CN109116593A - motherboard exposure method - Google Patents
motherboard exposure method Download PDFInfo
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- CN109116593A CN109116593A CN201810873781.3A CN201810873781A CN109116593A CN 109116593 A CN109116593 A CN 109116593A CN 201810873781 A CN201810873781 A CN 201810873781A CN 109116593 A CN109116593 A CN 109116593A
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- liquid crystal
- crystal display
- exposure
- panel
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
Abstract
The present invention provides a kind of motherboard exposure method.The motherboard exposure method, which passes through, is contoured to correspond to pattern area on the right side of liquid crystal display panel for the left side exposure region in the light shield for corresponding to every a line liquid crystal display panel and the non-panel area adjacent with every a line liquid crystal display panel, right side exposure region is contoured to correspond to pattern area on the left of liquid crystal display panel, center exposure area is contoured to correspond to liquid crystal display panel center pattern area and the non-panel area adjacent with every a line liquid crystal display panel, every a line liquid crystal display panel and the non-panel area adjacent with every a line liquid crystal display panel can be exposed simultaneously by the light shield, the exposure of liquid crystal display panel and the non-panel area adjacent with the liquid crystal display panel is completed at the same time by single exposure, it does not need individually to expose non-panel area by additional exposure actions, light shield exposure frequency can be reduced, save production capacity, improve production efficiency, reduce panel production cost.
Description
Technical field
The present invention relates to field of display technology more particularly to a kind of motherboard exposure methods.
Background technique
Thin film transistor (TFT) (Thin Film Transistor, TFT) is current liquid crystal display device (Liquid Crystal
Display, LCD) and active matrix drive type organic electroluminescence display device and method of manufacturing same (Active Matrix Organic Light-
Emitting Diode, AMOLED) in main driving element, the display performance of direct relation panel display apparatus.
Liquid crystal display on existing market is largely backlight liquid crystal display comprising liquid crystal display panel and back
Optical mode group (backlight module).The working principle of liquid crystal display panel is in thin film transistor base plate (Thin Film
Transistor Array Substrate, TFT Array Substrate) and colored filter (Color Filter, CF)
Pour into liquid crystal molecule between substrate, and apply pixel voltage and common voltage respectively on two plate bases, by pixel voltage and
The light refraction of backlight module is come out and generates picture by the direction of rotation of the electric field controls liquid crystal molecule formed between common voltage
Face.
As the consumption habit of people changes, large scale liquid crystal panel is increasingly favored by the majority of consumers, in the market greatly
Size (being greater than 65 inches) liquid crystal display panel demand is more and more.The existing most of generation lines of panel factory are 6 generation lines and 8.5 generations
Line, 65 cun or more of liquid crystal display panel size are greater than the light shield size of 6 generation lines and 8.5 generation lines, therefore, corresponding large scale liquid crystal
It needs to splice using light shield when the mask set of panel and design.Liquid crystal display panel is in typesetting on big plate, if having spare region on big plate
Domain (region dummy) would generally expose light shield partial pattern in spare area when exposure, guarantee among liquid crystal display panel and edge
It is suitable to locate pattern density, liquid crystal display panel edge occurred carving or etching not foot phenomenon because density is small when avoiding the occurrence of etching,
Liquid crystal display panel homogeneity and quality are influenced, is not in spare area pattern on the liquid crystal display panel of final finished, because being referred to herein as
The region dummy.Existing mask splicing design method also needs after the exposure for completing liquid crystal display panel using additional exposure actions
(shot) exposure in the region dummy is completed, will increase additional production capacity, reduces production efficiency, improve production cost.
Summary of the invention
The purpose of the present invention is to provide a kind of motherboard exposure methods, it is possible to reduce light shield exposure frequency is saved production capacity, mentioned
High efficiency reduces panel production cost.
To achieve the above object, the present invention provides a kind of motherboard exposure method, include the following steps:
Step S1, motherboard is provided, the motherboard includes panel area and the non-panel area adjacent with the panel area；The face
Plate area includes the multiple liquid crystal display panels being arranged in array；Each liquid crystal display panel includes left side pattern area, the center being sequentially connected
Pattern area and right side pattern area；
Step S2, corresponding every a line liquid crystal display panel and the non-panel area adjacent with every a line liquid crystal display panel are provided which light shield,
The light shield includes the left side exposure region in pattern area on the right side of corresponding liquid crystal display panel, corresponds at least the two of liquid crystal display panel center pattern area
The right side exposure region in pattern area on the left of a center exposure area and corresponding liquid crystal display panel；The center exposure area it is also corresponding simultaneously with
The adjacent non-panel area of every a line liquid crystal display panel；
Step S3, by the light shield simultaneously to every a line liquid crystal display panel and the non-panel adjacent with every a line liquid crystal display panel
Area is exposed, and the exposure of liquid crystal display panel and the non-panel area adjacent with the liquid crystal display panel is completed at the same time by single exposure.
