CN110032041A - Light resistance composition, display panel and preparation method thereof - Google Patents
Light resistance composition, display panel and preparation method thereof Download PDFInfo
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- CN110032041A CN110032041A CN201910375030.3A CN201910375030A CN110032041A CN 110032041 A CN110032041 A CN 110032041A CN 201910375030 A CN201910375030 A CN 201910375030A CN 110032041 A CN110032041 A CN 110032041A
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- light resistance
- hydrophilic radical
- resistance composition
- emulsion
- resin
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
Abstract
The present invention provides a kind of light resistance compositions, display panel and preparation method thereof, the light resistance composition includes resin, emulsion, it include hydrophilic radical in the resin and/or emulsion, the hydrophilic radical makes the light resistance composition have hydrophily, stronger using the photoresistance film of light resistance composition production and the adhesiveness of substrate.The display panel to avoid tackifier are used, can reduce the cost of manufacture of display panel, improve the yields of display panel.
Description
Technical field
The present invention relates to field of display technology, and in particular to a kind of light resistance composition, display panel and preparation method thereof.
Background technique
Photoresist is often used in the processing procedure of display panel and to carry out film layer patterned process formation circuit pattern, generally
Photoresist all has hydrophobicity, and when the substrate of photoresist is hydrophilic material, the adhesiveness of photoresist and substrate is bad, needs in substrate
Surface applies tackifier to enhance the adhesiveness of photoresist and substrate.
But tackifier it is general it is volatile it is inflammable, there is corrosivity and toxicity, harm to the human body is big；And in substrate
Surface, which applies tackifier, will increase the cost of manufacture of display panel.
It can be to avoid light resistance composition, display panel and its system for using tackifier in conclusion it is necessary to provide one kind
Preparation Method.
Summary of the invention
The present invention provides one kind can be to avoid light resistance composition, the display panel and preparation method thereof for using tackifier, can
To reduce the cost of manufacture of display panel, improve the yields of display panel.
The embodiment of the present invention provides a kind of light resistance composition, and the light resistance composition includes resin, emulsion, the resin
And/or include hydrophilic radical in emulsion, the hydrophilic radical makes the light resistance composition have hydrophily.
It in one embodiment, include the hydrophilic radical, the molecular structural formula of the resin in the resin are as follows:Wherein, at least one in described R1, R2 includes the hydrophilic radical, and n is positive integer.
It in one embodiment, include the hydrophilic radical, the molecular structural formula of the emulsion in the emulsion are as follows:Wherein, at least one in described R3, R4 includes the hydrophilic radical.
In one embodiment, in a heated condition, the hydrophilic radical is arranged in the photoresist group to the light resistance composition
Object is closed close to the side of hydroaropic substance.
In one embodiment, the light resistance composition further includes interfacial agent and solvent.
The embodiment of the present invention also provides a kind of display panel, and the display panel includes substrate and is arranged in the substrate
On photoresist layer；
Wherein, the material for preparing of the photoresist layer includes light resistance composition, and the light resistance composition includes resin, photosensitive
Agent includes hydrophilic radical in the resin and/or emulsion, and it is hydrophilic that the hydrophilic radical has the light resistance composition
Property.
It in one embodiment, include the hydrophilic radical, the molecular structural formula of the resin in the resin are as follows:Wherein, at least one in described R1, R2 includes the hydrophilic radical, and n is positive integer.
It in one embodiment, include the hydrophilic radical, the molecular structural formula of the emulsion in the emulsion are as follows:Wherein, at least one in described R3, R4 includes the hydrophilic radical.
In one embodiment, in a heated condition, the hydrophilic radical is arranged in the photoresist group to the light resistance composition
Object is closed close to the side of hydroaropic substance.
In one embodiment, the light resistance composition further includes interfacial agent and solvent.
The embodiment of the present invention also provides a kind of preparation method of display panel, comprising:
Resin, emulsion, interfacial agent and solvent are provided, include hydrophilic radical in the resin and/or emulsion,
The hydrophilic radical has hydrophily；
The resin, emulsion, interfacial agent are mixed with the solvent, form solution；
By the solution coating in substrate surface, photoresistance film is formed；
The photoresistance film is toasted, so that the hydrophilic radical in the resin and/or emulsion is arranged in the light
Film is hindered close to the side of the substrate, to improve the adhesiveness between the photoresistance film and the substrate；
The photoresistance film is developed, photoresist layer is formed.
