CN109860012A - A kind of ion implantation apparatus upright scanning device - Google Patents

A kind of ion implantation apparatus upright scanning device Download PDF

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Publication number
CN109860012A
CN109860012A CN201910151233.4A CN201910151233A CN109860012A CN 109860012 A CN109860012 A CN 109860012A CN 201910151233 A CN201910151233 A CN 201910151233A CN 109860012 A CN109860012 A CN 109860012A
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CN
China
Prior art keywords
main shaft
driving
ion implantation
sealing ring
sealing
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CN201910151233.4A
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Chinese (zh)
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CN109860012B (en
Inventor
袁卫华
彭立波
程文进
许波涛
徐松
王迪平
周波
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CETC 48 Research Institute
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CETC 48 Research Institute
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Priority to CN201910151233.4A priority Critical patent/CN109860012B/en
Publication of CN109860012A publication Critical patent/CN109860012A/en
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Abstract

The invention discloses a kind of ion implantation apparatus upright scanning devices, ion implantation apparatus include vacuum chamber and be located at the indoor target platform of vacuum chamber, upright scanning device includes bracket, main shaft, the first driving mechanism for driving spindle lifting and the second driving mechanism for driving spindle rotation, the vacuum chamber is set on the bracket, the main shaft upper end is connected with the target platform, and main shaft lower end extends to outside the vacuum chamber and is connected with first driving mechanism and the second driving mechanism.The present invention, which has many advantages, such as to reduce, occupies vacuum technology cavity space, avoids influencing processing chamber final vacuum.

