CN106565281B - 一种带有金属颗粒和光泽的全抛釉陶瓷砖及其制备方法 - Google Patents

一种带有金属颗粒和光泽的全抛釉陶瓷砖及其制备方法 Download PDF

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CN106565281B
CN106565281B CN201611000670.9A CN201611000670A CN106565281B CN 106565281 B CN106565281 B CN 106565281B CN 201611000670 A CN201611000670 A CN 201611000670A CN 106565281 B CN106565281 B CN 106565281B
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萧礼标
李惠文
梁超成
李国平
黄玲艳
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Monalisa Group Co Ltd
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Abstract

本发明涉及一种带有金属颗粒和光泽的全抛釉陶瓷砖及其制备方法,所述全抛釉陶瓷砖由下而上依次包括:坯体、面釉层、图案层和透明全抛釉层,所述透明全抛釉层内部含有金属颗粒且表面有金属颗粒露出。本发明的全抛釉陶瓷砖,在透明全抛釉层中包裹了金属颗粒,形成了立体感较强、自然流畅的金属光泽颗粒的视觉效果。

Description

一种带有金属颗粒和光泽的全抛釉陶瓷砖及其制备方法
技术领域
本发明涉及陶瓷砖制备技术领域,尤其是涉及一种带有金属颗粒和光泽的全抛釉陶瓷砖及其制备方法。
背景技术
目前全抛釉陶瓷产品传统的生产工艺是在砖坯表面施一层面釉,然后进行印花装饰,最后淋一层无机透明全抛釉料进行烧成。然而,经该生产工艺制得的全抛釉陶瓷砖立体感不强,视觉效果不够丰富。若能将金属颗粒引入陶瓷砖表面,则可使其具有金属颗粒质感和光泽效果。目前常规的将金属颗粒增加到产品的表面的方法是通过二次布料(例如参见CN105781067A)或者撒干粒的方法来实现。但二次布料会把颗粒置于釉层下面而抛光后无法产生金属光泽的效果,而撒干粒浮于釉层表面的层次单一且无法结合紧密。
发明内容
针对上述问题,本发明的目的在于提供一种金属颗粒包裹于抛釉陶瓷砖的表层釉料里面的全抛釉陶瓷砖及其制备方法。
一方面,本发明提供一种带有金属颗粒和光泽的全抛釉陶瓷砖,其由下而上依次包括:坯体、面釉层、图案层和透明全抛釉层,所述透明全抛釉层内部含有金属颗粒且表面有金属颗粒露出。
本发明的全抛釉陶瓷砖,在透明全抛釉层中包裹了金属颗粒,形成了立体感较强、自然流畅的金属光泽颗粒的视觉效果。本发明解决了二次布料会把颗粒置于釉层下面而抛光后无法产生金属光泽的效果的问题,也避免了撒干粒浮于釉层表面的层次单一且无法结合紧密的缺点,可以让金属颗粒效果显现得真正的三维立体。
较佳地,所述金属颗粒的熔点高于所述透明全抛釉层的釉料的烧成温度。
较佳地,所述金属颗粒为在空气中能稳定存在的金属。
较佳地,所述金属颗粒的粒径为80目~100目。
较佳地,所述金属颗粒为铬。铬具有很高的耐腐蚀性,在空气中,即便是在赤热的状态下,氧化也很慢,并且金属铬在抛光后具有很强的银亮色金属光泽,能和全抛釉的光泽形成反差,形成更立体丰富的视觉效果。
另一方面,本发明提供上述全抛釉陶瓷砖的制备方法,包括以下步骤:
(1)在坯体表面依次施面釉、印花装饰、施加混合有金属颗粒的全抛釉;
(2)将步骤(1)得到的砖坯烧成、抛光。
本发明采用金属颗粒与透明釉料的混合烧成,经过抛光后在产品表面形成立体感较强、自然流畅的金属光泽颗粒的视觉效果。金属颗粒烧成后在全抛釉里面,抛光后一部分金属颗粒也连同釉面一起被抛光,散发出和釉面光泽不同的金属光泽来。
较佳地,金属颗粒的加入量为全抛釉重量的2~3%。
较佳地,通过钟罩淋釉的方式施加混合有金属颗粒的全抛釉。根据本发明,使用钟罩淋釉的方式将金属颗粒加入到釉浆里面来一起施到砖坯表面,可控制好各种参数指标,简单快捷。
较佳地,全抛釉的比重控制在1.80~1.85,流速控制在28~25秒之间,施釉比重控制在515~560克/m2
较佳地,烧成温度为1200~1220℃。
附图说明
图1为本发明的全抛釉陶瓷砖的剖视示意图。
具体实施方式
以下通过下述实施方式进一步说明本发明,应理解,下述实施方式仅用于说明本发明,而非限制本发明。
本发明的全抛釉陶瓷砖,由下而上依次包括:坯体1、面釉层2、图案层(未示出)和透明全抛釉层3,所述透明全抛釉层3内部含有金属颗粒4且表面有金属颗粒4露出(参见图1)。金属颗粒不浮于透明全抛釉层之上。金属颗粒散发出和釉面光泽不同的金属光泽。
坯体可以是常用的陶瓷砖用坯体。在一个示例中,坯体的组分为:62~67wt%SiO2、20~23wt%Al2O3、1.0~1.2wt%Fe2O3、0.3~0.4wt%TiO2、0.3~0.5wt%CaO、0.5~0.8wt%MgO、2.7~3.2wt%K2O和2.3~2.7wt%Na2O。坯体的厚度可为10.5~10.9mm。
面釉层可以是由常用的陶瓷砖用面釉形成。在一个示例中,面釉层的组分为:57~62wt%SiO2、22~25wt%Al2O3、0.1~0.5wt%CaO、0.2~0.4wt%MgO、3.5~4.2wt%K2O和2.3~2.7wt%Na2O。面釉层的厚度可为0.15~0.18mm。面釉采用喷釉或者淋釉的方式均可以。
图案层可通过喷墨打印形成。喷墨图案的设计:由于在全抛釉中加入了金属颗粒后具有很多小点状的质感和光泽,所以可以针对这一特点专门进行图案设计,使喷墨图案与金属颗粒相配合,形成更为和谐、丰富的视觉效果。在一个示例中,选用了砂岩石材风格作为产品的图案基础,再进行艺术设计,将各种斑点的间距、颜色、位置与金属干粒(颗粒)有机地结合在一起。
金属颗粒
选用金属颗粒时,可考虑以下几项重要的性能参数。其一,为了使烧成后仍保持金属细颗粒质感效果,优选的是金属颗粒的烧成温度不能太低,金属颗粒在烧成过程中不显熔融状态。因此,金属颗粒的熔点优选为大于烧成温度,例如金属颗粒的熔点可以高于烧成温度530~570℃。其二,金属颗粒最好是抛光后的光泽度好,能够在高亮度的全抛釉里显现出独特的光泽,加强光泽的立体效果。其三,金属干粒的粒径范围优选为80目~100目。由此可以保证干粒在砖面上的分布层次是最自然最丰富的。若粒径过小,则颗粒的层次和光泽效果不明显,若粒径过大,则会在钟罩淋釉过程中沉淀而无法淋釉。其四,金属颗粒优选为在空气中不容易氧化,具有很强的耐腐蚀性。在一个示例中,综合以上四点考虑,选用了熔点为1857±20℃的金属铬粉。选用金属铬粉的理由是由于熔点够高和耐腐蚀性,并且抛光后的亮银色能够和全抛釉料的光泽拉开差距。具体而言,铬的熔点较高,在烧成时不显熔融状态。而且,铬具有很高的耐腐蚀性,在空气中,即便是在赤热的状态下,氧化也很慢,并且金属铬在抛光后具有很强的银亮色金属光泽,能和全抛釉的光泽形成反差。
全抛釉层
全抛釉层的厚度可为0.2~0.3mm。全抛釉可使用常用的透明釉料,例如无机透明釉料。在一个示例中,全抛釉的组分为:50~55wt%SiO2、14~16wt%Al2O3、4~5wt%ZnO、11~13wt%CaO、4~4.6wt%MgO、0.5~0.8wt%K2O和2.5~2.8wt%Na2O。
本发明中,可通过将金属颗粒(例如铬粉)混合于全抛釉一起施加到砖面上的方式来实现金属颗粒包裹于表层釉料里面。将金属颗粒混合于全抛釉的方法可为直接在钟罩淋釉的上釉缸里加入。金属颗粒的加入量可为全抛釉的2~3wt%。若金属颗粒加入量小于2wt%,则颗粒太稀少起不到效果;若金属颗粒加入量大于3wt%,则颗粒太密集了视觉上会适得其反。
全抛釉的比重可控制在1.80~1.85,流速可在28~25秒之间。通过将全抛釉的比重和流速控制在上述范围,可以既保证金属颗粒不容易沉淀,也可以让金属颗粒的混合得更加均匀,淋釉釉面也很平整。
施釉方式为钟罩淋釉,该方式参数易控,简单快捷,能够让釉面均匀平滑。施釉比重可控制在515~560克/m2,例如在800规格砖约330~360克。通过将施釉比重控制在上述范围,可以充分让金属铬粉在全抛釉层里立体分别,减少其他釉面缺陷的产生。本发明中,通过对金属颗粒的加入量、全抛釉的比重及施釉量等进行控制,可以使全抛釉和金属颗粒的结合达到最佳效果。
在坯体上依次施加面釉、图案、混合有金属颗粒的全抛釉后,进行烧成。烧成温度可为1200~1220℃。烧成时间可为65~70分钟。由于金属颗粒的熔点高于烧成温度,因此其在烧成过程中不显熔融状态,烧成后仍保持细颗粒状。烧成后熔融的全抛釉料将金属颗粒包裹在砖坯表面的釉层里。
烧成后进行抛光。抛光后一部分金属颗粒也连同釉面一起被抛光,散发出和釉面光泽不同的金属光泽来。抛光深度大约为0.08~0.12mm。
使用上述方法制备出的全抛釉产品的表面具有金属颗粒质感和光泽效果。
下面进一步例举实施例以详细说明本发明。同样应理解,以下实施例只用于对本发明进行进一步说明,不能理解为对本发明保护范围的限制,本领域的技术人员根据本发明的上述内容作出的一些非本质的改进和调整均属于本发明的保护范围。下述示例具体的工艺参数等也仅是合适范围中的一个示例,即本领域技术人员可以通过本文的说明做合适的范围内选择,而并非要限定于下文示例的具体数值。
实施例1
1)制坯:
坯料配方:62~67wt%SiO2、20~23wt%Al2O3、1.0~1.2wt%Fe2O3、0.3~0.4wt%TiO2、0.3~0.5wt%CaO、0.5~0.8wt%MgO、2.7~3.2wt%K2O和2.3~2.7wt%Na2O,
按此配料球磨喷雾制粉,通过压机压制成型;
2)在坯体上喷墨打印图案;
3)施面釉:
面釉配方:57~62wt%SiO2、22~25wt%Al2O3、0.1~0.5wt%CaO、0.2~0.4wt%MgO、3.5~4.2wt%K2O和2.3~2.7wt%Na2O,
采用喷釉方式施面釉;
4)混合全抛釉的制备:
全抛釉的配方:50~55wt%SiO2、14~16wt%Al2O3、4~5wt%ZnO、11~13wt%CaO、4~4.6wt%MgO、0.5~0.8wt%K2O和2.5~2.8wt%Na2O,
在全抛釉里加入2wt%的金属铬粉(粒径为80~100目),球磨混合均匀,控制全抛釉比重为1.80~1.85,流速为28~25秒,使用钟罩淋釉的方式施混合全抛釉,施釉比重控制在515~560克/m2
5)入窑炉烧成,烧成温度为1200~1220℃,烧成周期为65~70分钟;
6)抛光:抛光深度大约为0.08~0.12mm;
得到表面具有金属颗粒质感和光泽效果的全抛釉陶瓷砖。
实施例2
与实施例1不同之处在于:在全抛釉里加入3wt%的金属铬粉(粒径为80~100目),在釉线上的釉桶里混合均匀,控制全抛釉比重为1.80~1.85,流速为28~25秒,使用钟罩淋釉的方式施混合全抛釉,施釉比重控制在515~560克/m2
其余同实施例1;
得到表面具有金属颗粒质感和光泽效果的全抛釉陶瓷砖。
对比例1
与实施例1不同之处在于:在全抛釉里加入6wt%的金属铬粉;
其余同实施例1;
结果发现,烧出来抛光后金属颗粒太密集了,眼花缭乱影响了视觉效果。
对比例2
与实施例1不同之处在于:金属铬粉粒径为60目;
结果发现,60目的颗粒重量大,在釉浆里搅拌的时候容易沉淀,会导致淋釉时的金属颗粒不均匀,同时在钟罩上的流动性也不好,影响釉面的质量。
对比例3
与实施例1不同之处在于:金属铬粉粒径为150目;
结果发现,烧出来后金属颗粒太细了,层次感和光泽度都不突出。

Claims (2)

1.一种带有金属颗粒和光泽的全抛釉陶瓷砖,其特征在于,由下而上依次包括:坯体、面釉层、图案层和透明全抛釉层,所述透明全抛釉层内部含有金属颗粒且表面有金属颗粒露出,所述金属颗粒的粒径为80目~100目,所述金属颗粒为铬,所述金属颗粒的熔点高于所述透明全抛釉层的釉料的烧成温度,所述全抛釉陶瓷砖通过如下方法制备:
(1)在坯体表面依次施面釉、印花装饰、施加混合有金属颗粒的全抛釉;
(2)将步骤(1)得到的砖坯烧成、抛光,
其中,金属颗粒的加入量为全抛釉重量的2~3%,
通过钟罩淋釉的方式施加混合有金属颗粒的全抛釉,
全抛釉的比重控制在1.80~1.85,流速控制在28~25秒之间,施釉比重控制在515~560克/m2
2.根据权利要求1所述的带有金属颗粒和光泽的全抛釉陶瓷砖,其特征在于,烧成温度为1200~1220℃。
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