CN106598314A - 一种内嵌式触摸屏、显示装置及其驱动方法 - Google Patents
一种内嵌式触摸屏、显示装置及其驱动方法 Download PDFInfo
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Abstract
本发明公开了一种内嵌式触摸屏、显示装置及其驱动方法,增加了设置于触控检测电极所在膜层与阵列基板的衬底基板之间的触控压力感应电极,触控压力感应电极可以与位于阵列基板下方的金属层形成电容结构,在触控压力感应电极所在位置被按压时与金属层之间的距离产生变化随之带来电容的变化,因此,在触控时间段,触控侦测芯片可以通过检测各触控检测电极的电容值变化而判断出触控位置,并且通过检测触控压力感应电极的电容值变化而判断出触控位置压力的大小。将触控压力感应电极整合于触摸屏内部,在进行触控探测的同时实现了压力感应的功能,对于显示装置的结构设计改动较小,不会受到装配公差限制,有利于实现更好的探测精度,且节省了制作成本。
Description
技术领域
本发明涉及触控技术领域,尤其涉及一种内嵌式触摸屏、显示装置及其驱动方法。
背景技术
压力感应技术是指对外部受力能够实施探测的技术,这项技术很久前就运用在工控,医疗等领域。目前,在显示领域尤其是手机或平板领域实现压力感应的方式是在液晶显示面板的背光部分或者手机的中框部分增加额外的机构来实现,这种设计需要对液晶显示面板或者手机的结构设计做出改动,而且由于装配公差较大,这种设计的探测准确性也受到了限制。
因此,如何在显示面板硬件改动较小的情况下实现探测精度较高的压力感应,是本领技术人员域亟需解决的问题。
发明内容
有鉴于此,本发明实施例提供了一种内嵌式触摸屏、显示装置及其驱动方法,用以在触摸屏内实现高精度压力感应的探测。
因此,本发明实施例提供的一种内嵌式触摸屏,包括相对而置的阵列基板和对向基板,以及设置于所述阵列基板面向所述对向基板一侧和/或所述对向基板面向所述阵列基板一侧的触控检测电极,还包括:
设置于所述触控检测电极所在膜层与所述阵列基板的衬底基板之间的触控压力感应电极,所述触控压力感应电极与位于所述阵列基板下方的金属层形成电容结构;
在触控时间段,同时对所述触控检测电极和触控压力感应电极加载触控检测信号,通过检测各所述触控检测电极的电容值变化以判断触控位置,且通过检测所述触控压力感应电极的电容值变化以判断触控位置压力大小的触控侦测芯片。
在一种可能的实现方式中,在本发明实施例提供的上述内嵌式触摸屏中,还包括:设置于所述对向基板面向所述阵列基板的一侧,或设置于所述阵列基板面向所述对向基板的一侧的黑矩阵层;
各所述触控压力感应电极的图形在所述阵列基板上的正投影位于所述黑矩阵层的图形所在区域内。
在一种可能的实现方式中,在本发明实施例提供的上述内嵌式触摸屏中,各所述触控压力感应电极的图形为在所述阵列基板上的正投影位于所述黑矩阵层的图形所在区域内的网格状结构。
在一种可能的实现方式中,在本发明实施例提供的上述内嵌式触摸屏中,所述阵列基板具有顶栅型薄膜晶体管,在所述顶栅型薄膜晶体管所在膜层与所述阵列基板的衬底基板之间设置有用于遮挡所述顶栅型薄膜晶体管的有源层图案的遮挡电极;
各所述触控压力感应电极与所述遮挡电极同层设置。
在一种可能的实现方式中,在本发明实施例提供的上述内嵌式触摸屏中,所述触控压力感应电极与该触控压力感应电极具有的网格状结构所包围的所述遮挡电极电性相连。
在一种可能的实现方式中,在本发明实施例提供的上述内嵌式触摸屏中,沿着所述阵列基板的中心区域指向边缘区域的方向,各所述触控压力感应电极所在区域在所述阵列基板上所占面积逐渐变大;和/或,
沿着所述阵列基板的中心区域指向边缘区域的方向,在单位面积内所述触控压力感应电极的个数逐渐变小。
在一种可能的实现方式中,在本发明实施例提供的上述内嵌式触摸屏中,所述触控检测电极为多个同层设置且相互独立的自电容电极;或,
所述触控检测电极为交叉设置的触控驱动电极和触控感应电极。
在一种可能的实现方式中,在本发明实施例提供的上述内嵌式触摸屏中,各所述自电容电极组成所述阵列基板上的公共电极层。
在一种可能的实现方式中,在本发明实施例提供的上述内嵌式触摸屏中,在触控时间段,所述阵列基板中的栅线和数据线加载与所述触控检测信号相同的电信号。
本发明实施例提供的一种显示装置,包括本发明实施例提供的上述内嵌式触摸屏,以及设置在内嵌式触摸屏的阵列基板下方的金属层。
在一种可能的实现方式中,在本发明实施例提供的上述显示装置中,所述金属层为手机的中框或背光模组背面的背光金属。
本发明实施例提供的上述显示装置的驱动方法,包括:
在触摸屏显示每一帧的时间的触控时间段,同时对触控检测电极和触控压力感应电极加载触控检测信号,通过检测各所述触控检测电极的电容值变化以判断触控位置,并通过检测所述触控压力感应电极的电容值变化以判断触控位置压力大小。
在一种可能的实现方式中,本发明实施例提供的上述内嵌式触摸屏的驱动方法,还包括:在触控时间段,对阵列基板中的栅线和数据线加载与所述触控检测信号相同的电信号。
本发明实施例的有益效果包括:
本发明实施例提供的一种内嵌式触摸屏、显示装置及其驱动方法,在内嵌式触摸屏的结构内增加了设置于触控检测电极所在膜层与阵列基板的衬底基板之间的触控压力感应电极,增加的触控压力感应电极可以与位于阵列基板下方的金属层形成电容结构,在触控压力感应电极所在位置被按压时,触控压力感应电极与金属层之间的距离产生变化随之带来两者之间电容的变化。因此,在触控时间段,触控侦测芯片可以同时对触控检测电极和触控压力感应电极加载触控检测信号,通过检测各触控检测电极的电容值变化可以判断出触控位置,实现了触控侦测功能,并且通过检测触控压力感应电极的电容值变化可以判断触控位置压力大小,实现了压力感应功能。本发明实施例提供的上述内嵌式触摸屏将触控压力感应电极整合于触摸屏内部,在进行触控探测的同时实现了压力感应的功能,对于显示装置的结构设计改动较小,不会受到装配公差的限制,有利于实现更好的探测精度,且有利于节省制作成本。
附图说明
图1为本发明实施例提供的内嵌式触摸屏的结构示意图;
图2a和图2b分别为本发明实施例提供的内嵌式触摸屏中触控压力感应电极分布的俯视示意图;
图3为本发明实施例提供的内嵌式触摸屏中阵列基板的结构示意图;
图4为本发明实施例提供的内嵌式触摸屏中一个触控压力感应电极的示意图;
图5为本发明实施例提供的内嵌式触摸屏的驱动时序示意图。
具体实施方式
下面结合附图,对本发明实施例提供的内嵌式触摸屏、显示装置及其驱动方法的具体实施方式进行详细地说明。
附图中各膜层的厚度和形状不反映真实比例,目的只是示意说明本发明内容。
本发明实施例提供的一种内嵌式触摸屏,如图1所示,包括相对而置的阵列基板100和对向基板200,以及设置于阵列基板100面向对向基板200一侧和/或对向基板200面向阵列基板100一侧的触控检测电极300,图1中以触控检测电极300设置在阵列基板100上为例进行说明,还包括:
设置于触控检测电极300所在膜层与阵列基板100的衬底基板101之间的触控压力感应电极400,触控压力感应电极400可以与位于阵列基板100下方的金属层500形成电容结构;
在触控时间段,同时对触控检测电极300和触控压力感应电极400加载触控检测信号,通过检测各触控检测电极300的电容值变化以判断触控位置,且通过检测触控压力感应电极400的电容值变化以判断触控位置压力大小的触控侦测芯片600。
本发明实施例提供的上述内嵌式触摸屏,在内嵌式触摸屏的结构内增加了设置于触控检测电极300所在膜层与阵列基板100的衬底基板101之间的触控压力感应电极400,增加的触控压力感应电极400可以与位于阵列基板100下方的金属层500形成电容结构,在触控压力感应电极400所在位置被按压时,触控压力感应电极400与金属层500之间的距离产生变化随之带来两者之间电容的变化,因此,在触控时间段,触控侦测芯片600可以同时对触控检测电极300和触控压力感应电极400加载触控检测信号,通过检测各触控检测电极300的电容值变化可以判断出触控位置,实现了触控侦测功能,并且通过检测触控压力感应电极400的电容值变化可以判断触控位置压力大小,实现了压力感应功能。本发明实施例提供的上述内嵌式触摸屏将触控压力感应电极400整合于触摸屏内部,在进行触控探测的同时实现了压力感应的功能,对于显示装置的结构设计改动较小,不会受到装配公差的限制,有利于实现更好的探测精度,且有利于节省制作成本。
