CN109023246B - 一种高效oled蒸镀设备 - Google Patents
一种高效oled蒸镀设备 Download PDFInfo
- Publication number
- CN109023246B CN109023246B CN201811204514.3A CN201811204514A CN109023246B CN 109023246 B CN109023246 B CN 109023246B CN 201811204514 A CN201811204514 A CN 201811204514A CN 109023246 B CN109023246 B CN 109023246B
- Authority
- CN
- China
- Prior art keywords
- sealing
- ring
- end cover
- evaporation
- oled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201811204514.3A CN109023246B (zh) | 2017-12-08 | 2017-12-08 | 一种高效oled蒸镀设备 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201811204514.3A CN109023246B (zh) | 2017-12-08 | 2017-12-08 | 一种高效oled蒸镀设备 |
CN201711291603.1A CN107805784B (zh) | 2017-12-08 | 2017-12-08 | 一种oled蒸镀设备 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201711291603.1A Division CN107805784B (zh) | 2017-12-08 | 2017-12-08 | 一种oled蒸镀设备 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN109023246A CN109023246A (zh) | 2018-12-18 |
CN109023246B true CN109023246B (zh) | 2020-08-14 |
Family
ID=61579548
Family Applications (7)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201811204495.4A Withdrawn CN109207928A (zh) | 2017-12-08 | 2017-12-08 | 一种具有快速oled基板输送能力的oled蒸镀设备 |
CN201811204514.3A Active CN109023246B (zh) | 2017-12-08 | 2017-12-08 | 一种高效oled蒸镀设备 |
CN201811204513.9A Active CN109023288B (zh) | 2017-12-08 | 2017-12-08 | 一种具有高效蒸镀工作装置的oled蒸镀设备 |
CN201811205201.XA Withdrawn CN109182975A (zh) | 2017-12-08 | 2017-12-08 | 一种能够快速更换蒸镀源的oled蒸镀设备 |
CN201811204519.6A Pending CN109112487A (zh) | 2017-12-08 | 2017-12-08 | 一种具有高稳定性oled基板送入装置的oled蒸镀设备 |
CN201811204504.XA Active CN109023245B (zh) | 2017-12-08 | 2017-12-08 | 一种高稳定性oled蒸镀设备 |
CN201711291603.1A Active CN107805784B (zh) | 2017-12-08 | 2017-12-08 | 一种oled蒸镀设备 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201811204495.4A Withdrawn CN109207928A (zh) | 2017-12-08 | 2017-12-08 | 一种具有快速oled基板输送能力的oled蒸镀设备 |
Family Applications After (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201811204513.9A Active CN109023288B (zh) | 2017-12-08 | 2017-12-08 | 一种具有高效蒸镀工作装置的oled蒸镀设备 |
CN201811205201.XA Withdrawn CN109182975A (zh) | 2017-12-08 | 2017-12-08 | 一种能够快速更换蒸镀源的oled蒸镀设备 |
CN201811204519.6A Pending CN109112487A (zh) | 2017-12-08 | 2017-12-08 | 一种具有高稳定性oled基板送入装置的oled蒸镀设备 |
CN201811204504.XA Active CN109023245B (zh) | 2017-12-08 | 2017-12-08 | 一种高稳定性oled蒸镀设备 |
CN201711291603.1A Active CN107805784B (zh) | 2017-12-08 | 2017-12-08 | 一种oled蒸镀设备 |
Country Status (1)
Country | Link |
---|---|
CN (7) | CN109207928A (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109609914A (zh) * | 2019-02-27 | 2019-04-12 | 昆山国显光电有限公司 | 一种坩埚及其加热控制方法、蒸镀设备 |