Description

A kind of ion implantation apparatus upright scanning device
Technical field
The present invention relates to ion implantation apparatus more particularly to a kind of ion implantation apparatus upright scanning devices.
Background technique
Ion implantation apparatus is one of the key equipment in semiconductor technology.In order to guarantee the uniformity of ion implantation dosage, It is usually necessary to use certain scanning modes for ion implantation device.Since die size is increasing and ion implantation technology is wanted Ask higher and higher, the batch type target disc of early stage has been difficult to meet new technique requirement, and monolithic injection target platform gradually becomes current The mainstream of ion implantation apparatus.In this kind of implanter system, general requirement is: ion beam pass through in the horizontal direction electric scanning, The amendment such as electromagnet, dissipates, i.e., ion beam keeps stablizing in the horizontal direction constant, then leads in parallel when eventually arriving at target platform Crossing the scanning means being equipped with makes target platform pump to realize vertical scanning, at the same by the banking motion of target platform realize from The adjustment of sub- implant angle.
The CN of the granted patent 104409307B of applicant discloses a kind of ion implantation apparatus scanning means and scanning side Method realizes vertical scan motion by comparing simple movement mechanism, makes target platform around scan axis by horizontal rotary mechanism More accurate implant angle control may be implemented to correct angle in rotation.Disadvantage is that lead screw in movement mechanism and Guideway, driving part etc. largely is respectively positioned in vacuum technology chamber, cause vacuum technology chamber volume excessive, and lead screw and Guideway etc. needs to lubricate, and lubricates used oil, rouge can greatly influence the indoor final vacuum of process cavity.In addition, magnetic Fluid Sealing and linear motor add air-bearing realize vacuum insulation method all exist structure is complicated, it is at high cost, need to periodically tie up The defects of shield.
Summary of the invention
The technical problem to be solved by the present invention is to overcome the deficiencies in the prior art, and occupancy vacuum technology can be reduced by providing one kind Cavity space avoids the ion implantation apparatus upright scanning device for influencing processing chamber final vacuum.
In order to solve the above technical problems, the invention adopts the following technical scheme:
A kind of ion implantation apparatus upright scanning device, ion implantation apparatus include vacuum chamber and be located at the indoor target of vacuum chamber Platform, upright scanning device include bracket, main shaft, for the first driving mechanism of driving spindle lifting and for driving spindle Second driving mechanism of rotation, the vacuum chamber are set on the bracket, and the main shaft upper end is connected with the target platform, main shaft Lower end extends to outside the vacuum chamber and is connected with first driving mechanism and the second driving mechanism.
As a further improvement of the above technical scheme: the main shaft upper end is arranged in a seal receptacle, the seal receptacle Be provided, in sequence from bottom to top, with the first sealing ring, the second sealing ring and third sealing ring between main shaft, first sealing ring and Between second sealing ring be equipped with first sealing spacer, between second sealing ring and third sealing ring be equipped with second sealing every Set, the first sealing spacer and the second sealing spacer have gap between the main shaft, and described first seals on spacer Equipped with the first evacuation passageway being connected to downside gap, the second sealing spacer is equipped with second be connected to upside gap Evacuation passageway, the air pressure in the gap of upside is lower than the air pressure in the gap of downside.
As a further improvement of the above technical scheme: being connected between the bracket and the seal receptacle for preventing The radially displaceable support component of main shaft is stated, the support component includes that a pair of the first limit for being divided into the main shaft two sides is led Rail and a pair of the second limit guide rail for being divided into the main shaft two sides, first limit guide rail and second limit guide rail are hung down Straight arrangement.
As a further improvement of the above technical scheme: the frame upper is equipped with connecting flange, the main shaft periphery set Equipped with bellow seal pipe, bellow seal pipe upper end and the connecting flange are welded, and lower end and the seal receptacle weld.
As a further improvement of the above technical scheme: first sealing ring, the second sealing ring and third sealing ring are equal For lip-type packing, the first sealing spacer and the second sealing spacer are teflon seal spacer.
