CN107664924B - Exposure device and method - Google Patents

Exposure device and method Download PDF

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Publication number
CN107664924B
CN107664924B CN201610617029.3A CN201610617029A CN107664924B CN 107664924 B CN107664924 B CN 107664924B CN 201610617029 A CN201610617029 A CN 201610617029A CN 107664924 B CN107664924 B CN 107664924B
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China
Prior art keywords
exposure
system
flexible substrate
layer
pattern
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CN201610617029.3A
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Chinese (zh)
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CN107664924A (en
Inventor
陈勇辉
蓝科
陈文枢
戈亚萍
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上海微电子装备(集团)股份有限公司
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Priority to CN201610617029.3A priority Critical patent/CN107664924B/en
Publication of CN107664924A publication Critical patent/CN107664924A/en
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Publication of CN107664924B publication Critical patent/CN107664924B/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70425Imaging strategies, e.g. for increasing throughput, printing product fields larger than the image field, compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching, double patterning
    • G03F7/70466Multiple exposures, e.g. combination of fine and coarse exposures, double patterning, multiple exposures for printing a single feature, mix-and-match
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
    • G03F7/70616Wafer pattern monitoring, i.e. measuring printed patterns or the aerial image at the wafer plane
    • G03F7/70633Overlay

Abstract

The invention discloses an exposure device and a method, wherein the device comprises a flexible substrate, a roll-to-roll transmission system for transmitting and fixing the flexible substrate, a front exposure system and a back exposure system which are axially symmetrical relative to the flexible substrate, measurement systems respectively corresponding to the front and the back of the flexible substrate, and a main control system respectively connected with the roll-to-roll transmission system, the front exposure system, the back exposure system and the measurement systems. The front exposure system and the back exposure system are arranged to respectively expose the front surface and the back surface of the flexible substrate, so that the exposure efficiency is improved, meanwhile, two different exposure systems are respectively arranged in the front exposure system and the back exposure system to realize coarse exposure and correction exposure of different exposure patterns on the flexible substrate, the flexible substrate exposure device is suitable for different deformation quantities, and the exposure precision is greatly improved.

Description

Exposure device and method

Technical Field

The invention relates to the technical field of photoetching, in particular to an exposure device and an exposure method.

Background

In a roll-to-roll process, a processing substrate is a flexible substrate, which usually has multiple layers of exposure patterns, and during the flattening process of the flexible substrate, each flattening operation causes different deformation of the flexible substrate, so that the conventional proximity exposure cannot meet the exposure precision.

As shown in fig. 1, a structure diagram of a conventional proximity exposure system includes a light source 1 ', an illumination mirror assembly 2', a mask 3 ', and a flexible substrate 4'. The light beam emitted from the light source 1 ' is irradiated onto the mask 3 ' through the illumination mirror group 2 ', and the pattern on the mask 3 ' is transferred onto the flexible substrate 4 '. In which the mask 3 'is in close proximity to the flexible substrate 4', typically at a distance of several tens of microns to several hundreds of microns. As the size of the flexible substrate 4 'becomes larger in practical use, the size of the mask 3' tends to be larger, however, as the size of the mask 3 'becomes larger, the mask 3' is bent and deformed more, thereby greatly reducing the exposure accuracy.

Disclosure of Invention

The invention provides an exposure device and method, which aim to solve the problem of poor exposure precision caused by inconsistent deformation of all areas of a flexible substrate in the prior art.

In order to solve the technical problems, the technical scheme of the invention is as follows: an exposure device comprises a flexible substrate, a roll-to-roll transmission system used for transmitting and fixing the flexible substrate, a front exposure system and a back exposure system which are axially symmetrical relative to the flexible substrate, measurement systems respectively corresponding to the front and the back of the flexible substrate, and a main control system respectively connected with the roll-to-roll transmission system, the front exposure system, the back exposure system and the measurement systems.

Further, the roll-to-roll transmission system comprises an unwinding roll and a winding roll which are arranged in bilateral symmetry, one end of the flexible substrate is wound on the unwinding roll, and the other end of the flexible substrate is wound on the winding roll.

Further, the front exposure system comprises a first exposure system and a second exposure system, the back exposure system comprises a third exposure system and a fourth exposure system, wherein the first exposure system and the third exposure system are axially symmetrical relative to the flexible substrate and are respectively fixed on the first supporting component and the second supporting component, the second exposure system and the fourth exposure system are axially symmetrical relative to the flexible substrate and are respectively arranged on the first moving component and the second moving component, and the first moving component and the second moving component are driven to scan and move step by step along the horizontal direction.

Furthermore, the first exposure system and the third exposure system comprise a first light source, a first transmission optical fiber, a first illumination assembly, a shaping assembly, a beam expanding assembly, a scanning galvanometer assembly and a field lens which are sequentially arranged along a light path, wherein light beams emitted by the first light source are incident on the first illumination assembly through the first transmission optical fiber, then are shaped into light spots required for exposure through the shaping assembly, are incident on the scanning galvanometer assembly after being expanded through the beam expanding assembly, and are finally focused on the flexible substrate through the field lens.

Further, the first light source is an LD light source or an LED light source.

Further, the shaping component is a micro-lens array.

Furthermore, the first exposure system and the third exposure system comprise a first light source, a beam expanding component, a shaping component, a scanning galvanometer component and a field lens which are sequentially arranged along a light path; collimated light beams emitted by the first light source enter the shaping assembly to be shaped into required light spots after the beam diameter of the collimated light beams is adjusted by the beam expanding assembly.

Further, the reshaping component is a DOE or ROE component.

Furthermore, first exposure system and third exposure system set gradually first light source, expand the subassembly, plastic subassembly, focusing lens, objective and scanning galvanometer subassembly including following the light path, collimated light beam of first light source output gets into after expanding the subassembly and adjusting the light beam diameter and reshapes into required facula behind the plastic subassembly, and each field of view point position of whole visual field is focused through focusing lens after that, and at last after objective formation of image, through scanning galvanometer subassembly reflection to the focal plane on, expose the flexible basement.

Further, the first light source is a laser light source.

Further, the scanning galvanometer component is a two-dimensional scanning galvanometer.

Furthermore, the light spots are rectangular light spots, and the size of the light spots is consistent with the line width of the exposure pattern.

