CN108400075A - Parallel multi beam electron gun - Google Patents
Parallel multi beam electron gun Download PDFInfo
- Publication number
- CN108400075A CN108400075A CN201810065973.1A CN201810065973A CN108400075A CN 108400075 A CN108400075 A CN 108400075A CN 201810065973 A CN201810065973 A CN 201810065973A CN 108400075 A CN108400075 A CN 108400075A
- Authority
- CN
- China
- Prior art keywords
- cathode
- electron gun
- electron
- emission
- multi beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
- H01J3/02—Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/48—Electron guns
- H01J29/50—Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
- H01J29/503—Three or more guns, the axes of which lay in a common plane
Abstract
The invention discloses parallel multi beam electron guns, it is made of cathode, focusing electrode, anode, focusing system and collector.Multiple surface of emissions are wherein designed on cathode, and are arranged in uniform parallel, and the shape of the surface of emission can be round, rectangle or ellipse；Under the collective effect of focusing electrode, anode and focusing magnetic field, many electrons’ system of cathode surface launching can parallel transmission to collector.This electron gun belongs to electrovacuum field, can effectively solve the problems, such as that single electron beam current density is sufficiently high using this electron gun structure, will have extremely important facilitation to development millimeter wave, submillimeter wave or THz wave electron tube.
Description
Technical field
The present invention relates to parallel multi beam electron guns, belong to electrovacuum field.
Background technology
Currently, electron gun is made of cathode, focusing electrode, anode, focusing system and collector.With the development of science and technology,
The frequency of electron vacuum device work is continuously increased, and the size of the size and electron gun that cause electron vacuum device constantly reduces,
Therefore the difficulty of processing and manufacturing is increased；And working frequency and current density is square directly proportional, therefore with the increase of frequency,
The current density of required electron beam also sharply increases.So in millimeter wave, submillimeter wave or terahertz wave band, electron beam is in ruler
Required on very little it is sufficiently small, and required in terms of current density it is very high, this just to the design of electron gun and line control propose
Very harsh requirement.Effectively reducing electron beam current density will be true to development millimeter wave, submillimeter wave or THz wave electricity
Pocket part has extremely important facilitation.
Invention content
In millimeter wave, submillimeter wave or Terahertz frequency range, in order to overcome required deficiency with a high current density, the present invention to provide
A kind of parallel multi beam electron gun.The electron gun can greatly reduce the current density of single electron beam compared with conditional electronic rifle.
The present invention solve its technical problem the technical solution adopted is that：Multiple surface of emissions are designed on cathode, and in uniform
Arranged in parallel, the shape of the surface of emission can be round, rectangle or ellipse；In the common work of focusing electrode, anode and focusing magnetic field
Under, more electron beams of cathode surface launching can parallel transmission to collector.
The invention has the advantages that from the more electron beams arranged in parallel of cathode surface launching can well with high frequency
Structure carries out beam wave interaction, can not only improve efficiency, and can reduce the requirement of the current density to single electron beam,
And then reduce the design difficulty of focusing system.
Description of the drawings
Present invention will be further explained below with reference to the attached drawings and examples.
Fig. 1 is the three-dimensional structure sectional view of the present invention.Wherein 1 represents emission of cathode face, and 2 represent cathode, and 3 represent focusing
Pole, 4 represent anode, and 5 represent focusing system, and 6 represent collector, and 7 represent electron beam channel.
Fig. 2 is the three-dimensional structure sectional view of cathode.Wherein 1, which represents cathode and 2, represents multiple surface of emissions (for 5),
Cathode and the surface of emission can be round, ellipse or rectangle.
Fig. 3 is electron channel sectional view.Wherein 1 represents Duo Gen parallel electron beams (for 5).
Specific implementation mode
Parallel multi beam electron gun is as shown in Figure 1, by emission of cathode face 1, cathode 2, focusing electrode 3, anode 4,5 He of focusing system
Collection 6 is collected to constitute.Multi electron beam cathode cathode 1 and emission of cathode face 2 as shown in Fig. 2, be made of.Parallel multi electron beam is in electronics
Distribution in channel is as shown in figure 3, by taking 5 electron beams as an example.According to practical electrovacuum radiation source or electron-beam excitation source to flat
The needs of row multi beam electron gun can adjust spacing between the shapes and sizes in emission of cathode face, emission of cathode face, emission of cathode
The number in face, the shape of anode and cathode spacing, focusing electrode and anode voltage and all parts.
By taking the electron gun suitable for 340GHz radiation sources as an example, emission of cathode face is as shown in Fig. 2, the surface of emission is round and straight
Diameter is 0.1mm, anode voltage 13kV, and the spacing between each surface of emission is 0.3mm, the current density 4A/ of single electron beam
cm2。
Claims (5)
1. the present invention solve the technical problem the technical solution adopted is that, parallel multi beam electron gun, it by cathode, the surface of emission,
Anode, focusing electrode, focusing magnetic field and collector are constituted, which is characterized in that cathode has multiple surface of emissions arranged in parallel.