As a further improvement of the above technical scheme: first driving mechanism includes first motor speed reducer, first Drive pulley component, lead screw and the nut seat on lead screw, the first motor speed reducer and the lead screw are set to the branch On frame, the first drive pulley component is connected between the first motor speed reducer and the lead screw, second driving Mechanism is set on the nut seat, and the main shaft lower end is rotatably penetrated and arranged in the nut seat.
As a further improvement of the above technical scheme: second driving mechanism includes the second motor reducer, second Drive pulley component, second motor reducer are set on the nut seat, and the second drive pulley component is connected to institute It states between the second motor reducer and the main shaft.
As a further improvement of the above technical scheme: it is equipped with riser guide in the two sides of the lead screw on the bracket, The sliding block of riser guide cooperation is set on the nut seat.
Compared with the prior art, the advantages of the present invention are as follows: ion implantation apparatus upright scanning device disclosed by the invention, by Bracket provides support, and the first driving mechanism drives main shaft, target platform to pump and realize vertical scanning, the second driving mechanism band Dynamic main shaft, target platform, which rotate horizontally, realizes implant angle control;First driving mechanism, the second driving mechanism are all disposed under main shaft Outside end namely vacuum chamber, only main shaft upper end is protruded into vacuum chamber, is reduced kinematic pair and is occupied the indoor space of vacuum chamber, Avoiding kinematic pair from lubricating used grease influences the indoor final vacuum of vacuum chamber.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of ion implantation apparatus upright scanning device of the present invention.
Fig. 2 is the schematic diagram of the section structure of ion implantation apparatus upright scanning device of the present invention.
Fig. 3 is the schematic perspective view of the bracket in the present invention.
Fig. 4 is the schematic view of the front view of the bracket in the present invention.
Fig. 5 is the amplified schematic perspective view of support component in the present invention.
Each label indicates in figure: 1, vacuum chamber;2, target platform;3, bracket;31, support component;311, the first limit guide rail; 312, the second limit guide rail;32, connecting flange;33, riser guide;4, main shaft;41, the first sealing ring;42, the second sealing ring; 43, third sealing ring;44, the first sealing spacer;45, the second sealing spacer;46, the first evacuation passageway;47, it second vacuumizes Channel;48, bellow seal pipe;5, the first driving mechanism;51, first motor speed reducer;52, the first drive pulley component;53, silk Thick stick;54, nut seat;55, sliding block;6, the second driving mechanism;61, the second motor reducer;62, the second drive pulley component;7, Seal receptacle.
Specific embodiment
Below in conjunction with Figure of description and specific embodiment, invention is further described in detail.
Fig. 1 to Fig. 5 shows a kind of embodiment of ion implantation apparatus upright scanning device of the present invention, the ion of the present embodiment Implanter upright scanning device, ion implantation apparatus include vacuum chamber 1 and the target platform 2 in vacuum chamber 1, vertical scanning dress It sets including bracket 3, main shaft 4, the first driving mechanism 5 gone up and down for driving spindle 4 and rotated for driving spindle 4 the Two driving mechanisms 6, vacuum chamber 1 are set on bracket 3, and 4 upper end of main shaft is connected with target platform 2, and 4 lower end of main shaft extends to vacuum chamber It is connected outside 1 and with the first driving mechanism 5 and the second driving mechanism 6.
The ion implantation apparatus upright scanning device provides support by bracket 3, and the first driving mechanism 5 drives main shaft 4, target platform 2 It pumps and realizes vertical scanning, the second driving mechanism 6 drives main shaft 4, target platform 2 to rotate horizontally and realizes implant angle control System;First driving mechanism 5, the second driving mechanism 6 are all disposed within outside 4 lower end of main shaft namely vacuum chamber 1, only on main shaft 4 End is protruded into vacuum chamber 1, reduces the space in kinematic pair occupancy vacuum chamber 1, kinematic pair is avoided to lubricate used grease Influence the final vacuum in vacuum chamber 1.
