CN110082011A - A kind of multistage dynamometry location displacement sensor - Google Patents
A kind of multistage dynamometry location displacement sensor Download PDFInfo
- Publication number
- CN110082011A CN110082011A CN201910277419.4A CN201910277419A CN110082011A CN 110082011 A CN110082011 A CN 110082011A CN 201910277419 A CN201910277419 A CN 201910277419A CN 110082011 A CN110082011 A CN 110082011A
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- Prior art keywords
- cantilever beam
- dynamometry
- multistage
- level
- strain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B5/00—Measuring arrangements characterised by the use of mechanical techniques
- G01B5/02—Measuring arrangements characterised by the use of mechanical techniques for measuring length, width or thickness
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
- G01L1/2206—Special supports with preselected places to mount the resistance strain gauges; Mounting of supports
- G01L1/2218—Special supports with preselected places to mount the resistance strain gauges; Mounting of supports the supports being of the column type, e.g. cylindric, adapted for measuring a force along a single direction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
- G01L1/225—Measuring circuits therefor
- G01L1/2262—Measuring circuits therefor involving simple electrical bridges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
- G01L1/2268—Arrangements for correcting or for compensating unwanted effects
- G01L1/2281—Arrangements for correcting or for compensating unwanted effects for temperature variations
Abstract
The invention discloses a kind of multistage dynamometry location displacement sensors, are incuded using multi stage resilient body, by the way that power is dispersed in each elastomer come range extension；And select structure simple, it is easy to process, with higher sensitivity cantilever beam improves sensitivity, the measurement of various precision can be adapted to by changing geometry and the material of cantilever beam, it is limited compared to general load cell by proportional limit, precision is improved by using special material, this multistage dynamometry location displacement sensor improves precision by changing structure can be easier.By means of the invention it is possible to accomplish range extension from the change of structure, improve precision, reduce error, additionally it is possible to guarantee precision simultaneously in the case where large range measuring, be not only simple in structure, easy to operate and requirement to material is not also high.
Description
Technical field
The present invention relates to mechanics sensor fields, more particularly to a kind of multistage dynamometry location displacement sensor.
Background technique
Load cell is the elastomer by generating deformation after stress, and can incude the resistance strain gage of this deformation quantity
The bridge circuit (such as Wheatstone bridge) of composition, and fixed be pasted on elastomer of resistance strain gage can simultaneously be conducted strain
The three parts composition such as the adhesive of amount and the sealant for protecting electronic circuit.
Most common load cell is piezoresistive pressure sensor, and resistance strain gage is pressure resistance type strain transducer
One of chief component, the working principle of metal resistance strain gauge is to be adsorbed on basis material strain resistor with mechanical shape
The phenomenon that becoming and generating change in resistance is commonly called as resistance strain effect.In addition, either ceramic pressure sensor, spreads silicon pressure
The common load cell such as force snesor or diffusion silicon pressure sensor is also all based on resistance strain effect manufacture.
The synthesis precision of load cell is by displacement errors, sensitivity error, linearity error and hysteresis error four
The influence of factor.Displacement errors are the common biographies as caused by pressure sensor vertical shift in entire pressure limit
Sensor cannot be guaranteed power perpendicular acting in dynamometry at its center, so as to cause displacement errors.High-precision sensor in order to
Reduce sensitivity error and linearity error, frequently with special conductor sensitivity original part or substrate, it is not only higher to material requirements and
It is expensive, it is also very high to the requirement on machining accuracy of sensor entirety.In addition, existing load cell not can be carried out greatly mostly
Range measurement, that is, allow to can not have very high precision in the case where guaranteeing wide range.
Summary of the invention
The purpose of the present invention is provide a kind of multistage dynamometry displacement biography to solve above-mentioned the deficiencies in the prior art place
Sensor.