The present invention provides a kind of light resistance composition, display panel and preparation method thereof, the light resistance composition include resin,
Emulsion includes hydrophilic radical in the resin and/or emulsion, and it is hydrophilic that the hydrophilic radical has light resistance composition
Property.The display panel to avoid tackifier are used, can reduce the cost of manufacture of display panel, improve the non-defective unit of display panel
Rate.
Detailed description of the invention
Below by attached drawing, invention is further explained.It should be noted that the accompanying drawings in the following description is only
Explanation some embodiments of the present invention are only for not make the creative labor for those skilled in the art
Under the premise of, it is also possible to obtain other drawings based on these drawings.
Fig. 1 is a kind of schematic diagram of the cross section structure of display panel provided in an embodiment of the present invention.
Fig. 2 is a kind of flow chart of the preparation method of display panel provided in an embodiment of the present invention.
Fig. 3 is the flow chart of the preparation method of another display panel provided in an embodiment of the present invention.
Fig. 4 is a kind of resin provided in an embodiment of the present invention and the equation that emulsion chemically reacts in developer solution
Formula.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Whole description.Obviously, described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, those skilled in the art's every other implementation obtained without creative efforts
Example, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that, the orientation of instructions such as term " on ", "lower", " right side " " close " or
Positional relationship is to be based on the orientation or positional relationship shown in the drawings, wherein "upper" is surface above object, is referring specifically to generation just
Top, oblique upper, upper surface are ok, as long as occuping on object level, in comparison " close " refers to, with mesh
The smaller side of subject distance, the above orientation or positional relationship is merely for convenience of description of the present invention and simplification of the description, without referring to
Show or imply that signified device or element must have a particular orientation, be constructed and operated in a specific orientation, therefore cannot manage
Solution is limitation of the present invention.
In addition, it should also be noted that, attached drawing offer is only and Relationship Comparison of the present invention close structure and/or step
Suddenly, some and little details of inventive relationship is omitted, it is therefore intended that simplify attached drawing, keeps inventive point very clear, rather than table
Bright device in practice and/or method are exactly and attached drawing is the same, not as the limitation of device in practice and/or method.
The present invention provides a kind of display panel, as shown in Figure 1, the display panel 100 includes substrate 101, is arranged in institute
The photoresist layer 103 stating the substrate 102 on substrate 101 and being arranged on the substrate 102.
Wherein, the substrate 101 can be made as transparent substrate, such as can be using the saturating of including but not limited to glass
Bright material；The composition material of the substrate 102 has hydrophily, such as can be using including but not limited to silica, nitridation
The hydrophilic material of any material in silicon.
Particularly, the present invention also provides a kind of light resistance composition, the light resistance composition can be used for preparing the display
The photoresist layer 103 of panel 100, the light resistance composition can be positivity photoresist, be also possible to negativity photoresist, the photoresist
Composition includes resin, emulsion, includes hydrophilic radical in the resin and/or emulsion, and the hydrophilic radical makes described
Light resistance composition has hydrophily.
Wherein, the hydrophilic radical may include carboxylic acid group, sulfonic group, phosphate, amino, quaternary ammonium group, ether, carboxylic acid
At least one of ester, block polyether.
Further, the hydrophilic radical has photosensitivity, such as: the light resistance composition in a heated condition, institute
It states hydrophilic radical and is arranged in the light resistance composition close to the side of hydroaropic substance, so that the light resistance composition and hydrophily
Adhesion strength enhancing between substance.
When in the resin including the hydrophilic radical, including but not limited to following embodiment:
In one embodiment, the molecular structural formula of the resin are as follows:Wherein, the R1,
R2 can be the hydrophilic radical or be the side chain for including the hydrophilic radical, and n is positive integer.
Replaceable, the R1 can be arbitrarily to be connected directly between in the resinous molecular structure formulaOn
Hydrophilic radical or side chain including the hydrophilic radical；The R2 can be arbitrarily to be indirectly coupled to the resinous molecular structure
In formulaOn hydrophilic radical or side chain including the hydrophilic radical.Such as the R1 and/or R2 can be with certain
One with hydrophilic functional group or for the carbon long-chain with a certain hydrophilic functional group or be taking for a certain hydrogen atom
The single alkane CB of the hydrophilic functional group of Dai Jiwei, wherein C is center carbon atom, and B is to connect with the central carbon atom
The general name of other " non-central carbon atoms ".
It in one embodiment, may include R1 or R2 in the molecular structural formula of the resin.
It in one embodiment, may include R1 and/or multiple R2 in the molecular structural formula of the resin.
It in one embodiment, may include multiple R1 and/or R2 in the molecular structural formula of the resin.
