CN105988294B - An immersion lithography machine to maintain the immersion flow field collision avoidance - Google Patents

An immersion lithography machine to maintain the immersion flow field collision avoidance Download PDF

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CN105988294B
CN105988294B CN201510040998.2A CN201510040998A CN105988294B CN 105988294 B CN105988294 B CN 105988294B CN 201510040998 A CN201510040998 A CN 201510040998A CN 105988294 B CN105988294 B CN 105988294B
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immersion
means
buffer
liquid
maintain
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CN105988294A (en
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秦少伍
聂宏飞
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上海微电子装备(集团)股份有限公司
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Abstract

本发明公开一种浸没式光刻机浸液流场维持防碰撞系统,其特征在于,包括:液体供给装置,用于在投影物镜及基底台之间提供液体;基底,位于该基底台之上并浸没于该液体中;缓冲伸缩装置,该缓冲伸缩装置位于该液体供给装置和基底之间,用于实现该液体的密封,可在光轴方向上移动。 Over a substrate, the substrate table is located; a liquid supply means for providing a liquid between the projection lens and the substrate table: discloses an immersion lithography machine according to the present invention is to maintain the immersion flow field anti-collision system, characterized by comprising and immersed in the liquid; a buffer telescopic device, the telescopic means is located between the buffer liquid supply means and the substrate, for sealing the liquid, can be moved in the optical axis direction.

Description

一种浸没式光刻机浸液流场维持防碰撞系统 An immersion lithography machine to maintain the immersion flow field collision avoidance

技术领域 FIELD

[0001] 本发明涉及一种集成电路装备制造领域,尤其涉及一种浸没式光刻机浸液流场维持防碰撞系统。 [0001] The present invention relates to the field of equipment for manufacturing an integrated circuit, in particular, it relates to an immersion lithography machine to maintain the immersion flow field anti-collision system.

背景技术 Background technique

[0002] 光刻机是制造超大规模集成电路的核心装备之一,现代光刻机以光学光刻为主, 它利用光学系统把掩膜版上的图形精确地投影并曝光在涂过光刻胶的硅片上。 [0002] The lithography is one of the core VLSI manufacturing equipment, modern lithography optical lithography based, which uses an optical system to accurately pattern on the mask is projected and exposed coated lithography the silicon rubber. 它包括一个激光光源、一个光学系统、一块由芯片图形组成的投影掩模版、一个对准系统和一个涂有光敏光刻胶的硅片 It comprises a laser light source, an optical system, a reticle pattern composed by the chip, an alignment system and a wafer coated with a photosensitive resist

[0003] 浸没式光刻(I圓ersion Lithography)设备通过在最后一片投影物镜与娃片之间填充某种高折射率的液体,相对于中间介质为气体的干式光刻机,提高了投影物镜的数值孔径(NA),从而提高了光刻设备的分辨率和焦深。 [0003] The immersion lithography (I circle ersion Lithography) device through a liquid between the projection objective and the last one filled sheet Wa certain high refractive index, with respect to dry lithography intermediate medium is a gas, the improved projection the numerical aperture (NA), thus increasing the resolution and depth of focus of the lithographic apparatus. 在已提出的下一代光刻机中,浸没式光刻对现有设备改动最小,对现在的干式光刻机具有良好的继承性。 In the next generation lithography has been proposed, the immersion lithographic minimal changes to existing equipment, having a good inheritance of current dry lithography. 目前常采用的方案是局部浸没法,即将液体限制在硅片上方和最后一片投影物镜的下表面之间的局部区域内,并保持稳定连续的液体流动。 Now often used solution is localized immersion method, i.e. the liquid in a localized area between the upper and lower surface of the wafer a last projection objective, and maintain a stable continuous liquid flow. 在步进-扫描式光刻设备中,硅片在曝光过程中进行高速的扫描运动,这种运动会将曝光区域内的液体带离流场,从而引起泄漏,泄漏的液体会在光刻胶上形成水迹,影响曝光质量。 , Wafer scanning lithographic apparatus during exposure of a high-speed scanning movement, the liquid in the games which exposed areas away from the flow field, thereby causing the leak, the leaked liquid will be on the resist - In step formation of traces of water, affecting the quality of the exposure. 因此,浸没式光刻技术中必须重点解决缝隙流场的密封问题。 Thus, immersion lithography must be focused on solving the problem of sealing the gap flow field.

