CN107687937A - A kind of quasi-molecule laser annealing ELA processing procedure quality method for measurement and system - Google Patents
A kind of quasi-molecule laser annealing ELA processing procedure quality method for measurement and system Download PDFInfo
- Publication number
- CN107687937A CN107687937A CN201710682116.1A CN201710682116A CN107687937A CN 107687937 A CN107687937 A CN 107687937A CN 201710682116 A CN201710682116 A CN 201710682116A CN 107687937 A CN107687937 A CN 107687937A
- Authority
- CN
- China
- Prior art keywords
- scale
- laser
- graduated scale
- quasi
- ela
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 28
- 238000005259 measurement Methods 0.000 title claims abstract description 21
- 238000005224 laser annealing Methods 0.000 title claims abstract description 20
- 230000003287 optical Effects 0.000 claims abstract description 21
- 230000002159 abnormal effect Effects 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 239000007769 metal material Substances 0.000 claims description 6
- 238000001514 detection method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 2
- 229920001621 AMOLED Polymers 0.000 description 1
- 206010044565 Tremor Diseases 0.000 description 1
- 230000001594 aberrant Effects 0.000 description 1
- 230000000875 corresponding Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004438 eyesight Effects 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000006011 modification reaction Methods 0.000 description 1
- 230000000737 periodic Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
Abstract
The present invention relates to ELA processing procedure quality measurement technologies field, particularly a kind of quasi-molecule laser annealing ELA processing procedure quality method for measurement and system.Graduated scale is placed in below ELA devices, the line laser that ELA devices export is fallen within the scale of graduated scale, and ensure that the scale on graduated scale is vertical with line laser；Collection laser is irradiated in optical signal caused by graduated scale, and by the optical signal display output；Observe electric signal for a period of time, whether abnormal according to electric signal judges to export whether laser is stablized.The quasi-molecule laser annealing ELA processing procedure quality method for measurement and system cost of the present invention is cheap, can not only judge to export whether laser is stablized, moreover it is possible to judges to cause to export the laser factors of instability.
Description
Technical field
The present invention relates to ELA processing procedure quality measurement technologies field, particularly a kind of quasi-molecule laser annealing ELA processing procedure quality
Method for measurement and system.
Background technology
ELA (Excimer Laser Annel quasi-molecule laser annealings) MURA is to send out well and influence in AMOLED processing procedures greatly
The defects of, once being often associated with substantial amounts of online processing procedure abnormal article, ELA MURA are general all in rear root module lighting test
Shi Caineng has found, is lasted from occurring to finding more than 10 days, causes the bad risk of product high.Usual laser output shakiness, which is set to, to be led
Cause ELA MURA principal element, in order that in ELA processing procedures ELA MURA can by when find, it is necessary to be examined to output laser
Survey.
Conventional detection method judges for personnel or uses optical detection machine testing.Wherein, judge not unite using personnel
One quantitative criteria, eyesight and experience to inspector have higher requirement, and efficiency is low.Carried out using optical detector
Although detection efficiency detects higher compared to manpower, optical detector cost is high, and can only detect output laser whether
It is stable, it can not judge to cause to export the laser factors of instability.
The content of the invention
In order to solve the above technical problems, it is an object of the invention to provide a kind of cost is cheap, it can not only judge that output swashs
Just no stabilization, moreover it is possible to which the quasi-molecule laser annealing ELA processing procedures quality for judging to cause to export the laser factors of instability measures
Method and system.
The quasi-molecule laser annealing ELA processing procedure quality method for measurement of the present invention, is comprised the steps of：
S1：One graduated scale is provided, makes the line laser vertical irradiation that ELA devices export on the scale of graduated scale；
S2：Collection laser is irradiated on graduated scale caused optical signal and display output its signal pattern；
S3：Judge to export whether laser is stablized according to the whether abnormal of output signal in a period of time；
The substrate and graduation mark of the graduated scale are made up of different materials, and the line laser of the ELA devices output is in institute
The substrate for stating graduated scale is different with the optical signal that liter is produced on graduation mark.
As further alternative technical scheme, in step S3, judge to export the process whether laser is stablized as follows：
If signal amplitude is abnormal, and the abnormal same position for appearing in signal pattern, then it is judged as laser optical path exception；
If signal amplitude is abnormal, and the abnormal diverse location for appearing in signal pattern, then it is judged as that laser output is unstable
Or the gas anomaly of ELA devices；
If signal amplitude is normal, it is judged as that laser output is stable.
As further alternative technical scheme, the scale of the graduated scale is uniformly distributed along its length, the scale
The substrate of chi is nonmetallic materials, and graduation mark is metal material.