When panel area is located at the right side of motherboard, non-panel area is located at the left side of motherboard；In the step S3, while to right
Answer the center of the right side exposure region in pattern area on the left of liquid crystal display panel and the correspondence non-panel area adjacent with every a line liquid crystal display panel
Exposure region is exposed, by single exposure be completed at the same time on the left of liquid crystal display panel pattern area and with pattern area on the left of the liquid crystal display panel
The exposure of adjacent non-panel area.
The left side exposure region also corresponds to the non-panel area adjacent with every a line liquid crystal display panel simultaneously.
When panel area is located at the left side of motherboard, non-panel area is located at the right side of motherboard；In the step S3, while to right
Answer the center of the left side exposure region in pattern area on the right side of liquid crystal display panel and the correspondence non-panel area adjacent with every a line liquid crystal display panel
Exposure region is exposed, by single exposure be completed at the same time on the right side of liquid crystal display panel pattern area and with pattern area on the right side of the liquid crystal display panel
Non- panel area exposure.
The right side exposure region also corresponds to the non-panel area adjacent with every a line liquid crystal display panel simultaneously.
When panel area is located at the central area of motherboard, non-panel area is located at the left and right sides of motherboard；In the step S3,
Non- panel adjacent with every a line liquid crystal display panel to the left side exposure region and correspondence that correspond to liquid crystal display panel right side pattern area simultaneously
The center exposure area in area is exposed, by single exposure be completed at the same time on the right side of liquid crystal display panel pattern area and with the liquid crystal display panel right side
The exposure of the adjacent non-panel area in side pattern area, alternatively, simultaneously to the right side exposure region in pattern area on the left of corresponding liquid crystal display panel with
And the center exposure area of the corresponding non-panel area adjacent with every a line liquid crystal display panel is exposed, and is completed at the same time by single exposure
The exposure of pattern area and the non-panel area adjacent with pattern area on the left of the liquid crystal display panel on the left of liquid crystal display panel.
The panel area includes three liquid crystal display panels arranged along the vertical direction.
Each liquid crystal display panel includes viewing area and the rim area for surrounding viewing area；The left side exposure region, center exposure
Area and right side exposure region include the first exposure region of corresponding viewing area and the second exposure region of corresponding rim area.
The left side exposure region, center exposure area and right side exposure region further include the mosaic adjacent with the first exposure region
Region.
Beneficial effects of the present invention: motherboard exposure method of the invention by will correspond to every a line liquid crystal display panel and with it is each
Left side exposure region in the light shield of the adjacent non-panel area of row liquid crystal display panel is contoured to correspond to pattern area, right side on the right side of liquid crystal display panel
Exposure region is contoured to correspond to pattern area on the left of liquid crystal display panel, center exposure area be contoured to correspond to liquid crystal display panel center pattern area and with
The adjacent non-panel area of every a line liquid crystal display panel, can by the light shield simultaneously to every a line liquid crystal display panel and with every a line liquid
The adjacent non-panel area of crystal panel is exposed, and is completed at the same time liquid crystal display panel and adjacent with the liquid crystal display panel by single exposure
The exposure of non-panel area does not need individually to expose non-panel area by additional exposure actions, it is possible to reduce light shield exposure frequency,
Production capacity is saved, production efficiency is improved, reduces panel production cost.
Detailed description of the invention
For further understanding of the features and technical contents of the present invention, it please refers to below in connection with of the invention detailed
Illustrate and attached drawing, however, the drawings only provide reference and explanation, is not intended to limit the present invention.
