a limiting temperature range calibrated by the upper limit temperature of the laser and the lower limit temperature of the laser based on the target set temperature value and a laser temperature limiting strategy;
and detecting the working real-time temperature of the laser in real time, and turning off the laser when the real-time temperature exceeds the limited temperature range.
Optionally, wherein the processor for setting the relationship between the voltage value and the laser temperature includes: a set voltage value and laser temperature detection unit, a set voltage value and laser temperature analysis unit and a set voltage value and monitoring temperature relation processing unit; wherein the content of the first and second substances,
the set voltage value and laser temperature detection unit is connected with the set voltage value and laser temperature analysis unit and detects the set corresponding temperature of the laser under the set voltage value;
the set voltage value and laser temperature analysis unit is connected with the set voltage value and laser temperature detection unit and the refrigerator control processor and a according to the Temp1*VSET 3+b1*VSET 2+c1*VSET+d1Obtaining the corresponding relation between the set voltage value and the set corresponding temperature, wherein Temp is the set corresponding temperature, VSETTo set the voltage value, a1、b1、c1And d1Is a coefficient;
and the set voltage value and monitored temperature relation processing unit is connected with the set voltage value and laser temperature detection unit and the refrigerator control processor, and detects the monitored temperature reported by the refrigerator controller under the set voltage value within the working temperature range to obtain the corresponding relation between the set voltage value and the monitored temperature.
Optionally, wherein the processor for setting the relationship between the voltage value and the laser temperature includes: a processing unit for setting the relation between the voltage value and the corresponding temperature, a detecting unit for setting the voltage value and monitoring the temperature and an analyzing unit for setting the voltage value and monitoring the temperature; wherein the content of the first and second substances,
the processing unit for the relationship between the set voltage value and the set corresponding temperature is connected with the refrigerator control processor, detects the set corresponding temperature of the laser under the set voltage value and obtains the corresponding relationship between the set voltage value and the set corresponding temperature;
the set voltage value and monitoring temperature detection unit is connected with the set voltage value and monitoring temperature analysis unit, and detects the monitoring temperature reported by the refrigerator controller under the set voltage value within the working temperature range;
the set voltage value and monitoring temperature analysis unit is connected with the set voltage value and monitoring temperature detection unit and the refrigerator control processor according to VSET=a2*Tm 2+b2*Tm+c2Obtaining the corresponding relation between the set voltage value and the monitored temperature, wherein VSETTo set the voltage value, TmTo monitor the temperature, a2、b2And c2Are coefficients.
Optionally, wherein the hysteresis temperature range analysis processor comprises: the device comprises a monitoring temperature threshold range analysis processing unit, a target set temperature value analysis processing unit and a hysteresis temperature range analysis processing unit; wherein the content of the first and second substances,
the monitoring temperature threshold range analysis processing unit is connected with the set voltage value and laser temperature relation processor and the target set temperature value analysis processing unit, and obtains a monitoring temperature threshold range according to a corresponding working set voltage value of the laser in a working temperature range and a corresponding relation between the set voltage value and the monitoring temperature;
the target set temperature value analysis processing unit is connected with the monitoring temperature threshold value range analysis processing unit and the hysteresis temperature range analysis processing unit, and obtains a target set temperature value of the refrigerator controller according to an average temperature value of temperature values at two ends of the monitoring temperature threshold value range;
the hysteresis temperature range analysis processing unit is connected with the target set temperature value analysis processing unit and the laser control processor, and obtains an upper limit hysteresis temperature by adding a hysteresis temperature compensation value based on the target set temperature value; subtracting the hysteresis temperature compensation value to obtain a lower limit hysteresis temperature based on the target set temperature value;
and taking the temperature range between the upper limit hysteresis temperature and the lower limit hysteresis temperature as the hysteresis temperature range.
The method and the device for controlling the wavelength of the dense wavelength division multiplexing of the laser have the following beneficial effects:
(1) the method and the device for controlling the dense wavelength division multiplexing stable wavelength of the laser have the advantages that the dense wavelength division multiplexing DWDM wavelength of the laser with refrigeration is stably controlled, the EML working wavelength of the laser can be guaranteed to be within +/-0.02 nm, and the problem of optical crosstalk between DWDM channels is effectively solved.
(2) The method and the device for controlling the dense wavelength division multiplexing stable wavelength of the laser have simple and practical thought, and can effectively ensure the rapid and stable wavelength of the laser when the laser is cold started in various working environments.
