CN106249202A - Location beam launcher, location beam emission equipment and alignment system - Google Patents
Location beam launcher, location beam emission equipment and alignment system Download PDFInfo
- Publication number
- CN106249202A CN106249202A CN201610520036.1A CN201610520036A CN106249202A CN 106249202 A CN106249202 A CN 106249202A CN 201610520036 A CN201610520036 A CN 201610520036A CN 106249202 A CN106249202 A CN 106249202A
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- China
- Prior art keywords
- location
- rotating shaft
- light
- fan
- launcher
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S5/00—Position-fixing by co-ordinating two or more direction or position line determinations; Position-fixing by co-ordinating two or more distance determinations
- G01S5/16—Position-fixing by co-ordinating two or more direction or position line determinations; Position-fixing by co-ordinating two or more distance determinations using electromagnetic waves other than radio waves
Abstract
The invention discloses a kind of location beam launcher, location beam emission equipment and alignment system.Wherein, this location beam launcher includes: the first beam sweep mechanism, have first and strafe rotating shaft, axis of rotation is strafed around first from the first location light beam of the first beam sweep mechanism outgoing, first location light beam is the one one word light covering of the fan with the first subtended angle, one one word light covering of the fan and first strafes rotating shaft out of plumb, the first edge and first on the downside of one one word light covering of the fan is strafed has the first angle α between rotating shaft, 10 °≤α≤30 °, the second edge and first on the upside of one one word light covering of the fan is strafed has the second angle β between rotating shaft, α ＜ β, and alpha+beta≤90 °.Thus, utilize the location beam launcher of the present invention, by it being carried out in a particular manner installation just so that the location light beam strafed can cover whole located space substantially.
Description
Technical field
The present invention relates to positioning field, particularly relate to a kind of location beam launcher, location beam emission equipment with
And alignment system.
Background technology
Indoor positioning technologies, as the auxiliary positioning of satellite fix, can solve satellite-signal and arrive during ground more weak, no
The problem that can penetrate building.Laser positioning technology is a kind of common indoor positioning technologies, and the program is by location sky
In build launch laser location beam launcher, located space is carried out laser and strafes, on object to be positioned design
Multiple laser pick-off induction apparatuss, and at receiving terminal, data are carried out calculation process, directly export three-dimensional location coordinates information.It is fixed
Bit stream journey can be as shown in Figure 1.
In order to not affect the normal location of object to be positioned, when object to be positioned moves in located space, need to ensure
The laser pick-off induction apparatus being arranged on object to be positioned can receive location light beam.Thus, it is desirable to make to determine at laser
During Wei, the location light beam that location beam launcher is strafed can cover whole located space substantially, thus to location
The structure of beam launcher and the installation of location beam launcher have certain requirement.
Existing location beam launcher is relatively simple for structure, and when being installed in located space, it is strafed
Location light beam can not cover whole located space, can produce blind area, thus normal location can be caused shadow in located space
Ring.
Summary of the invention
The technical problem that present invention mainly solves be to provide a kind of location beam launcher, location beam emission equipment with
And alignment system, it can solve the blind zone problem produced due to structure and the installation of location beam launcher.
According to an aspect of the invention, it is provided a kind of location beam launcher, for strafing the cycle with predetermined
Strafing location light beam to located space, this location beam launcher includes:
First beam sweep mechanism, has first and strafes rotating shaft, from the first location light of the first beam sweep mechanism outgoing
Bundle strafes axis of rotation around first, and the first location light beam is the one one word light covering of the fan with the first subtended angle, the one one word light fan
Rotating shaft out of plumb is strafed in face and first, and the first edge and first on the downside of the one one word light covering of the fan is strafed has first between rotating shaft
Angle α, 10 °≤α≤30 °, the second edge and first on the upside of the one one word light covering of the fan is strafed has the second angle between rotating shaft
β, α ＜ β, and alpha+beta≤90 °.
Preferably, α=20 °.
Preferably, the first beam sweep mechanism includes: the first light source, is used for launching point-like laser；First reflecting mirror, is used for
Reflect the point-like laser that the first light source sends；And the first wave mirror, incide first from the reflection light of the first reflecting mirror reflection
Outgoing after wave mirror, formation the one one word light covering of the fan, the first subtended angle γ of the one one word light covering of the fan of the one one word light covering of the fan >=
90 °, the layout attitude of the first reflecting mirror and the first wave mirror is provided so that, 10 °≤α≤30 ° and α ＜ β.
Preferably, the reflecting surface of the first reflecting mirror and the angle of vertical direction between 30 ° to 45 °, the first wave mirror with
The angle of vertical direction is between 0 ° to 30 °.
Preferably, the plane of incidence of the first wave mirror and exit facet are perpendicular to the axis of symmetry of the one one word light covering of the fan.
Preferably, this location beam launcher can also include: shell, and shell is provided with window, the first beam sweep
Mechanism strafes rotating shaft around first and at the uniform velocity rotates, and the cycle is the cycle of strafing, and window made in substantially 1/4th of the cycle of strafing
In period, the first location light beam is from window outgoing, and the first location light beam is blocked by shell At All Other Times.
Preferably, this location beam launcher can also include: the second beam sweep mechanism, have second strafe turn
Axle, strafes axis of rotation from the second location light beam of the second beam sweep mechanism outgoing around second, and the second location light beam is for having
2nd 1 word light covering of the fan of the second subtended angle, the 2nd 1 word light covering of the fan and second strafes rotating shaft out of plumb, wherein, the second beam sweep
Mechanism is fixed with the relative position of the first beam sweep mechanism, and the first beam sweep mechanism and the second beam sweep mechanism strafe fixed
The period of position light beam is different, and second strafes shaft parallel in horizontal plane, strafes in rotating shaft is in same plane with first and with the
One strafes rotating shaft vertically, and the second subtended angle is more than or equal to 90 °.
Preferably, the second beam sweep mechanism may include that secondary light source, is used for launching point-like laser；Second reflecting mirror,
For reflecting the point-like laser that secondary light source sends；And the second wave mirror, incide from the reflection light of the second reflecting mirror reflection
Outgoing after second wave mirror, forms the 2nd 1 word light covering of the fan, and the second subtended angle of the 2nd 1 word light covering of the fan is more than or equal to 90 °.
According to another aspect of the present invention, additionally provide a kind of location beam emission equipment, including: that addresses above determines
Position beam launcher, wherein, first to strafe rotating shaft parallel with vertical direction；And base, with horizontal plane, there is predetermined inclination
Degree, location beam launcher is adapted to mount on base, and wherein, predetermined gradient is arranged to, and is being sent out by location light beam
When injection device is arranged on base, first strafes rotating shaft has the 3rd angle theta with vertical direction, | α-θ |≤5 °.
Preferably, θ is substantially equal to α.
According to another aspect of the present invention, additionally provide a kind of alignment system, including: the location light beam addressed above is sent out
Jet device, when being arranged in the corner location at top in located space, first strafes rotating shaft to located space inner inclination.
To sum up, the location beam launcher provided based on the present invention, just install by it is carried out in a particular manner
So that the location light beam strafed can cover whole located space substantially.
Accompanying drawing explanation
By combining accompanying drawing, disclosure illustrative embodiments is described in more detail, the disclosure above-mentioned and its
Its purpose, feature and advantage will be apparent from, wherein, in disclosure illustrative embodiments, and identical reference number
Typically represent same parts.
What Fig. 1 showed existing laser positioning scheme realizes flow process.
A kind of blind area schematic diagram that Fig. 2 produces when showing and be arranged in located space by location beam launcher.
The another kind of blind area schematic diagram that Fig. 3 produces when showing and be arranged in located space by location beam launcher.
Fig. 4 shows the structural representation positioning beam launcher according to an embodiment of the invention.
Fig. 5 shows the structural representation of the generating means of the first location light beam.
Fig. 6 shows that a kind of concrete of the device shown in Fig. 5 arranges attitude schematic diagram.
Fig. 7 shows a kind of view when being arranged in located space by location beam launcher.
Fig. 8 shows that first strafes the position relationship schematic diagram between rotating shaft and the one one word light covering of the fan.
Fig. 9 shows the structural representation of the location beam launcher of another embodiment of the present invention.
Figure 10 shows the structural representation positioning beam emission equipment according to an embodiment of the invention.
Detailed description of the invention
It is more fully described the preferred implementation of the disclosure below with reference to accompanying drawings.Although accompanying drawing shows the disclosure
Preferred implementation, however, it is to be appreciated that may be realized in various forms the disclosure and the embodiment party that should not illustrated here
Formula is limited.On the contrary, it is provided that these embodiments are to make the disclosure more thorough and complete, and can be by the disclosure
Scope intactly conveys to those skilled in the art.
As described in the background section, when using laser positioning technology that object to be positioned is positioned, position light beam
Discharger each strafe the cycle in the location light beam strafed should be able to substantially cover whole located space, so that undetermined
When position object moves in located space, the laser pick-off induction apparatus being arranged on object to be positioned can receive location light
Bundle.
Further, when located space is extended to multiple located space, it is required in each located space being provided with and determines
Position beam launcher.Now, in order to avoid laser overlapping region, (laser overlapping region has different location light beam to send out the most simultaneously
Injection device strafed location light beam arrive region) interference, the location beam launcher in each located space is swept
The location light beam penetrated should be while not covering other located space being adjacent as far as possible, it is possible to the basic son covering its place
Located space.
Based on above-mentioned consideration, the present invention proposes the location beam launcher of a kind of special construction.By by the present invention
Location beam launcher be arranged on located space in some way, it is possible to achieve location beam launcher is strafed
Location light beam can cover whole located space substantially.It addition, when located space is multiple, it is also possible to realize each location sky
The location light beam that interior location beam launcher is strafed should be able to substantially cover the located space at its place and try one's best
Do not cover other located space being adjacent.
Before the structure that the present invention positions beam launcher illustrates, the first location light beam with regard to the present invention is sent out
The invention mechanism of injection device illustrates.
As a example by the light beam of beam launcher swinging traverse location, location, it is fixed to be typically arranged on by location beam launcher
The top of bit space, position beam launcher strafe rotating shaft parallel with vertical direction time, location beam launcher institute
The coboundary of the location light beam strafed close to the top of located space, and can position the location light that beam launcher is strafed
The lower boundary of bundle and vertical direction have certain angle so that the bottom corner that location beam launcher is installed exists relatively
Big blind area.
To this end, typically beam launcher will be positioned with vertical wall direction angled (usually 45 °) obliquely
Install.As in figure 2 it is shown, can location beam launcher 100 be arranged at the A of corner with metope is angled, this feelings
Under condition, it is possible to eliminate the blind area at corner, beam launcher place (i.e. corner A) place, location, but filling with location beam emissions
Put adjacent two corner (i.e. corner B and corner C) and the biggest blind area will be there is.See Fig. 2, it can be seen that with location light beam
Two corners (i.e. corner B and corner C) that discharger installs corner adjacent have the biggest blind area, and blind area can reach about 1 meter,
That is lifting arm when people goes to the two corner, its arm just cannot realize location.It addition, in this case, location
The location light beam that beam launcher is strafed can cover the subregion of the located space adjacent with the located space at its place,
Thus laser overlapping region can be caused.
Inventors noted that can be by reducing the setting angle of location beam launcher 100 and vertical wall so that
The scope of strafing of location light beam is mentioned obliquely upward, so that the blind area in Fig. 2 diminishes (may diminish to not affect location), but
It is to there will be new blind area in the bottom (i.e. the bottom of corner A) of the installation site of location beam launcher 100.Fig. 3 illustrates
When location beam launcher 100 is mentioned obliquely, at the scale diagrams of the blind area that the bottom of corner A is caused, such as Fig. 3
Shown in, blind area size can reach about 1.3m.
To this end, inventor finds after further investigation, can be by adjusting determining from location beam launcher outgoing
The central shaft of position light beam and the angle strafing rotating shaft, then coordinate certain mounting means, come dead zone-eliminating, i.e. make in location
Beam launcher, during strafing axis of rotation, can cover substantially from the location light beam of location beam launcher outgoing
Cover whole located space.
The architectural feature can having with regard to the location beam launcher of the present invention itself first below illustrates.
Fig. 4 shows the structural representation positioning beam launcher according to an embodiment of the invention.
Seeing Fig. 4, the location beam launcher of the embodiment of the present invention includes the first beam sweep mechanism 1, the first light beam
Strafe mechanism 1 to have first and strafe rotating shaft 11.Strafe around first from the first of the outgoing of the first beam sweep mechanism 1 the location light beam and turn
Axle 11 rotates, and the first location light beam is the one one word light covering of the fan 12 (see in figure shown in sector region) with the first subtended angle,
One one word light covering of the fan 12 and first strafes rotating shaft 11 out of plumb.So, rotating shaft is strafed at the one one word light covering of the fan 12 around first
During 11 rotate, the one one word light covering of the fan 12 just can be with an inswept solid region.The purpose of the present invention is just such that in
One one word light covering of the fan 12 around first strafe rotating shaft 11 rotate during, it is whole fixed that its solid region strafed substantially covers
Bit space.
Specifically, the first edge 121 and first on the downside of the one one word light covering of the fan 12 is strafed and is had between rotating shaft 11
One angle α, the second edge 122 and first on the upside of the one one word light covering of the fan 12 is strafed has the second angle β between rotating shaft 11, the
Word light covering of the fan 12 has the first subtended angle γ one by one.Wherein, 10 °≤α≤30 °, α ＜ β, and alpha+beta≤90 °.
Fig. 5 shows the structural representation of the generating means of the first location light beam.
See Fig. 5, it is possible to use first light source the 2, first reflecting mirror the 3, first wave mirror 4 produces the first location light beam.
Wherein, first light source the 2, first reflecting mirror the 3, first wave mirror 4 around first strafe axis of rotation (the i.e. first light source 2,
First reflecting mirror the 3, first wave mirror 4 can be arranged on inside the beam launcher of location).First light source 2 is used for launching point-like
Laser, the point-like laser that the first reflecting mirror 3 sends for reflection the first light source 2.Incident from the reflection light of the first reflecting mirror 3 reflection
4 outgoing after the first wave mirror, form the one one word light covering of the fan 12.The plane of incidence of the first wave mirror 4 and exit facet are perpendicular to
The axis of symmetry 123 of word light covering of the fan 12 one by one.
By changing the first reflecting mirror 3 and layout attitude of the first wave mirror 4, can regulate the numerical value of the first angle α with
And second numerical value of angle β.The most preferably, the layout attitude of the first reflecting mirror 3 and the first wave mirror 4 is provided so that,
10 °≤α≤30 ° and α ＜ β.
Wherein, the numerical value of the first subtended angle γ is relevant with the optical characteristics of the first selected wave mirror 4.Suitable by choosing
The first wave mirror 4 so that the first subtended angle γ >=90 °.
Fig. 6 shows that a kind of concrete of the device shown in Fig. 5 arranges attitude schematic diagram.
Seeing Fig. 6, it is internal that the first reflecting mirror 3 and the first wave mirror 4 can be arranged on the first beam sweep mechanism 1, jointly
Axis of rotation is strafed around first.Wherein, the first of the first beam sweep mechanism 1 strafes rotating shaft can be the first beam sweep machine
The axis 13 of structure 1, the i.e. first beam sweep mechanism 1 can rotate around axis 13.In the first beam sweep mechanism 1
The first light source (not shown) can be arranged in the top of one reflecting mirror 3, and the first light source can also strafe rotating shaft (i.e. around first
Axis 13) rotate.It addition, according to the first reflecting mirror 3 and the difference of the layout attitude of the first wave mirror 4, the first light source is arranged
Position can also be different, repeat no more here.
The reflecting surface (i.e. shadow region on the first reflecting mirror 3 shown in figure) of the first reflecting mirror 3 can be swept with first
Penetrate rotating shaft (i.e. axis 13) in certain angle, as can be in the angle between 30 ° to 45 °.The plane of incidence of the first wave mirror 4
(i.e. shadow region on the first wave mirror 4 shown in figure) and first strafes rotating shaft (i.e. axis 13) can also be in certain
Angle, as can be in the angle between 0 ° to 30 °.Now, from the symmetry of the one one word light covering of the fan 12 of the first wave mirror 4 outgoing
It is not orthogonal that axle 123 strafes rotating shaft (i.e. axis 13) with first.
Thus, by regulating the reflecting surface of the first reflecting mirror 3 and the first angle strafing between rotating shaft and the first wave
The angle between rotating shaft strafed by mirror 4 and first, can adjust the symmetry of the one one word light covering of the fan 12 from the first wave mirror 4 outgoing
Axle 123 and first strafes the angle between rotating shaft, so that α ＜ β, and 10 °≤α≤30 °.Wherein it is possible to by choosing conjunction
The first suitable wave mirror 4 is so that the first subtended angle γ >=90 °.
So far, the structure of the location beam launcher of the present invention is described in detail in conjunction with Fig. 4 to Fig. 6.Based on the present invention
The location beam launcher provided, can be arranged in located space with certain mounting means, so that
During one strafes axis of rotation, effective range of exposures of the first location light beam can substantially cover location beam emissions dress
Put the located space at place.
A kind of feasible tool location the most provided by the present invention beam launcher being arranged in located space
Body arrangement illustrates.
The first beam sweep mechanism 1 in the beam launcher of location provided by the present invention can be with swinging traverse.Such as Fig. 7
Shown in, for being shaped as the located space of cuboid or square, location beam launcher can be arranged in located space
Top corners at, so, location beam launcher in the first beam sweep mechanism have only to sweep to from a vertical plane
Another vertical plane (i.e. strafing in the range of 90 °) just can realize strafing location light beam to whole location.Such as, inciting somebody to action
The first light when location beam launcher is arranged in the upper left corner of the located space shown in Fig. 7, in the beam launcher of location
Bundle is strafed mechanism and is had only to from abfe Plane Rotation to abcd plane.
Wherein, as described above, during the first beam sweep mechanism in the beam launcher of location rotates, need
The effective range of exposures making the first location light beam from the outgoing of the first beam sweep mechanism can substantially cover location light
Bundle discharger place located space, namely the one one word light covering of the fan around first strafe axis of rotation during, it is swept
The solid region penetrated substantially covers whole located space.
To this end, can be by down-set to located space inner inclination for location beam launcher, so that positioning light beam
The rotating shaft (i.e. first strafes rotating shaft) of strafing of the first beam sweep mechanism in discharger has certain folder with vertical direction
Angle.As shown in Figure 8, CD represents that first strafes rotating shaft, and AC represents metope, and FE is the second edge on the upside of the one one word light covering of the fan,
FG is the first edge on the downside of the one one word light covering of the fan, and EH is the one one word light covering of the fan axis of symmetry.
CD (first strafes rotating shaft) and AC (vertical metope) has the 3rd angle theta, by regulating the first beam sweep mechanism
Layout attitude so that | α-θ |≤5 °, the most preferably θ is substantially equal to α.
As shown in Figure 8, the subtended angle ∠ FEG of the one one word light covering of the fan can be 90 °, when angle ACD is 20 °, and the one one word
Axis of symmetry EH and first angle strafing rotating shaft C D of light covering of the fan are about 65 °.Now, the second limit on the upside of the one one word light covering of the fan
The edge EF the first edge FG on the downside of ceiling, the one one word light covering of the fan is arranged essentially parallel to vertical direction.Thus, it is possible to
Making during the first beam sweep mechanism rotates, the region that the one one word light covering of the fan is inswept can substantially cover it
The located space at place, less covers the located space with its place to other neighbouring located space.
To sum up, based on location provided by the present invention beam launcher, it is installed in by certain mounting means
In located space, so that the location that the location light beam that location beam launcher is strafed can cover its place substantially is empty
Between, and also less can cover with the located space at its place to neighbouring while covering the located space at its place
Other located space.
So far, in conjunction with Fig. 7, Fig. 8, the present invention positions the arrangement of beam launcher to elaborate.Based on
Above-mentioned arrangement, the location beam launcher of the present invention can also have other version.
Fig. 9 shows the structural representation of the location beam launcher of another embodiment of the present invention.
Seeing Fig. 9, the location beam launcher of the embodiment of the present invention can also include that shell 6, shell 6 are provided with window
21, the first beam sweep mechanism 1 strafes rotating shaft 11 around first and at the uniform velocity rotates, and the cycle is the cycle of strafing, and window 21 makes strafing
During substantially 1/4th of cycle, the first location light beam is from window 21 outgoing, and the first location light beam is by shell At All Other Times
6 block.So, when location beam launcher is arranged at the top corners of located space, it is possible to achieve the light beam of location
Discharger only strafes location light beam to the located space at its place.
Figure 10 shows the structural representation positioning beam emission equipment according to an embodiment of the invention.
Seeing Figure 10, the location beam emission equipment of the embodiment of the present invention can include the location beam emissions shown in Fig. 9
Device and base 7.
Wherein, first of the first beam sweep mechanism 1 in the beam launcher of location strafes rotating shaft 11 and vertical direction
Parallel.Base 7 and horizontal plane have predetermined gradient, and location beam launcher is adapted to mount on base 7, wherein, in advance
Fixed gradient is arranged to, and when being arranged on base 7 by location beam launcher, first strafes rotating shaft 11 and vertically side
To having the 3rd angle theta, | α-θ |≤5 °.It is preferred here that θ is substantially equal to α.
For the location beam emission equipment shown in Figure 10, the corner at top in located space can be arranged in
Position, and make first to strafe rotating shaft to located space inner inclination.
Thus, present invention also offers the alignment system of a kind of location beam emission equipment included shown in Figure 10.Wherein,
When location beam emission equipment being arranged in the corner location at top in located space, first in the beam emission equipment of location
Strafe rotating shaft to located space inner inclination.
So far, the location beam launcher of the present invention is described in detail and by the location beam launcher of the present invention
The concrete mode being arranged in located space.It addition, the location beam launcher of the present invention can also include that the second light beam is swept
Penetrate mechanism.The rotating shaft of strafing strafing rotating shaft and the first beam sweep mechanism of the second beam sweep mechanism has the folder being not zero
Angle, and the second beam sweep mechanism strafe with the first beam sweep mechanism location light beam period different.
Specifically, strafe axis of rotation from the second location light beam of the second beam sweep mechanism outgoing around second, second
Location light beam is the 2nd 1 word light covering of the fan with the second subtended angle, and the 2nd 1 word light covering of the fan and second strafes rotating shaft out of plumb, its
In, the second beam sweep mechanism is fixed with the relative position of the first beam sweep mechanism, the first beam sweep mechanism and the second light
Bundle strafes mechanism, and to strafe period of location light beam different, and second strafes shaft parallel in horizontal plane, strafes rotating shaft with first and is in
In same plane and strafing rotating shaft with first vertical, the second subtended angle is more than or equal to 90 °.
Therefore, the location beam launcher comprising the first beam sweep mechanism and the second beam sweep mechanism is being installed
Time in located space, the first beam sweep mechanism can be responsible for left and right, and to strafe (swinging traverse) second beam sweep mechanism permissible
It is responsible for strafing (longitudinally strafing) up and down.Wherein, the mounting means addressed above is being used to be arranged on by location beam launcher
Time in located space, owing to second strafes rotating shaft and strafe in rotating shaft is in same plane with first and strafe rotating shaft with first and hang down
Directly.Therefore, when first strafes axes of rotation skew certain angle, second strafe rotating shaft still with horizontal direction parallel.Do not affect
Two beam sweep mechanisms strafe second location light beam strafe scope.
Wherein, the structure of the second beam sweep mechanism is similar with the structure of the first beam sweep mechanism, simply strafes rotating shaft
Direction different.Therefore, the most only the structure of the second beam sweep mechanism has been done brief description, for the details being directed to
Part refers to the associated description above in association with Fig. 4 to Fig. 6.It addition, the second beam sweep mechanism produces the second location light beam
The structure of part essentially identical with Fig. 5 shown device structure, it is also possible to be by a light source, a reflecting mirror and one
Wave mirror produces the second location light beam, repeats no more here.
Above describe the location beam launcher according to the present invention, location beam emissions in detail by reference to accompanying drawing
Equipment and alignment system.
Being described above various embodiments of the present invention, described above is exemplary, and non-exclusive, and also
It is not limited to disclosed each embodiment.In the case of the scope and spirit without departing from illustrated each embodiment, for this skill
For the those of ordinary skill in art field, many modifications and changes will be apparent from.The selection of term used herein, purport
Explaining the principle of each embodiment, actual application or the improvement to the technology in market best, or making the art
Other those of ordinary skill is understood that each embodiment disclosed herein.
Claims (11)
1. a location beam launcher, for strafing location light beam with the predetermined cycle of strafing to located space, this location
Beam launcher includes:
First beam sweep mechanism, has first and strafes rotating shaft, from the first location light of described first beam sweep mechanism outgoing
Restrainting and strafe axis of rotation around described first, described first location light beam is the one one word light covering of the fan with the first subtended angle, described
One one word light covering of the fan and described first strafes rotating shaft out of plumb,
The first edge and described first on the downside of described one one word light covering of the fan is strafed has the first angle α between rotating shaft, 10 °≤
α≤30 °,
The second edge and described first on the upside of described one one word light covering of the fan is strafed has the second angle β between rotating shaft, α ＜ β,
And alpha+beta≤90 °.
Location the most according to claim 1 beam launcher, wherein, α=20 °.
Location the most according to claim 1 beam launcher, wherein, described first beam sweep mechanism includes:
First light source, is used for launching point-like laser；
First reflecting mirror, for reflecting the point-like laser that described first light source sends；And
First wave mirror, outgoing after the reflection light of described first reflecting mirror reflection incides described first wave mirror, form institute
State the one one word light covering of the fan, the first subtended angle γ >=90 ° of the one one word light covering of the fan of described one one word light covering of the fan,
The layout attitude of described first reflecting mirror and described first wave mirror is provided so that, 10 °≤α≤30 ° and α ＜ β.
Location the most according to claim 3 beam launcher, wherein,
The reflecting surface of described first reflecting mirror and described first strafes the angle of rotating shaft between 30 ° to 45 °, described first wave
Mirror and described first strafes the angle of rotating shaft between 0 ° to 30 °.
Location the most according to claim 3 beam launcher, wherein,
The plane of incidence of described first wave mirror and exit facet are perpendicular to the axis of symmetry of described one one word light covering of the fan.
Location the most according to claim 1 beam launcher, also includes:
Shell, described shell is provided with window, and described first beam sweep mechanism strafes rotating shaft around described first and at the uniform velocity rotates, week
Phase strafes the cycle described in being, described window make described strafe the cycle substantially 1/4th during in described first location
Light beam is blocked by described shell from described window outgoing, the most described first location light beam.
7., according to the location beam launcher in any of the one of claim 1-6, also include:
Second beam sweep mechanism, has second and strafes rotating shaft, from the second location light of described second beam sweep mechanism outgoing
Restrainting and strafe axis of rotation around described second, described second location light beam is the 2nd 1 word light covering of the fan with the second subtended angle, described
2nd 1 word light covering of the fan and described second strafes rotating shaft out of plumb,
Wherein, described second beam sweep mechanism is fixed with the relative position of described first beam sweep mechanism, described first light
Bundle strafe mechanism strafe with described second beam sweep mechanism location light beam period different, described second strafe shaft parallel in
Horizontal plane, strafes in rotating shaft is in same plane with described first and strafe rotating shaft with described first vertical, described second subtended angle
More than or equal to 90 °.
Location the most according to claim 7 beam launcher, wherein, described second beam sweep mechanism includes:
Secondary light source, is used for launching point-like laser；
Second reflecting mirror, for reflecting the point-like laser that described secondary light source sends；And
Second wave mirror, outgoing after the reflection light of described second reflecting mirror reflection incides described second wave mirror, form institute
Stating the 2nd 1 word light covering of the fan, the second subtended angle of described 2nd 1 word light covering of the fan is more than or equal to 90 °.
9. a location beam emission equipment, including:
According to the location beam launcher according to any one of claim 1-8, wherein, described first rotating shaft is strafed with vertical
Direction is parallel；With
Base, has predetermined gradient with horizontal plane, and described location beam launcher is adapted to mount on described base, its
In, described predetermined gradient is arranged to, when described location beam launcher is arranged on described base, and described
One strafes rotating shaft has the 3rd angle theta with vertical direction, | α-θ |≤5 °.
Location the most according to claim 9 beam emission equipment, wherein, θ is substantially equal to α.
11. 1 kinds of alignment systems, including:
Want the location beam emission equipment described in 9 or 10 according to right, be arranged in the corner location at top in described located space
Time, described first strafes rotating shaft to described located space inner inclination.
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