CN109659401B - Clean bench of high temperature equipment - Google Patents

Clean bench of high temperature equipment Download PDF

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Publication number
CN109659401B
CN109659401B CN201910019668.3A CN201910019668A CN109659401B CN 109659401 B CN109659401 B CN 109659401B CN 201910019668 A CN201910019668 A CN 201910019668A CN 109659401 B CN109659401 B CN 109659401B
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China
Prior art keywords
module
silicon carbide
primary
pair
butt joint
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CN109659401A (en
Inventor
张弥涛
李明
李晔纯
谭瞻
张春成
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Hunan Red Sun Photoelectricity Science and Technology Co Ltd
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Hunan Red Sun Photoelectricity Science and Technology Co Ltd
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    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L31/00Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876Particular processes or apparatus for batch treatment of the devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

The invention discloses a purification table of high-temperature equipment, which comprises a main frame, a silicon carbide paddle motion module and a wafer inserting machine butt joint mechanism, wherein the silicon carbide paddle motion module comprises a Z-axis moving module, a Y-axis moving module and an X-axis telescopic module, the Z-axis moving module is installed on the main frame, the Y-axis moving module is movably installed on the Z-axis moving module, the X-axis telescopic module is movably installed on the Y-axis moving module, the silicon carbide paddle is installed at the extending end of the X-axis telescopic module, the wafer inserting machine butt joint mechanism comprises a butt joint guide rail and a support frame capable of being in butt joint with the silicon carbide paddle, the support frame is movably arranged on the butt joint guide rail, the butt joint guide rail is arranged at the bottom of the main frame, and a butt joint avoiding area for. The invention has the advantages of compact space, high interchangeability, high productivity and low cost.