It in one embodiment, may include multiple R1 and/or multiple R2 in the molecular structural formula of the resin.
When in the emulsion including the hydrophilic radical, including but not limited to following embodiment:
In one embodiment, the molecular structural formula of the emulsion are as follows:Wherein, institute
Stating emulsion includes the first phenyl ring and the second phenyl ring on the right side of first phenyl ring, and described R3, R4 can be described hydrophilic
Group is the side chain for including the hydrophilic radical.
Replaceable, the R3 can be the hydrophilic group being arbitrarily connected directly between on first phenyl ring or the second phenyl ring
Group or the side chain including the hydrophilic radical；The R4 can be arbitrarily to be indirectly coupled to first phenyl ring or the second benzene
Hydrophilic radical on ring or the side chain including the hydrophilic radical.Such as the R3 and/or R4 a certain can have hydrophily
Functional group or for the carbon long-chain with a certain hydrophilic functional group or be the substituent group of a certain hydrogen atom be hydrophily
Functional group single alkane CB, wherein C be center carbon atom, B is other " the non-central carbon connecting with the central carbon atom
The general name of atom ".
It in one embodiment, may include described in one described R3 or one in the molecular structural formula of the emulsion
R4。
It in one embodiment, may include the R3 in the molecular structural formula of the emulsion and/or multiple described
R4。
It in one embodiment, may include described in multiple described R3 and/or one in the molecular structural formula of the emulsion
R4。
It in one embodiment, may include multiple R3 in the molecular structural formula of the emulsion and/or multiple described
R4。
In one embodiment, the light resistance composition further includes interfacial agent and solvent.The interfacial agent can
So that significant change occurs for the interface state of its solution system, the interfacial agent has fixed hydrophilic radical and oleophylic
Group, the hydrophilic radical and lipophilic group of the fixation can be arranged in the surface orientation of its solution；The solvent can be adopted
With organic solvent, such as it can include but is not limited to styrene, perchloroethylene, trichloro ethylene, ethylene glycol ether, triethanolamine
At least one of.
The present invention also provides a kind of preparation methods of display panel, as shown in Fig. 2, including the following steps:
S101: providing resin, emulsion, interfacial agent and solvent, includes hydrophilic in the resin and/or emulsion
Group, the hydrophilic radical have hydrophily.
Wherein, the hydrophilic radical include carboxylic acid group, it is sulfonic group, phosphate, amino, quaternary ammonium group, ether, carboxylate, embedding
At least one of section polyethers.
Further, the hydrophilic radical has photosensitivity, such as: the light resistance composition in a heated condition, institute
It states hydrophilic radical and is arranged in the light resistance composition close to the side of hydroaropic substance, so that the light resistance composition and hydrophily
Adhesion strength enhancing between substance.
When in the resin including the hydrophilic radical, including but not limited to following embodiment:
In one embodiment, the molecular structural formula of the resin are as follows:Wherein, the R1,
R2 can be the hydrophilic radical or be the side chain for including the hydrophilic radical, and n is positive integer.
Replaceable, the R1 can be arbitrarily to be connected directly between in the resinous molecular structure formulaOn
Hydrophilic radical or side chain including the hydrophilic radical；The R2 can be arbitrarily to be indirectly coupled to the resinous molecular structure
In formulaOn hydrophilic radical or side chain including the hydrophilic radical.Such as the R1 and/or R2 can be with certain
One with hydrophilic functional group or for the carbon long-chain with a certain hydrophilic functional group or be taking for a certain hydrogen atom
The single alkane CB of the hydrophilic functional group of Dai Jiwei, wherein C is center carbon atom, and B is to connect with the central carbon atom
The general name of other " non-central carbon atoms ".
It in one embodiment, may include R1 or R2 in the molecular structural formula of the resin.
It in one embodiment, may include R1 and/or multiple R2 in the molecular structural formula of the resin.
It in one embodiment, may include multiple R1 and/or R2 in the molecular structural formula of the resin.
It in one embodiment, may include multiple R1 and/or multiple R2 in the molecular structural formula of the resin.
When in the emulsion including the hydrophilic radical, including but not limited to following embodiment:
In one embodiment, the molecular structural formula of the emulsion are as follows:Wherein, institute
Stating emulsion includes the first phenyl ring and the second phenyl ring on the right side of first phenyl ring, and described R3, R4 can be described hydrophilic
Group is the side chain for including the hydrophilic radical.
