CN107540924A - A kind of high glaze puncture-resistant linear polyethylene construct blow-molded - Google Patents
A kind of high glaze puncture-resistant linear polyethylene construct blow-molded Download PDFInfo
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Abstract
The invention discloses a kind of high glaze puncture-resistant linear polyethylene construct blow-molded, mainly it is made up of the raw material of following mass percent:Ethylene butene polyethylene copolymer base resin 99.45~99.66%, nanometer EVA compound anti-reflections agent 0.25~0.35%, main anti-oxidant 0.03~0.05%, auxiliary antioxidant 0.06~0.10%, slipping agent 0.00~0.05%;The ethylene butene polyethylene copolymer base resin is using ethylene gas, butene gas as primary raw material, it is placed in reaction vessel, the synthesizing ethylene butene linear polyethylene base resin in the presence of activated catalyst, wherein, temperature of reactor is 82~92 DEG C, 2200~2500MPa of polymerization pressure, resin melt flowing speed is 0.8~1.2g/10min, and density is 0.916~0.920kg/m3.The high glaze puncture-resistant linear polyethylene construct blow-molded has the characteristics that excellent glossiness and higher paracentesis resistance energy, suitable for all kinds of electronic protective films, metal surface protection film, packaging for foodstuff.
Description
Technical field
The present invention relates to blow moulded polyethyene material, and in particular to a kind of high glaze puncture-resistant linear polyethylene construct blow-molded.
Background technology
LLDPE (referred to as LLDPE) is nontoxic, tasteless, odorless milky white granules, density 0.918
~0.935g/cm3.It has higher softening temperature and melting temperature compared with LDPE, there is that intensity is big, good toughness, rigidity
Greatly, heat-resisting, the advantages that cold resistance is good, also with the property such as good environmental stress crack resistance, impact strength, tear-resistant intensity
Energy.And can acid and alkali resistance, organic solvent etc., be widely used in make agricultural film, packing film, laminated film, tubing, hollow container,
Electric wire, cable insulation etc..
Due to being restricted by molecular structure, LLDPE strands are short branch shape structure, have higher crystallinity, its is saturating
Lightness is not relatively high always.In general, the turbidity of linear polyethylene film can be improved by adding common opening agent, and be added common
Transparent agent influences the Kekelé structure count of film again, and the raising of the Kekelé structure count and the transparency of LLDPE films mutually restricts.
During the downstream application of reality, the life of some electronic product pad pastings, protection film for automobile, metal surface protection film
Production enterprise proposes higher and higher requirement for the transparent performance of linear polyethylene, the thin-film material energy with high glaze performance
It is applied in broader field.Simultaneously as the particularity of diaphragm class product, for the paracentesis resistance of thin-film material
There can be higher requirement, common linear polyethylene product is difficult to have high-luster and paracentesis resistance concurrently.
The content of the invention
It is an object of the invention to provide a kind of high glaze puncture-resistant linear polyethylene construct blow-molded, the high glaze puncture-resistant line
Property blow moulded polyethyene material has the characteristics that excellent glossiness and higher paracentesis resistance energy, suitable for all kinds of Electronic Protections
Film, metal surface protection film, packaging for foodstuff.
The purpose of the present invention is achieved by the following technical solution:A kind of high glaze puncture-resistant linear polyethylene blowing
Material, mainly it is made up of the raw material of following mass percent:
Ethylene butene polyethylene copolymer base resin 99.45~99.66%
Nanometer EVA compound anti-reflections agent 0.25~0.35%
Main anti-oxidant 0.03~0.05%
Auxiliary antioxidant 0.06~0.10%
Slipping agent 0.00~0.05%.
The ethylene butene polyethylene copolymer base resin is placed on using ethylene gas, butene gas as primary raw material
In reaction vessel, the synthesizing ethylene butene linear polyethylene base resin in the presence of activated catalyst, wherein, reaction
Device temperature is 82~92 DEG C, under 2200~2500MPa of polymerization pressure.Linear polyethylene base resin prepared by the present invention, this is poly-
Ethylene base resin has relatively low density, relatively low melting means, suitable for film blow blowing.
The physical property for the ethylene butene polyethylene copolymer base resin that the present invention of table 1 prepares
Influence of the co-monomer content for transparent agent, pass through 1- butylene/ethene in reactor in telo merization
Inlet amount is more transparent so as to obtain than adjusting the 1- butene comonomer contents of ethylene butene linear polyethylene base resin
Base resin.Butene content in LLDPE comonomers has important influence for the transparency of LLDPE films, and one
As for, the increase and can of co-monomer content improves LLDPE tensile strength and paracentesis resistance energy, and the present invention passes through regulation
Co-monomer content, LLDPE transparency and paracentesis resistance energy can be effectively improved.The use of ethene of the present invention and 1- butylene
It is 1000kg (1 ton of) ﹕ 90kg~130kg to measure ratio;The dosage of 1- butylene is 1~2 times of catalyst amount.
Catalyst of the present invention is preferably the dry powder catalyst SCG-1 of Shanghai Lide Catalyst Co., Ltd's production
(II) C-3404, co-catalyst are liquid triethyl aluminum.
EVA, odium stearate, neopelex, nucleator and hydration are included in the nanometer EVA compound anti-reflection agent
Silicic acid magnesium powder, wherein, hard resin acid sodium ﹕ neopelex=90 of the EVA ﹕~﹕ 1~5 of 98 ﹕ 1~5, into core agent ﹕ EVA ﹕ water
The ﹕ 3~5 of magnesium silicate=12~15 ﹕ 10~15 are closed, above ratio is mass ratio.
Specifically, the preparation method Shi ﹕ of the nanometer EVA compound anti-reflection agent are newborn by the EVA that VA contents are 40%~60%
Liquid 5kg is placed in container, and odium stearate and neopelex, EVA ﹕ Ying resin acid Na ﹕ dodecyls are added dropwise under agitation
The ﹕ 1~5 of benzene sulfonic acid sodium salt=90~98 ﹕ 1~5, then emulsion and nucleator aqueous suspension and silicate hydrate magnesium powder (Allihn reaches) are outstanding
Solution swim by the dry weight Pei Bi ﹕ Cheng He Ji ﹕ EVA ﹕ hydrated magnesium silicate=12~﹕ 3~5 of 15 ﹕ 10~15 mixing, stirs, so
It is spray-dried afterwards using spray dryer, the inlet temperature of spray dryer is 130~180 DEG C, outlet temperature is 40~
70 DEG C, collected in cyclone separator and obtain a nanometer EVA compound anti-reflection agent after drying, its particle diameter is 50nm~150nm.
The EVA emulsions are preferably Beijing DongFang petroleum chemical engineering Co., Ltd. Organic Chemical Plant, Pai ﹕ BJ- 707EVA bullets
Property precursor emulsion.
The nucleator is HPN-20E.