As further alternative technical scheme, the minimum division value of the graduated scale is 0.3 millimeter, 1 millimeter, 2 millimeters,
One kind in 5 millimeters.
As further alternative technical scheme, multiple rows of scale is provided with the graduated scale in the width direction, often arranges scale
It is uniformly distributed along graduated scale length direction, the minimum division value for often arranging the scale is different.
The quasi-molecule laser annealing ELA processing procedure quality measurement systems of the present invention, including：
Graduated scale；
ELA devices：For exporting line laser and vertical irradiation in the scale of the graduated scale；And
Signal receiver：Caused optical signal and output signal image on graduated scale are irradiated in for gathering laser, is entered
And judge to export whether laser is stablized according to the whether abnormal of output signal.
As further alternative technical scheme, the scale of the graduated scale is uniformly distributed along its length, the scale
The substrate of chi is nonmetallic materials, and graduation mark is metal material.
As further alternative technical scheme, the minimum division value of the graduated scale is 0.3 millimeter, 1 millimeter, 2 millimeters,
One kind in 5 millimeters.
As further alternative technical scheme, multiple rows of scale is provided with the graduated scale in the width direction, often arranges scale
It is uniformly distributed along graduated scale length direction, the minimum division value for often arranging the scale is different.
As further alternative technical scheme, the signal receiver is CCD.
The beneficial effects of the invention are as follows：Using line laser get to metal and it is nonmetallic upper when produce the originals of different optical signals
Reason, it is nonmetallic materials by substrate, graduation mark is placed in the lower section of line laser for the graduated scale of metal material, gathered by CCD,
The signal pattern in periodic distribution can be formed on a display screen, by being observed to the signal, can interpolate that out that output swashs
Just no stabilization, and further judge to cause to export the unstable material elements of laser, such as：Laser is abnormal, laser optical path
Exception or laser gas are abnormal.Detecting system cost is cheap, and detection method is easy, and efficiency high.Small volume, is easy to be erected at and sets
It is standby internal, and can be with monitor large-area laser scanning processing procedure.
Brief description of the drawings
Fig. 1 is a kind of quasi-molecule laser annealing ELA processing procedures quality measurement system connection diagram；
Fig. 2 is graduated scale schematic diagram in Fig. 1；
Fig. 3 is aberrant electrical signals and normal electrical signal comparison diagram；
In figure：1-ELA devices, 2-graduated scale, 3-signal receiver.
Embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, it is right below in conjunction with drawings and Examples
The present invention is further elaborated.The specific embodiments described herein are merely illustrative of the present invention, is not used to limit
The fixed present invention.In addition, as long as technical characteristic involved in each embodiment of invention described below is each other
Conflict can is not formed to be mutually combined.
As shown in figure 1, a kind of quasi-molecule laser annealing ELA processing procedure quality measurement system includes ELA devices 1, the He of graduated scale 2
Signal receiver 3.As shown in Fig. 2 the scale of the graduated scale 2 of the system is uniformly distributed along its length, and the substrate of graduated scale 2
For nonmetallic materials, graduation mark is metal material.
In an embodiment, the minimum division value of graduated scale 2 can be any one in 0.3mm, 1mm, 2mm, 5mm；
In a specific embodiment, a row or multi-row scale is provided with graduated scale in the width direction, often arranges scale along quarter
Degree chi length direction is uniformly distributed, and often arranges the minimum division value difference of scale, the minimum division value is 0.3mm, 1mm, 2mm, 5mm
In any one.In embodiment illustrated in fig. 2, graduated scale 2 has two row's graduation marks.
In an embodiment, signal receiver 3 is CCD, Charge-coupled Device, i.e. ccd image sensor,
It can gather optical signal, and optical signal is exported signal pattern by display., can be as needed in practical application
Other optical signal receivers are chosen, are not limited thereto.
When being detected to output laser, the suitable graduated scale of minimum division value is chosen according to resolution ratio, and by graduated scale
Fixing on the table, makes it corresponding with the line laser of ELA devices output, even if line laser is vertical with graduation mark, with graduated scale
Length direction is parallel.Now, due to laser get to metal and it is nonmetallic upper when can produce different optical signals, pass through CCD collection carve
Spend the optical signal of chi and line laser intersection and by display output signal image, i.e., it is in the cycle to show one on a display screen
Property distribution oscillogram, pass through the whether abnormal stabilization that can judge output laser for observing the oscillogram in certain period of time
Property.
