CN108020179B - A kind of High-precision angle measuring device and method - Google Patents
A kind of High-precision angle measuring device and method Download PDFInfo
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- CN108020179B CN108020179B CN201711452067.9A CN201711452067A CN108020179B CN 108020179 B CN108020179 B CN 108020179B CN 201711452067 A CN201711452067 A CN 201711452067A CN 108020179 B CN108020179 B CN 108020179B
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- beam splitter
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
Abstract
The present invention proposes a kind of High-precision angle measuring device and method, and laser light source becomes after beam expanding lens and attenuator expands parallel laser；Parallel laser is expanded by the first beam splitter, reflecting mirror, third beam splitter, the 4th beam splitter, forms the first reference beam；Parallel laser is expanded by the first beam splitter, the second beam splitter, third beam splitter, the 4th beam splitter, forms the second reference beam；Parallel laser is expanded by the first beam splitter, the second beam splitter, reflecting mirror to be measured, the 4th beam splitter, forms light beam to be measured；First reference beam, the second reference beam, the light beam to be measured coherent superposition in CCD camera image planes generate interference pattern, and input picture processing system.Location information is carried out linear fit by measuring the location information of laser interference hot spot by the present invention, by calculating the variable quantity of linear distance, calculates the angle change of incident laser.Under identical measurement accuracy, this method avoid the rigors adjusted the distance, and provide a kind of method for the miniaturization of High-precision angle measuring device.
Description
Technical field
The invention belongs to optical metrology fields, relate generally to the High-precision angle measuring device and method of small angle variation.
Background technique
With the development of technology, sub-micro arc angles measure, and it is in the urgent need to address to have become many high-quality precision and sophisticated technologies
Major issue.Collimator method or four-quadrant method are now mostly used, it is high using collimator method measurement accuracy, but equipment is heavy,
Environmental requirement is high, adjusts difficult.Such as measurement sub-micro arc angles objective focal length must reach 2m, need to occupy big quantity space.Four
The high sensitivity of quadrant method position, it is assumed that reaching 4 quadrant detector distance from reflecting mirror is 2.5m, and the sensitivity of this method reaches
To 1 μ rad.But since laser facula is not equally distributed rectangular light spot, the differential amplification output valve of four-quadrant and laser
Facula position is in non-linear, and since non-gaussian stray light exists, four-quadrant method is not suitable for high-precision fixed measurement, and
And the very difficult tune of initial position on laser reflection to 4 quadrant detector surface, it is inconvenient to use.
Foreign countries have delivered " Application of the Fourier in optical&Laser Technology in 2012
Analysis methods to the three beam interferometry " it proposes to utilize three interference of light of fourier analysis
Method measures low-angle amount, is made of laser polarizing film beam splitter camera.Fu Li is carried out to the coherent image of formation
Leaf analysis simultaneously is further calculated to obtain angle change to the result of analysis.Minimum 10um of camera pixel or so at this stage,
Due to camera pixel can not accomplish it is infinitely small, so the space sampling frequency of image is relatively low to lead to the space that Fourier Tranform obtains
Frequency accuracy is lower, so that the angular error calculated is big.
Summary of the invention
In order to solve the problems existing in the prior art, the present invention proposes a kind of High-precision angle measuring device and method, in reality
The measurement accuracy for meeting sub-micro arc angles while miniaturization measuring device now, is suitable for on-the-spot test.
The technical solution of the present invention is as follows:
A kind of High-precision angle measuring device, it is characterised in that: including laser light source, beam expanding lens, attenuator, beam splitting
Mirror, reflecting mirror, reflecting mirror to be measured, CCD camera and image processing system；
Laser light source becomes after beam expanding lens and attenuator expands parallel laser；
It expands parallel laser and passes through the first beam splitter 1, reflecting mirror, third beam splitter 3, the 4th beam splitter 4, the shape on camera
At the first reference beam 1；
Parallel laser is expanded by the first beam splitter 1, the second beam splitter 2, third beam splitter 3, the 4th beam splitter 4, in phase
The second reference beam 2 is formed on machine；
Parallel laser is expanded by the first beam splitter 1, the second beam splitter 2, reflecting mirror to be measured, the 4th beam splitter 4, in camera
It is upper to form light beam to be measured；
First reference beam 1, the second reference beam 2, the light beam to be measured coherent superposition in CCD camera image planes generate interference
Figure, and input picture processing system.