Description

Clean bench of high temperature equipment
Technical Field
The invention relates to processing equipment of solar cells, in particular to a purification table of high-temperature equipment.
Background
At present, the purification platform of tubular high-temperature equipment such as tubular PECVD, tubular diffusion furnaces and tubular annealing furnaces is mainly characterized in that N high-temperature furnace reaction chambers need N horizontal movement modules to be matched with the N high-temperature furnace reaction chambers, and one gantry manipulator system tail gas is used for providing vertical movement, so that the purification platform has the defects of complex structure, high required cost, poor interchangeability, high failure rate and the like, is greatly influenced by the height and the space size of a workshop of a production workshop, has limited capacity of single equipment, and is very complicated to install and debug. In addition, most of the existing purification tables are mechanical arm integrated cache frames, meanwhile, the horizontal movement mechanism and the vertical movement mechanism are separated, the required space of the purification tables is increased by the scheme, meanwhile, the quartz/graphite boat on the cache frames is slow in cooling speed, an air cooling or water cooling system needs to be added, the mechanical arm processing cost is high, the installation and debugging difficulty is high, a great deal of inconvenience can be brought to operators in work and maintenance, the influence degree of the height and the space size of a workshop of a production workshop is large, and the capacity of single equipment is limited.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide the purification table of the high-temperature equipment, which has the advantages of simple structure, compact space, high interchangeability and high productivity.
In order to solve the technical problems, the invention adopts the following technical scheme:
the utility model provides a clean bench of high temperature equipment, includes main frame, carborundum oar motion module and insert mascerating machine docking mechanism, carborundum oar motion module includes Z axle moving module, Y axle moving module and the flexible module of X axle, Z axle moving module installs on the main frame, and Y axle moving module is mobilizable installs on Z axle moving module, and X axle flexible module is mobilizable installs on Y axle moving module, the carborundum oar is installed in the flexible module's of X axle end that stretches out, insert mascerating machine docking mechanism including the butt joint guide rail with can with the support frame of carborundum oar butt joint, the support frame is mobilizable to be located on the butt joint guide rail, the bottom of main frame is located to the butt joint guide rail, be equipped with the butt joint district of dodging the carborundum oar between support frame and the.
As a further improvement of the above technical scheme, it is preferable that the silicon carbide paddle is installed on the X-axis telescopic module through a leveling mechanism, the leveling mechanism includes a bottom plate, a movable plate and a clamping seat for clamping the silicon carbide paddle, the bottom plate is fixed at the end that extends out of the X-axis telescopic module, the movable plate is installed on the bottom plate, the clamping seat is installed on the movable plate, the upper end face of the bottom plate is provided with a semi-cylinder, and the movable plate is provided with a semi-slot capable of being matched with the semi-cylinder.
As a further improvement of the above technical solution, preferably, the movable plate is fixed by a plurality of pairs of fastening bolts, two fastening bolts of each pair of fastening bolts are respectively located at two sides of the semi-cylinder, wherein the pair of fastening bolts located in the middle are left and right leveling bolts; the clamping seats are two in number, and each clamping seat is fixed through a pair of clamping bolts and a pair of front and rear leveling bolts.
As a further improvement of the above technical solution, preferably, a buffer frame is arranged in the main frame, the buffer frame includes a vertical frame and a plurality of layers of supporting platforms arranged on the vertical frame, and the silicon carbide paddle can be butted with each layer of supporting platform.
As a further improvement of the above technical solution, preferably, the supporting platform includes a pair of fixing seat assemblies, each fixing seat assembly includes a base and a supporting seat, the base is fixed on the stand, the supporting seat is connected with the base through a pin shaft, a return spring is arranged between the base and the supporting seat, the base is further provided with a stroke trigger switch which can be in contact with the supporting seat, the supporting seat is provided with a supporting groove, and the supporting grooves of the two supporting seats are arranged oppositely.
As a further improvement of the above technical solution, preferably, a high-efficiency filtering and purifying system is provided at the top of the main frame.
As the further improvement of the technical proposal, the preferred, the X-axis telescopic module comprises a first-level kinematic pair component and a second-level kinematic pair component, the first-level kinematic pair component comprises a first-level base, a first-level linear guide rail, a first-level screw rod pair and a first-level driving motor, the second-level kinematic pair component comprises a second-level base, a second-level linear guide rail, a second-level screw rod pair and a second-level driving motor, the first-level base is fixed on the Y-axis moving module, the first-level linear guide rail and the first-level screw rod pair are arranged on the first-level base, the second-level base is arranged on the first-level linear guide rail in a sliding way and is connected with the first-level screw rod pair, the first-level driving motor is connected with the first-level screw rod pair through a belt and a belt pulley, the second, the second-stage driving motor is connected with the second-stage screw rod pair through a belt and a belt wheel, and the silicon carbide paddle is installed on the installation plate.
Compared with the prior art, the invention has the advantages that:
according to the purification table of the high-temperature equipment, the horizontal movement module (the wafer inserting machine butting mechanism) is butted with an external wafer inserting machine so as to realize automatic transmission of process battery wafers; the main moving body part (the silicon carbide paddle moving module) in the purification table consists of a vertical direction moving module (namely a Z axis), a horizontal direction moving module (namely a Y axis) and a front-back direction moving module (namely an X axis), and the X axis adopts a telescopic mode, so that the internal space of the main frame is effectively reduced; on the other hand, the equipment of the invention can also be used for placing a plurality of high-temperature furnace reaction chambers in parallel, thereby realizing higher productivity in a limited equipment installation space.