Primary antioxidant of the present invention is phenolic antioxidant, preferably octadecyl 3- (3,5- di-t-butyl -4- oxybenzenes
Base) propionic ester.Auxiliary antioxidant is phosphate antioxidant, preferably three (2,4- di-tert-butyl-phenyl) phosphite esters.It is described refreshing
Lubrication prescription is erucyl amide, preferably the big erucyl amide of Britain's standing grain.
The present invention has advantages below compared with prior art:
(1) present invention is by 1- butene comonomer contents in ethylene-butylene copolymer in telo merization, to film
The transparency of material is effectively improved.
(2) present invention is by 1- butene comonomer contents in ethylene-butylene copolymer in telo merization, to film
The puncture resistance of material is effectively improved.
(3) by the present invention in that with nanometer EVA, silicate hydrate magnesium powder convergent improvement nucleator, while antioxidant, auxiliary is adjusted
The formula of aid anti-oxidants, obtain the high glaze puncture-resistant linear polyethylene with excellent glossiness and higher paracentesis resistance energy
Film blow blowing material.The film of same transparency is obtained, material cost provided by the present invention relatively uses pure anti-reflection nucleating agent
Linear polyethylene resin cost about reduce by 20%.Good light is had concurrently using the film of linear polyethylene material blowing simultaneously
Pool property and Kekelé structure count, paracentesis resistance can significantly improve, and have wider application field.
Embodiment
Embodiment 1
The raw material of ethylene butene copolymerization of ethylene basis resin:
The raw material for producing base resin is following material:
1) polymer grade ethylene inlet amount 16t/h
Ethene:The C of purity >=99.20%2H2≤5×10-6 CO≤1×10-6
O2≤2×10-6 H2O≤1×10-6 COS≤0.02×10-6。
2) catalyst:Dry powder catalyst SCG-1 (II) C-3404 additions 807kg/h
Co-catalyst:Liquid triethyl aluminum adds a small amount of
3) 1- butylene addition 1601kg/h
1- butylene:The H of purity >=99.0%2O≤100×10-6 CO≤5×10-6
CO2≤10×10-6 O2≤1×10-6 CH3OH≤10×10-6
The preparation method of ethylene butene copolymerization of ethylene basis resin:
Feed ethylene, 1- butylene are placed in reaction vessel, add activated catalyst, regulation temperature of reactor is 82
DEG C, under 2200MPa polymerization pressures, produce to obtain ethylene butene copolymerization linear polyethylene base resin, ethylene feed amount 16t/h,
Dry powder catalyst SCG-1 (II) C-3404 additions 807kg/h, 1- butylene addition 1601kg/h, so as to obtain melt flows
Speed is 0.8~1.2g/10min, and density is 0.916~0.920kg/m3Ethylene butene polyethylene copolymer base resin.
The nanometer preparation method of EVA compound anti-reflection agent and the proportioning of each component are:
(it is preferably Beijing Orient petrochemical industry Co., Ltd organic chemical industry by the EVA emulsions that VA contents are 40%~60%
Factory, the trade mark:BJ-707EVA elastomer emulsions) 5kg is placed in container, odium stearate and detergent alkylate sulphur are added dropwise under agitation
Sour sodium, respective proportioning is EVA ﹕ Ying resin acid Na ﹕ neopelexes=﹕ 1 of 98 ﹕ 1, with HPN-20E nucleators
(Milliken) aqueous suspension and silicate hydrate magnesium powder (Allihn reaches) aqueous suspension, are mixed by certain proportioning of respective dry weight
Close, respective proportioning is HPN- 20E ﹕ EVA ﹕ hydrated magnesium silicates=﹕ 3 of 12 ﹕ 10), 2 hours are stirred, then using spray drying
The inlet temperature that device carries out Spray Drying Spray drier is 170~180 DEG C, and outlet temperature is 60~70 DEG C, in cyclonic separation
Collected in device and obtain a nanometer EVA compound anti-reflection agent after drying, its particle diameter is 50nm~300nm.
The raw material (parts by weight) of high glaze puncture-resistant linear polyethylene material:
99.65 parts of ethylene butene polyethylene copolymer base resin
(its component is that HPN-20E is 0.12 part, nanoscale E for 0.25 part of nanometer EVA compound anti-reflections agent
VA is 0.10 part, and silicate hydrate magnesium powder is 0.03 part)
0.03 part of primary antioxidant
0.06 part of auxiliary antioxidant
0.01 part of erucyl amide
Wherein primary antioxidant is octadecyl 3- (3,5- di-t-butyl -4- hydroxyphenyls) propionic ester, auxiliary antioxidant three
(2,4- di-tert-butyl-phenyls) phosphite ester.
The preparation method of high glaze puncture-resistant linear polyethylene construct blow-molded:
By above-mentioned dosage, by ethylene butene polyethylene copolymer base resin and the agent of nanometer EVA compound anti-reflections, antioxidant, mustard
After sour acid amides mixes, add kneading machine and extrude particle into cooling water, obtain graininess linear polyethylene construct blow-molded.Wherein,
When kneading machine is kneaded, it is 205 DEG C that regulation, which is kneaded machine drum body coolant-temperature gage, and the temperature for adjusting particle cooling water is 65 DEG C.
Embodiment 2
The raw material of ethylene butene copolymerization of ethylene basis resin:
The raw material for producing base resin is following material:
1) polymer grade ethylene inlet amount 18.5t/h
Ethene:The C of purity >=99.20%2H2≤5×10-6 CO≤1×10-6
O2≤2×10-6 H2O≤1×10-6 COS≤0.02×10-6。
2) catalyst:Dry powder catalyst SCG-1 (II) C-3404 additions 1440kg/h
Co-catalyst:Liquid triethyl aluminum adds a small amount of
3) 1- butylene addition 1770kg/h
1- butylene:The H of purity >=99.0%2O≤100×10-6 CO≤5×10-6
CO2≤10×10-6 O2≤1×10-6 CH3OH≤10×10-6
The preparation method of ethylene butene copolymerization of ethylene basis resin:
Feed ethylene, 1- butylene are placed in reaction vessel, add activated catalyst, regulation temperature of reactor is 85
DEG C, under 2350MPa polymerization pressures, produce to obtain ethylene butene copolymerization linear polyethylene base resin, ethylene feed amount 18.5t/
H, dry powder catalyst SCG-1 (II) C-3404 additions 1440kg/h, 1- butylene addition 1770kg/h, so as to obtain melt
Flowing velocity is 0.8~1.2g/10min, and density is 0.916~0.920kg/m3Ethylene butene polyethylene copolymer basic tree
Fat.