If the amplitude of signal is abnormal in oscillogram (as arranged under Fig. 3 shown in waveform circled), and this is different within a period of time
The diverse location of signal pattern is often appeared in, then is judged as that laser output is unstable, and be laser exception or ELA device gases
It is abnormal；
If signal amplitude is abnormal, and the exception appears in the same position of signal pattern (under such as Fig. 3 in a period of time
Arrange shown in waveform circled), then it is judged as laser optical path exception；
If signal amplitude is normal (such as Fig. 3 upper row's waveform), it is judged as that laser output is stable.
It should be appreciated that for those of ordinary skills, can according to the above description be improved or converted,
And all these modifications and variations should all belong to the protection domain of appended claims of the present invention.
Claims (10)
1. a kind of quasi-molecule laser annealing ELA processing procedures quality method for measurement, it is characterised in that include step：
S1：One graduated scale is provided, makes the line laser vertical irradiation that ELA devices export on the scale of graduated scale；
S2：Collection laser is irradiated on graduated scale caused optical signal and display output its signal pattern；
S3：Judge to export whether laser is stablized according to the whether abnormal of output signal in a period of time；
The substrate and graduation mark of the graduated scale are made up of different materials, and the line laser of the ELA devices output is at the quarter
The substrate for spending chi is different with the optical signal that liter is produced on graduation mark.
2. quasi-molecule laser annealing ELA processing procedures quality method for measurement as claimed in claim 1, it is characterised in that in step S3, sentence
The process whether disconnected output laser is stablized is as follows：
If signal amplitude is abnormal, and the abnormal same position for appearing in signal pattern, then it is judged as laser optical path exception；
If signal amplitude is abnormal, and the abnormal diverse location for appearing in signal pattern, then it is judged as that laser exports unstable or ELA
The gas anomaly of device；
If signal amplitude is normal, it is judged as that laser output is stable.
3. quasi-molecule laser annealing ELA processing procedures quality method for measurement as claimed in claim 1, it is characterised in that：The graduated scale
Scale be uniformly distributed along its length, the substrate of the graduated scale is nonmetallic materials, and graduation mark is metal material.
4. quasi-molecule laser annealing ELA processing procedures quality method for measurement as claimed in claim 3, it is characterised in that：The graduated scale
Minimum division value be 0.3 millimeter, 1 millimeter, 2 millimeters, 5 millimeters in one kind.
5. quasi-molecule laser annealing ELA processing procedures quality method for measurement as claimed in claim 3, it is characterised in that：The graduated scale
On be provided with multiple rows of scale in the width direction, often arrange scale be uniformly distributed along graduated scale length direction, often arrange the scale most
Small scale division value is different.
A kind of 6. quasi-molecule laser annealing ELA processing procedures quality measurement system, it is characterised in that including：
Graduated scale；
ELA devices：For exporting line laser and vertical irradiation in the scale of the graduated scale；And
Signal receiver：Caused optical signal and output signal image, Jin Ergen on graduated scale are irradiated in for gathering laser
Whether abnormal according to output signal judges to export whether laser is stablized.
7. quasi-molecule laser annealing ELA processing procedures quality measurement system as claimed in claim 6, it is characterised in that：The scale
The scale of chi is uniformly distributed along its length, and the substrate of the graduated scale is nonmetallic materials, and graduation mark is metal material.
8. quasi-molecule laser annealing ELA processing procedures quality measurement system as claimed in claim 7, it is characterised in that：The scale
The minimum division value of chi is one kind in 0.3 millimeter, 1 millimeter, 2 millimeters, 5 millimeters.
9. quasi-molecule laser annealing ELA processing procedures quality measurement system as claimed in claim 7, it is characterised in that：The scale
Multiple rows of scale is provided with chi in the width direction, scale is often arranged and is uniformly distributed along graduated scale length direction, often arrange the scale
Minimum division value is different.