Further, in this embodiment 4 upper end of main shaft is arranged in a seal receptacle 7, between seal receptacle 7 and main shaft 4 under The first sealing ring 41, the second sealing ring 42 and third sealing ring 43, the first sealing ring 41 and the second sealing ring are successively arranged on and It is equipped with the first sealing spacer 44 between 42, the second sealing spacer 45 is equipped between the second sealing ring 42 and third sealing ring 43, the One sealing spacer 44 and the second sealing spacer 45 have gap between main shaft 4, and the first sealing spacer 44 is equipped with and downside First evacuation passageway 46 of gap connection, the second sealing spacer 45 are equipped with the second evacuation passageway being connected to upside gap 47, the air pressure in the gap of upside is lower than the air pressure in the gap of downside.From bottom to top along main shaft 4, it is successively atmospheric region --- height is negative Low vacuum area can bring a small amount of gas in atmosphere into pressure area --- nearly low vacuum area --- when main shaft 4 moves up, take out by first Vacuum passage 46 takes part away, and main shaft 4 continues the part not being extracted when up moving and taken away by the second evacuation passageway 47, Since gas is removed step by step, will not enter vacuum chamber 1 will not cause vacuum chamber 1 big to reach sealing function It influences;Simultaneously because all having gap (preferably smaller than between the first sealing spacer 44 and the second sealing spacer 45 and main shaft 4 Frictional resistance when main shaft 4 moves 20um), can be reduced, and compare existing magnet fluid sealing, linear motor+air-bearing etc., Structure is simpler, cost is lower, is also convenient for daily safeguarded.
Further, it in the present embodiment, is connected between bracket 3 and seal receptacle 7 for preventing main shaft 4 radially displaceable Support component 31, support component 31 includes that a pair is divided into the first limit guide rail 311 of 4 two sides of main shaft and a pair is divided into master Second limit guide rail 312 of 4 two sides of axis, the first limit guide rail 311 and the second limit guide rail 312 are arranged vertically.Pass through support group Part 31 limits the radial slippage of main shaft 4, can effectively avoid sealing leak.
Further, in the present embodiment, 3 top of bracket is equipped with connecting flange 32, and 4 periphery of main shaft is arranged with bellow seal Pipe 48,48 upper end of bellow seal pipe and connecting flange 32 weld, and lower end and seal receptacle 7 weld.By welding bellow seal pipe 48 Realize the sealing of 4 periphery of main shaft between seal receptacle 7 and connecting flange 32, structure is simple, reliable and good airproof performance.
As a preferred technical solution, in the present embodiment, the first sealing ring 41, the second sealing ring 42 and third sealing ring 43 It is lip-type packing, the first sealing spacer 44 and the second sealing spacer 45 are teflon seal spacer.Lip packing Enclose itself good airproof performance, high reliablity;Teflon seal spacer, wearability is good, has self-lubricating property.
Further, in this embodiment the first driving mechanism 5 includes first motor speed reducer 51, the first drive pulley group Part 52, lead screw 53 and the nut seat 54 on lead screw 53, first motor speed reducer 51 and lead screw 53 are set on bracket 3, and first Drive pulley component 52 is connected between first motor speed reducer 51 and lead screw 53, and the second driving mechanism 6 is set on nut seat 54, 4 lower end of main shaft, which is rotatably penetrated and arranged in nut seat 54, (such as realizes that the opposite of main shaft 4 and nut seat 54 turns by bearing assembly It is dynamic).When work, first motor speed reducer 51 drives lead screw 53 to rotate by the first drive pulley component 52, and then drives nut Seat the 54, second driving mechanism 6, main shaft 4,2 integral elevating of target platform.
Further, in the present embodiment, the second driving mechanism 6 includes the second motor reducer 61, the second drive pulley Component 62, the second motor reducer 61 are set on nut seat 54, and the second drive pulley component 62 is connected to the second motor reducer Between 61 and main shaft 4.When work, the second motor reducer 61 drives main shaft 4,2 phase of target platform by the second drive pulley component 62 Nut seat 54 is rotated.
Further, in the present embodiment, it is equipped with riser guide 33 in the two sides of lead screw 53 on bracket 3, on nut seat 54 The sliding block 55 cooperated set on riser guide 33.By the cooperation of riser guide 33 and sliding block 55, it is steady, suitable to guarantee that main shaft 4 is gone up and down Freely, it avoids vertically shifting.
Although the present invention has been disclosed as a preferred embodiment, however, it is not intended to limit the invention.It is any to be familiar with ability The technical staff in domain, without deviating from the scope of the technical scheme of the present invention, all using the technology contents pair of the disclosure above Technical solution of the present invention makes many possible changes and modifications or equivalent example modified to equivalent change.Therefore, all Without departing from the content of technical solution of the present invention, according to the present invention technical spirit any simple modification made to the above embodiment, Equivalent variations and modification, all shall fall within the protection scope of the technical scheme of the invention.

Claims (8)

1. a kind of ion implantation apparatus upright scanning device, ion implantation apparatus includes vacuum chamber (1) and is located in vacuum chamber (1) Target platform (2), upright scanning device include bracket (3), main shaft (4), for driving spindle (4) lifting the first driving mechanism (5) and for driving spindle (4) the second driving mechanism (6) rotated, it is characterised in that: the vacuum chamber (1) is set to institute It states on bracket (3), main shaft (4) upper end is connected with the target platform (2), and main shaft (4) lower end extends to the vacuum chamber (1) It is connected outside and with first driving mechanism (5) and the second driving mechanism (6).
2. ion implantation apparatus upright scanning device according to claim 1, it is characterised in that: wear main shaft (4) upper end In a seal receptacle (7), the first sealing ring (41), are provided, in sequence from bottom to top, between the seal receptacle (7) and main shaft (4) It is close to be equipped with first for two sealing rings (42) and third sealing ring (43) between first sealing ring (41) and the second sealing ring (42) Packer (44), is equipped with the second sealing spacer (45) between second sealing ring (42) and third sealing ring (43), and described the One sealing spacer (44) and the second sealing spacer (45) have gap, the first sealing spacer between the main shaft (4) (44) it is equipped with the first evacuation passageway (46) being connected to downside gap, second sealing spacer (45) is equipped with and upside The second evacuation passageway (47) of gap connection, the air pressure in the gap of upside is lower than the air pressure in the gap of downside.
3. ion implantation apparatus upright scanning device according to claim 2, it is characterised in that: the bracket (3) with it is described The support component (31) for preventing the main shaft (4) radially displaceable, the support component are connected between seal receptacle (7) It (31) include that a pair is divided into first limit guide rail (311) of the main shaft (4) two sides and a pair is divided into the main shaft (4) two The second limit guide rail (312) of side, first limit guide rail (311) and second limit guide rail (312) are arranged vertically.
4. ion implantation apparatus upright scanning device according to claim 3, it is characterised in that: bracket (3) top is set Have connecting flange (32), main shaft (4) periphery is arranged with bellow seal pipe (48), bellow seal pipe (48) upper end and institute Connecting flange (32) welding is stated, lower end and the seal receptacle (7) are welded.
5. ion implantation apparatus upright scanning device according to any one of claim 2 to 4, it is characterised in that: described One sealing ring (41), the second sealing ring (42) and third sealing ring (43) are lip-type packing, the first sealing spacer (44) and the second sealing spacer (45) is teflon seal spacer.
6. ion implantation apparatus upright scanning device according to any one of claim 1 to 4, it is characterised in that: described One driving mechanism (5) includes first motor speed reducer (51), the first drive pulley component (52), lead screw (53) and is set to lead screw (53) nut seat (54) on, the first motor speed reducer (51) and the lead screw (53) are set on the bracket (3), described First drive pulley component (52) is connected between the first motor speed reducer (51) and the lead screw (53), and described second drives Motivation structure (6) is set on the nut seat (54), and main shaft (4) lower end is rotatably penetrated and arranged in the nut seat (54).
7. ion implantation apparatus upright scanning device according to claim 6, it is characterised in that: second driving mechanism It (6) include the second motor reducer (61), the second drive pulley component (62), second motor reducer (61) is set to described On nut seat (54), the second drive pulley component (62) is connected to second motor reducer (61) and the main shaft (4) between.
8. ion implantation apparatus upright scanning device according to claim 6, it is characterised in that: in institute on the bracket (3) The two sides for stating lead screw (53) are equipped with riser guide (33), and the cunning of the riser guide (33) cooperation is set on the nut seat (54) Block (55).
CN201910151233.4A 2019-02-28 2019-02-28 Vertical scanning device of ion implanter Active CN109860012B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910151233.4A CN109860012B (en) 2019-02-28 2019-02-28 Vertical scanning device of ion implanter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910151233.4A CN109860012B (en) 2019-02-28 2019-02-28 Vertical scanning device of ion implanter

Publications (2)

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CN109860012A true CN109860012A (en) 2019-06-07
CN109860012B CN109860012B (en) 2021-02-05

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07201772A (en) * 1993-12-29 1995-08-04 Sony Corp Manufacture of thin film element and ion implantation device
US20030094583A1 (en) * 2001-11-22 2003-05-22 Samsung Electronics Co., Ltd. Wafer holding apparatus for ion implanting system
CN102345107A (en) * 2010-08-02 2012-02-08 北京中科信电子装备有限公司 Seal assembly of sliding and rotating shaft

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07201772A (en) * 1993-12-29 1995-08-04 Sony Corp Manufacture of thin film element and ion implantation device
US20030094583A1 (en) * 2001-11-22 2003-05-22 Samsung Electronics Co., Ltd. Wafer holding apparatus for ion implanting system
CN102345107A (en) * 2010-08-02 2012-02-08 北京中科信电子装备有限公司 Seal assembly of sliding and rotating shaft

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
彭立波等: ""离子注入机剂量控制器设计"", 《自动化博览》 *

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