In attached drawing,
Fig. 1 is the flow chart of motherboard exposure method of the invention；
Fig. 2 is that the liquid crystal display panel of motherboard exposure method of the invention is located at the schematic diagram on the right side of motherboard；
Fig. 3 is that the liquid crystal display panel of motherboard exposure method of the invention is located at the schematic diagram on the left of motherboard；
Fig. 4 is that the liquid crystal display panel of motherboard exposure method of the invention is located at the schematic diagram of motherboard central area；
Fig. 5 is the schematic diagram of a preferred embodiment of the light shield of motherboard exposure method of the invention；
Fig. 6 and 7 is the schematic diagram of another preferred embodiment of the light shield of motherboard exposure method of the invention.
Specific embodiment
Further to illustrate technological means and its effect adopted by the present invention, below in conjunction with preferred implementation of the invention
Example and its attached drawing are described in detail.
Referring to Fig. 1, the present invention provides a kind of motherboard exposure method, include the following steps:
Step S1, motherboard 10 is provided, the motherboard 10 includes panel area 11 and the non-panel adjacent with the panel area 11
Area (area dummy) 12；The panel area 11 includes the multiple liquid crystal display panels 13 being arranged in array；Each liquid crystal display panel 13 includes
Left side pattern area, center pattern area and the right side pattern area being sequentially connected；
Step S2, corresponding every a line liquid crystal display panel 13 and the non-panel area 12 adjacent with every a line liquid crystal display panel 13 are provided which
Light shield 20, the light shield 20 include the left side exposure region 23 in corresponding 13 right side pattern area of liquid crystal display panel, correspond in liquid crystal display panel 13
The right side exposure region 21 in at least two center exposure areas 22 in heart pattern area and corresponding 13 left side pattern area of liquid crystal display panel；It is described
Center exposure area 22 is gone back while the corresponding non-panel area 12 adjacent with every a line liquid crystal display panel 13；
Step S3, by the light shield 20 simultaneously to every a line liquid crystal display panel 13 and adjacent with every a line liquid crystal display panel 13
Non- panel area 12 is exposed, and is completed at the same time liquid crystal display panel 13 and the non-panel adjacent with the liquid crystal display panel 13 by single exposure
The exposure in area 12.
It should be noted that the present invention is by being contoured to correspond to 13 right side of liquid crystal display panel for the left side exposure region 23 of light shield 20
Pattern area, right side exposure region 21 are contoured to correspond to 13 left side pattern area of liquid crystal display panel, and center exposure area 22 is contoured to correspond to liquid crystal
13 center pattern area of panel and the non-panel area 12 adjacent with every a line liquid crystal display panel 13, can be right simultaneously by the light shield 20
Every a line liquid crystal display panel 13 and the non-panel area 12 adjacent with every a line liquid crystal display panel 13 are exposed, simultaneously by single exposure
The exposure of liquid crystal display panel 13 and the non-panel area 12 adjacent with the liquid crystal display panel 13 is completed, the present invention is not being needed by additional
Exposure actions individually expose non-panel area, it is possible to reduce light shield exposure frequency saves production capacity, improves production efficiency, reduces panel
Production cost.
Specifically, present invention citing is described having a size of 65 inches of the generation line of liquid crystal display panel 13 and 8.5 motherboard 10, and 65 inches
The length of liquid crystal display panel 13 be 1440mm, width 810mm, and the length of 8.5 generation line motherboards 10 is 2200mm, and width is
2500mm, therefore three 65 inches of liquid crystal display panel 13 is at most formed on 8.5 generation line motherboards 10 in the vertical direction, i.e., at most may be used
To be cut into three 65 inches of liquid crystal display panel 13, the panel area 11 includes three liquid crystal display panels arranged along the vertical direction
13.Further, since the size of liquid crystal display panel 13 is larger, the size of the exposure region of light shield itself is restricted, therefore the present invention needs
At least two center exposure areas 22 could be exposed 13 center pattern area of liquid crystal display panel.
As shown in Fig. 2, non-panel area 12 is respectively positioned on the left side of motherboard 10 when panel area 11 is located at the right side of motherboard 10,
Therefore in the step S3, only need the right side exposure region 21 to corresponding 13 left side pattern area of liquid crystal display panel simultaneously and it is corresponding with it is every
The center exposure area 22 of the adjacent non-panel area 12 of a line liquid crystal display panel 13 is exposed, and is completed at the same time liquid crystal by single exposure
The exposure of 13 left side pattern area of panel and the non-panel area 12 adjacent with the 13 left side pattern area of liquid crystal display panel, compared to existing skill
Individually non-panel area 12 is exposed using additional exposure actions in art, 3 can be saved when exposing three liquid crystal display panels 13
Secondary exposure frequency；And the wider width of the non-panel area 12, it is also right simultaneously that left side exposure region 23 can also be arranged by the present invention
Non- panel area 12 that should be adjacent with every a line liquid crystal display panel 13, by center exposure area 22 and left side exposure region 23 simultaneously to non-face
Plate area 12 is exposed.