The nanometer preparation method of EVA compound anti-reflection agent and the proportioning of each component are:
(it is preferably Beijing Orient petrochemical industry Co., Ltd organic chemical industry by the EVA emulsions that VA contents are 40%~60%
Factory, the trade mark:BJ-707EVA elastomer emulsions) 5kg is placed in container, odium stearate and detergent alkylate sulphur are added dropwise under agitation
Sour sodium, respective proportioning is EVA ﹕ Ying resin acid Na ﹕ neopelexes=﹕ 1.5 of 96.5 ﹕ 2, with HPN-20E nucleators
(Milliken) aqueous suspension, silicate hydrate magnesium powder (Allihn reaches) aqueous suspension, mixed by certain proportioning of respective dry weight,
Respective proportioning is HPN- 20E ﹕ EVA ﹕ hydrated magnesium silicates=﹕ 4 of 13 ﹕ 12, stirs 2 hours, is then entered using spray dryer
The inlet temperature of row Spray Drying Spray drier is 170~180 DEG C, and outlet temperature is 60~70 DEG C, in cyclone separator
Collect and obtain a nanometer EVA compound anti-reflection agent after drying, its particle diameter is 50nm~300nm.
The raw material (parts by weight) of high glaze puncture-resistant linear polyethylene material:
99.60 parts of ethylene butene polyethylene copolymer base resin
(its component is that HPN-20E is 0.13 part, nanometer EVA for 0.29 part of nanometer EVA compound anti-reflections agent
For 0.12 part, silicate hydrate magnesium powder is 0.04 part)
0.03 part of primary antioxidant
0.06 part of auxiliary antioxidant
0.02 part of erucyl amide
Wherein primary antioxidant is octadecyl 3- (3,5- di-t-butyl -4- hydroxyphenyls) propionic ester, auxiliary antioxidant three
(2,4- di-tert-butyl-phenyls) phosphite ester.
The preparation method of high glaze puncture-resistant linear polyethylene construct blow-molded:
By above-mentioned dosage, by ethylene butene polyethylene copolymer base resin and the agent of nanometer EVA compound anti-reflections, antioxidant, mustard
After sour acid amides mixes, add kneading machine and extrude particle into cooling water, obtain graininess linear polyethylene construct blow-molded.Wherein,
When kneading machine is kneaded, it is 210 DEG C that regulation, which is kneaded machine drum body coolant-temperature gage, and the temperature for adjusting particle cooling water is 75 DEG C.
Embodiment 3
The raw material of ethylene butene copolymerization of ethylene basis resin:
The raw material for producing base resin is following material:
1) polymer grade ethylene inlet amount 17.9t/h
Ethene:The C of purity >=99.20%2H2≤5×10-6 CO≤1×10-6
O2≤2×10-6 H2O≤1×10-6 COS≤0.02×10-6。
2) catalyst:Dry powder catalyst SCG-1 (II) C-3404 additions 1453kg/h
Co-catalyst:Liquid triethyl aluminum adds a small amount of
3) 1- butylene addition 1960kg/h
1- butylene:The H of purity >=99.0%2O≤100×10-6 CO≤5×10-6
CO2≤10×10-6 O2≤1×10-6 CH3OH≤10×10-6
The preparation method of ethylene butene copolymerization of ethylene basis resin:
Feed ethylene, 1- butylene are placed in reaction vessel, add activated catalyst, regulation temperature of reactor is 90
DEG C, under 2400MPa polymerization pressures, produce to obtain ethylene butene copolymerization linear polyethylene base resin, ethylene feed amount 17.9t/
H, dry powder catalyst SCG-1 (II) C-3404 additions 1453kg/h, 1- butylene addition 1960kg/h, so as to obtain melt flow
Dynamic speed is 0.8~1.2g/10min, and density is 0.916~0.920kg/m3Ethylene butene polyethylene copolymer base resin.
The nanometer preparation method of EVA compound anti-reflection agent and the proportioning of each component are:
(it is preferably Beijing Orient petrochemical industry Co., Ltd organic chemical industry by the EVA emulsions that VA contents are 40%~60%
Factory, the trade mark:BJ-707EVA elastomer emulsions) 5kg is placed in container, odium stearate and detergent alkylate sulphur are added dropwise under agitation
Sour sodium, respective proportioning is EVA ﹕ Ying resin acid Na ﹕ neopelexes=﹕ 2 of 95 ﹕ 3, with HPN-20E nucleators
(Milliken) aqueous suspension and silicate hydrate magnesium powder (Allihn reaches) aqueous suspension are mixed by certain proportioning of respective dry weight
Close, respective proportioning is HPN-20E ﹕ EVA ﹕ hydrated magnesium silicates=﹕ 3 of 14 ﹕ 14, stirs 2 hours, then using spray drying
The inlet temperature that device carries out Spray Drying Spray drier is 170~180 DEG C, and outlet temperature is 60~70 DEG C, in cyclonic separation
Collected in device and obtain a nanometer EVA compound anti-reflection agent after drying, its particle diameter is 50nm~300nm.
The raw material (parts by weight) of high glaze puncture-resistant linear polyethylene material:
99.53 parts of ethylene butene polyethylene copolymer base resin
(its component is that HPN-20E is 0.14 part, and nanometer EVA is 0.14 part, water for 0.31 part of nanometer EVA compound anti-reflections agent
It is 0.03 part to close silicic acid magnesium powder)
0.04 part of primary antioxidant
0.08 part of auxiliary antioxidant
0.04 part of erucyl amide
Wherein primary antioxidant is octadecyl 3- (3,5- di-t-butyl -4- hydroxyphenyls) propionic ester, auxiliary antioxidant three
(2,4- di-tert-butyl-phenyls) phosphite ester.
The preparation method of high glaze puncture-resistant linear polyethylene construct blow-molded:
By above-mentioned dosage, by ethylene butene polyethylene copolymer base resin and the agent of nanometer EVA compound anti-reflections, antioxidant, mustard
After sour acid amides mixes, add kneading machine and extrude particle into cooling water, obtain graininess linear polyethylene construct blow-molded.Wherein,
When kneading machine is kneaded, it is 220 DEG C that regulation, which is kneaded machine drum body coolant-temperature gage, and the temperature for adjusting particle cooling water is 62 DEG C.
Embodiment 4
The raw material of ethylene butene copolymerization of ethylene basis resin:
The raw material for producing base resin is following material:
1) polymer grade ethylene inlet amount 19.8t/h
Ethene:The C of purity >=99.20%2H2≤5×10-6 CO≤1×10-6
O2≤2×10-6 H2O≤1×10-6 COS≤0.02×10-6。
2) catalyst:Dry powder catalyst SCG-1 (II) C-3404 additions 1957kg/h
Co-catalyst:Liquid triethyl aluminum adds a small amount of
3) 1- butylene addition 2379kg/h
1- butylene:The H of purity >=99.0%2O≤100×10-6 CO≤5×10-6
CO2≤10×10-6 O2≤1×10-6 CH3OH≤10×10-6
The preparation method of ethylene butene copolymerization of ethylene basis resin:
Feed ethylene, 1- butylene are placed in reaction vessel, add activated catalyst, regulation temperature of reactor is 88
DEG C, under 2200MPa polymerization pressures, produce to obtain ethylene butene copolymerization linear polyethylene base resin, ethylene feed amount 19.8t/
H, dry powder catalyst SCG-1 (II) C-3404 additions 1957kg/h, 1- butylene addition 2379kg/h, so as to obtain melt
Flowing velocity is 0.8~1.2g/10min, and density is 0.916~0.920kg/m3Ethylene butene polyethylene copolymer basic tree
Fat.
