CN108193183A - A kind of adjustable cathode baffle - Google Patents
A kind of adjustable cathode baffle Download PDFInfo
- Publication number
- CN108193183A CN108193183A CN201810187709.5A CN201810187709A CN108193183A CN 108193183 A CN108193183 A CN 108193183A CN 201810187709 A CN201810187709 A CN 201810187709A CN 108193183 A CN108193183 A CN 108193183A
- Authority
- CN
- China
- Prior art keywords
- baffle
- type
- telescoping mechanism
- adjustable
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000007246 mechanism Effects 0.000 claims abstract description 21
- 239000011810 insulating material Substances 0.000 claims description 4
- 239000011521 glass Substances 0.000 abstract description 11
- 239000011248 coating agent Substances 0.000 abstract description 6
- 238000000576 coating method Methods 0.000 abstract description 6
- 238000004544 sputter deposition Methods 0.000 abstract description 6
- 230000008859 change Effects 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The present invention relates to vacuum magnetic-control sputtering equipment technical field, a kind of adjustable cathode baffle, including：L-type baffle, telescoping mechanism and fixing bolt, it is staggered relatively that cathode baffle is equipped with two pieces of axisymmetric L-type baffles, opening is equipped between two pieces of L-type baffles, the long slab bottom end of L-type baffle is equipped with adjustable telescoping mechanism, L-type baffle is connect with telescoping mechanism by fixing bolt, the openings of sizes formed by adjusting two pieces of L-type baffles, when baffle openings change is small, corresponding rate of film build can slow down, when baffle openings become larger, corresponding rate of film build can be accelerated, therefore, it can reach and adjust magnetic control sputtering cathode rate of film build so as to optimize large-area coating film glass horizontal homogeneity.
Description
Technical field
The present invention relates to vacuum magnetic-control sputtering equipment technical fields, are a kind of adjustable cathode baffles more specifically.
Background technology
Vacuum magnetron sputtering coating film glass horizontal homogeneity is the important indicator of product quality, particularly large-area flat-plate glass
Glass plated film, good uniformity can effectively play plated film useful load, and then save production cost.
It is technology most rambunctious in large-area flat-plate coating film on glass production process to adjust product uniformity, it is desirable to be adjusted
The uniformity of product has been saved, has been substantially that can not possibly complete only with gas regulation.
The many because being known as of coated glass uniformity are influenced, there is Distribution of Magnetic Field, target spacing, gas barrier, cathode baffle
The reason of opening etc., also some are targets itself.
Invention content
In order to solve the above technical problem, the present invention provides a kind of adjustable cathode baffles, adjust vacuum magnetic-control sputtering
The rate of film build of cathode so as to fulfill adjust coated glass horizontal homogeneity.
Technical scheme is as follows：
A kind of adjustable cathode baffle, including：L-type baffle, telescoping mechanism and fixing bolt, cathode baffle are equipped with two pieces of axis
Symmetrical L-type baffle is staggered relatively, and opening is equipped between two pieces of L-type baffles, and the long slab bottom end of L-type baffle is equipped with adjustable stretch
Contracting mechanism, L-type baffle are connect with telescoping mechanism by fixing bolt.
L-type baffle is made of long slab and short slab, and long slab is horizontal positioned, and short slab is disposed vertically.
Fastening bolt is expansion bolt.
Telescoping mechanism surface is equipped with several through-holes, and the through-hole surfaces are equipped with screw thread.
L-type baffle is insulating materials.
L-type baffle is using short slab as the rotating member of rotary shaft.
The long plate surface of L-type baffle is equipped with graduation mark.
The advantageous effect of method disclosed by the invention is：
The openings of sizes formed by adjusting two pieces of L-type baffles, when baffle openings change is small, corresponding rate of film build can subtract
Slowly, when baffle openings become larger, corresponding rate of film build can be accelerated, and therefore, can reach and adjust magnetic control sputtering cathode film forming speed
Rate is so as to optimize large-area coating film glass horizontal homogeneity.
Description of the drawings
Fig. 1 is a kind of structure diagram of adjustable cathode baffle of the present invention.
1st, L-type baffle；2nd, telescoping mechanism；3rd, fixing bolt.
Specific embodiment
The technical solution of book invention is specifically addressed below, it should be pointed out that this technical scheme of the present invention
The embodiment described in embodiment is not limited to, those skilled in the art refers to and uses for reference the content of this technical solution of the present invention,
The improvement and design carried out on the basis of this present invention should belong to this protection scope of the present invention.