In order to solve the above technical problems, one technical scheme adopted by the invention is that: a kind of multistage dynamometry displacement is provided
Sensor, comprising: multistage cantilever beam, parallel equidistant arranged symmetrically, every two cantilever beam is set in same level, setting
For same level-one cantilever beam；The first end of every two cantilever beams of level-one is to be fixed on the fixing end of frame-type rack inner sidewall, cantilever beam
A foil gauge is respectively set in position close to first end, and second end is free end, and column is set to frame-type carriage center position, and
With the free end in contact of two cantilever beams of every level-one；Column and the position of every two free end in contact of level-one cantilever beam are set respectively
A power transmission nut is set, to keep column and the relative position of every level-one cantilever beam to fix；One strain bottom of bottom of the frame center setting
The foil gauge that two groups of vertical symmetries are distributed is arranged in column, strain foundation side wall；It is opposite with column one end at the top of the strain foundation to set
It sets, the effect platform of an applied force is fixedly installed in the column other end, by driving column mobile, making to effect platform applied force
Every level-one cantilever beam generates deformation, and contacts column with strain foundation, passes through the strain being arranged on cantilever beam and strain foundation
The data that piece generates carry out pressure measurement.
Wherein, each foil gauge accesses circuit by a quarter ridge method, to carry out reading data.
Wherein, the first end of each cantilever beam is fixed on rack inner sidewall by way of welding or grafting, and foil gauge is logical
The mode for crossing welding or bonding is fixed on cantilever beam and strain foundation.
Wherein, a graduated scale is fixed on power transmission platform, and one reference line is set on rack top to measure power transmission platform i.e.
The displacement generated by dynamometry.
Wherein, a temperature-compensating foil gauge is set in gantry base, with the foil gauge composition four being fixed on cantilever beam
/ mono- bridge.
Wherein, the reading strain for reading two foil gauges on every level-one cantilever beam calculates the pressure on every level-one cantilever beam
Power reads the reading of foil gauge on strain foundation, calculates the pressure on strain foundation, the every level-one that will be calculated by formula
The pressure value of cantilever beam is added with the pressure value of strain foundation, obtains the pressure value for being applied to effect platform.
Wherein, temperature-compensating foil gauge accesses 1/4 bridge, for every level-one cantilever beam and strain foundation foil gauge registration
It is modified.
It is different from the prior art, multistage dynamometry location displacement sensor of the invention is incuded using multi stage resilient body, is passed through
Power is dispersed in each elastomer and carrys out range extension；And select structure simple, easy to process, with higher sensitivity cantilever beam comes
Sensitivity is improved, the measurement of various precision can be adapted to by changing geometry and the material of cantilever beam, be surveyed compared to general
Force snesor is limited by proportional limit, and precision, this multistage dynamometry location displacement sensor are improved by using special material
Improving precision by changing structure can be easier.By means of the invention it is possible to accomplish range extension from the change of structure, mention
In high precision, reduce error, additionally it is possible to guarantee precision simultaneously in the case where large range measuring, is not only simple in structure, it is easy to operate
And the requirement to material is not also high.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of multistage dynamometry location displacement sensor provided by the invention.
Fig. 2 is a kind of structural schematic diagram of 1/4 bridge of multistage dynamometry location displacement sensor provided by the invention.
Specific embodiment
In the following description, numerous specific details are set forth in order to facilitate a full understanding of the present invention.But the present invention can be with
Much it is different from other way described herein to implement, those skilled in the art can be without prejudice to intension of the present invention the case where
Under do similar popularization, therefore the present invention is not limited to the specific embodiments disclosed below.
Secondly, the present invention is described in detail using schematic diagram, when describing the embodiments of the present invention, for purposes of illustration only, showing
It is intended to be example, the scope of protection of the invention should not be limited herein.
Refering to fig. 1, Fig. 1 is a kind of structural schematic diagram of multistage dynamometry location displacement sensor provided by the invention.Include:
Multistage cantilever beam 3, parallel equidistant arranged symmetrically, every two cantilever beam 3 is set in same level, is set as same
Grade cantilever beam；The first end of every two cantilever beams 3 of level-one is to be fixed on the fixing end of 9 inner sidewall of frame-type rack, and cantilever beam 3 is close
A foil gauge 7 is respectively set in the position of first end, and second end is free end, and column 6 is set to 9 center of frame-type bracket, and
With the free end in contact of two cantilever beams 3 of every level-one；The position of column 6 and every 3 two free end in contact of level-one cantilever beam point
One power transmission nut 4 is not set, to keep column 6 and the relative position of every level-one cantilever beam 3 to fix；The setting of 9 center of bottom of the frame
The foil gauge 7 that two groups of vertical symmetries are distributed is arranged in one strain foundation 8, strain 8 side wall of foundation；Strain 8 top of foundation and column 6 one
End is oppositely arranged, and the effect platform 5 of an applied force is fixedly installed in 6 other end of column, by driving to effect 5 applied force of platform
Column 6 is mobile, and every level-one cantilever beam 3 is made to generate deformation, and contacts column 6 with strain foundation 8, passes through cantilever beam 3 and strain
The data that the foil gauge 7 being arranged on foundation 8 generates carry out pressure measurement.
