CN107747131A - A kind of fine-hair maring using monocrystalline silicon slice additive - Google Patents

A kind of fine-hair maring using monocrystalline silicon slice additive Download PDF

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Publication number
CN107747131A
CN107747131A CN201711023941.7A CN201711023941A CN107747131A CN 107747131 A CN107747131 A CN 107747131A CN 201711023941 A CN201711023941 A CN 201711023941A CN 107747131 A CN107747131 A CN 107747131A
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China
Prior art keywords
monocrystalline silicon
additive
fine
silicon slice
copolymer
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CN201711023941.7A
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Chinese (zh)
Inventor
姜翰钦
吴金丹
周小国
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DEQING LIJING ENERGY TECHNOLOGY Co Ltd
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DEQING LIJING ENERGY TECHNOLOGY Co Ltd
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Publication of CN107747131A publication Critical patent/CN107747131A/en
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    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/08Etching
    • C30B33/10Etching in solutions or melts
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Photovoltaic Devices (AREA)

Abstract

The present invention provides a kind of fine-hair maring using monocrystalline silicon slice additive, the additive is added in alkali lye according to a certain percentage, you can realize quick making herbs into wool effect, the making herbs into wool time is 300s 420s.The fine-hair maring using monocrystalline silicon slice additive, is made up of following parts by weight of component:The copolymer 0.05 3% of vinyl pyrrolidone vinyl imidazole, polyethylene glycol polypropylene glycol ethylene glycol copolymer 0.05 3%, ethylenediamine tetra-acetic acid 0.05 1%, MEA 0.1 5%, the water of sodium benzoate 0.05 0.5%, paratoluenesulfonic acid sodium salt 0.1 2% and surplus.