Vacuum magnetron sputtering coating film glass horizontal homogeneity is the important indicator of product quality, particularly large-area flat-plate glass
Glass plated film, good uniformity can effectively play plated film useful load, and then save production cost.
It is to adjust the important measures of coated glass product uniformity by adjusting cathode baffle openings of sizes, therefore cathode baffle
The size of opening can control the rate of film forming.
Embodiment one：
A kind of adjustable cathode baffle, including：L-type baffle 1, telescoping mechanism 2 and fixing bolt 3, cathode baffle are equipped with two
The axisymmetric L-type baffle 1 of block is staggered relatively, opening is equipped between two pieces of L-type baffles 1, the long slab bottom end of L-type baffle 1 is equipped with can
The telescoping mechanism 2 of adjusting, L-type baffle 1 are connect with telescoping mechanism 2 by fixing bolt 3, are formed by adjusting two pieces of L-type baffles
Openings of sizes, when baffle openings become it is small when, corresponding rate of film build can slow down, corresponding to form a film when baffle openings become larger
Rate can be accelerated, and therefore, it is laterally equal so as to optimize large-area coating film glass can reach adjusting magnetic control sputtering cathode rate of film build
Even property.
L-type baffle 1 is made of long slab and short slab, and long slab is horizontal positioned, and short slab is disposed vertically, and long slab is set with short slab length
Meter, which organically combines, reduces cost.
Fastening bolt is expansion bolt, and 2 surface of telescoping mechanism is equipped with several through-holes, and the through-hole surfaces are equipped with screw thread, protect
Card connects secured, prolongs the service life.
L-type baffle 1 is insulating materials.
L-type baffle 1 is using short slab as the rotating member of rotary shaft.
The long plate surface of L-type baffle 1 is equipped with graduation mark, the accurate length for controlling telescoping mechanism 2, so as to control opening big
It is small.
Embodiment two：
A kind of adjustable cathode baffle, including：L-type baffle fastening bolt is expansion bolt 1, telescoping mechanism fastening bolt is
Expansion bolt 2 and fixing bolt fastening bolt are expansion bolt 3, and cathode baffle is equipped with two pieces of axisymmetric L-type baffle fastening spiral shells
Bolt is staggered relatively for expansion bolt 1, and two pieces of L-type baffle fastening bolts are equipped with opening, the fastening of L-type baffle between expansion bolt 1
Bolt is that the long slab bottom end of expansion bolt 1 equipped with adjustable telescoping mechanism fastening bolt is expansion bolt 2, the fastening of L-type baffle
It is expansion bolt 2 by fixing bolt fastening bolt is that expansion bolt 3 connects that bolt, which is expansion bolt 1 with telescoping mechanism fastening bolt,
It connects.
L-type baffle fastening bolt is made of for expansion bolt 1 long slab and short slab, and long slab is horizontal positioned, and short slab is disposed vertically.
Fastening bolt is fastening bolt.
L-type baffle fastening bolt is that determine throwing of 1 long slab of expansion bolt far from short slab one end is arc structure.
Telescoping mechanism fastening bolt is equipped with several through-holes for 2 surface of expansion bolt, and the through-hole surfaces are equipped with screw thread.
It is insulating materials that L-type baffle fastening bolt, which is expansion bolt 1,.
L-type baffle fastening bolt is rotating member of the expansion bolt 1 using short slab as rotary shaft.
L-type baffle fastening bolt is equipped with graduation mark for the long plate surface of expansion bolt 1.
The contact surface that L-type baffle fastening bolt is expansion bolt 1 and fixing bolt fastening bolt is expansion bolt 3 is equipped with and slides
Rail convenient for adjusting the size of opening, is equipped with Expandable strip in the sliding rail, ensures the connection effect with sliding rail, prolong the service life.
Claims (7)
1. a kind of adjustable cathode baffle, including：L-type baffle (1), telescoping mechanism (2) and fixing bolt (3), it is characterised in that：
Cathode baffle is staggered relatively equipped with two pieces of axisymmetric L-type baffles (1), and opening, L-type baffle are equipped between two pieces of L-type baffles (1)
(1) long slab bottom end is equipped with adjustable telescoping mechanism (2), and L-type baffle (1) is connected with telescoping mechanism (2) by fixing bolt (3)
It connects.