Drawings
Fig. 1 is a schematic perspective view of the present invention.
Fig. 2 is a schematic front view of the present invention.
Fig. 3 is a side view of the present invention.
FIG. 4 is a schematic front view of the silicon carbide paddle motion module of the present invention.
FIG. 5 is a schematic top view of a silicon carbide paddle motion module according to the present invention.
FIG. 6 is a schematic diagram of a side view of a silicon carbide paddle motion module according to the present invention.
Fig. 7 is a front view schematically showing the structure of the leveling mechanism of the present invention.
Fig. 8 is a schematic top view of the leveling mechanism of the present invention.
FIG. 9 is a side view schematically illustrating the leveling mechanism of the present invention.
Fig. 10 is a schematic view of a cache shelf according to the present invention.
FIG. 11 is a schematic top view of a cache shelf according to the present invention.
FIG. 12 is a schematic diagram of a side view of a cache shelf according to the present invention.
Fig. 13 is a perspective view of the fixing base assembly of the present invention.
Fig. 14 is a front view of the fixed seat assembly of the present invention.
Fig. 15 is a side view of the mount assembly of the present invention.
Fig. 16 is a front view of the X-axis telescopic module of the present invention.
Fig. 17 is a view a-a in fig. 16.
Fig. 18 is a schematic perspective view of a docking mechanism of a wafer inserter of the present invention.
The reference numerals in the figures denote:
100. a main frame; 200. silicon carbide paddles; 201. a semi-cylinder; 202. a semicircular groove; 210. a leveling mechanism; 211. a base plate; 212. a movable plate; 213. a clamping seat; 214. fastening a bolt; 215. a left leveling bolt and a right leveling bolt; 216. clamping the bolt; 217. front and rear leveling bolts; 300. a wafer inserting machine butting mechanism; 310. butting guide rails; 320. a support frame; 321. a tray; 322. welding a bracket; (ii) a 400. A Z-axis moving module; 500. a Y-axis moving module; 600. an X-axis telescopic module; 601. a belt; 602. a pulley; 610. a primary kinematic pair assembly; 611. a primary base; 612. a primary linear guide rail; 613. a first-stage screw pair; 614. a first-stage drive motor; 620. a secondary kinematic pair assembly; 621. a secondary base; 622. a secondary linear guide rail; 623. a secondary screw rod pair; 624. a secondary drive motor; 625. mounting a plate; 700. a cache shelf; 710. erecting a frame; 720. a fixed seat assembly; 721. a base; 722. a supporting seat; 723. a pin shaft; 724. a return spring; 725. a travel trigger switch; 726. a support groove; 800. high-efficient filtration clean system.
Detailed Description
The invention is described in further detail below with reference to the figures and specific examples of the specification.
As shown in fig. 1 to 6, the clean bench of the high-temperature equipment of the embodiment includes a main frame 100, a silicon carbide paddle 200, a silicon carbide paddle motion module and a wafer inserting machine docking mechanism 300, the silicon carbide paddle motion module includes a Z-axis moving module 400, a Y-axis moving module 500 and an X-axis telescopic module 600, the Z-axis moving module 400 is installed on the main frame 100, the Y-axis moving module 500 is movably installed on the Z-axis moving module 400, the X-axis telescopic module 600 is movably installed on the Y-axis moving module 500, the silicon carbide paddle 200 is installed at the protruding end of the X-axis telescopic module 600, the wafer inserting machine docking mechanism 300 includes a docking guide 310 and a support frame 320 that can dock with the silicon carbide paddle 200, the support frame 320 is movably installed on the docking guide 310, the docking guide rail 310 is disposed at the bottom of the main frame 100, and a docking avoidance area for avoiding the silicon carbide paddle 200 is disposed between the supporting frame 320 and the docking guide rail 310.
The support rack 320 is used to hold the quartz/graphite boat 900. The docking guide 310 and the silicon carbide paddle 200 are disposed on both sides of the main frame 100. In operation, the supporting frame 320 moves outward on the docking guide rail 310 to dock with a wafer inserting machine (not shown in the figure), the wafer inserting machine inserts the battery wafer into the quartz/graphite boat 900, after the wafer inserting is finished, the supporting frame 320 moves back into the main frame 100, the X-axis telescopic module 600 is in a telescopic state and drives the silicon carbide paddle 200 to move inward along the Y-axis movable module 500 into the main frame 100 (moves to the right side in fig. 4), then the Y-axis movable module 500 drives the silicon carbide paddle 200 to descend to the lowest position along the Z-axis movable module 400 so that the silicon carbide paddle 200 can enter a docking avoidance area, then the Y-axis movable module 500 ascends, the silicon carbide paddle 200 ascends to lift up the quartz/graphite boat 900, then the position of the silicon carbide paddle 200 is adjusted, the extending end of the X-axis telescopic module 600 extends out, and drives the silicon carbide paddle 200 to extend out of the main frame 100 along the Y-axis movable module 500, and conveys the quartz/graphite boat 900 into a high-temperature, repeating the steps until the number of the quartz/graphite boats 900 in the reaction chamber of the high-temperature furnace body reaches the requirement.
The purification table of the high-temperature equipment is butted with an external sheet inserting machine by using a horizontal movement module (a sheet inserting machine butting mechanism 300) so as to realize the automatic transmission of process battery sheets; the main moving body part (silicon carbide paddle moving module) in the purification table consists of a vertical direction moving module (namely Z axis), a horizontal direction moving module (namely Y axis) and a front-back direction moving module (namely X axis), and the X axis adopts a telescopic mode, so that the internal space of the main frame 100 is effectively reduced; on the other hand, the equipment of the invention can also be used for placing a plurality of high-temperature furnace reaction chambers in parallel, thereby realizing higher productivity in a limited equipment installation space.
As shown in fig. 7 to 9, in the present embodiment, the silicon carbide paddle 200 is mounted on the X-axis telescopic module 600 through the leveling mechanism 210, the leveling mechanism 210 includes a bottom plate 211, a movable plate 212 and a holder 213 for holding the silicon carbide paddle 200, the bottom plate 211 is fixed to the extending end of the X-axis telescopic module 600, the movable plate 212 is mounted on the bottom plate 211, the holder 213 is mounted on the movable plate 212, a semi-cylinder 201 is disposed on the upper end surface of the bottom plate 211, and the movable plate 212 is disposed with a semi-circular groove 202 capable of being engaged with the semi-cylinder 201. The movable plate 212 is fixed by a plurality of pairs of fastening bolts 214, two fastening bolts 214 of each pair of fastening bolts 214 are respectively positioned at two sides of the semi-cylinder 201, wherein the pair of fastening bolts 214 positioned in the middle is a left leveling bolt 215 and a right leveling bolt 215; two clamp holders 213 are provided, and each clamp holder 213 is fixed by a pair of clamp bolts 216 and a pair of front and rear leveling bolts 217. By adjusting the left and right leveling bolts 215, the movable plate 212 can swing around the semi-cylinder 201, so as to adjust the levelness of the movable plate 212. The front and rear leveling bolts 217 are adjusted to adjust the levelness of the front and rear clamping seats 213.
As shown in fig. 10 to 15, in the present embodiment, a buffer rack 700 is disposed in the main frame 100, the buffer rack 700 includes a vertical rack 710 and a plurality of layers of supporting platforms disposed on the vertical rack 710, and the silicon carbide paddle 200 may be butted against each layer of supporting platform. The supporting platform comprises a pair of fixed seat assemblies 720, each fixed seat assembly 720 comprises a base 721 and a supporting seat 722, the base 721 is fixed on the vertical frame 710, the supporting seat 722 is connected with the base 721 through a pin shaft 723, a return spring 724 is arranged between the base 721 and the supporting seat 722, the base 721 is further provided with a stroke trigger switch 725 capable of contacting with the supporting seat 722, the supporting seat 722 is provided with a supporting groove 726, and the supporting grooves 726 of the two supporting seats 722 are oppositely arranged. When the silicon carbide paddle 200 places the quartz/graphite boat 900 in the two supporting grooves 726, the supporting seat 722 rotates around the pin 723 due to the gravity of the quartz/graphite boat and the battery plate, and triggers the stroke trigger switch 725, and the stroke trigger switch 725 provides a boat existence signal of the buffer area to the system; when the SiC paddle 200 removes the quartz/graphite boat 900 from the slot 726, the spring 724 returns the support 722, and the trip trigger 725 trips to release the buffer out signal to the system.
The buffer rack 700 functions to cool the quartz/graphite boat 900. After the reaction of the quartz/graphite boat 900 in the high-temperature furnace reaction chamber is finished, the silicon carbide paddle 200 takes out the quartz/graphite boat 900 one by one to be prevented from being arranged on each layer of supporting platform of the buffer storage rack 700, the top of the main frame 100 is provided with the high-efficiency filtering and purifying system 800, and the fresh air surface entering the purifying platform after passing through the high-efficiency filtering and purifying system 800 covers the area where the buffer storage rack supporting platform is arranged, so that the quartz/graphite boat 900 on the supporting platform is cooled. Adopt new purification scheme and buffer station processing scheme, make equipment clean bench inner structure compacter, effectively reduced the installation space of equipment when reaching better purifying effect.
As shown in fig. 16 and 17, in this embodiment, the X-axis telescopic module 600 includes a primary kinematic pair assembly 610 and a secondary kinematic pair assembly 620, the primary kinematic pair assembly 610 includes a primary base 611, a primary linear guide 612, a primary screw pair 613, and a primary driving motor 614, the secondary kinematic pair assembly 620 includes a secondary base 621, a secondary linear guide 622, a secondary screw pair 623, and a secondary driving motor 624, the primary base 611 is fixed on the Y-axis movable module 500, the primary linear guide 612 and the primary screw pair 613 are disposed on the primary base 611, the secondary base 621 is slidably disposed on the primary linear guide 612 and connected to the primary screw pair 613, the primary driving motor 614 is connected to the primary screw pair 613 through a belt 601 and a pulley 602, the secondary linear guide 622 and the secondary screw pair 623 are disposed on the secondary base 621, a mounting plate 625 is slidably disposed on the secondary linear guide 622, the mounting plate 625 is connected to the secondary screw pair 623, the secondary driving motor 624 is connected with the secondary screw pair 623 through a belt 601 and a belt wheel 602, and the silicon carbide paddle 200 is mounted on the mounting plate 625. The pair 613 of first-level lead screws drives the second-level base 621 to extend, and the pair 623 of second-level lead screws drives the mounting plate 625 to extend, so that the silicon carbide paddle 200 on the mounting plate 625 is driven to move to a proper distance, and a second-level telescopic structure is adopted, so that the occupied space can be reduced.
As shown in fig. 18, in the present embodiment, the docking guide 310 and the supporting frame 320 are capable of docking with the silicon carbide paddle 200, the supporting frame 320 includes a tray 321 and a welding bracket 322, the tray 321 is disposed on the docking guide 310, the tray 322 is driven by a motor to move on the docking guide 310, the welding bracket 322 is fixed on the tray 321 and is used for holding the quartz/graphite boat 900, the welding bracket 322 is single-sided, and the docking avoiding area is located between the quartz/graphite boat 900 and the tray 321.
Besides this embodiment, the X-axis expansion module 600 may also be an expansion tube structure, or may also be an expansion structure with three or more stages.
Although the present invention has been described with reference to the preferred embodiments, it is not intended to be limited thereto. Those skilled in the art can make numerous possible variations and modifications to the present invention, or modify equivalent embodiments to equivalent variations, without departing from the scope of the invention, using the teachings disclosed above. Therefore, any simple modification, equivalent change and modification made to the above embodiments according to the technical spirit of the present invention should fall within the protection scope of the technical scheme of the present invention, unless the technical spirit of the present invention departs from the content of the technical scheme of the present invention.

