CN109333321A - Automatically adjustable hopper polisher - Google Patents

Automatically adjustable hopper polisher Download PDF

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Publication number
CN109333321A
CN109333321A CN201811255920.2A CN201811255920A CN109333321A CN 109333321 A CN109333321 A CN 109333321A CN 201811255920 A CN201811255920 A CN 201811255920A CN 109333321 A CN109333321 A CN 109333321A
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CN
China
Prior art keywords
moving mechanism
polishing
polishing wheel
bottom plate
plumb
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201811255920.2A
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Chinese (zh)
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CN109333321B (en
Inventor
卞伯中
刘立新
吴新华
瞿祖华
杨俊�
龚火金
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NANTONG BEITE PHARMACEUTICAL MACHINERY CO Ltd
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NANTONG BEITE PHARMACEUTICAL MACHINERY CO Ltd
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Priority to CN201811255920.2A priority Critical patent/CN109333321B/en
Publication of CN109333321A publication Critical patent/CN109333321A/en
Application granted granted Critical
Publication of CN109333321B publication Critical patent/CN109333321B/en
Expired - Fee Related legal-status Critical Current
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
    • B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
    • B24B29/04—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces for rotationally symmetrical workpieces, e.g. ball-, cylinder- or cone-shaped workpieces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/02—Frames; Beds; Carriages
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/04—Headstocks; Working-spindles; Features relating thereto
    • B24B41/042—Balancing mechanisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00—Drives or gearings; Equipment therefor
    • B24B47/02—Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables
    • B24B47/04—Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables by mechanical gearing only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B47/00—Drives or gearings; Equipment therefor
    • B24B47/02—Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables
    • B24B47/06—Drives or gearings; Equipment therefor for performing a reciprocating movement of carriages or work- tables by liquid or gas pressure only

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)

Abstract

本发明公开了一种可自动调节的料斗抛光机，可自动调节的料斗抛光机，包括平面移动机构、底板、铅锤面移动机构、水平移动机构、抛光轮支撑座、抛光轮，平面移动机构设于底板的上方，铅锤面移动机构设于底板的一端，铅锤面移动机构与水平移动机构相连，水平移动机构与抛光轮支撑座相连，抛光轮设于抛光轮支撑座底部。本发明无需人工在产品表面进行移动抛光，省时省力，可操控性强，抛光的精度高,通过弹性件的调节，能够使得抛光轮与凹凸不平的被抛光产品的表面充分接触，避免了抛光不到位的发生，抛光的效果好。

The invention discloses an automatically adjustable hopper polishing machine. The automatically adjustable hopper polishing machine comprises a plane moving mechanism, a bottom plate, a plumb surface moving mechanism, a horizontal moving mechanism, a polishing wheel support seat, a polishing wheel, and a plane moving mechanism Above the bottom plate, the plumb surface moving mechanism is located at one end of the bottom plate, the plumb surface moving mechanism is connected with the horizontal moving mechanism, the horizontal moving mechanism is connected with the polishing wheel support seat, and the polishing wheel is arranged at the bottom of the polishing wheel support seat. The invention does not need to manually move and polish the product surface, saves time and effort, has strong controllability, and has high polishing precision. Through the adjustment of the elastic member, the polishing wheel can be fully contacted with the surface of the uneven product to be polished, avoiding polishing If it is not in place, the polishing effect is good.

Description

Self-adjustable hopper polishing machine
Technical field
The present invention relates to machinery fields, specifically, in particular to a kind of self-adjustable hopper polishing machine.
Background technique
Polishing machine is that one kind can polish to the surface of product, makes the equipment that product surface is smooth.Polishing machine mainly by Rack, the polishing wheel in rack, the polishing fabric being sheathed on polishing wheel and drive polishing wheel driving motor at.Tradition Polishing machine polished by manual operation in the product surface being polished.Artificial polishing efficiency is low, simultaneously because the work of master worker Age, experience difference, the effect of the precision, polishing that will lead to final polishing is in the presence of irregular.For bigger Hopper polishing, the surface of hopper can not accomplish it is completely absolute smooth, by manually carry out polishing can overcome encounter it is recessed The processing of details is carried out when the surface of convex injustice, however, reciprocal movement is carried out by the operation of worker, it is time-consuming and laborious. The effect for how improving polishing, controls the precision of polishing, while can be improved the efficiency of polishing, is that the present invention needs what is solved to ask Topic.
Summary of the invention
Goal of the invention: the purpose of the present invention is to solve deficiencies in the prior art, provide a kind of self-adjustable Hopper polishing machine, without manually carrying out mobile polishing in product surface, time saving and energy saving, controllability is strong, and the precision of polishing is high.
Technical solution: a kind of self-adjustable hopper polishing machine of the present invention, self-adjustable hopper polishing machine, including Planar movement mechanism, bottom plate, plummet face mobile mechanism, horizontal mobile mechanism, polishing wheel support base, polishing wheel, planar movement machine Structure is set to the top of bottom plate, and plummet face mobile mechanism is set to one end of bottom plate, plummet face mobile mechanism and horizontal mobile mechanism phase Even, horizontal mobile mechanism is connected with polishing wheel support base, and polishing wheel is set to polishing wheel support base bottom；
Plummet face mobile mechanism includes column, plummet face mobile device, and column is a pair, and a column is symmetrically set in planar movement The two sides of mechanism, column are connected with plummet face mobile device, and plummet face mobile device can be moved up and down along column；
Horizontal mobile mechanism includes mounting base, the horizontally moving device in mounting base, the plummet face in mounting base and a column Mobile device is connected, and horizontally moving device can move back and forth in mounting base；
Polishing wheel support base includes upper backup pad, and upper backup pad is connected with elastic component, and elastic component is connected with polishing wheel；
Planar movement mechanism is slidably connected with bottom plate, and planar movement mechanism can be mobile relative to bottom plate, planar movement mechanism energy It is enough to be moved back and forth above bottom plate from plummet face mobile mechanism side to the other side.
A further improvement of the present invention is that planar movement mechanism includes mobile station, roller group, guide rail, roller group is set to Mobile station bottom, guide rail are set on the bottom plate, and roller group is run in the guide rail on bottom plate.
A further improvement of the present invention is that plummet face mobile device is connected with chain conveyor or cylinder is connected, one Plummet face mobile device is run simultaneously.
A further improvement of the present invention is that horizontally moving device is lead-screw drive mechanism.
A further improvement of the present invention is that elastic component is spring, it is equipped with connecting plate at the top of polishing wheel, connecting plate is L-type, The vertical portion of connecting plate is equipped with sliding block；Upper backup pad bottom plate is equipped with mounting plate, and mounting plate is equipped with guide groove；Sliding block is set to and leads Into slot, the top of the horizontal part of connecting plate is connected with spring.
A further improvement of the present invention is that plummet face mobile mechanism, moving horizontally machine, polishing wheel, planar movement mechanism Motor be connected with PLC or single-chip microcontroller be connected.
Compared with prior art, self-adjustable hopper polishing machine provided by the invention, at least realizing following has Beneficial effect:
1, by the movement of planar movement mechanism, it is past from plummet face mobile mechanism side to the other side to realize plummet face mobile mechanism Multiple movement, compared with traditional artificial promotion product carries out polishing, more intelligently, running fix is accurate, time saving and energy saving.
2, by the movement of plummet face mobile mechanism, the moving up and down in plummet face of plummet face mobile mechanism is realized, Can adjust polishing wheel at the top of polished product at a distance from, compared with traditional artificial promotion product carries out polishing, positioning is quasi- Really, accuracy is high, time saving and energy saving.
3, by the movement of horizontal mobile mechanism, the movement to polished product from side to the other side is realized, it can Polished product is polished comprehensively, accurate positioning, accuracy is high, time saving and energy saving.
4, by the adjusting of elastic component, polishing wheel is enabled to sufficiently to connect with the rough surface for being polished product Touching avoids and polishes generation not in place, and degree with precise polishing is more preferable, and the effect of polishing is good.
5, it drives planar movement mechanism mobile by roller group, drives plummet by the way that chain movement or cylinder push type are mobile The movement of face mobile mechanism is common mobile mechanism above, and material is easy to get, easy to make, and installation is easy
6, select lead-screw drive mechanism as horizontal mobile mechanism, accurate positioning, precision is high, can be realized to polishing product surface Comprehensive polishing.
7, sliding block is run in guide groove, is oriented to polishing wheel, so that polishing wheel moves up and down more stable, can be kept away Exempt from polishing wheel shaking, high reliablity avoids polishing position inaccurate as caused by shaking, and the accuracy of polishing is high.
8, by PLC or single-chip microcontroller, to plummet face mobile mechanism, horizontal mobile mechanism, planar movement mechanism stroke Displacement is controlled, with it is previous polishing is positioned manually compared with, accuracy is high.
Certainly, not specific needs are implemented any of the products of the present invention while reaching all the above technical effect.
By referring to the drawings to the detailed description of exemplary embodiment of the present invention, other feature of the invention and its Advantage will become apparent.
Detailed description of the invention
It is combined in the description and the attached drawing for constituting part of specification shows the embodiment of the present invention, and even With its explanation together principle for explaining the present invention.
Fig. 1 is the structural diagram of the present invention；
Fig. 2 is right view of the invention；
Fig. 3 is the attachment structure schematic diagram of elastic component and upper backup pad；
Wherein, 101- planar movement mechanism；102- bottom plate；103- mobile station；104- roller group；201- plummet face mobile mechanism； 202- column；203- plummet face mobile device；301- horizontal mobile mechanism；302- mounting base；303- horizontally moving device；400- Polishing wheel；401- polishing wheel support base；402- upper backup pad；403- elastic component；404- connecting plate；405- mounting plate；406- is led To slot；407- sliding block.
Specific embodiment
Carry out the various exemplary embodiments of detailed description of the present invention now with reference to attached drawing.It should also be noted that unless in addition having Body explanation, the unlimited system of component and the positioned opposite of step, numerical expression and the numerical value otherwise illustrated in these embodiments is originally The range of invention.
Be to the description only actually of at least one exemplary embodiment below it is illustrative, never as to the present invention And its application or any restrictions used.
Technology, method and apparatus known to person of ordinary skill in the relevant may be not discussed in detail, but suitable In the case of, the technology, method and apparatus should be considered as part of specification.
It is shown here and discuss all examples in, any occurrence should be construed as merely illustratively, without It is as limitation.Therefore, other examples of exemplary embodiment can have different values.
It should also be noted that similar label and letter indicate similar terms in following attached drawing, therefore, once a certain Xiang Yi It is defined in a attached drawing, then in subsequent attached drawing does not need that it is further discussed.
Such as Fig. 1-2, self-adjustable hopper polishing machine, including planar movement mechanism 101, bottom plate 102, the movement of plummet face Mechanism 201, horizontal mobile mechanism 301, polishing wheel support base 401, polishing wheel 400, planar movement mechanism 101 are set to bottom plate 102 Top, plummet face mobile mechanism 201 is set to one end of bottom plate 102, plummet face mobile mechanism 201 and horizontal mobile mechanism 301 It is connected, horizontal mobile mechanism 301 is connected with polishing wheel support base 401, and polishing wheel 400 is set to 401 bottom of polishing wheel support base；
Plummet face mobile mechanism 201 includes column 202, plummet face mobile device 203, and column 202 is a pair, a column 202 The two sides of planar movement mechanism 101 are symmetrically set in, column 202 is connected with plummet face mobile device 203, plummet face mobile device 203 can move up and down along column 202；
Horizontal mobile mechanism 301 includes the horizontally moving device 303 in mounting base 302, mounting base, mounting base 302 and an opposition Plummet face mobile device 203 on column 202 is connected, and horizontally moving device 303 can move back and forth in mounting base 302；
Polishing wheel support base 401 includes upper backup pad 402, and upper backup pad 402 is connected with elastic component 403, elastic component 403 and polishing Wheel 400 is connected；
Planar movement mechanism 101 is slidably connected with bottom plate 102, and planar movement mechanism 101 can be mobile relative to bottom plate 102, puts down Face mobile mechanism 101 can move back and forth above bottom plate 102 from 201 side of plummet face mobile mechanism to the other side.
Based on above-mentioned self-adjustable hopper polishing machine, the product polished will be needed to be placed in planar movement mechanism 101, Horizontally moving device 303 is moved to one end of mounting base 302,203 band of plummet face mobile device in plummet face mobile mechanism 201 Dynamic horizontal mobile mechanism 301 moves up and down, and horizontal mobile mechanism 301 drives polishing wheel support base 401 and polishing wheel support base 401 The polishing wheel 400 of bottom moves up and down, so that the product overhead height that the bottom of polishing wheel 400 and needs polish reaches unanimously, Planar movement mechanism 101 drives the product for needing to polish past to the other side from 201 side of plummet face mobile mechanism above bottom plate 102 Multiple movement is polished, and the edge polishing to product is completed.After the edge polishing for the product for completing to polish needs, plummet face Mobile mechanism 201 drives horizontal mobile mechanism 301 to move up, and the bottom of polishing wheel 400 is driven to leave the product for needing to polish, Mobile by the horizontally moving device 303 on horizontal mobile mechanism 301, the position that adjustment polishes in next step determines horizontal shifting Behind the position of dynamic device 303, moved down by the plummet face mobile device 203 of plummet face mobile mechanism 201, so that polishing wheel 400 are in contact with the burnishing surface of polished product, run planar movement mechanism 101 again, and planar movement mechanism 101, which drives, to be needed The product of polishing is moved back and forth from 201 side of plummet face mobile mechanism to the other side above bottom plate 102 and is polished.Pass through level Horizontally moving device 303 in mobile mechanism 301 is mobile, the movement of planar movement mechanism 101, plummet face mobile mechanism 201 Up and down adjustment finally completes the polishing at top to product.Compared with prior art, without manually carrying out mobile throwing in product surface Light, time saving and energy saving, controllability is strong, and the precision of polishing is high.
In the present embodiment, polishing wheel support base 401 includes upper backup pad 402, and upper backup pad 402 is connected with elastic component 403, Elastic component 403 is connected with polishing wheel 400, and elastic component 403 can carry out elastically regulating and controlling to polishing wheel 400, has adjusted polishing wheel 400 Be polished at a distance from product surface.The surface for being polished product is not abswolute level, and the product surface of polishing has bumps not Flat situation enables polishing wheel 400 to float up and down on the surface for being polished product by the adjusting of elastic component 403, even if It is polished the surface indentation of product, polishing wheel 400 can also be moved down and be polished, and convex for the surface for being polished product The place risen, polishing wheel can compress upwards to be polished, and the precision of polishing is high, effect is good, and there is no polish not in place show As.
For a further understanding of the present embodiment, it should be understood that planar movement mechanism 101 includes mobile station 103, idler wheel Group 104, guide rail, roller group 104 are set to 103 bottom of mobile station, and guide rail is set on bottom plate 102, and roller group 104 is on bottom plate 102 Guide rail in operation, roller group 104 drive mobile platform 103 run, install it is easy to make.
Further, plummet face mobile device 203 is connected with chain conveyor or cylinder is connected, and a pair of of plummet face is mobile Device 203 is run simultaneously, and it is common hoisting mechanism that chain is mobile and cylinder push type is mobile, and material is easy to get, installation production It is convenient.
Further, horizontally moving device 303 is lead-screw drive mechanism, and accurate positioning, precision is high, is avoided due to positioning Certain positions caused by inaccuracy cannot polish the generation of situation.
Further, such as Fig. 3, elastic component 403 is spring, is equipped with connecting plate 404, connecting plate 404 at the top of polishing wheel 400 Vertical portion for L-type, connecting plate 404 is equipped with sliding block 407；402 bottom plate of upper backup pad is equipped with mounting plate 405, on mounting plate 405 Equipped with guide groove 406；Sliding block 407 is set in guide groove 406, and the top of the horizontal part of connecting plate 404 is connected with spring.Sliding block 407 guide groove 406 run so that polishing wheel 400 move up and down it is more stable, can be avoided polishing wheel 400 shaking, reliability Height avoids polishing position inaccurate as caused by shaking, and the accuracy of polishing is high.
Further, plummet face mobile mechanism 201, horizontal mobile mechanism 301, polishing wheel 400, planar movement mechanism The 101 motor perhaps single-chip microcontroller that is connected with PLC is connected through PLC or single-chip microcontroller, to plummet face mobile mechanism 201, horizontal Mobile mechanism 301, planar movement mechanism 101 travel displacement controlled, with it is previous polishing is positioned manually compared with, accuracy It is high.
Through the foregoing embodiment it is found that self-adjustable hopper polishing machine provided by the invention, at least realizes as follows The utility model has the advantages that
1, by the movement of planar movement mechanism, it is past from plummet face mobile mechanism side to the other side to realize plummet face mobile mechanism Multiple movement, compared with traditional artificial promotion product carries out polishing, more intelligently, running fix is accurate, time saving and energy saving.
2, by the movement of plummet face mobile mechanism, the moving up and down in plummet face of plummet face mobile mechanism is realized, Can adjust polishing wheel at the top of polished product at a distance from, compared with traditional artificial promotion product carries out polishing, positioning is quasi- Really, accuracy is high, time saving and energy saving.
3, by the movement of horizontal mobile mechanism, the movement to polished product from side to the other side is realized, it can Polished product is polished comprehensively, accurate positioning, accuracy is high, time saving and energy saving.
4, by the adjusting of elastic component, polishing wheel is enabled to sufficiently to connect with the rough surface for being polished product Touching avoids and polishes generation not in place, and degree with precise polishing is more preferable, and the effect of polishing is good.
5, it drives planar movement mechanism mobile by roller group, drives plummet by the way that chain movement or cylinder push type are mobile The movement of face mobile mechanism is common mobile mechanism above, and material is easy to get, easy to make, and installation is easy
6, select lead-screw drive mechanism as horizontal mobile mechanism, accurate positioning, precision is high, can be realized to polishing product surface Comprehensive polishing.
7, sliding block is run in guide groove, is oriented to polishing wheel, so that polishing wheel moves up and down more stable, can be kept away Exempt from polishing wheel shaking, high reliablity avoids polishing position inaccurate as caused by shaking, and the accuracy of polishing is high.
8, by PLC or single-chip microcontroller, to plummet face mobile mechanism, horizontal mobile mechanism, planar movement mechanism stroke Displacement is controlled, with it is previous polishing is positioned manually compared with, accuracy is high.
Although some specific embodiments of the invention are described in detail by example, the skill of this field Art personnel it should be understood that example above merely to being illustrated, the range being not intended to be limiting of the invention.The skill of this field Art personnel are it should be understood that can without departing from the scope and spirit of the present invention modify to above embodiments.This hair Bright range is defined by the following claims.

Claims (6)

1.可自动调节的料斗抛光机，其特征在于：包括平面移动机构（101）、底板（102）、铅锤面移动机构（201）、水平移动机构（301）、抛光轮支撑座（401）、抛光轮（400），所述平面移动机构（101）设于底板（102）的上方，所述铅锤面移动机构（201）设于底板（102）的一端，所述铅锤面移动机构（201）与水平移动机构（301）相连，所述水平移动机构（301）与抛光轮支撑座（401）相连，所述抛光轮（400）设于抛光轮支撑座（401）底部；1. An automatically adjustable hopper polishing machine, characterized in that it includes a plane moving mechanism (101), a bottom plate (102), a plumb face moving mechanism (201), a horizontal moving mechanism (301), and a polishing wheel support seat (401) , polishing wheel (400), the plane moving mechanism (101) is arranged above the bottom plate (102), the plumb surface moving mechanism (201) is arranged at one end of the bottom plate (102), the plumb surface moving mechanism (201) is connected with a horizontal moving mechanism (301), the horizontal moving mechanism (301) is connected with a polishing wheel support seat (401), and the polishing wheel (400) is arranged at the bottom of the polishing wheel support seat (401); 所述铅锤面移动机构（201）包括立柱（202）、铅锤面移动装置（203），所述立柱（202）为一对，一对所述立柱（202）对称设于平面移动机构（101）的两侧，所述立柱（202）与铅锤面移动装置（203）相连，所述铅锤面移动装置（203）能够沿立柱（202）上下移动；The plumb face moving mechanism (201) includes a vertical column (202) and a plumb face moving device (203), the vertical columns (202) are a pair, and the pair of the vertical columns (202) are symmetrically arranged on the plane moving mechanism (203). 101) on both sides, the column (202) is connected with a plumb face moving device (203), and the plumb face moving device (203) can move up and down along the column (202); 所述水平移动机构（301）包括安装座（302）、安装座上的水平移动装置（303），所述安装座（302）与一对立柱（202）上的铅锤面移动装置（203）相连，所述水平移动装置（303）能够在安装座（302）上往复移动；The horizontal moving mechanism (301) comprises a mounting seat (302), a horizontal moving device (303) on the mounting seat, the mounting seat (302) and a plumb surface moving device (203) on a pair of uprights (202) connected, the horizontal moving device (303) can reciprocate on the mounting seat (302); 所述抛光轮支撑座（401）包括上支撑板（402），所述上支撑板（402）与弹性件（403）相连，所述弹性件（403）与抛光轮（400）相连；The polishing wheel supporting seat (401) includes an upper supporting plate (402), the upper supporting plate (402) is connected with an elastic member (403), and the elastic member (403) is connected with the polishing wheel (400); 所述平面移动机构（101）与底板（102）滑动连接，所述平面移动机构（101）能够相对于底板（102）移动，所述平面移动机构（101）能够在底板（102）上方从铅锤面移动机构（201）侧至另一侧往复移动。The plane moving mechanism (101) is slidably connected with the bottom plate (102), the plane moving mechanism (101) can move relative to the bottom plate (102), and the plane moving mechanism (101) can move from the lead above the bottom plate (102). The hammer face moving mechanism (201) reciprocates from side to side. 2.根据权利要求1所述的一种可自动调节的料斗抛光机，其特征在于：2. A kind of automatically adjustable hopper polishing machine according to claim 1 is characterized in that: 所述平面移动机构（101）包括移动台（103）、滚轮组（104）、导轨，所述滚轮组（104）设于移动台（103）底部，所述导轨设于底板（102）上，所述滚轮组（104）在底板（102）上的导轨内运行。The plane moving mechanism (101) comprises a moving table (103), a roller group (104), and a guide rail, the roller group (104) is arranged at the bottom of the moving table (103), and the guide rail is arranged on the bottom plate (102), The roller set (104) runs in guide rails on the base plate (102). 3.根据权利要求1所述的一种可自动调节的料斗抛光机，其特征在于：3. A kind of automatically adjustable hopper polishing machine according to claim 1 is characterized in that: 所述铅锤面移动装置（203）与链条传送带相连或者气缸相连，一对所述铅锤面移动装置（203）同步运行。The plumb face moving device (203) is connected with a chain conveyor or a cylinder, and a pair of the plumb face moving devices (203) run synchronously. 4.根据权利要求1所述的一种可自动调节的料斗抛光机，其特征在于：4. A kind of automatically adjustable hopper polishing machine according to claim 1 is characterized in that: 所述水平移动装置（303）为丝杠传动机构。The horizontal moving device (303) is a screw drive mechanism. 5.根据权利要求1-5任意一条所述的一种可自动调节的料斗抛光机，其特征在于：5. The self-adjustable hopper polishing machine according to any one of claims 1-5, characterized in that: 所述弹性件（403）为弹簧，所述抛光轮（400）顶部设有连接板（404），所述连接板（404）为L型，所述连接板（404）的竖直部上设有滑块（407）；The elastic member (403) is a spring, the top of the polishing wheel (400) is provided with a connecting plate (404), the connecting plate (404) is L-shaped, and the vertical portion of the connecting plate (404) is provided with a connecting plate (404). has slider(407); 所述上支撑板（402）底板设有安装板（405），所述安装板（405）上设有导向槽（406）；The bottom plate of the upper support plate (402) is provided with a mounting plate (405), and the mounting plate (405) is provided with a guide groove (406); 所述滑块（407）设于导向槽（406）内，所述连接板（404）的水平部的顶部与弹簧相连。The slider (407) is arranged in the guide groove (406), and the top of the horizontal portion of the connecting plate (404) is connected with the spring. 6.根据权利要求1-5任意一条所述的一种可自动调节的料斗抛光机，其特征在于：6. The self-adjustable hopper polishing machine according to any one of claims 1-5, characterized in that: 所述铅锤面移动机构（201）、水平移动机构（301）、抛光轮（400）、平面移动机构（101）的电机均与PLC相连或者单片机相连。The motors of the plumb plane moving mechanism (201), the horizontal moving mechanism (301), the polishing wheel (400), and the plane moving mechanism (101) are all connected with a PLC or a single-chip microcomputer.
CN201811255920.2A 2018-10-26 2018-10-26 Hopper polisher capable of being automatically adjusted Expired - Fee Related CN109333321B (en)

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