Description

A kind of fine-hair maring using monocrystalline silicon slice additive
Technical field
The present invention relates to solar cell technology neck, more particularly to a kind of fine-hair maring using monocrystalline silicon slice additive.
Background technology
Alkali lye is very fast to [100] etched-facet of monocrystalline silicon piece, and the etching to [111] crystal face is slower.Produce therefrom Etching rate difference the monocrystalline silicon sheet surface during being etched using alkali lye to silicon chip will be caused to form pyramid Structure.The structure can effectively reduce reflection of the silicon chip to light.In the preparation process of solar battery sheet, reflection of the silicon chip to light Lower, absorption of the silicon chip to light is more, and conversion efficiency of solar cell is also higher.The method etched by above-mentioned alkali lye is to monocrystalline Silicon chip surface progress texturing processing is conventional increase crystalline silicon to one of effective way of absorption of light.Existing monocrystalline silicon Process for etching usually requires the 600 s-900 s making herbs into wool time, less efficient, if can shorten the making herbs into wool time, can effectively carry High efficiency.The flocking additive of this patent can greatly shorten the making herbs into wool time, and after making herbs into wool monocrystalline silicon surface pyramid Size and distribution approached with common process.
The content of the invention
The present invention provides a kind of fine-hair maring using monocrystalline silicon slice additive, should be when carrying out making herbs into wool to monocrystalline silicon piece, by this patent Additive is added in alkali lye according to a certain percentage, you can realizes quick making herbs into wool effect, the making herbs into wool time is 300s-420s.The list Crystal silicon chip flocking additive, it is characterised in that:The additive is made up of following parts by weight of component:Vinyl pyrrolidone-ethene The copolymer 0.05-3% of base imidazoles, PEO-PPO-PEO 0.05-3%, ethylenediamine tetra-acetic acid 0.05-1%, MEA 0.1-5%, sodium benzoate 0.05-0.5%, paratoluenesulfonic acid sodium salt 0.1-2% and surplus water.
In a preferable technical scheme of the invention, the copolymer of described vinyl pyrrolidone-vinyl imidazole Number-average molecular weight be about 1,000-10,000.
In presently preferred technical scheme, described PEO-PPO-PEO Number-average molecular weight be about 5,00-10,000.
In presently preferred technical scheme, the pH of described flocking additive is 8-14.
Compared with prior art, the invention has the advantages that:
Fine-hair maring using monocrystalline silicon slice additive provided by the invention can quickly carry out surface wool manufacturing, system after being mixed with alkali lye to monocrystalline silicon piece The suede time, more conventional technique shortened more than 50%;And flocking additive need not be added during making herbs into wool, improving making herbs into wool efficiency Reduce cost simultaneously.Meanwhile the flocking additive of this patent is non-toxic, non-corrosiveness, to human body and environment non-hazardous.
It is also an advantage of the present invention that:The pyramidal size of matte obtained after quick making herbs into wool is smaller, narrow distribution, to light Reflectivity it is low, the photoelectric transformation efficiency of assembled obtained solar battery sheet is high.The additive cost is relatively low, efficiency compared with Height, significant effect, there is splendid practical value.
Brief description of the drawings
Fig. 1 is the pyramid 1 for the monocrystalline silicon surface that etching method provided by the invention obtains;
Fig. 2 is the pyramid 2 for the monocrystalline silicon surface that etching method provided by the invention obtains.
Embodiment
Embodiment 1
Processing step is as follows:
1. configure flocking additive:By the copolymer of 0.5 g vinyl pyrrolidones-vinyl imidazole(Number-average molecular weight is), 1 g PEO-PPO-PEOs, 0.5 g ethylenediamine tetra-acetic acids, 2 g MEAs, 0.1 g benzoic acid Sodium and 0.25 g paratoluenesulfonic acid sodium salts are dissolved into 100 ml deionized waters successively.
2. configure alkali lye:10 g sodium hydroxides are dissolved in 990 g deionized waters, obtain the hydrogen-oxygen that mass fraction is 1% Change sodium water solution.
3. the alkaline Woolen-making liquid of configuration:By the alkali lye that the flocking additive obtained by step 1 and step 2 obtain using mass ratio as 0.5:100 is well mixed.
4. process for etching:Monocrystalline silicon piece used for solar batteries is submerged into alkaline Woolen-making liquid prepared by step 3 and carries out surface Making herbs into wool, making herbs into wool temperature are 85oC, making herbs into wool time are 300 s.
Embodiment 2
Processing step is as follows:
1. configure flocking additive:By the copolymer of 1 g vinyl pyrrolidones-vinyl imidazole, 2 g polyethylene glycols third Glycol-ethylene glycol copolymer, 0.1 g ethylenediamine tetra-acetic acids, 0.5 g MEAs, 0.05 g sodium benzoates and 0.5 g are to first Benzene sulfonic acid sodium salt is dissolved into 100 ml deionized waters successively.
2. configure alkali lye:15 g potassium hydroxide are dissolved in 985 g deionized waters, obtain the hydrogen that mass fraction is 1.5% Aoxidize aqueous solutions of potassium.
3. the alkaline Woolen-making liquid of configuration:By the alkali lye that the flocking additive obtained by step 1 and step 2 obtain using mass ratio as 1:100 is well mixed.
4. process for etching:Monocrystalline silicon piece used for solar batteries is submerged into alkaline Woolen-making liquid prepared by step 3 and carries out surface Making herbs into wool, making herbs into wool temperature are 75oC, making herbs into wool time are 420 s.
Embodiment 3
Processing step is as follows:
1. configure flocking additive:By the copolymer of 2 g vinyl pyrrolidones-vinyl imidazole, 1 g polyethylene glycols third Glycol-ethylene glycol copolymer, ethylenediamine tetra-acetic acid 0.5, MEA 3, sodium benzoate 0.1, paratoluenesulfonic acid sodium salt 0.5g It is dissolved into successively in 100 ml deionized waters.
2. configure alkali lye:20 g sodium hydroxides are dissolved in 980 g deionized waters, obtain the hydrogen-oxygen that mass fraction is 2% Change sodium water solution.
3. the alkaline Woolen-making liquid of configuration:By the alkali lye that the flocking additive obtained by step 1 and step 2 obtain using mass ratio as 0.1:100 is well mixed.
4. process for etching:Monocrystalline silicon piece used for solar batteries is submerged into alkaline Woolen-making liquid prepared by step 3 and carries out surface Making herbs into wool, making herbs into wool temperature are 88oC, making herbs into wool time are 300 s.
Embodiment 4
Processing step is as follows:
1. configure flocking additive:By the copolymer of 1.5 g vinyl pyrrolidones-vinyl imidazole, 1.5 g polyethylene glycol- Polypropylene glycol-ethylene glycol copolymer, ethylenediamine tetra-acetic acid 0.3, MEA 2, sodium benzoate 0.2, paratoluenesulfonic acid sodium salt 0.5 is dissolved into 100 ml deionized waters successively.
2. configure alkali lye:30 g sodium hydroxides are dissolved in 970 g deionized waters, obtain the hydrogen-oxygen that mass fraction is 3% Change sodium water solution.
3. the alkaline Woolen-making liquid of configuration:By the alkali lye that the flocking additive obtained by step 1 and step 2 obtain using mass ratio as 0.2:100 is well mixed.
4. process for etching:Monocrystalline silicon piece used for solar batteries is submerged into alkaline Woolen-making liquid prepared by step 3 and carries out surface Making herbs into wool, making herbs into wool temperature are 83oC, making herbs into wool time are 400 s.
The technical scheme provided using the present embodiment can quickly obtain tiny, uniform matte pyramid.Such as Fig. 1 and Fig. 2 Shown, obtained size reaches 10um;The method cost is relatively low, and efficiency is higher, significant effect, has splendid practical value.

Claims (4)

  1. A kind of 1. fine-hair maring using monocrystalline silicon slice additive, it is characterised in that:The additive is made up of following parts by weight of component:Vinylpyridine The copolymer 0.05-3% of pyrrolidone-vinyl imidazole, PEO-PPO-PEO 0.05-3%, second two Amine tetraacethyl 0.05-1%, MEA 0.1-5%, sodium benzoate 0.05-0.5%, paratoluenesulfonic acid sodium salt 0.1-2% and surplus Water.
  2. 2. fine-hair maring using monocrystalline silicon slice additive according to claim 1, it is characterised in that:Described vinyl pyrrolidone- The number-average molecular weight of the copolymer of vinyl imidazole is about 1,000-10,000.
  3. 3. fine-hair maring using monocrystalline silicon slice additive according to claim 1, it is characterised in that:Described polyethylene glycol the third two The number-average molecular weight of alcohol-ethylene glycol copolymer is about 5,00-10,000.
  4. 4. fine-hair maring using monocrystalline silicon slice additive according to claim 1, it is characterised in that:The pH of described flocking additive is 8-14。
CN201711023941.7A 2017-10-27 2017-10-27 A kind of fine-hair maring using monocrystalline silicon slice additive Pending CN107747131A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108103584A (en) * 2017-11-13 2018-06-01 德清丽晶能源科技有限公司 A kind of acid flocking additive and its application method that silicon chip surface processing is cut for polycrystalline diamond line

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1902292A (en) * 2003-11-14 2007-01-24 昭和电工株式会社 Polishing composition and polishing method
CN102017176A (en) * 2008-03-25 2011-04-13 应用材料股份有限公司 Surface cleaning and texturing process for crystalline solar cells
CN102312294A (en) * 2011-09-08 2012-01-11 浙江向日葵光能科技股份有限公司 Additive used for monocrystalline silicon wafer alkaline flocking and application method thereof
US20130295712A1 (en) * 2012-05-03 2013-11-07 Advanced Technology Materials, Inc. Methods of texturing surfaces for controlled reflection
CN103451739A (en) * 2013-09-04 2013-12-18 常州时创能源科技有限公司 Monocrystalline silicon wafer texturizing additive and using method thereof
CN106206774A (en) * 2016-06-30 2016-12-07 常州时创能源科技有限公司 Silicon chip is prepared the method that uniform micro-nano is combined matte
CN106222756A (en) * 2016-09-30 2016-12-14 杭州飞鹿新能源科技有限公司 Additive and application process thereof for diamond wire cutting fine-hair maring using monocrystalline silicon slice
CN106521636A (en) * 2016-12-30 2017-03-22 德清丽晶能源科技有限公司 Single crystal wafer texturing additive
CN106835288A (en) * 2016-12-30 2017-06-13 德清丽晶能源科技有限公司 A kind of etching method of monocrystalline silicon piece

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1902292A (en) * 2003-11-14 2007-01-24 昭和电工株式会社 Polishing composition and polishing method
CN102017176A (en) * 2008-03-25 2011-04-13 应用材料股份有限公司 Surface cleaning and texturing process for crystalline solar cells
CN102312294A (en) * 2011-09-08 2012-01-11 浙江向日葵光能科技股份有限公司 Additive used for monocrystalline silicon wafer alkaline flocking and application method thereof
US20130295712A1 (en) * 2012-05-03 2013-11-07 Advanced Technology Materials, Inc. Methods of texturing surfaces for controlled reflection
CN103451739A (en) * 2013-09-04 2013-12-18 常州时创能源科技有限公司 Monocrystalline silicon wafer texturizing additive and using method thereof
CN106206774A (en) * 2016-06-30 2016-12-07 常州时创能源科技有限公司 Silicon chip is prepared the method that uniform micro-nano is combined matte
CN106222756A (en) * 2016-09-30 2016-12-14 杭州飞鹿新能源科技有限公司 Additive and application process thereof for diamond wire cutting fine-hair maring using monocrystalline silicon slice
CN106521636A (en) * 2016-12-30 2017-03-22 德清丽晶能源科技有限公司 Single crystal wafer texturing additive
CN106835288A (en) * 2016-12-30 2017-06-13 德清丽晶能源科技有限公司 A kind of etching method of monocrystalline silicon piece

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108103584A (en) * 2017-11-13 2018-06-01 德清丽晶能源科技有限公司 A kind of acid flocking additive and its application method that silicon chip surface processing is cut for polycrystalline diamond line

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Application publication date: 20180302