CN108093551A - For encouraging the composite power supply unit for generating Uniform Discharge high activity plasma - Google Patents
For encouraging the composite power supply unit for generating Uniform Discharge high activity plasma Download PDFInfo
- Publication number
- CN108093551A CN108093551A CN201711385104.9A CN201711385104A CN108093551A CN 108093551 A CN108093551 A CN 108093551A CN 201711385104 A CN201711385104 A CN 201711385104A CN 108093551 A CN108093551 A CN 108093551A
- Authority
- CN
- China
- Prior art keywords
- low
- pass filter
- frequency
- capacitance
- power supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
Abstract
The invention discloses a kind of for encouraging the composite power supply unit for generating Uniform Discharge high activity plasma, including high voltage nanosecond pulse power supply, low-frequency ac power, high-pass filter, low-pass filter and load；The output of high voltage nanosecond pulse power supply and the Single port of high-pass filter connect, and the another port of high-pass filter is connected to load both ends；The output of low-frequency ac power and the Single port of low-pass filter connect, and the another port of low-pass filter is connected to load both ends.The output of high voltage nanosecond pulse power supply and low pressure low-frequency ac power is superimposed by the composite power supply unit of the present invention, is applied on DBD electrodes and is easy to generate Uniform Discharge high activity plasma, and supply unit can be prevented to be destroyed.
Description
Technical field
It is more particularly to a kind of to generate Uniform Discharge high activity for encouraging the invention belongs to discharge plasma technique field
The composite power supply unit of plasma.
Background technology
Low temperature plasma is widely used in fields such as derived energy chemical, material surface modifying and medicine sterilizings
Prospect.Atmospheric dielectric barrier discharge (Dielectric Barrier Discharge, DBD) is to generate low temperature plasma
One of important method, but how to generate large area, uniform DBD is always difficult point in experimental study and commercial Application.In addition, it waits
The high activity of gas ions is also the emphasis of plasma application concern, and how effectively energy to be coupled in chemical reaction is urgently
The major issue that need to be solved.
Traditional DBD driving powers use frequency as 102~105Hz, the AC power that amplitude is 10kV or so, alternating current
The power of source consumption is larger, and is unfavorable for the formation of uniform DBD plasmas in air.In addition, traditional low-frequency power supply easily produces
Raw excited state molecule, but be difficult to generate Uniform Discharge.The high-voltage nanosecond generated in recent years with the development of Pulse Power Techniques
The pulse power is easy to generate Uniform Discharge as DBD driving powers, and it is low to consume power, is subject to that domestic and international researcher's is extensive
Concern.Problem existing in the prior art is：Although nanosecond pulse power supply instantaneous power is high, its energy is used for gas ionization, no
It is the required vibrational state of chemical reaction, rotating state equal excitation state molecule.And traditional low-frequency power supply is although easily generate excitation state point
Son, but be difficult to generate Uniform Discharge.
Chinese patent application announces No. CN103368445B, and " direct current adds the Treatment of Metal Surface of pulsed to open one kind
Power circuit " devises the processing form of power of a kind of adjustable DC superposition adjustable pulse-width and amplitude wave-shape.Chinese patent
Application publication number the CN106900135Ath, a kind of open " nanosecond pulse superposition DC power supply dress for plasma igniting
Put ", the supply unit of the high energy nanosecond pulse superposition high voltage direct current applied to plasma igniting has been built, and has employed spininess
Array-plate type electrode structure.
Above-mentioned design all employs a large amount of power electronic devices, and nanosecond pulse discharge can generate power electronic devices larger
Electromagnetic interference influences the stability of power electronic devices, destroys supply unit.In addition, the because big portion of DC voltage applied
It is allocated as in medium rather than discharging gap so that DC electric field coupling efficiency declines, and can not effectively generate excitation state
Molecule is not used to dielectric barrier discharge.
In conclusion there is an urgent need for a kind of drive electric power units for being easy to generate Uniform Discharge.