Wherein, each foil gauge 7 accesses circuit by a quarter ridge method, to carry out reading data.
Wherein, the first end of each cantilever beam 3 is fixed on 9 inner sidewall of frame-type rack by way of welding or grafting, answers
Become piece 7 to be fixed on by way of welding or being bonded on cantilever beam 3 and strain foundation 8.
Wherein, a graduated scale 2 is fixed on power transmission platform 5, and one reference line 1 is set on 9 top of frame-type rack to measure quilt
The displacement that dynamometry generates.
Wherein, a temperature-compensating foil gauge 10 is set in gantry base 9, be fixed on cantilever beam 37 groups of foil gauge
At a quarter bridge.
Wherein, the reading strain for reading two foil gauges on every level-one cantilever beam 3 calculates on every level-one cantilever beam 3
Pressure reads the reading of foil gauge 7 on strain foundation 8, the pressure on strain foundation 7 is calculated by formula, by what is be calculated
The pressure value of every level-one cantilever beam 3 is added with the pressure value of strain foundation 8, obtains the pressure value for being applied to effect platform 5.
Wherein, temperature-compensating foil gauge 10 accesses 1/4 bridge, for the strain to every level-one cantilever beam 3 and strain foundation 8
7 registration of piece is modified.Company between temperature-compensating foil gauge 10 and the foil gauge 7 being set on cantilever beam 3 and strain foundation 8
It is as shown in Figure 2 to connect relationship.
Specifically, foil gauge 7 is fixed on cantilever beam 3 and strain foundation 8 hot melt adhesive in a manner of being bonded.In this hair
In bright, the quantity of cantilever beam 3 is set as 3, then the foil gauge being set on cantilever beam 3 is 6, and number is 1-6 respectively；Strain
The foil gauge quantity being arranged on foundation 8 is 2, and number is 7 and 8.By reading the reading strain of each foil gauge, respectively indicate
For ε1-ε8.Relationship existing for the strain value and load of each foil gauge on cantilever beam 3 is as shown in Equation (1):
(1)
Wherein, b is the width of cantilever beam section, and h is the height of cantilever beam section, and F is load, and a is girder cantilever beam end to answering
Become the distance of piece, it is 210GPa that E is taken in the present invention.
Straining strain value and the load of the foil gauge on foundation 8, that there are relationships is as shown in Equation (2):
(2)
Then in three-level cantilever beam, the pressure on every level-one cantilever beam is respectively as follows:
Straining the pressure value on foundation 8 in cylinder is
Load can finally be obtained。
By applying different size of pressure on effect platform 5, by the relationship of strain value and pressure value, in column 6
The part stretched out outside top cover 10 carries out scale.When no pressure is applied, the position opposite with 10 outer surface of top cover of column 6
It sets as zero graduation line, using zero graduation line as starting point, scale is set on column 6, by applying different size to effect platform 5
Pressure current pressure values size is calculated when the scale on column 6 is aligned with top cover 10, by pressure value mark in vertical
On column 6, to complete scale.
It is different from the prior art, multistage dynamometry location displacement sensor of the invention is incuded using multi stage resilient body, is passed through
Power is dispersed in each elastomer and carrys out range extension；And select structure simple, easy to process, with higher sensitivity cantilever beam comes
Sensitivity is improved, the measurement of various precision can be adapted to by changing geometry and the material of cantilever beam, be surveyed compared to general
Force snesor is limited by proportional limit, and precision, this multistage dynamometry location displacement sensor are improved by using special material
Improving precision by changing structure can be easier.By means of the invention it is possible to accomplish range extension from the change of structure, mention
In high precision, reduce error, additionally it is possible to guarantee precision simultaneously in the case where large range measuring, is not only simple in structure, it is easy to operate
And the requirement to material is not also high.
