CN106356316B - A kind of technique unit waste discharge hydrops detection device - Google Patents
A kind of technique unit waste discharge hydrops detection device Download PDFInfo
- Publication number
- CN106356316B CN106356316B CN201510411467.XA CN201510411467A CN106356316B CN 106356316 B CN106356316 B CN 106356316B CN 201510411467 A CN201510411467 A CN 201510411467A CN 106356316 B CN106356316 B CN 106356316B
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- Prior art keywords
- hydrops
- lower cover
- cover
- accumulating box
- partition
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
Abstract
The present invention relates to a kind of technique unit waste discharge hydrops detection devices, lower cover and partition board are separately mounted on the workbench of technique unit, first partition is located at the inside of lower cover, one end of inner cover is hung in first partition, the other end is abutted with lower cover, upper cover is located at the outside of inner cover and is inserted in lower cover, and water conservancy diversion inner cavity is formed between inner cover；Liquid accumulating box is connected in lower cover, inner sleeve is placed in liquid accumulating box, and hydrops feedback cavity is equipped between the inner wall of liquid accumulating box, is connected to inside the lower cover below water conservancy diversion inner cavity and inner sleeve, is formed drain runner；The upper end of inner sleeve and grafting of trapping, lower end are distributed along the circumference with the gap between multiple connection drain runners and hydrops feedback cavity, and liquid accumulating box is equipped with the hydrops sensor stretched into hydrops feedback cavity.Hydrops and leakage caused by the present invention can prevent condensation due to waste liquid or pipeline unsmooth well, the purpose of early warning is made by triggering hydrops sensor.
Description
Technical field
The present invention relates to the detections for wafer generated waste liquid hydrops problem in technique unit technique, specifically
It is a kind of technique unit waste discharge hydrops detection device.
Background technology
Currently, for wafer in technique unit when technique, the microenvironment inside unit is most important to technique, interior environment
Slight variation can also influence wafer qualification rate.If chemicals waste liquid cannot drain in time in unit may result in volatilization, into
And causing entire interior environment to change influences subsequent technique, serious unqualified remove photoresist is reformed.There is this consequence to visitor
Family is fatal.
Invention content
In order to solve because in unit chemicals waste liquid cannot drain in time caused by the above problem, the purpose of the present invention exists
In a kind of technique unit waste discharge hydrops detection device of offer.The detection device is by detection since condensation or pipeline are unsmooth caused
Hydrops and leakage send out early warning at the first time by triggering hydrops sensor.
The purpose of the present invention is achieved through the following technical solutions：
The present invention includes upper cover, inner cover, lower cover, first partition, liquid accumulating box, inner sleeve and hydrops sensor, wherein lower cover and
Partition board is separately mounted on the workbench of the technique unit, and the first partition is located at the inside of lower cover, and the one of the inner cover
End hang in the first partition, the other end is abutted with the lower cover, the upper cover be located at the outside of inner cover and be inserted in it is described under
On cover, and water conservancy diversion inner cavity is formed between inner cover；Liquid accumulating box is connected in the lower cover, the inner sleeve is placed in the liquid accumulating box
It is interior, and hydrops feedback cavity is equipped between the inner wall of the liquid accumulating box, connect inside the lower cover and inner sleeve below the water conservancy diversion inner cavity
Logical, formation drain runner；The upper end of the inner sleeve and grafting of trapping, lower end is distributed along the circumference with multiple connection drain runners and product
Gap between liquid feedback cavity, the liquid accumulating box are equipped with the hydrops sensor stretched into hydrops feedback cavity；The technique unit
In liquid by motor drive rotation wafer on throw away, flow to the drain runner in liquid accumulating box through the water conservancy diversion inner cavity, it is described
The waste liquid formed in liquid accumulating box flows to the hydrops feedback cavity by each gap, is detected by the hydrops sensor.
Wherein：Liquid accumulating box inner wall above the inner sleeve and spatia, the upper surface of the liquid accumulating box are equipped between trapping
With trap between be equipped with and prevent the sealing ring of waste liquid leakage in the spatia；Second partition is equipped in the lower cover, this second every
It is hollow structure between plate and lower cover inner wall and between lower cover outer wall, in the edge of the first partition and the lower cover
The top of wall abuts, and the upper cover is plugged in the top of the lower cover outer wall；The second partition and lower cover outer wall are to downward
It stretches, form extension, which is inserted in the open end of the liquid accumulating box, and the lower end of the extension is inserted in institute
The inside of interior set upper side is stated, the spatia is formed between the outer surface and liquid accumulating box of the extension；One end of the inner cover
Positioned at the lower section of wafer, and the edge of the first partition is hung over, the outside of the other end of the inner cover and the second partition
Face abuts against；
One end of the upper cover and the top grafting of lower cover, the other end are located at the oblique upper of the wafer；Described first every
Plate is located at the lower section of wafer, and the motor is mounted on the workbench in technique unit, one end phase of output end and vacuum cartridge
Even, the other end of the vacuum cartridge is passed through by the first partition, and the wafer is sucked；The upper end of the liquid accumulating box is opening
End, lower end is blind end, and is connected with the pipeline for collecting liquid by connector on the blind end, and the hydrops sensor is inserted
In the box wall of liquid accumulating box；The inner sleeve is annular shape, and lower end is along the circumferential direction evenly equipped with multiple gap.