Further preferred embodiment, a kind of High-precision angle measuring device, it is characterised in that: each beam splitter with enter
Irradiating light beam angle at 45 °, reflecting mirror and incident beam angle are not equal to 45 °, and reflecting mirror to be measured and incident beam institute are at folder
Angle is not equal to 45 °.
Further preferred embodiment, a kind of High-precision angle measuring device, it is characterised in that: reflecting mirror and incident light
Beam angle is not equal to 45 ° in 45 ° of ± 10 ' range；Reflecting mirror to be measured and incident beam angle are at 45 ° ± 10 '
In range, and it is not equal to 45 °.
First reference beam 1, the second reference beam 2, the light beam to be measured coherent superposition in CCD camera image planes generate interference pattern
Shown in 2, the second reference beam 2 and light beam to be measured or the first reference beam 1 and light beam to be measured, the interference pattern formed on CCD is such as
Shown in Fig. 3.The center-of-mass coordinate that all hot spots in interference pattern 2 are found out using centroid method is carried out linear by the stripe direction of interference pattern 3
Fitting calculates the vertical range between adjacent two straight lines, and then can accurately calculate the angle change of plane mirror to be measured.
Based on the above principles, using above-mentioned measuring device, the method for carrying out High-precision angle measurement, it is characterised in that: packet
Include following steps:
Step 1: lighting laser light source, open CCD camera and image processing system；Fixed reflecting mirror to be measured, passes through adjusting
First beam splitter 1, the second beam splitter 2, third beam splitter 3, the 4th beam splitter 4, reflecting mirror join the first reference beam 1, second
It examines light beam 2, light beam to be measured and generates interference the first plaque-like interference pattern 1 of formation on CCD；
Step 2: low-angle offset occurs for reflecting mirror to be measured, and other elements are motionless, obtains the first reference beam 1, second ginseng
It examines light beam 2, light beam to be measured and generates interference the second plaque-like interference pattern 2 of formation on CCD；
Step 3: covering reference beam all the way, the speckle pattern interferometry that another way reference beam and light beam to be measured are formed on CCD
Fig. 3；
Step 4: the center-of-mass coordinate of all hot spots in the first plaque-like interference pattern 1 of step 1 generation is found out using centroid method
(x1i、y1i) and step 2 generate the second plaque-like interference pattern 2 in all hot spots center-of-mass coordinate (x2i、y2i)；
Step 5: according to the stripe direction for speckle pattern interferometry Fig. 3 that step 3 generates, to corresponding in the first plaque-like interference pattern 1
The center-of-mass coordinate of same striped carries out linear fit, obtains several straight lines, and calculates being averaged for distance between adjacent two straight lines
Value Da；Linear fit is carried out to the center-of-mass coordinate for corresponding to same striped in the second plaque-like interference pattern 2, obtains several straight lines, and
Calculate the average value D of distance between adjacent two straight linesb；
Step 6: the angle change of reflecting mirror to be measured in step 2 is calculated as follows:
Step 6.1: calculate spatial frequency variation value:Wherein γ is pixel dimension；
Step 6.2: calculation value: Δ β=Δ f λ, wherein λ is optical maser wavelength used.
Beneficial effect
Location information is carried out linear fit by measuring the location information of laser interference hot spot by the present invention, passes through meter
The variable quantity for calculating linear distance, cleverly calculates the angle change of incident laser.Under identical measurement accuracy, compared to using
Light pipe method measurement angle, this method avoid the rigors adjusted the distance, and provide one for the miniaturization of High-precision angle measuring device
Kind method.
Detailed description of the invention
A kind of measurement method schematic diagram of High-precision angle measurement of Fig. 1.
The three beams of laser interference pattern of Fig. 2 High-precision angle measurement.
Two beam laser interference figures in the measurement of Fig. 3 High-precision angle.
Specific embodiment
In order to further disclose the present invention, with reference to the accompanying drawing and preferred embodiment the invention will be further described.
As shown in Figure 1, the measurement method that the High-precision angle in the present embodiment measures includes laser light source, beam expanding lens, declines
Subtract piece, beam splitter, reflecting mirror, reflecting mirror to be measured, CCD and image recording and processing system；Reflecting mirror to be measured is installed on angled
In the equipment of variation；Three laser beams formed by each beam splitter and reflecting mirror are almost parallel, are ultimately incident upon CCD camera
On.
