CN109358233A - Conductive film surface conductivity test device and method are extracted based on electromagnetic field near field - Google Patents
Conductive film surface conductivity test device and method are extracted based on electromagnetic field near field Download PDFInfo
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- CN109358233A CN109358233A CN201811038049.0A CN201811038049A CN109358233A CN 109358233 A CN109358233 A CN 109358233A CN 201811038049 A CN201811038049 A CN 201811038049A CN 109358233 A CN109358233 A CN 109358233A
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- 238000012360 testing method Methods 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 title claims abstract description 13
- 230000005672 electromagnetic field Effects 0.000 title claims abstract description 12
- 239000000523 sample Substances 0.000 claims abstract description 54
- 230000005684 electric field Effects 0.000 claims abstract description 31
- 239000010408 film Substances 0.000 claims description 139
- 239000011159 matrix material Substances 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 7
- 239000010409 thin film Substances 0.000 claims description 6
- 238000004364 calculation method Methods 0.000 claims description 4
- GZPBVLUEICLBOA-UHFFFAOYSA-N 4-(dimethylamino)-3,5-dimethylphenol Chemical compound CN(C)C1=C(C)C=C(O)C=C1C GZPBVLUEICLBOA-UHFFFAOYSA-N 0.000 claims description 3
- 238000001514 detection method Methods 0.000 claims description 3
- 238000005259 measurement Methods 0.000 claims description 3
- 238000012546 transfer Methods 0.000 claims description 3
- 230000001360 synchronised effect Effects 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 abstract description 2
- 239000000284 extract Substances 0.000 abstract description 2
- 238000012545 processing Methods 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000005611 electricity Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000010998 test method Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 229910021389 graphene Inorganic materials 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 description 1
- 229910052982 molybdenum disulfide Inorganic materials 0.000 description 1
- 230000035772 mutation Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000012113 quantitative test Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000012956 testing procedure Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R27/00—Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
- G01R27/02—Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
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- General Physics & Mathematics (AREA)
- Measurement Of Resistance Or Impedance (AREA)
Abstract
The present invention relates to film surface conductivity measuring technologies, it is desirable to provide one kind extracts conductive film surface conductivity test device and method based on electromagnetic field near field.The device is that Electromagnetic Launching source is arranged in the side of conductive film, emits the direction direction of electromagnetic wave and perpendicular to conductive film；Magnetic field near field probes and electric field near field probes are placed in two sides respectively above and below horizontal conductive film, and two probes spacing identical as conductive film holding, the line of the two is perpendicular to conductive film.The present invention has no rigors to shape, the size of conductive film, can solve when carrying out high-frequency test in coaxial, waveguide, conductive film shape processing required precision is higher, error is larger problem.Meanwhile the present invention can measure conductive film any position, optional frequency, the surface conductivity of any time, obtain the surface conductivity of film with position, frequency, the distribution situation of time, be conducive to the reliability and stability for improving film application.
Description
Technical field
The present invention relates to a kind of film surface conductivity measuring technologies, and in particular to one kind is extracted based on electromagnetic field near field and led
The test device and method of film surface conductivity are accurately to measure film surface and position using electromagnetic field near-field test
With the local conductivity of frequency dependence.
Background technique
Conductive film is widely used in flexible electronic industrial field, is in urgent need.The most common conductive thin of industry at present
Film has the two-dimensional materials films such as tin indium oxide (ITO) film, fluorine-doped tin oxide (FTO) film and graphene, their electricity
Conductance be its be applied to screen show, one of the key influence factor of products such as screen touch-control, solar battery.Large-scale production
The electric thin of high quality not only needs to carry out accurate Row control in production, with greater need for different product, different batches
Carry out efficient quantitative test.Current test method is included in the chambers internal tests such as coaxial, waveguide, adds to conductive film shape
Work required precision is higher, mismachining tolerance degree test result is affected.
In the research frontier of Electromagnetic Fields & Magnetic Waves, there is the theoretical research largely about New Two Dimensional conductive film,
These films include graphene, molybdenum disulfide, hexagonal boron nitride etc., they are theoretically widely used in novel waveguide, novel
The design of the passive devices such as antenna, Novel Filter.Currently, the quality of production of these novel thin films is unstable, production scale compared with
It is small, thus with greater need for strictly being regulated and controled in production and design to their conductivity, and subtly measured.