(3) The method and the device for controlling the dense wavelength division multiplexing stable wavelength of the laser solve the difficulty of wavelength drift of an optical module under a DWDM system, have strong control adaptability and can be widely popularized to control application of other lasers with refrigeration.
Examples
Fig. 1 is a schematic flow chart of a method for wavelength control stabilization of dense wavelength division multiplexing of a laser in this embodiment. The method involves: and the laser EML closed-loop control circuit in the optical module and the temperature of the laser semiconductor cooler TEC are stably controlled. The embodiment of the invention adopts an accurate control method, can effectively reduce the wavelength drift of the laser during cold start, and is a control method for well solving the optical crosstalk between DWDM channels in the dense optical wave multiplexing DWDM optical module. Specifically, the method comprises the following steps:
step 101, a set voltage value of a refrigerator controller is set through a laser controller, and the laser controller monitors an output voltage value of the refrigerator controller under the set voltage value in real time to obtain a corresponding relation between the set voltage value and the output voltage value.
102, detecting the set corresponding temperature of the laser under the set voltage value, and obtaining the corresponding relation between the set voltage value and the set corresponding temperature; and in the working temperature range, detecting the monitored temperature reported by the refrigerator controller under the set voltage value to obtain the corresponding relation between the set voltage value and the monitored temperature.
103, obtaining a monitoring temperature threshold range according to a working set voltage value corresponding to the laser within a working temperature range and a corresponding relation between the set voltage value and the monitoring temperature; obtaining a target set temperature value of the refrigerator controller according to the monitoring temperature threshold range and a preset target temperature setting strategy; and obtaining the hysteresis temperature range calibrated by the upper limit hysteresis temperature and the lower limit hysteresis temperature based on the target set temperature value.
And 104, setting the target set temperature value as a target monitoring temperature reported by the refrigerator controller, obtaining a target set voltage value according to the target monitoring temperature, obtaining a target output voltage value according to the target set voltage value, and outputting the target output voltage value to the refrigerator.
And 105, detecting the working real-time temperature of the laser in real time, and starting the laser when the real-time temperature is within the hysteresis temperature range.
In some optional embodiments, as shown in fig. 2, a schematic flowchart of a method for wavelength-division multiplexing stabilization of a second laser in this embodiment is shown. Different from fig. 1, the method further includes:
step 201, obtaining a limited temperature range calibrated by the upper limit temperature of the laser and the lower limit temperature of the laser based on the target set temperature value and the laser temperature limiting strategy.
Step 202, detecting the working real-time temperature of the laser in real time, and turning off the laser when the real-time temperature exceeds the limited temperature range.
In some optional embodiments, as shown in fig. 3, a schematic flowchart of a method for wdm-stabilized wavelength control of the third laser in this embodiment is shown. Different from fig. 1, the set corresponding temperature of the laser is detected under the set voltage value, and the corresponding relationship between the set voltage value and the set corresponding temperature is obtained as follows:
and 301, detecting the set corresponding temperature of the laser under the set voltage value.
Step 302, according to Temp ═ a1*VSET 3+b1*VSET 2+c1*VSET+d1Obtaining the corresponding relation between the set voltage value and the set corresponding temperature, wherein Temp is the set corresponding temperature, VSETTo set the voltage value, a1、b1、c1And d1Are coefficients.
In some optional embodiments, as shown in fig. 4, a schematic flowchart of a method for wdm-stabilized wavelength control of the fourth laser in this embodiment is shown. Different from fig. 1, in the working temperature range, the monitored temperature reported by the refrigerator controller is detected under the set voltage value, and the corresponding relationship between the set voltage value and the monitored temperature is obtained as follows:
step 401, detecting the monitoring temperature reported by the refrigerator controller within the working temperature range under the set voltage value.
Step 402, according to VSET=a2*Tm 2+b2*Tm+c2Obtaining the corresponding relation between the set voltage value and the monitored temperature, wherein VSETTo set the voltage value, TmTo monitor the temperature, a2、b2And c2Are coefficients.
In some optional embodiments, as shown in fig. 5, a schematic flowchart of a method for wdm stabilized wavelength control of a fifth laser in this embodiment is shown. Different from the method shown in fig. 1, a target set temperature value of the refrigerator controller is obtained according to the monitoring temperature threshold range and a preset target temperature setting strategy; based on the target set temperature value, obtaining the hysteresis temperature range calibrated by the upper limit hysteresis temperature and the lower limit hysteresis temperature, and the hysteresis temperature range is as follows:
step 501, obtaining a target set temperature value of the refrigerator controller according to an average temperature value of temperature values at two ends of a monitoring temperature threshold range.
Step 502, setting a temperature value based on a target, and adding a hysteresis temperature compensation value to obtain an upper limit hysteresis temperature; subtracting a hysteresis temperature compensation value to obtain a lower limit hysteresis temperature based on the target set temperature value;
and 503, taking the temperature range between the upper limit hysteresis temperature and the lower limit hysteresis temperature as a hysteresis temperature range.
As shown in fig. 6 to 9, fig. 6 is a block diagram of a laser closed-loop control circuit in the wavelength division multiplexing stabilized wavelength control of the laser in this embodiment, and according to the specification of the laser EML, a suitable limiting voltage VLIM across the laser and a suitable limiting current ILIM across the laser are set to prevent the laser from operating under an overload condition. Fig. 7 is a schematic flow chart illustrating power-on of a laser in the wdm stabilized wavelength control of the laser in this embodiment; FIG. 8 is a schematic diagram illustrating a process of abnormal laser shutdown in wavelength division multiplexing stabilized wavelength control of the laser in this embodiment; fig. 9 is a schematic diagram of the laser temperature setting operation interval in the wdm stabilized wavelength control of the laser in this embodiment.
The TEC controller closed-loop control process comprises the following steps:
according to the specification of the laser, VSET is output through a VDAC3 port of the MCU to set the target temperature of the TEC;
the ADC1 port of the MCU monitors the VTEMP voltage output by the TEC control circuit in real time. The VTEMP voltage output value is a temperature monitoring value obtained by a TEC control chip through a hardware PID algorithm; when the target TEC temperature setting voltage value VSET is equal to the temperature monitoring VTEMP, the TEC control is stable.
Obtaining a set of functional relation between EML laser temperature Temp and TEC control chip temperature setting VSET voltage through a TEC control circuit: temp. a1*VSET 3+b1*VSET 2+c1*VSET+d1Equation (1).
The temperature stabilization control method for the TEC of the laser comprises the following steps: the power-on control of the laser and the abnormal closing control of the laser are realized, and because a temperature coefficient exists between the temperature and the wavelength of the semiconductor laser, the temperature coefficient is about (0.08nm-0.1nm)/° C, the temperature of the laser is not enough to be maintained, and the temperature of the laser needs to be compensated, so that the wavelength deviation of the DWDM laser can be controlled in a 50GHz DWDM system (+ -0.04 nm).
Setting the ambient temperature at 25 deg.C, 85 deg.C, and-40 deg.C, and setting the wavelength λ of the laser working centercAnd obtaining a group of compensation relations about the VSET DAC and the MCU monitoring temperature T:
VSET=a2*Tm 2+b2*Tm+c2equation (2), here TmThe temperature monitoring report value is that the MCU works in an industrial temperature range of (-40, 85) DEG C.
And obtaining the dynamic range of the three-temperature laser temperature according to the setting range of the three-temperature compensated TEC temperature VSETDAC (T1, T2).
And (3) setting the Temp condition of the module laser to emit light:
Laser Temp Lower Deassert<Temp<Laser Temp High Deassert
set Temp condition for module laser off:
laser Temp High Assert < Temp or Temp < Laser Temp High Assert
Upper limit of laser temperature:
laser upper temperature limit hysteresis:
laser temperature lower limit hysteresis:
lower limit of laser temperature:
setting: t is0=(T1+T2)/2(℃)。t1For the hysteresis temperature compensation value, t2To define a temperature compensation value.
Substituting the real-time VSETDAC value obtained by the three-temperature compensation into the formula (1) to obtain the real-time set value TEMP of the laser temperature2;
And (3) setting the Temp condition of the module laser to emit light:
Laser Temp Lower Deassert<Temp<Laser Temp High Deassert
set Temp condition for module laser off:
laser Temp High Assert < Temp or Temp < Laser Temp High Assert
Upper limit of laser temperature: laser Temp High Assert ═ Temp2+t2(℃)
Laser upper temperature limit hysteresis: laser Temp High Deassert ═ Temp2+t1(℃)
Laser temperature lower limit hysteresis: laser Temp Lower alarm Temp2-t1(℃)
Lower limit of laser temperature: laser Temp Low Assert ═ Temp2-t2(℃)
Here T0Setting: t is0=Temp2(℃)
To ensure that the laser can control the wavelength shift and prevent the optical crosstalk between channels in the three-temperature cold start, a delay (t) function is added, as shown in fig. 9.