As shown in Figure 1,632.8nm laser light source is placed in front of beam expanding lens, the position of beam expanding lens and laser is adjusted
It is set to export approximate planar light.Attenuator is placed behind the light source at 10mm, each beam splitter and reflecting mirror riding position are such as
Shown in Fig. 1, each mirror is almost parallel and is spaced apart from each other 50cm.Adjust laser, beam expanding lens, beam splitter, reflecting mirror CCD camera shooting
Relative altitude between machine makes three's common optical axis.CCD camera is connected with image recording with processing system.
High-precision angle measuring process is carried out using above-mentioned apparatus are as follows:
Step 1: lighting laser light source, open CCD camera and image processing system；Fixed reflecting mirror to be measured, passes through adjusting
First beam splitter 1, the second beam splitter 2, third beam splitter 3, the 4th beam splitter 4, reflecting mirror join the first reference beam 1, second
It examines light beam 2, light beam to be measured and generates interference the first plaque-like interference pattern 1 of formation on CCD；
Step 2: low-angle offset occurs for reflecting mirror to be measured, and other elements are motionless, obtains the first reference beam 1, second ginseng
It examines light beam 2, light beam to be measured and generates interference the second plaque-like interference pattern 2 of formation on CCD；
Step 3: covering reference beam all the way, the speckle pattern interferometry that another way reference beam and light beam to be measured are formed on CCD
Fig. 3；
Step 4: the center-of-mass coordinate of all hot spots in the first plaque-like interference pattern 1 of step 1 generation is found out using centroid method
(x1i、y1i) and step 2 generate the second plaque-like interference pattern 2 in all hot spots center-of-mass coordinate (x2i、y2i)；
Step 5: according to the stripe direction for speckle pattern interferometry Fig. 3 that step 3 generates, to corresponding in the first plaque-like interference pattern 1
The center-of-mass coordinate of same striped carries out linear fit, obtains straight line la1:ya1=kxa1+ca1、la2:ya2=kxa2+ca2、la3:ya3=
kxa3+ca3... .., and calculate the average value D of distance between adjacent two straight linesa；It is same to corresponding in the second plaque-like interference pattern 2
The center-of-mass coordinate of striped carries out linear fit, obtains straight line Lb1:yb1=Kxb1+cb1、Lb2:yb2=Kxb2+cb2、Lb3:yb3=Kxb3
+cb3... .., and calculate the average value D of distance between adjacent two straight linesb；
Step 6: the angle change of reflecting mirror to be measured in step 2 is calculated as follows:
Step 6.1: calculate spatial frequency variation value:Wherein γ is pixel dimension；
Step 6.2: calculation value: Δ β=Δ f λ, wherein λ is optical maser wavelength 632.8nm used.
The present invention obtains variable quantity to low-angle using the method that three beams of laser is interfered and measures, and finds out interference by calculating
Facula mass center carries out linear fit according to specific direction, calculates finally by the variation of the distance between adjacent two straight line to be measured
The angle change of reflecting mirror.This method has the characteristics that occupy little space, method is simple, measurement accuracy is high, application prospect is wide.
Claims (4)
1. a kind of High-precision angle measuring device, it is characterised in that: including laser light source, beam expanding lens, attenuator, beam splitter, anti-
Penetrate mirror, reflecting mirror to be measured, CCD camera and image processing system；
Laser light source becomes after beam expanding lens and attenuator expands parallel laser；
Parallel laser is expanded by the first beam splitter, reflecting mirror, third beam splitter, the 4th beam splitter, forms the first reference beam；
Parallel laser is expanded by the first beam splitter, the second beam splitter, third beam splitter, the 4th beam splitter, forms the second reference
Light beam；
Parallel laser is expanded by the first beam splitter, the second beam splitter, reflecting mirror to be measured, the 4th beam splitter, forms light beam to be measured；
In a stage of measurement process, the first reference beam, the second reference beam, the light beam to be measured phase in CCD camera image planes
Dry superposition generates interference pattern, and input picture processing system；In another stage of measurement process, the first reference beam or the second ginseng
It examines light beam and the light beam to be measured coherent superposition in CCD camera image planes and generates interference pattern, and input picture processing system.
2. a kind of High-precision angle measuring device according to claim 1, it is characterised in that: each beam splitter and incident beam
Angle at 45 °, reflecting mirror and incident beam angle are not equal to 45 °, and reflecting mirror to be measured and incident beam angle differ
In 45 °.