Summary of the invention
The technical problem to be solved by the present invention is to overcome deficiency in the prior art, provide a kind of based on electromagnetic field near field
Extract the test device and method of conductive film surface conductivity.
In order to solve the technical problem, solution of the invention is:
A kind of test device for being extracted conductive film surface conductivity based on electromagnetic field near field is provided, is in conductive film
Electromagnetic Launching source is arranged in side, emits the direction direction of electromagnetic wave and perpendicular to conductive film；Electromagnetic Launching source and conductive thin
The spacing of film is greater than 2 λ, and λ is the wavelength for emitting electromagnetic wave；Two sides are placed magnetic field near field respectively and are visited above and below horizontal conductive film
Head and electric field near field probes, two probes spacing identical as conductive film holding, the line of the two is perpendicular to conductive film.
It is to have both the detection of magnetic field near field and the probe of electric field near field detecting function and substitute the magnetic field near field in the present invention
Probe and/or electric field near field probes.
In the present invention, the line between two probes intersects with conductive film, the direction of the launch and conduction in Electromagnetic Launching source
Film intersection, the distance between two crosspoints are not more than DMAX/ 2, DMAXFor the maximum caliber of emission source.
In the present invention, the Electromagnetic Launching source is electromagnetic horn.
In the present invention, the spacing of described two probes and conductive film is less than at a distance from Electromagnetic Launching source and conductive film.
In the present invention, described two probes are connected to industrial personal computer by signal wire respectively, and the Electromagnetic Launching source passes through signal
Line is connected to controller.
Invention further provides realize to extract conductive film surface conductance based on electromagnetic field near field using aforementioned device
The test method of rate is the electromagnetic wave irradiation conductive film issued using Electromagnetic Launching source, its surface is made to generate induced current, led to
Cross horizontal magnetic field and level electricity that magnetic field near field probes and electric field near field probes measurement conductive film two sides are formed by induced current
The amplitude and phase of field；Finally, the surface conductivity of conductive film is calculated using measurement data；
This method specifically includes:
(1) emit electromagnetic wave in the export-oriented conductive film of 2 λ distance using Electromagnetic Launching source, guarantee electromagnetic wave irradiation to conduction
Plane wave is equivalent to when film；
(2) amplitude of film two sides equidistant horizontal magnetic field and the width of phase, horizontal component of electric field are measured respectively using probe
Degree and phase；By transmission line theory and boundary condition, the surface of film is obtained using the amplitude and phase calculation of horizontal magnetic field
Electric current obtains surface field using the amplitude and phase calculation of horizontal component of electric field；And then it is obtained by surface field and surface current
Surface conductivity between two probes at line and conductive film crosspoint；
(3) position of synchronous change two probes, repeats the operation of step (1) and (2), to obtain conductive film difference
Surface conductivity at position.
In the present invention, before test job starts, first with vector network analyzer and standard component to two pop one's head in into
Row calibration, so as to accurately measure the corresponding data of electric and magnetic fields.
In the present invention, the surface current and surface electricity that film is calculated by transmission line theory and boundary condition
, in particular to:
Two probes are respectively placed in above and below conductive film, are respectively respectively d apart from film position1And d2；Two
The pop one's head in horizontal component of electric field that tests out, magnetic field is denoted as (E respectivelyI、HI) and (EII、HII)；
In the direction perpendicular to conductive film, conductive film one equivalent resistance, resistance value Req=1/ σ, ReqFor to
The surface conductivity of conductive film is surveyed, σ is the surface conductivity of conductive film to be measured；In conductive film two sides, probe and conduction
Vertical space between film is equivalent with two sections of air transfer lines, and propagation constant and characteristic impedance are respectively kz0=ω/c, Zc0
=(μ0/ε0)0.5；In formula, the π of ω=2 f is angular frequency, and f is transmitting wave frequency, and c is the light velocity in vacuum, μ0For Vacuum Magnetic
Conductance, ε0For permittivity of vacuum.
According to the definition of abcd matrix:
In above formula, since field parallel component is equal everywhere, there is EI=EII；Wherein, EII、HI、HIIFor pop one's head in measured value,
Zc0、kz0、d1、d2For known quantity；J is imaginary unit's symbol.
By carrying out inverse operation to the above matrix, solution obtains film surface conductivityσ.
In the present invention, when probe is less than λ/20 at a distance from conductive film, it is by the further abbreviation of the matrix
I.e.
It is solved according to formula (3) and obtains film surface conductivityσ.
The description of invention realization principle:
Conductive film material is placed in free space, and driving source plane of departure wave above film works as plane wave illumination
When to thin-film material surface, since electric field is in the reflection and transmission of film surface, the water of some strength can be formed above and below film
Ordinary telegram field；Its horizontal component of electric field can motivate the surface current of thin-film material, and the amplitude and phase of surface current depend on material
Surface conductivity；The surface current will lead to the mutation in film upper and lower surfaces magnetic field；Thus, under certain plane wave illumination, no
With the film of surface conductivity, corresponding surface horizontal component of electric field and horizontal magnetic field information are different, pass through test electric field and magnetic
, so that it may the anti-surface conductivity for releasing film.
Testing procedure of the invention is as follows: firstly, using vector network analyzer and standard component to magnetic field near field probes and
Electric field near field probes are calibrated, so as to measure electric and magnetic fields true value；Later, Electromagnetic Launching source (such as loudspeaker are utilized
Antenna etc.) other than several wavelength emit electromagnetic wave, to guarantee that plane wave can be equivalent to when electromagnetic wave irradiation to film；Into
And above and below film, at vertical range film certain position, test out the amplitude of horizontal magnetic field respectively using magnetic field near field probes
And phase, and the same position below film, the amplitude and phase of horizontal component of electric field are tested out using electric field near field probes.Most
Afterwards, by transmission line theory and boundary condition, can push away film surface current and surface field, and then solve film
Surface conductivity.
The surface conductivity that the test obtains be film on a point at conductivity, the point be located at probe just on
Side/underface.Surface conductivity by changing the test position of probe, at available film different location.
Meanwhile the surface conductivity that the test obtains is the conductivity at the tranmitting frequency of Electromagnetic Launching source.By changing electricity
The tranmitting frequency of magnetic emission source, at the same near field probes test respective frequencies under horizontal magnetic field and horizontal component of electric field amplitude and phase
Position can push away to obtain the surface conductivity of film under different frequency.
It is popped one's head in using multi -components, horizontal component of electric field, the horizontal magnetic field of film or more can be measured simultaneously, to obtain certain for the moment
The surface conductivity of film under different moments can be obtained in the film surface conductivity at quarter, change test moment.
Compared with prior art, the beneficial effects of the present invention are:
The present invention has no rigors to shape, the size of conductive film, can solve and carries out high frequency in coaxial, waveguide
When test, conductive film shape processing required precision is higher, error is larger problem.Meanwhile the present invention can measure conductive thin
Film any position, optional frequency, the surface conductivity of any time, the surface conductivity of available film with position, frequency,
The distribution situation of time is conducive to the reliability and stability for improving film application.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of test device in the present invention.
Fig. 2 is electromagnetic principle figure of the present invention.
Fig. 3 is the schematic diagram that embodiment is popped one's head in apart from conductive film 1mm to be measured.
Fig. 4 is the schematic diagram that embodiment is popped one's head in apart from conductive film 0.2mm to be measured.
Fig. 5 is the surface conductivity obtained when embodiment is popped one's head in apart from conductive film 1mm to be measured.
Fig. 6 is the surface conductivity obtained when embodiment is popped one's head in apart from conductive film 0.2mm to be measured.
Appended drawing reference in Fig. 1: 1 Electromagnetic Launching source；Near field probes above 2 films are (for the water above testing film
The amplitude and phase of ordinary telegram field and horizontal magnetic field)；3 conductive films；Near field probes below 4 films are (for below testing film
Horizontal component of electric field and horizontal magnetic field amplitude and phase).
Specific embodiment
The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.
The test device for extracting conductive film surface conductivity in the present invention based on electromagnetic field near field, is in conductive film 3
Side be arranged Electromagnetic Launching source 1, emit electromagnetic wave direction towards and perpendicular to conductive film 3；Electromagnetic Launching source 1 with lead
The spacing spacing of conductive film 3 is greater than 2 λ, and λ is transmitting electromagnetic wavelength；It is placed respectively closely in horizontal about 3 two sides of conductive film
Field probe 2 and near field probes 4, two probes keep identical spacing (to be not more than electromagnetism with the spacing of conductive film with conductive film 3
The distance between emission source and conductive film), the line of the two intersects perpendicular to conductive film 3 and with conductive film 3, electromagnetism hair
The direction of the launch for penetrating source 1 intersects with conductive film 3, and the distance between two crosspoints are not more than DMAX/ 2, DMAXFor emission source
Maximum caliber.
The optional electromagnetic horn in Electromagnetic Launching source 1, is connected to its controller by signal wire.Two probes pass through signal wire respectively
It is connected to industrial personal computer.It may be selected to have both the probe of the detection of magnetic field near field and electric field near field detecting function and substitute the magnetic field near field spy
Head and/or electric field near field probes.
Specific embodiment:
Measuring device schematic diagram of the invention places it in as shown in Figure 1, using electromagnetic horn as Electromagnetic Launching source 1
3 top certain position of conductive film.Two probes are respectively placed in above and below conductive film 3, are respectively apart from conductive film 3
d1And d2.Two electric fields tested out of popping one's head in, magnetic fields are denoted as (E respectivelyI、HI) and (EII、HII)。
In the direction perpendicular to conductive film 3, this device can be with transmission line model as shown in Figure 2 come equivalent.Conductive thin
Film 3 equivalent resistance, resistance value Req=1/ σ, σ are film surface conductivity to be measured.In 3 two sides of conductive film, visit
Vertical space between head and conductive film 3 is equivalent with two sections of air transfer lines, and propagation constant and characteristic impedance are kz0=ω/
c、Zc0=(μ0/ε0)0.5, according to the definition of abcd matrix, have
In above formula, since field parallel component is equal everywhere, there is EI=EII。EII、HI、HIIFor measured value of popping one's head in, Zc0、kz0、
d1、d23 surface conductivity σ of conductive film can be solved by carrying out inverse operation to the above matrix for known quantity.Particularly, when
Probe with conductive film 3 at a distance from less than λ/20 when, above formula can abbreviation be
I.e.
Using test method as described above, two examples calculated using the data of three-dimensional full-wave emulation are shown below.
As shown in Figure 3, it is assumed that having a sheet resistance is 50 Ω/square, and surface conductivity is the conductive film of 0.02S, benefit
With the plane wave of electromagnetic horn transmitting 6GHz, vertical irradiation is on film.Respectively in the two sides up and down of film, vertical range film
At 1mm, horizontal component of electric field and horizontal magnetic field (E are extractedII、HI、HII).It is each on film by carrying out inverse operation to formula (1)
Position solves the surface conductivity of film, as shown in Figure 5.Surface conductivity shown in fig. 5 is a certain moment, and film surface is not
With the local conductivity at position.
Similarly, it in Fig. 4, keeps other settings constant, is to be extracted level at 0.2mm in film two sides vertical range
Electric field and horizontal magnetic field, and by same principle, the surface conductivity of film is solved, as shown in Figure 6.
From figs. 5 and 6, it can be seen that solving obtained surface conductivity in the value of most of domain on 0.02S
Under, illustrate method of the invention precision with higher.
Claims (10)
1. a kind of test device for extracting conductive film surface conductivity based on electromagnetic field near field, which is characterized in that be in conduction
Electromagnetic Launching source is arranged in the side of film, emits the direction direction of electromagnetic wave and perpendicular to conductive film；Electromagnetic Launching source with
The spacing of conductive film is greater than 2 λ, and λ is the wavelength for emitting electromagnetic wave；Magnetic field is placed in two sides respectively above and below horizontal conductive film
Near field probes and electric field near field probes, two probes spacing identical as conductive film holding, the line of the two is perpendicular to conductive thin
Film.
2. test device according to claim 1, which is characterized in that be to have both the detection of magnetic field near field with electric field near field and visit
The probe of brake substitutes the magnetic field near field probes and/or electric field near field probes.
