CN109161858B - 一种掺氮的铝钪合金靶材及其制造方法 - Google Patents

一种掺氮的铝钪合金靶材及其制造方法 Download PDF

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CN109161858B
CN109161858B CN201811048555.8A CN201811048555A CN109161858B CN 109161858 B CN109161858 B CN 109161858B CN 201811048555 A CN201811048555 A CN 201811048555A CN 109161858 B CN109161858 B CN 109161858B
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scandium alloy
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丁照崇
王兴权
张晓娜
何金江
李勇军
雷继锋
庞欣
贺昕
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Grinm Advanced Materials Co ltd
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    • C—CHEMISTRY; METALLURGY
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    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

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Abstract

本发明公开了属于磁控溅射靶材制造技术领域的一种掺氮的铝钪合金靶材及其制造方法。铝氮钪合金靶材化学成分为(AlxSc(1‑x))(1‑y)(AlN)y，其中以AlN形式对铝钪合金进行掺氮，掺氮的铝钪合金靶材以AlSc合金粉、AlN粉为原料，通过压力烧结工艺成型后由机加工制造出掺氮的铝钪合金单体成品靶材，或与背板焊接为复合成品靶材。采用该合金靶材溅射沉积氮化物膜，可降低膜层内氮原子缺失，确保薄膜合金成分比例。

Description

一种掺氮的铝钪合金靶材及其制造方法
技术领域
本发明属于磁控溅射靶材制造技术领域，尤其涉及一种掺氮的铝钪合金靶材及其制造方法。
背景技术
在新型微机电系统(MEMS)及射频滤波器等领域，铝氮钪薄膜由于具有优异的压电耦合系数，成为当前研究的热点。铝氮钪薄膜主要是通过反应溅射铝钪合金靶来沉积制造的，在溅射过程中需持续通入氮气，以作为反应气体。然而，溅射过程中氮气会和靶材发生很强的电化学反应，靶面易覆盖一层化合物，使得溅射刻蚀区域异常放电，影响镀膜性能，且制造出的氮化物膜层中氮原子易缺失，造成薄膜合金成分比例失配。
发明内容
本发明的目的在于提供一种掺氮的铝钪合金靶材及其制造方法，其特征在于，所述掺氮的铝钪合金靶材的化学成分为(AlxSc(1-x))(1-y)(AlN)y，以AlN形式对铝钪合金进行掺氮，其中Al原子含量x为0～1,AlN质量含量y为0.1～99.9％。
掺氮的铝钪合金靶材是以AlSc合金粉、AlN粉为原料，通过压力烧结工艺成型的，靶材相对密度达到95％以上。具体方法步骤如下：
(1)按掺氮的铝钪合金靶材成分配比AlSc合金粉、AlN粉原料，其中AlN粉粒径0.1～50μm，AlSc合金粉粒径1～150μm。
(2)将步骤(1)中所配比的两种原料放入混料机或球磨机内球磨混合均匀，混合过程中，混料机或球磨机处于真空状态，或用惰性气体保护。
(3)将步骤(2)中所得的混合粉末压力烧结成靶坯，其中压力烧结为热压烧结或热等静压烧结，烧结温度为600～1200℃，烧结压力为30～150MPa，保温保压时间为4～6h。
(4)将步骤(3)中所得进行机加工制造出掺氮的铝钪合金单体成品靶材，或机加工后与背板焊接为复合成品靶材。
本发明的有益效果为：
(1)本发明公开了一种渗氮的铝钪合金靶材及其制造方法，由于在块体靶材中已合金化氮，所以在磁控溅射镀膜过程中，无需或仅需少量补偿通入反应气体氮气，即可稳定地将铝、钪与氮的反应物按所需的化学配比稳定成膜，具有降低膜层内氮原子缺失、确保薄膜合金成分比例、不易异常放电、工艺窗口宽、稳定性好的特点。
(2)本发明采用易于制造或购买的AlN、AlSc合金粉为原料，采用压力烧结工艺成型，制造出的靶坯易致密化、不开裂、工艺简单，适合大批量工业化生产。
附图说明
图1为本发明涉及的掺氮的铝钪合金靶材制造方法流程图。
具体实施方式
本发明提供了一种掺氮的铝钪合金靶材及其制造方法，下面结合实施例和附图对本发明做进一步的说明。
1.配料
按本实施例1-8(如表1所示)设计的掺氮的铝钪合金靶材成分进行原材料配料：靶材化学成分为(AlxSc(1-x))(1-y)(AlN)y，其中以AlN形式对铝钪合金进行掺氮，Al原子含量x为0～1,AlN质量含量y为0.1～99.9％。AlN粉粒径0.1～50μm，AlSc合金粉粒径1～150μm。
2.混粉
将配比的两种原料放入混料机或球磨机内球磨混合均匀。混合过程中，为了防止粉末氧化，混料机或球磨机处于真空状态，或惰性气体保护，如Ar气。
3.压力烧结
将混合粉末压力烧结成靶坯，压力烧结采用热压烧结或热等静压烧结，压力烧结工艺为：烧结温度为600～1200℃，压力为30～150MPa，保温保压时间为4～6h。
4.机加工/焊接
对压力烧结靶坯进行机加工制造出掺氮的铝钪合金单体成品靶材，或机加工后与背板焊接为复合成品靶材。
实施例1-8掺氮的铝钪合金靶材的制造工艺及性能详见表1。
表1实施例1-8掺氮的铝钪合金靶材的制造工艺及性能
Figure BDA0001793900810000031

Claims (3)

1.一种掺氮的铝钪合金靶材，其特征在于，所述铝氮钪合金靶材的化学成分为(AlxSc（1-x）)（1-y）(AlN)y，其中以AlN形式对铝钪合金进行掺氮，Al原子含量x为0~1，AlN质量含量y为0.1~99.9%；
所述掺氮的铝钪合金靶材以AlSc合金粉、AlN粉为原料，通过压力烧结工艺成型，靶材相对密度达到95%以上；
一种掺氮的铝钪合金靶材的制造方法，包括以下步骤：
（1）配料：按粉末冶金靶材的合金成分配比AlSc合金粉、AlN粉原料；
（2）混粉：将步骤（1）中所配比的两种原料放入混料机或球磨机内球磨混合均匀；
（3）压力烧结：将步骤（2）中所得的混合粉末压力烧结成靶坯；所述压力烧结为热压烧结或热等静压烧结，烧结环境为优于0.1Pa真空状态或惰性气体保护，烧结温度600~1200℃，烧结压力为30~150MPa，保温保压时间为4~6h；
（4）将步骤（3）中所得靶坯进行机加工制造出掺氮的铝钪合金单体成品靶材，或将机加工后的单体靶材与背板焊接为复合成品靶材。
2.根据权利要求1所述的一种掺氮的铝钪合金靶材，其特征在于，AlN粉粒径为0.1~50μm，AlSc合金粉的粒径为1~150μm。
3.根据权利要求1所述的一种掺氮的铝钪合金靶材，其特征在于，所述步骤（2）的混粉过程在优于0.1Pa真空状态或惰性气体保护下进行。
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