Furthermore, the second exposure system and the fourth exposure system comprise a second light source, a second transmission optical fiber, a second illumination system, a light homogenizing assembly, a DMD assembly and a projection lens group which are sequentially arranged along a light path, wherein light beams emitted by the second light source enter the second illumination system through the second transmission optical fiber, are homogenized through the light homogenizing assembly, are modulated through the DMD assembly and then are projected through the projection lens group to generate light spots required by exposure.

Further, the second light source is a laser, an LED light source or an LD light source.

Further, the vertical distance between the first exposure system and the flexible substrate is greater than the vertical distance between the second exposure system and the flexible substrate.

Further, the focal plane position of the first exposure system corresponds to the exposure pattern on the front side of the flexible substrate, and the focal plane position of the third exposure system corresponds to the exposure pattern on the back side of the flexible substrate.

Furthermore, the first supporting component, the second supporting component, the first moving component and the second moving component are fixed on the main frame.

Furthermore, the measurement system comprises at least one first measurement system corresponding to the front surface of the flexible substrate and at least one second measurement system corresponding to the back surface of the flexible substrate, and the first measurement system and the second measurement system are used for measuring the horizontal position and the vertical position corresponding to the exposure pattern on the corresponding surface of the flexible substrate.

Furthermore, the first measuring system and the second measuring system are respectively connected with a six-degree-of-freedom motion mechanism.

Furthermore, the main control system is a single chip microcomputer, a PLC or an MCU.

The invention also provides an exposure method, which comprises the following steps:

s1, flattening the flexible substrate on a roll-to-roll transmission system;

s2: measuring the position of a workpiece alignment mark of a second layer of coarse exposure patterns on the front surface of the flexible substrate through a measuring system, and obtaining the position and the exposure attitude of the second layer of coarse exposure patterns through a main control system;

s3: exposing the second layer of coarse exposure graph through a first exposure system according to the position and the exposure posture of the second layer of coarse exposure graph;

s4: measuring the position of a workpiece alignment mark of a second layer of fine exposure patterns on the front surface of the flexible substrate by using a measuring system, and obtaining the position and the exposure posture of the second layer of fine exposure patterns by using a main control system;

s5: exposing the second layer of fine exposure pattern through a second exposure system according to the position and the exposure posture of the second layer of fine exposure pattern;

s6: and repeating the steps S2-S5, and exposing the second layer coarse exposure pattern and the second layer fine exposure pattern on the back surface of the flexible substrate through a third exposure system and a fourth exposure system.

Further, the step S1 specifically includes: and winding one end of the flexible substrate on an unwinding roller, and winding the other end of the flexible substrate on a winding roller.

Furthermore, each layer of exposure pattern on the flexible substrate comprises a plurality of mutually independent exposure patterns.

Further, in step S2, the measurement system is moved above the flexible substrate by the six-degree-of-freedom motion mechanism, the position information of the workpiece alignment mark of the first coarse exposure pattern in the second layer of coarse exposure patterns is measured, and the main control system calculates the position and the exposure attitude of the exposure pattern according to the measured position information.

Further, in the step S3, specifically, according to the position information and the exposure posture of the first coarse exposure pattern, firstly, the posture of the first exposure system is adjusted by the first supporting component, then the main control system starts the first exposure system according to the set process parameter to expose the first coarse exposure pattern, and the first light source is turned off after the exposure is finished.

Further, the step S3 includes measuring position information of a workpiece alignment mark of a second coarse exposure pattern by a measurement system, calculating a position and an exposure posture of the second coarse exposure pattern by the main control system according to the position information, adjusting a posture of a first exposure system by a first supporting component according to the position information and the exposure posture of the second coarse exposure pattern, then starting the first exposure system to expose the second coarse exposure pattern according to a set process parameter by the main control system, and turning off the first light source after the exposure is finished; and repeating the steps until the second layer of coarse exposure pattern is completely exposed.

Further, in the step S4, the measurement system is moved to a position above the flexible substrate by the six-degree-of-freedom movement mechanism, the position information of the workpiece alignment mark of the first fine exposure pattern in the second layer of fine exposure patterns is measured, and the main control system calculates the position and the exposure attitude of the exposure pattern according to the measured position information.

Further, in the step S5, according to the position information and the exposure posture of the first fine exposure pattern, firstly, the posture of the second exposure system is adjusted by the first moving component, then, the main control system starts the second exposure system according to the set process parameter to expose the first fine exposure pattern, and closes the second light source after the exposure is finished.

Further, the step S5 includes measuring position information of a workpiece alignment mark of a second fine exposure pattern by using a measurement system, calculating a position and an exposure posture of the second fine exposure pattern by using the main control system according to the position information, adjusting a posture of the second exposure system by using the first moving component according to the position information and the exposure posture of the second fine exposure pattern, starting the second exposure system by using the main control system according to a set process parameter to expose the second fine exposure pattern, and turning off the second light source after the exposure is finished; and repeating the steps until the second layer of fine exposure pattern is completely exposed.

Further, the exposure areas corresponding to the second layer of coarse exposure pattern and the second layer of fine exposure pattern on the front surface of the flexible substrate have overlapping parts; and the exposure areas corresponding to the second layer of coarse exposure pattern and the second layer of fine exposure pattern on the back surface of the flexible substrate are mutually provided with overlapping parts.

Further, the second layer of fine exposure pattern on the front surface of the flexible substrate is used for correcting the exposure pattern of the second layer of coarse exposure pattern on the front surface of the flexible substrate, and the second layer of fine exposure pattern comprises a frame pattern of the second layer of coarse exposure pattern on the front surface of the flexible substrate and/or an internal pattern of the second layer of coarse exposure pattern on the front surface of the flexible substrate; and the second layer of fine exposure pattern on the back surface of the flexible substrate is used for correcting the exposure pattern of the second layer of coarse exposure pattern on the back surface of the flexible substrate, and comprises a frame pattern of the second layer of coarse exposure pattern on the back surface of the flexible substrate and/or an internal pattern of the second layer of coarse exposure pattern on the back surface of the flexible substrate.

Further, before the step S2, the method further includes measuring a position of a workpiece alignment mark of a first layer of exposure pattern on the front surface of the flexible substrate by a measurement system, and obtaining the position and the exposure posture of the first layer of exposure pattern by a main control system; and exposing the first layer exposure pattern through a second exposure system according to the position and the exposure posture of the first layer exposure pattern.

Further, the obtaining of the position and the exposure posture of the first layer of the exposure pattern specifically comprises: and the measuring system is moved above the flexible substrate through the six-degree-of-freedom movement mechanism, the position information of the workpiece alignment mark of the first exposure pattern in the first layer of exposure patterns is measured, and the main control system calculates the position and the exposure attitude of the exposure pattern according to the measured position information.

Further, the exposure posture comprises information of the exposure pattern in six directions of X, Y, Rz, Z, Rx and Ry.

Further, the exposing the first layer of exposure pattern is specifically that, according to the position information and the exposure posture of the first exposure pattern, the first moving component adjusts the posture of the second exposure system, then the main control system starts the second exposure system according to the set process parameters to expose the first exposure pattern, and closes the second light source after the exposure is finished.

Further, the process parameters include exposure power, exposure spot diameter, and exposure spot scanning speed.

Measuring the position information of a workpiece alignment mark of a second exposure pattern by a measuring system, calculating the position and the exposure posture of the second exposure pattern by the main control system according to the position information, firstly adjusting the posture of the second exposure system by a first moving component according to the position information and the exposure posture of the second exposure pattern, then starting the second exposure system to expose the second exposure pattern according to set process parameters by the main control system, and closing a second light source after the exposure is finished; and repeating the steps until the first layer of exposure pattern is completely exposed.

The device comprises a flexible substrate, a roll-to-roll transmission system for transmitting and fixing the flexible substrate, a front exposure system and a back exposure system which are axially symmetrical relative to the flexible substrate, measurement systems respectively corresponding to the front and the back of the flexible substrate, and a main control system respectively connected with the roll-to-roll transmission system, the front exposure system, the back exposure system and the measurement systems. The front exposure system and the back exposure system are arranged to respectively expose the front side and the back side of the flexible substrate, so that the exposure efficiency is improved, meanwhile, two different exposure systems are respectively arranged in the front exposure system and the back exposure system to realize coarse exposure and correction exposure of different exposure patterns on the flexible substrate, the flexible substrate exposure device is suitable for different deformation quantities, and the exposure precision is greatly improved.

Drawings

FIG. 1 is a block diagram of a prior art proximity exposure system;

FIG. 2 is a schematic view showing the structure of an exposure apparatus in embodiment 1 of the present invention;

FIG. 3 is a schematic view showing the structure of a first exposure system in embodiment 1 of the present invention;

FIG. 4 is a schematic structural view of a second exposure system in embodiment 1 of the present invention;

FIG. 5 is a schematic view showing an exposure pattern of a first layer of a flexible substrate in example 1 of the present invention;

FIG. 6 is a schematic view showing an exposure pattern of a second layer of the flexible substrate in example 1 of the present invention;

FIG. 7 is a schematic view of the imaging of the alignment mark of the workpiece in embodiment 1 of the present invention;

FIG. 8 is a distribution diagram of measurement points for vertical measurement of an exposure pattern in example 1 of the present invention;

FIG. 9 is a flowchart of an exposure method in embodiment 1 of the present invention;

FIG. 10 is a schematic structural view of a first exposure system in embodiment 2 of the present invention;

fig. 11 is a schematic structural view of a first exposure system in embodiment 3 of the present invention.

Shown in FIG. 1: 1', a light source; 2', an illuminating lens group; 3', a mask; 4', a flexible substrate;

shown in FIGS. 2-11: 1. a flexible substrate; 11. exposing the pattern; 111. aligning a workpiece to a mark; 112-mask alignment marks; 21. unwinding rollers; 22. a wind-up roll; 3. a front exposure system; 31. a first exposure system; 311. a first light source; 312. a first transmission optical fiber; 313. a first lighting assembly; 314. a shaping component; 315. a beam expanding assembly; 316. a scanning galvanometer component; 317. a field lens; 318. a focus lens; 319. an objective lens; 32. a second exposure system; 321. a second light source; 322. a second transmission optical fiber; 323. a second illumination system; 324. a light homogenizing assembly; 325. a DMD component; 326. a projection lens group; 4. a back exposure system; 41. a third exposure system; 42. a fourth exposure system; 51. a first measurement system; 52. a second measurement system; 6. a master control system; 71. a first support assembly; 72. a second support assembly; 81. a first motion assembly; 82. a second motion assembly; 9. a main frame.

Detailed Description

The present invention will be described in detail below with reference to the accompanying drawings.

As shown in fig. 2, the present invention provides an exposure apparatus, which includes a flexible substrate 1 and a roll-to-roll transfer system for transferring and fixing the flexible substrate 1, and further includes a front exposure system 3 and a back exposure system 4 which are axially symmetric with respect to the flexible substrate 1, measurement systems respectively corresponding to the front and back of the flexible substrate 1, and a main control system 6 respectively connected to the roll-to-roll transfer system, the front exposure system 3, the back exposure system 4, and the measurement systems. Specifically, the flexible substrate 1 includes multiple layers of exposure patterns, two layers are provided in this embodiment, each layer of exposure pattern includes a plurality of mutually independent exposure patterns 11, each exposure pattern 11 is correspondingly provided with a workpiece alignment mark 111, as shown in fig. 4-5, in this embodiment, each layer of exposure pattern includes 12 mutually independent exposure patterns 11, the left, right, front and rear positions of each exposure pattern 11 are respectively provided with a workpiece alignment mark 111, the measurement system measures the position information of the workpiece alignment mark 111 corresponding to each exposure pattern 11 in different layers of exposure patterns on the front surface or the back surface of the flexible substrate 1, the main control system 6 calculates the position and the exposure attitude of the exposure pattern 11 according to the measured position information, including information in six directions of X, Y, Rz, Z, Rx, Ry corresponding to the exposure pattern 11, and according to the position and the exposure attitude of the exposure pattern 11, the different layer exposure patterns are respectively exposed by the front exposure system 3 or the back exposure system 4. In this embodiment, the front surface corresponds to the upper surface, and the back surface corresponds to the lower surface, but the front surface may correspond to the lower surface and the back surface may correspond to the upper surface.

Preferably, the roll-to-roll transmission system comprises an unwinding roll 21 and a winding roll 22 which are arranged in bilateral symmetry, one end of the flexible substrate 1 is wound on the unwinding roll 21, and the other end of the flexible substrate 1 is wound on the winding roll 22, so that the flexible substrate 1 is in a flattened state.

With reference to fig. 2, the front exposure system 3 includes a first exposure system 31 and a second exposure system 32, the back exposure system 4 includes a third exposure system 41 and a fourth exposure system 42, wherein the first exposure system 31 and the third exposure system 41 are axially symmetric with respect to the flexible substrate 1, and are respectively fixed on a first supporting assembly 71 and a second supporting assembly 72, the second exposure system 32 and the fourth exposure system 42 are axially symmetric with respect to the flexible substrate 1, and are respectively arranged on a first moving assembly 81 and a second moving assembly 82, and are driven by the first moving assembly 81 and the second moving assembly 82 to perform scanning and stepping motions along a horizontal direction so as to adapt to positions and exposure postures of different exposure patterns 11 in different layers of exposure patterns on the front surface or the back surface of the flexible substrate 1, the first exposure system 31 and the third exposure system 41 are respectively stationary with respect to the first supporting assembly 71 and the second supporting assembly 72, the positions and the exposure postures of the different exposure patterns 11 are satisfied by adjusting the postures of the first support member 71 and the second support member 72. Preferably, the vertical distance between the first exposure system 31 and the third exposure system 41 and the flexible substrate 1 is greater than the vertical distance between the second exposure system 32 and the fourth exposure system 42 and the flexible substrate 1. The focal plane position of the first exposure system 31 corresponds to the exposure pattern 11 on the front surface of the flexible substrate 1, and the focal plane position of the third exposure system 32 corresponds to the exposure pattern 11 on the back surface of the flexible substrate 1. Specifically, the focal plane positions of the first exposure system 31 and the third exposure system 41 correspond to the second layer coarse exposure patterns on the front surface and the back surface of the flexible substrate 1 respectively, and expose the second layer coarse exposure patterns respectively, and the second exposure system 32 and the fourth exposure system 42 are used for exposing the first layer exposure patterns and the second layer fine exposure patterns on the front surface and the back surface of the flexible substrate 1 respectively.

As shown in fig. 3, the first exposure system 31 and the third exposure system 41 include a first light source 311, a first transmission optical fiber 312, a first illumination component 313, a shaping component 314, a beam expanding component 315, a scanning galvanometer component 316, and a field lens 317, which are sequentially arranged along an optical path, and a light beam emitted by the first light source 311 is incident on the first illumination component 313 through the first transmission optical fiber 312, then is shaped into a light spot required for exposure through the shaping component 314, then is incident on the scanning galvanometer component 316 after being expanded by the beam expanding component 315, and finally is focused on the flexible substrate 1 through the field lens 317. The first light source 311 is an LD light source or an LED light source; the shaping component 314 is a DOE (Diffractive Optical Element) or ROE component; the scanning galvanometer component 316 is a two-dimensional scanning galvanometer, the light spots are rectangular light spots, and the size of the light spots is consistent with the line width of the exposure pattern 11. It should be noted that the exposure line width is about 2-5mm, the exposure precision is generally several tens of um magnitude, and the exposure field of view can reach 600mm × 600mm, that is, the exposure field of view covers the whole area of the exposure pattern 11.

As shown in fig. 4, the second exposure system 32 and the fourth exposure system 42 include a second light source 321, a second transmission optical fiber 322, a second illumination system 323, a light-homogenizing assembly 324, a DMD assembly 325 and a projection lens group 326, which are sequentially disposed along a light path, wherein a light beam emitted from the second light source 321 enters the second illumination system 323 through the second transmission optical fiber 322, then is homogenized through the light-homogenizing assembly 324, is modulated through a DMD (Digital Micro-Mirror array) assembly 325, and is projected through the projection lens group 326 to generate a light spot required for exposure. The second light source 321 is a laser, an LED light source or an LD light source. It should be noted that the second exposure system 32 and the fourth exposure system 42 are used for performing fine exposure on an exposure pattern, the exposure precision can reach um level, the exposure field is small, generally several mm by several mm, and a small line width pattern can be exposed.

Preferably, the first and second support assemblies 71 and 72 and the first and second motion assemblies 81 and 82 are fixed on the main frame 9, and provide a support function through the main frame 9.

Preferably, the measurement system includes at least one first measurement system 51 corresponding to the front surface of the flexible substrate 1 and at least one second measurement system 52 corresponding to the back surface of the flexible substrate 1, and the first measurement system 51 and the second measurement system 52 are configured to measure the horizontal position and the vertical position of the exposure pattern 11 on the corresponding surface of the flexible substrate 1. Specifically, as shown in fig. 5 to 6, schematic diagrams of a first layer exposure pattern and a second layer exposure pattern are respectively shown, where the second layer exposure pattern includes a second layer fine exposure pattern and a second layer coarse exposure pattern, exposure areas corresponding to the second layer coarse exposure pattern and the second layer fine exposure pattern on the front surface of the flexible substrate 1 have an overlapping portion, the second layer fine exposure pattern on the front surface of the flexible substrate 1 is used for performing exposure pattern correction on the second layer coarse exposure pattern on the front surface of the flexible substrate 1, similarly, the second layer coarse exposure pattern on the back surface of the flexible substrate 1 and the exposure area corresponding to the second layer fine exposure pattern have an overlapping portion, and the second layer fine exposure pattern on the back surface of the flexible substrate 1 is used for performing exposure pattern correction on the second layer coarse exposure pattern on the back surface of the flexible substrate 1. Of course, the exposure images of the front and back sides of the flexible substrate 1 may be the same or different, the flexible substrate 1 may be a flexible film, or any workpiece suitable for the solution of the present invention may be used, and the size may be larger or smaller, and the exposure patterns and the number on the workpiece are not limited to the exposure patterns used in fig. 4-5, but may be any exposure patterns that can be realized by the present invention. In fig. 5-6, each exposure pattern 11 is provided with a workpiece alignment mark 111 on the front, back, left, and right sides, and the first measurement system 51 and the second measurement system 52 obtain the horizontal position of the corresponding exposure pattern 11 by detecting the positions of the four workpiece alignment marks 111, as shown in fig. 7, the horizontal positions are the imaged patterns of the workpiece alignment mark 111 and the mask alignment mark 112, although the workpiece alignment mark 111 and the mask alignment mark 112 may take other forms, and the spatial position between the two is ensured to be imaged in the field of view of the measurement system at the same time; as shown in fig. 8, the measurement of the vertical position of the exposure pattern 11 by the first measurement system 51 and the second measurement system 52 is mainly performed by a three-point measurement method, and the three measurement points are respectively located on two opposite sides of the exposure pattern 11. Preferably, the first measurement system 51 and the second measurement system 52 are respectively connected to a six-degree-of-freedom motion mechanism, and are driven by the six-degree-of-freedom motion mechanism to perform six-degree-of-freedom motion, so as to measure the position and the exposure attitude of the exposure pattern 11.