In some alternative embodiments, as shown in fig. 10, a schematic structural diagram of an apparatus 1000 for wdm stabilized wavelength control of a laser in this embodiment is shown, where the apparatus is used to implement the method for wdm stabilized wavelength control of a laser described above. Specifically, the apparatus includes: a relation processor 1001 for setting voltage value and output voltage value, a relation processor 1002 for setting voltage value and laser temperature, a hysteresis temperature range analysis processor 1003, a refrigerator control processor 1004 and a laser control processor 1005.
The relation processor 1001 for setting voltage value and output voltage value is connected to the refrigerator control processor 1004 to set the setting voltage value of the refrigerator controller, and the laser controller monitors the output voltage value of the refrigerator controller at the setting voltage value in real time to obtain the corresponding relation between the setting voltage value and the output voltage value.
A relation processor 1002 for setting the voltage value and the laser temperature, connected to the refrigerator control processor 1004, for detecting the set corresponding temperature of the laser under the set voltage value, and obtaining the corresponding relation between the set voltage value and the set corresponding temperature; and in the working temperature range, detecting the monitored temperature reported by the refrigerator controller under the set voltage value to obtain the corresponding relation between the set voltage value and the monitored temperature.
A hysteresis temperature range analyzing processor 1003 connected with the setting voltage value and laser temperature relation processor 1002 and the laser control processor 1005, and obtaining a monitoring temperature threshold range according to a corresponding working setting voltage value of the laser in the working temperature range and a corresponding relation between the setting voltage value and the monitoring temperature; obtaining a target set temperature value of the refrigerator controller according to the monitoring temperature threshold range and a preset target temperature setting strategy; and obtaining the hysteresis temperature range calibrated by the upper limit hysteresis temperature and the lower limit hysteresis temperature based on the target set temperature value.
The refrigerator control processor 1004 is connected to the relationship processor 1001 for setting voltage value and output voltage value, the relationship processor 1002 for setting voltage value and laser temperature, and the refrigerator controller 1006, sets a target set temperature value as a target monitoring temperature reported by the refrigerator controller, obtains a target set voltage value according to the target monitoring temperature, obtains a target output voltage value according to the target set voltage value, and outputs the target output voltage value to the refrigerator controller 1006.
And the laser control processor 1005 is connected with the hysteresis temperature range analysis processor 1003, the refrigerator controller 1006 and the laser 1007, detects the working real-time temperature of the laser in real time, and starts the laser when the real-time temperature is within the hysteresis temperature range.
In some optional embodiments, as shown in fig. 11, a schematic structural diagram of an apparatus 1100 for wdm-stabilized wavelength control of a second laser in this embodiment is different from that in fig. 10, and further includes: the laser shutdown processor 1101 is connected with the hysteresis temperature range analysis processor 1003 and the laser 1007, and obtains a limited temperature range calibrated by the laser upper limit temperature and the laser lower limit temperature based on the target set temperature value and the laser temperature limiting strategy.
And detecting the working real-time temperature of the laser in real time, and turning off the laser when the real-time temperature exceeds the limited temperature range.
In some optional embodiments, as shown in fig. 12, which is a schematic structural diagram of an apparatus 1200 for wdm stabilized wavelength control of a third laser in this embodiment, different from fig. 10, a processor 1002 for setting a relationship between a voltage value and a laser temperature includes: a set voltage value and laser temperature detection unit 1201, a set voltage value and laser temperature analysis unit 1202, and a set voltage value and monitored temperature relationship processing unit 1203.
The setting voltage value and laser temperature detection unit 1201 is connected to the setting voltage value and laser temperature analysis unit 1202 and the setting voltage value and monitored temperature relationship processing unit 1203, and detects the setting corresponding temperature of the laser at the setting voltage value.
A set voltage value and laser temperature analysis unit 1202, a set voltage value and laser temperature detection unit 1201 and a refrigerator control processor 1004, and a1*VSET 3+b1*VSET 2+c1*VSET+d1Obtaining the corresponding relation between the set voltage value and the set corresponding temperature, wherein Temp is the set corresponding temperature, VSETTo set the voltage value, a1、b1、c1And d1Are coefficients.