Specifically, when panel area 11 is located at the right side of motherboard 10, non-panel area 12 is respectively positioned on the left side of motherboard 10, this hair
The bright specific exposure method to a liquid crystal display panel 13 and its adjacent non-panel area 12 are as follows: firstly, to non-face plate area 12 is located at
Left side exposure region 23 and center exposure area 22 and be exposed simultaneously positioned at the right side exposure region 21 of panel area 11 and block it
His exposure region is then exposed close to the center exposure area 22 of right side exposure region 21 to panel area 11 is located at and blocks other
Then exposure region is exposed close to the center exposure area 22 of left side exposure region 23 to panel area 11 is located at and blocks other exposures
Light area, finally, being exposed to the left side exposure region 23 for being located at panel area 11 and blocking other exposure regions；Therefore, the present invention
Need 4 exposure frequencies that the patterning production of a liquid crystal display panel 13 and its adjacent non-panel area 12 can be completed.
As shown in figure 3, non-panel area 12 is located at the right side of motherboard 10 when panel area 11 is located at the left side of motherboard 10, because
In this described step S3, only need the left side exposure region 23 to corresponding 13 right side pattern area of liquid crystal display panel simultaneously and it is corresponding with it is each
The center exposure area 22 of the adjacent non-panel area 12 of row liquid crystal display panel 13 is exposed, and is completed at the same time liquid crystal surface by single exposure
The exposure of 13 right side pattern area of plate and the non-panel area 12 adjacent with the 13 right side pattern area of liquid crystal display panel, compared with the prior art
It is middle that individually non-panel area 12 is exposed using additional exposure actions, it can be saved 3 times when exposing three liquid crystal display panels 13
Exposure frequency；And the wider width of the non-panel area 12, the present invention right side exposure region 21 can also be arranged also while corresponding
The non-panel area 12 adjacent with every a line liquid crystal display panel 13, by center exposure area 22 and right side exposure region 21 simultaneously to non-panel
Area 12 is exposed.
Specifically, when panel area 11 is located at the left side of motherboard 10, non-panel area 12 is located at the right side of motherboard 10, the present invention
To the specific exposure method of a liquid crystal display panel 13 and its adjacent non-panel area 12 are as follows: firstly, to non-face plate area 12 is located at
It right side exposure region 21 and center exposure area 22 and is exposed simultaneously positioned at the left side exposure region 23 of panel area 11 and blocks other
Exposure region is then exposed close to the center exposure area 22 of left side exposure region 23 to panel area 11 is located at and blocks other exposures
Then light area is exposed close to the center exposure area 22 of right side exposure region 21 to panel area 11 is located at and blocks other exposures
Area, finally, being exposed to the right side exposure region 21 for being located at panel area 11 and blocking other exposure regions；Therefore, the present invention only needs
Want 4 exposure frequencies that the patterning production of a liquid crystal display panel 13 and its adjacent non-panel area 12 can be completed.
As shown in figure 4, non-panel area 12 is located at the left and right of motherboard 10 when panel area 11 is located at the central area of motherboard 10
Two sides, therefore in the step S3, at the same left side exposure region 23 to corresponding 13 right side pattern area of liquid crystal display panel and it is corresponding with
The center exposure area 22 of the adjacent non-panel area 12 of every a line liquid crystal display panel 13 is exposed, and is completed at the same time liquid by single exposure
The exposure of 13 right side pattern area of crystal panel and the non-panel area 12 adjacent with the 13 right side pattern area of liquid crystal display panel, alternatively, simultaneously
Right side exposure region 21 and the corresponding non-face adjacent with every a line liquid crystal display panel 13 to corresponding 13 left side pattern area of liquid crystal display panel
The center exposure area 22 in plate area 12 is exposed, by single exposure be completed at the same time 13 left side pattern area of liquid crystal display panel and with the liquid
The exposure of the adjacent non-panel area 12 in 13 left side pattern area of crystal panel, it is middle compared with the prior art to use additional exposure actions list
Solely non-panel area 12 is exposed, 6 exposure frequencies can be saved when exposing three liquid crystal display panels 13；An and left side for motherboard 10
The narrower width of the non-panel area 12 of right two sides, the present invention are only needed through center exposure area 22 to the left and right sides of motherboard 10
Non- panel area 12 is exposed.