The content of the invention
It is an object of the invention to provide a kind of for encouraging the composite power source for generating Uniform Discharge high activity plasma
Device, to solve, above-mentioned there are technical problems.The composite power supply unit of the present invention is by high voltage nanosecond pulse power supply and low pressure low frequency
The output of AC power is superimposed, and is applied on DBD electrodes and is easy to generate Uniform Discharge high activity plasma.
To achieve these goals, the present invention adopts the following technical scheme that：
A kind of composite power supply unit that Uniform Discharge high activity plasma is generated for excitation, including high-voltage nanosecond pulse
Power supply, low-frequency ac power, high-pass filter, low-pass filter and load；The output of high voltage nanosecond pulse power supply is filtered with high pass
The Single port connection of ripple device, the another port of high-pass filter are connected to load both ends；The output of low-frequency ac power and low pass filtered
The Single port connection of ripple device, the another port of low-pass filter are connected to load both ends.
Further, time-delay trigger is further included；Low-frequency ac power is provided with trigger output end, high-voltage nanosecond pulse electricity
Source is provided with triggering input terminal, and the trigger output end of low-frequency ac power is connected to the input terminal of time-delay trigger, Time-delayed trigger
The output terminal of device is connected to the triggering input terminal of high voltage nanosecond pulse power supply.
Further, the delay of time-delay trigger is arranged to 0.
Further, high-pass filter is Butterworth type, using inductor-capacitor structure；Low-pass filter is irrigated for Bart
This type, using inductor-capacitor structure.
Further, low-pass filter is constructed using three rank Butterworth types, including capacitance C2With inductance L1And L3；Low frequency
The high-pressure side of AC power and inductance L3One end be connected, inductance L3The other end and inductance L1One end be connected, inductance L1
The other end with load one end be connected, the other end of load is connected with the ground terminal of low-frequency ac power, capacitance C2's
One end access inductance L1With inductance L3Between circuit, capacitance C2The other end ground connection.
Further, the cutoff frequency of low-pass filter is 1MHz, and characteristic impedance is 2000 Ω；L1And L3It is line around electricity
Sense, inductance value is 318 μ H, C2For Leaded Ceramic Disc Capacitor, capacitance 160pF.
Further, high-pass filter is constructed using three rank Butterworth types, including capacitance C4、C6With inductance L5；High pressure is received
The high-pressure side of pulse per second (PPS) power supply and capacitance C4One end be connected, capacitance C4The other end and capacitance C6One end be connected, capacitance
C6The other end with load one end be connected, the other end of load is connected with the ground terminal of high voltage nanosecond pulse power supply, electricity
Feel L5One end access capacitance C4With capacitance C6Between circuit, inductance L5The other end ground connection.
Further, the cutoff frequency of high-pass filter is 100kHz, and characteristic impedance is 2000 Ω；Capacitance C4And C6It is
Leaded Ceramic Disc Capacitor, capacitance are 800pF, L5For wire-wound inductor, inductance value 1.59mH.
Further, the dielectric barrier discharge unit for parallel plate electrode structure is loaded, electrode is brass material, is stopped
Medium is aluminium nitride (AlN) ceramics or anodised aluminium (AAO).
Further, the frequency of low-frequency ac power is 50Hz, and amplitude range is 0~1kV；High voltage nanosecond pulse power supply
Frequency is 100Hz, and halfwidth 20ns, amplitude range is 0~10kV.
Compared with the prior art, the invention has the advantages that：
The output of the high voltage nanosecond pulse power supply of the present invention is after-applied in load by high-pass filter, low frequency ac
The output in source is after-applied in load by low-pass filter, realizes the superposition of high-voltage nanosecond pulse and alternating voltage；Use height
Nanosecond pulse power supply is pressed, is easy to generate Uniform Discharge plasma, using low-voltage alternating current power supply, more high activities can be formed and swashed
State molecule is sent out, density is big, activity is strong, and reduces the power consumption of system.The high-pass filter of the present invention can ensure high-voltage nanosecond
The output of the pulse power is applied to smaller loss in load, while the output of low-frequency ac power can be prevented to high-voltage nanosecond
The pulse power causes to damage；Low-pass filter can ensure that the output of low-frequency ac voltage is applied to smaller loss in load,
It can prevent the output of high-voltage nanosecond pulse from causing to damage to low-frequency ac power simultaneously.The load of the present invention is dielectric barrier discharge
Unit or unobstructed medium discharge unit.