2. a kind of adjustable cathode baffle according to claim 1, it is characterised in that：L-type baffle (1) is by long slab and short slab
Composition, long slab is horizontal positioned, and short slab is disposed vertically.
3. a kind of adjustable cathode baffle according to claim 1, it is characterised in that：Fastening bolt is expansion bolt.
4. a kind of adjustable cathode baffle according to claim 1, it is characterised in that：Telescoping mechanism (2) is if surface is equipped with
Dry through-hole, the through-hole surfaces are equipped with screw thread.
5. a kind of adjustable cathode baffle according to claim 1, it is characterised in that：L-type baffle (1) is insulating materials.
6. a kind of adjustable cathode baffle according to claim 1, it is characterised in that：L-type baffle (1) is using short slab as rotation
The rotating member of axis.
7. a kind of adjustable cathode baffle according to claim 1, it is characterised in that：The long plate surface of L-type baffle (1) is set
There is graduation mark.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810187709.5A CN108193183A (en) | 2018-03-07 | 2018-03-07 | A kind of adjustable cathode baffle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810187709.5A CN108193183A (en) | 2018-03-07 | 2018-03-07 | A kind of adjustable cathode baffle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108193183A true CN108193183A (en) | 2018-06-22 |
Family
ID=62594711
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810187709.5A Pending CN108193183A (en) | 2018-03-07 | 2018-03-07 | A kind of adjustable cathode baffle |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108193183A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110551980A (en) * | 2019-10-18 | 2019-12-10 | 东莞市能特自动化科技有限公司 | Variable aperture crucible and OLED film forming system |
| CN114455852A (en) * | 2021-12-28 | 2022-05-10 | 凯盛信息显示材料(黄山)有限公司 | Magnetron sputtering glass coating device with adjustable sputtering range |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5616225A (en) * | 1994-03-23 | 1997-04-01 | The Boc Group, Inc. | Use of multiple anodes in a magnetron for improving the uniformity of its plasma |
| JP2002220663A (en) * | 2001-01-29 | 2002-08-09 | Anelva Corp | Magnetron sputtering equipment |
| CN201809434U (en) * | 2010-09-29 | 2011-04-27 | 吴江南玻华东工程玻璃有限公司 | NiCr cathode sputtering baffle plate |
| CN102409311A (en) * | 2011-11-15 | 2012-04-11 | 吴江南玻华东工程玻璃有限公司 | Cathode uniformity correcting baffle plate |
| CN204999964U (en) * | 2015-06-08 | 2016-01-27 | 信义节能玻璃（芜湖）有限公司 | Plane cathodic sputtering baffle |
| CN208121194U (en) * | 2018-03-07 | 2018-11-20 | 河北物华天宝镀膜科技有限公司 | A kind of adjustable cathode baffle |
-
2018
- 2018-03-07 CN CN201810187709.5A patent/CN108193183A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5616225A (en) * | 1994-03-23 | 1997-04-01 | The Boc Group, Inc. | Use of multiple anodes in a magnetron for improving the uniformity of its plasma |
| JP2002220663A (en) * | 2001-01-29 | 2002-08-09 | Anelva Corp | Magnetron sputtering equipment |
| CN201809434U (en) * | 2010-09-29 | 2011-04-27 | 吴江南玻华东工程玻璃有限公司 | NiCr cathode sputtering baffle plate |
| CN102409311A (en) * | 2011-11-15 | 2012-04-11 | 吴江南玻华东工程玻璃有限公司 | Cathode uniformity correcting baffle plate |
| CN204999964U (en) * | 2015-06-08 | 2016-01-27 | 信义节能玻璃（芜湖）有限公司 | Plane cathodic sputtering baffle |
| CN208121194U (en) * | 2018-03-07 | 2018-11-20 | 河北物华天宝镀膜科技有限公司 | A kind of adjustable cathode baffle |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110551980A (en) * | 2019-10-18 | 2019-12-10 | 东莞市能特自动化科技有限公司 | Variable aperture crucible and OLED film forming system |
| CN110551980B (en) * | 2019-10-18 | 2024-05-28 | 东莞市能特自动化科技有限公司 | Variable aperture crucible and OLED film forming system |
| CN114455852A (en) * | 2021-12-28 | 2022-05-10 | 凯盛信息显示材料(黄山)有限公司 | Magnetron sputtering glass coating device with adjustable sputtering range |
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