10. quasi-molecule laser annealing ELA processing procedures quality measurement system as claimed in claim 6, it is characterised in that：The signal
Receiver is CCD.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710682116.1A CN107687937B (en) | 2017-08-10 | 2017-08-10 | Excimer laser annealing ELA process quality measurement method and system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710682116.1A CN107687937B (en) | 2017-08-10 | 2017-08-10 | Excimer laser annealing ELA process quality measurement method and system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107687937A true CN107687937A (en) | 2018-02-13 |
| CN107687937B CN107687937B (en) | 2020-02-07 |
Family
ID=61153206
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710682116.1A Active CN107687937B (en) | 2017-08-10 | 2017-08-10 | Excimer laser annealing ELA process quality measurement method and system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107687937B (en) |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6255542A (en) * | 1985-09-04 | 1987-03-11 | Mitsubishi Electric Corp | Optical system inspecting device |
| CN1389716A (en) * | 2001-06-01 | 2003-01-08 | 清华大学 | Lens imaging quality testing device and method |
| CN1570561A (en) * | 2004-05-09 | 2005-01-26 | 中国科学院上海光学精密机械研究所 | Wave surface measuring apparatus for noncircular symmetrical light beam |
| CN201892571U (en) * | 2008-12-29 | 2011-07-06 | 长春理工大学 | Embedded quality measurement instrument for laser beam |
| CN203551251U (en) * | 2013-11-14 | 2014-04-16 | 长春理工大学 | Laser light beam quality measuring apparatus |
| CN104280210A (en) * | 2013-07-09 | 2015-01-14 | 上海和辉光电有限公司 | Laser source quality detecting device and method |
| CN105222992A (en) * | 2015-09-17 | 2016-01-06 | 西安科技大学 | A kind of Laser Beam Quality Factor measuring method |
| CN105990195A (en) * | 2015-03-20 | 2016-10-05 | 超科技公司 | Systems and methods for reducing pulsed laser beam profile non-uniformities for laser annealing |
-
2017
- 2017-08-10 CN CN201710682116.1A patent/CN107687937B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6255542A (en) * | 1985-09-04 | 1987-03-11 | Mitsubishi Electric Corp | Optical system inspecting device |
| CN1389716A (en) * | 2001-06-01 | 2003-01-08 | 清华大学 | Lens imaging quality testing device and method |
| CN1570561A (en) * | 2004-05-09 | 2005-01-26 | 中国科学院上海光学精密机械研究所 | Wave surface measuring apparatus for noncircular symmetrical light beam |
| CN201892571U (en) * | 2008-12-29 | 2011-07-06 | 长春理工大学 | Embedded quality measurement instrument for laser beam |
| CN104280210A (en) * | 2013-07-09 | 2015-01-14 | 上海和辉光电有限公司 | Laser source quality detecting device and method |
| CN203551251U (en) * | 2013-11-14 | 2014-04-16 | 长春理工大学 | Laser light beam quality measuring apparatus |
| CN105990195A (en) * | 2015-03-20 | 2016-10-05 | 超科技公司 | Systems and methods for reducing pulsed laser beam profile non-uniformities for laser annealing |
| CN105222992A (en) * | 2015-09-17 | 2016-01-06 | 西安科技大学 | A kind of Laser Beam Quality Factor measuring method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107687937B (en) | 2020-02-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7989766B2 (en) | Sample inspection apparatus | |
| JP2006234557A (en) | Method of correcting x-ray image and x-ray inspection apparatus | |
| CN101762777A (en) | Local discharging on-line detecting and positioning system for electric transformer | |
| CN103792705A (en) | Detecting method and detecting device for detecting substrate defects | |
| CN105158678A (en) | Printed circuit board short-circuit fault rapid detection device | |
| CN107037345B (en) | The method and its wafer test fixture that self is detected when wafer test | |
| CN107687937A (en) | A kind of quasi-molecule laser annealing ELA processing procedure quality method for measurement and system | |
| CN109216142A (en) | Electron probe microanalyzer and storage medium | |
| CN101673784B (en) | Method and device for generating digital still pictures of wafer-shaped elements during a production process | |
| CN105628710A (en) | Material detection system and detection method thereof | |
| KR20020000789A (en) | Inspection apparatus and sensor | |
| CN202947859U (en) | Backlight optical detection device and system | |
| CN207502419U (en) | Glass inspection systems | |
| CN103645197B (en) | The detection method of chip defect | |
| CN103197451B (en) | A kind of optic probe and comprise the equipment for measuring liquid crystal module Flicker flicker degree of this probe | |
| CN105547511B (en) | Gasification furnace furnace wall malfunction monitoring positioning device and method based on grid inspection | |
| DK167636B1 (en) | METHOD AND APPARATUS FOR MONITORING Acoustic Transducers | |
| CN104282248A (en) | Array substrate, testing method thereof, displaying panel and displaying device | |
| CN106653633A (en) | Battery piece for detecting abnormality of probe row and operation method used for detection | |
| KR101743595B1 (en) | Parital discharge diagnosis method and system, and mold transfomer deterioration monitoring system using the same. | |
| CN108469437A (en) | The defect inspection method and device of float glass | |
| CN202158872U (en) | Digital grain condition detection apparatus | |
| KR101124030B1 (en) | Producing device and producing method for producing electric fields in a substrate necessary to test at least one conductive structures formed on the substrate | |
| US20130175434A1 (en) | Indicator testing system | |
| CN204085689U (en) | A kind of proving installation of pilot lamp brightness uniformity |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |