CN106222710A - A kind of acid half bright tin plating solution and preparation method thereof - Google Patents

A kind of acid half bright tin plating solution and preparation method thereof Download PDF

Info

Publication number
CN106222710A
CN106222710A CN201610742278.5A CN201610742278A CN106222710A CN 106222710 A CN106222710 A CN 106222710A CN 201610742278 A CN201610742278 A CN 201610742278A CN 106222710 A CN106222710 A CN 106222710A
Authority
CN
China
Prior art keywords
acid
water
tin plating
plating solution
add
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610742278.5A
Other languages
Chinese (zh)
Inventor
范云鹰
支月鹏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kunming University of Science and Technology
Original Assignee
Kunming University of Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kunming University of Science and Technology filed Critical Kunming University of Science and Technology
Priority to CN201610742278.5A priority Critical patent/CN106222710A/en
Publication of CN106222710A publication Critical patent/CN106222710A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/30Electroplating: Baths therefor from solutions of tin
    • C25D3/32Electroplating: Baths therefor from solutions of tin characterised by the organic bath constituents used

Abstract

Invention describes a kind of acid half bright tin plating solution and preparation method thereof, belong to field of material surface treatment.Component and the content thereof of solution of the present invention are as follows: stannous sulfate 20 40g/L, sulphuric acid 80 110mL/L, benzylideneacetone 0.1 0.5g/L, OP 10 2 4mL/L, NP 10 1.5 3mL/L, sodium benzoate 0.9 1.5g/L, nicotinic acid 0.1 0.25g/L, gelatin 1 4g/L, ferrous sulfate 2 3g/L, ascorbic acid 0.5 1g/L, antimony potassium tartrate 0.5 1g/L, remaining is water.The solution dispersibility of the present invention and covering power are good, operating temperature range and cathode-current density wide ranges, and plating weldability is good, and adhesion is strong, and does not adds carcinogen Beta Naphthol 99MIN and poisonous aldehydes, and to human body and environmentally friendly, and cost reduces.

Description

A kind of acid half bright tin plating solution and preparation method thereof
Technical field
The present invention relates to a kind of acid half bright tin plating solution and preparation method thereof, belong to tin plating technical field.
Background technology
Acidic Sn electroplating is a kind of electroplating technology grown up the sixties.Tin plating to have toxicity low, good environmental protection, deposition The advantages such as speed is fast, and current efficiency is high and corrosion resistance is good, the most gradually obtain popularization and application.Light according to coating Degree, Acidic Sn electroplating can be divided into bright coating and half bright coating.The latter is also referred to as dark stannum, mist stannum and matte tin, compares the former, and half Bright tin plating layer has excellent reliability, and it is suitable as the solderable coating of various electronic component, has more tin plating than entire bright Preferably dispersibility, while taking into account assembly parts outward appearance needs, can reduce again the high light in installation to operator's eye The stimulation in portion.
Conventional acidity half bright tin plating technique is divided into sulfuric acid type and sulfonic acid type two kinds.The latter's bath stability is good, electric current Density is higher, is suitable for high speed electrodeposition and uses, but the cost of electroplate liquid is the highest.Comparatively speaking, although the former stability relatively Low, but its low cost, and there is excellent covering power and dispersibility, the most leaded and other harmful substances in plating solution, at electricity Sub-components and parts solderable coating and protectiveness coating are widely used.
Existing Technology Bright Acidic technology is highly developed, has a lot of pertinent literature to report both at home and abroad, and the document of half bright tin plating Report the most less.Formula the most classical is that nineteen forty-one NACHTMAN discloses the continuous of a kind of strip steel at US2240265 Tin plating technique, its electroplate liquid consists of cresol sulfonic acid, betanaphthol and animal glue.The electroplate liquid of this patent is used till today always, is The standard electric plating solution of currently used acquisition half light coating.Additionally, also minority half bright tin plating technique, be adapted to sulphuric acid- Phenol sulfonic acid or pyrovinic acid system, the most rare about the half bright tin plating technique with sulphuric acid as disperse medium.Phenol sulfonic acid There is the pollution problem of phenolic compound, therefore the plating solution as disperse medium is the most progressively eliminated.And metilsulfate body It is that plating solution is relatively costly.Additionally, betanaphthol is still the main additive of existing half Bright Tin plating solution, but research shows, this material Belong to the dangerous carcinogen of potentiality, thus preferably lack in electroplate liquid with or without.Accordingly, it would be desirable to exploitation does not use β-naphthalene The half bright tin plating solution with sulphuric acid as disperse medium of phenol.
Summary of the invention
It is an object of the invention to provide a kind of acid half bright tin plating solution, the group of described acid half bright tin plating solution Point and content be: stannous sulfate is 20-40g/L, and sulphuric acid is 80-110mL/L, benzylideneacetone be 0.1-0.5g/L, OP-10 be 2- 4mL/L, NP-10 are 1.5-3mL/L, and sodium benzoate is 0.9-1.5g/L, and nicotinic acid is 0.1-0.25g/L, and gelatin is 1-4g/L, sulfur Acid ferrous iron is 2-3g/L, and ascorbic acid is 0.5-1g/L, and antimony potassium tartrate is 0.5-1g/L, and remaining is water.
Another object of the present invention is to provide the preparation method of described acid half bright tin plating solution, specifically include following Step:
(1) being added to the water by sulphuric acid (98% concentrated sulphuric acid for commercially available), be cooled to room temperature, be subsequently adding stannous sulfate, stirring makes it It is completely dissolved;
(2) nicotinic acid, gelatin and antimony potassium tartrate are added to the water so that it is be completely dissolved;
(3) sodium benzoate, ferrous sulfate and ascorbic acid are added to the water, and are sufficiently stirred for making it be completely dissolved;
(4) being joined by benzylideneacetone in the mixed solution of OP-10 and NP-10, stirring makes it be completely dissolved, and then add water stirring Make it fully transparent, be cooled to room temperature afterwards;
(5) solution of step (2), (3), (4) gained is added in the solution of step (1) gained, be sufficiently stirred for making it mix all Even, then adding water, it is volume required to be settled to, and i.e. obtains acid half bright tin plating solution.
Step (2) can heat water to 50 DEG C-60 DEG C to accelerate rate of dissolution.
With 50 DEG C of-60 DEG C of heating in water bath in course of dissolution in step (4).
Stannous sulfate of the present invention, sulphuric acid, benzylideneacetone, sodium benzoate, nicotinic acid, NP-10, OP-10, gelatin, sulphuric acid Ferrous iron, ascorbic acid, antimony potassium tartrate are commercially available analytical pure chemical reagent.
Beneficial effects of the present invention: acid half bright tin plating solution solution dispersibility and covering power of the present invention Good, operating temperature range and cathode-current density wide ranges, plating weldability is good, and adhesion is strong, and do not add carcinogen β- Naphthols and poisonous aldehydes, to human body and environmentally friendly, and because institute's reagent adding is nontoxic, so raw material is easy to get and low price, Reduce production cost to a certain extent.
Detailed description of the invention
Below in conjunction with detailed description of the invention, the invention will be further described, but in the core without departing from the present invention In the case of, any simple deformation, amendment or other those skilled in the art can not spend the equivalent of creative work to replace Change and each fall within protection scope of the present invention.
Embodiment 1
Component and the content of the acid half bright tin plating solution of the present embodiment is: stannous sulfate 20g/L, sulphuric acid 80mL/L, benzal third Ketone 0.1g/L, OP-10 2mL/L, NP-10 1.5mL/L, sodium benzoate 0.9g/L, nicotinic acid 0.1g/L, gelatin 1g/L, sulphuric acid is sub- Ferrum 2g/L, ascorbic acid 0.5g/L, antimony potassium tartrate 0.5g/L, remaining is pure water.
In units of 1L, prepare acid half bright tin plating solution described in the present embodiment, specifically comprise the following steps that
(1) take a clean beaker, add 400mL pure water, take 80mL sulphuric acid and be slowly added in water, be cooled to room temperature.
(2) adding 20g stannous sulfate in step (1), stirring is to being completely dissolved.
(3) take a clean 10mL graduated cylinder, add NP-10 and the 0.1g benzylideneacetone of the OP-10,1.5mL of 2mL, 58 DEG C heating in water bath, adds after waiting benzylideneacetone to be completely dissolved in the beaker filling 100mL pure water, and 58 DEG C of heating in water bath are until it is complete All-transparent, is cooled to room temperature afterwards.
(4) taking a clean beaker, add 20mL pure water, take 0.9g sodium benzoate and add in beaker, stirring is to the most molten Solve.
(5) taking a clean beaker, add 30mL pure water, take 2g ferrous sulfate and add in beaker, stirring is to being completely dissolved.
(6) taking a clean beaker, add 50mL pure water, take 0.5g ascorbic acid and add in beaker, stirring is to the most molten Solve.
(7) take a clean beaker, add 50mL pure water, take 0.1g nicotinic acid and add in beaker, 58 DEG C of heating in water bath, and stir Mix and be completely dissolved to it, be cooled to room temperature afterwards.
(8) take a clean beaker, add 50mL pure water, take 1g gelatin and add in beaker, 58 DEG C of heating in water bath, and stir It is completely dissolved to it, is cooled to room temperature afterwards.
(9) taking a clean beaker, add 50mL pure water, take 0.5g antimony potassium tartrate and add in beaker, 58 DEG C of water-baths add Heat, and stir and be completely dissolved to it, it is cooled to room temperature afterwards.
(10) solution that step (3) (4) (5) (6) (7) (8) (9) obtains is joined in the solution that step (2) obtains, fill Divide stirring to make its mix homogeneously, add water afterwards and be settled to 1L, i.e. obtain acid half bright tin plating solution.
This experiment is carried out in the Hull groove of 250mL, and the time is 5min, and anode is sheet tin, and negative electrode is copper sheet, electric current density For 1A/dm2, temperature is room temperature.
Electrotinning technological process is:
Polishing → washing → pickling (30-50ml sulphuric acid/L, 10-15s) → wash → electroplate → wash → dry up.
Coating surface after the electroplate liquid plating prepared through the present embodiment is smooth, half light, without bubbling, pit and local nothing The defects such as coating;Plating piece is impregnated in solder flux, then leaching 5s in the molten tin that temperature is 250 DEG C, surfacing after taking-up, 97% Being stained with new tin layers (requiring >=95%), bubble-free and pin-hole phenomena, welding performance is good;Draw cutter with converted steel to draw on plating piece surface Article two, at a distance of the parallel lines as deep as matrix for 2mm, the coating between two line does not come off, and adhesion is strong.
Embodiment 2
Component and the content of the acid half bright tin plating solution of the present embodiment is: stannous sulfate 40g/L, sulphuric acid 110mL/L, benzal third Ketone 0.5g/L, OP-10 4mL/L, NP-10 3mL/L, sodium benzoate 1.5g/L, nicotinic acid 0.25g/L, gelatin 4g/L, ferrous sulfate 3g/L, ascorbic acid 1g/L, antimony potassium tartrate 1g/L, remaining is pure water.
In units of 1L, prepare acid half bright tin plating solution described in the present embodiment, specifically comprise the following steps that
(1) take a clean beaker, add 400mL pure water, take 110mL sulphuric acid and be slowly added in water, be cooled to room temperature.
(2) adding 20g stannous sulfate in step (1), stirring is to being completely dissolved.
(3) take a clean 10mL graduated cylinder, add OP-10 and the 0.5g benzylideneacetone of the NP-10,4mL of 3mL, 58 DEG C Heating in water bath, adds after waiting benzylideneacetone to be completely dissolved in the beaker filling 100mL pure water, and 58 DEG C of heating in water bath are until it is complete Transparent, it is cooled to room temperature afterwards.
(4) taking a clean beaker, add 20mL pure water, take 1.5g sodium benzoate and add in beaker, stirring is to the most molten Solve.
(5) taking a clean beaker, add 30mL pure water, take 3g ferrous sulfate and add in beaker, stirring is to being completely dissolved.
(6) taking a clean beaker, add 50mL pure water, take 1g ascorbic acid and add in beaker, stirring is to being completely dissolved.
(7) take a clean beaker, add 50mL pure water, take 0.25g nicotinic acid and add in beaker, 58 DEG C of heating in water bath, and Stirring is completely dissolved to it, is cooled to room temperature afterwards.
(8) take a clean beaker, add 50mL pure water, take 4g gelatin and add in beaker, 58 DEG C of heating in water bath, and stir It is completely dissolved to it, is cooled to room temperature afterwards.
(9) take a clean beaker, add 50mL pure water, take 1g antimony potassium tartrate and add in beaker, 58 DEG C of heating in water bath, And stir and be completely dissolved to it, it is cooled to room temperature afterwards.
(10) solution that step (3) (4) (5) (6) (7) (8) (9) obtains is joined in the solution that step (2) obtains, fill Divide stirring to make its mix homogeneously, add water afterwards and be settled to 1L, i.e. obtain acid half bright tin plating solution.
This experiment is carried out in the Hull groove of 250mL, and the time is 5min, and anode is sheet tin, and negative electrode is copper sheet, electric current density For 1A/dm2, temperature is room temperature.
Electrotinning technological process is:
Polishing → washing → pickling (30-50ml sulphuric acid/L, 10-15s) → wash → electroplate → wash → dry up.
Coating surface after the electroplate liquid plating prepared through the present embodiment is smooth, half light, without bubbling, pit and local nothing The defects such as coating;Plating piece is impregnated in solder flux, then leaching 5s in the molten tin that temperature is 250 DEG C, surfacing after taking-up, 96% Being stained with new tin layers (requiring >=95%), bubble-free and pin-hole phenomena, welding performance is good;Draw cutter with converted steel to draw on plating piece surface Article two, at a distance of the parallel lines as deep as matrix for 2mm, the coating between two line does not come off, and adhesion is strong.
Embodiment 3
Component and the content of the acid half bright tin plating solution of the present embodiment is: stannous sulfate 30g/L, sulphuric acid 100mL/L, benzal third Ketone 0.3g/L, OP-10 3mL/L, NP-10 2.5mL/L, sodium benzoate 1.2g/L, nicotinic acid 0.2g/L, gelatin 2g/L, sulphuric acid is sub- Ferrum 2.5g/L, ascorbic acid 0.8g/L, antimony potassium tartrate 0.7g/L, remaining is pure water.
In units of 1L, prepare acid half bright tin plating solution described in the present embodiment, specifically comprise the following steps that
(1) take a clean beaker, add 400mL pure water, take 100mL sulphuric acid and be slowly added in water, be cooled to room temperature.
(2) adding 30g stannous sulfate in step (1), stirring is to being completely dissolved.
(3) take a clean 10mL graduated cylinder, add OP-10 and the 0.3g benzylideneacetone of the NP-10,3mL of 2.5mL, 58 DEG C heating in water bath, adds after waiting benzylideneacetone to be completely dissolved in the beaker filling 100mL pure water, and 58 DEG C of heating in water bath are until it is complete All-transparent, is cooled to room temperature afterwards.
(4) taking a clean beaker, add 20mL pure water, take 1.2g sodium benzoate and add in beaker, stirring is to the most molten Solve.
(5) taking a clean beaker, add 30mL pure water, take 2.5g ferrous sulfate and add in beaker, stirring is to the most molten Solve.
(6) taking a clean beaker, add 50mL pure water, take 0.8g ascorbic acid and add in beaker, stirring is to the most molten Solve.
(7) take a clean beaker, add 50mL pure water, take 0.2g nicotinic acid and add in beaker, 58 DEG C of heating in water bath, and stir Mix and be completely dissolved to it, be cooled to room temperature afterwards.
(8) take a clean beaker, add 50mL pure water, take 2g gelatin and add in beaker, 58 DEG C of heating in water bath, and stir It is completely dissolved to it, is cooled to room temperature afterwards.
(9) taking a clean beaker, add 50mL pure water, take 0.7g antimony potassium tartrate and add in beaker, 58 DEG C of water-baths add Heat, and stir and be completely dissolved to it, it is cooled to room temperature afterwards.
(10) solution that step (3) (4) (5) (6) (7) (8) (9) obtains is joined in the solution that step (2) obtains, fill Divide stirring to make its mix homogeneously, add water afterwards and be settled to 1L, i.e. obtain acid half bright tin plating solution.
This experiment is carried out in the Hull groove of 250mL, and the time is 5min, and anode is sheet tin, and negative electrode is copper sheet, electric current density For 1A/dm2, temperature is room temperature.
Electrotinning technological process is:
Polishing → washing → pickling (30-50ml sulphuric acid/L, 10-15s) → wash → electroplate → wash → dry up.
Coating surface after the electroplate liquid plating prepared through the present embodiment is smooth, half light, without bubbling, pit and local nothing The defects such as coating;Plating piece is impregnated in solder flux, then leaching 5s in the molten tin that temperature is 250 DEG C, surfacing after taking-up, 99% Being stained with new tin layers (requiring >=95%), bubble-free and pin-hole phenomena, welding performance is good;Draw cutter with converted steel to draw on plating piece surface Article two, at a distance of the parallel lines as deep as matrix for 2mm, the coating between two line does not come off, and adhesion is strong.

Claims (2)

1. an acidity half bright tin plating solution, it is characterised in that: component and the content of described acid half bright tin plating solution is: Stannous sulfate is 20-40g/L, and sulphuric acid is 80-110mL/L, benzylideneacetone be 0.1-0.5g/L, OP-10 be 2-4mL/L, NP-10 For 1.5-3mL/L, sodium benzoate is 0.9-1.5g/L, and nicotinic acid is 0.1-0.25g/L, and gelatin is 1-4g/L, and ferrous sulfate is 2- 3g/L, ascorbic acid is 0.5-1g/L, and antimony potassium tartrate is 0.5-1g/L, and remaining is water.
2. the preparation method of an acid half bright tin plating solution as claimed in claim 1, it is characterised in that specifically include following Step:
(1) being added to the water by sulphuric acid, be cooled to room temperature, be subsequently adding stannous sulfate, stirring makes it be completely dissolved;
(2) nicotinic acid, gelatin and antimony potassium tartrate are added to the water so that it is be completely dissolved;
(3) sodium benzoate, ferrous sulfate and ascorbic acid are added to the water, and are sufficiently stirred for making it be completely dissolved;
(4) being joined by benzylideneacetone in the mixed solution of OP-10 and NP-10, stirring makes it be completely dissolved, and then add water stirring Make it fully transparent, be cooled to room temperature afterwards;
(5) solution of step (2), (3), (4) gained is added in the solution of step (1) gained, be sufficiently stirred for making it mix all Even, then adding water, it is volume required to be settled to, and i.e. obtains acid half bright tin plating solution.
CN201610742278.5A 2016-08-29 2016-08-29 A kind of acid half bright tin plating solution and preparation method thereof Pending CN106222710A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610742278.5A CN106222710A (en) 2016-08-29 2016-08-29 A kind of acid half bright tin plating solution and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610742278.5A CN106222710A (en) 2016-08-29 2016-08-29 A kind of acid half bright tin plating solution and preparation method thereof

Publications (1)

Publication Number Publication Date
CN106222710A true CN106222710A (en) 2016-12-14

Family

ID=57556087

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610742278.5A Pending CN106222710A (en) 2016-08-29 2016-08-29 A kind of acid half bright tin plating solution and preparation method thereof

Country Status (1)

Country Link
CN (1) CN106222710A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106835210A (en) * 2017-03-09 2017-06-13 昆明理工大学 A kind of sulfate bright tin plating solution and preparation method thereof
CN108396343A (en) * 2018-05-05 2018-08-14 深圳市竑鎏电子表面处理科技有限公司 A kind of mist tin additive and the electroplate liquid using the mist tin additive
TWI703239B (en) * 2018-03-20 2020-09-01 日商三菱綜合材料股份有限公司 Plating solution of tin or tin alloy and method for forming bumps
CN113430593A (en) * 2021-05-10 2021-09-24 江苏灏润新材料科技有限公司 Novel additive suitable for high-speed copper-tin composite production

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3483100A (en) * 1966-09-14 1969-12-09 Philips Corp Tin plating baths
JPS58151487A (en) * 1982-03-01 1983-09-08 Shinko Electric Ind Co Ltd Tin electroplating bath made acidic with hydrochloric aicd
US4439286A (en) * 1981-07-14 1984-03-27 Edinen Centar Po Chimia Electrolyte for the deposition of bright tin coatings
JPH0754184A (en) * 1993-08-17 1995-02-28 Kobe Steel Ltd Sulfuric acid tin plating bath for reflow plating capable of embodying fast continuous plating
CN101922026A (en) * 2010-08-18 2010-12-22 济南德锡科技有限公司 Methanesulfonic acid-based matte pure tin electroplating solution and additive thereof
CN101962790A (en) * 2010-08-20 2011-02-02 河南科技大学 Electrolyte composition for half bright acid tinning
CN103882485A (en) * 2014-04-04 2014-06-25 哈尔滨工业大学 All-sulfate tin electroplating additive and plating solution thereof
CN105063680A (en) * 2015-08-21 2015-11-18 无锡桥阳机械制造有限公司 Sulfonic acid type semi-bright pure-tin electroplating liquid
CN105648483A (en) * 2016-04-11 2016-06-08 济南德锡科技有限公司 High-speed tinning solution and preparation method thereof

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3483100A (en) * 1966-09-14 1969-12-09 Philips Corp Tin plating baths
US4439286A (en) * 1981-07-14 1984-03-27 Edinen Centar Po Chimia Electrolyte for the deposition of bright tin coatings
JPS58151487A (en) * 1982-03-01 1983-09-08 Shinko Electric Ind Co Ltd Tin electroplating bath made acidic with hydrochloric aicd
JPH0754184A (en) * 1993-08-17 1995-02-28 Kobe Steel Ltd Sulfuric acid tin plating bath for reflow plating capable of embodying fast continuous plating
CN101922026A (en) * 2010-08-18 2010-12-22 济南德锡科技有限公司 Methanesulfonic acid-based matte pure tin electroplating solution and additive thereof
CN101962790A (en) * 2010-08-20 2011-02-02 河南科技大学 Electrolyte composition for half bright acid tinning
CN103882485A (en) * 2014-04-04 2014-06-25 哈尔滨工业大学 All-sulfate tin electroplating additive and plating solution thereof
CN105063680A (en) * 2015-08-21 2015-11-18 无锡桥阳机械制造有限公司 Sulfonic acid type semi-bright pure-tin electroplating liquid
CN105648483A (en) * 2016-04-11 2016-06-08 济南德锡科技有限公司 High-speed tinning solution and preparation method thereof

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
张立茗等: "《实用电镀添加剂》", 31 January 2007, 化学工业出版社 *
曾华樑等: "《电镀技术问题对策》", 31 October 2006, 机械工业出版社 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106835210A (en) * 2017-03-09 2017-06-13 昆明理工大学 A kind of sulfate bright tin plating solution and preparation method thereof
TWI703239B (en) * 2018-03-20 2020-09-01 日商三菱綜合材料股份有限公司 Plating solution of tin or tin alloy and method for forming bumps
US11053600B2 (en) 2018-03-20 2021-07-06 Mitsubishi Materials Corporation Tin or tin alloy plating solution and bump forming method
CN108396343A (en) * 2018-05-05 2018-08-14 深圳市竑鎏电子表面处理科技有限公司 A kind of mist tin additive and the electroplate liquid using the mist tin additive
CN113430593A (en) * 2021-05-10 2021-09-24 江苏灏润新材料科技有限公司 Novel additive suitable for high-speed copper-tin composite production

Similar Documents

Publication Publication Date Title
CN106222710A (en) A kind of acid half bright tin plating solution and preparation method thereof
CN102758228B (en) A kind of sulfonic acid type semi-bright Pure Tin Plating Process liquid
CN102943292B (en) A kind of method of plastic surface plating micro-crack nickel
CN111058068A (en) Processing technology of zinc-plated nickel alloy
CN102304734A (en) Alkali system electroplating bright zinc-nickel alloy process
CN109957822A (en) Copper alloy electroplating technology
CN102352521A (en) Environment-friendly barrel-plating type trivalent chromium plating solution and barrel-plating method thereof
CN102605391A (en) Brightener for zinc and zinc iron alloy
CN105970256A (en) Brightening agent electroplated with bright zinc-nickel alloys and preparation method of brightening agent
CN102220610B (en) Non-cyanide copper-tin alloy plating solution
CN104120462B (en) Steel cord is without the cuprous brass plating of cyanogen and the passivating method of brass coating
CN103215622B (en) A kind of method of electric wire copper conductor eleetrotinplate
CN105780070A (en) Alkaline zinc-nickel alloy electroplating technology and serial additives thereof
CN105177659A (en) Surface treatment process for improving corrosion resistance of copper foil
US20020166774A1 (en) Alloy composition and plating method
CN102383178B (en) Stripping solution for vehicle connector electroplated terminal plating
CN105369305A (en) A copper-nickel alloy electroplating solution and an electroplating method thereof
CN105063677A (en) Electroplating nickel solution and electroplating method thereof
CN104846410A (en) Method for electroplating nickel on brass and red copper alloy
CN104120466A (en) Weak acid chloride electroplating solution used for neodymium iron boron electroplating of zinc-iron alloy and preparation method
CN105970252A (en) Change agent electroplated with bright zinc-nickel alloys
CN102517616B (en) Plating solution formula for electroplating tin and bismuth on aluminum material and electroplating method thereof
JP2005314799A (en) Tinning method and tinning bath used therefor
CN102392274B (en) Low-temperature rapid black nickel water
CN1359769A (en) Process for manufacturing non-cyanogen electroplated low-tin bronze steel wire for rim

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20161214

RJ01 Rejection of invention patent application after publication