[0004] 目前已有的解决方案中,专利US6954256B2公开了使用气密封,气密封技术是在环绕填充流场的圆周周边上,通过施加高压气体形成环形气幕,将填充液体限定在一定的圆形区域内。 [0004] The currently available solutions, Patent US6954256B2 discloses the use of gas seals, hermetic seal technique is filled around the circumferential periphery of the flow field of the annular gas curtain is formed by applying a high pressure gas, the liquid filled in a certain circle defined the shaped region.

[0005] 专利US20070126999 A1公开了使用液体密封,液密封技术是利用与填充液体不相容的第三方液体(通常是磁流体或水银等),环绕填充流场进行密封。 [0005] Patent No. US20070126999 A1 discloses the use of a liquid seal, and liquid sealing technology is the use of a liquid filling the liquid incompatible third party (usually a magnetic fluid or the like mercury), the flow field around the filled sealed.

[0006] 但是在这些密封方案中,存在以下不足: [0006] However, these seals embodiment, the following deficiencies:

[0007] (1)现有的气密封方式采用气幕施加在填充流体周围,但是为保证基底台在高速水平运动下不发生浸没液体泄漏,要求浸没头与物镜、基底台或硅片的距离非常近,其中要求浸没头与基底台或硅片之间的距离小于200um,而基底台上安装有其他部件,导致基底台表面存在〇-16〇Um的起伏形貌,且基底台为运动部件,其垂向运动行程为±0.5mm,存在浸没头与物镜、基底台或硅片发生碰撞而影响光刻性能、损坏光刻设备的风险。 [0007] (1) using a conventional airtight manner around the air curtain is applied to the filling fluid, but in order to ensure the substrate table of the immersion liquid leakage does not occur at a high speed horizontal motion requires immersion head and the lens, distance from the substrate or wafer table very close, wherein the distance required between the immersion head and the substrate table or wafer is less than 200um, and other components attached to the substrate table, leading to the presence of square-16〇Um undulating topography of the surface of the substrate table, the substrate table and a motion member which vertical movement stroke of ± 0.5mm, the risk of the presence of an immersion objective or a silicon wafer substrate stage lithographic performance impact collision occurs, damage to the lithographic apparatus and the head.

[0008] (2)液密封方式对密封液体有十分苛刻的要求,在确保密封性能要求的同时,还必须保证密封液体与填充液体不相互溶解、与光刻胶(或Topcoat)及填充液体不相互扩散。 [0008] (2) a liquid-tight manner has a very demanding liquid seal, ensuring sealing performance requirements, it is also necessary to ensure that the liquid filling and sealing liquid does not dissolve each other, does not resist (or Topcoat) and filled with a liquid interdiffusion. 在衬底高速运动过程中,外界空气或密封液体一旦被卷入或溶解或扩散到填充液体中,都会对曝光质量产生负面的影响。 In the high-speed movement of the substrate during sealing liquid or ambient air once caught or dissolved or dispersed in a liquid to the filling, it will have a negative effect on the quality of the exposure.

发明内容 SUMMARY

[0009] 为了克服现有技术中存在的缺陷,本发明提供一种浸没式光刻机浸液流场维持防碰撞系统。 [0009] In order to overcome the drawbacks present in the prior art, the present invention provides an immersion lithography machine to maintain the immersion flow field anti-collision system.

[0010]为了实现上述发明目的,本发明公开一种浸没式光刻机浸液流场维持防碰撞系统,其特征在于,包括:液体供给装置,用于在投影物镜及基底台之间提供液体;基底,位于该基底台之上并浸没于该液体中;缓冲伸缩装置,该缓冲伸缩装置位于该液体供给装置和基底之间,用于实现该液体的密封,可在光轴方向上移动。 [0010] In order to achieve the above object, there is disclosed an immersion lithography machine according to the present invention is to maintain the immersion flow field collision avoidance system, characterized in that, comprising: liquid supply means for providing a liquid between the projection lens and the substrate table ; substrate, the substrate table located above and immersed in the liquid; a buffer telescopic device, the telescopic means is located between the buffer liquid supply means and the substrate, for sealing the liquid, can be moved in the optical axis direction. 更进一步地,所述缓冲伸缩装置的末端包括柔性橡胶薄膜圈对所述液体进行密封,所述柔性橡胶薄膜圈与所述基底之间的距离保持在预设间隙范围内。 Still further, the telescopic end of the buffer means comprises a flexible rubber membrane sealed to the liquid ring, the distance between the ring and the flexible rubber film to the substrate remain within predetermined range of the clearance.