Claims (7)

1. The utility model provides a clean bench of high temperature equipment which characterized in that: the silicon carbide blade butt joint mechanism comprises a main frame (100), a silicon carbide blade (200), a silicon carbide blade movement module and a blade inserting machine butt joint mechanism (300), wherein the silicon carbide blade movement module comprises a Z-axis movement module (400), a Y-axis movement module (500) and an X-axis telescopic module (600), the Z-axis movement module (400) is installed on the main frame (100), the Y-axis movement module (500) is movably installed on the Z-axis movement module (400), the X-axis telescopic module (600) is movably installed on the Y-axis movement module (500), the silicon carbide blade (200) is installed at the extending end of the X-axis telescopic module (600), the blade inserting machine butt joint mechanism (300) comprises a butt joint guide rail (310) and a support frame (320) capable of being in butt joint with the silicon carbide blade (200), the support frame (320) is movably arranged on the butt joint guide rail (310), the butt joint guide rail (310) is arranged at the bottom of, and a butt joint avoiding area for avoiding the silicon carbide paddle (200) is arranged between the support frame (320) and the butt joint guide rail (310).
2. A clean bench for high-temperature equipment according to claim 1, characterized in that: silicon carbide oar (200) are installed on the flexible module (600) of X axle through leveling mechanism (210), leveling mechanism (210) include bottom plate (211), fly leaf (212) and grip slipper (213) that are used for centre gripping silicon carbide oar (200), bottom plate (211) are fixed in the end that stretches out of the flexible module (600) of X axle, fly leaf (212) are installed on bottom plate (211), grip slipper (213) are installed on fly leaf (212), bottom plate (211) up end is equipped with semicylinder (201), fly leaf (212) be equipped with can with semicylinder (201) complex semicircular groove (202).
3. A clean bench for high-temperature equipment according to claim 2, characterized in that: the movable plate (212) is fixed through a plurality of pairs of fastening bolts (214), two fastening bolts (214) of each pair of fastening bolts (214) are respectively positioned on two sides of the semi-cylinder (201), wherein the pair of fastening bolts (214) positioned in the middle are left and right leveling bolts (215); the number of the clamping seats (213) is two, and each clamping seat (213) is fixed through a pair of clamping bolts (216) and a pair of front and rear leveling bolts (217).
4. A clean bench for high-temperature equipment according to any one of claims 1 to 3, characterized in that: be equipped with buffer memory frame (700) in main frame (100), buffer memory frame (700) include grudging post (710) and locate the multilayer supporting platform on grudging post (710), carborundum oar (200) can dock with every layer of supporting platform.
5. The clean bench for high-temperature equipment according to claim 4, wherein: the supporting platform comprises a pair of fixed seat assemblies (720), each fixed seat assembly (720) comprises a base (721) and a supporting seat (722), the bases (721) are fixed on the stand (710), the supporting seats (722) are connected with the bases (721) through pin shafts (723), a return spring (724) is arranged between each base (721) and each supporting seat (722), the bases (721) are further provided with travel trigger switches (725) capable of being in contact with the supporting seats (722), the supporting seats (722) are provided with supporting grooves (726), and the supporting grooves (726) of the two supporting seats (722) are arranged oppositely.
6. The clean bench for high-temperature equipment according to claim 4, wherein: the top of the main frame (100) is provided with a high-efficiency filtering and purifying system (800).
7. A clean bench for high-temperature equipment according to any one of claims 1 to 3, characterized in that: the X-axis telescopic module (600) comprises a primary kinematic pair component (610) and a secondary kinematic pair component (620), the primary kinematic pair component (610) comprises a primary base (611), a primary linear guide rail (612), a primary screw rod pair (613) and a primary driving motor (614), the secondary kinematic pair component (620) comprises a secondary base (621), a secondary linear guide rail (622), a secondary screw rod pair (623) and a secondary driving motor (624), the primary base (611) is fixed on the Y-axis mobile module (500), the primary linear guide rail (612) and the primary screw rod pair (613) are arranged on the primary base (611), the secondary base (621) is arranged on the primary linear guide rail (612) in a sliding manner and is connected with the primary screw rod pair (613), the primary driving motor (614) is connected with the primary screw rod pair (613) through a belt (601) and a belt pulley (602), the secondary linear guide rail (622) and the secondary screw rod pair (623) are arranged on the secondary base (621), the mounting plate (625) is arranged on the secondary linear guide rail (622) in a sliding manner, the mounting plate (625) is connected with the secondary screw rod pair (623), the secondary driving motor (624) is connected with the secondary screw rod pair (623) through a belt (601) and a belt wheel (602), and the silicon carbide paddle (200) is arranged on the mounting plate (625).
CN201910019668.3A 2019-01-09 2019-01-09 Clean bench of high temperature equipment Active CN109659401B (en)