Specifically, when panel area 11 is located at the central area of motherboard 10, non-panel area 12 is located at the left and right two of motherboard 10
Side, specific exposure method of the present invention to a liquid crystal display panel 13 and its adjacent non-panel area 12 are as follows: firstly, to panel is located at
It the center exposure area 22 of the non-panel area 12 in the left side of area 11 and is exposed simultaneously simultaneously positioned at the right side exposure region 21 of panel area 11
Other exposure regions are blocked, then, is exposed and keeps off close to the center exposure area 22 of right side exposure region 21 to panel area 11 is located at
Then firmly other exposure regions are exposed and block close to the center exposure area 22 of left side exposure region 23 to panel area 11 is located at
Other exposure regions, finally, to the left side exposure region 23 for being located at panel area 11 and positioned at the non-panel area 12 on panel area 11 right side
Center exposure area 22 is exposed simultaneously and blocks other exposure regions；Therefore, the present invention only needs 4 exposure frequencies can be completed
The production of the patterning of one liquid crystal display panel 13 and its adjacent non-panel area 12.
Specifically, referring to Fig. 5, each liquid crystal display panel 13 includes viewing area and the rim area for surrounding viewing area；It is described
Left side exposure region 23, center exposure area 22 and right side exposure region 21 include the first exposure region 201 of corresponding viewing area and correspond to
Second exposure region 202 of rim area.
Specifically, Fig. 6 and Fig. 7 are please referred to, the left side exposure region 23, center exposure area 22 and right side exposure region 21 are also
Including the mosaic area 24 adjacent with the first exposure region 201, due to the corresponding liquid in junction between two neighboring exposure region
The film thickness of crystal panel has a certain difference, so that the junction exposure between two neighboring exposure region has a certain difference,
The mosaic area 24 of two neighboring exposure region, which is stitched together overlap, forms complete pattern, is used for two neighboring exposure
The difference in exposure of junction between area is distributed to entire mosaic area 24, reduces the junction between two neighboring exposure region
Difference in exposure caused by splice defect (Stitching Mura), improve the product quality of liquid crystal display panel.
In conclusion motherboard exposure method of the invention by will correspond to every a line liquid crystal display panel and with every a line liquid crystal surface
Left side exposure region in the light shield of the adjacent non-panel area of plate is contoured to correspond to pattern area, right side exposure region on the right side of liquid crystal display panel and sets
Be set to pattern area on the left of corresponding liquid crystal display panel, center exposure area be contoured to correspond to liquid crystal display panel center pattern area and with every a line liquid
The adjacent non-panel area of crystal panel, can by the light shield simultaneously to every a line liquid crystal display panel and with every a line liquid crystal display panel phase
Adjacent non-panel area is exposed, and is completed at the same time liquid crystal display panel and the non-panel area adjacent with the liquid crystal display panel by single exposure
Exposure, do not need individually to expose non-panel area by additional exposure actions, it is possible to reduce light shield exposure frequency, save produce
Can, production efficiency is improved, panel production cost is reduced.
The above for those of ordinary skill in the art can according to the technique and scheme of the present invention and technology
Other various corresponding changes and modifications are made in design, and all these change and modification all should belong to the claims in the present invention
Protection scope.
Claims (9)
1. a kind of motherboard exposure method, which comprises the steps of:
Step S1, motherboard (10) are provided, the motherboard (10) include panel area (11) and with adjacent non-of the panel area (11)
Panel area (12)；The panel area (11) includes the multiple liquid crystal display panels (13) being arranged in array；Each liquid crystal display panel (13) is equal
Including the left side pattern area, center pattern area and right side pattern area being sequentially connected；
Step S2, corresponding every a line liquid crystal display panel (13) and the non-panel area (12) adjacent with every a line liquid crystal display panel (13) mention
For light shield (20), the light shield (20) includes the left side exposure region (23) in pattern area on the right side of corresponding liquid crystal display panel (13), corresponding liquid
Pattern area on the left of at least two center exposure areas (22) in crystal panel (13) center pattern area and corresponding liquid crystal display panel (13)
Right side exposure region (21)；The center exposure area (22) is gone back while the corresponding and adjacent non-panel area of every a line liquid crystal display panel (13)
(12)；
Step S3, adjacent to every a line liquid crystal display panel (13) and with every a line liquid crystal display panel (13) simultaneously by the light shield (20)
Non- panel area (12) be exposed, by single exposure be completed at the same time liquid crystal display panel (13) and with the liquid crystal display panel (13) it is adjacent
Non- panel area (12) exposure.
2. motherboard exposure method as described in claim 1, which is characterized in that when panel area (11) is located at the right side of motherboard (10)
When, non-panel area (12) is located at the left side of motherboard (10)；In the step S3, while to pattern on the left of corresponding liquid crystal display panel (13)
The right side exposure region (21) in area and the corresponding center exposure area with the adjacent non-panel area (12) of every a line liquid crystal display panel (13)
(22) be exposed, by single exposure be completed at the same time on the left of liquid crystal display panel (13) pattern area and on the left of the liquid crystal display panel (13)
The exposure of the adjacent non-panel area (12) in pattern area.
3. motherboard exposure method as claimed in claim 2, which is characterized in that the left side exposure region (23) it is also corresponding simultaneously and
The adjacent non-panel area (12) of every a line liquid crystal display panel (13).
4. motherboard exposure method as described in claim 1, which is characterized in that when panel area (11) is located at the left side of motherboard (10)
When, non-panel area (12) is located at the right side of motherboard (10)；In the step S3, while to pattern on the right side of corresponding liquid crystal display panel (13)
The left side exposure region (23) in area and the corresponding center exposure area with the adjacent non-panel area (12) of every a line liquid crystal display panel (13)
(22) be exposed, by single exposure be completed at the same time on the right side of liquid crystal display panel (13) pattern area and on the right side of the liquid crystal display panel (13)
The exposure of the non-panel area (12) in pattern area.
5. motherboard exposure method as claimed in claim 4, which is characterized in that the right side exposure region (21) it is also corresponding simultaneously and
The adjacent non-panel area (12) of every a line liquid crystal display panel (13).
6. motherboard exposure method as described in claim 1, which is characterized in that when panel area (11) is located at the center of motherboard (10)
When region, non-panel area (12) is located at the left and right sides of motherboard (10)；In the step S3, while to corresponding liquid crystal display panel (13)
In the left side exposure region (23) in right side pattern area and the corresponding and adjacent non-panel area (12) of every a line liquid crystal display panel (13)
Heart exposure region (22) is exposed, by single exposure be completed at the same time on the right side of liquid crystal display panel (13) pattern area and with the liquid crystal display panel
(13) exposure of the adjacent non-panel area (12) in right side pattern area, alternatively, simultaneously to pattern area on the left of corresponding liquid crystal display panel (13)
Right side exposure region (21) and the corresponding center exposure area with the adjacent non-panel area (12) of every a line liquid crystal display panel (13)
(22) be exposed, by single exposure be completed at the same time on the left of liquid crystal display panel (13) pattern area and on the left of the liquid crystal display panel (13)
The exposure of the adjacent non-panel area (12) in pattern area.
7. motherboard exposure method as described in claim 1, which is characterized in that the panel area (11) includes arranging along the vertical direction
Three liquid crystal display panels (13) of cloth.
8. motherboard exposure method as described in claim 1, which is characterized in that each liquid crystal display panel (13) include viewing area and
Surround the rim area of viewing area；The left side exposure region (23), center exposure area (22) and right side exposure region (21) include pair
Answer the first exposure region (201) of viewing area and the second exposure region (202) of corresponding rim area.
9. motherboard exposure method as claimed in claim 8, which is characterized in that the left side exposure region (23), center exposure area
(22) and right side exposure region (21) further includes the mosaic area (24) adjacent with the first exposure region (201).
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|---|---|---|---|
| CN201810873781.3A CN109116593B (en) | 2018-08-02 | 2018-08-02 | Method for exposing master plate |
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| CN201810873781.3A CN109116593B (en) | 2018-08-02 | 2018-08-02 | Method for exposing master plate |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110875343A (en) * | 2019-11-28 | 2020-03-10 | 上海华力微电子有限公司 | Layout structure, mask plate and manufacturing method of super-large pixel splicing product |
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