[0012] 更进一步地,该缓冲伸缩装置沿与该投影物镜的光轴垂直的方向旋转。 [0012] Still further, the buffer telescopic device is rotated in a direction perpendicular to the optical axis of the projection objective.

[0013] 更进一步地,该缓冲伸缩装置包括:气体供给通道,用于提供一高速率气流;以及气液回收通道,用于气液回收。 [0013] Still further, the buffer telescopic device comprising: a gas supply channel for supplying a high-rate gas stream; and a liquid recovery path for recovering liquid.

[0014] 更进一步地,还包括一测量装置,该测量装置用于测量该缓冲伸缩装置与该液体供给装置的预设高度。 [0014] Still further, further comprising a measuring apparatus, predetermined height of the telescopic device and the buffer liquid supply means to the measuring means for measuring. 还包括测量装置,所述测量装置用于测量所述缓冲伸缩装置与所述液体供给装置之间的相对位移。 Further comprising measuring means, said measuring means for measuring a relative displacement between the buffer means and the liquid supply telescopic device.

[0015] 更进一步地,该缓冲伸缩装置包括一致动装置,该致动装置用于实现该缓冲伸缩装置在Z、Rx、Ry方向上运动。 [0015] Furthermore, the buffer means comprises a telescopic actuating means, the actuating means for achieving the buffer means telescopically moved in the Z, Rx, Ry directions.

[0016] 更进一步地,还包括一缓冲伸缩装置控制器以及一基底台控制器,用于控制该缓冲伸缩装置和该基底台以相同的速度和加速度运动,避免该缓冲伸缩装置和该基底台发生碰撞。 [0016] Still further, the telescopic device further comprises a buffer controller, and a base station controller for controlling the buffer and the telescopic device substrate table at the same speed and acceleration of motion, to avoid the buffer telescopic device and the substrate table Collision.

[0017] 更进一步地,还包括一补偿装置,用于补偿该缓冲伸缩装置与基底台之间的浸没液体的刚度k和阻尼系数D。 [0017] Still further, further comprising a compensating means for compensating for the stiffness k and damping cushion immersion liquid between the substrate table and the telescopic device D.

[0018] 更进一步地,该致动装置的数量为三个,均匀分布于该缓冲伸缩装置的边缘处。 [0018] Still further, the number of the actuator means is three, evenly distributed in the buffer at the edge of the telescopic device.

[0019] 更进一步地,该致动装置为微型致动器,所述微型制动器为压电致动器、微型步进电机或音圈电机。 [0019] Still further, the actuating means is a micro-actuator, the brake is a miniature piezoelectric actuator, a micro stepping motor or a voice coil motor.

[0020] 本发明在现有液体供给系统与硅片台之间的间隙中,添加一缓冲伸缩装置,该缓冲伸缩装置能够自由的在光轴方向上移动或围绕至少一个垂直于光轴的轴旋转。 [0020] In the present invention, a gap between the liquid supply system with a conventional wafer stage, add a buffer telescopic device, the telescopic device capable of buffering or move freely about at least one axis perpendicular to the optical axis in the optical axis direction, rotation. 该结构底端是一充满液体(磁流体)的柔性橡胶薄膜圈,通过缓冲伸缩装置的运动调节柔性橡胶薄膜圈硅片台上方预定高度,从而解决了现有液体供给系统由于浸没头与物镜、基底台或硅片的距离非常近,存在浸没头与物镜、基底台或硅片发生碰撞的风险,同时能够满足维持浸液流场的功能。 The bottom structure is filled with a liquid (magnetic fluid) is a flexible rubber membrane ring, flexible rubber adjusting ring silicon film at a predetermined height by the movement of the platform side cushioning telescopic device, thereby solving the conventional liquid supply system due to the immersion head and the lens, silicon from the substrate table or very close, there is a risk immersion head and the lens, the substrate table or wafer collision, while maintaining the functionality to meet the immersion flow field.

[0021] 与现有技术相比较,本发明的进步效果在于: [0021] Compared with the prior art, the present invention advances the effect of:

[0022] (1)提高了液体供给系统与工作台之间的间距,从而避免了液体供给系统与工作台发生碰撞, [0022] (1) increase the spacing between the liquid supply system and the stage, the liquid supply system so as to avoid collision with the table,

[0023] (2)液体供给装置固定不动,仅仅是缓冲伸缩装置运动,大大减小了液体供给装置的运动对主流场稳定产生的千扰。 [0023] (2) the liquid supply device is stationary, the buffer simply means telescopic movement, greatly reduces interference thousand movement of the liquid supply apparatus of the main field generated stably. 同时减小了运动负载,降低了因运动机构产生的温升而对曝光产生的影响。 While reducing the motion loads, reducing the influence of the temperature rise due to the movement generated by the mechanism of the exposure generated.

[0024] (3)缓冲伸缩装置与基底台采用同步控制,避免了跟随运动而产生的响应延时,提高了系统的工作效率。 Response [0024] (3) the buffer means and the substrate table telescopic synchronous control, to avoid the delay caused to follow the motion, improving the efficiency of the system.

附图说明 BRIEF DESCRIPTION

[0025] 关于本发明的优点与精神可以通过以下的发明详述及所附图式得到进一步的了解。 [0025] The advantage and spirit of the appended drawings the present invention may be further understood by the following detailed description of the invention and.

[0026] 图1是现有技术中常见的光刻机的结构示意图; [0026] FIG. 1 is a schematic view of a common prior art lithography machine;

[0027] 图2是气体密封浸没单元示意图; [0027] FIG. 2 is a schematic view of a gas seal means is immersed;

[0028] 图3是本发明浸没式光刻机浸液流场维持防碰撞系统的结构示意图; [0028] FIG. 3 is a schematic structural diagram of anti-collision system of an immersion lithography machine according to the present invention is to maintain the immersion flow field;

[0029] 图4是本发明浸没式光刻机浸液流场维持防碰撞系统的缓冲伸缩密封装置的结构示意图; [0029] FIG. 4 is a schematic structural diagram of a buffer retractable sealing means anti-collision system of an immersion lithography machine according to the present invention is to maintain the immersion flow field;

[0030] 图5是本发明浸没式光刻机浸液流场维持防碰撞系统的缓冲伸缩密封装置的俯视图; [0030] FIG. 5 is an immersion lithography machine according to the present invention, the immersion flow field buffer to maintain the anti-collision system of the retractable top plan view of the sealing apparatus;

[0031] 图6是本发明浸没式光刻机浸液流场维持防碰撞系统的缓冲伸缩密封装置的控制原理图。 [0031] FIG. 6 is an immersion lithography machine of the present invention to maintain the immersion flow field buffer Anti-collision system control schematic retractable sealing device.

具体实施方式 Detailed ways

[0032]下面结合附图详细说明本发明的具体实施例。 [0032] The following detailed description of specific embodiments of the present invention in conjunction with the accompanying drawings.

[0033]本发明的目的在于提供一种浸没式光刻机的浸液流场维持系统,在现有液体供给系统与硅片台之间的间隙中,添加一缓冲伸缩装置,该缓冲伸缩装置能够自由的在光轴方向上移动或围绕至少一个垂直于光轴的轴旋转。 [0033] The object of the present invention is to provide an immersion lithography machine to maintain the immersion flow field system, the existing gap between the liquid supply system and wafer stages, the addition of a buffer telescopic device, the telescopic device buffer able to move freely, or at least a rotation about an axis perpendicular to the optical axis in the optical axis direction.

[0034]图1为现有的光刻机的结构示意图,其揭示一现有的光刻机结构。 [0034] FIG. 1 is a schematic view of a conventional lithography machine, which discloses the structure of a conventional lithography. 在该光刻机中, 主框架支撑一照明系统20、一投影物镜10和一硅片台40,硅片台40上放置有一涂有感光光刻胶的硅片50。 In the lithography machine, the main frame 20 supporting an illumination system, a projection objective 10 and a wafer stage 40, there is placed a silicon wafer coated with a photosensitive photoresist 50 on the wafer stage 40. 掩模版30上集成电路的图形通过照明系统20和投影物镜10,以成像曝光的方式,转移到涂有感光光刻胶的硅片50上,从而完成曝光。 An integrated circuit pattern on the reticle 30 by the illumination system 20 and projection lens 10 to image exposure mode, transferred onto a silicon wafer coated with a photosensitive resist 50, thereby completing the exposure.

[0035]图2为现有的气体密封技术的示意图,通过入口/出口输送管13,将投影物镜PL与硅片台W之间充满具有相对较高的折射率的液体11,比如水.通过位于投影装置PL的最后部件之下或周围的液体供给装置12形成存贮装置。 [0035] FIG. 2 is a schematic diagram of the prior art gas seal, through the inlet / outlet transfer tube 13, will be filled with liquid having a relatively high refractive index between the projection lens PL 11 and wafer stage W, such as water. By under the last member of the projection apparatus PL or the liquid supply device 12 formed around the storage means. 通过气体,比如空气或合成气体,但优选的是N2或其它惰性气体,形成该气体密封,气体在压力下通过入口15提供到液体供给装置12 和基底之间的缝隙,以及通过第一出口14引出。 Through the gas, such as air or synthesis gas, but preferably N2 or another inert gas, which gas seal is formed, the gas under pressure is supplied to the gap between the substrate and the liquid supply device 12 through the inlet 15, outlet 14 and through a first elicited. 设置气体入口15处的过压力、第一出口14处的真空水平和缝隙的几何形状,从而提供向内的高速率的气流以限定液体。 Through a gas inlet 15 at a pressure, vacuum level and geometry of the gap at the first outlet 14, thereby providing high rate gas flow inwardly to define a liquid.

[0036]图3为本发明浸没式光刻机浸液流场维持防碰撞系统,该系统使液体供给装置12 距离硅片台一定远的距离,该距离能够完全的保证硅片台的高速扫描运动不会碰撞到液体供给装置12。 [0036] FIG. 3 immersion lithography immersion flow field to maintain anti-collision system of the present invention, the liquid supply system so that the wafer stage apparatus 12 a certain distance away distance that can fully guarantee high-speed scanning of the wafer stage the movement does not collide to the liquid supply apparatus 12. 其特征是在液体供给装置12的底部与基地W的表面之间添加一缓冲伸缩装置I7,该缓冲伸缩装置17与液体供给装置12底端相连接,缓冲伸缩装置17能够通过外部驱动(图中未画出)在光轴方向上移动或围绕至少一个垂直于光轴的轴旋转。 Characterized in that the telescopic device I7 adding a buffer between the bottom and the surface of the base W of the liquid supply device 12, the buffer 17 and the telescopic device liquid supply device 12 is connected to a bottom end, the buffer 17 can drive the telescopic device (FIG external not shown) or moving around the optical axis direction perpendicular to the axis of rotation of at least one optical axis. 该结构底端是一柔性橡胶薄膜圈18,通过缓冲伸缩装置17的运动调节柔性橡胶薄膜圈18硅片台上方预定高度,通过该预设高度来实现对浸没液体的第一道密封。 The structure of the bottom ring is a flexible rubber membrane 18, 17 is adjusted moving the flexible silicon rubber membrane ring 18 at a prescribed height through the buffer stage telescopic device, the primary seal is achieved by the immersion liquid of predetermined height.

[0037]图4为本发明专利的缓冲伸缩装置放大图,柔性橡胶薄膜圈18距离基底的距离保持在很小的距离范围内,该预设距离能满足液体自身的张力来实现自我的密封, [0037] FIG. 4 an enlarged view of the buffer retracting device of the present invention patent, film from a flexible rubber ring 18 from the substrate is maintained within a small distance range, the predetermined distance can satisfy its own tension of the liquid self-sealing,

[0038]缓冲伸缩装置包括气体供给通路14'和气液回收通路15',该气体供给通路14'和气液回收通路15'分别与液体供给装置上气体供给通道丨4和气液回收通道15相连通。 [0038] Buffer telescopic device comprises a gas supply passage 14 'and the liquid recovery path 15', the gas supply passage 14 'and the liquid recovery passage 15', respectively to the liquid supply apparatus the gas supply passage Shu 4 and the liquid recovery passage 15 communicates. 气体在微小正压下通过气体供给通道提供到缓冲伸缩装置17和基底之间的缝隙中,以及通过气液回收通道以负压形式将气体和缝隙中的液体引出,从而提供向内的高速率的气流,作为对浸没液体的第二道密封。 Under a slight positive pressure in the gas supply through the gas feed passage into the gap between the buffer 17 and the telescopic device substrate, and a liquid recovery passage by the negative pressure in the form of gases and liquids in the extraction slit, thereby providing a high rate inwardly air, as a secondary seal against the immersion liquid.

[0039]本发明浸没式光刻机浸液流场维持防碰撞系统进一步包括测量装置,该测量装置直接测量缓冲伸缩装置与液体供给装置的相对位置量,该位置量反馈给缓冲系统的控制机构,通过控制机构的控制来调节柔性橡胶薄膜圈18与基底的预设高度,通过让柔性橡胶薄膜圈18随动最终来实现浸没液体的动态密封。 [0039] The immersion lithography machine according to the present invention is to maintain the immersion flow field anti-collision system further comprising measuring means, the measuring means directly measuring the relative position of the telescopic means and the amount of the buffer liquid supply means, the position of the amount of feedback to the control mechanism of the buffer system to adjust the predetermined height of the flexible rubber film and the substrate ring 18 controlled by the control means, the final immersion liquid dynamic seal is achieved by having a flexible rubber film 18 follower ring.

[0040]图5示意给出了缓冲伸缩装置的俯视图。 [0040] FIG. 5 shows a schematic top plan view of a cushioning telescopic device. 致动器19安装在缓冲伸缩装置17上,其具体位置在气体供给通道14的外侧,也可以是在气液回收通道15的内侧。 The actuator 19 is mounted on a retractable buffer device 17, its location on the outside of the gas supply passage 14, the liquid may be recovered in the inner passage 15. 缓冲伸缩装置至少包括3个致动器,通过致动器的运动,实现缓冲伸缩装置在Z、Rx、Ry方向的运动。 The buffer means comprises at least three telescopic actuator by movement of the actuator to achieve Z, Rx, Ry direction of movement of the telescopic device in the buffer. 致动器为微型致动器,可以是压电致动器,也可以是微型步进电机或音圈电机等。 A micro actuator The actuator may be a piezoelectric actuator, may be micro-stepper motor or a voice coil motor or the like.

[0041]图6示意给出了本发明缓冲伸缩装置的控制原理,通过缓冲伸缩装置位置传感器21测量出缓冲伸缩装置17与液体供给装置12的相对位移量,该位置量作为反馈信号给控制器24以进行闭环控制。 [0041] Figure 6 schematically shows the control principle of a telescopic device according to the invention the buffer, the buffer 21 is measured by a position sensor means telescopically retractable buffer device 17 to the liquid supply apparatus 12 of the relative displacement amount, the position of the amount as a feedback signal to the controller 24 for closed loop control. 通过基底台垂向位置传感器22测量出基底台40与测量框架26之间的位置量,该位置量反馈给基底台控制器25,执行器27用于驱动基底台在Z、Rx、Ry方向上运动。 By vertical position sensor 22 measures the position of the substrate table between the amount of the substrate table 26 and the measurement frame 40, back to the position quantity of the substrate table controller 25, an actuator 27 for driving the substrate stage Z, Rx, Ry directions motion.

[0042]上位机是指整机软件控制系统,将基底台Z、Rx、Ry方向的位置量同时下发给缓冲伸缩装置控制器24和基底台控制器25,以控制缓冲伸缩装置与基底台同步运动。 [0042] PC software refers to the whole control system, the position quantity of the substrate stage Z, Rx, Ry directions while the lower telescopic device send buffer controller 24 and the base station controller 25 to control the buffer means and the substrate table telescopic synchronized movement. 缓冲伸缩装置控制器24、执行器19与基底台控制器25、执行器27的动态响应特性相当,保证缓冲伸缩装置和基底台以相同的速度和加速度运动。 Buffer telescopic device controller 24, the actuator 19 and the base station controller 25, the dynamic response characteristics of the actuator 27 is quite ensure cushioning telescopic device and the substrate table at the same speed and acceleration of movement. 使缓冲伸缩装置与基底台的间隙保持在预设的固定值,从而避免缓冲伸缩装置与基底台发生碰撞。 The buffer means and the substrate table telescopic gap holding at preset fixed value, so as to avoid collision with the buffer telescopic device substrate table occurs.

[0043]图6示意给出了作用在缓冲伸缩装置17与基底台40之间的阻尼系数D和弹簧K。 [0043] Figure 6 schematically shows the action of the spring 17 and the damping coefficient D between the telescopic device 40 in the buffer and the substrate table K. 这两个参数代表了缓冲伸缩装置与基底台之间浸没液体产生的压力传递关系。 These two parameters represent the immersion pressure between the buffer means and the substrate table telescopic resulting liquid transfer relationship. 可以通过浸没液体的物料特性和缓冲伸缩装置的几何形状计算得到。 It can be obtained by calculation of geometry and material properties of the immersion liquid cushioning telescopic device. 通过补偿装置23,将缓冲伸缩装置与基底台之间的浸没液体的刚度k和阻尼系数D补偿到控制器24的输出,从而减小浸没液体产生的压力传递和提高伺服控制性能。 By compensating means 23, will compensate for the stiffness k and damping coefficient D immersion liquid between the substrate table and the telescopic device buffer to the output of the controller 24, thereby reducing the pressure of the immersion liquid is transferred and increasing servo control performance.

[0044]本说明书中所述的只是本发明的较佳具体实施例,以上实施例仅用以说明本发明的技术方案而非对本发明的限制。 [0044] in the present specification are only preferred embodiments of the present invention are described, for example, only the above embodiments describing the technical solutions of the present invention, not limitation of the invention. 凡本领域技术人员依本发明的构思通过逻辑分析、推理或者有限的实验可以得到的技术方案,皆应在本发明的范围之内。 Where skilled in the art under this inventive concept by logical analysis, reasoning or limited experiments aspect can be obtained, it is to be within the scope of the present invention.

Claims (10)

1. 一种浸没式光刻机浸液流场维持防碰撞系统,其特征在于,包括: 液体供给装置,用于在投影物镜及基底台之间提供液体; 基底,位于所述基底台之上并浸没于所述液体中; 缓冲伸缩装置,所述缓冲伸缩装置位于所述液体供给装置和基底之间,用于实现所述液体的密封,可在光轴方向上移动; 所述缓冲伸缩装置与所述液体供给装置相连,所述缓冲伸缩装置与所述基底之间保持在预设间隙范围内。 Over a substrate, said substrate table positioned; a liquid supply means for providing a liquid between the projection lens and the substrate table: 1. an immersion lithography machine to maintain the immersion flow field collision avoidance system, comprising and immersed in the liquid; a buffer telescopic device, the telescopic means is located between the buffer liquid supply means and said substrate, for implementing the sealing liquid, can be moved in the optical axis direction; telescopic said buffer means means connected to the liquid feed, said buffer telescopic device remain within predetermined range of the clearance between the substrate and.
2. 如权利要求1所述的浸没式光刻机浸液流场维持防碰撞系统,其特征在于,所述缓冲伸缩装置的末端包括柔性橡胶薄膜圈对所述液体进行密封,所述柔性橡胶薄膜圈与所述基底之间的距离保持在预设间隙范围内。 2. The immersion lithography machine according to an immersion flow field to maintain the anti-collision system as claimed in claim, characterized in that the telescopic end of the buffer means comprises a flexible rubber membrane sealed to the liquid ring, the flexible rubber the distance between the film and the substrate holding ring within a predetermined range of the clearance.
3. 如权利要求1所述的浸没式光刻机浸液流场维持防碰撞系统,其特征在于,所述缓冲伸缩装置沿与所述投影物镜的光轴垂直的方向旋转。 An immersion lithography machine according to an immersion flow field to maintain the anti-collision system as claimed in claim 3, characterized in that the damping telescopic device along the optical axis of the projection objective with vertical rotation.
4. 如权利要求1所述的浸没式光刻机浸液流场维持防碰撞系统,其特征在于,所述缓冲伸缩装置包括:气体供给通道,用于提供一高速率气流;以及气液回收通道,用于气液回收。 And recovering liquid; a gas supply channel for supplying a high rate of gas flow: 4. The immersion lithography machine according to an immersion flow field to maintain the anti-collision system as claimed in claim, wherein said buffer means comprises a telescoping passage for liquid recovery.
5. 如权利要求1所述的浸没式光刻机浸液流场维持防碰撞系统,其特征在于,还包括测量装置,所述测量装置用于测量所述缓冲伸缩装置与所述液体供给装置之间的相对位移。 5. The immersion lithography machine according to an immersion flow field to maintain the anti-collision system as claimed in claim, characterized by further comprising measuring means, measuring means for measuring the telescopic means and said buffer means supplying the liquid relative displacement between.
6. 如权利要求1所述的浸没式光刻机浸液流场维持防碰撞系统,其特征在于,所述缓冲伸缩装置还包括致动装置,所述致动装置用于实现所述缓冲伸缩装置在Z、Rx、Ry方向上运动。 6. The immersion lithography machine according to an immersion flow field to maintain the anti-collision system as claimed in claim, wherein said buffer means further comprises a retractable actuating means, said actuating means for achieving the buffer telescopic means movement in the Z, Rx, Ry directions.
7. 如权利要求丨所述的浸没式光刻机浸液流场维持防碰撞系统,其特征在于,还包括缓冲伸缩装置控制器以及基底台控制器,用于控制所述缓冲伸缩装置和所述基底台以相同的速度和加速度运动,避免所述缓冲伸缩装置和所述基底台发生碰撞。 7. The immersion lithography immersion flow field Shu claim maintain anti-collision system, characterized in that the telescopic device further comprising a buffer controller and a base station controller for controlling said buffer means and the telescopic said base station at the same speed and acceleration of movement, to avoid stretching the buffer means and the substrate table collision.
8. 如权利要求7所述的浸没式光刻机浸液流场维持防碰撞系统,其特征在于,还包括补偿装置,用于补偿所述缓冲伸缩装置与基底台之间的浸没液体的刚度k和阻尼系数D。 8. The immersion flow field immersion lithography machine according to claim 7 to maintain the anti-collision system, characterized in that, further comprising compensation means for compensating the stiffness of the buffer immersion liquid between the substrate table and the telescopic device k and damping coefficient D.
9. 如权利要求6所述的浸没式光刻机浸液流场维持防碰撞系统,其特征在于,所述致动装置的数量为三个,均匀分布于所述缓冲伸缩装置的边缘处。 9. The immersion flow field immersion lithography machine according to claim 6 to maintain anti-collision system, wherein the number of said actuator means is three, uniformly distributed in the buffer at the edge of the telescopic device.
10. 如权利要求6所述的浸没式光刻机浸液流场维持防碰撞系统,其特征在于,所述至女动装置为微型致动器,所述微型致动器为压电致动器、微型步进电机或音圈电机。 10. The immersion flow field immersion lithography machine according to claim 6 to maintain anti-collision system, characterized in that said movable means is a female to the microactuator, the microactuator is a piezoelectric actuator , a micro-stepper motor or voice coil motor.
CN201510040998.2A 2015-01-28 2015-01-28 An immersion lithography machine to maintain the immersion flow field collision avoidance CN105988294B (en)

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CN1550905A (en) * 2003-05-13 2004-12-01 Asml荷兰有限公司 Lithographic apparatus and device manufacturing method
US7501226B2 (en) * 2004-06-23 2009-03-10 Taiwan Semiconductor Manufacturing Co., Ltd. Immersion lithography system with wafer sealing mechanisms
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