Advantages of the present invention is with good effect：
1. the present invention forms a water conservancy diversion inner cavity by upper cover, lower cover, inner cover and first partition, it can prevent waste liquid from splashing
And protect following motor.
2. the present invention constitutes spatia by lower cover and liquid accumulating box, in this way when handle hydrops can easily by lower cover and
Liquid accumulating box is disassembled and cleaning.
3. the present invention constitutes main chamber-hydrops feedback cavity by liquid accumulating box and inner sleeve, detection has condensation or pipeline unsmooth
Caused hydrops, triggering hydrops sensor quickly send out early warning.
4. the inner sleeve lower part of the present invention is provided with the gap of regular distribution, realizes that drain runner and hydrops feedback cavity are ganged up, use
Difference in areas utmostly feeds back the occurrence of hydrops.
5. there is sealing ring in the liquid accumulating box end face of the present invention, prevent hydrops time length from leading to the generation of leakage.
Description of the drawings
Fig. 1 is the overall structure diagram of the present invention；
Fig. 2 is the partial enlarged view of liquid accumulating box of the present invention and lower cover junction；
Fig. 3 is the structural schematic diagram of inner sleeve of the present invention；
Wherein：1 is upper cover, and 2 be inner cover, and 3 be lower cover, and 4 be first partition, and 5 be vacuum cartridge, and 6 be wafer, and 7 be motor,
8 be liquid accumulating box, and 9 be inner sleeve, and 10 be hydrops sensor, and 11 be sealing ring, and 12 be gap, and 13 be connector, and 14 be second partition, 15
It is lower cover outer wall for lower cover inner wall, 16, A is water conservancy diversion inner cavity, and B is spatia, and C is hydrops feedback cavity, and D is drain runner.
Specific implementation mode
The invention will be further described below in conjunction with the accompanying drawings.
As shown in Figure 1 and Figure 2, the present invention includes upper cover 1, inner cover 2, lower cover 3, first partition 4, liquid accumulating box 8, inner sleeve 9 and product
Liquid sensor 10, wherein first partition 4 are mounted on the workbench of technique unit, are equipped with and are fixed in the lower section of first partition 4
Motor 7 on technique unit workbench, the output end of the motor 7 are connected with the one end for the vacuum cartridge 5 for connecting factory service vacuum, very
The other end of empty bracket 5 is passed through by first partition 4, and wafer 6 is sucked；Motor 7 provides power source, drives vacuum cartridge 5 and wafer 6
Rotation.
Lower cover 3 is mounted on the workbench of technique unit, and positioned at the outside of first partition 4.Be equipped in lower cover 3 second every
Plate 14 is hollow structure between the second partition 14 and lower cover inner wall 15 and between lower cover outer wall 16, first partition 4
Edge is abutted with the top of lower cover inner wall 15.
One end of inner cover 2 is located at the lower section of wafer 6, and hangs over the edge of first partition 4, the other end of inner cover 2 and second
The lateral surface of partition board 14 abuts against.Upper cover 1 is located at the outside of inner cover 2, and one end of upper cover 1 is plugged in the top of lower cover outer wall 16,
The other end is located at the oblique upper of wafer 6.Water conservancy diversion inner cavity A is formed between upper cover 1 and inner cover 2, prevents waste liquid from splashing away and protecting
Following motor 7.
Liquid accumulating box 8 is connected in lower cover 3, the upper end of the liquid accumulating box 8 is open end, and lower end is blind end, and in the closing
It is connected with the pipeline for collecting liquid by connector 13 on end, hydrops sensor 10 is inserted in the box wall of liquid accumulating box 8.Inner sleeve
9 are placed in liquid accumulating box 8, as shown in figure 3, inner sleeve 9 is annular shape, lower end is along the circumferential direction evenly equipped with multiple rectangular gap
12.Hydrops feedback cavity C, lower cover 3 and inner sleeve below the A of water conservancy diversion inner cavity are equipped between the outer surface and the inner wall of liquid accumulating box 8 of inner sleeve 9
9 inside connections form drain runner D, which is connected to by each gap 12 with hydrops feedback cavity C, hydrops sensor 10
It extend into hydrops feedback cavity C.Second partition 14 and lower cover outer wall 16 extend downwardly, form extension, which plugs
In in the open end of liquid accumulating box 8, and the lower end of extension is inserted in the inside of 9 upper end of inner sleeve, the outer surface (i.e. of extension
The outer surface of the inner surface of two partition boards 14 and lower cover outer wall 16) the formation spatia B between the liquid accumulating box 8 of 9 top of inner sleeve, hydrops
The upper surface of box 8 and the sealing ring 11 for being equipped between 3 and preventing waste liquid leakage in spatia B of trapping, constitute closed chamber.
The operation principle of the present invention is that：
Wafer 6 enters technique unit, is put on vacuum cartridge 5, is sucked by vacuum cartridge 5.Motor 7 drives vacuum cartridge 5
It is rotated with wafer 6, after liquid is fallen on wafer 6, the surface for the wafer 6 that can outward splash, throw away under the action of the centrifugal force can quilt
Upper cover 1, inner cover 2, lower cover 3 and partition board 4 block, and waste liquid is allowed to enter in drain runner D.Under normal circumstances, liquid can be made in gravity
It is discharged inside technique unit through connector 13 with lower.But due to the difference of chemicals can occur pipeline condensation or comb have some setbacks and lead
Waste liquor stream is caused not go out, such waste liquid will exist in liquid accumulating box 8.Due to condensation or pipeline is unsmooth leads to hydrops in the liquid accumulating box 8
Afterwards, at this moment waste liquid can flow to the hydrops feedback cavity C formed with inner sleeve 9, liquid by the gap 12 of 9 following regular distribution of inner sleeve
Product will trigger hydrops sensor 10 to set amount, and it is unsmooth to send out early warning waste discharge.When not checking in time, liquid can enter
In spatia B, possible liquid exudation；Leakage in order to prevent has installed sealing ring 11 additional in 8 end face of liquid accumulating box, has constituted closed chamber.
Claims (9)
1. a kind of technique unit waste discharge hydrops detection device, it is characterised in that：Including upper cover (1), inner cover (2), lower cover (3),
One partition board (4), liquid accumulating box (8), inner sleeve (9) and hydrops sensor (10), wherein lower cover (3) and partition board (4) are separately mounted to institute
It states on the workbench of technique unit, the first partition (4) is located at the inside of lower cover (3), and one end of the inner cover (2) hangs over this
In first partition (4), the other end is abutted with the lower cover (3), and the upper cover (1) is located at the outside of inner cover (2) and is inserted in institute
It states in lower cover (3), and water conservancy diversion inner cavity (A) is formed between inner cover (2)；Liquid accumulating box (8) is connected on the lower cover (3), it is described
Inner sleeve (9) is placed in the liquid accumulating box (8), and hydrops feedback cavity (C) is equipped between the inner wall of the liquid accumulating box (8), described
It is connected to inside lower cover (3) and inner sleeve (9) below water conservancy diversion inner cavity (A), forms drain runner (D)；The upper end of the inner sleeve (9) with
It traps (3) grafting, lower end is distributed along the circumference with the gap (12) between multiple connection drain runners (D) and hydrops feedback cavity (C),
The liquid accumulating box (8) is equipped with the hydrops sensor (10) stretched into hydrops feedback cavity (C)；Liquid in the technique unit by
Motor (7) drives and is thrown away on the wafer (6) rotated, and the drain runner (D) in liquid accumulating box (8) is flowed to through the water conservancy diversion inner cavity (A),
The waste liquid formed in the liquid accumulating box (8) flows to the hydrops feedback cavity (C) by each gap (12), passes through the hydrops
Sensor (10) detects.
2. technique unit waste discharge hydrops detection device as described in claim 1, it is characterised in that：Above the inner sleeve (9)
It liquid accumulating box (8) inner wall and traps and is equipped with spatia (B) between (3), the upper surface of the liquid accumulating box (8) and trapping is set between (3)
Having prevents the sealing ring (11) of the interior waste liquid leakage of spatia (B).
3. technique unit waste discharge hydrops detection device as described in claim 1 or 2, it is characterised in that：It is set in the lower cover (3)
There is second partition (14), is hollow between the second partition (14) and lower cover inner wall (15) and between lower cover outer wall (16)
Structure, the edge of the first partition (4) are abutted with the top of the lower cover inner wall (15), and the upper cover (1) is plugged in described
The top of lower cover outer wall (16).
4. technique unit waste discharge hydrops detection device as described in claim 3, it is characterised in that：The second partition (14) and
Lower cover outer wall (16) extends downwardly, forms extension, which is inserted in the open end of the liquid accumulating box (8), and institute
The lower end for stating extension is inserted in the inside of the inner sleeve (9) upper end, between the outer surface of the extension and liquid accumulating box (8)
Form spatia (B).
5. technique unit waste discharge hydrops detection device as described in claim 3, it is characterised in that：One end of the inner cover (2)
Lower section positioned at wafer (6), and hang over the edge of the first partition (4), the other end of the inner cover (2) with described second every
The lateral surface of plate (14) abuts against.
6. technique unit waste discharge hydrops detection device as described in claim 1 or 2, it is characterised in that：The one of the upper cover (1)
The top grafting at end and lower cover (3), the other end are located at the oblique upper of the wafer (6).
7. technique unit waste discharge hydrops detection device as described in claim 1 or 2, it is characterised in that：The first partition (4)
Lower section positioned at wafer (6), the motor (7) are mounted on the workbench in technique unit, output end and vacuum cartridge (5)
One end is connected, and the other end of the vacuum cartridge (5) is passed through by the first partition (4), and the wafer (6) is sucked.
8. technique unit waste discharge hydrops detection device as described in claim 1 or 2, it is characterised in that：The liquid accumulating box (8)
Upper end is open end, and lower end is blind end, and is connected with the pipeline for collecting liquid by connector (13) on the blind end, institute
Hydrops sensor (10) is stated to be inserted in the box wall of liquid accumulating box (8).
9. technique unit waste discharge hydrops detection device as described in claim 1 or 2, it is characterised in that：The inner sleeve (9) is circle
Ring-type, lower end are along the circumferential direction evenly equipped with multiple gap (12).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510411467.XA CN106356316B (en) | 2015-07-14 | 2015-07-14 | A kind of technique unit waste discharge hydrops detection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510411467.XA CN106356316B (en) | 2015-07-14 | 2015-07-14 | A kind of technique unit waste discharge hydrops detection device |
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| Publication Number | Publication Date |
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| CN106356316A CN106356316A (en) | 2017-01-25 |
| CN106356316B true CN106356316B (en) | 2018-10-09 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201510411467.XA Active CN106356316B (en) | 2015-07-14 | 2015-07-14 | A kind of technique unit waste discharge hydrops detection device |
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Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114171424A (en) * | 2020-09-10 | 2022-03-11 | 长鑫存储技术有限公司 | Wet etching control system, wet etching machine and wet etching control method |
| CN112768377B (en) * | 2020-12-31 | 2022-08-12 | 上海至纯洁净系统科技股份有限公司 | Structure for effectively solving secondary pollution after drying of wafer dry particle number |
| CN114985224B (en) * | 2022-07-08 | 2023-06-20 | 沈阳芯源微电子设备股份有限公司 | Waste discharge mechanism and photoresist coating platform |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5879576A (en) * | 1996-05-07 | 1999-03-09 | Hitachi Electronics Engineering Co., Ltd. | Method and apparatus for processing substrates |
| CN102043354A (en) * | 2009-10-23 | 2011-05-04 | 东京毅力科创株式会社 | Developing apparatus and developing method |
| CN104103555A (en) * | 2013-04-04 | 2014-10-15 | 东京毅力科创株式会社 | Substrate processing method and substrate processing apparatus |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW561516B (en) * | 2001-11-01 | 2003-11-11 | Tokyo Electron Ltd | Substrate processing apparatus and substrate processing method |
| JP4410076B2 (en) * | 2004-10-07 | 2010-02-03 | 東京エレクトロン株式会社 | Development processing equipment |
| JP5304771B2 (en) * | 2010-11-30 | 2013-10-02 | 東京エレクトロン株式会社 | Developing device, developing method, and storage medium |
-
2015
- 2015-07-14 CN CN201510411467.XA patent/CN106356316B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5879576A (en) * | 1996-05-07 | 1999-03-09 | Hitachi Electronics Engineering Co., Ltd. | Method and apparatus for processing substrates |
| CN102043354A (en) * | 2009-10-23 | 2011-05-04 | 东京毅力科创株式会社 | Developing apparatus and developing method |
| CN104103555A (en) * | 2013-04-04 | 2014-10-15 | 东京毅力科创株式会社 | Substrate processing method and substrate processing apparatus |
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| CN106356316A (en) | 2017-01-25 |
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Address after: 110168 No. 16 Feiyun Road, Hunnan District, Shenyang City, Liaoning Province Patentee after: Shenyang Core Source Microelectronic Equipment Co., Ltd. Address before: 110168 No. 16 Feiyun Road, Hunnan New District, Shenyang City, Liaoning Province Patentee before: Shenyang Siayuan Electronic Equipment Co., Ltd. |
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