The nanometer preparation method of EVA compound anti-reflection agent and the proportioning of each component are:
(it is preferably Beijing Orient petrochemical industry Co., Ltd organic chemical industry by the EVA emulsions that VA contents are 40%~60%
Factory, the trade mark:BJ-707EVA elastomer emulsions) 5kg is placed in container, odium stearate and detergent alkylate sulphur are added dropwise under agitation
Sour sodium, respective proportioning is EVA ﹕ Ying resin acid Na ﹕ neopelexes=﹕ 2 of 95 ﹕ 3, with HPN-20E nucleators
(Milliken) aqueous suspension, silicate hydrate magnesium powder (Allihn reaches) aqueous suspension are mixed by certain proportioning of respective dry weight,
Respective proportioning is HPN-20E ﹕ EVA ﹕ hydrated magnesium silicates=﹕ 4 of 12 ﹕ 14, stirs 2 hours, is then entered using spray dryer
The inlet temperature of row Spray Drying Spray drier is 170~180 DEG C, and outlet temperature is 60~70 DEG C, in cyclone separator
Collect and obtain a nanometer EVA compound anti-reflection agent after drying, its particle diameter is 50nm~300nm.
The raw material (parts by weight) of high glaze puncture-resistant linear polyethylene material:
99.54 parts of ethylene butene polyethylene copolymer base resin
(its component is that HPN-20E is 0.12 part, and nanometer EVA is 0.14 part, water for 0.30 part of nanometer EVA compound anti-reflections agent
It is 0.04 part to close silicic acid magnesium powder)
0.04 part of primary antioxidant
0.08 part of auxiliary antioxidant
0.04 part of erucyl amide
Wherein primary antioxidant is octadecyl 3- (3,5- di-t-butyl -4- hydroxyphenyls) propionic ester, auxiliary antioxidant three
(2,4- di-tert-butyl-phenyls) phosphite ester.
The preparation method of high glaze puncture-resistant linear polyethylene construct blow-molded:
By above-mentioned dosage, by ethylene butene polyethylene copolymer base resin and the agent of nanometer EVA compound anti-reflections, antioxidant, mustard
After sour acid amides mixes, add kneading machine and extrude particle into cooling water, obtain graininess linear polyethylene construct blow-molded.Wherein,
When kneading machine is kneaded, it is 220 DEG C that regulation, which is kneaded machine drum body coolant-temperature gage, and the temperature for adjusting particle cooling water is 70 DEG C.
Embodiment 5
The raw material of ethylene butene copolymerization of ethylene basis resin:
The raw material for producing base resin is following material:
1) polymer grade ethylene inlet amount 20.2t/h
Ethene:The C of purity >=99.20%2H2≤5×10-6 CO≤1×10-6
O2≤2×10-6 H2O≤1×10-6 COS≤0.02×10-6。
2) catalyst:Dry powder catalyst SCG-1 (II) C-3404 additions 1669kg/h
Co-catalyst:Liquid triethyl aluminum adds a small amount of
3) 1- butylene addition 2506kg/h
1- butylene:The H of purity >=99.0%2O≤100×10-6 CO≤5×10-6
CO2≤10×10-6 O2≤1×10-6 CH3OH≤10×10-6
The preparation method of ethylene butene copolymerization of ethylene basis resin:
Feed ethylene, 1- butylene are placed in reaction vessel, add activated catalyst, regulation temperature of reactor is 92
DEG C, under 2500MPa polymerization pressures, produce to obtain ethylene butene copolymerization linear polyethylene base resin, ethylene feed amount 20.2t/
H, dry powder catalyst SCG-1 (II) C-3404 additions 1669kg/h, 1- butylene addition 2506kg/h, so as to obtain melt
Flowing velocity is 0.8~1.2g/10min, and density is 0.916~0.920kg/m3Ethylene butene polyethylene copolymer basic tree
Fat.
The nanometer preparation method of EVA compound anti-reflection agent and the proportioning of each component are:
(it is preferably Beijing Orient petrochemical industry Co., Ltd organic chemical industry by the EVA emulsions that VA contents are 40%~60%
Factory, the trade mark:BJ-707EVA elastomer emulsions) 5kg is placed in container, odium stearate and detergent alkylate sulphur are added dropwise under agitation
Sour sodium, respective proportioning is EVA ﹕ Ying resin acid Na ﹕ neopelexes=﹕ 2.5 of 95 ﹕ 2.5, with HPN-20E nucleators
(Milliken) aqueous suspension, silicate hydrate magnesium powder (Allihn reaches) aqueous suspension are mixed by certain proportioning of respective dry weight,
Respective proportioning is HPN- 20E ﹕ EVA ﹕ hydrated magnesium silicates=﹕ 5 of 15 ﹕ 15, stirs 2 hours, is then entered using spray dryer
The inlet temperature of row Spray Drying Spray drier is 170~180 DEG C, and outlet temperature is 60~70 DEG C, in cyclone separator
Collect and obtain the ultra-fine EVA powdered rubbers containing nucleator after drying, its particle diameter is 50nm~300nm.
The raw material (parts by weight) of high glaze puncture-resistant linear polyethylene material:
99.48 parts of ethylene butene polyethylene copolymer base resin
(its component is that HPN-20E is 0.15 part, and nanometer EVA is 0.1 for 0.35 part of nanometer EVA compound anti-reflections agent
5 parts, silicate hydrate magnesium powder is 0.05 part)
0.05 part of primary antioxidant
010 part of auxiliary antioxidant
0.02 part of erucyl amide
Wherein primary antioxidant is octadecyl 3- (3,5- di-t-butyl -4- hydroxyphenyls) propionic ester, auxiliary antioxidant three
(2,4- di-tert-butyl-phenyls) phosphite ester.
The preparation method of high glaze puncture-resistant linear polyethylene construct blow-molded:
By above-mentioned dosage, by ethylene butene polyethylene copolymer base resin and the agent of nanometer EVA compound anti-reflections, antioxidant, mustard
After sour acid amides mixes, add kneading machine and extrude particle into cooling water, obtain graininess linear polyethylene construct blow-molded.Wherein,
When kneading machine is kneaded, it is 225 DEG C that regulation, which is kneaded machine drum body coolant-temperature gage, and the temperature for adjusting particle cooling water is 60 DEG C.
Comparative example 1
The raw material of ethylene butene copolymerization of ethylene basis resin:
The raw material for producing base resin is following material:
1) polymer grade ethylene inlet amount 16.1t/h
Ethene:The C of purity >=99.20%2H2≤5×10-6 CO≤1×10-6
O2≤2×10-6 H2O≤1×10-6 COS≤0.02×10-6。
2) catalyst:Dry powder catalyst SCG-1 (II) C-3404 additions 815kg/h
Co-catalyst:Liquid triethyl aluminum adds a small amount of
3) 1- butylene addition 1647kg/h
1- butylene:The H of purity >=99.0%2O≤100×10-6 CO≤5×10-6
CO2≤10×10-6 O2≤1×10-6 CH3OH≤10×10-6
The preparation method of ethylene butene copolymerization of ethylene basis resin:
Feed ethylene, 1- butylene are placed in reaction vessel, add activated catalyst, regulation temperature of reactor is 82
DEG C, under 2200MPa polymerization pressures, produce to obtain ethylene butene copolymerization linear polyethylene base resin, ethylene feed amount 16.1t/
H, dry powder catalyst SCG-1 (II) C-3404 additions 815kg/h, 1- butylene addition 1647kg/h, so as to obtain melt flow
Dynamic speed is 0.8~1.2g/10min, and density is 0.916~0.920kg/m3Ethylene butene polyethylene copolymer base resin.
The raw material (parts by weight) of high glaze puncture-resistant linear polyethylene material:
Wherein primary antioxidant is octadecyl 3- (3,5- di-t-butyl -4- hydroxyphenyls) propionic ester, auxiliary antioxidant three
(2,4- di-tert-butyl-phenyls) phosphite ester.
The preparation method of high glaze puncture-resistant linear polyethylene construct blow-molded:
By above-mentioned dosage, after ethylene butene polyethylene copolymer base resin and antioxidant are mixed, kneading machine extrusion is added
Particle obtains graininess linear polyethylene construct blow-molded into cooling water.Wherein, when kneading machine is kneaded, regulation is kneaded machine drum body
Coolant-temperature gage is 205 DEG C, and the temperature for adjusting particle cooling water is 65 DEG C.
Comparative example 2
The raw material of ethylene butene copolymerization of ethylene basis resin:
The raw material for producing base resin is following material:
1) polymer grade ethylene inlet amount 18.3t/h
Ethene:The C of purity >=99.20%2H2≤5×10-6 CO≤1×10-6
O2≤2×10-6 H2O≤1×10-6 COS≤0.02×10-6。
2) catalyst:Dry powder catalyst SCG-1 (II) C-3404 additions 1431kg/h
Co-catalyst:Liquid triethyl aluminum adds a small amount of
3) 1- butylene addition 1190kg/h
1- butylene:The H of purity >=99.0%2O≤100×10-6 CO≤5×10-6
CO2≤10×10-6 O2≤1×10-6 CH3OH≤10×10-6
The preparation method of ethylene butene copolymerization of ethylene basis resin:
Feed ethylene, 1- butylene are placed in reaction vessel, add activated catalyst, regulation temperature of reactor is 85
DEG C, under 2350MPa polymerization pressures, produce to obtain ethylene butene copolymerization linear polyethylene base resin, ethylene feed amount 18.3t/
H, dry powder catalyst SCG-1 (II) C-3404 additions 1431kg/h, 1- butylene addition 1190kg/h, so as to obtain melt
Flowing velocity is 0.8~1.2g/10min, and density is 0.916~0.920kg/m3Ethylene butene polyethylene copolymer basic tree
Fat.
The nanometer preparation method of EVA compound anti-reflection agent and the proportioning of each component are:
(it is preferably Beijing Orient petrochemical industry Co., Ltd organic chemical industry by the EVA emulsions that VA contents are 40%~60%
Factory, the trade mark:BJ-707EVA elastomer emulsions) 5kg is placed in container, odium stearate, DBSA are added dropwise under agitation
Sodium (respective proportioning is EVA ﹕ Ying resin acid Na ﹕ neopelexes=﹕ 2 of 95 ﹕ 3), with HPN-20E nucleators
(Milliken) aqueous suspension and hydrated magnesium silicate (Allihn reaches) aqueous suspension, mixed by certain proportioning of respective dry weight
(respective proportioning is HPN- 20E ﹕ EVA ﹕ hydrated magnesium silicates=﹕ 4 of 13 ﹕ 12), 2 hours are stirred, then using spray dryer
The inlet temperature for carrying out Spray Drying Spray drier is 170~180 DEG C, and outlet temperature is 60~70 DEG C, in cyclone separator
Middle collection obtains a nanometer EVA compound anti-reflection agent after drying, and its particle diameter is 50nm~300nm.
The raw material (parts by weight) of high glaze puncture-resistant linear polyethylene material:
99.60 parts of ethylene butene polyethylene copolymer base resin
(its component is that HPN-20E is 0.13 part, EVA 0.12 for 0.29 part of nanometer EVA compound anti-reflections agent
Part, water and silicic acid magnesium powder are 0.04 part)
0.03 part of primary antioxidant
0.06 part of auxiliary antioxidant
0.02 part of erucyl amide
Wherein primary antioxidant is octadecyl 3- (3,5- di-t-butyl -4- hydroxyphenyls) propionic ester, auxiliary antioxidant three
(2,4- di-tert-butyl-phenyls) phosphite ester.
The preparation method of high glaze puncture-resistant linear polyethylene construct blow-molded:
By above-mentioned dosage, by ethylene butene polyethylene copolymer base resin and the agent of nanometer powder EVA compound anti-reflections, antioxygen
After agent, erucyl amide mix, add kneading machine and extrude particle into cooling water, obtain graininess linear polyethylene construct blow-molded.
Wherein, when kneading machine is kneaded, it is 210 DEG C that regulation, which is kneaded machine drum body coolant-temperature gage, and the temperature for adjusting particle cooling water is 65 DEG C.
Comparative example 3
The raw material of ethylene butene copolymerization of ethylene basis resin:
The raw material for producing base resin is following material:
1) polymer grade ethylene inlet amount 16.3t/h
Ethene:The C of purity >=99.20%2H2≤5×10-6 CO≤1×10-6
O2≤2×10-6 H2O≤1×10-6 COS≤0.02×10-6。
2) catalyst:Dry powder catalyst SCG-1 (II) C-3404 additions 878kg/h
Co-catalyst:Liquid triethyl aluminum adds a small amount of
3) 1- butylene addition 1076kg/h
1- butylene:The H of purity >=99.0%2O≤100×10-6 CO≤5×10-6
CO2≤10×10-6 O2≤1×10-6 CH3OH≤10×10-6
The preparation method of ethylene butene copolymerization of ethylene basis resin:
Feed ethylene, 1- butylene are placed in reaction vessel, add activated catalyst, regulation temperature of reactor is 82
DEG C, under 2200MPa polymerization pressures, produce to obtain ethylene butene copolymerization linear polyethylene base resin, ethylene feed amount 16.3t/
H, dry powder catalyst SCG-1 (II) C-3404 additions 878kg/h, 1- butylene addition 1076kg/h, so as to obtain melt flow
Dynamic speed is 0.8~1.2g/10min, and density is 0.916~0.920kg/m3Ethylene butene polyethylene copolymer base resin.
The raw material (parts by weight) of high glaze puncture-resistant linear polyethylene material:
Wherein primary antioxidant is octadecyl 3- (3,5- di-t-butyl -4- hydroxyphenyls) propionic ester, auxiliary antioxidant three
(2,4- di-tert-butyl-phenyls) phosphite ester.
The preparation method of high glaze puncture-resistant linear polyethylene construct blow-molded:
By above-mentioned dosage, after ethylene butene polyethylene copolymer base resin and antioxidant, erucyl amide are mixed, add mixed
Mill extrudes particle into cooling water, obtains graininess linear polyethylene construct blow-molded.Wherein, when kneading machine is kneaded, regulation is mixed
Mill cylinder coolant-temperature gage is 205 DEG C, and the temperature for adjusting particle cooling water is 65 DEG C.
Comparative example 4
The raw material of ethylene butene copolymerization of ethylene basis resin:
The raw material for producing base resin is following material:
1) polymer grade ethylene inlet amount 17.6t/h
Ethene:The C of purity >=99.20%2H2≤5×10-6 CO≤1×10-6
O2≤2×10-6 H2O≤1×10-6 COS≤0.02×10-6。
2) catalyst:Dry powder catalyst SCG-1 (II) C-3404 additions 1325kg/h
Co-catalyst:Liquid triethyl aluminum adds a small amount of
3) 1- butylene addition 1921kg/h
1- butylene:The H of purity >=99.0%2O≤100×10-6 CO≤5×10-6
CO2≤10×10-6 O2≤1×10-6 CH3OH≤10×10-6
The preparation method of ethylene butene copolymerization of ethylene basis resin:
Feed ethylene, 1- butylene are placed in reaction vessel, add activated catalyst, regulation temperature of reactor is 90
DEG C, under 2400MPa polymerization pressures, produce to obtain ethylene butene copolymerization linear polyethylene base resin, ethylene feed amount 17.6t/
H, dry powder catalyst SCG-1 (II) C-3404 additions 1325kg/h, 1- butylene addition 1921kg/h, so as to obtain melt
Flowing velocity is 0.8~1.2g/10min, and density is 0.916~0.920kg/m3Ethylene butene polyethylene copolymer basic tree
Fat.
The nanometer preparation method of EVA compound anti-reflection agent and the proportioning of each component are:
(it is preferably Beijing Orient petrochemical industry Co., Ltd organic chemical industry by the EVA emulsions that VA contents are 40%~60%
Factory, the trade mark:BJ-707EVA elastomer emulsions) 5kg is placed in container, odium stearate, DBSA are added dropwise under agitation
Sodium (respective proportioning is EVA ﹕ Ying resin acid Na ﹕ neopelexes=﹕ 2 of 95 ﹕ 3), with HPN-20E nucleators
(Milliken) aqueous suspension, by certain proportioning mixing of respective dry weight, (respective proportioning is HPN-20E ﹕ EVA=14 ﹕
14) 2 hours, are stirred, then use spray dryer to carry out the inlet temperature of Spray Drying Spray drier as 170~180
DEG C, outlet temperature is 60~70 DEG C, is collected in cyclone separator and obtains the ultra-fine EVA powdered rubbers containing nucleator after drying,
Its particle diameter is 50nm~300nm.
The raw material (parts by weight) of high glaze puncture-resistant linear polyethylene material:
99.56 parts of ethylene butene polyethylene copolymer base resin
(its component is that EVA is 0.14 part, HPN-20E 0.14 for 0.28 part of nanometer EVA compound anti-reflections agent
Part)
0.04 part of primary antioxidant
0.08 part of auxiliary antioxidant
0.04 part of erucyl amide
Wherein primary antioxidant is octadecyl 3- (3,5- di-t-butyl -4- hydroxyphenyls) propionic ester, auxiliary antioxidant three
(2,4- di-tert-butyl-phenyls) phosphite ester.
The preparation method of high glaze puncture-resistant linear polyethylene construct blow-molded:
By above-mentioned dosage, by ethylene butene polyethylene copolymer base resin and the agent of nanometer powder EVA compound anti-reflections, antioxygen
After agent, erucyl amide mix, add kneading machine and extrude particle into cooling water, obtain graininess linear polyethylene construct blow-molded.
Wherein, when kneading machine is kneaded, it is 220 DEG C that regulation, which is kneaded machine drum body coolant-temperature gage, and the temperature for adjusting particle cooling water is 62 DEG C.
Comparative example 5
The raw material of ethylene butene copolymerization of ethylene basis resin:
The raw material for producing base resin is following material:
1) polymer grade ethylene inlet amount 20.2t/h
Ethene:The C of purity >=99.20%2H2≤5×10-6 CO≤1×10-6
O2≤2×10-6 H2O≤1×10-6 COS≤0.02×10-6。
2) catalyst:Dry powder catalyst SCG-1 (II) C-3404 additions 1932kg/h
Co-catalyst:Liquid triethyl aluminum adds a small amount of
3) 1- butylene addition 2416kg/h
1- butylene:The H of purity >=99.0%2O≤100×10-6 CO≤5×10-6
CO2≤10×10-6 O2≤1×10-6 CH3OH≤10×10-6
The preparation method of ethylene butene copolymerization of ethylene basis resin:
Feed ethylene, 1- butylene are placed in reaction vessel, add activated catalyst, regulation temperature of reactor is 88
DEG C, under 2200MPa polymerization pressures, produce to obtain ethylene butene copolymerization linear polyethylene base resin, ethylene feed amount 20.2t/
H, dry powder catalyst SCG-1 (II) C-3404 additions 1932kg/h, 1- butylene addition 2416kg/h, so as to obtain melt
Flowing velocity is 0.8~1.2g/10min, and density is 0.916~0.920kg/m3Ethylene butene polyethylene copolymer basic tree
Fat.
The nanometer preparation method of EVA compound anti-reflection agent and the proportioning of each component are:
(it is preferably Beijing Orient petrochemical industry Co., Ltd organic chemical industry by the EVA emulsions that VA contents are 40%~60%
Factory, the trade mark:BJ-707EVA elastomer emulsions) 5kg is placed in container, odium stearate and detergent alkylate sulphur are added dropwise under agitation
Sour sodium, respective proportioning is EVA ﹕ Ying resin acid Na ﹕ neopelexes=﹕ 2 of 95 ﹕ 3, with HPN-20E nucleators
(Milliken) aqueous suspension and hydrated magnesium silicate aqueous suspension are mixed by certain proportioning of respective dry weight, respective proportioning
For the ﹕ 4 of HPN-20E ﹕ hydrated magnesium silicates=12,2 hours are stirred, Spray Drying Spray drying is then carried out using spray dryer
The inlet temperature of device is 170~180 DEG C, and outlet temperature is 60~70 DEG C, is collected in cyclone separator and obtains nanometer after drying
EVA compound anti-reflection agent, its particle diameter are 50nm~300nm.
The raw material (parts by weight) of high glaze puncture-resistant linear polyethylene material:
99.68 parts of ethylene butene polyethylene copolymer base resin
(its component is that HPN-20E is 0.12 part, is hydrated silicon for 0.16 part of nanometer EVA compound anti-reflections agent
Sour magnesium powder is 0.04 part)
0.04 part of primary antioxidant
0.08 part of auxiliary antioxidant
0.04 part of erucyl amide
Wherein primary antioxidant is octadecyl 3- (3,5- di-t-butyl -4- hydroxyphenyls) propionic ester, auxiliary antioxidant three
(2,4- di-tert-butyl-phenyls) phosphite ester.
The preparation method of high glaze puncture-resistant linear polyethylene construct blow-molded:
By above-mentioned dosage, ethylene butene polyethylene copolymer base resin and transparent agent, antioxidant, erucyl amide are mixed
Afterwards, add kneading machine and extrude particle into cooling water, obtain graininess linear polyethylene construct blow-molded.Wherein, kneading machine is kneaded
When, it is 225 DEG C that regulation, which is kneaded machine drum body coolant-temperature gage, and the temperature for adjusting particle cooling water is 60 DEG C.
Comparative example 6
The raw material of ethylene butene copolymerization of ethylene basis resin:
The raw material for producing base resin is following material:
1) polymer grade ethylene inlet amount 19.9t/h
Ethene:The C of purity >=99.20%2H2≤5×10-6 CO≤1×10-6
O2≤2×10-6 H2O≤1×10-6 COS≤0.02×10-6。
2) catalyst:Dry powder catalyst SCG-1 (II) C-3404 additions 1532kg/h
Co-catalyst:Liquid triethyl aluminum adds a small amount of
3) 1- butylene addition 2516kg/h
1- butylene:The H of purity >=99.0%2O≤100×10-6 CO≤5×10-6
CO2≤10×10-6 O2≤1×10-6 CH3OH≤10×10-6
The preparation method of ethylene butene copolymerization of ethylene basis resin:
Feed ethylene, 1- butylene are placed in reaction vessel, add activated catalyst, regulation temperature of reactor is 92
DEG C, under 2500MPa polymerization pressures, produce to obtain ethylene butene copolymerization linear polyethylene base resin, ethylene feed amount 19.9t/
H, dry powder catalyst SCG-1 (II) C-3404 additions 1532kg/h, 1- butylene addition 2516kg/h, so as to obtain melt
Flowing velocity is 0.8~1.2g/10min, and density is 0.916~0.920kg/m3Ethylene butene polyethylene copolymer basic tree
Fat.
The raw material (parts by weight) of high glaze puncture-resistant linear polyethylene material:
Wherein primary antioxidant is octadecyl 3- (3,5- di-t-butyl -4- hydroxyphenyls) propionic ester, auxiliary antioxidant three
(2,4- di-tert-butyl-phenyls) phosphite ester.
The preparation method of high glaze puncture-resistant linear polyethylene construct blow-molded:
By above-mentioned dosage, ethylene butene polyethylene copolymer base resin and transparent agent, antioxidant, erucyl amide are mixed
Afterwards, add kneading machine and extrude particle into cooling water, obtain graininess linear polyethylene construct blow-molded.Wherein, kneading machine is kneaded
When, it is 225 DEG C that regulation, which is kneaded machine drum body coolant-temperature gage, and the temperature for adjusting particle cooling water is 60 DEG C.
Comparative example 7
The raw material of ethylene butene copolymerization of ethylene basis resin:
The raw material for producing base resin is following material:
1) polymer grade ethylene inlet amount 19.8t/h
Ethene:The C of purity >=99.20%2H2≤5×10-6 CO≤1×10-6
O2≤2×10-6 H2O≤1×10-6 COS≤0.02×10-6。
2) catalyst:Dry powder catalyst SCG-1 (II) C-3404 additions 1641kg/h
Co-catalyst:Liquid triethyl aluminum adds a small amount of
3) 1- butylene addition 2472kg/h
1- butylene:The H of purity >=99.0%2O≤100×10-6 CO≤5×10-6
CO2≤10×10-6 O2≤1×10-6 CH3OH≤10×10-6
The preparation method of ethylene butene copolymerization of ethylene basis resin:
Feed ethylene, 1- butylene are placed in reaction vessel, add activated catalyst, regulation temperature of reactor is 92
DEG C, under 2500MPa polymerization pressures, produce to obtain ethylene butene copolymerization linear polyethylene base resin, ethylene feed amount 19.8t/
H, dry powder catalyst SCG-1 (II) C-3404 additions 1641kg/h, 1- butylene addition 2472kg/h, so as to obtain melt
Flowing velocity is 0.8~1.2g/10min, and density is 0.916~0.920kg/m3Ethylene butene polyethylene copolymer basic tree
Fat.
The raw material (parts by weight) of high glaze puncture-resistant linear polyethylene material:
Wherein primary antioxidant is octadecyl 3- (3,5- di-t-butyl -4- hydroxyphenyls) propionic ester, auxiliary antioxidant three
(2,4- di-tert-butyl-phenyls) phosphite ester.
The preparation method of high glaze puncture-resistant linear polyethylene construct blow-molded:
By above-mentioned dosage, ethylene butene polyethylene copolymer base resin and transparent agent, antioxidant, erucyl amide are mixed
Afterwards, add kneading machine and extrude particle into cooling water, obtain graininess linear polyethylene construct blow-molded.Wherein, kneading machine is kneaded
When, it is 225 DEG C that regulation, which is kneaded machine drum body coolant-temperature gage, and the temperature for adjusting particle cooling water is 60 DEG C.
Table 1:The 1- butylene and ethylene feed situation of the embodiment of the present invention and comparative example contrast
Table 2:The embodiment of the present invention and comparative example formula table
The linear polyethylene product particle of obtained 1~embodiment of embodiment 5,1~comparative example of comparative example 6 will be granulated 60
6h is dried at DEG C, is blow molded at 190 DEG C 30 μm of film respectively using single screw rod inflation film manufacturing machine, carries out performance test.As a result it is as follows
Shown in table:
Table 3:The performance comparison of embodiment and comparative example
It can be seen that from above-mentioned experimental result comprehensive according to the LLDPE material of present invention addition nanometer EVA compound anti-reflection agent
It is optimal to close performance, the film blown has relatively low turbidity, higher gloss degree, preferable Kekelé structure count, while can obtain higher
Puncture resistance.
Any auxiliary agent is not added with comparative example 1 in addition to base resin and antioxidant, equivalent to currently common line
Property polyethylene product, embodiment 1 with contrast 1 contrast, it is seen that turbidity, glossiness, which are obtained for, to be obviously improved, while puncture resistance
Increase, Kekelé structure count also has slight improvement.
Comparative example 2 and embodiment 2 all with the addition of identical nanometer EVA compound anti-reflection agent prescriptions, compared with Example 2, right
1- butylene/ethylene feed amount of the ratio 2 in production is only the former 68%, shows higher turbidity and relatively low puncture resistant
Property;Comparative example 2 and the different products obtained under the production status that comparative example 3 is similar relatively low 1- butylene/ethylene feed amount, no
The comparative example 3 of the compound anti-reflection agent of EVA containing nanometer has relatively low gloss, higher adhesion intensity and relatively low puncture resistance.It is right
Ratio 1 is identical with the formula of comparative example 3, but in the case of 1- butylene/ethylene feed amount ratio difference, the addition ratio of 1- butylene
The raising of example is beneficial to improve its puncture resistance and transparency.
Under the production status of identical 1- butylene/ethylene feed amount, embodiment 5 and the turbidity and gloss of the film of comparative example 7
Degree is very close, but embodiment 5 has only used the transparent agent equivalent to 60% content in comparative example 7, while obtains puncture resistance
Higher, the more preferable thin-film material of Kekelé structure count.
Embodiment 5 contrasts with comparative example 6, under the production status of identical 1- butylene/ethylene feed amount, adds the increasing of equivalent
When saturating agent, the film of embodiment 5 has lower turbidity and more preferable combination property.
The contrast of embodiment 4 and comparative example 5, embodiment 3 and comparative example 4 show respectively, in identical 1- butylene/ethene
Under the production status of inlet amount, the addition of nanometer EVA and ultrafine hydrous magnesium silicate to the mechanical properties of whole LLDPE systems and
The improvement of Kekelé structure count.
The present invention can be summarized with others without prejudice to the concrete form of the spirit or essential characteristics of the present invention, of the invention
Above-described embodiment can only all be considered the description of the invention rather than limitation, and every substantial technological according to the present invention is to the above
Any subtle modifications, equivalent variations and modifications that embodiment is made, are belonged in the range of technical solution of the present invention.
Claims (9)
1. a kind of high glaze puncture-resistant linear polyethylene construct blow-molded, it is characterized in that, mainly by the raw material of following mass percent
It is made:
Ethylene butene polyethylene copolymer base resin 99.45~99.66%
Nanometer EVA compound anti-reflections agent 0.25~0.35%
Main anti-oxidant 0.03~0.05%
Auxiliary antioxidant 0.06~0.10%
Slipping agent 0.00~0.05%;
The ethylene butene polyethylene copolymer base resin is placed on reaction using ethylene gas, butene gas as primary raw material
In container, the synthesizing ethylene butene linear polyethylene base resin in the presence of activated catalyst, wherein, reactor temperature
Spend for 82~92 DEG C, 2200~2500MPa of polymerization pressure, resin melt flowing speed is 0.8~1.2g/10min, and density is
0.916~0.920kg/m3。
2. high glaze puncture-resistant linear polyethylene construct blow-molded according to claim 1, it is characterized in that, the ethene and 1-
The amount ratio of butylene is 1000kg ﹕ 90kg~130kg;The dosage of 1- butylene is 1~2 times of catalyst amount.
3. high glaze puncture-resistant linear polyethylene construct blow-molded according to claim 1, it is characterized in that, described catalyst
For dry powder catalyst SCG-1 (II) C-3404 of Shanghai Lide Catalyst Co., Ltd's production, co-catalyst is liquid triethyl group
Aluminium.
4. the high glaze puncture-resistant linear polyethylene construct blow-molded according to claim 1 or 2 or 3, it is characterized in that, it is described to receive
EVA, odium stearate, neopelex, nucleator and silicate hydrate magnesium powder are included in rice EVA compound anti-reflection agent, wherein,
EVA ﹕ Ying resin acid Na ﹕ neopelex=90~98 ﹕ 1~5 ﹕ 1~5, EVA ﹕ Cheng He Ji ﹕ hydrated magnesium silicate=12~
The ﹕ 3~5 of 15 ﹕ 10~15, above ratio are mass ratio.
5. high glaze puncture-resistant linear polyethylene construct blow-molded according to claim 4, it is characterized in that, the nanometer EVA
The preparation method of compound anti-reflection agent is:The EVA emulsions 5kg that VA contents are 40%~60% is placed in container, dripped under agitation
Add odium stearate, neopelex, hard resin acid sodium ﹕ neopelex=90 of the EVA ﹕~﹕ 1~5 of 98 ﹕ 1~5,
Then emulsion and nucleator aqueous suspension, silicate hydrate magnesium powder aqueous suspension, mixed by certain proportioning of respective dry weight,
The EVA ﹕ HPN-20E ﹕ hydrated magnesium silicate=12~﹕ 3~5 of 15 ﹕ 10~15, are stirred, are then sprayed using spray dryer
Mist is dried, and the inlet temperature of spray dryer is 130~180 DEG C, and outlet temperature is 40~70 DEG C, is collected in cyclone separator
The ultra-fine EVA powdered rubbers containing nucleator are obtained after drying, its particle diameter is 50nm~150nm.
6. high glaze puncture-resistant linear polyethylene construct blow-molded according to claim 4, it is characterized in that, the nucleator is
HPN-20E。
7. high glaze puncture-resistant linear polyethylene construct blow-molded according to claim 1, it is characterized in that, the primary antioxidant
For phenolic antioxidant, auxiliary antioxidant is phosphoric acid ester antioxidant.
8. high glaze puncture-resistant linear polyethylene construct blow-molded according to claim 7, it is characterized in that, the phenols antioxygen
Agent is octadecyl 3- (3,5- di-t-butyl -4- hydroxyphenyls) propionic ester, and the phosphoric acid ester antioxidant is three (2,4- bis- tertiary fourths
Base phenyl) phosphite ester.
9. high glaze puncture-resistant linear polyethylene construct blow-molded according to claim 1, it is characterized in that, the slipping agent is
Erucyl amide.
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CN114573902A (en) * | 2020-12-01 | 2022-06-03 | 中国石油天然气股份有限公司 | Polyethylene composition and preparation method thereof |
CN114573902B (en) * | 2020-12-01 | 2023-11-28 | 中国石油天然气股份有限公司 | Polyethylene composition and method for producing the same |
CN113896977A (en) * | 2021-10-26 | 2022-01-07 | 中国石油化工股份有限公司 | Polyethylene composition for bottle cap and preparation method thereof |
CN113896977B (en) * | 2021-10-26 | 2023-10-20 | 中国石油化工股份有限公司 | Polyethylene composition for bottle cap and preparation method thereof |
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