CN106718207A - The planting unit and cultural method of centella - Google Patents

The planting unit and cultural method of centella Download PDF

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Publication number
CN106718207A
CN106718207A CN201611050593.8A CN201611050593A CN106718207A CN 106718207 A CN106718207 A CN 106718207A CN 201611050593 A CN201611050593 A CN 201611050593A CN 106718207 A CN106718207 A CN 106718207A
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planting groove
centella
planting
foundation trench
groove
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CN201611050593.8A
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CN106718207B (en
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陈念枢
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    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01GHORTICULTURE; CULTIVATION OF VEGETABLES, FLOWERS, RICE, FRUIT, VINES, HOPS OR SEAWEED; FORESTRY; WATERING
    • A01G9/00Cultivation in receptacles, forcing-frames or greenhouses; Edging for beds, lawn or the like
    • A01G9/02Receptacles, e.g. flower-pots or boxes; Glasses for cultivating flowers
    • AHUMAN NECESSITIES
    • A01AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
    • A01GHORTICULTURE; CULTIVATION OF VEGETABLES, FLOWERS, RICE, FRUIT, VINES, HOPS OR SEAWEED; FORESTRY; WATERING
    • A01G22/00Cultivation of specific crops or plants not otherwise provided for

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  • Life Sciences & Earth Sciences (AREA)
  • Environmental Sciences (AREA)
  • Botany (AREA)
  • Cultivation Of Plants (AREA)

Abstract

The invention provides the planting unit and cultural method of a kind of centella, belong to Chinese herbal medicine planting technology field.The planting unit includes foundation trench, the first planting groove and the second planting groove, foundation trench includes plantation basal plane, first planting groove and the second planting groove are arranged at plantation basal plane, the trough floor of the trough floor of the first planting groove and the second planting groove is oppositely arranged, first planting groove away from foundation trench side and the second planting groove away from foundation trench side is close to each other and interval setting, form the exposure opening for exposing plantation basal plane.Additionally, the cultural method that the present invention is also provided includes:Above-mentioned planting unit is prepared, then centella is planted on the first planting groove, the second planting groove and foundation trench.The planting unit simple structure, makes easy.Facility cultivation is carried out using the planting unit, the cultivated area of centella can be expanded, increased yield, improve the utilization rate in soil.

Description

The planting unit and cultural method of centella
Technical field
The present invention relates to Chinese herbal medicine planting technology field, planting unit and cultivation in particular to a kind of centella Culture method.
Background technology
Centella is a kind of Carrot family herbaceous plant, with heat-clearing, removing toxic substances the effects such as, be one kind of traditional herbal medicine, can For oral administration, external application, is also the good material of food and drink soup stock and the raw material of cosmetics.It is existing known without scale cultivation, only exist Have fragmentary cultivation in kitchen garden, it is widely distributed in the torrid zone and subtropical zone, spring field be readily available, summer, autumn Season is difficult to be obtained, and weeds, fallen leaves mixes, difficult clear miscellaneous, hardly possible harvesting, and centella of how transplanting reaches that yield is high, Yi Cai Receive, quality it is excellent be those skilled in the art endeavour solve problem.
The content of the invention
It is an object of the invention to provide a kind of planting unit of centella, its simple structure installs easy, it is possible to increase The cultivated area of centella.
Another object of the present invention is to provide a kind of cultural method of centella, the cultural method utilizes above-mentioned centella Planting unit carries out cultivation centella, effectively raises the cultivated area of centella, improves land utilization ratio, and improve Yield.
The present invention is solved its technical problem and is realized using following technical scheme.
A kind of planting unit of centella, it includes foundation trench, the first planting groove and the second planting groove, and foundation trench includes Plantation basal plane, the first planting groove and the second planting groove are arranged at plantation basal plane, the trough floor of the first planting groove and the second planting groove Trough floor be oppositely arranged, and the first planting groove is mutual away from the side of foundation trench with the second planting groove away from the side of foundation trench It is close to and interval setting, forms the exposure opening for exposing plantation basal plane.
