CN109984523A - A kind of down-filling is uniformly and the Double-layer eiderdown quilt of back side Sutureless - Google Patents

A kind of down-filling is uniformly and the Double-layer eiderdown quilt of back side Sutureless Download PDF

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Publication number
CN109984523A
CN109984523A CN201910229627.7A CN201910229627A CN109984523A CN 109984523 A CN109984523 A CN 109984523A CN 201910229627 A CN201910229627 A CN 201910229627A CN 109984523 A CN109984523 A CN 109984523A
Authority
CN
China
Prior art keywords
eiderdown quilt
chain tooth
double
back side
uniformly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201910229627.7A
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Chinese (zh)
Inventor
何玲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ESTEEM HOME TEXTILE Co Ltd
Original Assignee
ESTEEM HOME TEXTILE Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ESTEEM HOME TEXTILE Co Ltd filed Critical ESTEEM HOME TEXTILE Co Ltd
Priority to CN201910229627.7A priority Critical patent/CN109984523A/en
Publication of CN109984523A publication Critical patent/CN109984523A/en
Pending legal-status Critical Current

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Classifications

    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47GHOUSEHOLD OR TABLE EQUIPMENT
    • A47G9/00Bed-covers; Counterpanes; Travelling rugs; Sleeping rugs; Sleeping bags; Pillows
    • A47G9/02Bed linen; Blankets; Counterpanes
    • A47G9/0207Blankets; Duvets

Abstract

Uniform and back side Sutureless the Double-layer eiderdown quilt the invention discloses a kind of down-filling, including the first eiderdown quilt body and the second eiderdown quilt body, the surrounding of the bottom of the first eiderdown quilt body is stitched with the first chain tooth, the second eiderdown quilt body is stitched with the second chain tooth, first chain tooth and the second chain tooth are ratcheting, first chain tooth and the second chain tooth are connected with the same zipper, the first eiderdown quilt body and the second eiderdown quilt body include top layer cloth and bottom cloth, several barrier tie rods are stitched with above the bottom cloth, venthole is provided with above the top layer cloth, natural feather is filled between the barrier tie rod.The present invention can be good at the thickness that eiderdown quilt is adjusted according to the different demands of user, while can be good at hiding the position of suture to by the inside of body, improve the controllability and aesthetics when eiderdown quilt uses.

Description

A kind of down-filling is uniformly and the Double-layer eiderdown quilt of back side Sutureless
Technical field
Uniform and back side Sutureless the Double-layer eiderdown the present invention relates to eiderdown quilt technical field more particularly to a kind of down-filling Quilt.
Background technique
The eiderdown quilt made now, to make being uniformly distributed for natural feather in eiderdown quilt all be equipped with laterally longitudinal rule seam in quilt cover Line of threading causes countless pin holes to generate pin hole and runs suede phenomenon, and it is harmful to health to influence living environment.
It is a kind of quilt cover Non-seam Double-layer eiderdown by including including quilt cover, quilt through retrieval request CN201220359016.8 In, upper middle layer cloth and lower middle layer cloth;It is equipped in quilt cover and between inner upper middle layer cloth and lower middle layer cloth, in quilt cover and upper middle layer cloth Between, by it is inner between lower middle layer cloth filled with natural feather, between quilt cover and upper middle layer cloth, by it is inner between lower middle layer cloth by pair The closed loop pattern for the array that should be equipped with carries out line style bonding, and quilt cover is passed through linear slit around inner, upper middle layer cloth and lower middle layer cloth Connection etc..
But above-mentioned patent, which cannot be adjusted and win well top layer cloth during use, is cleaned, and Controllability is poor, can not be according to the thickness of the adjusting eiderdown quilt of user.
Therefore, it needs to design a kind of down-filling uniformly and the Double-layer eiderdown of back side Sutureless is solved the above problems.
Summary of the invention
The purpose of the present invention is to solve disadvantage existing in the prior art, and a kind of down-filling proposed is uniformly and the back side The Double-layer eiderdown quilt of Sutureless.
To achieve the goals above, present invention employs following technical solutions:
A kind of down-filling uniformly and the Double-layer eiderdown quilt of back side Sutureless, including the first eiderdown quilt body and the second eiderdown quilt body, The surrounding of the bottom of the first eiderdown quilt body is stitched with the first chain tooth, and the second eiderdown quilt body is stitched with the second chain tooth, institute It states the first chain tooth and the second chain tooth is ratcheting, first chain tooth and the second chain tooth are connected with the same zipper, first natural feather Include top layer cloth and bottom cloth by body and the second eiderdown quilt body, several barriers are stitched with above the bottom cloth and are drawn Item is provided with venthole above the top layer cloth, is filled with natural feather between the barrier tie rod.
Further, the venthole is located at a corner of top layer cloth.
Further, the specification of the first eiderdown quilt body is identical with the specification of the second eiderdown quilt body.
Further, the shape of the barrier tie rod is reticular structure.
Further, first chain tooth is that polythene material is made with the second chain tooth.
The invention has the benefit that
1. can be good at being adjusted according to the different demands of user by the first chain tooth and the second chain tooth of setting The thickness of eiderdown quilt, while can be good at hiding the position of suture to by the inside of body, it improves when eiderdown quilt uses Controllability and aesthetics.
2. can be good at natural feather face fixation during use can not win by the netted barrier tie rod of setting The case where generate, can be good in disassembly, cleaning top layer cloth, while netted barrier tie rod, can be good at carrying out ventilative relax Natural feather is opened up, makes more to be enriched by body.
Detailed description of the invention
Fig. 1 be a kind of down-filling proposed by the present invention uniformly and the structural schematic diagram of the Double-layer eiderdown quilt of back side Sutureless;
Fig. 2 be a kind of down-filling proposed by the present invention uniformly and the second eiderdown quilt body knot of the Double-layer eiderdown quilt of back side Sutureless Structure schematic diagram;
Fig. 3 is a kind of down-filling proposed by the present invention uniformly and the barrier bracing structural of the Double-layer eiderdown quilt of back side Sutureless shows It is intended to.
In figure: 1 first eiderdown quilt body, 2 second eiderdown quilt bodies, 3 second chain tooths, 4 zippers, 5 top layer cloth, 6 bottom cloths, 7 lead to Stomata, 8 barrier tie rods.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other Embodiment shall fall within the protection scope of the present invention.
It should be noted that it can be directly on another component when component is referred to as " being fixed on " another component Or there may also be components placed in the middle.When a component is considered as " connection " another component, it, which can be, is directly connected to To another component or it may be simultaneously present component placed in the middle.When a component is considered as " being set to " another component, it It can be and be set up directly on another component or may be simultaneously present component placed in the middle.Term as used herein is " vertical ", " horizontal ", "left", "right" and similar statement for illustrative purposes only.
Unless otherwise defined, all technical and scientific terms used herein and belong to technical field of the invention The normally understood meaning of technical staff is identical.Term as used herein in the specification of the present invention is intended merely to description tool The purpose of the embodiment of body, it is not intended that in the limitation present invention.Term " and or " used herein includes one or more phases Any and all combinations of the listed item of pass.
Please referring also to Fig. 1 to Fig. 3, a kind of down-filling uniformly and the Double-layer eiderdown quilt of back side Sutureless, including the first natural feather By body 1 and the second eiderdown quilt body 2, the surrounding of the bottom of the first eiderdown quilt body 1 is stitched with the first chain tooth, second natural feather Second chain tooth 3 is stitched with by body 2, first chain tooth and the second chain tooth 3 are ratcheting, and first chain tooth is connect with the second chain tooth 3 There is the same zipper 4, the first eiderdown quilt body 1 and the second eiderdown quilt body 2 include top layer cloth 5 and bottom cloth 6, the bottom The top of layer cloth 6 is stitched with several barrier tie rods 8, and the top of the top layer cloth 5 is provided with venthole 7, the barrier tie rod 8 Between be filled with natural feather.
Further, the venthole 7 is located at a corner of top layer cloth 5.
Further, the specification of the first eiderdown quilt body 1 is identical with the specification of the second eiderdown quilt body 2.
Further, the shape of the barrier tie rod 8 is reticular structure, and netted barrier tie rod 8 can be good at making The case where can not winning generation is fixed in natural feather face during, can be good in disassembly, cleaning top layer cloth, while netted Tie rod 8 is obstructed, can be good at breathe freely unfolding natural feather, make more to be filled by body.
Further, first chain tooth and the second chain tooth 3 are that polythene material is made, the first chain tooth and the second chain tooth 3, it can be good at the thickness that eiderdown quilt is adjusted according to the different demands of user, while can be good at the portion of suture Position hides to by the inside of body, improves the controllability and aesthetics when eiderdown quilt uses.
In summary: in use, can be good at natural feather during use by the netted barrier tie rod 8 of setting The case where face fixation can not be won generation can be good in disassembly, cleaning top layer cloth, while netted barrier tie rod 8, can It carries out breathing freely well and unfolds natural feather, make more to be enriched by body;First chain tooth and the second chain tooth 3, can be good at basis makes The different demands of user are adjusted the thickness of eiderdown quilt, while can be good at hiding the position of suture in by body Portion improves controllability and aesthetics when eiderdown quilt uses.
The foregoing is only a preferred embodiment of the present invention, but scope of protection of the present invention is not limited thereto, Anyone skilled in the art in the technical scope disclosed by the present invention, according to the technique and scheme of the present invention and its Inventive concept is subject to equivalent substitution or change, should be covered by the protection scope of the present invention.