Preferably, the main control system 6 is a single chip microcomputer, a PLC or an MCU.

The present invention also provides an exposure method, as shown in fig. 9, including the steps of:

s1, flattening the flexible substrate 1 on a roll-to-roll transmission system; specifically, one end of the flexible substrate 1 is wound on an unwinding roller 21, and the other end of the flexible substrate 1 is wound on a winding roller 22, so as to achieve a flattened state, and each layer of exposure pattern on the flexible substrate 1 comprises a plurality of mutually independent exposure patterns 11. Referring to fig. 4, in the present embodiment, the flexible substrate 1 includes two layers of exposure patterns, each layer of exposure pattern includes 12 independent exposure patterns 11, and each exposure pattern 11 has a workpiece alignment mark 111 at a left, a right, a front, and a rear position.

S2, measuring the position of the workpiece alignment mark 111 of the first layer of exposure pattern on the front surface of the flexible substrate 1 through a measuring system, and obtaining the position and the exposure posture of the first layer of exposure pattern through the main control system 6; specifically, the measurement system is moved above the flexible substrate 1 through a six-degree-of-freedom movement mechanism, wherein the measurement system corresponding to the front surface of the flexible substrate 1 is a first measurement system 51, the position information of the workpiece alignment mark 111 of the first exposure pattern 11 in the first layer of exposure patterns is measured, the main control system 6 calculates the position and the exposure attitude of the exposure pattern 11 according to the measured position information, the position of the exposure pattern 11 comprises a horizontal position and a vertical position, and the exposure attitude comprises information of the exposure pattern 11 in six directions of X, Y, Rz, Z, Rx and Ry. In this case, the horizontal position of the exposure pattern 11 is obtained by measuring the position of the workpiece alignment mark 111, and the vertical position is measured by a three-point measurement method, as shown in fig. 8, which are located on two opposite sides of the exposure pattern 11.

S3: exposing the first layer exposure pattern through a second exposure system 32 according to the position and the exposure posture of the first layer exposure pattern; specifically, according to the position information and the exposure posture of the first exposure pattern 11, firstly, the first motion component 81 adjusts the posture of the second exposure system 32, then the main control system 6 starts the second exposure system 32 to expose the first exposure pattern 11 according to the set process parameters, the process parameters include exposure power, exposure spot diameter, exposure spot scanning speed, and further include the position information of the workpiece alignment mark 111 of the second exposure pattern 11 measured by the measurement system, wherein the measurement system corresponding to the front surface of the flexible substrate 1 is the first measurement system 51, the main control system 6 calculates the position and the exposure posture of the second exposure pattern 11 according to the position information, and according to the position information and the exposure posture of the second exposure pattern 11, firstly, the posture of the second exposure system 32 is adjusted by the first motion component 81, then the main control system 6 starts the second exposure system 32 to expose the second exposure pattern 11 according to the set process parameters; the above steps are repeated until all the first layer exposure patterns are exposed, as shown in fig. 5, in this embodiment, the first layer exposure patterns include 12 mutually independent exposure patterns 11, and the second exposure system 32 sequentially exposes the exposure patterns 11 according to the arrow direction in fig. 5, where each exposure area is a. It should be noted that, during the exposure process of the previous exposure pattern 11, the position information of the workpiece alignment mark 111 of the next exposure pattern 11 is measured at the same time, so as to save time and improve work efficiency.

S4: measuring 5 the position of a workpiece alignment mark 111 of a second layer of coarse exposure patterns on the front surface of the flexible substrate 1 by using a measuring system, wherein the measuring system corresponding to the front surface of the flexible substrate 1 is a first measuring system 51, and obtaining the position and the exposure posture of the second layer of coarse exposure patterns by using a main control system 6; specifically, the measurement system is moved above the flexible substrate 1 through a six-degree-of-freedom motion mechanism to measure the position information of the workpiece alignment mark 111 of the first coarse exposure pattern in the second layer of coarse exposure patterns, the main control system 6 calculates the position and the exposure attitude of the coarse exposure patterns according to the measured position information, as shown in fig. 6, in this embodiment, the second layer of coarse exposure patterns comprises the coarse exposure patterns which are independent from each other, the workpiece alignment marks 111 are arranged on the front, the back, the left and the right of each coarse exposure pattern, the position of each coarse exposure pattern comprises a horizontal position and a vertical position, and the exposure attitude comprises the information of the exposure pattern 11 in six directions of X, Y, Rz, Z, Rx and Ry. The horizontal position of the rough exposure pattern is obtained by measuring the position of the workpiece alignment mark 111, and the vertical position is measured by a three-point measurement method, wherein the three measurement points are respectively located on two opposite sides of the rough exposure pattern.

S5: according to the position and the exposure posture of the second layer of coarse exposure graph, firstly, exposing the second layer of coarse exposure graph through a first exposure system 31; according to the position information and the exposure posture of the first rough exposure pattern, firstly, the posture of the first exposure system 31 is adjusted by the first supporting component 71, then, the main control system 6 starts the first exposure system 31 to expose the first coarse exposure pattern according to the set process parameters, and further measures the position information of the workpiece alignment mark 111 of the second coarse exposure pattern through the measurement system, the main control system 6 calculates the position and exposure attitude of the second rough exposure pattern based on the position information, according to the position information and the exposure posture of the second rough exposure pattern, firstly, the posture of the first exposure system 31 is adjusted by the first supporting component 71, then the main control system 6 starts the first exposure system 31 to expose the second rough exposure pattern according to the set process parameters; the above steps are repeated until the second layer of coarse exposure patterns are completely exposed, that is, the first exposure system 31 sequentially exposes 12 coarse exposure patterns in the direction of the arrow in fig. 6. It should be noted that, during the exposure process of the previous coarse exposure pattern, the position information of the workpiece alignment mark 111 of the next coarse exposure pattern is measured at the same time, so as to save time and improve work efficiency.

S6: measuring the position of a workpiece alignment mark 111 of a second layer of fine exposure patterns 12 on the front surface of the flexible substrate 1 through a measuring system, and obtaining the position and the exposure posture of the second layer of fine exposure patterns through a main control system 6; specifically, the measurement system is moved above the flexible substrate by the six-degree-of-freedom movement mechanism, the position information of the workpiece alignment mark 111 of the first fine exposure pattern in the second layer of fine exposure patterns is measured, and the main control system 6 calculates the position and the exposure attitude of the exposure pattern 11 according to the measured position information.