Although the invention has been described by way of example and in terms of the preferred embodiments, but it is not for limiting the present invention, any this field
Technical staff without departing from the spirit and scope of the present invention, may be by the methods and technical content of the disclosure above to this hair
Bright technical solution makes possible variation and modification, therefore, anything that does not depart from the technical scheme of the invention, and according to the present invention
Technical spirit any simple modifications, equivalents, and modifications to the above embodiments, belong to technical solution of the present invention
Protection scope.
Claims (7)
1. a kind of multistage dynamometry location displacement sensor characterized by comprising
Multistage cantilever beam, parallel equidistant arranged symmetrically, every two cantilever beam is set in same level, is set as same level-one
Cantilever beam；The first end of every two cantilever beams of level-one is to be fixed on the fixing end of frame-type rack inner sidewall, and cantilever beam is close to first
The position at end is respectively set a foil gauge, and second end is free end, and column is set to frame-type carriage center position, and with every level-one
Two cantilever beams free end in contact；A power transmission is respectively set in the position of column and every two free end in contact of level-one cantilever beam
Nut, to keep column and the relative position of every level-one cantilever beam to fix；One strain foundation of bottom of the frame center setting, strains bottom
The foil gauge that two groups of vertical symmetries are distributed is arranged in column side wall；It is oppositely arranged at the top of the strain foundation with column one end, column is another
The effect platform of an applied force is fixedly installed in one end, by driving column mobile, making every level-one cantilever to effect platform applied force
Beam generates deformation, and contacts column with strain foundation, the number generated by the foil gauge being arranged on cantilever beam and strain foundation
According to progress pressure measurement；
Meanwhile a graduated scale is fixed on power transmission platform, it is i.e. tested to measure power transmission platform that a reference line is arranged on rack top
The displacement that power generates.
2. multistage dynamometry location displacement sensor according to claim 1, which is characterized in that each foil gauge by four/
One ridge method accesses circuit, to carry out reading data.
3. multistage dynamometry location displacement sensor according to claim 1, which is characterized in that the first end of each cantilever beam is logical
The mode for crossing welding or grafting is fixed on frame-type rack inner sidewall, and foil gauge is fixed on cantilever beam and strain by way of bonding
On foundation.
4. multistage dynamometry location displacement sensor according to claim 1, which is characterized in that fix a moment on power transmission platform
Ruler is spent, one reference line is set on frame-type rack top to measure the displacement generated by dynamometry.
5. multistage dynamometry location displacement sensor according to claim 2, which is characterized in that a temperature is arranged in gantry base
Dummy gauge is spent, forms a quarter bridge with the foil gauge for being fixed on cantilever beam and strain foundation.
6. multistage dynamometry location displacement sensor according to claim 5, which is characterized in that read on every level-one cantilever beam
The reading strain of two foil gauges calculates the pressure on every level-one cantilever beam, reads the reading of foil gauge on strain foundation, passes through
Formula calculates the pressure on strain foundation, by the pressure value phase of the pressure value for the every level-one cantilever beam being calculated and strain foundation
Add, obtains the pressure value for being applied to effect platform.
7. multistage dynamometry location displacement sensor according to claim 6, which is characterized in that temperature-compensating foil gauge access 1/
4 bridges, for being modified to every level-one cantilever beam and strain foundation foil gauge registration.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910277419.4A CN110082011B (en) | 2019-04-08 | 2019-04-08 | Multi-stage force and displacement measuring sensor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910277419.4A CN110082011B (en) | 2019-04-08 | 2019-04-08 | Multi-stage force and displacement measuring sensor |
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| CN110082011A true CN110082011A (en) | 2019-08-02 |
| CN110082011B CN110082011B (en) | 2021-03-05 |
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| CN201910277419.4A Active CN110082011B (en) | 2019-04-08 | 2019-04-08 | Multi-stage force and displacement measuring sensor |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114046722A (en) * | 2021-10-12 | 2022-02-15 | 中车唐山机车车辆有限公司 | Displacement meter |
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| CN110082011B (en) | 2021-03-05 |
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