Replaceable, the R3 can be the hydrophilic group being arbitrarily connected directly between on first phenyl ring or the second phenyl ring
Group or the side chain including the hydrophilic radical；The R4 can be arbitrarily to be indirectly coupled to first phenyl ring or the second benzene
Hydrophilic radical on ring or the side chain including the hydrophilic radical.Such as the R3 and/or R4 a certain can have hydrophily
Functional group or for the carbon long-chain with a certain hydrophilic functional group or be the substituent group of a certain hydrogen atom be hydrophily
Functional group single alkane CB, wherein C be center carbon atom, B is other " the non-central carbon connecting with the central carbon atom
The general name of atom ".
It in one embodiment, may include described in one described R3 or one in the molecular structural formula of the emulsion
R4。
It in one embodiment, may include the R3 in the molecular structural formula of the emulsion and/or multiple described
R4。
It in one embodiment, may include described in multiple described R3 and/or one in the molecular structural formula of the emulsion
R4。
It in one embodiment, may include multiple R3 in the molecular structural formula of the emulsion and/or multiple described
R4。
S102: the resin, emulsion, interfacial agent are mixed with the solvent, form solution.
Wherein, the interfacial agent can make the interface state of its solution system that significant change, the interfacial activity occur
Agent has fixed hydrophilic radical and lipophilic group, and the hydrophilic radical and lipophilic group of the fixation can be in its solution
Surface orientation arrangement；The solvent generally uses organic solvent, such as can include but is not limited to styrene, perchloroethylene, three
Vinyl chloride, ethylene glycol ether, triethanolamine.
S103: by the solution coating in substrate surface, photoresistance film is formed.
Wherein, the composition material of the substrate has hydrophily, such as can be using including but not limited to silica, nitrogen
The hydrophilic material of SiClx.
It should be noted that further including cleaning to the substrate before being coated with the solution, coating can be passed through
The solution coating in substrate surface, is guaranteed that the solution can be coated with uniformly by machine.
S104: the photoresistance film is toasted, so that the hydrophilic radical in the resin and/or emulsion is arranged in institute
Photoresistance film is stated close to the side of the substrate, to improve the adhesiveness between the photoresistance film and the substrate.
It should be noted that further including to the institute for being coated with the photoresist before being toasted the photoresistance film
It states substrate to be dried in vacuo, tentatively reduces the solvent composition in the photoresistance film, reduce the mobility of the photoresistance film.
Wherein, the baking can be with reference to prebake conditions in the prior art before exposure, herein directly by existing
There is prebake conditions process intrinsic in technology, reduces the cost for preparing display panel.
S105: the photoresistance film is developed, and forms photoresist layer.
In one embodiment, as shown in figure 3, the step S105 can specifically include following steps:
S1051: being exposed the photoresistance film, the emulsion of exposure regionHair
Raw decomposition reaction, generates acid groupIt encounters water and further generates acid
Wherein it is possible to the dominant wavelength of the light issued using high-pressure sodium lamp as the exposure light source, the high-pressure sodium lamp
For 365nm, the exposure can be 1 minute.
S1052: the photoresistance film after the exposure being developed, hard baking, the resin of non-exposed areaWith the emulsionReaction generates polymer, the polymerization
The molecular structural formula of object are as follows:Form the photoresist layer.
Wherein, the resin and the emulsion chemically react in developer solution MOH equation as shown in figure 4,
The developer solution MOH can be not limited to potassium hydroxide, sodium hydroxide, tetramethylammonium hydroxide alkaline solution.
It should be understood that the emulsion end reaction of exposure region generates acidic materials in S1051And developer solution MOH be alkaline solution, therefore the emulsion of exposure region eventually with development
Liquid occurs neutralization reaction and generates water, and is removed.
As shown in figure 4, in the environment of the developer solution, the emulsion that is not exposedAdd to the resin not being exposedOn, and it is described
- OH in developer solution MOH is reacted with-the H of-the OH in the resin generates water, so that the M atom is instead of in the resin
- OH-H.During the development, the hydrophilic group or side chain R1, R2, R3, R4 comprising the hydrophilic group are simultaneously
It is not engaged in chemical reaction, however it remains in Yu Suoshu polymer, and in the hard-baking process in later period, the hydrophilic group
Or side chain R1, R2, R3, R4 comprising the hydrophilic group still can be arranged in the photoresistance film close to the one of the substrate
Side, therefore the photoresistance film still has hydrophily.
The present invention provides a kind of light resistance composition, display panel and preparation method thereof, the light resistance composition include resin,
Emulsion includes hydrophilic radical in the resin and/or emulsion, and it is hydrophilic that the hydrophilic radical has light resistance composition
Property.The display panel to avoid tackifier are used, can reduce the cost of manufacture of display panel, improve the non-defective unit of display panel
Rate.