S7: according to the position and the exposure posture of the second layer of fine exposure pattern, firstly, exposing the second layer of fine exposure pattern through a second exposure system 32; according to the position information and the exposure posture of the first fine exposure pattern, firstly, the posture of the second exposure system 32 is adjusted through the first moving component 81, then, the main control system 6 starts the second exposure system 32 to expose the first fine exposure pattern according to the set process parameters, and further includes measuring the position information of the workpiece alignment mark 111 of the second fine exposure pattern by the measuring system, the main control system 6 calculates the position and the exposure posture of the second fine exposure pattern according to the position information, according to the position information and the exposure posture of the second fine exposure pattern, firstly, the posture of the second exposure system 32 is adjusted through the first moving component 81, then the main control system 6 starts the second exposure system 32 to expose the second fine exposure pattern according to the set process parameters; the steps are repeated until the second layer of fine exposure pattern is completely exposed, and the second exposure system 32 is used for correcting exposure, so that the method is better suitable for different deformation quantities, and the exposure precision is greatly improved. It should be noted that, during the exposure process of the previous fine exposure pattern, the position information of the workpiece alignment mark 111 of the next fine exposure pattern is measured at the same time, so as to save time and improve work efficiency.

As shown in fig. 6, the exposure areas corresponding to the second layer of coarse exposure patterns and the second layer of fine exposure patterns on the front surface of the flexible substrate 1 have overlapping portions, and the second layer of fine exposure patterns on the front surface of the flexible substrate 1 is used for performing exposure pattern correction on the second layer of coarse exposure patterns on the front surface of the flexible substrate 1, and includes a frame pattern of the second layer of coarse exposure patterns on the front surface of the flexible substrate 1 and/or an internal pattern of the second layer of coarse exposure patterns on the front surface of the flexible substrate 1.

S8: and repeating the steps S2-S7, and exposing the first layer of exposure pattern, the second layer of coarse exposure pattern and the second layer of fine exposure pattern on the back surface of the flexible substrate 1 through a third exposure system and a fourth exposure system. The first layer of exposure pattern on the back surface of the flexible substrate 1 is exposed by the fourth exposure system 42, then the second layer of coarse exposure pattern and the second layer of fine exposure pattern on the back surface of the flexible substrate 1 are exposed by the third exposure system 41 and the fourth exposure system, respectively, and the measurement system corresponding to the back surface of the flexible substrate 1 is the second measurement system 52, the support component corresponding to the third exposure system 41 is the second support component 72, and the moving component corresponding to the fourth exposure system 42 is the second moving component 82. The second layer of coarse exposure pattern on the back surface of the flexible substrate 1 and the exposure area corresponding to the second layer of fine exposure pattern have overlapping portions, and the second layer of fine exposure pattern on the back surface of the flexible substrate 1 is used for carrying out exposure pattern correction on the second layer of coarse exposure pattern on the back surface of the flexible substrate 1 and comprises a frame pattern of the second layer of coarse exposure pattern on the back surface of the flexible substrate 1 and/or an internal pattern of the second layer of coarse exposure pattern on the back surface of the flexible substrate 1. In this embodiment, the exposure patterns of the front surface and the back surface of the flexible substrate 1 are the same, and the exposure steps for the front surface and the back surface are also completely the same, so that the details are not repeated herein.

Example 2

As shown in fig. 10, unlike embodiment 1, in this embodiment, the first exposure system 31 and the third exposure system 41 include a first light source 311, a beam expanding assembly 315, a shaping assembly 314, a scanning galvanometer assembly 316, and a field lens 317, which are sequentially arranged along an optical path; the first light source 311 is a laser light source, and the collimated light beam emitted by the first light source is adjusted in beam diameter by the beam expanding assembly 315, and then enters the shaping assembly 314 to be shaped into a required light spot shape, which may be a rectangular light spot, or may be in other shapes. The shaping element 314 is a DOE (Diffractive Optical Elements) or a ROE (refractive Optical Elements).

Example 3

As shown in fig. 11, different from the foregoing embodiment 1-2, the first exposure system 31 and the third exposure system 41 include a first light source 311, a beam expanding assembly 315, a shaping assembly 314, a focusing lens 318, an objective lens 319, and a scanning galvanometer assembly 316 sequentially arranged along an optical path, where the first light source 311 is a laser light source, outputs a collimated light beam, adjusts a beam diameter through the beam expanding assembly 315, enters the shaping assembly 314, and is shaped into a desired spot shape, then focuses on each position of a field of view through the focusing lens 318, so that the light beam at each field of view is focused on a plane, and finally, after being imaged through the objective lens 319, is reflected to a focal plane through the scanning galvanometer assembly 316, so as to expose the flexible substrate 1. The spot shape may be a rectangular spot, or may have other shapes.

In summary, the exposure apparatus and method provided by the present invention includes a flexible substrate 1, a roll-to-roll transmission system for transmitting and fixing the flexible substrate 1, a front exposure system and a back exposure system that are axially symmetric with respect to the flexible substrate 1, measurement systems corresponding to the front and back of the flexible substrate 1, respectively, and a main control system 6 connected to the roll-to-roll transmission system, the front exposure system 3, the back exposure system 4, and the measurement systems, respectively. The front exposure system 3 and the back exposure system 4 are arranged to respectively expose the front and the back of the flexible substrate 1, so that the exposure efficiency is improved, meanwhile, different exposure systems are respectively arranged in the front exposure system 3 and the back exposure system 4 to expose various patterns, the flexible substrate exposure device is suitable for different deformation, and the exposure precision is greatly improved.

Although the embodiments of the present invention have been described in the specification, these embodiments are merely provided as a hint, and should not limit the scope of the present invention. Various omissions, substitutions, and changes may be made without departing from the spirit of the invention and are intended to be within the scope of the invention.