3. test device according to claim 1, which is characterized in that line and conductive film phase between two probes
It hands over, the direction of the launch in Electromagnetic Launching source intersects with conductive film, and the distance between two crosspoints are not more than DMAX/ 2, DMAXFor hair
Penetrate the maximum caliber in source.
4. test device according to claim 1, which is characterized in that the Electromagnetic Launching source is electromagnetic horn.
5. test device according to claim 1, which is characterized in that the spacing of described two probes and conductive film is less than
Electromagnetic Launching source is at a distance from conductive film.
6. according to claim 1 to test device described in 5 any one, which is characterized in that described two probes lead to respectively
It crosses signal wire and is connected to industrial personal computer, the Electromagnetic Launching source is connected to controller by signal wire.
7. realizing the test side for extracting conductive film surface conductivity based on electromagnetic field near field using claim 1 described device
Method, which is characterized in that it is the electromagnetic wave irradiation conductive film issued using Electromagnetic Launching source, its surface is made to generate induced current,
The horizontal magnetic field and level that conductive film two sides are formed by induced current are measured by magnetic field near field probes and electric field near field probes
The amplitude and phase of electric field；Finally, the surface conductivity of conductive film is calculated using measurement data；
This method specifically includes:
(1) emit electromagnetic wave in the export-oriented conductive film of 2 λ distance using Electromagnetic Launching source, guarantee electromagnetic wave irradiation to conductive film
When be equivalent to plane wave；
(2) using probe measure respectively film two sides equidistant horizontal magnetic field amplitude and phase, the amplitude of horizontal component of electric field with
Phase；By transmission line theory and boundary condition, the surface current of film is obtained using the amplitude and phase calculation of horizontal magnetic field,
Surface field is obtained using the amplitude and phase calculation of horizontal component of electric field；And then two spies are obtained by surface field and surface current
Surface conductivity between head at line and conductive film crosspoint；
(3) position of synchronous change two probes repeats the operation of step (1) and (2), to obtain conductive film different location
The surface conductivity at place.
8. the method according to the description of claim 7 is characterized in that dividing before test job starts first with vector network
Analyzer and standard component calibrate two probes, so as to accurately measure the corresponding data of electric and magnetic fields.
9. the method according to the description of claim 7 is characterized in that described be calculated by transmission line theory and boundary condition
The surface current and surface field of film, in particular to:
Two probes are respectively placed in above and below conductive film, are respectively respectively d apart from film position1And d2；Two probes
The horizontal component of electric field that tests out, magnetic field are denoted as (E respectivelyI、HI) and (EII、HII)；
In the direction perpendicular to conductive film, conductive film one equivalent resistance, resistance value Req=1/ σ, ReqIt is led to be to be measured
The surface conductivity of conductive film, σ are the surface conductivity of conductive film to be measured；In conductive film two sides, probe and conductive film
Between vertical space it is equivalent with two sections of air transfer lines, propagation constant and characteristic impedance are respectively kz0=ω/c, Zc0=
(μ0/ε0)0.5；In formula, the π of ω=2 f is angular frequency, and f is transmitting wave frequency, and c is the light velocity in vacuum, μ0For vacuum magnetic conductance
Rate, ε0For permittivity of vacuum.
According to the definition of abcd matrix:
In above formula, since field parallel component is equal everywhere, there is EI=EII；Wherein, EII、HI、HIIFor measured value of popping one's head in, Zc0、
kz0、d1、d2For known quantity；J is imaginary unit's symbol.
By carrying out inverse operation to the above matrix, solution obtains film surface conductivityσ.
10. according to the method described in claim 9, it is characterized in that, being incited somebody to action when probe is less than λ/20 at a distance from conductive film
The further abbreviation of matrix is
I.e.
It is solved according to formula (3) and obtains film surface conductivityσ.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811038049.0A CN109358233B (en) | 2018-09-06 | 2018-09-06 | Device and method for testing surface conductivity of conductive film based on electromagnetic field near field extraction |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811038049.0A CN109358233B (en) | 2018-09-06 | 2018-09-06 | Device and method for testing surface conductivity of conductive film based on electromagnetic field near field extraction |
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| Publication Number | Publication Date |
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| CN109358233A true CN109358233A (en) | 2019-02-19 |
| CN109358233B CN109358233B (en) | 2024-05-17 |
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ID=65350420
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