A kind of light resistance composition, display panel and preparation method thereof is provided for the embodiments of the invention above to have carried out in detail
Thin to introduce, used herein a specific example illustrates the principle and implementation of the invention, and above embodiments are said
It is bright to be merely used to help understand technical solution of the present invention and its core concept；Those skilled in the art should understand that:
It is still possible to modify the technical solutions described in the foregoing embodiments, or part of technical characteristic is carried out etc.
With replacement；And these are modified or replaceed, the technical side for various embodiments of the present invention that it does not separate the essence of the corresponding technical solution
The range of case.
Claims (11)
1. a kind of light resistance composition, which is characterized in that the light resistance composition includes resin, emulsion, the resin and/or sense
It include hydrophilic radical in photo etching, the hydrophilic radical makes the light resistance composition have hydrophily.
2. light resistance composition as described in claim 1, which is characterized in that it include the hydrophilic radical in the resin, it is described
The molecular structural formula of resin are as follows:Wherein, at least one in described R1, R2 includes the parent
Water base group, n are positive integer.
3. light resistance composition as described in claim 1, which is characterized in that include the hydrophilic radical, institute in the emulsion
State the molecular structural formula of emulsion are as follows:Wherein, at least one in described R3, R4 includes
The hydrophilic radical.
4. light resistance composition as described in claim 1, which is characterized in that the light resistance composition is in a heated condition, described
Hydrophilic radical is arranged in the light resistance composition close to the side of hydroaropic substance.
5. light resistance composition as described in claim 1, which is characterized in that the light resistance composition further include interfacial agent with
And solvent.
6. a kind of display panel, which is characterized in that the display panel includes the photoresist of substrate and setting over the substrate
Layer；
Wherein, the material for preparing of the photoresist layer includes light resistance composition, and the light resistance composition includes resin, emulsion, institute
It states comprising hydrophilic radical in resin and/or emulsion, the hydrophilic radical makes the light resistance composition have hydrophily.
7. display panel as claimed in claim 6, which is characterized in that include the hydrophilic radical, the tree in the resin
The molecular structural formula of rouge are as follows:Wherein, at least one in described R1, R2 includes described hydrophilic
Group, n are positive integer.
8. display panel as claimed in claim 6, which is characterized in that it include the hydrophilic radical in the emulsion, it is described
The molecular structural formula of emulsion are as follows:Wherein, at least one in described R3, R4 includes institute
State hydrophilic radical.
9. display panel as claimed in claim 6, which is characterized in that the light resistance composition in a heated condition, the parent
Water base group is arranged in the light resistance composition close to the side of hydroaropic substance.
10. display panel as claimed in claim 6, which is characterized in that the light resistance composition further include interfacial agent with
And solvent.
11. a kind of preparation method of display panel characterized by comprising
Resin, emulsion, interfacial agent and solvent are provided, they include hydrophilic radical in the resin and/or emulsion, and it is described
Hydrophilic radical has hydrophily；
The resin, emulsion, interfacial agent are mixed with the solvent, form solution；
By the solution coating in substrate surface, photoresistance film is formed；
The photoresistance film is toasted, so that the hydrophilic radical in the resin and/or emulsion is arranged in the photoresistance film
Close to the side of the substrate, to improve the adhesiveness between the photoresistance film and the substrate；
The photoresistance film is developed, photoresist layer is formed.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910375030.3A CN110032041B (en) | 2019-05-07 | 2019-05-07 | Photoresist composition, display panel and preparation method thereof |
| PCT/CN2019/099339 WO2020224071A1 (en) | 2019-05-07 | 2019-08-06 | Photoresist composition, display panel and preparation method therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910375030.3A CN110032041B (en) | 2019-05-07 | 2019-05-07 | Photoresist composition, display panel and preparation method thereof |
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| Publication Number | Publication Date |
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| CN110032041A true CN110032041A (en) | 2019-07-19 |
| CN110032041B CN110032041B (en) | 2020-11-10 |
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| WO (1) | WO2020224071A1 (en) |
Cited By (1)
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| WO2020224071A1 (en) * | 2019-05-07 | 2020-11-12 | 深圳市华星光电半导体显示技术有限公司 | Photoresist composition, display panel and preparation method therefor |
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Also Published As
| Publication number | Publication date |
|---|---|
| WO2020224071A1 (en) | 2020-11-12 |
| CN110032041B (en) | 2020-11-10 |
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