A kind of cultural method of centella, it includes:
Build planting unit:Site preparation making ridge basis of formation groove, foundation trench includes plantation basal plane, by the first planting groove and second Planting groove is installed on plantation basal plane, and is oppositely arranged the trough floor of the first planting groove and the trough floor of the second planting groove, and makes First planting groove away from foundation trench side and the second planting groove away from foundation trench side is close to each other and interval setting, formed Exposure opening for exposing plantation basal plane;And
Plantation:The centella is planted on the foundation trench, first planting groove and second planting groove.
A kind of planting unit of centella provided in an embodiment of the present invention and the beneficial effect of cultural method are:The present invention The planting unit of the centella of offer, its simple structure makes easy, and facility cultivation is carried out using the planting unit, the first Plant groove, the second planting groove and foundation trench and form three growing areas, the cultivated area of centella can be expanded, increased yield, together When the first planting groove and the second planting groove be obliquely installed, improve the utilization rate in soil, exempt from it is clear it is miscellaneous save artificial, be accumulated snow The application of grass, promotes and provides abundant raw material.It is high, fresh and tender using centella quality obtained in the cultivation method, reach Quality of vegetable, easily harvesting.
Brief description of the drawings
Technical scheme in order to illustrate more clearly the embodiments of the present invention, below will be attached to what is used needed for embodiment Figure is briefly described, it will be appreciated that the following drawings illustrate only certain embodiments of the present invention, thus be not construed as it is right The restriction of scope, for those of ordinary skill in the art, on the premise of not paying creative work, can also be according to this A little accompanying drawings obtain other related accompanying drawings.
The structural representation of the planting unit of the centella that Fig. 1 is provided for first embodiment of the invention;
The structural representation of the first closure panel of the planting unit of the centella that Fig. 2 is provided for first embodiment of the invention Figure;
The knot of the first subzone is carried out when being harvested in the cultural method of the centella that Fig. 3 is provided for second embodiment of the invention Structure schematic diagram;
Second subregion is carried out after repeatedly being harvested in the cultural method of the centella that Fig. 4 is provided for second embodiment of the invention Structural representation;
The structural representation of the planting unit of the centella that Fig. 5 is provided for third embodiment of the invention;
The structural representation of the mounting bracket of the planting unit of the centella that Fig. 6 is provided for third embodiment of the invention.
Icon:The planting unit of 100- centellas;The planting grooves of 110- first;The plantation portions of 110a- first;Between 110b- first Gap portion;The fixed parts of 110c- first;The closure panels of 111- first;112- implantation holes;113- suckings;The pre- exploiting fields of 114- first; The stud plots of 115- first;The pre- exploiting fields of 116- second;The stud plots of 117- second;118- exposures opening;The planting grooves of 120- second; The plantation portions of 120a- second;The clearance portions of 120b- second;The fixed parts of 120c- second;The closure panels of 121- second;122- tie-beams; 130- foundation trench;131- sandstone layer;132- safe edges layer;133- kinds plant basal plane;140- mounting brackets;141- installing plates;142- consolidates Determine frame;The gag lever posts of 143- first;The gag lever posts of 144- second.
Specific embodiment
To make the purpose, technical scheme and advantage of the embodiment of the present invention clearer, below will be in the embodiment of the present invention Technical scheme be clearly and completely described.Unreceipted actual conditions person, builds according to normal condition or manufacturer in embodiment The condition of view is carried out.Agents useful for same or the unreceipted production firm person of instrument, are the conventional product that can be obtained by commercially available purchase Product.
Fig. 1 is referred to, below the planting unit 100 to a kind of centella of the embodiment of the present invention and the cultivation of centella Method is specifically described.
The planting unit 100 of centella includes the first planting groove 110, the second planting groove 120, foundation trench 130 and connection Beam 122.
Fig. 1 and Fig. 2 is referred to, Culture media is filled with the first planting groove 110, in the notch of the first planting groove 110 Place is provided with the first closure panel 111, and the first closure panel 111 can close the first planting groove 110 to avoid the first planting groove Culture media in 110 spills.Multiple implantation holes 112 and multiple suckings 113 are offered on the first closure panel 111, Multiple implantation holes 112 and multiple suckings 113 are arranged alternately.Wherein implantation hole 112 is used to plant centella, because centella is Sprawl growth, in growth course, to be taken root on the section of centella, this part root can stretch into matrix and seek by sucking 113 Supporting in soil carries out absorption nutrition.
Specifically, the first planting groove 110 includes the first plantation portion 110a, the first clearance portion 110b and the first fixed part 110c, wherein, the first clearance portion 110b is arranged between the first plantation portion 110a and the first fixed part 110c, the first plantation portion 110a is used to plant centella, thus the first closure panel 111 and the first plantation portion 110a cooperations.Between first clearance portion 110b is Gap opening, for foundation trench 130 to be in communication with the outside, is easy to harvest the centella on foundation trench 130.And the first fixed part 110c In insertion foundation trench 130, that is to say in insertion soil, for fixing and supporting the first planting groove 110, the first fixed part 110c's Insertion depth about 0.4m.Multiple implantation holes 112 are arranged as multiple rows of and closure panel is divided into multiple crawls area, the two of arbitrary neighborhood Spacing between row's implantation hole 112 is 0.3~0.5m, preferably 0.4m.Spacing between the implantation hole 112 of same row is 0.06 ~0.1m, preferably 0.08m.A diameter of 3~5mm of implantation hole 112, preferably 4mm.Two row's implantation holes 112 of arbitrary neighborhood Between be provided with array arrange multiple suckings 113, that is to say that sucking 113 is arranged at and crawl in area, and formed it is many Row and multiple row, often go and the spacing between two suckings 113 of each column arbitrary neighborhood is 0.06~0.1m, preferably 0.08m. A diameter of 2~4mm of sucking 113, preferably 3mm.
The structure of the second planting groove 120 is identical with the first planting groove 110, is also equipped with the notch of the second planting groove 120 For closing the second closure panel 121 of the second planting groove 120, likewise, being also equipped with plantation on the second closure panel 121 Hole 112 and sucking 113, the set-up mode and setting distance of implantation hole 112 and sucking 113 on the second closure panel 121 It is identical with the implantation hole 112 and sucking 113 on the first closure panel 111, additionally, the second planting groove 120 includes second kind of plant Portion 120a, the second clearance portion 120b and the second fixed part 120c, the second clearance portion 120b be connected to the second plantation portion 120a and Between second fixed part 120c, the second plantation portion 120a, the effect of the second clearance portion 120b and the second fixed part 120c and Annexation can refer to the first plantation portion 110a, the first clearance portion 110b and the first fixed part 110c of the first planting groove 110, Here do not repeating.
Foundation trench 130 includes plantation basal plane 133, and the plantation basal plane 133 is oppositely arranged with the trough floor of foundation trench 130, i.e., It is plantation basal plane 133 that foundation trench 130 is used to plant the side of centella, in the present embodiment, using the ridge face after site preparation making ridge as Foundation trench 130, because centella directly can be grown on ridge face, thus without the filling substrate battalion in foundation trench 130 Soil is supported, and foundation trench 130 is horizontally disposed, and closure panel is set without on foundation trench 130.
Specifically, foundation trench 130 is to lay sandstone layer 131 on the ridge face formed after site preparation making ridge to be formed, wherein, it is husky The sandstone particle diameter of rock layers 131 is less than 0.02m, and the laying depth of sandstone layer 131 is 0.03~0.05m.The side in ridge face is equipped with Safe edge layer 132.Safe edge layer 132 is formed using brick laying, and it can effectively prevent the sandstone of sandstone layer 131 from dropping, from And play the effect of safe edge shield soil.
Certainly, in other embodiments, foundation trench 130 can use same with the first planting groove 110 and the second planting groove 120 The structure of sample, realizes that departing from ground is planted, it is adaptable to indoor plantation or aerial plantation.
Tie-beam 122 is used to connect and consolidate the first planting groove 110 and the second planting groove 120, the two ends point of tie-beam 122 It is not connected away from one end of foundation trench 130 away from one end of foundation trench 130 and the second planting groove 120 with the first planting groove 110.Even The material for connecing beam 122 can select reinforcing bar, angle bar etc., and tie-beam 122 is arranged at intervals at the first planting groove 110 and the second planting groove On 120 longitudinal direction, spacing distance is 1.5~1.8m.Tie-beam 122 not only plays firm first planting groove 110 and The effect of two planting grooves 120, while its interval setting, also allows for exposing foundation trench 130, from the light without influenceing foundation trench 130 Cooperation is used.
It should be noted that in the present embodiment, the first planting groove 110 is fixedly installed in basis by the first fixed part 110c On groove 130, and the second planting groove 120 is fixedly installed on foundation trench 130 by the second fixed part 120c, and the first planting groove 110 and second planting groove 120 consolidated by tie-beam 122.In other embodiments, it would however also be possible to employ other modes are carried out Install and fixed, for example:First planting groove 110 and the second planting groove are carried out using the mounting bracket 140 (such as Fig. 5) of triangle 120 installation;It is installed on foundation trench 130 using fastener (bolt etc.).
In the present embodiment, the first planting groove 110, the second planting groove 120 and the third plant groove 130 are strip, certainly, In other embodiments, the first planting groove 110, the second planting groove 120 and foundation trench 130 can also be arc, waveform etc..
The present embodiment additionally provides the cultural method that centella is carried out using the planting unit 100 of above-mentioned centella.Its bag Include following steps:
S1, the planting unit 100 for preparing centella:
Site preparation making ridge, the width in ridge face is 1.2~1.6m, and preferably 1.4m, the length in ridge face is set by landform, and ridge face is in Turtleback shape, basis of formation groove 130 after laying sandstone on ridge face.In foundation trench 130 top surface of the Zinc fractions of filling be with The relative plantation basal plane 133 of the groove bottom of foundation trench 130, wherein, the sandstone of laying are screened through river sand for building, should The diameter of sandstone is less than 0.02m, and the laying depth of sandstone is 0.03~0.05m, preferably 0.04m, then in the side in ridge face Carry out building the treatment of ridge safe edge using brick, prevent sandstone from sliding.
Then Culture media is separately filled with the first planting groove 110 and the second planting groove 120, and is closed using first The closure panel 121 of panel 111 and second is closed to be closed, wherein, it is pre- on the first closure panel 111 and the second closure panel 121 First offer multiple implantation holes 112 and multiple suckings 113.
First fixed part 110c of the first planting groove 110 is fixedly installed on the plantation basal plane 133 of foundation trench 130, together When the second fixed part 120c of the second planting groove 120 is fixedly installed on the plantation basal plane 133 of foundation trench 130, and Tie-beam 122 is installed in one end away from foundation trench 130 of one planting groove 110 and the second planting groove 120, for consolidating first kind of plant The planting groove 120 of groove 110 and second, and the first planting groove 110 and the inclination of the second planting groove 120 is installed on foundation trench 130 The planting unit 100 of the centella is formed, the planting unit 100 of centella forms three growing areas, expands cultivated area, Also the growth characteristics of centella are met.
When the first planting groove 110 and the second planting groove 120 is installed, make the first planting groove 110 and the second planting groove 120 equal Along the trough floor away from foundation trench 130 direction extend, by the first planting groove 110 away from foundation trench 130 side and second Planting groove 120 forms the exposure for exposing foundation trench 130 and opens away from the side of foundation trench 130 is close to each other and interval setting Mouth 118, wherein, the trough floor of the trough floor of the first planting groove 110 and the second planting groove 120 is oppositely arranged.
S3, plantation centella:
In 120 kinds of plant centellas of the first planting groove 110 and the second planting groove, and by the first planting groove 110 and second Centella is planted on foundation trench 130 in the exposure opening 118 that planting groove 120 is formed.
Specifically, first nursery forms centella, because the first planting groove 110 and the interval setting of the second planting groove 120 are formed Exposure opening 118, be not only easy to plant centella on foundation trench 130, moreover it is possible to ensure to plant in foundation trench 130 The growth characteristics of interior centella, and ensure its photosynthesis etc..Spacing between the centella planted in foundation trench 130 It is 0.4m.Then centella is planted in the implantation hole 112 of the first planting groove 110 and the second planting groove 120 respectively.Due to plantation The spacing in hole 112 is 0.3~0.5m, that is, ensure that the spacing between centella, for 0.3~0.5m, is reserved between centella Centella sprawl growth is easy in interval, and is taken root on the section of centella, and root grows to the first planting groove through sucking 113 110 or second in planting groove 120.
S4, harvesting centella:
Fig. 3 is referred to, the first planting groove 110, the second planting groove 120 and foundation trench 130 form three growing areas, by accumulated snow Three growing areas of grass carry out subregion and form multiple first pre- exploiting fields 114 and multiple first staying for continued growth procreation respectively Area 115 is planted, multiple first pre- exploiting fields 114 are arranged alternately with multiple first stud plots 115, the product in the first pre- exploiting field 114 of harvesting The centella of snow grass and the first stud plot 115 of reservation.Fig. 4 is by taking the first planting groove 110 as an example, to show in the first planting groove The schematic diagram of subregion is carried out on 110, the partitioning scenario on the second planting groove 120 and foundation trench 130 can refer to the first planting groove 110 subregion is carried out, and is no longer illustrated here.
Similarly, Fig. 4 is referred to, Fig. 4 is by taking the first planting groove 110 as an example, to show after repeatedly harvesting, the first planting groove Second schematic diagram of subregion is carried out on 110, second partitioning scenario on the second planting groove 120 and foundation trench 130 can join Subregion according to the first planting groove 110 is carried out, and is no longer illustrated here.Specifically, subregion repeatedly is carried out to growing area again after harvesting Form multiple second pre- exploiting fields 116 and multiple second stud plots 117 and harvested, wherein the first stud plot 115 is located at second In pre- exploiting field 116.That is to say, after repeatedly harvesting, the centella growth time in the first stud plot 115 is long, and rhizome is aging, Unsuitable continued growth procreation, so after repeatedly harvesting, by the centella harvesting in the first stud plot 115 before, and selecting new Centella continued growth procreation, update training strong.
Refer to Fig. 1, harvest foundation trench 130 on centella when, can be by the first clearance portion of the first planting groove 110 Second clearance portion 120b of 110b and the second planting groove 120 is harvested to the centella on foundation trench 130, and user directly will Hand is harvested by stretching into the first clearance portion 110b or the second clearance portion 120b, easy to operate.
Water-fertilizer integral facility is installed in centella plantation, beneficial to routine work management, accumulated snow is well grassed, growed Hurry up, at 4 points in sizzler at the beginning of mid-May summer to 10 months daily 10 thirty to afternoon is covered with sunshade net, heavy rain day masking, sunshade Net can injure blade from rainwater.
The planting unit 100 of centella provided using the present invention carries out accumulated snow grass planting, due to the first planting groove 110, The triangular structure that second planting groove 120 and foundation trench 130 are formed, i.e., with three growing areas, drastically increase soil profit With rate, increased yield (higher 3 times than conventional), meanwhile, using the facility cultivation, exempt from it is clear it is miscellaneous save artificial, be centella Application, promote and provide abundant raw material.Cultivating the centella for obtaining has quality higher, fresh and tender, up to quality of vegetable, Easily harvesting.
Embodiment one
Fig. 1 and Fig. 2 is refer to, site preparation, making ridge make ridge 1.4m wide, and the ridge back of the body is in turtleback shape, and length can set according to landform Put.Then sandstone basis of formation groove 130 is laid on ridge face, the diameter of sandstone is less than 0.02m, and laying depth is 0.03m, then Carry out building the treatment of ridge safe edge using brick in the side in ridge face, prevent sandstone from sliding.Then in the first planting groove 110 and second Filling substrate Nutrition Soil respectively is planted in groove 120, foundation trench 130 is used to planting the side of centella as plantation basal plane 133, by the One planting groove 110 and the second planting groove 120 are arranged at plantation basal plane 133, the trough floor and the second planting groove of the first planting groove 110 120 trough floor is oppositely arranged, and the first planting groove 110 is away from the side of foundation trench 130 and the second planting groove 120 away from foundation trench 130 side is close to each other and interval setting, forms the exposure opening 118 for exposing plantation basal plane 133.After installation, Form three growing areas.Then the careless seedling of centella is planted respectively on three growing areas, it is 0.3m to keep plantation spacing.Can To harvest during centella, harvested in the usual way.
Embodiment two
In the present embodiment, the mounting means of the first planting groove 110 and the second planting groove 120 is identical with embodiment one, can join According to Fig. 1, specifically, site preparation, making ridge make ridge 1.4m wide, and the ridge back of the body is in turtleback shape, and length can be set according to landform.Then in ridge Sandstone basis of formation groove 130 is laid on face, the diameter of sandstone is less than 0.02m, and laying depth is 0.04m, then in the side in ridge face Lateral dominance is carried out building the treatment of ridge safe edge with brick, prevents sandstone from sliding.Foundation trench 130 is used to plant the side of centella as plantation Basal plane 133, adjusts the setting angle of the first planting groove 110, and the first fixed part 110c is fixedly installed in into plantation basal plane 133 On, the setting angle of the second planting groove 120 is then adjusted, and the second fixed part 120c is fixedly installed on plantation basal plane 133, Then respectively to filling substrate Nutrition Soil in the first plantation portion 110a and the second plantation portion 120a, and the first closure panel is utilized 111 and second closure panel 121 closed, offer multiple in advance on the first closure panel 111 and the second closure panel 121 Implantation hole 112 and multiple suckings 113.By the first planting groove 110 and the second planting groove 120 along the groove away from foundation trench 130 The direction of base plate extends, and the first planting groove 110 is away from the side of foundation trench 130 and the second planting groove 120 away from foundation trench 130 Side is close to each other and interval setting, forms the exposure opening 118 of the plantation basal plane 133 for exposing foundation trench 130, the first The trough floor of the trough floor and the second planting groove 120 of planting groove 110 is oppositely arranged.After installation, three growing areas are formed.Then Plant the centella cultivated in advance respectively on three growing areas, wherein, by accumulated snow grass planting in the first planting groove 110 and second In the implantation hole 112 of planting groove 120, foundation trench 130 can be planted directly, and it is 0.4m to keep plantation spacing.Refer to Fig. 3 and Fig. 4, when that can harvest centella, carries out the growing area of centella subregion and forms multiple first pre- exploiting fields 114 and multiple the One stud plot 115, multiple first pre- exploiting fields 114 are arranged alternately with multiple first stud plots 115, in the first pre- exploiting field 114 of harvesting Centella and retain the first stud plot 115 centella.Repeatedly after harvesting, subregion is carried out to growing area again and forms multiple the Two pre- exploiting fields 116 and multiple second stud plots 117 are simultaneously harvested, wherein the first stud plot 115 is located at the second pre- exploiting field 116 It is interior, water-fertilizer integral setting is installed in the plantation of centella, it is easy to daily fertilising and management.