在具体实施时,本发明实施例提供的上述内嵌式触摸屏中增加的触控压力感应电极400一般采用金属材料制作,为了使增加的触控压力感应电极400不影响显示区域的开口率,各触控压力感应电极400的图形一般会被黑矩阵层201的图形遮挡,即各触控压力感应电极400的图形在阵列基板上的正投影位于黑矩阵层201的图形所在区域内。如图1所示,该黑矩阵层201具体可以设置在对向基板200面向阵列基板100的一侧,也可以置在阵列基板100面向对向基板200的一侧,在此不做具体限定。
并且,在具体实施时,如图2a所示,各触控压力感应电极400的图形一般设置为在阵列基板100上的正投影位于黑矩阵层201的图形所在区域内的网格状结构,该网格状结构具体由与栅线延伸方向相同的横向条状结构和与数据线延伸方向相同的纵向条状结构组成。当然各触控压力感应电极400的图形也可以仅设置成横向条状结构,还可以仅设置成纵向条状结构,根据可以实际参数进行设计,在此不做限定。
具体地,在本发明实施例提供的上述内嵌式触摸屏中,可以根据具体所需探测的触控压力的精度,具体设置各触控压力感应电极400的尺寸和间隙。并且,由于内嵌式触摸屏一般是利用边框区域固定于显示装置的外框上,因此,采用相同力度按压内嵌式触摸屏的中心区域和边缘区域时,中心区域的触控压力感应电极400更容易将压力转换为与下方的金属层500之间的距离变化,即中心区域对于压力更敏感,因此,在具体设计时,为了使触摸屏整个面板的压力感应灵敏度相对均匀,如图2b所示,可以沿着阵列基板100的中心区域指向边缘区域的方向,将各触控压力感应电极400所在区域在阵列基板100上所占面积逐渐变大;或者,沿着阵列基板100的中心区域指向边缘区域的方向,在单位面积内触控压力感应电极400的个数逐渐变小;或者,沿着阵列基板100的中心区域指向边缘区域的方向,将各触控感应压力电极400所在区域在阵列基板100上所占面积逐渐变大,同时,在单位面积内触控压力感应电极400的个数逐渐变小。
目前,在显示面板内使用的阵列基板100中的薄膜晶体管一般采用非晶硅制作有源层,由于非晶硅存在本身自有的缺陷会导致薄膜晶体管的开态电流低、迁移率低、稳定性差等问题,使它在很多领域受到了限制,为了弥补非晶硅本身缺陷,采用低温多晶硅(Low Temperature Poly-Silicon,LTPS)作为有源层的薄膜晶体管阵列基板应运而生。目前的低温多晶硅薄膜晶体管阵列基板多为顶栅型薄膜晶体管结构,如图3所示,主要包括:在衬底基板101上依次设置的有源层011、栅极012、源漏极013等膜层;并且,源漏极013和栅极012的位置可以互换,即可以先形成栅极012然后形成源漏极013,也可以先形成源漏极013然后形成栅极012,在此不做限定,以下都是以图3所示的先形成栅极012然后形成源漏极013为例进行说明。其中,为了避免背光源的光线照射到有源层011而产生光生载流子从而影响薄膜晶体管的性能,在阵列基板中,在有源层011的下方还设置有避免光线照射到有源层011上的遮挡电极014。即在阵列基板100具有顶栅型薄膜晶体管时,在顶栅型薄膜晶体管所在膜层与阵列基板的衬底基板101之间设置有用于遮挡顶栅型薄膜晶体管的有源层011图案的遮挡电极014。
一般地,如图3所示,该遮挡电极014与有源层011的图形一致。因此,本发明实施例提供的上述内嵌式触摸屏在具体实施时,如图3所示,可以在遮挡电极014所在膜层制作增加的触控压力感应电极400,即将各触控压力感应电极400与遮挡电极014同层设置。这样,在现有的阵列基板制备工艺的基础上,不需要增加额外的工艺,可以节省生产成本,提高生产效率。
进一步地,在本发明实施例提供的上述内嵌式触摸屏中,为了增加各触控压力感应电极400的感应面积,如图4所示,可以将触控压力感应电极400与该触控压力感应电极400具有的网格状结构所包围的遮挡电极014电性相连。
具体地,在阵列基板的顶栅型薄膜晶体管之上,如图3所示,一般还包括:公共电极层015和像素电极016;其中,公共电极层015和像素电极016的位置可以互换,即公共电极层015可以作为板状电极位于下层(更靠近衬底基板),像素电极016作为狭缝电极位于上层(更靠近液晶层);也可以像素电极016作为板状电极位于下层(更靠近衬底基板),公共电极层015作为狭缝电极位于上层(更靠近液晶层)。当然,还可以将公共电极层015设置在与阵列基板100相对而置的对向基板200上,即在阵列基板100上不设置公共电极层015。下面都是以图3所示的公共电极层015设置在像素电极016下方为例进行说明。
在具体实施时,本发明实施例提供的内嵌式触摸屏中,用于触控侦测的触控检测电极的具体结构可以有多种实现方式,例如,触控检测电极可以由多个同层设置且相互独立的自电容电极组成;触控检测电极也可以由交叉设置的触控驱动电极和触控感应电极组成。
其中,当采用自电容电极实现触控侦测功能时,可以采用阵列基板100中的公共电极层015复用自电容电极,即各自电容电极组成阵列基板100上的公共电极层015,如图3所示,在将公共电极层015的结构进行变更分割成自电容电极时,在现有的阵列基板制备工艺的基础上,不需要增加额外的工艺,可以节省生产成本,提高生产效率。
具体地,在本发明实施例提供的上述内嵌式触摸屏中,为了减少显示和触控信号之间的相互干扰,在具体实施时,需要采用触控和显示阶段分时驱动的方式,并且,在具体实施时还可以将显示驱动芯片和触控侦测芯片整合为一个芯片,进一步降低生产成本。
具体地,例如:如图5所示的驱动时序图中,将触摸屏显示每一帧(V-sync)的时间分成显示时间段(Display)和触控时间段(Touch)。在显示时间段(Display),对触摸屏中的每条栅极信号线Gate依次施加栅扫描信号,对数据信号线Sourse施加灰阶信号;当采用公共电极层复用自电容电极时,与各自电容电极Cm连接的触控侦测芯片向各自电容电极Cm分别施加公共电极信号,以实现液晶显示功能。在触控时间段(Touch),如图5所示,与各自电容电极Cm连接的触控侦测芯片向各自电容电极Cm和各触控压力感应电极Ls同时施加触控检测信号,同时接收各自电容电极Cm和各触控压力感应电极Ls的反馈信号,通过对反馈信号的分析判断是否发生触控以及感应压力的大小,以同时实现触控和感应压力的功能。
进一步地,如图5所示,为了避免在触控时间段(Touch)阵列基板中的栅线和数据线与触控压力感应电极之间产生对地电容从而影响压力感应的准确性,在具体实施时,在触控时间段,可以对阵列基板中的栅线和数据线加载与所述触控检测信号相同的电信号,这样可以消除栅线和数据线与触控压力感应电极之间的对地电容,便于提高压力感应的准确性。
需要说明的是,本发明实施例提供的上述触摸屏具体可以应用于液晶显示面板(Liquid Crystal Display,LCD),或者,也可以应用于有机电致发光显示面板(Organic Electroluminesecent Display,OLED),或者,还可以应用于其他显示面板,在此不做限定。
基于同一发明构思,本发明实施例还提供了一种显示装置,包括本发明实施例提供的上述内嵌式触摸屏,以及设置在内嵌式触摸屏的阵列基板下方的金属层。该显示装置可以为:手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。该显示装置的实施可以参见上述内嵌式触摸屏的实施例,重复之处不再赘述。
具体地,当本发明实施例提供的上述显示装置为手机时,设置在触摸屏下方的金属层可以为手机的中框,当本发明实施例提供的上述显示装置的触摸屏采用液晶显示面板时,设置在触摸屏下方的金属层可以是背光模组背面的背光金属。并且,该背光金属可以具体为包覆在背光模组外侧的金属框,也可以具体为贴覆于背光模组背面的金属贴片,在此不做限定。
基于同一发明构思,本发明实施例还提供了一种上述显示装置的驱动方法,包括:
在触摸屏显示每一帧的时间的触控时间段,同时对触控检测电极和触控压力感应电极加载触控检测信号,通过检测各所述触控检测电极的电容值变化以判断触控位置,并通过检测所述触控压力感应电极的电容值变化以判断触控位置压力大小。
进一步地,在上述驱动方法中,还包括:在触控时间段,对阵列基板中的栅线和数据线加载与所述触控检测信号相同的电信号。
本发明实施例提供的上述内嵌式触摸屏、显示装置及其驱动方法,在内嵌式触摸屏的结构内增加了设置于触控检测电极所在膜层与阵列基板的衬底基板之间的触控压力感应电极,增加的触控压力感应电极可以与位于阵列基板下方的金属层形成电容结构,在触控压力感应电极所在位置被按压时,触控压力感应电极与金属层之间的距离产生变化随之带来两者之间电容的变化。因此,在触控时间段,触控侦测芯片可以同时对触控检测电极和触控压力感应电极加载触控检测信号,通过检测各触控检测电极的电容值变化可以判断出触控位置,实现了触控侦测功能,并且通过检测触控压力感应电极的电容值变化可以判断触控位置压力大小,实现了压力感应功能。本发明实施例提供的上述内嵌式触摸屏将触控压力感应电极整合于触摸屏内部,在进行触控探测的同时实现了压力感应的功能,对于显示装置的结构设计改动较小,不会受到装配公差的限制,有利于实现更好的探测精度,且有利于节省制作成本。
显然,本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样,倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内,则本发明也意图包含这些改动和变型在内。
Claims (13)
1.一种内嵌式触摸屏,包括相对而置的阵列基板和对向基板,以及设置于所述阵列基板面向所述对向基板一侧和/或所述对向基板面向所述阵列基板一侧的触控检测电极,其特征在于,还包括:
设置于所述触控检测电极所在膜层与所述阵列基板的衬底基板之间的触控压力感应电极,所述触控压力感应电极与位于所述阵列基板下方的金属层形成电容结构;
在触控时间段,同时对所述触控检测电极和触控压力感应电极加载触控检测信号,通过检测各所述触控检测电极的电容值变化以判断触控位置,且通过检测所述触控压力感应电极的电容值变化以判断触控位置压力大小的触控侦测芯片。
2.如权利要求1所述的内嵌式触摸屏,其特征在于,还包括:设置于所述对向基板面向所述阵列基板的一侧,或设置于所述阵列基板面向所述对向基板的一侧的黑矩阵层;
各所述触控压力感应电极的图形在所述阵列基板上的正投影位于所述黑矩阵层的图形所在区域内。
3.如权利要求2所述的内嵌式触摸屏,其特征在于,各所述触控压力感应电极的图形为在所述阵列基板上的正投影位于所述黑矩阵层的图形所在区域内的网格状结构。
4.如权利要求3所述的内嵌式触摸屏,其特征在于,所述阵列基板具有顶栅型薄膜晶体管,在所述顶栅型薄膜晶体管所在膜层与所述阵列基板的衬底基板之间设置有用于遮挡所述顶栅型薄膜晶体管的有源层图案的遮挡电极;
各所述触控压力感应电极与所述遮挡电极同层设置。
5.如权利要求4所述的内嵌式触摸屏,其特征在于,所述触控压力感应电极与该触控压力感应电极具有的网格状结构所包围的所述遮挡电极电性相连。
6.如权利要求1-5任一项所述的内嵌式触摸屏,其特征在于,沿着所述阵列基板的中心区域指向边缘区域的方向,各所述触控压力感应电极所在区域在所述阵列基板上所占面积逐渐变大;和/或,
沿着所述阵列基板的中心区域指向边缘区域的方向,在单位面积内所述触控压力感应电极的个数逐渐变小。
7.如权利要求1-5任一项所述的内嵌式触摸屏,其特征在于,所述触控检测电极为多个同层设置且相互独立的自电容电极;或,
所述触控检测电极为交叉设置的触控驱动电极和触控感应电极。
8.如权利要求7所述的内嵌式触摸屏,其特征在于,各所述自电容电极组成所述阵列基板上的公共电极层。
9.如权利要求1-5任一项所述的内嵌式触摸屏,其特征在于,在触控时间段,所述阵列基板中的栅线和数据线加载与所述触控检测信号相同的电信号。
10.一种显示装置,其特征在于,包括如权利要求1-9任一项所述的内嵌式触摸屏,以及设置在内嵌式触摸屏的阵列基板下方的金属层。
11.如权利要求10所述的显示装置,其特征在于,所述金属层为手机的中框或背光模组背面的背光金属。
12.一种如权利要求10或11所述的显示装置的驱动方法,其特征在于,包括:
在触摸屏显示每一帧的时间的触控时间段,同时对触控检测电极和触控压力感应电极加载触控检测信号,通过检测各所述触控检测电极的电容值变化以判断触控位置,并通过检测所述触控压力感应电极的电容值变化以判断触控位置压力大小。
13.如权利要求12所述的驱动方法,其特征在于,还包括:
在触控时间段,对阵列基板中的栅线和数据线加载与所述触控检测信号相同的电信号。
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