The set voltage value and monitored temperature relation processing unit 1203 is connected to the set voltage value and laser temperature detection unit 1201 and the refrigerator control processor 1004, and detects the monitored temperature reported by the refrigerator controller under the set voltage value within the working temperature range to obtain the corresponding relation between the set voltage value and the monitored temperature.
In some optional embodiments, as shown in fig. 13, which is a schematic structural diagram of an apparatus 1300 for wdm stabilized wavelength control of a third laser in this embodiment, different from fig. 10, a processor 1002 for setting a relationship between a voltage value and a laser temperature includes: a setting voltage value and setting corresponding temperature relation processing unit 1301, a setting voltage value and monitoring temperature detecting unit 1302, and a setting voltage value and monitoring temperature analyzing unit 1303.
The processing unit 1301 for setting the voltage value and the temperature corresponding to the setting is connected to the refrigerator control processor 1004, and detects the temperature corresponding to the setting of the laser at the set voltage value, and obtains the corresponding relationship between the set voltage value and the temperature corresponding to the setting.
The set voltage value and monitoring temperature detecting unit 1302 is connected to the set voltage value and monitoring temperature analyzing unit 1303, and detects the monitoring temperature reported by the refrigerator controller under the set voltage value within the working temperature range.
A set voltage value and monitor temperature analyzing unit 1303 connected to the set voltage value and monitor temperature detecting unit 1302 and the refrigerator control processor 1004 according to VSET=a2*Tm 2+b2*Tm+c2Obtaining the corresponding relation between the set voltage value and the monitored temperature, wherein VSETTo set the voltage value, TmTo monitor the temperature, a2、b2And c2Are coefficients.
In some optional embodiments, as shown in fig. 14, which is a schematic structural diagram of an apparatus 1400 for wdm-stabilized wavelength control of a third laser in this embodiment, different from fig. 10, the hysteretic temperature range analyzing processor 1003 includes: a monitoring temperature threshold range analysis processing unit 1401, a target set temperature value analysis processing unit 1402, and a hysteresis temperature range analysis processing unit 1403.
The monitoring temperature threshold range analysis processing unit 1401 is connected to the setting voltage value and laser temperature relation processor 1002 and the target setting temperature value analysis processing unit 1402, and obtains the monitoring temperature threshold range according to the corresponding working setting voltage value of the laser in the working temperature range and the corresponding relation between the setting voltage value and the monitoring temperature.
And a target set temperature value analyzing and processing unit 1402 connected to the monitoring temperature threshold range analyzing and processing unit 1401 and the hysteresis temperature range analyzing and processing unit 1403, and obtaining a target set temperature value of the refrigerator controller according to an average temperature value of temperature values at both ends of the monitoring temperature threshold range.
A hysteresis temperature range analyzing and processing unit 1403 connected to the target set temperature value analyzing and processing unit 1402 and the laser control processor 1005, and configured to obtain an upper limit hysteresis temperature based on the target set temperature value and the hysteresis temperature compensation value; subtracting a hysteresis temperature compensation value to obtain a lower limit hysteresis temperature based on the target set temperature value; the temperature range between the upper limit hysteresis temperature and the lower limit hysteresis temperature is taken as the hysteresis temperature range.
The method and the device for controlling the dense wavelength division multiplexing stable wavelength of the laser in the embodiment have the following beneficial effects that:
(1) the method and the device for controlling the dense wavelength division multiplexing stable wavelength of the laser have the advantages that the dense wavelength division multiplexing DWDM wavelength of the laser with refrigeration is stably controlled, the EML working wavelength of the laser can be guaranteed to be within +/-0.02 nm, and the problem of optical crosstalk between DWDM channels is effectively solved.
(2) The method and the device for controlling the dense wavelength division multiplexing stable wavelength of the laser have simple and practical thought, and can effectively ensure the rapid and stable wavelength of the laser when the laser is cold started in various working environments.
(3) The method and apparatus for wavelength control stabilization of laser dense wavelength division multiplexing of the present embodiment,
while the preferred embodiments of the present application have been described, additional variations and modifications in those embodiments may occur to those skilled in the art once they learn of the basic inventive concepts. Therefore, it is intended that the appended claims be interpreted as including preferred embodiments and all alterations and modifications as fall within the scope of the application. It will be apparent to those skilled in the art that various changes and modifications may be made in the present application without departing from the spirit and scope of the application. Thus, if such modifications and variations of the present application fall within the scope of the claims of the present application and their equivalents, the present application is intended to include such modifications and variations as well.