3. a kind of High-precision angle measuring device according to claim 2, it is characterised in that: reflecting mirror and incident beam institute at
Angle is not equal to 45 ° in 45 ° of ± 10 ' range；Reflecting mirror to be measured and incident beam angle are in 45 ° of ± 10 ' range
It is interior, and it is not equal to 45 °.
4. using measuring device described in claim 1, the method for progress High-precision angle measurement, it is characterised in that: including following
Step:
Step 1: lighting laser light source, open CCD camera and image processing system；Fixed reflecting mirror to be measured, by adjusting first
Beam splitter, the second beam splitter, third beam splitter, the 4th beam splitter, reflecting mirror make the first reference beam, the second reference beam, to
It surveys light beam and generates interference the first plaque-like interference pattern of formation on CCD；
Step 2: low-angle offset occurs for reflecting mirror to be measured, and other elements are motionless, obtain the first reference beam, the second reference light
Beam, light beam to be measured generate interference on CCD and form the second plaque-like interference pattern；
Step 3: covering reference beam all the way, the interference fringe that another way reference beam and light beam to be measured are formed on CCD；
Step 4: the center-of-mass coordinate (x of all hot spots in the first plaque-like interference pattern of step 1 generation is found out using centroid method1i、y1i),
And step 2 generate the second plaque-like interference pattern in all hot spots center-of-mass coordinate (x2i、y2i)；
Step 5: according to step 3 generate interference fringe stripe direction, in the first plaque-like interference pattern correspond to same
The center-of-mass coordinate of line carries out linear fit, obtains several straight lines, and calculate the average value D of distance between adjacent two straight linesa；It is right
Linear fit is carried out corresponding to the center-of-mass coordinate of same striped in second plaque-like interference pattern, obtains several straight lines, and calculate adjacent
The average value D of distance between two straight linesb；
Step 6: the angle change of reflecting mirror to be measured in step 2 is calculated as follows:
Step 6.1: calculate spatial frequency variation value:Wherein γ is pixel dimension；
Step 6.2: calculation value: Δ β=Δ f λ, wherein λ is optical maser wavelength used.
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| DE102018126544A1 (en) * | 2018-10-24 | 2020-04-30 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Method and device for detecting changes in direction of a light beam |
| CN110631510B (en) * | 2019-09-12 | 2020-07-31 | 中国科学院西安光学精密机械研究所 | High-precision angle measuring device and method based on Michelson structure |
| CN110673334B (en) * | 2019-09-29 | 2021-08-13 | 中国科学院空间应用工程与技术中心 | Automatic light beam transmission stabilizing system and method |
| CN111006582B (en) * | 2019-12-06 | 2021-09-07 | 中国科学院光电技术研究所 | Interference phase shift sensitivity enhancing method based on moire fringes |
| CN112611340B (en) * | 2020-11-19 | 2022-04-01 | 易思维（杭州）科技有限公司 | Method for adjusting laser light plane in vision sensor |
| CN113654656B (en) * | 2021-10-18 | 2022-02-11 | 之江实验室 | Light beam drift detection device and method based on three-light-beam interference |
| CN114370935A (en) * | 2022-01-10 | 2022-04-19 | 中国人民解放军63892部队 | CCD target surface laser energy distribution measuring system and method based on image fusion |
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| CN2099299U (en) * | 1991-08-30 | 1992-03-18 | 华中理工大学 | Non-contact type ultra-precise surface measuring equipment |
| US6525821B1 (en) * | 1997-06-11 | 2003-02-25 | Ut-Battelle, L.L.C. | Acquisition and replay systems for direct-to-digital holography and holovision |
| US6563592B2 (en) * | 2001-03-19 | 2003-05-13 | The United States Of America As Represented By The Secretary Of The Army | Interferometric alignment device |
| FR2978824B1 (en) * | 2011-08-05 | 2014-03-21 | Thales Sa | INTERFEROMETER POSTURE DETECTION SYSTEM |
| CN102944989B (en) * | 2012-10-23 | 2015-07-01 | 深圳大学 | Phase-shift digital holographic high-speed imaging method and system |
| KR101948912B1 (en) * | 2014-07-09 | 2019-02-15 | 에이에스엠엘 네델란즈 비.브이. | Inspection apparatus, inspection method and device manufacturing method |
| CN105698710B (en) * | 2016-01-28 | 2017-05-10 | 襄阳宏伟航空器有限责任公司 | A dynamic angle measurement apparatus and application thereof |
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