CN110055518A - 低压化学气相沉积真空管式炉的柔性衬管 - Google Patents
低压化学气相沉积真空管式炉的柔性衬管 Download PDFInfo
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- CN110055518A CN110055518A CN201910390325.8A CN201910390325A CN110055518A CN 110055518 A CN110055518 A CN 110055518A CN 201910390325 A CN201910390325 A CN 201910390325A CN 110055518 A CN110055518 A CN 110055518A
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- 238000004518 low pressure chemical vapour deposition Methods 0.000 title claims abstract description 27
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000003365 glass fiber Substances 0.000 claims abstract description 16
- 239000010453 quartz Substances 0.000 claims abstract description 14
- 239000012495 reaction gas Substances 0.000 claims abstract description 3
- 238000000151 deposition Methods 0.000 claims description 7
- 230000008021 deposition Effects 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 3
- 239000000919 ceramic Substances 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 238000012423 maintenance Methods 0.000 abstract description 3
- 238000007789 sealing Methods 0.000 abstract description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 238000009958 sewing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
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- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
本发明给出了一种低压化学气相沉积真空管式炉的柔性衬管;包括骨架和石英玻璃纤维,骨架为两端开口的圆管状,骨架的外壁契合低压化学气相沉积真空管式炉的石英管内壁轮廓,骨架设有容纳内孔载片舟的内孔,石英玻璃纤维完全包裹在骨架外壁和内孔侧壁上形成石英玻璃纤维层,石英玻璃纤维层外侧镀有与低压化学气相沉积真空管式炉中反应气体产生的沉积物相同的沉积层。将本柔性衬管套装在低压化学气相沉积真空管式炉的石英管内壁上,沉积物沉积到本低压化学气相沉积真空管式炉的柔性衬管上,可以阻挡沉积物沉积到低压化学气相沉积真空管式炉的石英管上,而且本柔性衬管没有密封要求,便于维护,又易拆装,同时成本节约50%。
Description
技术领域
本发明涉及一种低压化学气相沉积真空管式炉的柔性衬管。
背景技术
在低压化学气相沉积真空管式炉(即LPCVD)工作中,沉积物在沉积到硅片表面同时,也会沉积到低压化学气相沉积真空管式炉的石英管壁上,因腐蚀性或者膨胀系数不同,造成石英管爆管,造成重大损失,同时有安全隐患,同时石英管价格很高,安装维护时也会因操作造成损坏。
发明内容
本发明所要解决的技术问题是提供一种满足替代现有石英管壁的作用、又易安装的低压化学气相沉积真空管式炉的柔性衬管。
为解决上述技术问题,本发明提供了一种低压化学气相沉积真空管式炉的柔性衬管;
包括骨架和石英玻璃纤维,骨架为两端开口的圆管状,骨架的外壁契合低压化学气相沉积真空管式炉的石英管内壁轮廓,骨架设有容纳内孔载片舟的内孔,石英玻璃纤维完全包裹在骨架外壁和内孔侧壁上形成石英玻璃纤维层,石英玻璃纤维层外侧镀有与低压化学气相沉积真空管式炉中反应气体产生的沉积物相同的沉积层。
采用这样的结构后,将本柔性衬管套装在低压化学气相沉积真空管式炉的石英管内壁上,沉积物沉积到本低压化学气相沉积真空管式炉的柔性衬管上,可以阻挡沉积物沉积到低压化学气相沉积真空管式炉的石英管上,而且本柔性衬管没有密封要求,便于维护,又易拆装,同时成本节约50%。
为了更清楚的理解本发明的技术内容,以下将本低压化学气相沉积真空管式炉的柔性衬管简称为本柔性衬管。