2. parallel multi beam electron gun as described in claim 1, which is characterized in that the cathode shape can be round, ellipse
Or rectangle.
3. parallel multi beam electron gun as described in claim 1, which is characterized in that the surface of emission shape can be round, oval
Shape or rectangle.
4. parallel multi beam electron gun as described in claim 1, which is characterized in that the emission of cathode face number is more than or equal to two
It is a.
5. parallel multi beam electron gun as described in claim 1, which is characterized in that the size and spacing in the emission of cathode face need
Match with the working frequency of device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810065973.1A CN108400075A (en) | 2018-01-22 | 2018-01-22 | Parallel multi beam electron gun |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810065973.1A CN108400075A (en) | 2018-01-22 | 2018-01-22 | Parallel multi beam electron gun |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108400075A true CN108400075A (en) | 2018-08-14 |
Family
ID=63094227
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810065973.1A Pending CN108400075A (en) | 2018-01-22 | 2018-01-22 | Parallel multi beam electron gun |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108400075A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109065428A (en) * | 2018-08-16 | 2018-12-21 | 电子科技大学 | A kind of double-gated standard cold-cathode gun and preparation method thereof |
| CN112652510A (en) * | 2020-12-16 | 2021-04-13 | 中国科学院西安光学精密机械研究所 | Large-field-of-view and low-aberration electronic optical imaging system and imaging method |
| CN113421808A (en) * | 2021-05-19 | 2021-09-21 | 电子科技大学 | Terahertz waveband low-current small-diameter single-column multi-beam electron gun |
| CN113488831A (en) * | 2021-07-09 | 2021-10-08 | 电子科技大学 | Terahertz gas laser of electron beam pumping |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1116769A (en) * | 1994-08-08 | 1996-02-14 | 中华映管股份有限公司 | Deflection device on multibeam colour kinescope shared main lens electron gun |
| CN1308769A (en) * | 1998-07-03 | 2001-08-15 | 汤姆森管电子技术公司 | Multibeam electronic tube with magnetic field for correcting beam trajectory |
| CN1351756A (en) * | 1999-04-07 | 2002-05-29 | Ut-巴特勒有限责任公司 | Electrostatically focused addressable field emission arraychips (AFEA' s) for high-speed maskless digital e-beam direct write lithography and scanning electron microscopy |
| CN1413353A (en) * | 1999-12-31 | 2003-04-23 | 尖端设备公司 | Segmented grid drive for dynamic electron beam shape correction in field emission cathodes |
| CN105723494A (en) * | 2013-11-19 | 2016-06-29 | 西门子公司 | Electron gun and radiation-generating system |
-
2018
- 2018-01-22 CN CN201810065973.1A patent/CN108400075A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1116769A (en) * | 1994-08-08 | 1996-02-14 | 中华映管股份有限公司 | Deflection device on multibeam colour kinescope shared main lens electron gun |
| CN1308769A (en) * | 1998-07-03 | 2001-08-15 | 汤姆森管电子技术公司 | Multibeam electronic tube with magnetic field for correcting beam trajectory |
| CN1351756A (en) * | 1999-04-07 | 2002-05-29 | Ut-巴特勒有限责任公司 | Electrostatically focused addressable field emission arraychips (AFEA' s) for high-speed maskless digital e-beam direct write lithography and scanning electron microscopy |
| CN1413353A (en) * | 1999-12-31 | 2003-04-23 | 尖端设备公司 | Segmented grid drive for dynamic electron beam shape correction in field emission cathodes |
| CN105723494A (en) * | 2013-11-19 | 2016-06-29 | 西门子公司 | Electron gun and radiation-generating system |
Non-Patent Citations (1)
| Title |
|---|
| 于海龙: "电子枪CAD软件与快速设计研究", 《中国优秀硕士学位论文全文数据库》 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109065428A (en) * | 2018-08-16 | 2018-12-21 | 电子科技大学 | A kind of double-gated standard cold-cathode gun and preparation method thereof |
| CN112652510A (en) * | 2020-12-16 | 2021-04-13 | 中国科学院西安光学精密机械研究所 | Large-field-of-view and low-aberration electronic optical imaging system and imaging method |
| CN113421808A (en) * | 2021-05-19 | 2021-09-21 | 电子科技大学 | Terahertz waveband low-current small-diameter single-column multi-beam electron gun |
| CN113488831A (en) * | 2021-07-09 | 2021-10-08 | 电子科技大学 | Terahertz gas laser of electron beam pumping |
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| PB01 | Publication | ||
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| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20180814 |