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CN109659401B true CN109659401B (en) 2020-07-10

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6537010B2 (en) * 1999-07-07 2003-03-25 Amtech Systems, Incorporated Wafer boat support and method for twin tower wafer boat loader
CN102760674A (en) * 2012-07-10 2012-10-31 中国电子科技集团公司第四十八研究所 Push-boat movement executing device for soft-landing diffusion furnace
CN103681420A (en) * 2013-11-22 2014-03-26 中国电子科技集团公司第四十八研究所 Automatic mounting and detaching system for silicon wafers of graphite boat for tube plasma enhanced chemical vapor deposition (PECVD)
CN206076214U (en) * 2016-08-25 2017-04-05 深圳市捷佳伟创新能源装备股份有限公司 A kind of quartz boat connecting gear in diffusion furnace
CN107283402A (en) * 2017-08-04 2017-10-24 深圳市捷佳伟创新能源装备股份有限公司 Accurately control boat system on the manipulator and multitube reative cell of stroke
CN108315719A (en) * 2017-12-20 2018-07-24 湖南红太阳光电科技有限公司 A kind of graphite boat cache shelf of five pipes PECVD

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6537010B2 (en) * 1999-07-07 2003-03-25 Amtech Systems, Incorporated Wafer boat support and method for twin tower wafer boat loader
CN102760674A (en) * 2012-07-10 2012-10-31 中国电子科技集团公司第四十八研究所 Push-boat movement executing device for soft-landing diffusion furnace
CN103681420A (en) * 2013-11-22 2014-03-26 中国电子科技集团公司第四十八研究所 Automatic mounting and detaching system for silicon wafers of graphite boat for tube plasma enhanced chemical vapor deposition (PECVD)
CN206076214U (en) * 2016-08-25 2017-04-05 深圳市捷佳伟创新能源装备股份有限公司 A kind of quartz boat connecting gear in diffusion furnace
CN107283402A (en) * 2017-08-04 2017-10-24 深圳市捷佳伟创新能源装备股份有限公司 Accurately control boat system on the manipulator and multitube reative cell of stroke
CN108315719A (en) * 2017-12-20 2018-07-24 湖南红太阳光电科技有限公司 A kind of graphite boat cache shelf of five pipes PECVD

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