本柔性衬管的骨架为网状骨架;采用这样的结构后,骨架结构更合理,更能满足本柔性衬管的设计要求。
本柔性衬管的骨架的材质为金属或者陶瓷;采用这样的结构后,骨架的材质具有轻便、低廉、坚固等优点。
附图说明
图1是本柔性衬管实施例一的结构示意图的剖视图。
图2是本柔性衬管实施例一骨架的立体图。
图3是图1的A部放大图。
具体实施方式
实施例一
如图1至3所示
本柔性衬管包括骨架1和石英玻璃纤维。
骨架1为钢筋网状骨架1,骨架1呈两端开口的圆管状,骨架1的外壁契合低压化学气相沉积真空管式炉的石英管内壁轮廓,骨架1设有容纳内孔载片舟的内孔。
石英玻璃纤维完全包裹在骨架1外壁和内孔侧壁上形成石英玻璃纤维层2,骨架1内、外侧均包裹,骨架1不能有暴露,并且石英玻璃纤维网状骨架1之间通过缝合固定。
使用前,包裹过石英玻璃纤维的骨架1先经过饱和沉积,即根据当前的不同的气相沉积反应,先在低压化学气相沉积真空管式炉内对本柔性衬管进行饱和沉积反应,使石英玻璃纤维层2外壁表面形成沉积物构成的沉积层3,沉积层3完全覆盖石英玻璃纤维表面。
使用时,将本柔性衬管套装在低压化学气相沉积真空管式炉的石英管内壁上,沉积物沉积到本柔性衬管上,可以阻挡沉积物沉积到低压化学气相沉积真空管式炉的石英管上,而且本柔性衬管没有密封要求,便于维护,又易拆装,同时成本节约50%。
实施例二
本实施例与实施一的区别仅在于:本实施例中骨架采用陶瓷材质的网状骨架,也可以达到与实施例一相同的技术效果。
以上所述的仅是本发明的两种实施方式,应当指出,对于本领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以作出若干变型和改进,这些也应视为属于本发明的保护范围。
Claims (3)
1.一种低压化学气相沉积真空管式炉的柔性衬管,其特征为:
包括骨架和石英玻璃纤维,骨架为两端开口的圆管状,骨架的外壁契合低压化学气相沉积真空管式炉的石英管内壁轮廓,骨架设有容纳内孔载片舟的内孔,石英玻璃纤维完全包裹在骨架外壁和内孔侧壁上形成石英玻璃纤维层,石英玻璃纤维层外侧镀有与低压化学气相沉积真空管式炉中反应气体产生的沉积物相同的沉积层。
2.根据权利要求1所述的低压化学气相沉积真空管式炉的柔性衬管,其特征是:
所述的骨架为网状骨架。
3.根据权利要求1所述的低压化学气相沉积真空管式炉的柔性衬管,其特征是:
所述骨架的材质为金属或者陶瓷。
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2228154Y (zh) * | 1995-08-22 | 1996-05-29 | 伍学文 | 含油轴承 |
US6117244A (en) * | 1998-03-24 | 2000-09-12 | Applied Materials, Inc. | Deposition resistant lining for CVD chamber |
US6227140B1 (en) * | 1999-09-23 | 2001-05-08 | Lam Research Corporation | Semiconductor processing equipment having radiant heated ceramic liner |
CN2725623Y (zh) * | 2004-09-09 | 2005-09-14 | 陆杰 | 内置气囊变阻尼后减震器 |
CN209974890U (zh) * | 2019-05-10 | 2020-01-21 | 普乐新能源(蚌埠)有限公司 | 低压化学气相沉积真空管式炉的柔性衬管 |
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- 2019-05-10 CN CN201910390325.8A patent/CN110055518A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2228154Y (zh) * | 1995-08-22 | 1996-05-29 | 伍学文 | 含油轴承 |
US6117244A (en) * | 1998-03-24 | 2000-09-12 | Applied Materials, Inc. | Deposition resistant lining for CVD chamber |
US6227140B1 (en) * | 1999-09-23 | 2001-05-08 | Lam Research Corporation | Semiconductor processing equipment having radiant heated ceramic liner |
CN2725623Y (zh) * | 2004-09-09 | 2005-09-14 | 陆杰 | 内置气囊变阻尼后减震器 |
CN209974890U (zh) * | 2019-05-10 | 2020-01-21 | 普乐新能源(蚌埠)有限公司 | 低压化学气相沉积真空管式炉的柔性衬管 |
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Application publication date: 20190726 |