Claims (5)

1. a kind of down-filling is uniformly and the Double-layer eiderdown quilt of back side Sutureless, including the first eiderdown quilt body (1) and the second eiderdown quilt body (2), which is characterized in that the surrounding of the bottom of the first eiderdown quilt body (1) is stitched with the first chain tooth, the second eiderdown quilt body (2) it is stitched with the second chain tooth (3), first chain tooth and the second chain tooth (3) are ratcheting, first chain tooth and the second chain tooth (3) It is connected with the same zipper (4), the first eiderdown quilt body (1) and the second eiderdown quilt body (2) include top layer cloth (5) and bottom Layer cloth (6) is stitched with several barrier tie rods (8) above the bottom cloth (6), is provided with above the top layer cloth (5) Venthole (7) is filled with natural feather between the barrier tie rod (8).
2. a kind of down-filling according to claim 1 uniformly and back side Sutureless Double-layer eiderdown quilt, which is characterized in that it is described Venthole (7) is located at a corner of top layer cloth (5).
3. a kind of down-filling according to claim 1 uniformly and back side Sutureless Double-layer eiderdown quilt, which is characterized in that it is described The specification of first eiderdown quilt body (1) is identical with the specification of the second eiderdown quilt body (2).
4. a kind of down-filling according to claim 1 uniformly and back side Sutureless Double-layer eiderdown quilt, which is characterized in that it is described The shape for obstructing tie rod (8) is reticular structure.
5. a kind of down-filling according to claim 1 uniformly and back side Sutureless Double-layer eiderdown quilt, which is characterized in that it is described First chain tooth is that polythene material is made with the second chain tooth (3).
CN201910229627.7A 2019-03-25 2019-03-25 A kind of down-filling is uniformly and the Double-layer eiderdown quilt of back side Sutureless Pending CN109984523A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910229627.7A CN109984523A (en) 2019-03-25 2019-03-25 A kind of down-filling is uniformly and the Double-layer eiderdown quilt of back side Sutureless

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910229627.7A CN109984523A (en) 2019-03-25 2019-03-25 A kind of down-filling is uniformly and the Double-layer eiderdown quilt of back side Sutureless

Publications (1)

Publication Number Publication Date
CN109984523A true CN109984523A (en) 2019-07-09

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CN201910229627.7A Pending CN109984523A (en) 2019-03-25 2019-03-25 A kind of down-filling is uniformly and the Double-layer eiderdown quilt of back side Sutureless

Country Status (1)

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CN (1) CN109984523A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201154071Y (en) * 2008-02-15 2008-11-26 厦门蒙发利科技(集团)股份有限公司 Massaging pillow and quilt
CN202161064U (en) * 2011-06-22 2012-03-14 赖圣铜 Novel double-layer quilt
CN104273991A (en) * 2013-07-02 2015-01-14 扬州大野家饰用品有限公司 Down quilt with rose fragrance
CN105768731A (en) * 2016-04-08 2016-07-20 宁波尚锦家用纺织品有限公司 Down quilt having internal flocking effect and manufacturing method thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201154071Y (en) * 2008-02-15 2008-11-26 厦门蒙发利科技(集团)股份有限公司 Massaging pillow and quilt
CN202161064U (en) * 2011-06-22 2012-03-14 赖圣铜 Novel double-layer quilt
CN104273991A (en) * 2013-07-02 2015-01-14 扬州大野家饰用品有限公司 Down quilt with rose fragrance
CN105768731A (en) * 2016-04-08 2016-07-20 宁波尚锦家用纺织品有限公司 Down quilt having internal flocking effect and manufacturing method thereof

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Application publication date: 20190709

RJ01 Rejection of invention patent application after publication