Embodiment three
Fig. 5 and Fig. 6 is refer to, site preparation, making ridge make ridge 1.6m wide, and the ridge back of the body is in turtleback shape, and length can set according to landform Put.Then sandstone basis of formation groove 130 is laid on ridge face, the diameter of sandstone is less than 0.02m, and laying depth is 0.05m, then Carry out building the treatment of ridge safe edge using brick in the side in ridge face, prevent sandstone from sliding.
In the present embodiment, the first planting groove 110 and the second planting groove 120 are to be installed on foundation trench by mounting bracket 140 130, specifically, mounting bracket 140 is provided with installing plate 141 and fixed mount 142, and installing plate 141 is connected to fixed mount 142, Angle between installing plate 141 and fixed mount 142 is about 50~70 degree, and fixed mount 142 is fixedly connected with foundation trench 130, so that Installing plate 141 is also inclined with foundation trench 130, the first gag lever post 143 and the second gag lever post 144 are provided with installing plate 141.This In embodiment, mounting bracket 140 is two, is respectively used to install the first planting groove 110 and the second planting groove 120, be that is to say, the One planting groove 110 is installed between first first gag lever post 143 and the second gag lever post 144 of mounting bracket 140, second kind of plant Groove 120 is installed between the first gag lever post 143 between second installation and the second gag lever post 144.By two mounting brackets 140 After installation, spacing of two installing plates 141 with the formation of foundation trench 130 between triangle, and two installing plates 141 is along perpendicular to base The direction of plinth groove 130 is gradually reduced, and when on two installing plates 141, i.e., the first planting groove 110 and the second planting groove 120 are arranged at Triangle is formed with foundation trench 130.
Then in the first planting groove 110 and the second planting groove 120 distinguish filling substrate Nutrition Soil, and using first close The closure panel 121 of panel 111 and second is closed, and is offered in advance on the first closure panel 111 and the second closure panel 121 Implantation hole 112 and sucking 113.Two mounting brackets 140 are respectively arranged on the plantation basal plane 133 of foundation trench 130, then First planting groove 110 and the second planting groove 120 are respectively arranged in two mounting brackets 140, after installation, three is formed Growing area.Then the centella for cultivating in advance is planted respectively on three growing areas, wherein, by accumulated snow grass planting in the first Plant in the implantation hole 112 of the planting groove 120 of groove 110 and second, foundation trench 130 can be planted directly, holding plantation spacing is 0.5m.In the present embodiment, the picking methods of centella are identical with embodiment two, can refer to Fig. 3 and Fig. 4, specifically, can adopt When receiving centella, the growing area of centella is carried out into subregion and forms multiple first pre- exploiting fields 114 and multiple first stud plots 115, Multiple first pre- exploiting fields 114 are arranged alternately with multiple first stud plots 115, and the centella in the first pre- exploiting field 114 of harvesting simultaneously protects Stay the centella of the first stud plot 115.Repeatedly after harvesting, subregion is carried out to growing area again and forms multiple second pre- exploiting fields 116 With multiple second stud plots 117 and harvested, wherein the first stud plot 115 is located in the second pre- exploiting field 116, the kind of centella Water-fertilizer integral setting is installed in plant garden, is easy to daily fertilising and management.
Centella per mu yield about 300kg in the prior art, and use the cultural method of the centella that the present embodiment provides can The yield of about 2000kg is obtained, yield is not only improve only, and improves land utilization ratio, and the quality of centella is high, harvesting Easily.
Embodiments described above is a part of embodiment of the invention, rather than whole embodiments.Reality of the invention The detailed description for applying example is not intended to limit the scope of claimed invention, but is merely representative of selected implementation of the invention Example.Based on the embodiment in the present invention, what those of ordinary skill in the art were obtained under the premise of creative work is not made Every other embodiment, belongs to the scope of protection of the invention.

Claims (10)

1. a kind of planting unit of centella, it is characterised in that it includes foundation trench, the first planting groove and the second planting groove, The foundation trench includes plantation basal plane, and first planting groove and second planting groove are arranged at the plantation basal plane, described The trough floor of the trough floor of the first planting groove and second planting groove is oppositely arranged, and first planting groove is away from the base The side of plinth groove and second planting groove are formed for exposing away from the side of the foundation trench is close to each other and interval setting The exposure opening of the plantation basal plane.
2. the planting unit of centella according to claim 1, it is characterised in that the planting unit of the centella is also wrapped The first closure panel of the notch for closing first planting groove is included, and for closing the notch of second planting groove The second closure panel, multiple implantation holes are offered on first closure panel and second closure panel and multiple are inhaled Batter.
3. the planting unit of centella according to claim 2, it is characterised in that multiple implantation holes are arranged as many Row, spacing between implantation hole described in two rows of arbitrary neighborhood is 0.3~0.5m, and implantation hole described in two rows of arbitrary neighborhood it Between be provided with array arrange multiple described sucking, often row and two suckings of each column arbitrary neighborhood between Away from being 0.06~0.1m.
4. the planting unit of centella according to claim 2, it is characterised in that first planting groove includes that first consolidates Determine portion, the first plantation portion and the first clearance portion being arranged between first fixed part and first plantation portion, it is described Fixed part stretches into the foundation trench and is fixedly connected with the foundation trench away from one end of the clearance portion, first closing face Plate is connected with the plantation portion.
5. the planting unit of centella according to claim 1, it is characterised in that the planting unit of the centella is also wrapped Mounting bracket is included, the mounting bracket includes installing plate and fixed mount, and the installing plate is connected to the fixed mount, the fixation Frame is connected with the foundation trench, and the installing plate is provided with the first gag lever post and the second gag lever post, and first planting groove is installed Between first gag lever post and second gag lever post.
6. the planting unit of centella according to claim 1, it is characterised in that the foundation trench is after site preparation making ridge Lay what sandstone layer was formed on the ridge face of formation, the side in the ridge face is equipped with the shield for preventing the sandstone of the sandstone layer from dropping Boundary layer;Wherein, the sandstone particle diameter of the sandstone layer is less than 0.02m, and the laying depth of the sandstone layer is 0.03~0.05m.
7. the planting unit of centella according to claim 1, it is characterised in that the trough floor of first planting groove with The angle of the trough floor of the foundation trench is 50~70 degree, the trough floor of second planting groove and the trough floor of the foundation trench Angle also be 50~70 degree.
8. a kind of cultural method of centella, it is characterised in that it includes:
Build planting unit:Site preparation making ridge basis of formation groove, the foundation trench includes plantation basal plane, by the first planting groove and second Planting groove is installed on the plantation basal plane, and makes the trough floor phase of the trough floor of first planting groove and second planting groove To set, and make first planting groove away from the side of the foundation trench with second planting groove away from the foundation trench Side is close to each other and interval setting, forms the exposure opening for exposing the plantation basal plane;And
Plantation:The centella is planted on the foundation trench, first planting groove and second planting groove.
9. the cultural method of centella according to claim 8, it is characterised in that also include after the plantation:
Harvesting:The foundation trench, first planting groove and second planting groove are carried out into subregion respectively and forms multiple the Stayed with multiple described first in one pre- exploiting field and multiple the first stud plots for continued growth procreation, multiple first pre- exploiting fields Plant area to be arranged alternately, harvest the centella in the first pre- exploiting field and retain the accumulated snow of first stud plot Grass.
10. the cultural method of centella according to claim 9, it is characterised in that repeatedly after harvesting, again respectively to institute State foundation trench, first planting groove and second planting groove and carry out subregion and form multiple second pre- exploiting fields and multiple second Stud plot is simultaneously harvested, wherein first stud plot is located in the described second pre- exploiting field.
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