CN106403821A - Displacement sensor, usage and manufacturing method thereof and interferometer - Google Patents
Displacement sensor, usage and manufacturing method thereof and interferometer Download PDFInfo
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- CN106403821A CN106403821A CN201510447068.9A CN201510447068A CN106403821A CN 106403821 A CN106403821 A CN 106403821A CN 201510447068 A CN201510447068 A CN 201510447068A CN 106403821 A CN106403821 A CN 106403821A
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- 238000006073 displacement reaction Methods 0.000 title claims abstract description 85
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 239000004065 semiconductor Substances 0.000 claims abstract description 43
- 238000012360 testing method Methods 0.000 claims description 46
- 238000000034 method Methods 0.000 claims description 35
- 238000005259 measurement Methods 0.000 claims description 19
- 230000003287 optical effect Effects 0.000 claims description 15
- 238000001514 detection method Methods 0.000 claims description 10
- 230000010354 integration Effects 0.000 description 4
- 230000002452 interceptive effect Effects 0.000 description 4
- 241000931526 Acer campestre Species 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000005305 interferometry Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 241001551112 Hainardia cylindrica Species 0.000 description 1
- 241000406668 Loxodonta cyclotis Species 0.000 description 1
- 241001494479 Pecora Species 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/36—Forming the light into pulses
- G01D5/38—Forming the light into pulses by diffraction gratings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P13/00—Indicating or recording presence, absence, or direction, of movement
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
Abstract
The present invention discloses a displacement sensor, a usage and manufacturing method thereof and an interferometer, wherein the displacement sensor comprises a semiconductor laser used for generating a laser beam; a diffraction grating used for directly diffracting and reflecting a part of light of the laser beam to generate the first diffracted light and diffracting a part of light which penetrates itself, reaches a to-be-measured object, is reflected by the to-be-measured object and penetrates itself again to form the second diffracted light; a detector located at the intersection position of the diffracted light preset with the same levels and in the to-be-measured first and second diffracted light and used for measuring the change of the interference intensity information between the diffracted light preset with the same levels and in the first and second diffracted light; an information processor connected with the detector and used for reading an interference intensity signal and inverting the displacement information of the to-be-measured object according to the interference intensity change information detected by the detector, wherein the diffraction grating is located between the semiconductor laser and the to-be-measured object.
Description
Technical field
The present invention relates to Micro-Opto-Electro-Mechanical Systems (Micro Optic Electro Mechanical System,
MOEMS) technical field, more particularly, to a kind of displacement transducer.
Background technology
Displacement refers to the side-play amount that object space produces relative to reference point, in numerous physical quantitys displacement and its
It is measured and compares is not only easily to have detected but also be readily available high-precision testing result, so often will be tested right in measurement
The mechanical quantity of elephant is converted into displacement to detect.For example acceleration is converted into the displacement of mass, will expand
It is converted into displacement of body surface etc..Thin tail sheep measurement is pressure, acceleration, flow, temperature, vibration etc.
The basis of e measurement technology, large displacement measurement is automatic production line (as the movement of mechanical hand), industrial detection
The foundation of (as expanded), on-line monitoring (as vibrated) etc..
Displacement information is converted into optical information by photoelectric displacement sensor, and detected by photodiode
Light intensity embodies.Photoelectric displacement sensor has that non-cpntact measurement, test speed be fast, high precision, test
The advantages of point is little is widely studied and applied.The test of existing photoelectric displacement mainly have laser triangulation,
Moire fringe technique, double beam interferometry, double-frequency laser interference method based on Doppler effect etc., they are mostly
For the measurement of big displacement, its light path system also all more complicated it is impossible to meet corpusculum in development of modern industry
Long-pending, easy of integration, high reliability, low-power consumption require.
Dual-beam interferometry is reflected based on Michelson's interferometer, with the change of two-beam interference intensity
The information of displacement.It is extensively studied by the displacement information of interference strength inverting measurand, using just
String phase modulation can make displacement measurement accuracy reach more than one of percentage of detection optical wavelength.Do in dual-beam
Relate in measuring system, the coherence length of light source determines measurable maximum range.Existing wide range double
In beam interference measuring system, light source is mostly provided by He-Ne laser instrument, but the He-Ne laser instrument body of itself
Long-pending larger, this fundamentally affects the volume of big displacement double beam interference measuring system.
Content of the invention
For solving existing technical problem, embodiment of the present invention expectation provides one kind to have miniaturization, easy
The displacement transducer of the features such as integrated, high reliability and low-power consumption and interferometer.
The technical scheme of the embodiment of the present invention is realized in：
The embodiment of the present invention provides a kind of displacement transducer, and this displacement transducer includes：
Semiconductor laser, for producing laser beam；
Diffraction grating, for reflecting the direct diffraction of a part of light in described laser beam again, produces first
Diffraction light；It is simultaneously used for pass through itself in described laser beam, reaching object under test, and through object under test
Again pass through a part of optical diffraction of itself after reflection, form the second diffraction light；
Detector, in the first diffraction light to be measured and the second diffraction light, the diffraction light of default same stages time crosses
Place is strong for measuring the interference between the diffraction light of default same stages time in the first diffraction light and the second diffraction light
The change of degree information；
Message handler, is connected with described detector, for reading interference strength signal, is visited according to detector
The interference strength change information surveyed, is finally inversed by the displacement information of object under test；
Described diffraction grating is located between semiconductor laser and object under test.
In such scheme, institute's displacement sensors also include：
Diffraction grating modulation-demodulation device, periodically vibrates for introducing to diffraction grating, and to detection
The interference strength information that device detects is demodulated.
In such scheme, institute's displacement sensors also include：
Reflection light collecting device, for the light through object under test reflection for the collection so that being detected the second diffraction light
Suitable with the intensity of the diffraction light of same stages time default in the first diffraction light.
In such scheme, described semiconductor laser is long coherence apart from semiconductor laser.
The present invention also provides a kind of interferometer, and this interferometer includes：
Semiconductor laser, for producing laser beam；
Diffraction grating, for reflecting the direct diffraction of a part of light in described laser beam again, produces first
Diffraction light；It is simultaneously used for pass through itself in described laser beam, reaching object under test, and through object under test
Again pass through a part of optical diffraction of itself after reflection, form the second diffraction light；
Detector, in the first diffraction light to be measured and the second diffraction light, the diffraction light of default same stages time crosses
Place is strong for measuring the interference between the diffraction light of default same stages time in the first diffraction light and the second diffraction light
The change of degree information.
In such scheme, described interferometer also includes：
Diffraction grating modulation-demodulation device, periodically vibrates for introducing to diffraction grating, and to detection
The interference strength information that device detects is demodulated.
In such scheme, described interferometer also includes：
Reflection light collecting device, for the light through object under test reflection for the collection so that being detected the second diffraction light
Suitable with the intensity of the diffraction light of same stages time default in the first diffraction light.
In such scheme, described semiconductor laser is long coherence apart from semiconductor laser.
The present invention also provides a kind of using method of displacement transducer, and the method includes：
Semiconductor laser produces laser beam；
The direct diffraction of a part of light in described laser beam is reflected by diffraction grating again, produces the first diffraction light；
Diffraction grating will pass through itself, reach object under test in described laser beam simultaneously, and through object under test reflection
Again pass through a part of light of itself afterwards, be diffracted to the second diffraction light；
Interference between the diffraction light of default same stages time in detector measurement first diffraction light and the second diffraction light
The change of strength information；
Message handler reads interference strength signal, the interference strength change information being detected according to detector, instead
The displacement information of performance object under test.
The present invention also provides a kind of manufacture method of displacement transducer, and the method includes：
Using Micro-Opto-Electro-Mechanical Systems MOEMS technique productions semiconductor laser, diffraction grating, detector,
Message handler, and the MOEMS element of Grating Modulation device, reflection light collecting device；
By detached semiconductor laser, diffraction grating, photodetector, message handler, and grating
Modulating device, the MOEMS element of reflection light collecting device are according to according to any one displacement transducer above-mentioned
Structure assembles；Or
By semiconductor laser, diffraction grating, photodetector, message handler, and Grating Modulation dress
Put, reflect all or part of element in the MOEMS element of light collecting device to be integrated in a monolithic.
The feature of above-mentioned technical scheme is：The detection light of the displacement transducer that the present invention provides can be by long coherence
There is provided apart from semiconductor laser, be not as existing dual-beam displacement measurement system, detect light by He-Ne
Laser instrument etc. provides.The displacement transducer so invented have miniaturization, easy of integration the features such as.Sensor
Measured maximum range is the half of semiconductor laser coherence distance, swashs apart from quasiconductor with long coherence
The continuous progress of light device technology, the range of the displacement transducer invented can reach several meters even farther.
The another one feature of technique scheme is：The method producing relevant dual-beam is not as Michael
Inferior interferometer is realized using different light paths like that, but utilizes the half-reflection and half-transmission property of diffraction grating Lai real
Existing light splitting.The surface reflection of the direct reflection of grating and object under test provides two bundle coherent lights, they
Optical path difference contains the displacement information of object under test.The two-beam interfering can be the first diffraction light and
The diffraction light of any one-level in two diffraction lights, such as 0 grade, ± 1 grade, ± 2 grades etc., their direction in space is different,
When measuring hence with different stage diffraction light coherence messages, the locus of corresponding detector are also different.
The another one feature of above-mentioned technical scheme is：Modulating system can be introduced to diffraction grating.To spreading out
Penetrate grating and introduce and periodically vibrate, the interference strength information then detector being detected is demodulated；This
Sample can suppress and reduce noise effectively, improves certainty of measurement.
Additionally, each assembly of the displacement transducer of present invention offer and interferometer all can be utilized MOEMS work
Skill produces, therefore so that the displacement transducer that provides of the present invention and interferometer have miniaturization, easy of integration
Feature.
Brief description
Fig. 1 is the composition structural representation of displacement transducer provided in an embodiment of the present invention；
Fig. 2 is the schematic flow sheet of the using method of displacement transducer provided in an embodiment of the present invention；
Fig. 3 is the schematic diagram that in displacement transducer work process provided in an embodiment of the present invention, light is propagated.
Specific embodiment
In order to be illustrated more clearly that the embodiment of the present invention and technical scheme, below in conjunction with drawings and Examples pair
Technical scheme is described in detail it is clear that described embodiment is of the present invention
Divide embodiment, rather than whole embodiments.Based on embodiments of the invention, those of ordinary skill in the art exist
The every other embodiment being obtained on the premise of not paying creative work, broadly falls into the model of present invention protection
Enclose.
Fig. 1 is the structural representation of displacement transducer provided in an embodiment of the present invention, as shown in figure 1, this position
Displacement sensor includes：
Semiconductor laser 101, for producing laser beam；
Diffraction grating 102, for reflecting the direct diffraction of a part of light in described laser beam again, produces
First diffraction light；It is simultaneously used for pass through itself in described laser beam, reaching object under test, and through to be measured
Again pass through a part of optical diffraction of itself after object reflection, form the second diffraction light；
Detector 103, the diffraction light of default same stages time in the first diffraction light to be measured and the second diffraction light
Intersection, dry between the diffraction light of default same stages time in the first diffraction light and the second diffraction light for measuring
Relate to the change of strength information；
Message handler 104, is connected with described detector, for reading interference strength signal, according to detection
The interference strength change information that device detects, is finally inversed by the displacement information of object under test；
Described diffraction grating is located between semiconductor laser and object under test.
Specifically, in upper displacement sensors, described semiconductor laser 101 can be long coherence distance half
Conductor laser is so that institute's displacement sensors can measure larger displacement, the range of this displacement transducer
It is the half of semiconductor laser coherence distance, with long coherence constantly entering apart from semiconductor laser technology
Step, the range of the displacement transducer invented can reach several meters even farther.
Additionally, in upper displacement sensors, diffraction grating 102 can be that the grating to laser half-reflection and half-transmission comes
Realize.
Further, in upper displacement sensors, described detector 103 can be photodetector；This spy
The position surveying device 103 is optical maser wavelength, the cycle of diffraction grating 102 launched with semiconductor laser 101,
And to measure the diffraction light interfering level time relevant, when the cycle of diffraction grating and optical maser wavelength are true
After fixed, in diffraction light, the direction of each diffraction time determines that, the position of detector is by the side of diffraction time to be measured
To determine to the distance with test surface and diffraction grating.Thus, need to be preset concrete which order diffraction of measurement
Light, in actual applications, can be set as measuring 0 grade as the case may be, ± 1 grade, ± 2 grades etc., that is, above-mentioned
The diffraction light of default same stages time can be 0 grade, ± 1 grade, the diffraction light of ± 2 grades of grades time.
Additionally, in upper displacement sensors, message handler 104 in actual applications, can be by positioned at displacement
Central processing unit (CPU) in sensor, microprocessor (MPU), digital signal processor (DSP),
Or field programmable gate array (FPGA) realization.
Further, upper displacement sensors may also include：
Diffraction grating modulation-demodulation device 105, periodically vibrates for introducing to diffraction grating, and right
The interference strength information that detector detects is demodulated.
Specifically, diffraction grating modulation-demodulation device 105 can pass through the realization of the methods such as piezoelectric modulation, diffraction
The purpose of Grating Modulation demodulating equipment is to suppress the noise in measurement process, and it can be by means of tiny signal
Lock in process the method such as mutually amplifies to improve the signal to noise ratio of detectable signal, thus improving displacement measurement accuracy.
Further, upper displacement sensors may also include：
Reflection light collecting device 106, the light for collecting through object under test reflection is spread out so that detecting second
Penetrate light suitable with the intensity of the diffraction light of same stages time default in the first diffraction light.
Specifically, reflection light collecting device 106 can pass through the realization of the methods such as lens, reflects light collecting device
106 purpose is to make the light of more object under test reflections participate in relevant it is also desirable to participate in relevant
Two-beam intensity be equal to.
The upper displacement sensors that the present invention provides, if remove message handler 104, remaining part itself
It is a kind of interferometer, therefore, the present invention also provides a kind of interferometer, and it includes：
Semiconductor laser, for producing laser beam；
Diffraction grating, for reflecting the direct diffraction of a part of light in described laser beam again, produces first
Diffraction light；It is simultaneously used for pass through itself in described laser beam, reaching object under test, and through object under test
Again pass through a part of optical diffraction of itself after reflection, form the second diffraction light；
Detector, in the first diffraction light to be measured and the second diffraction light, the diffraction light of default same stages time crosses
Place is strong for measuring the interference between the diffraction light of default same stages time in the first diffraction light and the second diffraction light
The change of degree information.
Further, above-mentioned interference instrument also includes：
Diffraction grating modulation-demodulation device, periodically vibrates for introducing to diffraction grating, and to detection
The interference strength information that device detects is demodulated.
Further, above-mentioned interference instrument also includes：
Reflection light collecting device, for the light through object under test reflection for the collection so that being detected the second diffraction light
Suitable with the intensity of the diffraction light of same stages time default in the first diffraction light.
Further, in above-mentioned interference instrument, described semiconductor laser is long coherence apart from semiconductor laser.
The schematic flow sheet of the using method of the upper displacement sensors that Fig. 2 provides for the present invention, as Fig. 2 institute
Show, the method includes：
Step 201, semiconductor laser produces laser beam；
Step 202, the direct diffraction of a part of light in described laser beam is reflected by diffraction grating again, produces
First diffraction light；Diffraction grating will pass through itself, reach object under test in described laser beam simultaneously, and warp
Again pass through a part of optical diffraction of itself after object under test reflection, form the second diffraction light；
Specifically, as shown in figure 3, the laser beam that semiconductor laser sends incides diffractive grating surface
When, directly diffracted optical grating diffraction reflects generation the first diffraction light, the first diffraction light to a part of laser beam again
In comprise a series of diffraction times, such as 0 grade, ± 1 grade, ± 2 grades etc.；A part of laser beam passes through and spreads out simultaneously
Penetrate grating and reach object under test, after being reflected by object under test, after reflection light collecting device, again pass through diffraction light
Grid are diffracted to the second diffraction light, also comprise a series of diffraction times in the second diffraction light, such as 0 grade, ± 1 grade,
± 2 grades etc..
The diffraction light of default same stages time in step 203, detector measurement first diffraction light and the second diffraction light
Between interference strength information change；
Specifically, adjusting diffraction grating makes the reflecting surface of object under test parallel with the reflecting surface of grating, such as Fig. 3
Shown, the at this moment space side of the first diffraction light and the diffraction light of identical diffraction time default in the second diffraction light
To consistent, they will interfere.Adjusting detector makes detector be located at the first diffraction light and the second diffraction light
In default identical diffraction time intersection, as shown in Figure 3.So, detector just can measure first and spread out
Penetrate light and the change information of the second diffraction light interference strength.
Here, described default identical diffraction time, refers to default first diffraction light and the second diffraction light
Level time is all 0 grade, is all ± 1 grade, is all ± 2 grades etc..
Further, by diffraction grating modulation-demodulation device, diffraction grating can be introduced and periodically vibrate,
Noise and the interference strength change information that detector detected is demodulated, in suppression measurement process.
Step 204, message handler reads interference strength signal, is become according to the interference strength that detector detects
Change information, is finally inversed by the displacement information of object under test；
Specifically, as shown in figure 3, the optical path difference of the first diffraction light now interfering and the second diffraction light
It is to be determined by the distance between diffraction grating reflecting surface and object under test reflecting surface, such and traditional mikey
Your method of inferior interferometer measurement displacement information is the same, message handler according to described interference strength change information,
The displacement letter of moving object just can be finally inversed by through existing process circuit with after executing existing Processing Algorithm
Breath.
The manufacture method that the present invention also provides displacement sensors, the method includes：
Using Micro-Opto-Electro-Mechanical Systems MOEMS technique productions semiconductor laser, diffraction grating, detector,
Message handler, and the MOEMS element of Grating Modulation device, reflection light collecting device；
By detached semiconductor laser, diffraction grating, photodetector, message handler, and grating
Modulating device, the MOEMS element of reflection light collecting device are according to according to any one displacement transducer above-mentioned
Structure assembles；Or
By semiconductor laser, diffraction grating, photodetector, message handler, and Grating Modulation dress
Put, reflect all or part of element in the MOEMS element of light collecting device to be integrated in a monolithic.
Specifically, detached semiconductor laser, diffraction grating, Grating Modulation device, reflected light are collected
Device, photodetector, message handler etc. assemble with reference to Fig. 1, constitute invented displacement sensing
Device；Or
Using existing MOEMS technique by semiconductor laser, diffraction grating, photodetector, information
All or part in processor, and Grating Modulation device, the MOEMS element of reflection light collecting device
Element is integrated in a monolithic, produces fully integrated or half integrated MOEMS displacement transducer.
The feature of above-mentioned technical scheme is：The detection light of the displacement transducer that the present invention provides can be by growing
Coherence distance semiconductor laser provides, and is not as existing dual-beam displacement measurement system, detect light by
He-Ne laser instrument etc. provides.The displacement transducer so invented have miniaturization, easy of integration the features such as.
Maximum range measured by sensor is the half of semiconductor laser coherence distance, with long coherence distance half
The continuous progress of conductor laser technology, the range of the displacement transducer invented can reach several meters even more
Far.
The another one feature of technique scheme is：The method producing relevant dual-beam is not as Michael
Inferior interferometer is realized using different light paths like that, but utilizes the half-reflection and half-transmission property of diffraction grating Lai real
Existing light splitting.The surface reflection of the direct reflection of grating and object under test provides two bundle coherent lights, they
Optical path difference contains the displacement information of object under test.The two-beam interfering can be the first diffraction light and
The diffraction light of any one-level in two diffraction lights, such as 0 grade, ± 1 grade, ± 2 grades etc., their direction in space is different,
When measuring hence with different stage diffraction light coherence messages, the locus of corresponding detector are also different.
The another one feature of above-mentioned technical scheme is：Modulating system can be introduced to diffraction grating.To spreading out
Penetrate grating and introduce and periodically vibrate, the interference strength information then detector being detected is demodulated；This
Sample can suppress and reduce noise effectively, improves certainty of measurement.
In manufacture, can be built or integrated by detached element paster.Logical
When crossing detached element paster and building, by detached semiconductor laser, diffraction grating, Grating Modulation device,
Reflection light collecting device, photodetector, message handler etc. assemble with reference to Fig. 1, constitute and are invented
Displacement transducer.By each element in the displacement transducer invented making all with existing
MOEMS process compatible, therefore can also produce single chip integrated position using all of MOEMS technique
Displacement sensor.
The above, only presently preferred embodiments of the present invention, it is not intended to limit the protection model of the present invention
Enclose.
Claims (10)
1. a kind of displacement transducer is it is characterised in that institute's displacement sensors include：
Semiconductor laser, for producing laser beam；
Diffraction grating, for reflecting the direct diffraction of a part of light in described laser beam again, produces first
Diffraction light；It is simultaneously used for pass through itself in described laser beam, reaching object under test, and through object under test
Again pass through a part of optical diffraction of itself after reflection, form the second diffraction light；
Detector, in the first diffraction light to be measured and the second diffraction light, the diffraction light of default same stages time crosses
Place is strong for measuring the interference between the diffraction light of default same stages time in the first diffraction light and the second diffraction light
Degree change information；
Message handler, is connected with described detector, for reading interference strength signal, is visited according to detector
The change of the interference strength information surveyed, is finally inversed by the displacement information of object under test；
Described diffraction grating is located between semiconductor laser and object under test.
2. displacement transducer according to claim 1 is it is characterised in that institute's displacement sensors also wrap
Include：
Diffraction grating modulation-demodulation device, periodically vibrates for introducing to diffraction grating, and to detection
The interference strength information that device detects is demodulated.
3. displacement transducer according to claim 1 and 2 is it is characterised in that institute's displacement sensors
Also include：
Reflection light collecting device, for the light through object under test reflection for the collection so that being detected the second diffraction light
Suitable with the intensity of the diffraction light of same stages time default in the first diffraction light.
4. the displacement transducer according to any one of claims 1 to 3 is it is characterised in that described partly lead
Body laser is long coherence apart from semiconductor laser.
5. a kind of interferometer is it is characterised in that described interferometer includes：
Semiconductor laser, for producing laser beam；
Diffraction grating, for reflecting the direct diffraction of a part of light in described laser beam again, produces first
Diffraction light；It is simultaneously used for pass through itself in described laser beam, reaching object under test, and through object under test
Again pass through a part of optical diffraction of itself after reflection, form the second diffraction light；
Detector, in the first diffraction light to be measured and the second diffraction light, the diffraction light of default same stages time crosses
Place is strong for measuring the interference between the diffraction light of default same stages time in the first diffraction light and the second diffraction light
The change of degree information.
6. interferometer according to claim 5 is it is characterised in that described interferometer also includes：
Diffraction grating modulation-demodulation device, periodically vibrates for introducing to diffraction grating, and to detection
The interference strength information that device detects is demodulated.
7. interferometer according to claim 5 is it is characterised in that described interferometer also includes：
Reflection light collecting device, for the light through object under test reflection for the collection so that being detected the second diffraction light
Suitable with the intensity of the diffraction light of same stages time default in the first diffraction light.
8. the interferometer according to any one of claim 5 to 7 is it is characterised in that described quasiconductor swashs
Light device is long coherence apart from semiconductor laser.
9. a kind of using method of displacement transducer is it is characterised in that the method includes：
Semiconductor laser produces laser beam；
The direct diffraction of a part of light in described laser beam is reflected by diffraction grating again, produces the first diffraction light；
Diffraction grating will pass through itself, reach object under test in described laser beam simultaneously, and through object under test reflection
Again pass through a part of light of itself afterwards, be diffracted to the second diffraction light；
Interference between the diffraction light of default same stages time in detector measurement first diffraction light and the second diffraction light
The change of strength information；
Message handler reads interference strength signal, the interference strength change information being detected according to detector, instead
The displacement information of performance object under test.
10. a kind of manufacture method of displacement transducer is it is characterised in that the method includes：
Using Micro-Opto-Electro-Mechanical Systems MOEMS technique productions semiconductor laser, diffraction grating, detector,
Message handler, and the MOEMS element of Grating Modulation device, reflection light collecting device；
By detached semiconductor laser, diffraction grating, photodetector, message handler, and grating
Modulating device, the MOEMS element of reflection light collecting device are according to according to any one of Claims 1-4 institute
The displacement sensor structure assembling stated；Or
By semiconductor laser, diffraction grating, photodetector, message handler, and Grating Modulation dress
Put, reflect all or part of element in the MOEMS element of light collecting device to be integrated in a monolithic.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510447068.9A CN106403821A (en) | 2015-07-27 | 2015-07-27 | Displacement sensor, usage and manufacturing method thereof and interferometer |
| PCT/CN2015/097620 WO2017016144A1 (en) | 2015-07-27 | 2015-12-16 | Displacement sensor, method of use and manufacture thereof, and interferometer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510447068.9A CN106403821A (en) | 2015-07-27 | 2015-07-27 | Displacement sensor, usage and manufacturing method thereof and interferometer |
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| CN106403821A true CN106403821A (en) | 2017-02-15 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510447068.9A Pending CN106403821A (en) | 2015-07-27 | 2015-07-27 | Displacement sensor, usage and manufacturing method thereof and interferometer |
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| Country | Link |
|---|---|
| CN (1) | CN106403821A (en) |
| WO (1) | WO2017016144A1 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106860967A (en) * | 2017-02-17 | 2017-06-20 | 苏州新生命医疗科技有限公司 | The capacity sensing device of high accuracy drug infusion system |
| CN109029273A (en) * | 2018-10-24 | 2018-12-18 | 中北大学 | A kind of measurement method of 0 grade of nanometer grating based on circulator detection displacement |
| CN109211122A (en) * | 2018-10-30 | 2019-01-15 | 清华大学 | Ultraprecise displacement measurement system and method based on optical neural network |
| CN110388980A (en) * | 2019-07-31 | 2019-10-29 | 山东大学 | A kind of micro acoustic sensor based on diffraction grating structure |
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