CN114308586A (zh) * | 2021-12-30 | 2022-04-12 | 上海创功通讯技术有限公司 | 仿陶瓷复合材料及其制备方法和应用 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4151064A (en) * | 1977-12-27 | 1979-04-24 | Coulter Stork U.S.A., Inc. | Apparatus for sputtering cylinders |
JPS6357759A (ja) * | 1986-08-26 | 1988-03-12 | Sumitomo Heavy Ind Ltd | 真空中での表面処理方法およびその装置 |
EP0409451A1 (en) * | 1989-07-18 | 1991-01-23 | Optical Coating Laboratory, Inc. | Process for depositing optical thin films on both planar and non-planar substrates |
JPH0572784A (ja) * | 1991-09-12 | 1993-03-26 | Fuji Electric Co Ltd | 真空蒸着装置 |
JP2002363733A (ja) * | 2001-06-04 | 2002-12-18 | Nippon Sheet Glass Co Ltd | 被膜の形成方法 |
US8123862B2 (en) * | 2003-08-15 | 2012-02-28 | Semiconductor Energy Laboratory Co., Ltd. | Deposition apparatus and manufacturing apparatus |
WO2005087973A1 (ja) * | 2004-03-15 | 2005-09-22 | Ulvac, Inc. | 成膜装置及びその成膜方法 |
KR100651258B1 (ko) * | 2004-10-11 | 2006-11-29 | 두산디앤디 주식회사 | 유기 박막 증착 공정용 멀티 노즐 도가니 장치 |
AT501722B1 (de) * | 2005-07-12 | 2006-11-15 | Miba Gleitlager Gmbh | Beschichtungsverfahren |
KR100750654B1 (ko) * | 2006-09-15 | 2007-08-20 | 한국전기연구원 | 장선 테이프 증착장치 |
JP2010095745A (ja) * | 2008-10-15 | 2010-04-30 | Sumitomo Electric Ind Ltd | 成膜方法及び成膜装置 |
DE102008062332A1 (de) * | 2008-12-15 | 2010-06-17 | Gühring Ohg | Vorrichtung zur Oberflächenbehandlung und/oder -beschichtung von Substratkomponenten |
CN102234767B (zh) * | 2010-04-30 | 2014-04-30 | 鸿富锦精密工业(深圳)有限公司 | 镀膜装置及镀膜方法 |
JP5715802B2 (ja) * | 2010-11-19 | 2015-05-13 | 株式会社半導体エネルギー研究所 | 成膜装置 |
CN202898524U (zh) * | 2012-10-31 | 2013-04-24 | 四川虹视显示技术有限公司 | 有机物蒸镀机与钝化层蒸镀机对接用基板旋转装置 |
CN203307428U (zh) * | 2013-06-24 | 2013-11-27 | 芜湖真空科技有限公司 | 一种真空镀膜机的真空室旋转传送机构 |
CN203794974U (zh) * | 2014-03-26 | 2014-08-27 | 东莞新能源科技有限公司 | 一种蒸镀装置 |
CN104073764B (zh) * | 2014-06-17 | 2016-05-18 | 京东方科技集团股份有限公司 | 一种用于oled蒸镀的旋转蒸发源装置 |
CN104746007A (zh) * | 2015-04-01 | 2015-07-01 | 浙江阳天包装材料有限公司 | 一种真空镀铝机 |
CN106244993B (zh) * | 2016-09-13 | 2019-10-11 | 宇龙计算机通信科技(深圳)有限公司 | 一种真空电镀转架及真空镀膜机 |
CN107254661A (zh) * | 2017-08-01 | 2017-10-17 | 河源耀国电子科技有限公司 | 柔性oled的蒸镀设备及其工艺 |
-
2017
- 2017-12-08 CN CN201811204495.4A patent/CN109207928A/zh not_active Withdrawn
- 2017-12-08 CN CN201811204514.3A patent/CN109023246B/zh active Active
- 2017-12-08 CN CN201811204513.9A patent/CN109023288B/zh active Active
- 2017-12-08 CN CN201811205201.XA patent/CN109182975A/zh not_active Withdrawn
- 2017-12-08 CN CN201811204519.6A patent/CN109112487A/zh active Pending
- 2017-12-08 CN CN201811204504.XA patent/CN109023245B/zh active Active
- 2017-12-08 CN CN201711291603.1A patent/CN107805784B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN109112487A (zh) | 2019-01-01 |
CN109023288A (zh) | 2018-12-18 |
CN109182975A (zh) | 2019-01-11 |
CN109023288B (zh) | 2020-10-13 |
CN109023245B (zh) | 2020-04-03 |
CN107805784A (zh) | 2018-03-16 |
CN109207928A (zh) | 2019-01-15 |
CN109023246A (zh) | 2018-12-18 |
CN109023245A (zh) | 2018-12-18 |
CN107805784B (zh) | 2018-12-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN109023246B (zh) | 一种高效oled蒸镀设备 | |
US9299958B2 (en) | Device for detecting evaporation source and method for applying the same | |
CN103938168A (zh) | 磁控溅射镀膜系统 | |
CN102534529B (zh) | 磁控溅射源及磁控溅射设备 | |
CN107097005A (zh) | 一种用于激光焊接的侧面焊夹具 | |
CN203021645U (zh) | 一种移动磁场平面溅射靶 | |
CN208681598U (zh) | 一种旋转搬运机构 | |
CN103866295A (zh) | 一种用于反应腔的基板加热及传输装置 | |
CN102034725B (zh) | 基片自动对位上载装置 | |
CN201956333U (zh) | 基片对位上载装置 | |
CN204608151U (zh) | 一种用于磁控溅射镀膜设备的传送机台 | |
CN115710689A (zh) | 一种非规则曲面工件镀膜阴极用伸缩机构 | |
CN108277468B (zh) | 一种带真空机械臂的磁控溅射光学镀膜设备及镀膜方法 | |
CN209109788U (zh) | 随动除尘装置及上料转运装置 | |
CN208608130U (zh) | 一种智能型接触器 | |
CN112647052A (zh) | 一进口过渡真空腔体和磁控溅射镀膜生产线 | |
WO2023245881A1 (zh) | 传动结构 | |
CN210458349U (zh) | Pvd设备 | |
CN112795887A (zh) | 一种arc镀膜生产线的基片架旋转装置 | |
CN117672933A (zh) | 送料组件和oled蒸镀封装设备 | |
CN219898672U (zh) | 一种环形油漆喷涂装置 | |
CN200981893Y (zh) | 基片处理装置 | |
CN203270029U (zh) | 等离子体增强化学气相沉积设备及其定位装置 | |
CN221056825U (zh) | 应用于显示面板的干燥设备 | |
CN221235643U (zh) | 灯罩真空镀膜机 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20200703 Address after: 518000 Room 2202, 22nd Floor, Wantong Building, No. 3002, Donglu Sanggang Street, Luohu District, Shenzhen City, Guangdong Province Applicant after: SHENZHEN LOTUT INNOVATION DESIGN Co.,Ltd. Address before: 213100 Tianan Digital City, No. 588, Changwu South Road, Wujin District, Changzhou, Jiangsu Province, 16 8 floors 806 Applicant before: CHANGZHOU ZHIDOU INFORMATION TECHNOLOGY Co.,Ltd. |
|
TA01 | Transfer of patent application right | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20210208 Address after: 214000 Shangqin Lane 7, Qianqiao Xinan Industrial Park, Huishan District, Wuxi City, Jiangsu Province Patentee after: Wuxi Dior CNC Technology Co.,Ltd. Address before: Room 2202, 22 / F, Wantong building, No. 3002, Sungang East Road, Sungang street, Luohu District, Shenzhen City, Guangdong Province Patentee before: SHENZHEN LOTUT INNOVATION DESIGN Co.,Ltd. |
|
TR01 | Transfer of patent right | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: An efficient OLED evaporation equipment Effective date of registration: 20220224 Granted publication date: 20200814 Pledgee: The Bank of Jiangsu Limited by Share Ltd. Wuxi Helie branch Pledgor: Wuxi Dior CNC Technology Co.,Ltd. Registration number: Y2022320010077 |
|
PE01 | Entry into force of the registration of the contract for pledge of patent right |