Claims (36)

1. An exposure device comprises a flexible substrate and a roll-to-roll transmission system for transmitting and fixing the flexible substrate, and is characterized by further comprising a front exposure system and a back exposure system which are axially symmetrical relative to the flexible substrate, measurement systems respectively corresponding to the front and the back of the flexible substrate, and a main control system respectively connected with the roll-to-roll transmission system, the front exposure system, the back exposure system and the measurement systems;
the front exposure system comprises a first exposure system and a second exposure system, the back exposure system comprises a third exposure system and a fourth exposure system, the first exposure system and the third exposure system are axially symmetrical relative to the flexible substrate, the first exposure system and the third exposure system are respectively fixed on a first supporting component and a second supporting component, the second exposure system and the fourth exposure system are axially symmetrical relative to the flexible substrate, the second exposure system and the fourth exposure system are respectively arranged on a first moving component and a second moving component, and scanning and stepping movement are carried out in the horizontal direction under the driving of the first moving component and the second moving component;
the front and the back of the flexible substrate both comprise a second layer fine exposure graph and a second layer coarse exposure graph, the second layer fine exposure graph is used for correcting the exposure graph of the front layer coarse exposure graph, the second layer fine exposure graph is used for correcting the exposure graph of the back layer coarse exposure graph, the first exposure system is used for exposing the front second layer coarse exposure graph, the second exposure system is used for exposing the front second layer fine exposure graph, the third exposure system is used for exposing the back second layer coarse exposure graph, and the fourth exposure system is used for exposing the back second layer fine exposure graph.
2. The exposure apparatus according to claim 1, wherein the roll-to-roll conveying system includes an unwinding roll and a winding roll which are arranged bilaterally symmetrically, one end of the flexible substrate is wound around the unwinding roll, and the other end is wound around the winding roll.
3. The exposure apparatus according to claim 1, wherein the first exposure system and the third exposure system include a first light source, a first transmission fiber, a first illumination assembly, a shaping assembly, a beam expanding assembly, a scanning galvanometer assembly, and a field lens, which are sequentially disposed along a light path, and a light beam emitted from the first light source is incident on the first illumination assembly through the first transmission fiber, then is shaped into a light spot required for exposure through the shaping assembly, then is incident on the scanning galvanometer assembly after being expanded by the beam expanding assembly, and finally is focused on the flexible substrate through the field lens.
4. The exposure apparatus according to claim 3, wherein the first light source is an LD light source or an LED light source.
5. The exposure apparatus according to claim 3, wherein the shaping member is a microlens array.
6. The exposure apparatus according to claim 1, wherein the first exposure system and the third exposure system comprise a first light source, a beam expanding assembly, a shaping assembly, a scanning galvanometer assembly, and a field lens, which are arranged in sequence along an optical path; collimated light beams emitted by the first light source enter the shaping assembly to be shaped into required light spots after the beam diameter of the collimated light beams is adjusted by the beam expanding assembly.
7. The exposure apparatus of claim 6, wherein the shaping component is a DOE or ROE component.
8. The exposure apparatus according to claim 1, wherein the first exposure system and the third exposure system include a first light source, a beam expanding assembly, a shaping assembly, a focusing lens, an objective lens, and a scanning galvanometer assembly, which are sequentially disposed along the light path, and the first light source outputs a collimated light beam, the collimated light beam is adjusted in beam diameter by the beam expanding assembly, enters the shaping assembly, is shaped into a desired light spot, is focused at each position of a field of view by the focusing lens, and is finally imaged by the objective lens, reflected onto a focal plane by the scanning galvanometer assembly, and exposes the flexible substrate.
9. The exposure apparatus according to claim 6 or 8, wherein the first light source is a laser light source.
10. The exposure apparatus according to claim 3, 6 or 8, wherein the scanning galvanometer component is a two-dimensional scanning galvanometer.
11. The exposure apparatus according to claim 3, 6 or 8, wherein the light spot is a rectangular light spot, and a light spot size is in accordance with a line width of the exposure pattern.
12. The exposure apparatus according to claim 1, wherein the second exposure system and the fourth exposure system comprise a second light source, a second transmission optical fiber, a second illumination system, a light homogenizing assembly, a DMD assembly, and a projection lens assembly, which are sequentially disposed along the light path, and the light beam emitted from the second light source enters the second illumination system through the second transmission optical fiber, is homogenized by the light homogenizing assembly, is modulated by the DMD assembly, and is projected by the projection lens assembly to generate the light spot required for exposure.
13. The exposure apparatus according to claim 12, wherein the second light source is a laser, an LED light source, or an LD light source.
14. The exposure apparatus according to claim 1, wherein vertical distances between the first exposure system and the third exposure system and the flexible substrate are larger than vertical distances between the second exposure system and the fourth exposure system and the flexible substrate.
15. The exposure apparatus according to claim 1, wherein a focal plane position of the first exposure system corresponds to an exposure pattern of the front surface of the flexible substrate, and a focal plane position of the third exposure system corresponds to an exposure pattern of the back surface of the flexible substrate.
16. The exposure apparatus according to claim 1, wherein the first and second support members and the first and second moving members are fixed to a main frame.
17. The exposure apparatus according to claim 1, wherein the measurement system comprises at least one first measurement system corresponding to the front surface of the flexible substrate and at least one second measurement system corresponding to the back surface of the flexible substrate, and the first measurement system and the second measurement system are configured to measure a horizontal position and a vertical position corresponding to an exposure pattern on the corresponding surface of the flexible substrate.
18. The exposure apparatus according to claim 17, wherein the first measurement system and the second measurement system are each connected to a six-degree-of-freedom motion mechanism.
19. The exposure apparatus according to claim 1, wherein the main control system is a single chip microcomputer, a PLC, or an MCU.
20. An exposure method, comprising the steps of:
s1, flattening the flexible substrate on a roll-to-roll transmission system;
s2: measuring the position of a workpiece alignment mark of a second layer of coarse exposure patterns on the front surface of the flexible substrate through a measuring system, and obtaining the position and the exposure attitude of the second layer of coarse exposure patterns through a main control system;
s3: exposing the second layer of coarse exposure graph through a first exposure system according to the position and the exposure posture of the second layer of coarse exposure graph;
s4: measuring the position of a workpiece alignment mark of a second layer of fine exposure patterns on the front surface of the flexible substrate by using a measuring system, and obtaining the position and the exposure posture of the second layer of fine exposure patterns by using a main control system;
s5: exposing the second layer of fine exposure pattern through a second exposure system according to the position and the exposure posture of the second layer of fine exposure pattern;
s6: repeating the steps S2-S5, exposing the second layer of coarse exposure pattern on the back surface of the flexible substrate through a third exposure system, and exposing the second layer of fine exposure pattern on the back surface of the flexible substrate through a fourth exposure system;
and the second layer fine exposure pattern on the back surface is used for correcting the exposure pattern of the second layer coarse exposure pattern on the back surface.
21. The exposure method according to claim 20, wherein the step S1 specifically includes: and winding one end of the flexible substrate on an unwinding roller, and winding the other end of the flexible substrate on a winding roller.
22. The exposure method according to claim 20, wherein each layer of the exposure pattern on the flexible substrate comprises a plurality of independent exposure patterns.
23. The exposure method according to claim 22, wherein the step S2 is specifically configured to move the measurement system over the flexible substrate by a six-degree-of-freedom motion mechanism, measure the position information of the workpiece alignment mark of the first coarse exposure pattern in the second layer coarse exposure pattern, and the main control system calculates the position and exposure attitude of the exposure pattern based on the measured position information.
24. The exposure method according to claim 23, wherein in step S3, according to the position information and the exposure posture of the first coarse exposure pattern, firstly, the posture of a first exposure system is adjusted by a first supporting component, then the main control system starts the first exposure system to expose the first coarse exposure pattern according to the set process parameters, and turns off the first light source after the exposure is finished.
25. The exposure method according to claim 24, wherein the step S3 further comprises measuring position information of a workpiece alignment mark of a second coarse exposure pattern by a measurement system, the main control system calculating a position and an exposure posture of the second coarse exposure pattern based on the position information, first adjusting a posture of a first exposure system by a first support member based on the position information and the exposure posture of the second coarse exposure pattern, then the main control system turning on the first exposure system to expose the second coarse exposure pattern based on set process parameters, and turning off the first light source after the exposure is finished; and repeating the steps until the second layer of coarse exposure pattern is completely exposed.
26. The exposure method according to claim 22, wherein the step S4 is specifically configured to move the measurement system over the flexible substrate by a six-degree-of-freedom motion mechanism, measure the position information of the workpiece alignment mark of the first fine exposure pattern in the second layer of fine exposure patterns, and the main control system calculates the position and the exposure posture of the exposure pattern based on the measured position information.
27. The exposure method according to claim 26, wherein the step S5 is specifically that, according to the position information and the exposure posture of the first fine exposure pattern, firstly, the posture of a second exposure system is adjusted by a first moving component, then the main control system starts the second exposure system to expose the first fine exposure pattern according to the set process parameters, and closes a second light source after the exposure is finished.
28. The exposure method according to claim 27, wherein the step S5 further comprises measuring position information of a workpiece alignment mark of a second fine exposure pattern by a measurement system, the main control system calculating a position and an exposure posture of the second fine exposure pattern according to the position information, first adjusting a posture of the second exposure system by the first moving device according to the position information and the exposure posture of the second fine exposure pattern, then the main control system turning on the second exposure system to expose the second fine exposure pattern according to the set process parameters, and turning off the second light source after the exposure is finished; and repeating the steps until the second layer of fine exposure pattern is completely exposed.
29. The exposure method according to claim 20, wherein the exposure regions corresponding to the second layer of the coarse exposure pattern and the second layer of the fine exposure pattern on the front surface of the flexible substrate have an overlapping portion with each other; and the exposure areas corresponding to the second layer of coarse exposure pattern and the second layer of fine exposure pattern on the back surface of the flexible substrate are mutually provided with overlapping parts.
30. The exposure method according to claim 29, wherein the second layer fine exposure pattern on the front surface of the flexible substrate is used for performing exposure pattern correction on the second layer coarse exposure pattern on the front surface of the flexible substrate, and comprises a frame pattern of the second layer coarse exposure pattern on the front surface of the flexible substrate and/or an internal pattern of the second layer coarse exposure pattern on the front surface of the flexible substrate; and the second layer of fine exposure pattern on the back surface of the flexible substrate is used for correcting the exposure pattern of the second layer of coarse exposure pattern on the back surface of the flexible substrate, and comprises a frame pattern of the second layer of coarse exposure pattern on the back surface of the flexible substrate and/or an internal pattern of the second layer of coarse exposure pattern on the back surface of the flexible substrate.
31. The exposure method according to claim 20, wherein the step S2 is preceded by measuring a position of a workpiece alignment mark of the first layer exposure pattern on the front surface of the flexible substrate by a measurement system, obtaining the position and the exposure posture of the first layer exposure pattern by a main control system, and exposing the first layer exposure pattern by a second exposure system according to the position and the exposure posture of the first layer exposure pattern.
32. The exposure method according to claim 31, wherein the obtaining of the position and the exposure posture of the first layer exposure pattern is specifically: and the measuring system is moved above the flexible substrate through the six-degree-of-freedom movement mechanism, the position information of the workpiece alignment mark of the first exposure pattern in the first layer of exposure patterns is measured, and the main control system calculates the position and the exposure attitude of the exposure pattern according to the measured position information.
33. The exposure method according to claim 32, wherein the exposure posture includes information on six directions of the exposure pattern, X, Y, Rz, Z, Rx, Ry.
34. The exposure method according to claim 31, wherein the exposing the first layer of the exposure pattern is performed by adjusting a posture of a second exposure system by a first moving component according to the position information and the exposure posture of the first exposure pattern, then the main control system starts the second exposure system to expose the first exposure pattern according to the set process parameters, and turns off the second light source after the exposure is finished.
35. The exposure method according to claim 34, wherein the process parameters include exposure power, exposure spot diameter, and exposure spot scanning speed.
36. The exposure method according to claim 34, wherein the step S2 is preceded by measuring position information of a workpiece alignment mark of a second exposure pattern in the first layer of exposure patterns by a measurement system, the main control system calculating a position and an exposure posture of the second exposure pattern based on the position information, adjusting a posture of the second exposure system by the first moving device based on the position information and the exposure posture of the second exposure pattern, turning on the second exposure system to expose the second exposure pattern based on the set process parameters, and turning off the second light source after the exposure is finished; and repeating the steps until the first layer of exposure pattern is completely exposed.
CN201610617029.3A 2016-07-29 2016-07-29 Exposure device and method CN107664924B (en)

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CN109856925B (en) * 2019-03-22 2020-01-24 上海微电子装备(集团)股份有限公司 Double-workpiece-table flexible tape exposure device and exposure method
CN109884860A (en) * 2019-03-22 2019-06-14 上海微电子装备(集团)股份有限公司 Multistation flexibility winding exposure device and exposure method

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