Further, the present invention can realize that the output phase of nanosecond pulse is controllable by time-delay trigger.Low frequency ac
The trigger output end in source is connected to the input terminal of time-delay trigger, and the output terminal of time-delay trigger is connected to high-voltage nanosecond pulse electricity
The triggering input terminal in source.When the sinusoidal voltage zero passage that low-frequency ac power generates, output trigger signal is prolonged to time-delay trigger
When trigger generated after preset delay trigger signal triggering high voltage nanosecond pulse power supply generate pulse output.Nanosecond arteries and veins
The source of punching can realize single triggering or sequence triggering.In the case where high-voltage nanosecond pulse is superimposed with low-frequency ac voltage, high pressure is received
The generation phase of pulse per second (PPS) is controllable, and after nanosecond pulse effect, the Uniform Discharge of easy generation rule is equivalent to while controls
The phase of Uniform Discharge.
Further, high-pass filter and low-pass filter are all Butterworth types, have pass band damping characteristic flat,
The features such as easily designed, high-pass filter and low-pass filter use inductor-capacitor structure, caused by can avoiding capacitance-resistance structure
Energy loss.
Further, the cutoff frequency of low-pass filter is designed as only allowing low-frequency ac voltage by and stopping high pressure
Nanosecond pulse is by ensure that the output of low-frequency ac voltage is applied to smaller loss in load, while prevent high pressure from receiving
The output of pulse per second (PPS) causes to damage to low-frequency ac power.
Further, the cutoff frequency of high-pass filter is designed as only allowing high-voltage nanosecond pulse by and stopping low frequency
Alternating voltage by, ensure that the output of high voltage nanosecond pulse power supply with it is smaller loss be applied in load, prevent simultaneously
The output of low-frequency ac power causes to damage to high voltage nanosecond pulse power supply.
Further, the dielectric barrier discharge unit for parallel plate electrode structure is loaded, electrode is brass material, is hindered
Keeping off medium can be by needing to change, and discharge gap distance is adjustable.
Description of the drawings
Fig. 1 is a kind of knot of composite power supply unit that Uniform Discharge high activity plasma is generated for excitation of the present invention
Structure schematic diagram；
Fig. 2 is the circuit diagram of the low-pass filter in Fig. 1；
Fig. 3 is the circuit diagram of the high-pass filter in Fig. 1；
Fig. 4 is the dielectric barrier discharge cellular construction figure in Fig. 1.
In Fig. 1, high voltage nanosecond pulse power supply 10；Low-frequency ac power 20；Time-delay trigger 30；High-pass filter 40；
Low-pass filter 50；Load 60.
Specific embodiment
It elaborates in the following with reference to the drawings and specific embodiments to the present invention.
Shown in please referring to Fig.1 to Fig.4, a kind of answering for excitation generation Uniform Discharge high activity plasma of the invention
Supply unit is closed, including high voltage nanosecond pulse power supply 10, low-frequency ac power 20, time-delay trigger 30, high-pass filter 40, low
Bandpass filter 50 and load 60.
The output of high voltage nanosecond pulse power supply 10 is connected with the Single port of high-pass filter 40, high-pass filter 40 it is another
Port is connected to 60 both ends of load.The output of low-frequency ac power 20 is connected with the Single port of low-pass filter 50, low-pass filter
50 another port is connected to 60 both ends of load.
The trigger output end of low-frequency ac power 20 is connected to the input terminal of time-delay trigger 30, time-delay trigger 30 it is defeated
Outlet is connected to the triggering input terminal of high voltage nanosecond pulse power supply 10.
The delay of time-delay trigger 30 is arranged to 0, i.e. the instantaneous trigger high frequency nanosecond pulse power supply in alternating voltage zero-crossing
10 generate nanosecond pulse.The frequency of low-frequency ac power 20 is 50Hz, and amplitude is adjustable for 0~1kV, high voltage nanosecond pulse power supply 10
Frequency be 100Hz；The halfwidth of high-voltage nanosecond pulse is 20ns, and amplitude is adjustable for 0~10kV.
Low-pass filter 50 is constructed using three rank Butterworth types, and circuit diagram is as shown in Figure 2.Low-pass filter 50 includes
Inductance L1, inductance L3With capacitance C2, inductance L1One end 60 one end of connection load, other end connection inductance L3One end and capacitance C2One
End, inductance L3The other end connects the high-pressure side of low-frequency ac power 20, capacitance C2Other end connection low-frequency ac power 20 connect
Ground terminal and 60 other ends of load are simultaneously grounded.Each device parameter values for normalizing Butterworth type low-pass filter can be public by calculating
Formula：
With
To calculate.Wherein, k=1,2 ..., n, n are filter order, CkFor the capacitance of kth rank capacitance, LkFor kth rank
The inductance value of inductance.After obtaining each device parameter values of normalization low-pass filter, then carry out cutoff frequency conversion and feature resistance
Resistance, which changes, can obtain the wave filter that requirement is realized.The cutoff frequency of low-pass filter 50 is designed as 1MHz, and characteristic impedance is
2000Ω.Wherein L1And L3It is line around inductance, inductance value is 318 μ H, C2For Leaded Ceramic Disc Capacitor, capacitance 160pF.It is logical
The output for setting above-mentioned low-pass filter 50 that can prevent high voltage nanosecond pulse power supply 10 is crossed to damage low-frequency ac power 20.
High-pass filter 40 is constructed using three rank Butterworth types, and circuit diagram is as shown in Figure 3.High-pass filter 40 includes
Capacitance C4, capacitance C6With inductance L5, capacitance C6One end 60 one end of connection load, other end connection capacitance C4One end and inductance L5One
End, capacitance C4The other end connects the high-pressure side of high voltage nanosecond pulse power supply 10, inductance L5The other end connects high voltage nanosecond pulse power supply
10 60 other ends of ground terminal and load；Load 60 other ends ground connection GND1.Each component parameters can be by first asking normalization Bart
Then Butterworth type low-pass filter parameter exchanges capacitor and inductor element and seeks the inverse of former normalized value, finally carries out cutoff frequency
Rate converts and the method for characteristic impedance conversion acquires.The cutoff frequency of high-pass filter 40 is designed as 100kHz, and characteristic impedance is
2000Ω.Wherein capacitance C4And C6For Leaded Ceramic Disc Capacitor, capacitance 800pF, L5It is line around inductance, inductance value 1.59mH.Pass through
The output that low-frequency ac power 20 can be prevented by setting above-mentioned high-pass filter 40 damages high voltage nanosecond pulse power supply 10.
Load 60 is the dielectric barrier discharge unit of parallel plate electrode structure, and structure chart is as shown in Figure 4.Its electrode 1
For brass material, block media 2 is aluminium nitride (AlN) ceramics or anodised aluminium (AAO), when AlN and AAO make block media
It is more advantageous to the generation of Uniform Discharge.
The output of the high voltage nanosecond pulse power supply of the present invention is after-applied in load by high-pass filter, low frequency ac
The output in source is after-applied in load by low-pass filter, realizes the superposition of high-voltage nanosecond pulse and alternating voltage；Use height
Nanosecond pulse power supply is pressed, is easy to generate Uniform Discharge plasma, using low-voltage alternating current power supply, more high activities can be formed and swashed
State molecule is sent out, density is big, activity is strong, and reduces the power consumption of system.The high-pass filter of the present invention can ensure high-voltage nanosecond
The output of the pulse power is applied to smaller loss in load, while the output of low-frequency ac power can be prevented to high-voltage nanosecond
The pulse power causes to damage；Low-pass filter can ensure that the output of low-frequency ac voltage is applied to smaller loss in load,
It can prevent the output of high-voltage nanosecond pulse from causing to damage to low-frequency ac power simultaneously.The load of the present invention is dielectric barrier discharge
Unit or unobstructed medium discharge unit.
The present invention can realize that the output phase of nanosecond pulse is controllable by time-delay trigger.The triggering of low-frequency ac power is defeated
Outlet is connected to the input terminal of time-delay trigger, and the triggering that the output terminal of time-delay trigger is connected to high voltage nanosecond pulse power supply is defeated
Enter end.When the sinusoidal voltage zero passage that low-frequency ac power generates, output trigger signal to time-delay trigger, time-delay trigger exists
Trigger signal triggering high voltage nanosecond pulse power supply is generated after preset delay and generates pulse output.Nanosecond pulse source can be real
Existing single triggering or sequence triggering.The production of high-voltage nanosecond pulse in the case where high-voltage nanosecond pulse is superimposed with low-frequency ac voltage
Raw phase is controllable, and after nanosecond pulse effect, the Uniform Discharge of easy generation rule is equivalent to while controls Uniform Discharge
Phase.
Claims (10)
1. a kind of composite power supply unit that Uniform Discharge high activity plasma is generated for excitation, which is characterized in that including height
Press nanosecond pulse power supply (10), low-frequency ac power (20), high-pass filter (40), low-pass filter (50) and load (60)；
The output of high voltage nanosecond pulse power supply (10) is connected with the Single port of high-pass filter (40), high-pass filter (40) it is another
Single port is connected to load (60) both ends；The output of low-frequency ac power (20) is connected with the Single port of low-pass filter (50), low
The another port of bandpass filter (50) is connected to load (60) both ends.
2. a kind of composite power source dress that Uniform Discharge high activity plasma is generated for excitation according to claim 1
It puts, which is characterized in that further include time-delay trigger (30)；
Low-frequency ac power (20) is provided with trigger output end, and high voltage nanosecond pulse power supply (10) is provided with triggering input terminal, low
The trigger output end of frequency AC power (20) is connected to the input terminal of time-delay trigger (30), the output terminal of time-delay trigger (30)
It is connected to the triggering input terminal of high voltage nanosecond pulse power supply (10).
3. a kind of composite power source dress that Uniform Discharge high activity plasma is generated for excitation according to claim 2
It puts, which is characterized in that the delay of time-delay trigger (30) is arranged to 0.
4. a kind of composite power source dress that Uniform Discharge high activity plasma is generated for excitation according to claim 1
It puts, which is characterized in that high-pass filter (40) constructs for Butterworth, using inductor-capacitor structure；Low-pass filter (50) is
Butterworth constructs, using inductor-capacitor structure.
5. a kind of composite power source dress that Uniform Discharge high activity plasma is generated for excitation according to claim 4
It puts, which is characterized in that low-pass filter (50) includes capacitance C2With inductance L1And L3；
The high-pressure side of low-frequency ac power (20) and inductance L3One end be connected, inductance L3The other end and inductance L1One end
It is connected, inductance L1The other end be connected with one end of load (60), load (60) the other end and low-frequency ac power
(20) ground terminal is connected, capacitance C2One end access inductance L1With inductance L3Between circuit, capacitance C2Another termination
Ground.
6. a kind of composite power source dress that Uniform Discharge high activity plasma is generated for excitation according to claim 5
It puts, which is characterized in that the cutoff frequency of low-pass filter (50) is 1MHz, and characteristic impedance is 2000 Ω；L1And L3It is line around electricity
Sense, inductance value is 318 μ H, C2For Leaded Ceramic Disc Capacitor, capacitance 160pF.
7. a kind of composite power source dress that Uniform Discharge high activity plasma is generated for excitation according to claim 4
It puts, which is characterized in that high-pass filter (40) includes capacitance C4、C6With inductance L5；
The high-pressure side of high voltage nanosecond pulse power supply (10) and capacitance C4One end be connected, capacitance C4The other end and capacitance C6's
One end is connected, capacitance C6The other end be connected with one end of load (60), load the other end and the high-voltage nanosecond arteries and veins of (60)
The ground terminal for rushing power supply (10) is connected, inductance L5One end access capacitance C4With capacitance C6Between circuit, inductance L5It is another
End ground connection.
8. a kind of composite power source dress that Uniform Discharge high activity plasma is generated for excitation according to claim 7
It puts, which is characterized in that the cutoff frequency of high-pass filter (40) is 100kHz, and characteristic impedance is 2000 Ω；Capacitance C4And C6It is
Leaded Ceramic Disc Capacitor, capacitance are 800pF, L5For wire-wound inductor, inductance value 1.59mH.
9. a kind of composite power source dress that Uniform Discharge high activity plasma is generated for excitation according to claim 1
It puts, which is characterized in that load (60) is the dielectric barrier discharge unit of parallel plate electrode structure, and electrode is brass material.
10. a kind of composite power source dress that Uniform Discharge high activity plasma is generated for excitation according to claim 1
It puts, which is characterized in that the frequency of low-frequency ac power (20) is 50Hz, and amplitude range is 0~1kV；High voltage nanosecond pulse power supply
(10) frequency is 100Hz, and halfwidth 20ns, amplitude range is 0~10kV.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711385104.9A CN108093551B (en) | 2017-12-20 | 2017-12-20 | Composite power supply device for exciting and generating uniform discharge high-activity plasma |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711385104.9A CN108093551B (en) | 2017-12-20 | 2017-12-20 | Composite power supply device for exciting and generating uniform discharge high-activity plasma |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN108093551A true CN108093551A (en) | 2018-05-29 |
| CN108093551B CN108093551B (en) | 2020-03-13 |
Family
ID=62176229
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711385104.9A Active CN108093551B (en) | 2017-12-20 | 2017-12-20 | Composite power supply device for exciting and generating uniform discharge high-activity plasma |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN108093551B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111697870A (en) * | 2020-05-20 | 2020-09-22 | 中国人民解放军空军工程大学 | Low-voltage, low-power and low-electromagnetic interference pulse-alternating current combined nanosecond pulse discharge generation device and generation method |
| CN115117973A (en) * | 2022-07-15 | 2022-09-27 | 首凯汽车零部件（江苏）有限公司 | Voltage superposition type composite power supply system |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1551305A (en) * | 2003-05-16 | 2004-12-01 | ���������ƴ���ʽ���� | Plasma processing apparatus and control method thereof |
| CN101043784A (en) * | 2006-03-21 | 2007-09-26 | 显示器生产服务株式会社 | Hybrid plasma reactor |
| CN102694525A (en) * | 2011-03-23 | 2012-09-26 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Double frequency filtering device, processing method thereof and semiconductor device |
| CN203504452U (en) * | 2013-10-23 | 2014-03-26 | 天津市英格环保科技有限公司 | Steep-fronted nanosecond pulse power supply for dual-medium low-temperature plasma reactor |
| CN105093107A (en) * | 2015-09-11 | 2015-11-25 | 东北电力大学 | Instrument used for measuring withstand voltage and pulse frequency of pulse water switch and method thereof |
| CN105259430A (en) * | 2015-11-11 | 2016-01-20 | 国家电网公司 | Medium space charge measurement electrode at AC superposition DC voltage based on PEA method |
| WO2017069617A1 (en) * | 2015-10-19 | 2017-04-27 | Technische Universiteit Delft | Dielectric barrier discharge DBD plasma system for an air-foil of a wind turbine or an airplane |
| CN206721124U (en) * | 2017-05-17 | 2017-12-08 | 哈尔滨理工大学 | A kind of electrical oil dewatering water installations of DC stacked ac pulse-type electric field |
-
2017
- 2017-12-20 CN CN201711385104.9A patent/CN108093551B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1551305A (en) * | 2003-05-16 | 2004-12-01 | ���������ƴ���ʽ���� | Plasma processing apparatus and control method thereof |
| CN101043784A (en) * | 2006-03-21 | 2007-09-26 | 显示器生产服务株式会社 | Hybrid plasma reactor |
| CN102694525A (en) * | 2011-03-23 | 2012-09-26 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Double frequency filtering device, processing method thereof and semiconductor device |
| CN203504452U (en) * | 2013-10-23 | 2014-03-26 | 天津市英格环保科技有限公司 | Steep-fronted nanosecond pulse power supply for dual-medium low-temperature plasma reactor |
| CN105093107A (en) * | 2015-09-11 | 2015-11-25 | 东北电力大学 | Instrument used for measuring withstand voltage and pulse frequency of pulse water switch and method thereof |
| WO2017069617A1 (en) * | 2015-10-19 | 2017-04-27 | Technische Universiteit Delft | Dielectric barrier discharge DBD plasma system for an air-foil of a wind turbine or an airplane |
| CN105259430A (en) * | 2015-11-11 | 2016-01-20 | 国家电网公司 | Medium space charge measurement electrode at AC superposition DC voltage based on PEA method |
| CN206721124U (en) * | 2017-05-17 | 2017-12-08 | 哈尔滨理工大学 | A kind of electrical oil dewatering water installations of DC stacked ac pulse-type electric field |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111697870A (en) * | 2020-05-20 | 2020-09-22 | 中国人民解放军空军工程大学 | Low-voltage, low-power and low-electromagnetic interference pulse-alternating current combined nanosecond pulse discharge generation device and generation method |
| CN115117973A (en) * | 2022-07-15 | 2022-09-27 | 首凯汽车零部件（江苏）有限公司 | Voltage superposition type composite power supply system |
| CN115117973B (en) * | 2022-07-15 | 2023-09-26 | 首凯高科技(江苏)有限公司 | Voltage superposition type composite power supply system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN108093551B (en) | 2020-03-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US10064263B2 (en) | Cold plasma treatment devices and associated methods | |
| CN103482735B (en) | Water spray discharge air plasma jet processing unit and high voltage source thereof | |
| CN106787924B (en) | A kind of long pulsewidth quasi-square wave impulse generator of high voltage | |
| CN103656857B (en) | A kind of Portable low-temp plasma sterilization, beauty appliance | |
| CN203658523U (en) | Cable insulation detection equipment based on oscillating wave test | |
| WO2017198469A1 (en) | Circuit assembly for providing high-frequency energy, and system for generating an electric discharge | |
| CN108093551A (en) | For encouraging the composite power supply unit for generating Uniform Discharge high activity plasma | |
| CN106993369A (en) | Portable low-temp plasma producing apparatus with protecting human body function | |
| CN106655529B (en) | Realize the ECPT system and its Parameters design of load soft handover | |
| Amjad et al. | Analysis, design, and implementation of multiple parallel ozone chambers for high flow rate | |
| CN201478694U (en) | Air ion generator | |
| CN101902862A (en) | Harmonic constant current source for atmospheric glow discharge | |
| CN203785025U (en) | Wide-voltage constant-power electromagnetic oven | |
| CN218742781U (en) | Ultrasonic atomizer | |
| CN211301762U (en) | Novel radio frequency emission source | |
| CN203416162U (en) | Photovoltaic inverter-used du/dt filter circuit | |
| CN1725619A (en) | Power supply for low temp. plasma treatment of wool fibre | |
| CN111697870A (en) | Low-voltage, low-power and low-electromagnetic interference pulse-alternating current combined nanosecond pulse discharge generation device and generation method | |
| CN208337987U (en) | A kind of multipoint mode plasma generator | |
| Yasu et al. | Development of high power burst pulse generator based on magnetic switch for bioelectrics application | |
| CN204206129U (en) | A kind of Novel ultra wide band piezoelectric filter | |
| CN207251492U (en) | The pulse power | |
| WO2024037496A1 (en) | Impedance identification method for ultrasonic atomizer, and ultrasonic atomizer | |
| CN207294170U (en) | A kind of environmental protection equipment with voltage protection | |
| CN207853777U (en) | A kind of high-voltage power apparatus and electronic equipment |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant |